阅读说明：本技术 一种阵列式指示光栅结构及其生产工艺 (Array type indicating grating structure and production process thereof ) 是由 不公告发明人 于 2019-12-06 设计创作，主要内容包括：本发明涉及一种阵列式指示光栅结构及其生产工艺,包括基板和安装在基板中的圆形光学玻璃,所述圆形光学玻璃中部设有多个指示光栅刻线,指示光栅刻线阵列式横向排列,相邻两个指示光栅刻线之间的栅距为19.5μm,指示光栅刻线为矩形且栅宽为9.75μm,指示光栅刻线上方设有零位基准电压光栅窗口而下方设有零位光栅窗口,指示光栅刻线阵列式横向排列,制造简单方便便于大批量生产,而栅距为19.5μm、栅宽为9.75μm的指示光栅与栅距为20μm、栅宽为10μm的主光栅相配合能够形成相位标准,提高位移信号准确度。(The invention relates to an array type indication grating structure and a production process thereof, and the array type indication grating structure comprises a substrate and circular optical glass arranged in the substrate, wherein a plurality of indication grating lines are arranged in the middle of the circular optical glass, the indication grating lines are arranged in an array type transversely, the grid distance between two adjacent indication grating lines is 19.5 mu m, the indication grating lines are rectangular, the grid width is 9.75 mu m, a zero reference voltage grating window is arranged above the indication grating lines, a zero grating window is arranged below the indication grating lines, the indication grating lines are arranged in an array type, the manufacture is simple and convenient, the mass production is convenient, and the indication grating with the grid distance of 19.5 mu m and the grid width of 9.75 mu m is matched with a main grating with the grid distance of 20 mu m and the grid width of 10 mu m to form a phase standard, so that the accuracy of.)

1. An array type indication grating structure, which comprises a substrate and a circular optical glass arranged in the substrate, and is characterized in that: the middle of the circular optical glass is provided with a plurality of indicating grating lines which are transversely arranged in an array manner, the grid distance between every two adjacent indicating grating lines is 19.5 mu m, the indicating grating lines are rectangular, the grid width is 9.75 mu m, and the indicating gratings are matched with a main grating with the grid distance of 20 mu m and the grid width of 10 mu m.

2. An array indicator grating structure according to claim 1, wherein: a zero reference voltage grating window is arranged above the indication grating reticle, and a zero grating window is arranged below the indication grating reticle.

3. A production process of an array type indicating grating structure is characterized in that: comprises the following steps of (a) carrying out,

① selecting materials, selecting circular optical glass with proper size, and coating photoresist on the surface of the circular optical glass;

② exposure, primarily transferring the figure matched with the grating reticle on the mask plate to the photoresist;

③ developing to dissolve the pattern of the unexposed part in the photoresist to display the pattern of the grating sheet;

④, and fixing the patterns developed in step ③ to obtain transversely arranged grating lines in an array in one step, wherein the pitch between two adjacent indicator grating lines is 19.5 μm, the indicator grating lines are rectangular and the width of the indicator grating lines is 9.75 μm.

4. The process of claim 3, wherein the array type indicator grating structure comprises: after the fixing is finished, the circular optical glass is subjected to precision measurement, and if a defect is found, the circular optical glass is repaired and then cleaned; if no defect exists, the cleaning is directly carried out, and finally, a dustproof film is attached.

Technical Field

The invention relates to the field of grating equipment, in particular to an array type indicating grating structure and a production process thereof.

Background

The grating is a high-precision displacement measuring element, which is matched with a digital signal processing instrument to form a displacement measuring system, a light source emits parallel light to irradiate a main grating, an indicating grating and a receiver, and when the light source, the indicating grating and the receiver move together with a moving object and the main grating is not in motion, the parallel light passes through the main grating and the indicating grating to reach the receiver to form Moire fringes with alternate light and shade, so that a sine wave signal is generated to sense the moving displacement of the moving object. The existing indicating grating has the defects of complex structure, high manufacturing difficulty and low precision, and can not form a stable and accurate signal with a main grating to influence displacement detection.

Disclosure of Invention

Aiming at the defects of the prior art, the invention provides an array type indication grating structure and a production process thereof, and the specific technical scheme is as follows:

an array type indication grating structure comprises a substrate and circular optical glass arranged in the substrate, wherein a plurality of indication grating lines are arranged in the middle of the circular optical glass, the indication grating lines are arrayed transversely, the grid distance between every two adjacent indication grating lines is 19.5 micrometers, the indication grating lines are rectangular, the grid width is 9.75 micrometers, and the indication gratings are matched with a main grating with the grid distance being 20 micrometers and the grid width being 10 micrometers.

As a preferred scheme of the invention, a zero reference voltage grating window is arranged above the indication grating ruling and a zero grating window is arranged below the indication grating ruling.

A production process of an array type indicating grating structure comprises the following steps,

① selecting materials, selecting circular optical glass with proper size, and coating photoresist on the surface of the circular optical glass;

② exposure, primarily transferring the figure matched with the grating reticle on the mask plate to the photoresist;

③ developing to dissolve the pattern of the unexposed part in the photoresist to display the pattern of the grating sheet;

④, and fixing the patterns developed in step ③ to obtain transversely arranged grating lines in an array in one step, wherein the pitch between two adjacent indicator grating lines is 19.5 μm, the indicator grating lines are rectangular and the width of the indicator grating lines is 9.75 μm.

As a preferable scheme of the invention, after the fixing is finished, the round optical glass is repaired and cleaned after precision measurement is carried out on the round optical glass if a defect is found; if no defect exists, the cleaning is directly carried out, and finally, a dustproof film is attached.

The invention has the beneficial effects that: the indication gratings are transversely arranged in a groove array manner, the manufacture is simple and convenient, the mass production is convenient, the phase standard can be formed by matching the indication gratings with the grating distance of 19.5 mu m and the grating width of 9.75 mu m with the main gratings with the grating distance of 20 mu m and the grating width of 10 mu m, and the accuracy of displacement signals is improved.

Drawings

FIG. 1 is a schematic diagram of a grating detecting displacement;

FIG. 2 is a schematic diagram of an array type indicating grating structure according to the present invention;

FIG. 3 is an enlarged view at A in FIG. 2;

FIG. 4 is a schematic diagram of the main grating and the indicating grating cooperating to produce moire fringes according to the present invention. .

Detailed Description

The following description of the embodiments of the present invention will be made with reference to the accompanying drawings:

in the description of the present invention, it should be noted that the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer", etc., indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings, and are only for convenience of description and simplicity of description, but do not indicate or imply that the positions or elements referred to must have specific orientations, be constructed and operated in specific orientations, and thus, should not be construed as limiting the present invention.

In the description of the present invention, it should be noted that, unless otherwise explicitly specified or limited, the terms "mounted," "connected," and "connected" are to be construed broadly, e.g., as meaning either a fixed connection, a removable connection, or an integral connection; can be mechanically or electrically connected; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. The specific meaning of the above terms in the present invention can be understood as appropriate by those of ordinary skill in the art.

As shown in fig. 1 to 3, an array type indication grating structure includes a substrate 1 and a circular optical glass 2 installed in the substrate 1, wherein a plurality of indication grating lines 3 are arranged in the middle of the circular optical glass 2, the indication grating lines 3 are arranged in an array type transversely, a grating distance between two adjacent indication grating lines 3 is 19.5 μm, the indication grating lines are opaque, the indication grating lines 3 are rectangular and have a grating width of 9.75 μm, and the indication grating is matched with a main grating having a grating distance of 20 μm and a grating width of 10 μm.

Specifically, a zero-position reference voltage grating window 4 is arranged above the indication grating groove 3, a zero-position grating window 5 is arranged below the indication grating groove, and grating grooves are also arranged in the zero-position reference voltage grating window 4 and the zero-position grating window 5.

A production process of an array type indicating grating structure comprises the following steps,

① selecting materials, selecting circular optical glass with proper size, and coating photoresist on the surface of the circular optical glass;

② exposure, primarily transferring the figure matched with the grating reticle on the mask plate to the photoresist;

③ developing to dissolve the pattern of the unexposed part in the photoresist to display the pattern of the grating sheet;

④, fixing, and shaping the array-type transversely-arranged grating lines at one time according to the graph developed in the step ③, wherein the grid distance between two adjacent indication grating lines is 19.5 μm, the indication grating lines are rectangular and the grid width is 9.75 μm, the grating lines are integrally manufactured at one time through a photoetching process, the mounting is not needed one by one, and the high precision error is small.

After the fixing is finished, the circular optical glass is repaired and cleaned after precision measurement is carried out on the circular optical glass if defects are found; if no defect exists, the cleaning is directly carried out, and finally, a dustproof film is attached.

The above description is for the purpose of describing the invention in more detail with reference to specific preferred embodiments, and it should not be construed that the embodiments of the invention are limited to those described herein, and it will be apparent to those skilled in the art that various changes and modifications can be made without departing from the spirit and scope of the invention.