Photoresist material, color filter and display device

文档序号:1337015 发布日期:2020-07-17 浏览:14次 中文

阅读说明:本技术 光刻胶材料、彩色滤光片和显示装置 (Photoresist material, color filter and display device ) 是由 张月红 于 2020-04-29 设计创作,主要内容包括:本申请提供一种光刻胶材料、彩色滤光片和显示装置,所述光刻胶材料包括颜料分散液、粘合树脂、染料、光引发剂、溶剂和添加剂,所述染料包括卟啉-聚倍半硅氧烷寡聚体,所述卟啉-聚倍半硅氧烷寡聚体的结构式具有卟啉基和聚倍半硅氧烷基,将卟啉基和聚倍半硅氧烷基结合,形成了有机-无机杂化染料,具有热稳定性,并提高光的透过率,将光刻胶材料应用于彩色滤光片中,进而提高了彩色滤光片的性能。(The application provides a photoresist material, color filter and display device, the photoresist material includes pigment dispersion, adhesive resin, dyestuff, photoinitiator, solvent and additive, the dyestuff includes porphyrin-polysilsesquioxane oligomer, porphyrin-polysilsesquioxane oligomer's structural formula has porphyrin group and polysilsesquioxane group, combines porphyrin group and polysilsesquioxane group, has formed organic-inorganic hybrid dye, has thermal stability to improve the transmissivity of light, be applied to the color filter with the photoresist material in, and then improved color filter's performance.)

1. A photoresist material is characterized by comprising a pigment dispersion liquid, a binding resin, a dye, a photoinitiator, a solvent and an additive, wherein the dye comprises a porphyrin-polysilsesquioxane oligomer, and the structural formula of the porphyrin-polysilsesquioxane oligomer is shown in the specificationWherein, R is1The R is2The R is3And said R4One or more of polysilsesquioxane, aliphatic chain group, hydrogen group, aryl and heteroaryl, wherein R is1The R is2The R is3And said R4At least one of which is polysilsesquioxane group having the formulaM1One selected from divalent metal elements and hydrogen radicals, and R5One or more of isobutyl, hydrogen base, alkyl, alkoxy, aryl and heteroaryl.

2. The photoresist material of claim 1, wherein the divalent metal is selected from one or a combination of alkaline earth metals and subgroup metals.

3. The photoresist material of claim 2, wherein the alkaline earth metal is selected from one or a combination of Mg, Ca, Sr and Ba, and the subgroup metal is selected from one or a combination of Cu, Fe, Zn, Cr and Mn.

4. The photoresist material of claim 1, wherein the fatty chain groups comprise alkyl and alkoxy groups, the carbon chain of the alkyl and alkoxy groups being C1-C20

5. The photoresist material of claim 1, wherein the pigment dispersion is 5-10% by mass, the binder resin is 5-8% by mass, the dye is 5-8% by mass, the photoinitiator is 0.3-0.8% by mass, the solvent is 70-85% by mass, and the additive is 0.1-0.2% by mass.

6. The photoresist material of claim 1, wherein the binder resin comprises one or a combination of an acrylic resin and an epoxy acrylic resin.

7. The photoresist material of claim 1, wherein the photoinitiator comprises one or a combination of acetophenones, benzophenones, benzoins and bisimidazoles.

8. The photoresist material of claim 1, wherein the solvent comprises one or a combination of ester solvents, ether solvents, and ketone solvents.

9. A color filter comprising the photoresist material according to any one of claims 1 to 8.

10. A display device comprising the color filter according to claim 9.

Technical Field

The application relates to the technical field of display, in particular to a photoresist material, a color filter and a display device.

Background

The color filter is an important component of the liquid crystal display device, when light passes through the red pixel, the green pixel and the blue pixel on the color filter, the three colors of RGB are presented, and various colors to be displayed can be formed through the mixing of the three colors, but the dark-state color point of the display screen is shifted in the blue direction, so that the dark-state color point of the display screen is shifted to blue, and the display performance of the display device is affected.

Disclosure of Invention

The application provides a photoresist material, a color filter and a display device, so as to improve the display performance of the display device.

A photoresist material comprises pigment dispersion liquid, binding resin, dye, photoinitiator, solvent and additive, wherein the dye comprises porphyrin-polysilsesquioxane oligomer, and the structural formula of the porphyrin-polysilsesquioxane oligomer is shown in the specificationWherein, R is1The R is2The R is3And said R4One or more of polysilsesquioxane, aliphatic chain group, hydrogen group and aryl group, wherein R is1The R is2The R is3And said R4At least one of which is polysilsesquioxane group having the formulaM1One selected from divalent metal elements and hydrogen radicals, and R5One or more of isobutyl, hydrogen base, alkyl, alkoxy, aryl and heteroaryl.

In the photoresist material provided by the application, the divalent metal is selected from one or a combination of several of alkaline earth metal and subgroup metal.

In the photoresist material provided by the application, the alkaline earth metal is selected from one or more of Mg, Ca, Sr and Ba, and the subgroup metal is selected from one or more of Cu, Fe, Zn, Cr and Mn.

In the photoresist material provided by the application, the aliphatic chain group comprises an alkyl group and an alkoxy group, and the carbon chain of the alkyl group and the alkoxy group is C1-C20

In the photoresist material provided by the application, the mass fraction of the pigment dispersion liquid is 5% -10%, the mass fraction of the binder resin is 5% -8%, the mass fraction of the dye is 5% -8%, the mass fraction of the photoinitiator is 0.3% -0.8%, the mass fraction of the solvent is 70% -85%, and the mass fraction of the additive is 0.1% -0.2%.

In the photoresist material provided by the present application, the binder resin includes one or a combination of two of an acryl-based resin and an epoxy-based acrylic resin.

In the photoresist material provided by the present application, the photoinitiator includes one or a combination of acetophenone, benzophenone, benzoin and bisimidazole.

In the photoresist material provided by the present application, the solvent includes one or a combination of ester solvents, ether solvents and ketone solvents.

The application provides a color filter, which comprises the photoresist material.

The application provides a display device, which comprises the color filter.

The application discloses photoresist material, color filter and display device, photoresist material includes pigment dispersion, adhesive resin, dyestuff, photoinitiator, solvent and additive, the dyestuff includes porphyrin-polysilsesquioxane oligomer, porphyrin-polysilsesquioxane oligomer's structural formula has porphyrin group and polysilsesquioxane group, combines porphyrin group and polysilsesquioxane group, has formed organic-inorganic hybrid dye, and this kind of dye has higher thermal stability, and is higher to the transmissivity of light, is applied to the color filter with photoresist material, and then provides color filter's performance.

Drawings

In order to more clearly illustrate the technical solutions in the present application, the drawings needed to be used in the description of the embodiments will be briefly introduced below, and it is obvious that the drawings in the following description are only some embodiments of the present application, and it is obvious for those skilled in the art to obtain other drawings based on these drawings without creative efforts.

FIG. 1 is an absorption spectrum of porphyrin-polysilsesquioxane oligomers as provided herein.

Fig. 2 is a structural cross-sectional view of a color filter provided in the present application.

Fig. 3 is a structural sectional view of a display device provided in the present application.

Detailed Description

The present application provides a photoresist material. The photoresist material includes a pigment dispersion, a binder resin, a dye, a photoinitiator, a solvent, and an additive. The mass fraction of the pigment dispersion liquid is 5-10%. The mass fraction of the adhesive resin is 5-8%. The mass fraction of the dye is 5-8%. The mass fraction of the photoinitiator is 0.3-0.8%. The mass fraction of the solvent is 70-85%. The mass fraction of the additive is 0.1-0.2%.

The pigment dispersion material liquid includes one or more combinations of green pigment, yellow pigment, blue pigment and cyan pigment.

In another embodiment, the pigment dispersion material includes one or more of halogenated copper phthalocyanine, isoindoline pigment, quinophthalone pigment, and nickel complex pigment.

The adhesive resin comprises one or two of propylene resin and epoxy acrylic resin.

In another embodiment, the binder resin comprises one or a combination of acrylic acid, alkyl methacrylate, aryl methacrylate, alkylaryl methacrylate, succinic acid methacrylate, epoxy acrylate, epoxy methacrylate, epoxy alkyl methacrylate, and epoxy aryl methacrylate.

Referring to fig. 1, fig. 1 is an absorption spectrum of a porphyrin-polysilsesquioxane oligomer as provided herein. The dyes include porphyrin-polysilsesquioxane oligomers. The structural formula of the porphyrin-polysilsesquioxane oligomer is shown in the specificationWherein, R is1The R is2The R is3And said R4One or more of polysilsesquioxane group, aliphatic chain group, hydrogen group, aryl group and heteroaryl group. Wherein, R is1The R is2The R is3And said R4At least one of which is a polysilsesquioxane group. The polysilsesquioxane group has the structural formulaThe aryl group includes phenyl, naphthyl and substituted phenyl and naphthyl. The heteroaryl group includes a phenoxy group and a phenoxy group having a substituent on the ring. The fatty chain groups include alkyl and alkoxy groups. The carbon chain of the alkyl and the alkoxy is C1-C20. The alkyl group includes-C5H12and-C6H14And the like. The alkoxy group comprises-OC4H10、-OC5H12、-OC6H14and-OC8H18And the like. M1One selected from divalent metal elements and hydrogen radicals. The divalent metal is selected from one or more of alkaline earth metal and metal in a secondary group. The alkaline earth metal is selected from one or a combination of more of Mg, Ca, Sr and Ba. The metal of the secondary group is selected from one or a combination of more of Cu, Fe, Zn, Cr and Mn. The R is5One or more of isobutyl, hydrogen base, alkyl, alkoxy, aryl and heteroaryl.

The porphyrin-polysilsesquioxane oligomers have a high solubility in organic solvents, including CHCl, and thus the synthetic procedure is simple3、CH3COOCH3DMF and DMSO.

In the application, the porphyrin-polysilsesquioxane oligomer contains a silica cage structure, the structure of the porphyrin-polysilsesquioxane oligomer is an organic-electrodeless structure, so that the porphyrin-polysilsesquioxane oligomer has high thermal stability, the absorption wavelength range of the porphyrin-polysilsesquioxane oligomer to light is 400 nanometers-450 nanometers, and the absorbance to light reaches 0.95 or more when the wavelength range is 400 nanometers-450 nanometers, so that the transmittance to light with other wavelengths is improved.

The photoinitiator comprises one or a combination of a plurality of acetophenones, benzophenones, benzoins and bisimidazoles.

In another embodiment, the photoinitiator comprises one or more of α -diethoxyacetophenone, 2-methyl-2-morpholino-1- (4-methylphenylsulfanyl) propan-1-one, benzil, benzoin ether, hexaarylbisimidazoles, and benzophenone.

The solvent comprises one or a combination of ester solvents, ether solvents and ketone solvents.

In another embodiment, the solvent comprises one or more of ethylene glycol ethyl ether acetate, diethylene glycol butyl ether acetate, propylene glycol monomethyl ether ester, etc., ethylene glycol dimethyl ether, diethylene glycol diethyl ether, ethylene glycol dibutyl ether, etc., cyclohexanone, and isophorone.

The additive comprises one or a combination of a plurality of silane coupling agents, antioxidants, ultraviolet absorbers, defoaming agents and flatting agents.

In another embodiment, the additive comprises 3-aminopropyltriethoxysilane, methacryloxypropyltrimethoxysilane, triethoxypropyltrimethoxysilane, ethylenediamine propylmethyldimethoxysilane, ethylenediamine propyltriethoxysilane, vinyltriethoxysilane, zinc dialkyldithiophosphate, zinc dialkyldithiocarbamate, benzotriazole, one or a plurality of combinations of alkyl substituted imidazoline, 2-mercaptobenzothiazole, 2, 5-dimercapto-1, 3, 4-thiadiazole, 2, 4-dihydroxy benzophenone, phenyl o-hydroxybenzoate, tris (1, 2, 2, 6, 6-pentamethylpiperidinyl) phosphite, 4-benzoyloxy-2, 2, 6, 6-tetramethylpiperidine, trialkyl melamine and acrylic acid.

In the present application, the present application provides a photoresist material, the photoresist material includes a porphyrin-polysilsesquioxane oligomer, the porphyrin-polysilsesquioxane oligomer is used as a dye of the photoresist material, the porphyrin-polysilsesquioxane oligomer includes a silicon-oxygen cage structure, and presents an organic-nonpolar structure, so that the porphyrin-polysilsesquioxane oligomer has high thermal stability, and the porphyrin-polysilsesquioxane oligomer has an absorption wavelength range of 400 nm to 450 nm to light, and when the porphyrin-polysilsesquioxane oligomer is 400 nm to 450 nm, the absorbance to light reaches 0.95 or more, while the transmittance to light with other wavelengths is improved, the porphyrin-polysilsesquioxane oligomer is applied to the photoresist material and is prepared from the photoresist material, thereby improving the thermal stability of a color filter, and the transmittance of light is improved.

Referring to fig. 2, fig. 2 is a cross-sectional view of a color filter according to the present disclosure. The present application provides a color filter 121.

The color filter 121 includes one or more of a yellow sub-pixel 1211, a green sub-pixel 1212, and a blue sub-pixel 1213. The color filter is formed by adopting the photoresist material provided by the application, the photoresist material is applied to the color filter, and the photoresist material comprises porphyrin-polysilsesquioxane oligomer which is used as dye of the photoresist material, and the porphyrin-polysilsesquioxane oligomer contains a silicon-oxygen cage structure, so that the dye presents an organic-electrodeless structure, the thermal stability of the color filter is improved, and the light transmittance is improved.

Referring to fig. 3, fig. 3 is a structural cross-sectional view of a display device provided in the present application. The application provides a display device. The display device 10 includes a backlight module 200 and a display panel 100. The display panel 100 includes an array substrate 110, a liquid crystal layer 130, and a color film substrate 120. The array substrate 110 and the color film substrate 120 are disposed opposite to each other. The color filter substrate 120 includes a color filter 121 and a black matrix layer 122. The color filter 121 includes one or a combination of yellow sub-pixel 1211, green sub-pixel 1212 and blue sub-pixel 1213. A black matrix layer 122 is disposed between the sub-pixels. The liquid crystal layer 130 is located between the array substrate 110 and the color film substrate 120. The backlight module 200 includes a substrate 210, a micro light emitting diode 220, and a functional layer 230. The micro light emitting diode 220 is disposed on the substrate 210. The functional layer 230 is located on the micro light emitting diode 220 and located between the display panel 100 and the backlight module 200. The backlight module 200 may be one or two of a blue light backlight module and a white light backlight module.

The application provides a display device, porphyrin-polysilsesquioxane oligomer is used as dye to prepare a color filter, the color filter is applied to the display device, the thermal stability of the display device is improved, and in addition, the absorption wavelength range of the porphyrin-polysilsesquioxane oligomer to light is 400-450 nanometers, the light transmittance of other wavelengths to light is improved, and the problem that dark-state color points of the display screen are blue is solved.

The application provides a photoresist material, color filter and display device, the photoresist material includes pigment dispersion, adhesive resin, dyestuff, photoinitiator, solvent and additive, the dyestuff includes porphyrin-polysilsesquioxane oligomer, porphyrin-polysilsesquioxane oligomer's structural formula has porphyrin base and polysilsesquioxane base, combines porphyrin base and polysilsesquioxane base, has formed organic-inorganic hybrid dye, has thermal stability to improve the transmissivity of light, adopt photoresist material preparation color filter, and then improved color filter's thermal stability and the transmissivity to light, be applied to display device with the color filter who obtains of preparation, and then solve display device's the problem that the display dark state colour point is blue partially, and then improved display device's performance.

The foregoing provides a detailed description of embodiments of the present application, and the principles and embodiments of the present application have been described herein using specific examples, which are presented solely to aid in the understanding of the present application. Meanwhile, for those skilled in the art, according to the idea of the present application, there may be variations in the specific embodiments and the application scope, and in summary, the content of the present specification should not be construed as a limitation to the present application.

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