阅读说明：本技术 一种双色焦平面探测器的制作方法及双色图像获取方法 (Manufacturing method of double-color focal plane detector and double-color image obtaining method ) 是由 冯斌 李琳 康超 于 2020-04-29 设计创作，主要内容包括：本发明公开了一种双色焦平面探测器的制作方法及双色图像获取方法,通过在基底上镀制呈梳状周期排布的单色滤光膜形成微滤光片阵列、在焦平面探测器的焦平面上粘贴微滤光片阵列构成双色焦平面探测器、获取双色焦平面探测器直接输出的宽波段图像和第一幅窄波段图像、将宽波段图像和第一幅窄波段图像沿垂直于滤光膜延展方向分别进行两倍放大处理、在全尺寸的宽波段图像中去除全尺寸的第一幅窄波段图像得到全尺寸的第二幅窄波段图像,提出的双色焦平面探测器的制作方法及双色图像获取方法具有制造工艺简单、结构紧凑、集成度高、可快照式成像、成本低的优点。(The invention discloses a method for manufacturing a double-color focal plane detector and a method for acquiring a double-color image, the manufacturing method of the two-color focal plane detector and the two-color image acquisition method have the advantages of simple manufacturing process, compact structure, high integration level, capability of snapshot imaging and low cost.)

1. A manufacturing method of a bicolor focal plane detector is characterized by comprising the following steps:

s11: plating a monochromatic filter membrane in comb-shaped periodic arrangement on a substrate to form a micro-filter array;

s12: and pasting the micro optical filter array to a focal plane of the focal plane detector to form a double-color focal plane detector, wherein the substrate and the working waveband of the focal plane detector are provided with an intersection waveband I, and the working waveband of the single-color filter membrane and the intersection waveband I are provided with an intersection waveband II.

2. The method for manufacturing the bicolor focal plane detector of claim 1, wherein the plurality of monochromatic filter films are arranged on the surface of the substrate in a comb-shaped period, and the width of a single monochromatic filter film is equal to 1/2 of the arrangement period.

3. The method of making a dual color focal plane detector of claim 1, wherein the thickness of the substrate is 0.1-2.0 mm.

4. The method for manufacturing a bicolor focal plane detector of claim 1, wherein the focal plane detector is any one of a visible-near infrared focal plane detector, a visible-short wave infrared focal plane detector and a short wave infrared focal plane detector.

5. The method for manufacturing a bi-color focal plane detector of claim 1, wherein the micro-filter array is adhered to the focal plane of the focal plane detector, and the adhering surface of the micro-filter array is any one of a surface with the monochromatic filter film and a surface without the monochromatic filter film.

6. The method for manufacturing a bicolor focal plane detector of claim 1, wherein the micro-filter array is adhered to the focal plane detector, and the alignment direction of the micro-filter array and the focal plane detector is any one of the two directions of alignment along the horizontal direction of the focal plane detector and alignment along the vertical direction of the focal plane detector.

7. The method for manufacturing a bi-color focal plane detector of claim 6, wherein said alignment is along the horizontal direction of the focal plane of said focal plane detector, the extension direction of said monochromatic filter is consistent with the horizontal direction of the focal plane of said focal plane detector, and a single monochromatic filter is in line with the n of said focal plane detector₁Line pixels aligned, n₁Is a positive integer.

8. The method for manufacturing a bi-color focal plane detector of claim 6, wherein said alignment is along the vertical direction of the focal plane of said focal plane detector, the extension direction of said monochromatic filter is the same as the vertical direction of the focal plane of said focal plane detector, and a single monochromatic filter is aligned with the n of said focal plane detector₂Column pixels aligned, n₂Is a positive integer.

9. The method for manufacturing the bicolor focal plane detector according to claim 6, wherein the method for manufacturing the bicolor focal plane detector is characterized in that the array of the micro-filters is pasted on the focal plane of the focal plane detector to form the bicolor focal plane detector, and comprises the following steps:

s21: coating ultraviolet sensitive glue with the thickness of less than 100nm on a focal plane of the focal plane detector;

s22: a working light source is formed by adding an optical filter in front of an LED light source, wherein the working waveband of the optical filter is positioned in the intersection waveband I and does not intersect with the working waveband of the monochromatic filter film;

s23: under the irradiation of the working light source, adjusting the position and the angle of the micro-filter plate array to ensure that the micro-filter plate array is aligned with the focal plane pixel of the focal plane detector;

s24: and curing the micro-fluorescence plate array and the focal plane of the focal plane detector together by using an ultraviolet lamp for exposure.

10. A bi-color image acquisition method, characterized by comprising the steps of:

s31: the dichromatic focal plane detector prepared by the method for manufacturing a dichromatic focal plane detector according to any one of claims 1 to 9, wherein the pixels which are not acted by the monochromatic filter film output a broadband image, and the pixels which are acted by the monochromatic filter film output a first narrow-band image, so that the broadband image and the first narrow-band image are obtained;

s32: respectively carrying out double-time image amplification processing on the wide-band image and the first narrow-band image along a direction perpendicular to the extension direction of the monochromatic filter film by using an image amplification processing method to correspondingly obtain a full-size wide-band image and a full-size first narrow-band image;

s33: and removing the full-size first narrow-band image from the full-size wide-band image to obtain a full-size second narrow-band image, so as to obtain two full-size narrow-band images, wherein the removing method is to subtract the full-size first narrow-band image from a beta-fold full-size wide-band image to obtain the full-size second narrow-band image, the beta value is a ratio of an average value of the first narrow-band image output by the two-color focal plane detector to an average value of the wide-band image under a light source irradiation condition that a working band is within a band of the monochromatic filter film, and the image average value is an average value of all pixel values in the image.

11. The bi-color image acquisition method according to claim 10, wherein the image enlargement processing method is any one of four methods of nearest neighbor interpolation, linear interpolation, cubic spline interpolation, and deep learning.

Technical Field

The invention belongs to the technical field of photoelectric imaging, and particularly relates to a manufacturing method of a double-color focal plane detector and a double-color image acquisition method.

Background

The current two-color imaging methods are mainly classified into three types according to the structure: the first type is a combination of two sets of monochrome imaging systems responsive to different wavelength bands (e.g., granted patent publication No. CN 103974039B); the second type is that two focal plane detectors share one optical system, and in the optical path, a light splitting element is used to split the incident light into two paths on the wave band, and the two paths are respectively responded by the two focal plane detectors (for example, granted patent publication No. CN 105227818B); the third type consists of a dichroic focal plane detector responsive to two bands, preceded by an optical system (e.g., granted patent publication No.: CN 105244357B). The first two types of two-color imaging systems are limited in application due to the defects that the structure is large, the cost is high, a space registration error easily exists between the two detectors, the reliability is poor and the like. The third type of two-color imaging method has the advantages of high integration level, miniaturization, small spatial registration error and the like. The two-color focal plane detector is a core device of a third type of imaging system.

The structure of the current bicolor focal plane detector mainly has two types: the first is an array type double-color focal plane detector, adjacent pixels in the focal plane detector respond to different wave bands, and the two types of pixels are arranged in a staggered manner, so that the difficulty of the manufacturing process of the detector is extremely high; the second is a stacked two-color focal plane detector, which is composed of two stacked photodiodes or infrared light detection quantum wells distributed longitudinally and can obtain radiation of two wave bands completely aligned spatially (granted patent publication No. CN 105244357B). The two dual-color focal plane detectors require radiation response and signal reading of two wave bands in a small space in one pixel or adjacent pixels, and provide quite high design and preparation process requirements for the material, device packaging and reading circuit design of the detectors, so that the preparation process of the dual-color focal plane detectors is complex and the cost is high. In conclusion, the existing two-color imaging method has the defects of large system volume, complex preparation process and high cost.

At present, a document (research on design and manufacturing process of visible/infrared dual-band array type optical filter, 2007,36, z1) discloses a design and manufacturing process of a dual-band array type optical filter. The manufacturing scheme adopts two working procedures of plating filter films on a sapphire substrate to finish the dual-waveband array type optical filter, and comprises a first working procedure of plating a long-wave-pass infrared cut-off filter film and a second working procedure of plating a short-wave-pass cut-off filter film. When the manufacturing scheme is used for implementing the second step of coating the filter film, the position of the coated filter film in the first step needs to be accurately positioned, the second coating step is ensured not to influence the coated filter film in the first step, otherwise, the coated filter film in the first coating step is damaged, and even the coated filter film in the first step is damaged, so that the overall quality, performance and yield of the array type optical filter are seriously reduced.

Disclosure of Invention

Aiming at the defects of the existing scheme, the invention provides a manufacturing method of a bicolor focal plane detector and a bicolor image acquisition method. A manufacturing method of a two-color focal plane detector and a two-color image acquisition method are provided, wherein the manufacturing method comprises the steps of plating a single-color filter membrane which is arranged in a comb-shaped period on a substrate to form a micro-filter membrane array, pasting the micro-filter membrane array on a focal plane of a focal plane detector, acquiring a wide-band image and a first narrow-band image which are directly output by the two-color focal plane detector, respectively carrying out double amplification processing on the wide-band image and the first narrow-band image along a direction perpendicular to the extension direction of the filter membrane, and removing the full-size first narrow-band image from the full-size wide-band image to obtain a full-size second narrow-band image.

In order to achieve the purpose, the invention adopts the following technical scheme to realize the purpose:

the invention discloses a method for manufacturing a two-color focal plane detector, which comprises the following steps:

s11: plating a monochromatic filter membrane in comb-shaped periodic arrangement on a substrate to form a micro-filter array;

s12: and pasting the micro optical filter array to a focal plane of the focal plane detector to form a double-color focal plane detector, wherein the substrate and the working waveband of the focal plane detector are provided with an intersection waveband I, and the working waveband of the single-color filter membrane and the intersection waveband I are provided with an intersection waveband II.

As a preferred embodiment of the present invention: the plurality of monochromatic filter films are arranged on the surface of the substrate in a comb-shaped period, wherein the width of a single monochromatic filter film is equal to 1/2 of the arrangement period.

As a preferred embodiment of the present invention: the thickness of the substrate is 0.1-2.0 mm.

As a preferred embodiment of the present invention: the focal plane detector is any one of a visible-near infrared focal plane detector (the working waveband is 0.4-1.0 mu m), a visible-short wave infrared focal plane detector (the working waveband is 0.4-1.7 mu m) and a short wave infrared focal plane detector (the working waveband is 0.9-1.7 mu m).

As a preferred embodiment of the present invention: and adhering the micro-filter array to a focal plane of the focal plane detector, wherein the adhering surface of the micro-filter array is any one of the surface with the monochromatic filter membrane and the surface without the monochromatic filter membrane.

As a preferred embodiment of the present invention: the micro-filter plate array is adhered to the focal plane detector, and the alignment direction of the micro-filter plate array and the focal plane detector is any one of the two directions of alignment along the horizontal direction of the focal plane detector and alignment along the vertical direction of the focal plane detector.

As a preferred embodiment of the present invention: the horizontal direction along the focal plane of the focal plane detector is aligned, the extension direction of the monochromatic filter membrane is consistent with the horizontal direction of the focal plane detector, and the monochromatic filter membrane and the n of the focal plane detector are single₁Line pixels aligned, n₁Is a positive integer.

As a preferred embodiment of the present invention: the filter films are aligned along the vertical direction of the focal plane, the extension direction of the monochromatic filter film is consistent with the vertical direction of the focal plane detector, and the monochromatic filter film and the n of the focal plane detector are single₂Column pixels aligned, n₂Is a positive integer.

As a preferred embodiment of the present invention: the micro-filter array is adhered to the focal plane of the focal plane detector to form a double-color focal plane detector, and the method comprises the following steps:

s21: coating ultraviolet sensitive glue with the thickness of less than 100nm on a focal plane of the focal plane detector;

s22: a working light source is formed by adding an optical filter in front of an LED light source, wherein the working waveband of the optical filter is positioned in the intersection waveband I and does not intersect with the working waveband of the monochromatic filter film;

s23: under the irradiation of the working light source, adjusting the position and the angle of the micro-filter plate array to ensure that the micro-filter plate array is aligned with the focal plane pixel of the focal plane detector;

s24: and curing the micro-fluorescence plate array and the focal plane of the focal plane detector together by using an ultraviolet lamp for exposure.

Based on the double-color focal plane detector, the invention discloses a double-color image acquisition method, which comprises the following steps:

s31: in the bi-chromatic focal plane detector prepared by the method for manufacturing a bi-chromatic focal plane detector according to any embodiment, the pixel element which is not acted by the monochromatic filter film outputs a broadband image, and the pixel element which is acted by the monochromatic filter film outputs a first narrow-band image, so that the broadband image and the first narrow-band image are obtained;

s32: respectively carrying out double-time image amplification processing on the wide-band image and the first narrow-band image along a direction perpendicular to the extension direction of the monochromatic filter film by using an image amplification processing method to correspondingly obtain a full-size wide-band image and a full-size first narrow-band image;

s33: and removing the full-size first narrow-band image from the full-size wide-band image to obtain a full-size second narrow-band image, so as to obtain two full-size narrow-band images, wherein the removing method is to subtract the full-size first narrow-band image from a beta-fold full-size wide-band image to obtain the full-size second narrow-band image, the beta value is a ratio of an average value of the first narrow-band image output by the two-color focal plane detector to an average value of the wide-band image under a light source irradiation condition that a working band is within a band of the monochromatic filter film, and the image average value is an average value of all pixel values in the image.

As a preferred embodiment of the present invention: the image amplification processing method is any one of four methods, namely nearest neighbor interpolation, linear interpolation, cubic spline interpolation and deep learning.

The invention has the beneficial effects that:

the invention forms a micro-filter array by plating a single-color filter film which is arranged in a comb-shaped period on a substrate, pastes the micro-filter array on a focal plane of a focal plane detector to form a double-color focal plane detector, obtains a wide-band image and a first narrow-band image which are directly output by the double-color focal plane detector, respectively performs double amplification on the wide-band image and the first narrow-band image along the direction vertical to the extension direction of the filter film, and removes the first narrow-band image in the full-size wide-band image to obtain a second narrow-band image in the full-size.

In addition, the bicolor focal plane detector provided by the invention only adopts one procedure to plate the monochromatic filter film, and compared with the manufacturing scheme of plating the bicolor filter film through two procedures, the technique complexity and cost for plating the filter film are undoubtedly reduced.

Drawings

FIG. 1 is a flow chart of a method of making a bi-color focal plane detector and a bi-color image acquisition method in accordance with the present invention;

FIG. 2 is a schematic structural diagram of a micro-filter array aligned along the horizontal direction of the focal plane according to the present invention;

FIG. 3 is a layered schematic diagram of a dual color focal plane detector for horizontal alignment along the focal plane in accordance with the teachings of the present invention;

FIG. 4 is a schematic diagram of a dual color focal plane detector for horizontal alignment along the focal plane in accordance with the teachings of the present invention;

FIG. 5 is a schematic structural diagram of a micro-filter array aligned along the vertical direction of the focal plane according to the present invention;

FIG. 6 is a layered schematic diagram of a dual color focal plane detector for alignment along a focal plane perpendicular direction according to the present invention;

fig. 7 is a schematic diagram of a dual color focal plane detector for alignment along the vertical direction of the focal plane according to the present invention.

Description of reference numerals:

101-a substrate of transparent glass; 102-a monochromatic filter film for alignment along the focal plane horizontal direction; 103-an array of micro-filters for alignment along the focal plane horizontal direction; 104-a focal plane detector with a working wave band of 0.4-1.0 μm; 105-picture elements of a focal plane detector; 106-a two-tone focal plane detector aligned horizontally along the focal plane;

201-a substrate of short wave infrared material; 202-a monochromatic filter film for alignment in the vertical direction of the focal plane; 203-an array of micro-filters for alignment along the vertical direction of the focal plane; 204-a focal plane detector with a working wave band of 0.9-1.7 μm; 205-picture elements of a focal plane detector; 206-dichroic focal plane detector aligned perpendicular to the focal plane.

Detailed Description

The invention is further described with reference to the following figures and specific embodiments.

The technical solutions in the embodiments of the present invention are clearly and completely described below. The described embodiments are only some embodiments of the invention, not all embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.