阅读说明：本技术 气体供应单元及包括其的衬底处理设备 (Gas supply unit and substrate processing apparatus including the same ) 是由 金材玹 金大渊 李政镐 张显秀 全然孮 于 2021-04-07 设计创作，主要内容包括：一种能够防止功率耗散且实现高过程再现性的衬底处理设备包括分隔件和在分隔件下方的处理单元,其中处理单元包括导电本体和与导电本体一体地形成的至少一个导电突起。(A substrate processing apparatus capable of preventing power dissipation and achieving high process reproducibility includes a partition and a processing unit under the partition, wherein the processing unit includes a conductive body and at least one conductive protrusion integrally formed with the conductive body.)

1. A substrate processing apparatus, comprising:

a separator; and

a processing unit under the partition member, wherein,

wherein the processing unit comprises:

a conductive body; and

at least one conductive protrusion integrally formed with the conductive body.

2. The substrate processing apparatus of claim 1, further comprising a conductive joint between the conductive body and the conductive protrusion,

wherein the conductive body, the conductive protrusion, and the conductive contact are integrally formed.

3. The substrate processing apparatus of claim 2, wherein the conductive joint has a curvature.

4. The substrate processing apparatus of claim 2, wherein the conductive joint has a concave shape.

5. The substrate processing apparatus of claim 1, further comprising a solder joint between the conductive body and the conductive protrusion.

6. The substrate processing apparatus of claim 5, wherein the weld joint comprises a fillet weld.

7. The substrate processing apparatus of claim 6, wherein the fillet weld has a concave shape.

8. The substrate processing apparatus of claim 5,

wherein at least one of the conductive body, the conductive protrusion and the solder joint further comprises a heat affected portion, and

the heat affected portion has characteristics different from characteristics of the conductive body, the conductive protrusion, and the solder joint.

9. The substrate processing apparatus of claim 1, wherein the conductive body comprises:

a plurality of first coupling holes formed along a first circumference separated from a center of the conductive body and having a first radius; and

a plurality of second coupling holes formed along a second circumference separated from a center of the conductive body and having a second radius greater than the first radius.

10. The substrate processing apparatus according to claim 9, wherein said conductive body and said conductive protrusion are fixed to said partition by a first coupling unit arranged in said first coupling hole, and

the conductive body and the conductive protrusion are further fixed to the partition by a second coupling unit disposed in the second coupling hole.

11. The substrate processing apparatus of claim 9, wherein the at least one conductive protrusion is on the second circumference.

12. The substrate processing apparatus as claimed in claim 1, wherein the conductive body includes a first surface in which a plurality of injection holes are formed and a second surface opposite to the first surface, and

the conductive protrusion protrudes from the second surface.

13. The substrate processing apparatus of claim 12, wherein the conductive protrusion comprises an end portion extending from the second surface to pass through the partition.

14. The substrate processing apparatus as claimed in claim 13, wherein the substrate processing apparatus further comprises a power supply portion, and

the end portion of the conductive protrusion is electrically connected to the power supply portion.

15. The substrate processing apparatus of claim 1, further comprising:

a heating unit arranged to contact the separator;

a first thermocouple configured to measure a temperature of a first portion of the heating unit; and

a second thermocouple configured to measure a temperature of a second portion of the heating unit.

16. The substrate processing apparatus of claim 15, wherein the first thermocouple and the second thermocouple are symmetrically arranged with respect to a center of the heating unit.

17. A gas supply unit comprising:

a conductive body;

a conductive protrusion protruding from the conductive body; and

a fillet between the conductive body and the conductive protrusion.

18. The gas supply unit of claim 17, wherein the conductive body, the conductive protrusion, and the recessed fillet are integrally formed with one another by metal milling.

19. The gas supply unit of claim 17, wherein the conductive body, the conductive protrusion, and the fillet are integrally formed with one another by metal bonding.

20. A substrate processing apparatus, comprising:

a separator;

a heating unit in contact with the separator;

a plurality of thermocouples configured to measure a temperature of the heating unit;

a processing unit having a conductive body and at least one conductive protrusion integrally formed with the conductive body;

a plurality of first coupling units configured to fix the processing unit to the partition; and

a plurality of second coupling units configured to fix the processing unit to the partition,

wherein the first coupling units are arranged along a first circumference and the second coupling units are arranged along a second circumference having a larger diameter than the diameter of the first circumference, and

the fixing force of the processing unit to the partition, which is generated by the first coupling units arranged along the first circumference, is increased by the second coupling units arranged along the second circumference.

Technical Field

One or more embodiments relate to a gas supply unit and a substrate processing apparatus including the same, and more particularly, to a gas supply unit for processing a substrate and a substrate processing apparatus including the same.

Background

When a substrate is processed at a high temperature in a semiconductor or display manufacturing apparatus, the process may need to be performed in a high-temperature atmosphere. In this case, deformation of the reactor may occur due to the high-temperature atmosphere. Due to the deformation of the reactor, power loss (especially RF power in plasma processing) and the like may occur, and process reproducibility may deteriorate.

The problem of reactor deformation in a high temperature atmosphere is also mentioned in Korean patent laid-open No. 10-2011-0058534. In more detail, it is mentioned below that as the size of the substrate increases, the gas injection plate is manufactured in a large size, and the thickness uniformity of the deposited thin film is deteriorated due to the increase of thermal deformation.

Disclosure of Invention

One or more embodiments include a gas supply unit and a substrate processing apparatus including the same, which can prevent reactor deformation and resultant power loss and process reproducibility degradation in a high temperature process as described above.

Additional aspects will be set forth in part in the description which follows and, in part, will be obvious from the description, or may be learned by practice of the presented embodiments of the disclosure.

According to one or more embodiments, a substrate processing apparatus includes a partition and a processing unit under the partition, wherein the processing unit includes a conductive body and at least one conductive protrusion integrally formed with the conductive body.

According to an example of the substrate processing apparatus, the substrate processing apparatus may further include a metal conductive joint between the conductive body and the conductive protrusion, wherein the conductive body, the conductive protrusion, and the metal conductive joint may be integrally formed with each other.

According to another example of the substrate processing apparatus, the metal conductive contact may have a curvature.

According to another example of the substrate processing apparatus, the metal conductive joint may have a concave shape.

According to another example of the substrate processing apparatus, the substrate processing apparatus may further include a solder joint between the conductive body and the conductive protrusion.

According to another example of the substrate processing apparatus, the weld joint may comprise a fillet weld.

According to another example of the substrate processing apparatus, the fillet weld may have a concave shape.

According to another example of the substrate processing apparatus, at least one of the conductive body, the conductive protrusion, and the solder joint may further include a heat affected portion, and the heat affected portion may have different characteristics from the conductive body, the conductive protrusion, and the solder joint.

According to another example of the substrate processing apparatus, the conductive body may include: a plurality of first coupling holes formed along a first circumference separated from a center of the conductive body and having a first radius; and a plurality of second coupling holes formed along a second circumference separated from the center of the conductive body and having a second radius greater than the first radius.

According to another example of the substrate processing apparatus, the conductive body and the conductive protrusion may be fixed to the partition by a first coupling unit disposed in the first coupling hole, and the conductive body and the conductive protrusion may be further fixed to the partition by a second coupling unit disposed in the second coupling hole.

According to another example of the substrate processing apparatus, the at least one conductive protrusion may be on the second circumference.

According to another example of the substrate processing apparatus, the conductive body may include a first surface in which the plurality of injection holes are formed and a second surface opposite to the first surface, and the conductive protrusion may protrude from the second surface.

According to another example of the substrate processing apparatus, the conductive protrusion may include an end portion extending from the second surface to pass through the partition.

According to another example of the substrate processing apparatus, the substrate processing apparatus may further include a power supply portion, and the end portion of the conductive protrusion may be electrically connected to the power supply portion.

According to another example of the substrate processing apparatus, the substrate processing apparatus may further include a heating unit arranged to contact the partition, a first thermocouple configured to measure a temperature of a first portion of the heating unit, and a second thermocouple configured to measure a temperature of a second portion of the heating unit.

According to another example of the substrate processing apparatus, the first thermocouple and the second thermocouple may be symmetrically arranged with respect to a center of the heating unit.

According to one or more embodiments, the gas supply unit may include a conductive body, a conductive protrusion protruding from the conductive body, and a fillet between the conductive body and the conductive protrusion.

According to an example of the gas supply unit, the conductive body, the conductive protrusion, and the concave fillet may be integrally formed with each other by metal milling.

According to another example of the gas supply unit, the conductive body, the conductive protrusion, and the concave fillet may be integrally formed with each other by metal bonding.

According to one or more embodiments, a substrate processing apparatus may include a partition, a heating unit in contact with the partition, a plurality of thermocouples configured to measure a temperature of the heating unit, a processing unit having a conductive body and at least one conductive protrusion integrally formed with the conductive body, a plurality of first coupling units configured to fix the processing unit to the partition, and a plurality of second coupling units configured to fix the processing unit to the partition, wherein the first coupling units are arranged along a first circumference, and the second coupling units are arranged along a second circumference having a diameter greater than that of the first circumference, and a fixing force of the processing unit to the partition, which is generated by the first coupling units arranged along the first circumference, may be increased by the second coupling units arranged along the second circumference.

Drawings

These and other aspects, features and advantages of certain embodiments of the present disclosure will become apparent and more readily appreciated from the following description of the embodiments, taken in conjunction with the accompanying drawings of which:

fig. 1 is a cross-sectional view of a substrate processing apparatus according to an embodiment of the inventive concept;

fig. 2 is a view of the flow of reaction gases (and residual gases) in a substrate processing apparatus according to an embodiment of the inventive concept;

FIG. 3 is a cross-sectional view of a substrate processing apparatus according to an embodiment of the inventive concept as seen from another section;

fig. 4 is a view of a processing unit included in a substrate processing apparatus according to an embodiment of the concept of the present invention;

FIG. 5 is a cross-sectional view of the processing unit of FIG. 4 taken along line X-X';

fig. 6 is a partial view of a processing unit included in a substrate processing apparatus according to an embodiment of the concept of the present invention;

fig. 7 is a view illustrating an example in which an air curtain as a conductive body of a processing unit and an RF rod as a conductive protrusion are not integrated with each other and are mechanically coupled as separate components according to an embodiment of the present inventive concept;

fig. 8 is a view illustrating a deformation of an air curtain at a high temperature of 300 c or more according to an embodiment of the present inventive concept;

fig. 9 is a view illustrating a state in which a sealing device such as an O-ring corrodes due to deformation of a process unit according to an embodiment of the inventive concept;

fig. 10A and 10B are views of a substrate processing apparatus according to an embodiment of the concept of the present invention;

fig. 11 is a view of a deformation degree and a process result of a reactor operating at a high temperature in a substrate processing apparatus according to an embodiment of the inventive concept;

fig. 12 is a view of a process result obtained by using a process apparatus employing a separate and inserted RF rod and a process apparatus in which an RF rod and an air curtain according to the present disclosure are integrated, according to an embodiment of the present inventive concept;

fig. 13 is a view of a wall heater and a Thermocouple (TC) measuring temperature on a partition according to an embodiment of the concept of the present invention;

fig. 14 is a view illustrating a process result when a dual thermocouple is applied according to an embodiment of the present inventive concept; and

fig. 15 is a view of a substrate processing apparatus according to an embodiment of the inventive concept.

Detailed Description

Reference will now be made in detail to embodiments, examples of which are illustrated in the accompanying drawings, wherein like reference numerals refer to the like elements throughout. In this regard, embodiments of the invention may take different forms and should not be construed as limited to the description set forth herein. Accordingly, aspects of the present specification are set forth below by describing the embodiments only with reference to the drawings. As used herein, the term "and/or" includes any and all combinations of one or more of the associated listed items. Before an element, an expression as "at least one of" modifies the entire list of elements and does not modify an individual element of the list.

The terminology used herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the disclosure. As used herein, the singular forms "a", "an" and "the" are intended to include the plural forms as well, unless the context clearly indicates otherwise. It will be further understood that the terms "comprises", "comprising", "includes" and/or "including", when used in this specification, specify the presence of stated features, integers, steps, operations, elements, components, and/or groups thereof, but do not preclude the presence or addition of one or more other features, integers, steps, operations, elements, components, and/or groups thereof. As used herein, the term "and/or" includes any and all combinations of one or more of the associated listed items.

It will be understood that, although the terms "first," "second," etc. may be used herein to describe various elements, components, regions, layers and/or sections, these elements, components, regions, layers and/or sections should not be limited by these terms. These terms are not intended to imply any order, quantity, or importance, but are merely used to distinguish one element, region, layer, and/or section from another element, region, layer, and/or section. Thus, a first member, component, region, layer or section discussed below could be termed a second member, component, region, layer or section without departing from the teachings of the embodiments.

Embodiments of the present disclosure will be described below with reference to the accompanying drawings, which schematically illustrate embodiments of the disclosure. In the drawings, variations from the shapes of the illustrations as a result, for example, of manufacturing techniques and/or tolerances, are to be expected. Accordingly, embodiments of the present disclosure should not be construed as limited to the particular shapes of regions illustrated herein but are to include deviations in shapes that result, for example, from manufacturing processes.

Referring first to fig. 1, a substrate processing apparatus according to an embodiment of the inventive concept will be described. Fig. 1 illustrates a cross-sectional view of a substrate processing apparatus 100 according to an embodiment of the inventive concept.

Referring to fig. 1, in a substrate processing apparatus 100, a spacer 101 may contact a substrate supporting plate 103. In more detail, when the lower surface of the separator 101 contacts the substrate supporting plate 103 serving as a lower electrode, a reaction space may be formed.

In other words, the substrate support plate 103 may be configured to be face-sealed with the partition 101, and the reaction space 125 may be formed between the partition 101 and the substrate support plate 103 by the face-sealing. In addition, the gas exhaust path 117 may be formed between the gas flow control unit 105 and the partition and between the conductive body 323 (fig. 3) of the process unit 109 and the partition 101 by surface sealing.

The gas flow control unit 105 and the processing unit 109 may be disposed between the partition 101 and the substrate support plate 103. The airflow control unit 105 and the processing unit 109 may be integrally formed or may be separately configured. In a separate structure, the gas flow control unit 105 may be stacked over the conductive body 323 of the process unit 109. Alternatively, the conductive body 323 of the process unit 109 (of fig. 3) may also be a separate type, in which case the process unit 109 may include a gas injection part having a plurality of through-holes and a gas channel stacked above the gas injection part (see fig. 3 and 4).

The airflow control unit 105 may include a plate and a sidewall 123 protruding from the plate. A plurality of holes 111 penetrating the sidewall 123 may be formed in the sidewall 123.

Grooves 127, 129, and 131 for receiving sealing members such as O-rings may be formed between the partition 101 and the air flow control unit 105 and between the air flow control unit 105 and the process unit 109. By the sealing member, external gas can be prevented from entering the reaction space 125. In addition, the reaction gas in the reaction space 125 may exit along a designated path (i.e., the gas exhaust path 117 and the gas outlet 115, see fig. 2) by the sealing member. Therefore, the reaction gas can be prevented from flowing out into the region other than the specified path.

The processing unit 109 may be used as an electrode in a plasma process, such as a Capacitively Coupled Plasma (CCP) method. In this case, the processing unit 109 may include a metal material, such as aluminum (Al). In the CCP method, the substrate support plate 103 may also serve as an electrode, and thus, capacitive coupling may be achieved by the processing unit 109 serving as a first electrode and the substrate support plate 103 serving as a second electrode.

In more detail, a power supply part such as an external plasma generator (not shown) may be electrically connected to the conductive protrusion 313 (of fig. 3), and thus, power (e.g., RF power) generated by the power supply part may be transmitted to the processing unit 109 by the conductive protrusion 313 serving as an RF rod. The conductive protrusion 313 may extend from the conductive body 323 of the processing unit 109 to the outside of the heating unit 7 (of fig. 10A). Further, the conductive protrusion 313 may be formed to be integrated with the processing unit 109. Thus, there will be no mechanical coupling through a separate member between the conductive protrusion 313 and the conductive body 323 of the processing unit 109. As a result, the conductive protrusion 313 may extend from the conductive body 323 to the outside of the heating unit through the RF rod hole 303 (of fig. 3) passing through the gas flow control unit 105 and the upper portion of the partition 101.

Optionally, the processing unit 109 is formed of a conductor, and the gas flow control unit 105 includes an insulating material such as ceramic, so that the gas supply unit 109 serving as a plasma electrode can be insulated from the separator 101.

As shown in fig. 1, the gas inlet 113 may be formed on the partition 101 to penetrate the partition 101 and penetrate the center of the gas flow control unit 105. In addition, a gas flow path 119 is further formed in the process unit 109, and thus, the reaction gas supplied from an external gas supply part (not shown) through the gas inlet 113 may be uniformly supplied to each of the gas injection holes 133 of the process unit 109.

In addition, as shown in fig. 1, the gas outlet 115 is disposed at an upper end of the partition 101 and is asymmetrically disposed with respect to the gas inlet 113. Although not shown in the drawings, the gas outlet 115 may be symmetrically disposed with respect to the gas inlet 113. In addition, the sidewalls of the partition 101 and the gas flow control unit 105 (and the sidewalls of the process unit 109) are separated from each other, and thus a gas exhaust path 117 through which the residual gas of the reaction gas is exhausted may be formed after the process is performed.

Fig. 2 is a view illustrating the flows of the reaction gases (and the residual gases) in the substrate processing apparatus 100 according to the present disclosure. The arrows show the direction of gas flow, and the reaction gas supplied from an external gas supply part (not shown) to the gas inlet 113 may be uniformly supplied to the gas injection holes 133 formed inside the process unit 109 through the gas flow path 119.

A chemical reaction of the reaction gas is performed in the reaction space 125 or on the substrate 110 to form a thin film on the substrate 110. After the thin film is formed, the residual gas flows into the inner space of the gas flow control unit 105 through the through-holes 111 formed in the sidewall 123 of the gas flow control unit 105 via the gas exhaust path 117 formed between the partition 101 and the sidewall of the process unit 109, and then is discharged to the outside through the gas outlet 115.

Fig. 3 is a cross-sectional view of the substrate processing apparatus 100 according to the present disclosure, as seen from another section. Referring to fig. 3, the gas flow control unit 105 includes a sidewall 123, a gas inlet 113, a plate 301 surrounded by the sidewall 123, an RF rod hole 303, a first coupling hole 305, a second coupling hole (not shown), a through hole 111, and a groove 127 for receiving a sealing member such as an O-ring. The plate 301 may be surrounded by the protruding sidewalls 123 and may have a concave shape.

The RF rod aperture 303 may be provided on a portion (e.g., an edge portion) of the airflow control unit 105. The conductive protrusion 313 extending from the conductive body 323 of the processing unit 109 may be connected to an external plasma supply part (not shown) through the RF rod hole 303.

The processing unit 109 below the gas flow control unit 105 may act as an electrode during the plasma process of the CCP method. In this case, the gas supplied through the gas passage 323a (fig. 4) and the gas injection unit 323b (fig. 4) of the process unit 109 is activated by the process unit 109 serving as an electrode and injected onto the substrate on the substrate supporting plate 103. The processing unit 109 may include a conductive protrusion 313 and a conductive body 323 integrated with the conductive protrusion 313.

In another portion (e.g., a central portion) of the gas flow control unit 105, a gas inlet 113 is disposed, which is a path for introducing external reactor gas. At least two first coupling holes 305 may be provided around the gas inlet 113. In an embodiment, the first coupling holes 305 may be arranged along a first circumference separated from the center of the processing unit 109 to have a first radius (see fig. 4).

A first coupling unit (e.g., a screw) configured to connect the gas flow control unit 105 of the processing unit 109 to the conductive body 323 may penetrate the first coupling hole 305. Accordingly, the conductive body 323 of the process unit 109 and the conductive protrusion 313 integrally formed with the conductive body 323 may be fixed to the partition 101 by the first coupling unit disposed in the first coupling hole 305.

Although not shown in fig. 3, at least two second coupling holes may be provided outside the first coupling holes 305. That is, the second coupling holes may be arranged along a second circumference separated from the center of the processing unit 109 to have a second radius (see C2 in fig. 4) greater than the first radius. Since the shape of the second coupling holes is shown more specifically in fig. 4 and 5, these holes will be used for description later.

In some embodiments, the heating unit 7 (of fig. 10A) arranged to contact the partition may include a plurality of thermocouples. For example, a first thermocouple configured to measure a temperature of a first portion of the heating unit and a second thermocouple configured to measure a temperature of a second portion of the heating unit may be on the heating unit. The first thermocouple and the second thermocouple may be symmetrically arranged with respect to a center of the heating unit.

Fig. 4 is a view of a processing unit included in a substrate processing apparatus according to an embodiment of the inventive concept. Fig. 5 is a cross-sectional view of the processing unit taken along line X-X' in fig. 4. The process unit (e.g., gas supply unit) of fig. 4 and 5 may be a process unit of the substrate processing apparatus according to the above-described embodiment. Hereinafter, a repetitive description of the embodiments will not be given herein.

Referring to fig. 4 and 5, the processing unit 109 may be configured to perform appropriate functions in accordance with the functions of the substrate processing apparatus. In an example, the processing unit 109 may perform an electrode function for applying plasma power. In another example, the processing unit 109 may perform a gas supply function configured to supply gas. In another example, the processing unit 109 may be configured to perform both a power supply function and a gas supply function.

Hereinafter, it is assumed that the processing unit 109 is a gas supply unit configured to perform a power supply function and a gas supply function.

The substrate processing apparatus may be a deposition (etching) apparatus for performing a deposition (etching) function, and may use plasma to promote the reaction. In this case, the gas supply unit may be formed of a conductive member to serve as an electrode to apply plasma thereto. For example, the gas supply unit may include a conductive body 323 and a conductive protrusion 313 protruding from the conductive body 323. Further, the gas supply unit may comprise a plurality of gas inlets for gas supply. The gas for deposition (etching) may be supplied through a plurality of gas inlets of the gas supply unit.

The gas supply unit may include a conductive body 323 and a conductive protrusion 313. The conductive body 323 may include a gas injection part 323b having a plurality of gas injection holes 133 and a gas channel 323a stacked on the gas injection part 323 b. The gas injection unit 323b and the gas channel 323a may be integrated and implemented as a single body, or may be implemented as separate parts. Fig. 5 illustrates a case where the gas passage 323a and the gas injection unit 323b are separately implemented, wherein the gas passage 323a and the gas injection unit 323b may be coupled to each other by a coupling 550 such as a screw.

The conductive protrusion 313 may extend to protrude from the conductive body 323. In an embodiment, the conductive protrusion 313 may be integrally formed with the conductive body 323. For example, the conductive body 323 and the conductive protrusion 313 may be integrally manufactured through a welding process (e.g., welding, brazing, and soldering and/or a metal milling process). There will be no separate interface between the conductive body 323 and the conductive protrusion 313 because they are integrally manufactured in this manner.

A metal conductive joint 333 may be formed between the conductive body 323 and the conductive protrusion 313. The metallic conductive joints 333 may be formed as a result of the welding process and/or the milling process described above. Accordingly, the conductive body 323, the conductive protrusion 313, and the metal conductive joint 333 may be integrally formed with each other.

In an embodiment, the metal conductive joint 333 may be formed to have a certain curvature. For example, as shown in fig. 3 and 5, the metal conductive joint 333 may be formed to have a concave shape. In more detail, an upper surface of the metal conductive joint 333 (a surface connecting the conductive body 323 and the conductive protrusion 313) may be concave. The concave surface may have a curvature. In another example, the metal conductive joint 333 may be formed to have a convex shape, and the convex shape may have a curvature.

In some embodiments, the metallic conductive joint 333 may be implemented as a soldered joint between the conductive body 323 and the conductive protrusion 313. That is, the metal conductive joint 333 is disposed between the conductive body 323 and the conductive protrusion 313, and a soldering process is performed so that the conductive body 323 and the conductive protrusion 313 may be integrated with each other. In another embodiment, the metallic conductive joint 333 may be implemented as a milled joint between the conductive body 323 and the conductive protrusion 313. The milled joint may be formed by performing a metal milling process on the unitary metal body.

In some embodiments, the weld joint may include a fillet weld formed by welding. The upper surface of such fillet welds may be concave. The fillet may be between the conductive body 323 and the conductive protrusion 313. Although the above description is made with the provision of forming the fillet using welding, it should be noted that the fillet may be formed using a process other than welding (e.g., a metal milling process). Thus, the conductive body 323, the conductive protrusion 313 and the fillet may be integrally formed with each other by metal milling or by metal joining (such as welding, brazing and soldering).

The conductive body 323 of the process unit 109 may include a gas injection portion 323b and a gas passage 323 a. The gas injection part 323b and the gas channel 323a may be integrally formed, or may be configured as a separate type in which the gas injection unit 323b having the gas injection holes 133 and the gas channel 323a stacked on the gas injection part 323b are separated. The embodiment of fig. 4 and 5 shows the conductive body 323 based on the embodiment in which the gas injection portion 323b and the gas passage 323a are constructed as a separate type.

Referring to fig. 4 and 5, the conductive body 323 including the gas injection unit 323b and the gas channel 323a may include a first surface and a second surface opposite to the first surface. The first surface may correspond to a lower surface of the gas injection unit 323b, and the second surface may correspond to an upper surface of the gas passage 323 a. A plurality of injection holes may be formed on the first surface, and first and second coupling holes may be formed on the second surface.

The conductive protrusion 313 may be formed to protrude from the second surface that is the upper surface of the gas channel 323 a. When the processing unit 109 is fixed to the partition 101 (of fig. 3) of the substrate processing apparatus through the first and second coupling holes, one end of the conductive protrusion 313 protruding from the second surface may extend to pass through the partition 101 (of fig. 3) of the substrate processing apparatus. Accordingly, the end of the conductive protrusion 313 extending out of the partition 101 (of fig. 3) may be electrically connected to a power supply portion (not shown).

A second coupling unit (e.g., a screw) configured to connect the airflow control unit 105 and the processing unit 109 may penetrate the second coupling hole. Accordingly, the conductive body 323 of the processing unit 109 and the conductive protrusion 313 integrally formed with the conductive body 323 may be additionally fixed to the partition 101 through the second coupling unit disposed in the second coupling hole.

In some embodiments, the conductive protrusions 313 may protrude on a second circumference C2 having a second radius greater than the first radius of the first circumference C1. That is, in one cross-section, the conductive protrusion 313 may be separated from the center of the processing unit 109 by a second radius, and in another cross-section, the second coupling hole may also be separated from the center of the processing unit 109 by the second radius.

Fig. 6 is a partial view of a processing unit included in a substrate processing apparatus according to an embodiment of the inventive concept. The processing unit (e.g., gas supply unit) of fig. 6 may be a processing unit of the substrate processing apparatus according to the above-described embodiment. Hereinafter, a repetitive description of the embodiments will not be given herein.

Referring to fig. 6, the conductive body 323 and the conductive protrusion 313 of the processing unit may be formed of a single structure using a solder joint 333'. That is, after the conductive body 323 and the conductive protrusion 313 are separately formed, a fillet weld is disposed between the conductive body 323 and the conductive protrusion 313, and a welding process is performed, so that the conductive body 323, the conductive protrusion 313, and the weld joint 333' may be integrated. In this case, at least one of the conductive body 323, the conductive protrusion 313, and the solder joint 333' may include a heat affected portion 353. The heat affected portion 353 is formed during the soldering process and may have different characteristics from the conductive body 323, the conductive protrusion 313 and the solder joint 333'.

Fig. 7 shows an embodiment in which the air curtain 3 as the conductive body of the processing unit and the RF rod 4 as the conductive protrusion are not integrated with each other and are mechanically coupled as separate components.

Referring to fig. 7, the gas curtain 3, which is in direct contact with the reaction space, is fixed to the reactor wall 1 and the gas flow control ring 2 by a plurality of connection means (e.g., screws) penetrating the central portion of the reactor wall 1. The gas curtain 3 comprises a conductive material to transmit RF power to a gas injection device, such as a showerhead, coupled to the bottom. Gas flow control ring 2 provides an exhaust path with through holes formed in the protruding sidewalls and comprises an insulating material for RF insulation between reactor wall 1 and gas curtain 3.

A plurality of RF rods 4 transmitting RF power in the reactor are symmetrically arranged with respect to the center of the gas curtain 3 and connected to the gas curtain 3. That is, in order to uniformly supply RF power to the reaction space, a plurality of RF rods 4 penetrate the reactor wall 1 and the gas flow control ring 2 symmetrically with respect to the center of the reactor wall 1 and the gas flow control ring 2, and are inserted into the gas curtain 3. In one embodiment, the connection portion of the RF rod 4 for insertion has a screw shape, and the screw-shaped connection portion is inserted into a groove formed in the air curtain 3. Insertion of the RF rod 4 may be accomplished by manual assembly. However, when reactor wall 1 and gas curtain 3 are deformed at high temperature, the coupling force between RF rod 4 and gas curtain 3 may be weakened, or RF rod 4 may be separated from gas curtain 3, resulting in deformation and cracking. In this case, the regulated RF power supply is not performed, resulting in RF power loss.

Fig. 8 shows a modification of the air curtain 3. Specifically, the extent to which the gas curtain 3 deforms at high temperatures, such as a process temperature of 300 ℃, is shown in fig. 8. Fig. 8(a) shows the degree of deformation in the X-axis direction, and fig. 8(b) shows the degree of deformation in the Y-axis direction.

The center portion of the graph shown in fig. 8 represents the center portion of the air curtain 3, and both ends represent the peripheral portions of the air curtain. That is, it can be seen that the peripheral portion of the air curtain 3 droops downward as compared with the central portion, and the degrees of deformation in the X and Y axis directions are similar to each other. When the outer peripheral portion of the gas curtain 3 sags, a gap is generated between the outer peripheral portion of the gas curtain 3 and the gas flow control ring 2, and the gas curtain 3 is exposed to the cleaning gas (for example, NF3), the cleaning gas is discharged through the exhaust path formed between the reactor wall 1, the gas flow control ring 2, and the gas curtain 3, and thus the sealing means (such as an O-ring) provided between the gas flow control ring 2 and the gas curtain 3 is corroded, and the cleaning gas remains as impurities in the reaction space (see fig. 9). Alternatively, the gas exhausted during the process flows into and remains through the gap and acts as an impurity in the process.

Fig. 10A and 10B are views of a substrate processing apparatus according to an embodiment of the inventive concept. The substrate processing apparatus according to the embodiment may be a modification of the substrate processing apparatus according to the above-described embodiment. Hereinafter, a repetitive description of the embodiments will not be given herein.

Referring to fig. 10A and 10B, the RF rod 4 is integrally coupled to the air curtain 3. For example, the RF rod 4 and the gas curtain 3 may be coupled by welding, thereby strengthening the coupling between the RF rod 4 and the gas curtain 3 and preventing RF power from leaking even during high temperatures. In addition, the reactor wall 1 and the gas curtain 3 may be coupled to each other by means of a connection means 5, such as a screw. The connection means 5 penetrate the reactor wall 1 and the gas flow control ring 2 and are coupled to the gas curtain 3. A plurality of connection holes 6 are provided on one surface of the air curtain 3, and the connection device 5 is coupled to the air curtain 3 through the connection holes 6. In the conventional air curtain 3 (of fig. 7), the connection holes are concentrated in the center of the air curtain 3. However, in the gas curtain 3 according to the present disclosure, the connection hole 6 (of fig. 10B) is formed not only in the center of the gas curtain 3 but also in the periphery, thereby reinforcing the coupling between the reactor wall 1 and the gas curtain 3 and preventing the gas curtain 2 from being deformed even at high temperatures.

Fig. 10A shows a cross section of the reactor as seen along line a-a' in fig. 10B, showing two RF rods 4 and two connection devices 5 coupled to the gas curtain 3. As can be seen from fig. 10A and 10B, in order to uniformly supply RF power to the gas curtain 3, the RF rod 4 is symmetrically arranged with respect to the center of the gas curtain 3, and the connection holes 6 are also symmetrically arranged with respect to the center of the gas curtain 3 for uniform coupling force between the reactor wall 1 and the gas curtain 3. In fig. 10A and 10B, two RF bars 4, eight connection means 5, and eight connection holes 6 are arranged, but the number is not limited thereto.

Fig. 11 shows the degree of deformation of the reactor at high temperature and the processing results when a plurality of connection means 5 and connection holes 6 are applied to the center and periphery of the gas curtain 3 according to fig. 10.

As shown in fig. 11, in the reactor according to the present disclosure, it can be seen that the high temperature deformation of the peripheral portion of the gas curtain is significantly lower than that shown in fig. 8. That is, in the reactor according to the present disclosure, by adding an additional connection means to the peripheral portion of the gas curtain, there is a technical effect that the physical deformation of the gas curtain can be suppressed.

Fig. 12 shows the processing results of a processing apparatus using a separate and inserted RF rod (fig. 7) and a processing device according to the present disclosure in which an RF rod and an air curtain are integrated (fig. 10). In this process, a plasma atomic layer process was used to deposit a SiO2 film at a process temperature of 300 ℃.

The lower part (part B) of fig. 12 shows the processing result of the structure in which a separate RF rod is inserted into the air curtain, and the upper part (part a) of fig. 12 shows the processing result of the structure in which the RF rod and the air curtain are integrated as shown in fig. 7. As shown in fig. 12, it can be seen that the process window is significantly larger in the reactor of the RF rod and gas curtain integrated structure, compared to the reactor of the separate structure. That is, it can be seen that a stabilization process is possible at a larger range of RF power in a unified structure. It can be seen that by maintaining the coupling between the RF rod and the air curtain in a unitary structure, the RF power dissipation is greatly reduced.

In more detail, according to fig. 12, in a reactor having a separate type of processing device, when the RF power is 200 watts or less and 1000 watts or more, the thin film deposition is not performed on the substrate. However, in the reactor having the integrally structured processing apparatus according to the embodiment of the concept of the present invention, it can be seen that the RF power range of the stabilization process has been extended to the range of 100 to 1600 Watts. Accordingly, the present disclosure has a technical effect of preventing process defects and process reproducibility degradation due to manual assembly in the existing reactor.

As an additional process variable affecting the high temperature process, in addition to the above-described physical connection between the reactor wall and the gas curtain and the physical connection between the RF rod and the gas curtain, a uniform temperature distribution in the reactor wall is also important. Non-uniform temperature distribution on the reactor wall surface can lead to cold spots and reduced process reproducibility. Fig. 13 shows a Thermocouple (TC) for measuring temperature and a wall heater on a partition, which are introduced to solve this problem.

Referring to fig. 13, the reactor wall heater 7 comprises a material containing heating elements. When a TC (thermocouple) 9 for measuring the temperature of the reactor wall heater of the reactor is disposed only on one side of the reactor wall heater 7, the temperature distribution of the reactor wall heater and the top of the reactor wall may not be uniform. Thus, in the present disclosure, a plurality of thermocouples are arranged for more uniform temperature measurement and heating. The thermocouples are arranged to face each other and more preferably to be symmetrical with respect to the center of the reactor wall heater. In addition, to prevent the occurrence of cold spots at the top of the reactor wall, which are relatively low in temperature, the reactor wall heater 7 opens only the path through which the RF rod, the gas curtain connection, the exhaust port and the gas inlet pass. In more detail, the reactor wall heater 7 has two thermocouples 9, eight screw holes 10 and two RF rod holes 11, and an air inlet hole 13 in the center. The reactor wall heater 8 is arranged in the other region so that no cold spots are produced at the top of the lower reactor wall.

Fig. 14 shows the processing result when the dual TC is applied.

Referring to fig. 14, when the dual TC is applied to a multi-chamber system having four reactors R1, R2, R3, and R4, in reactors R1, R2, R3, and R4, the thickness deviation of a thin film between the inside and the outside of a substrate is less than or equal to a reference value of 2.0A, and the thickness deviation of a thin film between reactors is less than or equal to a reference value of 13A. Thus, it can be seen that by implementing dual TCs in the substrate and between the reactors, allowable deviations in process reproducibility are achieved.

Fig. 15 is a view of a substrate processing apparatus according to an embodiment of the inventive concept. The substrate processing apparatus according to the embodiment may be a modification of the substrate processing apparatus according to the above-described embodiment. Hereinafter, a repetitive description of the embodiments will not be given herein.

Referring to fig. 15, as a reactor structure, the above-described integrated RF rod, a plurality of connection means (fig. 10), and a reactor wall heater (fig. 13) were applied. A conductive protrusion as an integrated RF rod is formed to extend from the conductive body as an air curtain, and a plurality of connection means (not shown) may be configured to fix the processing unit PU to the partition RW. In this case, the flow control ring FCR may be disposed between the processing unit PU and the partition RW such that the processing unit PU and the flow control ring FCR may be fixed to the partition RW by the connecting means.

The connection device may include a first coupling unit arranged along the first circumference C1 and a second coupling unit arranged along the second circumference C2. Therefore, the fixing force of the processing unit PU and the separator RW by the first coupling units arranged along the first circumference C1 may be reinforced by the second coupling units arranged along the second circumference C2. Therefore, the sagging of the processing unit PU occurring at a high temperature can be prevented.

Further, the heating unit HU is disposed to contact the partition RW, and the temperature of the heating unit HU is measured by a plurality of thermocouples TC1 and TC 2. By these configurations, it is possible to minimize deformation of the reactor and prevent RF power loss during the plasma process at high temperature. In addition, it is possible to achieve process reproducibility within the substrate and process reproducibility between reactors by homogenizing the temperature distribution at the top of the reactor wall.

It should be understood that the shape of each part of the drawings is illustrative for clear understanding of the present disclosure. It should be noted that the portions may be modified into various shapes other than the illustrated shape.

It is to be understood that the embodiments described herein are to be considered in all respects only as illustrative and not restrictive. Descriptions of features or aspects in each embodiment should generally be considered as available for other similar features or aspects in other embodiments. While one or more embodiments have been described with reference to the drawings, it will be understood by those of ordinary skill in the art that various changes in form and details may be made therein without departing from the spirit and scope of the present disclosure as defined by the following claims.