阅读说明：本技术 照明系统以及使用其形成鳍状结构的方法 (Illumination system and method of forming fin structure using the same ) 是由 刘恩铨 童宇诚 于 2015-04-07 设计创作，主要内容包括：本发明公开了一种照明系统以及使用其形成鳍状结构的方法。该照明系统包括用于产生光线的光源以及不透明板。不透明板设置于光源以及光掩模之间,且不透明板包括环形开口以及双极开口。环形开口具有内侧边以及外侧边。双极开口包括第一开口以及第二开口,其中第一开口与第二开口分别与环形开口相连接,并分别从环形开口的外侧边延伸出,且第一开口与第二开口对称于环形开口的中心点设置。第一开口与第二开口分别为长条状,并彼此平行,且第一开口与第二开口分别横跨环形开口的两部分。(The invention discloses an illumination system and a method for forming a fin-shaped structure by using the same. The illumination system includes a light source for generating light and an opaque plate. The opaque plate is disposed between the light source and the photomask, and includes an annular opening and a dipole opening. The annular opening has an inner side and an outer side. The bipolar opening comprises a first opening and a second opening, wherein the first opening and the second opening are respectively connected with the annular opening and respectively extend out of the outer side edge of the annular opening, and the first opening and the second opening are arranged symmetrically to the central point of the annular opening. The first opening and the second opening are respectively in a long strip shape and are parallel to each other, and the first opening and the second opening respectively cross over two parts of the annular opening.)

1. An illumination system, comprising:

the light source is used for generating light; and

the opaque plate, set up between light source and a photomask, and the opaque plate includes:

an annular opening having an inner side and an outer side; and

the bipolar opening comprises a first opening and a second opening, wherein the first opening and the second opening are respectively connected with the annular opening and respectively extend out of the outer side edge of the annular opening, the first opening and the second opening are arranged symmetrically to a central point of the annular opening, the first opening and the second opening are respectively in a long strip shape and are parallel to each other, and the first opening and the second opening respectively span two parts of the annular opening.

2. The illumination system of claim 1, wherein the first opening and the second opening are aligned along a first direction and extend along a second direction.

3. A method of forming a fin structure using a lighting system, comprising:

providing the lighting system, wherein the lighting system comprises:

a light source for generating light; and

a first opaque sheet comprising:

a first annular opening having a first inner side and a first outer side; and

a first bipolar opening, including a first opening and a second opening, wherein the first opening and the second opening are respectively connected to the first annular opening and respectively extend from the outer side of the first annular opening, the first opening and the second opening are symmetrically arranged at a first center point of the first annular opening and are arranged along a first direction, the first opening and the second opening are respectively in a strip shape and are parallel to each other, and the first opening and the second opening respectively cross two parts of the first annular opening;

providing a first photomask, a plurality of annular spacers and a substrate, wherein the annular spacers are arranged on the substrate, and the first photomask comprises a plurality of first strip-shaped openings which respectively extend along a second direction;

disposing the first opaque plate of the illumination system between the light source and the first photomask such that the first direction is perpendicular to the second direction;

forming a first mask layer on the plurality of annular spacers;

performing a first exposure process on the first mask layer by using the illumination system and the first photomask to define a plurality of first cutting openings in the first mask layer;

providing a second photomask comprising a plurality of second strip-shaped openings, wherein the illumination system further comprises a second opaque plate comprising:

a second annular opening having a second inner side edge and a second outer side edge; and

a second bipolar opening, including a third opening and a fourth opening, wherein the third opening and the fourth opening are respectively connected to the second annular opening and respectively extend from the second outer side of the second annular opening, the third opening and the fourth opening are symmetrically arranged with respect to a second center point of the second annular opening and are arranged along the second direction, the third opening and the fourth opening are respectively in a strip shape and are parallel to each other, and the third opening and the fourth opening respectively cross two parts of the second annular opening;

replacing the first opaque plate with the second opaque plate, and replacing the first photomask with the second photomask, and setting the extending direction of each second strip-shaped opening along the first direction;

performing a second exposure process on the illumination system and the second photomask to define a plurality of second cutting openings in the first mask layer; and

and removing the exposed first parts and the second parts of the annular spacers by using the first mask layer as a mask to form the fin-shaped structure.

4. The method of forming a fin structure using a lighting system of claim 3, further comprising:

performing a developing process between the second exposure process and the removing of the first portions and the second portions to form a plurality of first cutting openings and a plurality of second cutting openings, wherein the first cutting openings respectively expose the first portions of the annular spacers, and the second cutting openings respectively expose the second portions of the annular spacers.

Technical Field

The present invention relates to an illumination system and a method of forming a fin structure using the same, and more particularly, to an illumination system using an opaque plate including an annular opening and a bipolar opening as a pupil and a method of forming a fin structure using the same.

Background

As semiconductor manufacturing technology advances, the size of integrated circuits is becoming smaller and the operating speed is becoming faster. In the fabrication of integrated circuits, the most critical technology stands for the so-called photolithography process, which has the burden of precisely transferring the pattern on the photomask to the different device layers on the wafer. The photolithography process projects a pattern on a photomask onto a photoresist formed on a wafer through an exposure apparatus, and thus a resolution (resolution), i.e., a so-called Critical Dimension (CD), of the pattern formed on the wafer is determined mainly by the exposure apparatus. Since the exposure apparatus transfers the pattern onto the photoresist by projection, the illumination system of the exposure apparatus and the wavelength of the light are factors that determine the critical dimension. Therefore, it is always an object of the industry to continuously improve the illumination system to reduce the critical dimension.

Disclosure of Invention

The present invention provides an illumination system and a method for forming a fin structure using the same, so as to increase an angle at which an exposure light is incident on a photomask, thereby effectively reducing a critical dimension.

To achieve the above objective, the present invention provides an illumination system, which includes a light source and an opaque plate. The light source is used for generating light. The opaque plate is disposed between the light source and the photomask, and includes an annular opening and a dipole opening. The annular opening has an inner side and an outer side. The bipolar opening comprises a first opening and a second opening, wherein the first opening and the second opening are respectively connected with the annular opening and respectively extend out of the outer side edge of the annular opening, and the first opening and the second opening are arranged symmetrically to the central point of the annular opening. The first opening and the second opening are respectively in a long strip shape and are parallel to each other, and the first opening and the second opening respectively cross over two parts of the annular opening.

To achieve the above objects, the present invention also provides a method of forming a fin structure using a lighting system. First, an illumination system is provided, wherein the illumination system includes a light source and a first opaque plate. The light source is used for generating light. The first opaque plate includes a first annular opening and a first bipolar opening. The first annular opening has a first inner side edge and a first outer side edge. The first bipolar opening comprises a first opening and a second opening, wherein the first opening and the second opening are respectively connected with the first annular opening and respectively extend out of the first outer side edge of the first annular opening, the first opening and the second opening are arranged symmetrically to a first central point of the first annular opening and are arranged along a first direction, the first opening and the second opening are respectively in a long strip shape and are parallel to each other, and the first opening and the second opening respectively span two parts of the first annular opening. Then, a first photomask, a plurality of annular spacers and a substrate are provided, wherein the annular spacers are disposed on the substrate, and the first photomask comprises a plurality of first strip-shaped openings respectively extending along a second direction. Next, a first opaque plate of the illumination system is disposed between the light source and the first photomask, and the first direction is perpendicular to the second direction. Then, a first mask layer is formed on the annular gap. Then, a first exposure process is performed by using the illumination system and the first photomask to define a plurality of first cut openings in the first mask layer. Then, a second photomask is provided, comprising a plurality of second strip-shaped openings, wherein the illumination system further comprises a second opaque plate comprising a second ring-shaped opening and a second bi-polar opening. The second annular opening has a second inner side edge and a second outer side edge. The second bipolar opening comprises a third opening and a fourth opening, wherein the third opening and the fourth opening are respectively connected with the second annular opening and respectively extend out of the second outer side of the second annular opening, the third opening and the fourth opening are arranged symmetrically to the second central point of the second annular opening and are arranged along the second direction, the third opening and the fourth opening are respectively in a long strip shape and are parallel to each other, and the third opening and the fourth opening respectively cross over two parts of the second annular opening. Then, the first opaque plate is replaced by a second opaque plate, the first photomask is replaced by a second photomask, and the extending direction of each second strip-shaped opening is arranged along the first direction. Then, a second exposure process is performed by using the illumination system and the second photomask to define a plurality of second cut openings in the first mask layer. Then, the first part and the second part of the exposed annular gap object are removed by taking the first mask layer as a mask, so as to form the fin-shaped structure.

In the opaque plate of the present invention, the dipole opening is at least disposed at the outer side of the annular opening, so that the angle of the exposure light incident on the photomask after passing through the dipole opening and the annular opening can be increased, thereby effectively reducing the critical dimension.

Drawings

FIG. 1 is a schematic view of an exposure apparatus according to an embodiment of the present invention;

FIG. 2 is a schematic top view of an opaque panel according to a first embodiment of the present invention;

FIG. 3 is a schematic top view of an opaque panel according to a second embodiment of the present invention;

FIG. 4 is a schematic top view of an opaque panel according to a third embodiment of the present invention;

FIG. 5 is a schematic top view of an opaque panel according to a fourth embodiment of the present invention;

FIG. 6 is a schematic top view of an opaque plate according to a fifth embodiment of the present invention;

FIG. 7 is a schematic top view of an opaque panel according to a sixth embodiment of the present invention;

FIG. 8 is a schematic top view of an opaque panel according to a seventh embodiment of the present invention;

FIG. 9 is a schematic top view of an opaque panel according to an eighth embodiment of the present invention;

FIG. 10 is a schematic top view of an opaque panel according to a ninth embodiment of the invention;

fig. 11-14 are schematic diagrams illustrating a method for forming a fin structure using an illumination system according to an embodiment of the invention.

The reference numerals are explained below:

100 exposure apparatus 102 illumination system

104 photo mask holder 106 projection lens

108 substrate holders 110, 130 photomask

110a first strip-shaped opening 112 substrate

114 light source

116. 132, 216, 316, 416, 516, 616, 716, opaque plates

816、916

116a, a central portion 116b, and a peripheral portion

118. 134 annular openings 118a, 134a inboard edges

118b, 134b outer side edge

120. 220, 320, 420, 520, 620, 720, 820, a first bipolar opening

920

120a, 220a, 320a, 420a, 520a, 620a, 720a, a first opening

820a、920a

120b, 220b, 320b, 420b, 520b, 620b, 720b, a second opening

820b、920b

136a, 422a, 522a, 622a, 722a, 822a third opening

136b, 422b, 522b, 622b, 722b, 822b

124 annular space 124a first portion

124b second portion 126 first mask layer

128 first cut openings 130a and second strip openings

138 second cut opening 140 fin structure

136. 422, 522, 622, 722, 822 second bipolar opening

924a arcuate portion 924b elongate portion

D1 first direction D2 second direction

Position P1, P2

W1, W2, W3, W4 and W5 widths

Detailed Description

Referring to fig. 1, fig. 1 is a schematic view of an exposure apparatus according to an embodiment of the invention. As shown in fig. 1, the exposure apparatus 100 of the present embodiment may include an illumination system 102, a mask holder 104, a projection lens 106, and a substrate holder 108. The illumination system 102 is used for generating exposure light, and the mask stage 104, the projection lens 106 and the substrate stage 104 are sequentially disposed on a light path of the exposure light. Therefore, during the exposure process, the mask 110 and the substrate 112 to be patterned are disposed on the mask base 104 and the substrate base 108, respectively, so that the exposure light can pass through the mask 110 and the projection lens 106 in sequence and then be focused on a photoresist layer (not shown) on the substrate 112. The illumination system 102 includes a light source 114 and an opaque plate 116. The light source 114 may generate exposure light, such as: KrF laser (248nm) or ArF laser (193nm), but the present invention is not limited thereto. The opaque plate 116 is disposed between the light source 114 and the photomask 110, and has at least one opening thereon for serving as a pupil (pupil) of the illumination system 102, so that the exposure light can generate a desired light pattern after passing through the opening of the opaque plate 116.

Referring to fig. 2, fig. 2 is a schematic top view of an opaque plate according to a first embodiment of the invention. As shown in fig. 2, the opaque plate 116 of the present embodiment includes an annular opening 118 and a first bipolar opening 120. The annular opening 118 has an inner side 118a and an outer side 118b and surrounds a portion of the opaque plate 116. Specifically, the opaque plate 116 may include a central portion 116a and a peripheral portion 116b, and the annular opening 118 surrounds the central portion 116a, so that the central portion 116a has the same shape as the inner side 118a of the annular opening 118. For example, the shape of the annular opening 118 and the central portion 116a may be circular or elliptical. The peripheral portion 116b surrounds the annular opening 118 and the first bipolar opening 120, and the central portion 116a and the peripheral portion 116b form the annular opening 118 and the first bipolar opening 120. The first bipolar opening 120 may include at least one first opening 120a and at least one second opening 120 b. In the present embodiment, the first dual-pole opening 120 includes only a single first opening 120a and a single second opening 120 b. The first opening 120a and the second opening 120b are connected to the outer side 118b of the annular opening 118, respectively, and extend from the outer side 118b of the annular opening 118 to protrude toward the peripheral portion 116 b. The first opening 120a and the second opening 120b are symmetrically disposed about a center point of the annular opening 118, and the first opening 120a and the second opening 120b are arranged along a first direction D1. For example, the shapes of the first opening 120a and the second opening 120b may be polygonal such as square, rectangle, etc., or geometric or non-geometric shapes such as arc, arch, etc., respectively. One side of the first opening 120a and the second opening 120b is connected to the outer side 118b of the annular opening 118. The invention is not limited thereto. In other embodiments, a vertex angle of the polygonal opening may be a point where the first opening and the second opening are connected to the annular opening. In addition, when the shape of the annular opening 118 is an ellipse, the first direction may preferably be parallel to the major axis of the annular opening 118, but the present invention is not limited thereto. In other embodiments, the first direction may be parallel to a minor axis of the annular opening or not parallel to the major and minor axes of the annular opening.

It should be noted that, compared to disposing the first opening and the second opening on the inner side of the annular opening and recessing the first opening and the second opening into the circular portion 116a, the opaque plate 116 of the embodiment disposes the first opening 120a and the second opening 120b completely outside the outer side 118b of the annular opening 118, so that the angle of the exposure light incident on the photomask 110 after passing through the first opening 120a, the second opening 120b and the annular opening 118 can be increased. Since the numerical aperture of the exposure apparatus 100 is directly proportional to the incident angle of the exposure light incident on the photomask 110 and the numerical aperture is inversely proportional to the critical dimension, increasing the incident angle can effectively reduce the critical dimension.

In addition, the width W1 of the first opening 120a in the first direction D1 of the present embodiment may be greater than the width W2 of the annular opening 118. Similarly, the width W3 of the second opening 120b in the first direction D1 may be greater than the width W2 of the annular opening 118. Therefore, the brightness of the light passing through the first bi-polar opening 120 can be increased relative to the brightness of the light passing through the annular opening 118, so as to increase the brightness of the light with an increased incident angle, thereby more effectively reducing the critical dimension.

The opaque plate of the present invention is not limited to the above-described embodiment. Other embodiments or variations of the present invention will be disclosed, however, in order to simplify the description and to make the difference between the embodiments or variations more obvious, the same reference numerals are used to designate the same elements, and the repeated descriptions are omitted.

Referring to fig. 3, fig. 3 is a schematic top view of an opaque plate according to a second embodiment of the invention. As shown in fig. 3, compared to the first embodiment, the first opening 220a and the second opening 220b of the first bi-polar opening 220 of the opaque plate 216 of the present embodiment are not completely disposed outside the outer side 118b of the annular opening 118, but respectively span a portion of the annular opening 118. That is, the first opening 220a and the second opening 220b each extend from the inner side 118a of the annular opening 118 to be recessed toward the circular portion 116a and extend from the outer side 118b to be protruded toward the peripheral portion 116b, respectively.

Referring to fig. 4, fig. 4 is a schematic top view of an opaque plate according to a third embodiment of the invention. As shown in fig. 4, compared to the second embodiment, the first dual-pole opening 320 of the opaque plate 316 of the present embodiment includes a plurality of first openings 320a and a plurality of second openings 320 b. In the present embodiment, each of the first openings 320a and each of the second openings 320b are still symmetrically disposed about the center point of the annular opening 118, and each of the first openings 320a and each of the second openings 320b respectively span a portion of the annular opening 118, so that each of the first openings 320a and each of the second openings 320b extends from the inner side 118a of the annular opening 118 to be recessed toward the circular portion 116a and extends from the outer side 118b to be protruded toward the peripheral portion 116 b. The invention is not limited thereto. In other embodiments, each of the first openings and each of the second openings may not span the annular opening, but may extend from the outer side of the annular opening only to protrude toward the peripheral portion and be disposed entirely outside the outer side of the annular opening.

Referring to fig. 5, fig. 5 is a schematic top view of an opaque plate according to a fourth embodiment of the invention. As shown in fig. 5, compared to the first embodiment, the opaque plate 416 of the present embodiment further includes a second bi-polar opening 422 including a third opening 422a and a fourth opening 422b in addition to the first bi-polar opening 420 (including the first opening 420a and the second opening 420 b). The first opening 420a, the second opening 420b, the third opening 422a and the fourth opening 422b are respectively connected to the outer side 118b of the annular opening 118, and extend from the outer side 118b of the annular opening 118 to the peripheral portion 116 b. In addition, the first opening 420a and the second opening 420b are symmetrically disposed about the center point of the annular opening 118 and are arranged along the first direction D1, and the third opening 422a and the fourth opening 422b are symmetrically disposed about the center point of the annular opening 118 and are arranged along a second direction D2 different from the first direction D1. In the present embodiment, the included angle between the first direction D1 and the second direction D2 is less than 90 degrees. For example, when the annular opening 118 is elliptical, the arrangement direction of the first openings 420a and the third openings 422a and the arrangement direction of the second openings 420b and the fourth openings 422b may be parallel to the long axis of the annular opening 118, and the arrangement direction of the first openings 420a and the fourth openings 422b and the arrangement direction of the second openings 420b and the third openings 422a may be parallel to the short axis of the annular opening 118. The invention is not limited thereto. . In addition, the shapes of the third opening 422a and the fourth opening 422b may be respectively the same as or different from the first opening 420a and the second opening 420b, and may be rectangular, arcuate, or the like. In the present embodiment, the first opening 420a, the second opening 420b, the third opening 422a and the fourth opening 422b are respectively connected to the outer side 118b of the annular opening 118 at the corners thereof. In addition, the widths W1, W3 of the first opening 420a and the second opening 420b in the first direction D1 may be greater than the width W2 of the annular opening 118, and the widths W4, W5 of the third opening 422a and the fourth opening 422b in the second direction D2 may be greater than the width W2 of the annular opening 118.

Referring to fig. 6, fig. 6 is a schematic top view of an opaque plate according to a fifth embodiment of the invention. As shown in fig. 6, compared to the fourth embodiment, the first opening 520a and the second opening 520b of the first bipolar opening 520 and the third opening 522a and the fourth opening 522b of the second bipolar opening 522 of the opaque plate 516 of the present embodiment respectively span a portion of the annular opening 118. That is, the first opening 520a, the second opening 520b, the third opening 522a, and the fourth opening 522b are each recessed from the inner side 118a of the annular opening 118 toward the central portion 116a and extend from the outer side 118b toward the peripheral portion 116b, respectively. In addition, in the embodiment, the recess toward the central portion 116a or the protrusion toward the peripheral portion 116b is a vertex angle of the opening, but in other embodiments, the recess may be a side of the opening.

Referring to fig. 7, fig. 7 is a schematic top view of an opaque plate according to a sixth embodiment of the invention. As shown in fig. 7, compared to the fourth embodiment, the first direction D1 of the first and second openings 620a and 620b of the first bi-polar opening 620 of the opaque plate 616 of the present embodiment is perpendicular to the second direction D2 of the third and fourth openings 622a and 622b of the second bi-polar opening 622. For example, when the shape of the annular opening 118 is an ellipse, the first direction D1 and the second direction D2 may be parallel to the major axis and the minor axis of the elliptical annular opening 118, respectively, but the invention is not limited thereto. In addition, the first opening 620a, the second opening 620b, the third opening 622a and the fourth opening 622b of the present embodiment are connected to the outer side 118b of the annular opening 118 at the sides. In addition, the widths W1 and W3 of the first opening 420a and the second opening 420b in the first direction D1 may be greater than the width W2 of the annular opening 118, and the widths W4 and W5 of the third opening 422a and the fourth opening 422b in the second direction D2 may be greater than the width W2 of the annular opening 118.

Referring to fig. 8, fig. 8 is a schematic top view of an opaque plate according to a seventh embodiment of the invention. As shown in fig. 8, compared to the sixth embodiment, the first opening 720a and the second opening 720b of the first bipolar opening 720 and the third opening 722a and the fourth opening 722b of the second bipolar opening 722 of the opaque plate 716 of the present embodiment respectively cross over a portion of the annular opening 118. Similarly, in the present embodiment, the recess toward the central portion 116a or the protrusion toward the peripheral portion 116b are both open sides, but in other embodiments, the recess may be a vertex angle of the opening.

Referring to fig. 9, fig. 9 is a schematic top view of an opaque plate according to an eighth embodiment of the invention. As shown in fig. 9, compared to the seventh embodiment, the first bipolar opening 820 of the opaque plate 816 of the present embodiment includes a plurality of first openings 820a and a plurality of second openings 820b, and the second bipolar opening 822 includes a plurality of third openings 822a and a plurality of fourth openings 822 b. In the present embodiment, the first openings 820a and the second openings 820b are still symmetrically disposed about the center point of the annular opening 118, and each of the first openings 820a and each of the second openings 820b respectively span a portion of the annular opening 118, and thus each extends from the inner side 118a of the annular opening 118 to be recessed toward the central portion 116a and extends from the outer side 118b to be protruded toward the peripheral portion 116 b. The third opening 822a and the fourth opening 822b are also disposed symmetrically to the center point of the annular opening 118, and each of the third opening 822a and the fourth opening 822b respectively crosses over a portion of the annular opening 118. The present embodiment is not limited thereto. In other embodiments, each of the first openings, the second openings, the third openings and the fourth openings may not cross the annular opening, and each of the first openings, the second openings, the third openings and the fourth openings may extend from an outer side of the annular opening to form a vertex angle or a side edge.

Referring to fig. 10, fig. 10 is a schematic top view of an opaque plate according to a ninth embodiment of the invention. As shown in fig. 10, compared to the first embodiment, the first opening 920a and the second opening 920b of the first bi-polar opening 920 of the opaque plate 916 of the present embodiment are respectively long, and extend along the second direction D2 and are parallel to each other. Moreover, the first opening 920a and the second opening 920b respectively cross over the inner side 118a and the outer side 118b of two non-adjacent portions of the annular opening 118, so that the first opening 920a and the second opening 920b can divide the circular portion surrounded by the annular opening 118 into two arcuate portions 924a and a long portion 924b which are not connected to each other. In addition, in the embodiment, the second direction D2 extends parallel to the major axis of the elliptical ring opening, but in other embodiments, it may also be parallel to the minor axis of the elliptical ring opening. The invention also provides a method for forming the fin-shaped structure by using the lighting system. For the sake of clarity, the opaque plate of the following embodiments is described by taking the first embodiment as an example, but not limited thereto, and may be the opaque plate of any embodiment. Please refer to fig. 11 to 14. Fig. 11-14 are schematic diagrams illustrating a method for forming a fin structure using an illumination system according to an embodiment of the invention. First, as shown in fig. 11, an exposure apparatus 100 is provided, which includes an illumination system 102, a photomask holder 104, a projection lens 106, and a substrate holder 108. The illumination system 102 may include a light source 114 and an opaque plate 116. The opaque plate 116 of this embodiment is the same as the first embodiment, and therefore, the description thereof is omitted.

Then, the photomask 110, the plurality of annular spacers 124 and the substrate 112 are provided, the photomask 110 is disposed between the illumination system 102 and the substrate 112, and the annular spacers 124 are disposed on the substrate 112, so that the exposure light generated by the illumination system 102 can be irradiated to the annular spacers 124 on the substrate 112 through the photomask 110. Also, the photo mask 110 may be used to define a position P1 of the first cut opening 128, which includes a plurality of first stripe-shaped openings 110a respectively extending along the second direction D2. For example, the ring spacers 124 may be formed by a Sidewall Image Transfer (SIT) process or a multiple SIT process to have a width less than the critical dimension that can be formed by an exposure tool.

Next, the opaque plate 116 of the illumination system 102 is disposed between the light source 114 and the photomask 110, and the first direction D1 is perpendicular to the second direction D2. Subsequently, a first mask layer 126 is formed on the annular spacer 124. The first mask layer 126 may include a photoresist material.

Then, a first exposure process is performed by using the opaque plate 116 and the photo mask 110 to define a plurality of positions P1 of the first cut openings 128 in the first mask layer 126. In this step, the first mask layer 126 includes a negative photoresist material, so that the first mask layer 126 corresponding to the first stripe-shaped opening 110a of the photomask 110 is irradiated by light, so that the irradiated first mask layer 126 defines the position of the first cut opening 128.

As shown in fig. 12, after defining the position P1 of the first cut opening 128, another photo mask 130 is provided for defining the position P2 of the second cut opening 138, and the photo mask 130 may include a plurality of second stripe-shaped openings 130 a. Also, the illumination system 102 may include another opaque plate 132 including another annular opening 134 and a second dipole opening 136. The annular opening 134 has an inner side 134a and an outer side 134 b. The second dual-pole opening 136 includes a third opening 136a and a fourth opening 136b, wherein the third opening 136a and the fourth opening 136b are respectively connected to the annular opening 134 and respectively extend from the outer side 134b of the annular opening 134, and the third opening 136a and the fourth opening 136b are symmetrically disposed about the center point of the annular opening 134 and are arranged along the second direction D2. The widths W4, W5 of the third opening 136a and the fourth opening 136b in the second direction D2 of the present embodiment may be greater than the width W2 of the annular opening 134.

Then, opaque plate 116 is replaced with opaque plate 132 and photomask 110 is replaced with photomask 130. That is, the photomask 130 is disposed between the illumination system 102 and the substrate 112, the opaque plate 132 of the illumination system 102 is disposed between the light source 114 and the photomask 130, and the extending direction of each of the second stripe-shaped openings 130a is disposed along the first direction D1. Next, a second exposure process is performed by using the opaque plate 132 and the photo mask 130 to further define a plurality of positions P2 of the second cut openings 138 in the first mask layer 128. The second stripe-shaped opening 130a of the photomask 130 corresponds to the position P2 of the first cut opening 138.

As shown in fig. 13, after defining the position P1 of the first cut-out 128 and the position P2 of the second cut-out 138, a developing process is performed to form the first cut-out 128 and the second cut-out 138, such that the first cut-out 128 exposes the first portions 124a of the annular spacers 124, respectively, and the second cut-out 138 exposes the second portions 124b of the annular spacers 124, respectively. The first slit opening 128 and the second slit opening 138 are defined by the first bar-shaped opening 110a and the second bar-shaped opening 130a, respectively, and are therefore also bar-shaped.

As shown in fig. 14, an etching process is performed to remove the exposed first portion 124a and the exposed second portion 124b of the annular spacer 124 by using the first mask layer 126 as a mask, thereby forming the fin structure 140. The first masking layer 126 may then be further removed. It should be noted that, in the embodiment, when the first exposure process is performed, the first direction D1 in which the first openings 120a and the second openings 120b are arranged is perpendicular to the second direction D2 in which the first stripe-shaped openings 110a extend, so that the position P1 of the first cut opening 128 can be precisely defined. In other words, when the first cut opening 128 extending along the second direction D2 is to be formed, the arrangement direction of the first opening 120a and the second opening 120b of the opaque plate 116, i.e., the first direction D1, is preferably perpendicular to the direction in which the first stripe-shaped opening 110a (or pattern) on the photomask 110 extends, i.e., the second direction D2. Similarly, in the second exposure process, the second direction D2 along which the third openings 136a and the fourth openings 136b are arranged is perpendicular to the first direction D1 along which each of the second stripe-shaped openings 130a extends, so that the position P2 of the second cut opening 138 can be precisely defined. Therefore, when the second cut opening 138 extending along the first direction D1 is to be formed, the arrangement direction of the third opening 136a and the fourth opening 136b of the opaque plate 132, i.e., the second direction D2, is preferably perpendicular to the extending direction of the second stripe-shaped opening 130a (or pattern) on the photomask 130, i.e., the first direction D1.

As can be seen from the above, the ring-shaped spacer 124 of the present embodiment is formed by removing the unnecessary portions through the two-exposure process and the one-development process to form the fin-shaped structure 140, so that the cutting openings for cutting the ring-shaped spacer 124 are first disassembled into the first cutting openings 128 extending along the second direction D2 and the second cutting openings 138 extending along the first direction D1. Therefore, two photomasks 110 and 130 are provided to define the first cutting opening 128 and the second cutting opening 138, respectively. In other embodiments, the annular spacer may also be formed by a double exposure process and a double development process to remove unwanted portions. For example: the first exposure process may be followed by a development process to form a first cut opening, and the first mask layer may be used as a mask to remove a first portion of the exposed annular spacer. Then, the first mask layer is removed, and a second mask layer is formed on the annular gap object. Then, a second exposure process and a second development process are performed by using the opaque plate 132 and the photo mask 130 to form a plurality of second cut openings in the second mask layer and expose a second portion of the annular spacer. Then, the second part of the exposed annular gap object is removed by taking the second mask layer as a mask to form the fin-shaped structure.

In addition, in other embodiments, the opaque plate may also apply the fourth to eighth embodiments, so that the opaque plate has a first opening and a second opening arranged in the first direction and a third opening and a fourth opening arranged in the second direction. Therefore, the first and second cut openings can be formed in the first mask layer in a precisely defined manner in the same exposure process with the photomask integrated with the first and second stripe openings. Therefore, the annular spacer can remove the unnecessary part only by one exposure process and one development process. In addition, when the annular openings are elliptical, the first openings and the second openings are arranged in a direction parallel to the major axis, and the third openings and the fourth openings are arranged in a direction parallel to the minor axis, the photomask preferably has a greater number or a denser arrangement of first stripe-shaped openings extending along the direction perpendicular to the major axis, and a lesser number or a sparser arrangement of second stripe-shaped openings extending along the minor axis.

In summary, the opaque plate of the present invention has the dipole opening at least disposed at the outer side of the annular opening, so that the angle of the exposure light incident on the photomask after passing through the dipole opening and the annular opening can be increased, thereby effectively reducing the critical dimension.

The above description is only a preferred embodiment of the present invention, and all equivalent changes and modifications made in the claims of the present invention should be covered by the present invention.