阅读说明：本技术 识别用于制造凸版结构的凸版前体的方法 (Method of identifying a relief precursor for making a relief structure ) 是由 M·穆菲 T·比克特 R·莱尼克 A·纳普 于 2018-12-07 设计创作，主要内容包括：一种识别包含载体和凸纹形成层的凸版前体的方法,其具有步骤：a)提供包含载体和凸纹形成层的凸版前体；b)以至少一个二维码的形式提供识别凸版前体的类型和如果适当含有用于其加工的工艺相关数据的数据；c)将所述至少一个二维码作为凸纹引入凸纹形成层。(A method of identifying a relief precursor comprising a support and a relief-forming layer, having the steps of: a) providing a relief precursor comprising a support and a relief-forming layer; b) providing data identifying the type of relief precursor and, if appropriate, process-related data for its processing, in the form of at least one two-dimensional code; c) introducing the at least one two-dimensional code as a relief into a relief-forming layer.)

1. A method of identifying a relief precursor or relief comprising a support and a relief-forming layer, having the steps of:

a) providing a relief precursor comprising a support and a relief-forming layer;

b) providing data identifying the type of relief precursor or relief and containing process related data for its processing in the form of at least one two-dimensional code;

c) introducing the at least one two-dimensional code as a relief into a relief-forming layer.

2. A method as claimed in claim 1, characterized in that the relief-forming layer is an engravable layer and in step c) the two-dimensional code is introduced as a relief in the relief-forming layer by means of a material removal process.

3. A method as claimed in claim 1, characterized in that the relief-forming layer is a photosensitive layer and in step c) the two-dimensional code is introduced into the relief-forming layer by means of direct image exposure and subsequent removal of the exposed or unexposed areas of the relief-forming layer.

4. The method according to claim 1, wherein the relief-forming layer is a photopolymerizable layer onto which an imageable mask layer is applied, and step c) comprises the steps of:

ca) imaging the imageable mask layer, writing the two-dimensional code into the mask layer,

cb) exposing the photopolymerizable relief-forming layer through the formed mask with electromagnetic radiation;

cc) removing the remaining portions of the imageable mask and the unexposed, non-photopolymerizable portions of the photopolymerizable relief-forming layer.

5. The method as claimed in one of claims 1 to 4, characterized in that the at least one two-dimensional code is a bar code, a data matrix code, a QR code or a point code.

6. Method as claimed in one of the claims 1 to 5, characterized in that two or more different codes for different process steps are introduced.

7. A method of producing a relief from a relief precursor comprising at least one support, a relief-forming layer and a mask layer, having the method steps:

(A) providing a relief precursor;

(B) providing data identifying the type of relief precursor and/or containing process parameters for its processing;

(C) imaging the mask layer, thereby forming a mask;

(D) exposing the imaged relief precursor through the formed mask with electromagnetic radiation;

(E) removing the remaining portions of the imageable mask layer and the exposed or unexposed regions of the relief-forming layer;

(F) optionally reprocessing the resulting relief;

(G) optionally, between steps (B) and (C), (C) and (D) or (D) and (E), exposing the relief precursor or the back side of the relief with electromagnetic radiation;

characterized in that in step (C) data identifying the type of relief precursor and/or containing process parameters for its processing is written to the mask layer in the form of a two-dimensional code, and after step (C) the data contained in said code is read to control one or more of steps (D), (E), (F) and (G).

8. The method of claim 7 wherein the data contained in the code controls one or more of steps (D), (E), (F) and (G) in terms of one or more of the following process parameters:

(i) the intensity and/or duration of the exposure in step (D);

(ii) the wavelength in step (D);

(iii) the development temperature and/or development time in step (E);

(iv) the temperature and/or treatment time in step (F);

(v) intensity and/or exposure time in step (G);

(vi) the wavelength of the electromagnetic radiation in step (G);

(vii) the speed of transport of the relief precursor or relief as it passes through one or more of method steps (D) to (G).

9. A method of making a relief from a relief precursor comprising at least one carrier and a photosensitive relief forming layer, having the method steps of:

(A) providing a relief precursor;

(B) providing data identifying the type of relief precursor and/or containing process parameters for its processing;

(C) directly exposing the relief precursor according to the image;

(D) removing the exposed or unexposed areas of the relief-forming layer;

(E) optionally reprocessing the resulting relief;

(F) optionally, optionally between steps (B) and (C) or (C) and (D), exposing the relief precursor or the back side of the relief with electromagnetic radiation;

characterized in that in step (C) data identifying the type of relief precursor and/or specifying the process parameters for its processing are written in the form of a two-dimensional code into the relief-forming layer by direct exposure, and in that after step (C) the data contained in said code are read to control one or more of steps (D), (E) and (F).

10. The method of claim 9 wherein the data contained in the code controls one or more of steps (D), (E) and (F) with respect to one or more of the following process parameters:

(i) the development temperature and/or development duration in step (D);

(ii) the temperature and/or development time in step (E);

(iii) intensity and/or exposure time in step (F);

(iv) the wavelength of the electromagnetic radiation in step (F);

(v) the speed of transport of the relief precursor or relief as it passes through one or more of method steps (D) to (F).

11. A method of making a relief from a relief precursor comprising at least one support and an engravable relief-forming layer, having the method steps of:

(A) providing a relief precursor;

(B) providing data identifying the type of relief precursor and/or containing process parameters for its processing;

(C) optionally exposing or heat treating the entire area of the relief precursor;

(D) writing a three-dimensional relief into the relief-forming layer by a material removal process;

(E) optionally removing residues from the surface of the relief;

(F) optionally reprocessing the resulting relief;

(G) optionally re-exposing the resulting relief with electromagnetic radiation;

characterized in that in step (D) data identifying the type of relief precursor and/or containing the process parameters for its processing are written in the form of a two-dimensional code into the relief-forming layer by laser engraving, and in that after step (D) the data contained in said code are read to control one or more of steps (E), (F) and (G).

12. The method as set forth in claim 11, wherein the data contained in the code controls one or more of steps (E), (F) and (G) in terms of one or more of the following process parameters:

(i) the duration and/or temperature in step (E);

(ii) positive or negative pressure in step (E);

(iii) the temperature and/or duration of step (F);

(iv) intensity and/or exposure time in step (G);

(v) the wavelength of the electromagnetic radiation in step (G);

(vi) the speed of transport of the relief as it passes through one or more of method steps (E) to (G).

13. A method as claimed in claims 1 to 12, characterized in that the data contained in the code is read contactlessly.

14. A method as claimed in claims 1 to 13, characterized in that the data contained in the code identifies the type of relief precursor and reads the relevant process parameters from a database.

15. A relief structure having a code made by the method as claimed in any one of claims 1 to 14.

16. Use of the relief structure as claimed in claim 15 as a gravure printing plate, a transfer plate, a flexographic printing plate, a book printing plate, a microfluidic component, as a microreactor, as a battery for interatomic electrostatic conductivity, as a light control element for color displays, as a photonic crystal or as a flexible part of clothing.

Example (b):

in an embodiment, the information transfer is performed by means of the control software CX Server-lite version 2.2 from OMRON E L ECTRONICS GmbH for which the code is detected by means of SR-G100 Scanner (Keyence, settings), converted into a CSV file (Excel) and transferred to the P L C controller of the device via the 2.2 interface.