阅读说明：本技术 等离子发电系统 (Plasma power generation system ) 是由 缪波 于 2021-06-23 设计创作，主要内容包括：本申请公开了一种等离子发电系统,属于发电技术领域。所述等离子发电系统包括等离子体约束装置、等离子源和发电电极。发电电极具有第一表面和第二表面,发电电极的第一表面位于发电电极的第二表面与等离子源之间。该等离子发电系统工作时,等离子源产生的带电荷的等离子体在等离子体约束装置形成的约束场的约束范围内运动至发电电极的第一表面。发电电极具有预设形状,以使被接收在发电电极的第一表面的等离子体所带的电荷会趋于静电平衡分布而迁移至发电电极的第二表面。如此,会使等离子体还原成中性物质,从而可以减弱带电荷的等离子体对发电电极的腐蚀,延长等离子发电系统的寿命。(The application discloses plasma power generation system belongs to the technical field of electricity generation. The plasma power generation system comprises a plasma confinement device, a plasma source and a power generation electrode. The generating electrode has a first surface and a second surface, and the first surface of the generating electrode is located between the second surface of the generating electrode and the plasma source. When the plasma power generation system works, the charged plasma generated by the plasma source moves to the first surface of the power generation electrode within the constraint range of the constraint field formed by the plasma constraint device. The generating electrode has a predetermined shape such that charges carried by the plasma received at the first surface of the generating electrode tend to be distributed in an electrostatic equilibrium to migrate to the second surface of the generating electrode. Therefore, the plasma is reduced into neutral substances, so that the corrosion of the charged plasma to the power generation electrode can be reduced, and the service life of the plasma power generation system can be prolonged.)

1. A plasma power generation system, comprising: a plasma confinement device, a plasma source and a power generation electrode;

the plasma confinement device is used for forming a confinement field;

the plasma source is used for being connected with a power supply VCC to generate plasma, and the plasma is positively or negatively charged;

the power generation electrode has a first surface and a second surface, the first surface of the power generation electrode being located between the second surface of the power generation electrode and the plasma source;

the plasma generated by the plasma source moves to the first surface of the generating electrode within the constraint range of the constraint field, the generating electrode has a preset shape, so that charges carried by the plasma received on the first surface of the generating electrode tend to be distributed in an electrostatic equilibrium manner and migrate to the second surface of the generating electrode, and the generating electrode is used for outputting electric energy.

2. The plasma power generation system of claim 1, wherein the plasma confinement arrangement comprises at least one of a magnetic mirror, an electrostatic lens.

3. The plasma power generation system of claim 1 or 2, wherein the plasma confinement arrangement comprises: a first coil and a second coil;

the plasma source and the power generation electrode are located between the first coil and the second coil;

the first coil and the second coil have currents in the same direction, so that the confinement field is formed between the first coil and the second coil.

4. The plasma power generation system of claim 1 or 2, wherein the plasma confinement arrangement comprises: a first electrode and a second electrode;

the first electrode has a first through hole, and the second electrode has a second through hole; the first via is located between the plasma source and the second via, and the second via is located between the first via and the power generating electrode, such that the first electrode and the second electrode form the confinement field.

5. The plasma power generation system of claim 4, wherein the plasma confinement arrangement further comprises: a third electrode;

the plasma source is located between the third electrode and the first via such that the first electrode, the second electrode, and the third electrode form the confinement field.

6. The plasma power generation system of claim 4, wherein the plasma confinement arrangement further comprises: a third electrode;

the third electrode is provided with a third through hole or a first blind hole, and the first blind hole is positioned on the surface of the third electrode close to the first electrode;

the plasma source is located in the third through hole or the first blind hole, or the plasma source is located between the third through hole and the first through hole or the first through hole, so that the first electrode, the second electrode and the third electrode form the confinement field.

7. The plasma power generation system of claim 4, wherein the plasma confinement arrangement further comprises: a third coil and a fourth coil;

the third coil is located between the plasma source and the fourth coil, or the plasma source is located between the third coil and the fourth coil, or the power generating electrode is located between the third coil and the fourth coil;

the third coil and the fourth coil have currents in the same direction.

8. The plasma power generation system of claim 1, wherein the plasma confinement arrangement comprises: a first electrode and a second electrode;

the second electrode is provided with a second through hole; the second via is located between the plasma source and the power generating electrode;

the plasma source is positioned between the first electrode and the second via such that the first electrode and the second electrode form the confinement field.

9. The plasma power generation system of claim 1, wherein the plasma confinement arrangement comprises: a first electrode and a second electrode;

the second electrode is provided with a second through hole; the second via is located between the plasma source and the power generating electrode;

the first electrode is provided with a first through hole or a second blind hole, the second blind hole is positioned on the surface of the first electrode close to the second electrode, and the plasma source is positioned in the first through hole or the second blind hole, so that the first electrode and the second electrode form the confinement field.

10. The plasma power generation system of claim 1, further comprising: a load module;

the first end of the load module is connected with the power generation electrode, and the second end of the load module is connected with the plasma source or the ground wire.

Technical Field

The application relates to the technical field of power generation, in particular to a plasma power generation system.

Background

The plasma power generation technology is also called magnetic fluid power generation technology, and refers to the technology of generating electric energy through the interaction of flowing plasma and a magnetic field.

In the related art, a plasma power generation system generally includes a plasma, a magnetic field, a first electrode, and a second electrode. When plasma enters the magnetic field along the direction perpendicular to the magnetic induction lines of the magnetic field at a certain speed, the positively charged plasma flows to the first electrode along the direction perpendicular to the magnetic induction lines under the action of the magnetic field, and the negatively charged plasma flows to the second electrode along the direction perpendicular to the magnetic induction lines under the action of the magnetic field. Thus, the first electrode and the second electrode can output direct current.

However, in the related art, the charged plasma received on the power generating electrode (including the first electrode and the second electrode) may corrode the power generating electrode, which may affect the life of the plasma power generating system.

Disclosure of Invention

The application provides a plasma power generation system, which can weaken the corrosion of plasma with charges on a power generation electrode, thereby prolonging the service life of the plasma power generation system. The technical scheme is as follows:

a plasma power generation system, comprising: a plasma confinement device, a plasma source and a power generation electrode;

the plasma confinement device is used for forming a confinement field;

the plasma source is used for being connected with a power supply VCC to generate plasma, and the plasma is positively or negatively charged;

the power generation electrode has a first surface and a second surface, the first surface of the power generation electrode being located between the second surface of the power generation electrode and the plasma source;

the plasma generated by the plasma source moves to the first surface of the generating electrode within the constraint range of the constraint field, the generating electrode has a preset shape, so that charges carried by the plasma received on the first surface of the generating electrode tend to be distributed in an electrostatic equilibrium manner and migrate to the second surface of the generating electrode, and the generating electrode is used for outputting electric energy.

In the present application, a plasma power generation system includes a plasma confinement device, a plasma source, and a power generation electrode. The plasma confinement device is used for forming a confinement field, and the plasma source is used for generating plasma with positive charges or negative charges. The generating electrode has a first surface and a second surface, and the first surface of the generating electrode is located between the second surface of the generating electrode and the plasma source. When the plasma power generation system works, the plasma generated by the plasma source moves to the first surface of the power generation electrode within the constraint range of the constraint field. The generating electrode has a predetermined shape such that charges carried by the plasma received at the first surface of the generating electrode tend to be distributed in an electrostatic equilibrium to migrate to the second surface of the generating electrode. Therefore, the power generation electrode can output electric energy, and simultaneously, the plasma is reduced into neutral substances due to the charge migration of the plasma, so that the power generation electrode can be prevented from being continuously corroded by the charged plasma, the corrosion of the charged plasma to the power generation electrode can be weakened, and the service life of a plasma power generation system is prolonged.

Optionally, the plasma confinement device comprises at least one of a magnetic mirror, an electrostatic lens.

Optionally, the plasma confinement arrangement comprises: a first coil and a second coil;

the plasma source and the power generation electrode are located between the first coil and the second coil;

the first coil and the second coil have currents in the same direction, so that the confinement field is formed between the first coil and the second coil.

Optionally, the plasma confinement arrangement comprises: a first electrode and a second electrode;

the first electrode has a first through hole, and the second electrode has a second through hole; the first via is located between the plasma source and the second via, and the second via is located between the first via and the power generating electrode, such that the first electrode and the second electrode form the confinement field.

Optionally, the plasma confinement arrangement further comprises: a third electrode;

the plasma source is located between the third electrode and the first via such that the first electrode, the second electrode, and the third electrode form the confinement field.

Optionally, the plasma confinement arrangement further comprises: a third electrode;

the third electrode is provided with a third through hole or a first blind hole, and the first blind hole is positioned on the surface of the third electrode close to the first electrode;

the plasma source is located in the third through hole or the first blind hole, or the plasma source is located between the third through hole and the first through hole or the first through hole, so that the first electrode, the second electrode and the third electrode form the confinement field.

Optionally, the plasma confinement arrangement further comprises: a third coil and a fourth coil;

the third coil is located between the plasma source and the fourth coil, or the plasma source is located between the third coil and the fourth coil, or the power generating electrode is located between the third coil and the fourth coil;

the third coil and the fourth coil have currents in the same direction.

Optionally, the plasma confinement arrangement comprises: a first electrode and a second electrode;

the second electrode is provided with a second through hole; the second via is located between the plasma source and the power generating electrode;

the plasma source is positioned between the first electrode and the second via such that the first electrode and the second electrode form the confinement field.

Optionally, the plasma confinement arrangement comprises: a first electrode and a second electrode;

the second electrode is provided with a second through hole; the second via is located between the plasma source and the power generating electrode;

the first electrode is provided with a first through hole or a second blind hole, the second blind hole is positioned on the surface of the first electrode close to the second electrode, and the plasma source is positioned in the first through hole or the second blind hole, so that the first electrode and the second electrode form the confinement field.

Optionally, the plasma power generation system further comprises: the device comprises a switch module and a detection control module;

the first end of the switch module is used for being connected with the power supply VCC, and the second end of the switch module is connected with the plasma source;

the input end of the detection control module is connected with the second surface of the power generation electrode and used for detecting the voltage of the power generation electrode, and the output end of the detection control module is connected with the control end of the switch module so as to control the switch module to be switched off when the voltage of the power generation electrode is greater than the preset voltage.

Optionally, the plasma power generation system further comprises: a load module;

the first end of the load module is connected with the power generation electrode, and the second end of the load module is connected with the plasma source or the ground wire.

Drawings

In order to more clearly illustrate the technical solutions in the embodiments of the present application, the drawings needed to be used in the description of the embodiments are briefly introduced below, and it is obvious that the drawings in the following description are only some embodiments of the present application, and it is obvious for those skilled in the art to obtain other drawings based on these drawings without creative efforts.

FIG. 1 is a schematic structural diagram of a first plasma power generation system provided in an embodiment of the present application;

FIG. 2 is a schematic structural diagram of a second plasma power generation system provided in an embodiment of the present application;

fig. 3 is a schematic structural diagram of a first electrode provided in an embodiment of the present application;

fig. 4 is a schematic structural diagram of a second electrode provided in an embodiment of the present application;

FIG. 5 is a schematic structural diagram of a third plasma power generation system provided in an embodiment of the present application;

FIG. 6 is a schematic structural diagram of a fourth plasma power generation system provided in an embodiment of the present application;

FIG. 7 is a schematic structural diagram of a fifth plasma power generation system provided in an embodiment of the present application;

FIG. 8 is a schematic structural diagram of a sixth plasma power generation system provided in an embodiment of the present application;

FIG. 9 is a schematic structural diagram of a seventh plasma power generation system provided in an embodiment of the present application;

FIG. 10 is a schematic structural diagram of an eighth plasma power generation system provided in an embodiment of the present application;

FIG. 11 is a schematic structural diagram of a ninth plasma power generation system provided in an embodiment of the present application;

fig. 12 is a schematic structural diagram of a tenth plasma power generation system according to an embodiment of the present application.

Wherein, the meanings represented by the reference numerals of the figures are respectively as follows:

10. a plasma power generation system;

110. a plasma confinement arrangement;

1102. a confining field;

1122. a first coil;

1124. a second coil;

1142. a first electrode;

1143. a first through hole;

1144. a second electrode;

1145. a second through hole;

1146. a third electrode;

1152. a third coil;

1154. a fourth coil;

120. a plasma source;

122. plasma;

130. a power generation electrode;

132. a first surface;

134. a second surface;

140. a switch module;

150. a detection control module;

160. and a load module.

Detailed Description

To make the objects, technical solutions and advantages of the present application more clear, embodiments of the present application will be described in further detail below with reference to the accompanying drawings.

It should be understood that reference to "a plurality" in this application means two or more. In the description of the present application, "/" means "or" unless otherwise stated, for example, a/B may mean a or B; "and/or" herein is only an association relationship describing an associated object, and means that there may be three relationships, for example, a and/or B, which may mean: a exists alone, A and B exist simultaneously, and B exists alone. In addition, for the convenience of clearly describing the technical solutions of the present application, the terms "first", "second", and the like are used to distinguish the same items or similar items having substantially the same functions and actions. Those skilled in the art will appreciate that the terms "first," "second," etc. do not denote any order or quantity, nor do the terms "first," "second," etc. denote any order or importance.

Before explaining the embodiments of the present application in detail, an application scenario of the embodiments of the present application will be described.

Plasma, also called plasma, is an ionized gaseous substance consisting of positive and negative ions generated by ionization after partial electrons of atoms and radicals are deprived, and is considered to be a fourth state in which solid, liquid, and gaseous foreign substances are removed. The motion of the plasma is dominated by electric and magnetic fields. The plasma power generation technology is also called magnetic fluid power generation technology, and refers to the technology of generating electric energy through the interaction of flowing plasma and a magnetic field. In the related art, the positively charged plasma is received on the first electrode under the action of the magnetic field, and the negatively charged plasma is received on the second electrode under the action of the magnetic field, so that the first electrode and the second electrode can output direct current.

However, in the related art, the charged plasma received on the power generating electrode (including the first electrode and the second electrode) may corrode the power generating electrode, which may affect the life of the plasma power generating system.

Therefore, the embodiment of the application provides a plasma power generation system, which can reduce the corrosion of charged plasma to a power generation electrode, thereby prolonging the service life of the plasma power generation system.

The plasma power generation system provided in the embodiments of the present application will be explained in detail below. In the embodiments of the present application, the connection between the two electronic devices is referred to as an electrical connection. Here, the electrical connection means that two electronic devices are connected by a wire to realize transmission of an electrical signal.

Fig. 1 is a schematic structural diagram of a plasma power generation system 10 according to an embodiment of the present disclosure. As shown in fig. 1, the plasma power generation system 10 includes a plasma confinement device 110, a plasma source 120, and a power generation electrode 130.

The plasma confinement device 110 is configured to form a confinement field 1102 such that the plasma 122 can only move within a confinement range of the confinement field 1102. Here, the confinement field 1102 may be at least one of an electric and a magnetic field. The plasma source 120 is configured to be coupled to a power source VCC to generate a charged plasma 122. In the present embodiment, the plasma source 120 is used to generate a plasma 122 with the same charge, for example, the plasma source 120 may be used to generate a plasma 122 with a positive charge and may also be used to generate a plasma 122 with a negative charge. In the present embodiment, the plasma power generation system 10 is described with the plasma source 120 for generating a positively charged plasma 122. In some embodiments, the plasma source 120 may be a liquid metal. The liquid metal generates a positively charged plasma 122 under the action of a power supply VCC. In other specific embodiments, the plasma source 120 may also be a molten salt. The molten salt herein refers to a melt formed by melting a salt, such as a melt formed by a halide of an alkali metal, a melt of a nitrate, a melt of a sulfate, and the like. The plasma source 120 may be a molten salt or a mixture of molten salts. The molten salt generates a positively charged plasma 122 under the action of a power supply VCC.

The power generation electrode 130 has a first surface 132 and a second surface 134. The first surface 132 of the power generation electrode 130 is located between the second surface 134 of the power generation electrode 130 and the plasma source 120. That is, the first surface 132 of the power generation electrode 130 is close to the plasma source 120 with respect to the second surface 134 of the power generation electrode 130, and the second surface 134 of the power generation electrode 130 is far from the plasma source 120 with respect to the first surface 132 of the power generation electrode 130. In the present embodiment, the power generation electrode 130 also has a predetermined shape. The predetermined shape may allow charges charged by the plasma 122 received at the first surface 132 of the power generation electrode 130 to migrate toward the second surface 134 of the power generation electrode 130 toward an electrostatic equilibrium distribution.

In operation of the plasma power generation system 10, the charged plasma 122 generated by the plasma source 120 moves within the confinement region of the confinement field 1102 formed by the plasma confinement device 110, and is received by the first surface 132 of the power generation electrode 130 after moving to the first surface 132 of the power generation electrode 130. The motion here includes at least one of thermal motion of the plasma 122 and accelerated motion of the plasma 122 by the confinement force of an electric or magnetic field. After the charged plasma 122 is received on the first surface 132 of the power generating electrode 130, the charged plasma 122 received on the first surface 132 of the power generating electrode 130 has a predetermined shape, so that the charged plasma tends to be distributed in an electrostatic equilibrium and migrates to the second surface 134 of the power generating electrode 130. After the charges carried by the plasma 122 are transferred to the second surface 134 of the power generation electrode 130, the power generation electrode 130 can output electric energy, and simultaneously, due to the charge transfer of the plasma 122, the plasma 122 is reduced to neutral substances (no neutral substances are generated if electrons are generated), so that the power generation electrode 130 can be prevented from being continuously corroded by the charged plasma 122, the corrosion of the charged plasma 122 to the power generation electrode 130 can be reduced, and the service life of the plasma power generation system 10 can be prolonged.

In some embodiments, as shown in fig. 1 and 2, the preset shape of the power generation electrode 130 refers to: the generating electrode 130 has a first surface 132 and a second surface 134, and the full curvature of the first surface 132 of the generating electrode 130 is negative. Generally, the first surface 132 of the power generation electrode 130 for receiving the plasma 122 has a charge density less than the charge density at the plasma source 120 when the plasma power generation system 10 is in operation.

In some specific embodiments, the power generating electrode 130 is curved when the full curvature of the first surface 132 of the power generating electrode 130 is negative and the full curvature of the second surface 134 of the power generating electrode 130 is positive. In the embodiment of the present application, as shown in fig. 1, the first surface 132 and the second surface 134 of the power generation electrode 130 may have a circular arc shape, so that the power generation electrode 130 has a circular arc shape. Alternatively, as shown in fig. 2, the first surface 132 and the second surface 134 of the power generation electrode 130 may have a multi-sectional arc shape, thereby making the power generation electrode 130 have a multi-sectional arc shape. In other embodiments, not shown in the figures, the predetermined shape of the power generating electrode 130 refers to: the power generation electrode 130 has a mesh-like cylindrical shape. The inner surface of the mesh-like cylindrical power generation electrode 130 is a first surface of the power generation electrode 130, and the outer surface of the mesh-like cylindrical power generation electrode 130 is a second surface of the power generation electrode 130.

In some embodiments, plasma confinement device 110 comprises at least one of a magnetic mirror and an electrostatic lens. Various implementations of plasma confinement arrangement 110 are described below in conjunction with specific embodiments.

In a first possible implementation, the plasma confinement device 110 includes a magnetic mirror, and the magnetic field generated by the magnetic mirror is the confinement field 1102.

As shown in fig. 2, plasma confinement device 110 includes a first coil 1122 and a second coil 1124. The first coil 1122 and the second coil 1124 have currents in the same direction, so that a magnetic field with a weak middle and strong ends is formed between the first coil 1122 and the second coil 1124. At this time, the middle weak magnetic field and the two strong magnetic fields formed between the first coil 1122 and the second coil 1124 are the confining field 1102. The plasma source 120 and the power generation electrode 130 are both located between the first coil 1122 and the second coil 1124.

In operation of the plasma power generation system 10, the plasma source 120 generates a charged plasma 122 from a power source VCC. The charged plasma 122 undergoes thermal motion within the confinement region of the confinement field 1102. For convenience of description, the direction of the thermal motion is divided into a first direction and a second direction, the first direction being a direction directed from the plasma source 120 to the power generation electrode 130. The second direction is a direction having a certain included angle with the first direction. Wherein, the plasma 122 with the thermal movement direction being the first direction can move to the power generation electrode 130 without the constraint of the constraint field 1102. In other words, the confinement field 1102 serves to confine the plasma 122 having the thermal motion direction in the second direction. During the movement of the plasma 122 with the thermal movement direction being the second direction, the movement direction of the plasma 122 and the magnetic induction line direction of the confinement field 1102 form a certain included angle, and at this time, the plasma 122 is subjected to the lorentz force of the magnetic field, so that the plasma 122 returns to the confinement range of the confinement field 1102, and further the plasma 122 is prevented from moving outside the confinement range of the confinement field 1102. Meanwhile, during the thermal motion of the plasma 122 within the confinement range of the confinement field 1102, the density of the plasma 122 at the plasma source 120 is greater than the charge density of the first surface 132 of the power generation electrode 130, which may further promote the thermal motion direction of the plasma 122 to be the direction from the plasma source 120 to the power generation electrode 130.

Generally, the first coil 1122, the second coil 1124, the plasma source 120, and the power generation electrode 130 may be located on the same central axis.

In the above embodiment, the plasma confinement device 110 includes a magnetic mirror, and the magnetic field generated by the magnetic mirror is the confinement field 1102. The confinement field 1102 can confine the plasma 122 within a confinement range, thereby preventing a reduction in power generation efficiency caused by the plasma 122 moving outside the confinement range of the confinement field 1102, and thus, the power generation efficiency of the plasma power generation system 10 can be improved. Meanwhile, the plasma 122 moves to the first surface 132 of the power generation electrode 130 in the range of the confinement field 1102 in a thermal movement manner, so that the temperature of the power generation working medium of the plasma 122 is prevented from being too high, and the service life of the plasma power generation system 10 is prolonged.

In a second possible implementation, the plasma confinement device 110 is an electrostatic lens. The electric field generated by the electrostatic lens is a confining field 1102.

Fig. 3 is a schematic structural diagram of a first electrode 1142 provided in this embodiment of the application, and fig. 4 is a schematic structural diagram of a second electrode 1144 provided in this embodiment of the application. Fig. 5 to 7 are schematic structural diagrams of the plasma power generation system 10 in which the plasma confinement device 110 is an electrostatic lens according to various embodiments of the present disclosure. As shown in fig. 3-7, the plasma confinement device 110 includes a first electrode 1142 and a second electrode 1144. The first electrode 1142 may be a centrally apertured metal sheet or cylinder and the second electrode 1144 may also be a centrally apertured metal sheet or cylinder.

In a first possible structure, as shown in fig. 3 to 5, the first electrode 1142 has a first through hole 1143. The second electrode 1144 has a second through hole 1145. The plasma source 120 is located in the first through hole 1143. The second through-hole 1145 is located between the plasma source 120 and the power generation electrode 130. In other words, the plasma source 120 and the first electrode 1142 are located on the same plane, and the second electrode 1144 is located between the plasma source 120 and the power generating electrode 130, so that the first electrode 1142 and the second electrode 1144 form an electrostatic lens, and the electric field generated by the first electrode 1142 and the second electrode 1144 is the confining field 1102. In other embodiments, the first through hole 1143 of the first electrode 1142 in the plasma power generation system 10 shown in fig. 5 can also be a blind hole, and the blind hole is named as a second blind hole for convenience of description. At this time, the second blind hole of the first electrode 1142 is located on the surface of the first electrode 1142 close to the second electrode 1144, the plasma source 120 is located in the second blind hole, and the electric field generated by the first electrode 1142 and the second electrode 1144 is the confining field 1102.

In a second possible configuration, as shown in fig. 3, 4 and 6, the first electrode 1142 has a first via 1143. The second electrode 1144 has a second through hole 1145. The plasma source 120 is located between the first through hole 1143 and the second through hole 1145, and the second through hole 1145 is located between the plasma source 120 and the power generating electrode 130. In other words, the first electrode 1142 is located on the side of the plasma source 120 away from the power generating electrode 130, and the second electrode 1144 is located between the plasma source 120 and the power generating electrode 130, so that the first electrode 1142 and the second electrode 1144 form an electrostatic lens, and the electric field generated by the first electrode 1142 and the second electrode 1144 is the confinement field 1102. In other embodiments, the first electrode 1142 of the plasma power generation system 10 shown in fig. 6 may not have the first through hole 1143, i.e., the first electrode 1142 is a metal plate. At this time, the second electrode 1144 has a second through hole 1145, and the second through hole 1145 is located between the plasma source 120 and the power generating electrode 130. The plasma source 120 is positioned between the first electrode 1142 and the second via 1145 such that the first electrode 1142 and the second electrode 1144 form the confinement field 1102.

In a third possible configuration, as shown in fig. 3, 4 and 7, the first through hole 1143 is located between the plasma source 120 and the second through hole 1145, and the second through hole 1145 is located between the first through hole 1143 and the power generation electrode 130. In other words, the first electrode 1142 is located on the side of the plasma source 120 close to the power generating electrode 130, and the second electrode 1144 is located between the first electrode 1142 and the power generating electrode 130, so that the first electrode 1142 and the second electrode 1144 form an electrostatic lens, and the electric field generated by the first electrode 1142 and the second electrode 1144 is the confining field 1102.

In operation of the plasma power generation system 10, the plasma source 120 generates a charged plasma 122 from a power source VCC. The charged plasma 122 moves within the confinement region of the confinement field 1102. At this time, the charged plasma 122 is confined by the electrostatic lens and converges to the position where the first surface 132 of the power generation electrode 130 is located. Due to the converging action of the electrostatic lens on the plasma 122, the plasma 122 may be prevented from moving outside the confinement range of the confinement field 1102. Meanwhile, during the movement of the plasma 122 within the confinement range of the confinement field 1102, the density of the plasma 122 at the plasma source 120 is greater than the charge density of the first surface 132 of the power generation electrode 130, which may further facilitate the movement of the plasma 122 from the plasma source 120 to the power generation electrode 130.

Further, the diameter of the second through hole 1145 is larger than the diameter of the first through hole 1143.

Generally, the plasma source 120, the first electrode 1142, the second electrode 1144, and the power generation electrode 130 may be located on the same central axis.

In the above embodiment, the plasma confinement device 110 includes an electrostatic lens, and the electric field generated by the electrostatic lens is the confinement field 1102. The confinement field 1102 can confine the plasma 122 within a confinement range, thereby preventing a reduction in power generation efficiency caused by the plasma 122 moving outside the confinement range of the confinement field 1102, and thus, the power generation efficiency of the plasma power generation system 10 can be improved. Meanwhile, the acceleration of the plasma 122 by the electric field in the range of the confinement field 1102 can also improve the power generation efficiency of the plasma power generation system 10.

It should be noted that the formation of an electrostatic lens typically requires at least two metal sheets or cylinders with a central opening. Therefore, in the embodiment of the present application, the electrostatic lens as the plasma confinement device 110 at least comprises the first electrode 1142 and the second electrode 1144, and may further comprise the third electrode 1146, so as to enhance the confinement effect of the confinement field 1102 formed by the plasma confinement device 110 on the plasma 122.

For example, the plasma power generation system 10 shown in fig. 8 and 9 is further improved on the basis of the above-described third possible configuration. In the embodiment shown in fig. 8 and 9, the plasma confinement device 110 further comprises a third electrode 1146. The third electrode 1146 has a third through hole (not shown), the diameter of the third through hole may be smaller than or equal to the diameter of the first through hole 1143, and the third electrode 1146 may be concentric with the first electrode 1142.

In some embodiments, as shown in fig. 8, the plasma source 120 is located within the third aperture. In other words, the plasma source 120 and the third electrode 1146 are located on the same plane. When the plasma 122 generated by the plasma source 120 is positively charged, the voltage of the third electrode 1146 is greater than the voltage of the first electrode 1142. Conversely, when the plasma 122 generated by the plasma source 120 is negatively charged, the voltage of the third electrode 1146 is lower than the voltage of the first electrode 1142. Thus, when the plasma power generation system 10 is in operation, the plasma source 120 generates a charged plasma 122 under the action of the power source VCC. The plasma 122 moves in a direction from the plasma source 120 toward the power generating electrode 130 by an electric field formed between the third electrode 1146 and the second electrode 1144, and converges toward the position of the first surface 132 of the power generating electrode 130 by an electric field formed between the second electrode 1144 and the first electrode 1142. Meanwhile, the density of the plasma 122 at the plasma source 120 is greater than the charge density of the first surface 132 of the power generation electrode 130, which may further facilitate movement of the plasma 122 from the plasma source 120 to the power generation electrode 130. In other embodiments, the third via of the third electrode 1146 in the plasma power generation system 10 shown in fig. 8 can also be a blind via, which is named as the first blind via for convenience of description. At this time, the first blind hole of the third electrode 1146 is located on the surface of the third electrode 1146 close to the first electrode 1142, and the plasma source 120 is located in the first blind hole, so that the first electrode 1142, the second electrode 1144 and the third electrode 1146 form a confinement field.

In other embodiments, as shown in fig. 9, the plasma source 120 is located between the third through-hole and the first through-hole 1143. In other words, the third electrode 1146 is located on a side of the plasma source 120 away from the first electrode 1142. When the plasma 122 generated by the plasma source 120 is positively charged, the voltage of the third electrode 1146 is greater than the voltage of the first electrode 1142. Conversely, when the plasma 122 generated by the plasma source 120 is negatively charged, the voltage of the third electrode 1146 is less than the voltage of the first electrode 1142. Thus, when the plasma power generation system 10 is in operation, the plasma source 120 generates a charged plasma 122 under the action of the power source VCC. The plasma 122 moves in a direction from the plasma source 120 toward the power generating electrode 130 by an electric field formed between the third electrode 1146 and the second electrode 1144, and converges toward the position of the first surface 132 of the power generating electrode 130 by an electric field formed between the second electrode 1144 and the first electrode 1142. Meanwhile, the density of the plasma 122 at the plasma source 120 is greater than the charge density of the first surface 132 of the power generation electrode 130, which may further facilitate movement of the plasma 122 from the plasma source 120 to the power generation electrode 130. In other embodiments, the third electrode 1146 of the plasma power generation system 10 shown in fig. 9 may not have the third through hole, i.e., the third electrode 1146 is a metal plate. At this time, the plasma source 120 is located between the third electrode 1146 and the first through hole 1143, so that the first electrode 1142, the second electrode 1144 and the third electrode 1146 form the confinement field 1102.

In the above embodiments, the plasma confinement device 110 further comprises a third electrode 1146, and the third electrode 1146 can enhance the confinement effect of the confinement field 1102 formed by the plasma confinement device 110 on the plasma 122. Meanwhile, the third electrode 1146 may accelerate the movement of the plasma 122, thereby improving the power generation efficiency of the plasma power generation system 10.

In a third possible embodiment, the plasma confinement device 110 includes both a magnetic mirror and an electrostatic lens. The magnetic field generated by the magnetic mirror and the electric field generated by the electrostatic lens together form a confining field 1102.

As shown in fig. 10 and 11, the plasma confinement device 110 includes a first electrode 1142, a second electrode 1144, a third coil 1152 and a fourth coil 1154. Third and fourth coils 1152 and 1154 have currents flowing in the same direction, thereby creating a strong magnetic field between third and fourth coils 1152 and 1154 with weaker ends. It is understood that the plasma confinement device 110 can further include a third electrode 1146, which is not described in detail. The first electrode 1142 and the second electrode 1144 form an electrostatic lens, and the electrostatic lens can confine the charged plasma 122, so that the plasma 122 converges to the same position. The third and fourth coils 1152, 1154 form a magnetic mirror that also confines the charged plasma 122. In this manner, plasma 122 may be further prevented from moving outside the confinement range of confinement field 1102 by the dual confinement of the electrostatic lens and the magnetic mirror.

When the plasma confinement device 110 comprises a first electrode 1142, a second electrode 1144, a third coil 1152 and a fourth coil 1154. The first electrode 1142, the second electrode 1144, the third coil 1152, and the fourth coil 1154 are positioned in various combinations. Several possible positional relationships of the first electrode 1142, the second electrode 1144, the third coil 1152, and the fourth coil 1154 are described below in connection with specific embodiments.

In some specific embodiments, as shown in fig. 10, the third coil 1152 is located between the plasma source 120 and the fourth coil 1154. At this time, the fourth coil 1154 is positioned between the third coil 1152 and the power generating electrode 130. That is, the third coil 1152 is positioned at a side of the plasma source 120 adjacent to the power-generating electrode 130, and the fourth coil 1154 is positioned at a side of the third coil 1152 adjacent to the power-generating electrode 130. The first electrode 1142 is located on the side of the plasma source 120 close to the power generating electrode 130, and the second electrode 1144 is located on the side of the first electrode 1142 close to the power generating electrode 130. The positional relationship of the first electrode 1142 and the second electrode 1144 with respect to the first coil 1122 and the second coil 1124 is not limited.

In other particular embodiments, the plasma source 120 is located between the third and fourth coils 1152, 1154. At this time, the fourth coil 1154 is positioned between the plasma source 120 and the power generation electrode 130. That is, the third coil 1152 is positioned on the side of the plasma source 120 remote from the power-generating electrode 130, and the fourth coil 1154 is positioned on the side of the plasma source 120 near the light-emitting electrode. The first electrode 1142 is located on the side of the plasma source 120 close to the power generating electrode 130, and the second electrode 1144 is located on the side of the first electrode 1142 close to the power generating electrode 130. The positional relationship of the first electrode 1142 and the second electrode 1144 with respect to the first coil 1122 and the second coil 1124 is not limited.

In yet other specific embodiments, the power-generating electrode 130 is positioned between the third coil 1152 and the fourth coil 1154. That is, the third coil 1152 is positioned at a side of the plasma source 120 close to the power-generating electrode 130, and the fourth coil 1154 is positioned at a side of the power-generating electrode 130 remote from the plasma source 120. The first electrode 1142 is located on the side of the plasma source 120 close to the power generating electrode 130, and the second electrode 1144 is located on the side of the first electrode 1142 close to the power generating electrode 130. The positional relationship of the first electrode 1142 and the second electrode 1144 with respect to the first coil 1122 and the second coil 1124 is not limited.

In yet other specific embodiments, as shown in fig. 11, the plasma source 120 and the generating electrode 130 are positioned between the third coil 1152 and the fourth coil 1154. In this case, the third coil 1152 is the first coil 1122, and the fourth coil 1154 is the second coil 1124. The first electrode 1142 is located on the side of the plasma source 120 close to the power generating electrode 130, and the second electrode 1144 is located on the side of the first electrode 1142 close to the power generating electrode 130.

In some embodiments, as shown in fig. 12, the plasma power generation system 10 further includes a load module 160.

The first end of the load module 160 is connected to the power generation electrode 130, such as can be connected to the second surface 134 of the power generation electrode 130, to obtain the electrical energy output by the second surface 134 of the power generation electrode 130. A second end of the load module 160 is coupled to the plasma source 120. Thus, when the charged plasma 122 is received on the first surface 132 of the power generating electrode 130, the charges of the plasma 122 tend to be distributed in an electrostatic equilibrium and move to the second surface 134 of the power generating electrode 130. When the second surface 134 of the power generation electrode 130 outputs the electric energy, the charges are returned from the second surface 134 of the power generation electrode 130 to the plasma source 120 through the load module 160, thereby forming a path. Generally, the load module 160 may be an electrical appliance with a certain resistance value, or may be an electric energy storage such as a super capacitor or a storage battery for storing electric energy.

In other embodiments, not shown, the second end of the load module 160 may also be connected to the ground GND such that a path is formed between the ground GND and the power generation electrode 130 through the load module 160.

In some embodiments, as shown in fig. 12, when the first end of the load module 160 is connected to the power generation electrode 130 and the second end of the load module 160 is connected to the plasma source 120, the plasma power generation system 10 may further include a switch module 140 and a detection control module 150.

The first terminal of the switch module 140 is connected to the power source VCC, and the second terminal of the switch module 140 is connected to the plasma source 120. Thus, when the switch module 140 is turned on, the power source VCC outputs electric energy to the plasma source 120, so that the plasma source 120 generates the plasma 122; when the switching module 140 is turned off, the power supply VCC stops outputting power to the plasma source 120.

The input end of the detection control module 150 is connected to the second surface 134 of the power generation electrode 130 for detecting the voltage of the power generation electrode 130, and the output end of the detection control module 150 is connected to the control end of the switch module 140 for controlling the on and off of the switch module 140. A preset voltage may be set in the detection control module 150.

When the plasma power generation system 10 starts to operate, the detection control module 150 may control the switch module 140 to be turned on. After the switch module 140 is turned on, the plasma source 120 generates the plasma 122 under the action of the power source VCC. When the plasma 122 moves and is received on the first surface 132 of the power generation electrode 130, the power generation electrode 130 starts to have electric charges. As the amount of charge increases, the voltage of the power generation electrode 130 also gradually increases. When the voltage of the power generating electrode 130 is greater than the preset voltage, the power generating electrode 130 may output electric energy. When the second surface 134 of the power generation electrode 130 outputs electric energy, the load module 160 may be connected between the second surface 134 of the power generation electrode 130 and the plasma source 120, and at this time, charges are returned from the second surface 134 of the power generation electrode 130 to the plasma source 120 through the load module 160, thereby forming a conductive path. Thus, the plasma source 120 may also generate the plasma 122 because the charge returns to the plasma source 120, which may not require the power supply VCC. Therefore, the detection control module 150 may control the switch module 140 to be turned off when the voltage of the power generation electrode 130 is greater than the preset voltage, so as to prevent the electric energy output by the second surface 134 of the power generation electrode 130 from flowing back to the power source VCC.

In the present embodiment, the plasma power generation system 10 includes a plasma confinement device 110, a plasma source 120, and a power generation electrode 130. The plasma confinement arrangement 110 is used to form a confinement field 1102 and the plasma source 120 is used to generate a plasma 122. The generating electrode 130 has a first surface 132 and a second surface 134, and the first surface 132 of the generating electrode 130 is located between the second surface 134 of the generating electrode 130 and the plasma source 120. In operation of the plasma power generation system 10, the charged plasma 122 generated by the plasma source 120 moves within the confinement region of the confinement field 1102 formed by the plasma confinement device 110, and is received by the first surface 132 of the power generation electrode 130 after moving to the first surface 132 of the power generation electrode 130. The generating electrode 130 has a predetermined shape such that charges charged by the plasma 122 received at the first surface 132 of the generating electrode 130 tend to be distributed in an electrostatic equilibrium and migrate to the second surface 134 of the generating electrode 130. After the charges carried by the plasma 122 are transferred to the second surface 134 of the power generation electrode 130, the second surface 134 of the power generation electrode 130 outputs electric energy, and meanwhile, the charges of the plasma 122 are transferred to reduce the plasma 122 into neutral substances, so that the power generation electrode 130 can be prevented from being continuously corroded by the charged plasma 122, the corrosion of the charged plasma 122 to the power generation electrode 130 can be reduced, and the service life of the plasma power generation system 10 can be prolonged. Meanwhile, during thermal movement of the plasma 122 within the confinement range of the confinement field 1102, the density of the plasma 122 at the plasma source 120 is greater than the charge density of the first surface 132 of the power generation electrode 130, which may further facilitate movement of the plasma 122 from the plasma source 120 to the power generation electrode 130.

The plasma confinement device 110 may be a magnetic mirror, and a magnetic field formed by the magnetic mirror is a confinement field 1102, so that the plasma 122 is prevented from moving outside the confinement range of the confinement field 1102, and the power generation efficiency of the plasma power generation system 10 is improved. Meanwhile, the plasma 122 moves to the first surface 132 of the power generation electrode 130 in a thermal motion manner within the range of the confinement field 1102 formed by the magnetic mirror, so that the overhigh temperature of the power generation working medium of the plasma 122 can be avoided, and the service life of the plasma power generation system 10 is further prolonged. The plasma confinement device 110 can be an electrostatic lens, and the electric field formed by the electrostatic lens is the confinement field 1102. Due to the converging action of the electrostatic lens on the plasma 122, the plasma 122 may be prevented from moving outside the confinement range of the confinement field 1102. Meanwhile, during the movement of the plasma 122 within the confinement range of the confinement field 1102 formed by the electrostatic lens, the density of the plasma 122 at the plasma source 120 is greater than the charge density of the first surface 132 of the power generation electrode 130, which may further facilitate the movement of the plasma 122 from the plasma source 120 to the power generation electrode 130. The plasma confinement arrangement 110 can also include a switching module 140 and a detection control module 150. The switch module 140 is connected between the power source VCC and the plasma source 120. The detection control module 150 may control the switch module 140 to be turned off when the voltage of the power generation electrode 130 is greater than a preset voltage, so as to prevent the electric energy output from the second surface 134 of the power generation electrode 130 from flowing back to the power source VCC.

The above-mentioned embodiments are only used for illustrating the technical solutions of the present application, and not for limiting the same; although the present application has been described in detail with reference to the foregoing embodiments, it should be understood by those of ordinary skill in the art that: the technical solutions described in the foregoing embodiments may still be modified, or some technical features may be equivalently replaced; such modifications and substitutions do not substantially depart from the spirit and scope of the embodiments of the present application and are intended to be included within the scope of the present application.