阅读说明：本技术 一种速调管 (Klystron ) 是由 刘秀 李冬凤 周军 王坤 欧阳佳佳 徐娜 张思安 雷雪峰 储开荣 赵跃帅 刘永梅 于 2020-07-22 设计创作，主要内容包括：本发明公开了一种速调管,所述速调管包括磁聚焦系统以及与所述磁聚焦系统连接的电子枪,所述磁聚焦系统的外径小于或者等于所述电子枪的外径。本发明的速调管进行电子传输时,能量损失减少,提高了电子注的流通率,使得速调管满足工程应用下峰值功率高、工作比小以及脉冲宽度小的特殊要求。(The invention discloses a klystron, which comprises a magnetic focusing system and an electron gun connected with the magnetic focusing system, wherein the outer diameter of the magnetic focusing system is less than or equal to that of the electron gun. When the klystron of the invention is used for electronic transmission, the energy loss is reduced, and the circulation rate of the electron beam is improved, so that the klystron meets the special requirements of high peak power, small working ratio and small pulse width under the engineering application.)

1. A klystron is characterized in that,

the klystron comprises a magnetic focusing system and an electron gun connected with the magnetic focusing system,

the outer diameter of the magnetic focusing system is smaller than or equal to the outer diameter of the electron gun.

2. The klystron of claim 1, wherein a ratio of an outer diameter of the magnetic focusing system to an outer diameter of the electron gun is in a range of: 0.7 to 1.

3. The klystron of claim 1, wherein the magnetic focusing system comprises magnetic steel and a magnetic ring,

the outer diameter of the structure formed by the magnetic steel and the magnetic ring is smaller than or equal to the outer diameter of the electron gun.

4. The klystron of claim 3, wherein the magnetic focusing system further comprises an outer snap ring that is sleeved outside the structure formed by the magnetic steel and the magnetic ring.

5. The klystron of claim 4, wherein an outer diameter of the outer snap ring is equal to or less than an outer diameter of the electron gun.

6. The klystron of claim 3, wherein the magnetic steels and the magnetic rings are alternately mounted, and the circumferential inner side walls of the magnetic steels and the circumferential inner side walls of the magnetic rings are both attached and fixed to the circumferential outer side wall of the klystron high frequency band tube body.

7. The klystron of claim 3, further comprising a collector, an upper magnetic shield, and a lower magnetic shield, wherein the upper magnetic shield comprises a connection to the collector and the lower magnetic shield comprises a connection to the electron gun;

the magnetic ring comprises:

an upper magnetic ring fixedly connected with the upper magnetic screen;

the lower magnetic ring is fixedly connected with the lower magnetic screen; and

and the connecting magnetic ring is positioned between the upper magnetic ring and the lower magnetic ring.

8. The klystron of claim 7, wherein a magnetic field region for electron beam operation is formed between the upper magnetic ring and the lower magnetic ring.

9. The klystron of claim 3, wherein adjacent magnetic steels and magnetic rings are fixed by adhesive.

Technical Field

The present invention relates to the field of microwave devices. And more particularly to a klystron.

Background

A widely used klystron is generally composed of the following parts: a cathode capable of emitting sufficient current; a heater for ensuring that the cathode reaches the required working temperature; an electron gun for converging electrons into a beam and capable of withstanding a high voltage; a magnetic focusing system for maintaining the electron beam not to diverge; a collector and a corresponding cooling system for converting the total energy of the electron beam into heat energy; an output window capable of transmitting all high frequency power without reflection; resonant cavities and output systems that interact with the electron beams and convert the energy of the electron beams into high frequency energy, and the like.

Disclosure of Invention

The present invention aims to provide a klystron to solve at least one of the problems existing in the prior art;

in order to achieve the purpose, the invention adopts the following technical scheme: a kind of speed-adjusting tube is disclosed,

the klystron comprises a magnetic focusing system and an electron gun connected with the magnetic focusing system,

the outer diameter of the magnetic focusing system is smaller than or equal to the outer diameter of the electron gun.

Further, the ratio range of the outer diameter of the magnetic focusing system to the outer diameter of the electron gun is as follows: 0.7 to 1.

Furthermore, the magnetic focusing system comprises magnetic steel and a magnetic ring,

the outer diameter of the structure formed by the magnetic steel and the magnetic ring is smaller than or equal to the outer diameter of the electron gun.

Furthermore, the magnetic focusing system further comprises an outer snap ring, and the outer snap ring is sleeved outside the structure formed by the magnetic steel and the magnetic ring.

Further, the outer diameter of the outer snap ring is smaller than or equal to the outer diameter of the electron gun.

Further, magnet steel and magnetic ring are installed in turn, the circumference inside wall of magnet steel and the circumference inside wall of magnetic ring are all laminated and fixed in on the circumference lateral wall of speed adjusting pipe high frequency section body.

Furthermore, the klystron further comprises a collector, an upper magnetic screen and a lower magnetic screen, wherein the upper magnetic screen comprises a connecting part connected with the collector, and the lower magnetic screen comprises a connecting part connected with the electron gun;

the magnetic ring comprises:

an upper magnetic ring fixedly connected with the upper magnetic screen;

the lower magnetic ring is fixedly connected with the lower magnetic screen; and

and the connecting magnetic ring is positioned between the upper magnetic ring and the lower magnetic ring.

Furthermore, a magnetic field area for electron beam work is formed between the upper magnetic ring and the lower magnetic ring.

Furthermore, the adjacent magnetic steel and the magnetic ring are connected and fixed through viscose

The invention has the following beneficial effects:

when the klystron of the invention is used for electronic transmission, the energy loss is reduced, and the circulation rate of the electron beam is improved, so that the klystron meets the special requirements of high peak power, small working ratio and small pulse width under the engineering application.

Drawings

In order to more clearly illustrate the technical solutions in the embodiments of the present invention, the drawings needed to be used in the description of the embodiments will be briefly introduced below, and it is obvious that the drawings in the following description are only some embodiments of the present invention, and it is obvious for those skilled in the art to obtain other drawings based on these drawings without creative efforts.

FIG. 1 shows a cross-sectional view of a magnetic focusing system of an embodiment of the present invention;

FIG. 2 illustrates a side view of a magnetic focusing system of an embodiment of the present invention.

Detailed Description

In order to more clearly illustrate the invention, the invention is further described below with reference to preferred embodiments and the accompanying drawings. Similar parts in the figures are denoted by the same reference numerals. It is to be understood by persons skilled in the art that the following detailed description is illustrative and not restrictive, and is not to be taken as limiting the scope of the invention.

The focusing performance of the klystron electron beam is not only related to the magnetic field intensity of the magnetic focusing system, but also has a great relation with the magnetic field distribution of the magnetic focusing system at the position of the electron beam channel. The stronger the magnetic field required by electron beam focusing is, the larger the volume of the focusing system is, so that the outer diameter D1 of the magnetic system of the magnetic focusing system of the klystron in the prior art is far larger than the outer diameter D2 of the electron gun barrel, the weight of the magnetic focusing system is generally 1-5 times of that of the klystron, and the circulation rate is generally 93%.

Aiming at the defects of electron beam focusing and circulation rate of the klystron in the prior art, the embodiment of the invention provides the klystron, and the magnetic field intensity on a central shaft can be greatly improved by tightly attaching the inner diameter of a magnetic focusing system to the outer wall of a high-frequency section. As shown in fig. 1 and 2, the klystron includes a magnetic focusing system and an electron gun connected to the magnetic focusing system, and an outer diameter D1 of the magnetic focusing system is less than or equal to an outer diameter D2 of the electron gun.

The magnetic focusing system of the klystron of the embodiment of the invention has larger change of the magnetic field at the position of the electron beam channel along with the radius, and the focusing action force of the magnetic field close to the channel wall to the electron beam is larger than the focusing action force on the central shaft, thereby improving the defocusing resistance, increasing the rigidity of the electron beam and improving the focusing performance of the electron beam. When the klystron designed by the invention is used for electronic transmission, the energy loss is reduced, the circulation rate is improved, and the circulation rate of the klystron can reach more than 96 percent, so that the klystron meets the special requirements of high peak power, small working ratio and small pulse width under the engineering application.

In some optional implementations of this embodiment, a ratio of an outer diameter of the magnetic focusing system to an outer diameter of the electron gun ranges from: 0.7 to 1.

In a specific example, when the ratio D1/D2 of the outer diameter of the magnetic focusing system to the outer diameter of the electron gun is 0.88, after verification by a microwave tube, in the case that the diameter D2 of the electron gun is 45mm, the klystron of the embodiment can obtain an electron beam with a flux rate of 96%, and at this time, the outer diameter D1 of the magnetic focusing system is only 40 mm. In contrast to the magnetic focusing system of the prior art klystron, when the electron gun diameter D2 is also 45mm, the magnetic focusing system outer diameter D1 of the prior klystron is 150mm, and the flow rate is 93%.

In another example, when the ratio D1/D2 between the outer diameter of the magnetic focusing system and the outer diameter of the electron gun is 0.93, after verification by a microwave tube, when the diameter D2 of the electron gun is 70mm, the klystron of the present embodiment can obtain an electron beam with a flux rate of 96%, at this time, the outer diameter of the magnetic focusing system D1 is 65mm, and compared with the magnetic focusing system applied to the klystron of the prior art, when the diameter D2 of the electron gun is also 70mm, the outer diameter D of the magnetic focusing system of the prior klystron is 260mm, and the flux rate is 93%.

Therefore, in the range of the ratio of the outer diameter D1 of the magnetic focusing system provided by the embodiment to the outer diameter D2 of the electron gun, the flow rate of the klystron of the embodiment of the invention can be improved by 3% compared with the flow rate of the magnetic focusing system of the prior art. In some optional implementations of this embodiment, as shown in fig. 1, the magnetic focusing system 1 includes a magnetic steel 11 and a magnetic ring 12,

the outer diameter of the structure formed by the magnetic steel 11 and the magnetic ring 12 is smaller than or equal to the outer diameter of the electron gun 2.

In a specific example, the outer diameter of the magnetic focusing system may be formed by the outer diameter of the structure formed by the magnetic steel 11 and the magnetic ring 12, in which case the outer diameter of the structure formed by the magnetic steel 11 and the magnetic ring 12 is smaller than or equal to the outer diameter of the electron gun 2.

In some optional implementations of this embodiment, as shown in fig. 1, the magnetic focusing system 1 further includes an outer snap ring 13, and the outer snap ring 13 is sleeved outside the structure formed by the magnetic steel 11 and the magnetic ring 12.

As shown in fig. 1, the circumferential inner side wall of the outer snap ring 13 is tightly attached to the circumferential outer side wall of the magnetic steel 11 and the circumferential outer side wall of the magnetic ring 12 at the same time, and is used for positioning the magnetic steel 11 and the magnetic ring 12.

In some optional implementations of this embodiment, the outer diameter of the outer snap ring 13 is equal to or less than the outer diameter of the electron gun 2.

Because the outer snap ring has a certain thickness, under the condition that the magnetic focusing system is provided with the outer snap ring, the outer diameter of the outer snap ring 3 is the outer diameter D2 of the magnetic focusing system according to the embodiment of the present invention, and because the outer diameter of the outer snap ring 13 is less than or equal to the outer diameter of the electron gun 2, the magnetic focusing system formed by the structure still meets the condition that the outer diameter of the magnetic focusing system is less than or equal to the outer diameter of the electron gun.

In some optional implementation manners of this embodiment, the magnetic steels 11 and the magnetic rings 12 are alternately installed, and the circumferential inner side walls of the magnetic steels 11 and the circumferential inner side walls of the magnetic rings 12 are both attached and fixed to the circumferential outer side wall of the klystron high-frequency tube body 21.

As shown in fig. 1, the magnetic focusing system according to the embodiment of the present invention includes a plurality of magnetic steel rings (made of pure iron), a plurality of magnetic rings (made of permanent magnetic material), and 1 outer snap ring (made of nonmagnetic material), an electron beam channel of the klystron is located at a central axis of the magnetic focusing system, the magnetic steels and the magnetic rings are firmly bonded by high and low temperature resistant adhesive, and a strong attraction force of the magnetic rings to the iron material is absorbed and installed between the two magnetic steels and is positioned by the outer snap ring.

Through the arrangement, the outer diameter of the magnetic focusing system and an electron beam channel of the electron gun can form a coaxial structure, and the circumferential inner side wall of the magnetic steel 11 and the circumferential inner side wall of the magnetic ring 12 are tightly attached to the circumferential outer side wall of the klystron high-frequency tube body, so that the focusing performance of the electron beam is improved.

In some optional implementations of this embodiment, the magnetizing directions of two adjacent magnetic rings are opposite or the same, and the magnetizing directions of another portion of the plurality of adjacent magnetic rings which are the same and take the center of the length direction of the magnetic system as an axis are opposite. And in some optional implementations of this embodiment, the magnetic ring is magnetized in an axial direction.

The magnetic field strength generated by the magnetic focusing system is related to the magnetic material of the magnetic ring, the structure and the volume (inner diameter and outer diameter) of the magnetic system. The samarium cobalt material with good temperature property is selected for the high-intensity magnetic field generally, and the magnetic field intensity is related to the structural design and the volume of the magnetic system under the condition of selecting the same material. The magnetic system of the invention has novel structural design, small inner diameter of the magnetic ring, large magnetic field intensity and magnetic flux distribution, is beneficial to electron beam defocusing resistance, good focusing performance, high circulation rate, improved electron beam interaction efficiency, small outer diameter of the magnetic system, and is beneficial to improving the flexibility and maneuverability of the whole system.

Through the magnetizing mode and the plurality of closely arranged magnetic steels and magnetic rings, a magnetic field with high peak intensity is formed between the magnetic steels and the magnetic rings, and the focusing performance of the electron beams is effectively improved. In a specific example, the magnetic focusing system of the embodiment of the invention can obtain the axial magnetic field strength of the center of the electron beam channel to be 0.4T +/-0.1T, which is improved by 1.6 times compared with the axial magnetic field strength of 0.25T of the center of the electron beam channel in the prior art.

In some optional implementations of this embodiment, the adjacent magnetic steels 11 and magnetic rings 12 are fixed by adhesive. The magnetic ring adopts permanent magnetism material (like samarium cobalt, ferro-aluminum boron etc.), and the magnet steel is pure iron, and usable magnetic ring adsorbs the strong suction of iron material to make the magnetic ring firmly install between two magnet steels on the one hand, and on the other hand is for guaranteeing the physical joint strength of magnet steel and magnetic ring, will be adjacent pass through the viscose connection between magnet steel and the magnetic ring for the magnetic focusing system guarantees use strength. In some optional implementations of this embodiment, the electron gun is assembled and fixed with the magnetic focusing system to form an integrally connected klystron.

In some optional implementations of this embodiment, the klystron further includes a collector, an upper magnetic shield 3, and a lower magnetic shield 4, where the upper magnetic shield includes a connection portion connected to the collector, and the lower magnetic shield includes a connection portion connected to the electron gun;

as shown in fig. 1, the magnetic ring 12 includes:

an upper magnetic ring 121 fixedly connected with the upper magnetic screen;

a lower magnetic ring 122 fixedly connected with the lower magnetic screen; and

and a connecting magnetic ring 123 positioned between the upper magnetic ring and the lower magnetic ring.

A magnetic field area for electron beam work is formed between the upper magnetic screen 3 and the lower magnetic screen 4, the upper magnetic screen is made of pure iron, the lower magnetic screen is made of pure iron, the magnetic steel material is made of pure iron, and the magnetic field area for electron beam work is formed between the upper magnetic screen and the lower magnetic screen after the magnetic ring is magnetized.

The upper magnetic ring 121 is arranged at the upper magnetic screen 3 in an adsorbing way, the lower magnetic ring 122 is arranged at the lower magnetic screen 4 in an adsorbing way, and when the magnetic focusing system works, the magnetic focusing system is connected with the upper magnetic screen and the lower magnetic screen of the klystron to form a whole. The connecting magnetic ring 123 between the upper magnetic ring and the lower magnetic ring and the magnetic steel 11 are tightly arranged to form an integrated magnetic focusing structure, and a magnetic field with high peak intensity is formed to focus the electron beam, so that the energy loss caused by the dispersion of the electron beam is greatly reduced, and the circulation rate of the klystron is further improved.

In a specific example, the upper magnetic shield 3 and the lower magnetic shield 4 are respectively provided with through holes for passing through the electron beam, and a channel 51 for passing through the electron beam is formed inside the klystron high-frequency tube body 5.

The electron beam channel is coaxial with the upper magnetic screen through hole and the lower magnetic screen through hole, a magnetic field with high peak intensity exists in the area between the upper magnetic screen and the lower magnetic screen, the electron beam enters the magnetic field area at the opening of the lower magnetic screen, and when the electron beam is transmitted in the magnetic field area, the electron beam is under the action of the axial magnetic field, so that the focusing performance of the electron beam is kept, and the electron beam leaves the magnetic field area from the opening of the upper magnetic screen and enters the collector. The magnetic focusing system of the embodiment can keep the electron beam focused and reduce the energy loss in the electron beam transmission process.

In a specific example, as shown in fig. 1, the outer snap ring 13 circumferentially covers the outer side wall of the magnetic steel 11 and the outer side wall of the magnetic ring 12, and two ends of the outer snap ring 13 in the extending direction are respectively attached to the upper magnetic screen 3 and the lower magnetic screen 4 to form an integrated klystron structure.

The klystron of an embodiment of the invention may be formed by:

firstly, the magnetic steel 11 and the magnetic ring 12 are firmly bonded through high and low temperature resistant viscose; then, the magnetic ring is used for adsorbing and installing the iron material between the two magnetic steels by using the strong suction force of the magnetic ring, and the magnetic steel 11 and the connecting magnetic ring 123 are fixed and positioned by the outer snap ring 13; the upper magnetic ring 121 is arranged at the upper magnetic screen 3 in an absorption way, the lower magnetic ring 122 is arranged at the lower magnetic screen 4 in an absorption way, and the upper and lower magnetic rings at the two ends are fastened with the high-frequency tube 5 through the outer clamping ring 13; magnetizing the magnetic ring along the axial direction to enable the area between the upper magnetic screen 3 and the lower magnetic screen 4 to be a magnetic field area, namely a working area of the klystron electron beam; the lower magnetic shield is connected to the electron gun and the upper magnetic shield is connected to the collector.

When the klystron designed by the invention is used for electron transmission, the energy loss is reduced, the circulation rate of electron beams is improved, and the focusing performance of a magnetic system can meet the requirement of a focusing magnetic field of an electron optical system. The flow rate of the embodiment of the invention can reach more than 96 percent, the axial magnetic field intensity of the center of the electron beam channel can be obtained to be 0.4T +/-0.1T, the weight of the magnetic system is only 1/3-1/2 of the weight of the klystron, and the total weight is reduced to 1/4-1/10 of the total weight of the conventional focusing method. The klystron can meet the special requirements of high peak power, small duty ratio (the duty ratio is less than or equal to 0.1%) and small pulse width under the engineering application.

It should be understood that the above-mentioned embodiments of the present invention are only examples for clearly illustrating the present invention, and are not intended to limit the embodiments of the present invention, and it will be obvious to those skilled in the art that other variations or modifications may be made on the basis of the above description, and all embodiments may not be exhaustive, and all obvious variations or modifications may be included within the scope of the present invention.