阅读说明：本技术 激光能量补偿系统、激光晶化装置及补偿激光能量的方法 (Laser energy compensation system, laser crystallization device and method for compensating laser energy ) 是由 安永军 王豪 张世权 于 2019-09-20 设计创作，主要内容包括：本发明公开了一种激光能量补偿系统、激光晶化装置及补偿激光能量的方法,该激光能量补偿系统包括：第一分束器、调整模块和监控模块,第一分束器用于接收激光信号,将激光信号分成第一束激光信号及第二束激光信号,并将第一束激光信号传输至监控模块,将第二束激光信号传输至调整模块；监控模块用于判断第一束激光信号是否发生变化,并将判断结果传输至调整模块；调整模块用于根据判断结果对第二束激光信号进行调整,并将调整后的第二束激光信号传输至激光信号所在光路。通过实施本发明,不仅可以监控激光能量变化,还可以对激光能量进行补偿,使得激光能量保持稳定,解决了现有激光晶化装置无法使激光能量保持稳定的技术问题。(The invention discloses a laser energy compensation system, a laser crystallization device and a method for compensating laser energy, wherein the laser energy compensation system comprises: the laser signal processing system comprises a first beam splitter, an adjusting module and a monitoring module, wherein the first beam splitter is used for receiving a laser signal, dividing the laser signal into a first beam of laser signal and a second beam of laser signal, transmitting the first beam of laser signal to the monitoring module and transmitting the second beam of laser signal to the adjusting module; the monitoring module is used for judging whether the first beam of laser signal changes or not and transmitting a judgment result to the adjusting module; the adjusting module is used for adjusting the second laser signal according to the judgment result and transmitting the adjusted second laser signal to the optical path where the laser signal is located. By implementing the invention, the laser energy change can be monitored, and the laser energy can be compensated, so that the laser energy is kept stable, and the technical problem that the existing laser crystallization device can not keep the laser energy stable is solved.)

1. A laser energy compensation system, comprising: a first beam splitter, an adjusting module and a monitoring module,

the first beam splitter is used for receiving a laser signal, splitting the laser signal into a first beam of laser signal and a second beam of laser signal, transmitting the first beam of laser signal to the monitoring module, and transmitting the second beam of laser signal to the adjusting module;

the monitoring module is used for judging whether the first beam of laser signal changes or not and transmitting a judgment result to the adjusting module;

and the adjusting module is used for adjusting the second laser signal according to the judgment result and transmitting the adjusted second laser signal to the optical path where the laser signal is located.

2. The laser energy compensation system of claim 1, wherein the adjustment module comprises: the system comprises a first attenuator, an amplifier, a microprocessor and a laser combiner;

the microprocessor is connected with the attenuator and the amplifier, and is used for controlling the first attenuator and/or the amplifier to adjust the second beam of laser signals according to the judgment result and transmitting the adjusted second beam of laser signals to a first inlet of the laser combiner;

the first inlet of the laser combiner is configured to receive the adjusted second laser signal, the second inlet of the laser combiner is configured to receive an original laser signal, and the laser combiner is configured to combine the adjusted second laser signal and the original laser signal and output the combined signal to a light path where the original laser signal is located through an outlet of the laser combiner.

3. The laser energy compensation system of claim 2, wherein the monitoring module comprises: a monitor and a second attenuator, wherein the second attenuator is arranged on the monitor,

the second attenuator is used for attenuating the first laser signal and then transmitting the first laser signal to the monitor;

the monitor is used for judging whether the attenuated first beam of laser signal changes or not and transmitting a judgment result to the adjusting module.

4. The laser energy compensation system of claim 2, wherein the adjustment module further comprises: and the first reflector is used for receiving the adjusted second laser signal and reflecting the adjusted second laser signal to the first inlet of the laser combiner.

5. The laser energy compensation system of claim 3, wherein the monitoring module further comprises: and the second reflector is used for receiving the first laser signal and reflecting the first laser signal to the second attenuator.

6. A laser crystallization apparatus, comprising: a laser, a second beam splitter, and a laser energy compensation system according to any of claims 1-5,

the second beam splitter is used for receiving a laser signal, dividing the laser signal into a third beam of laser signal and a fourth beam of laser signal, using the third beam of laser signal to irradiate a product to be processed, and transmitting the fourth beam of laser signal to the laser energy compensation system;

the laser energy compensation system is used for monitoring whether the fourth laser signal changes, and when the fourth laser signal changes, the laser energy compensation system is used for adjusting the fourth laser signal and transmitting the adjusted fourth laser signal to a light path where the laser signal is located.

7. The laser crystallization apparatus of claim 6, further comprising: and the third reflector is used for receiving the fourth laser signal and reflecting the fourth laser signal to the laser energy compensation system.

8. The laser crystallization apparatus of claim 6, further comprising: and the linear conversion system is used for receiving the compensated third laser signal, converting the compensated third laser signal into a line beam and irradiating the line beam to a product to be processed.

9. The laser crystallization apparatus of claim 7, further comprising: and the bearing platform is used for bearing the product to be processed, and the product to be processed is a substrate containing a film to be crystallized.

10. A method of compensating laser energy in a laser crystallization apparatus, applied to the laser crystallization apparatus as claimed in any one of claims 6 to 9,

the second beam splitter is used for receiving laser signals, dividing the laser signals into a third beam of laser signals and a fourth beam of laser signals, using the third beam of laser signals to irradiate a product to be processed, and transmitting the fourth beam of laser signals to the laser energy compensation system;

and monitoring whether the fourth laser signal changes or not through the laser energy compensation system, adjusting the fourth laser signal through the laser energy compensation system when the fourth laser signal changes, and transmitting the adjusted laser signal to a light path where the laser signal is located for compensation.

Technical Field

The invention relates to the technical field of laser, in particular to a laser energy compensation system, a laser crystallization device and a method for compensating laser energy.

Background

At present, in LTPS (Low Temperature Poly-Silicon, P-Si for short), a glass substrate coated with an A-Si (Amorphous Silicon, A-Si for short) film layer is irradiated by laser, so that the A-Si is melted and recrystallized to generate a P-Si film. This process is generally called a laser crystallization process, and stability and uniformity of laser energy irradiated on the surface of a-Si are one of important factors determining crystallization uniformity.

However, the laser inevitably has certain energy fluctuation during the use process due to the accumulation of self heat, the thermal expansion of the device, the change of the environmental temperature and humidity, and other factors. Meanwhile, the laser also has a certain service life, and the energy can be attenuated after long-term use. The existing laser crystallization device can only monitor whether the laser energy changes or not, and the laser energy can not be kept stable.

Disclosure of Invention

In view of this, the present invention provides a laser energy compensation system, a laser crystallization apparatus and a method for compensating laser energy, so as to solve the technical problem that the laser crystallization apparatus in the prior art can only monitor whether the laser energy changes, and cannot keep the laser energy stable.

The technical scheme provided by the invention is as follows:

a first aspect of an embodiment of the present invention provides a laser energy compensation system, including: the laser monitoring system comprises a first beam splitter, an adjusting module and a monitoring module, wherein the first beam splitter is used for receiving a laser signal, dividing the laser signal into a first beam of laser signal and a second beam of laser signal, transmitting the first beam of laser signal to the monitoring module and transmitting the second beam of laser signal to the adjusting module; the monitoring module is used for judging whether the first beam of laser signal changes or not and transmitting a judgment result to the adjusting module; and the adjusting module is used for adjusting the second laser signal according to the judgment result and transmitting the adjusted second laser signal to the optical path where the laser signal is located.

Optionally, the adjusting module includes: the system comprises a first attenuator, an amplifier, a microprocessor and a laser combiner; the microprocessor is connected with the attenuator and the amplifier, and is used for controlling the first attenuator and/or the amplifier to adjust the second beam of laser signals according to the judgment result and transmitting the adjusted second beam of laser signals to a first inlet of the laser combiner; the first inlet of the laser combiner is configured to receive the adjusted second laser signal, the second inlet of the laser combiner is configured to receive an original laser signal, and the laser combiner is configured to combine the adjusted second laser signal and the original laser signal and output the combined signal to a light path where the original laser signal is located through an outlet of the laser combiner.

Optionally, the monitoring module includes: the second attenuator is used for transmitting the first laser beam signal to the monitor after being attenuated; the monitor is used for judging whether the attenuated first beam of laser signal changes or not and transmitting a judgment result to the adjusting module.

Optionally, the adjusting module further comprises: and the first reflector is used for receiving the adjusted second laser signal and reflecting the adjusted second laser signal to the first inlet of the laser combiner.

Optionally, the monitoring module further comprises: and the second reflector is used for receiving the first laser signal and reflecting the first laser signal to the second attenuator.

A second aspect of an embodiment of the present invention provides a laser crystallization apparatus, including: the laser energy compensation system comprises a laser, a second beam splitter and the laser energy compensation system according to any one of the first aspect and the first aspect of the embodiment of the invention, wherein the second beam splitter is used for receiving a laser signal, dividing the laser signal into a third laser signal and a fourth laser signal, using the third laser signal to irradiate a product to be processed, and transmitting the fourth laser signal to the laser energy compensation system; the laser energy compensation system is used for monitoring whether the fourth laser signal changes, and when the fourth laser signal changes, the laser energy compensation system is used for adjusting the fourth laser signal and transmitting the adjusted fourth laser signal to a light path where the laser signal is located.

Optionally, the laser crystallization apparatus further includes: and the third reflector is used for receiving the fourth laser signal and reflecting the fourth laser signal to the laser energy compensation system.

Optionally, the laser crystallization apparatus further includes: and the linear conversion system is used for receiving the compensated third laser signal, converting the compensated third laser signal into a line beam and irradiating the line beam to a product to be processed.

Optionally, the laser crystallization apparatus further includes: and the bearing platform is used for bearing the product to be processed, and the product to be processed is a substrate containing a film to be crystallized.

The third aspect of the embodiments of the present invention provides a method for compensating laser energy by using a laser crystallization apparatus, which is applied to the laser crystallization apparatus according to any one of the second aspect and the second aspect of the embodiments of the present invention, the method including: the second beam splitter is used for receiving laser signals, dividing the laser signals into a third beam of laser signals and a fourth beam of laser signals, using the third beam of laser signals to irradiate a product to be processed, and transmitting the fourth beam of laser signals to the laser energy compensation system; and monitoring whether the fourth laser signal changes or not through the laser energy compensation system, adjusting the fourth laser signal through the laser energy compensation system when the fourth laser signal changes, and transmitting the adjusted laser signal to a light path where the laser signal is located for compensation.

The technical scheme provided by the invention has the following advantages:

according to the laser energy compensation system, the laser crystallization device and the method for compensating laser energy provided by the embodiment of the invention, the first beam splitter is arranged to transmit the laser energy to be monitored to the adjusting module and the monitoring module respectively, the monitoring module can monitor whether the laser energy changes, when the laser energy changes suddenly, the monitoring module is used for transmitting the judgment result to the adjusting module, and the adjusting module can determine the laser sudden change amount according to the judgment result and compensate the laser energy, so that the laser energy is kept stable. When the laser energy compensation system is used in a laser crystallization device or laser annealing equipment, the stability of laser irradiated on the surface of A-Si can be improved, the occurrence rate of crystallization defects is reduced, and the crystallization yield is improved.

Drawings

In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the description of the embodiments or the prior art will be briefly described below, and it is obvious that the drawings in the following description are some embodiments of the present invention, and other drawings can be obtained by those skilled in the art without creative efforts.

FIG. 1 is a laser energy jump curve in a conventional laser crystallization apparatus;

FIG. 2 is a block diagram of a conventional laser crystallization apparatus;

FIG. 3 is a schematic block diagram of a laser energy compensation system in an embodiment of the present invention;

FIG. 4 is a schematic block diagram of a laser crystallization apparatus according to an embodiment of the present invention;

FIG. 5 is a flowchart illustrating a method for compensating laser energy by a laser crystallization apparatus according to an embodiment of the present invention.

Detailed Description

The technical solutions of the present invention will be described clearly and completely with reference to the accompanying drawings, and it should be understood that the described embodiments are some, but not all embodiments of the present invention. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.

In the description of the present invention, it should be noted that the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer", etc., indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings, and are only for convenience of description and simplicity of description, but do not indicate or imply that the device or element being referred to must have a particular orientation, be constructed and operated in a particular orientation, and thus, should not be construed as limiting the present invention. Furthermore, the terms "first," "second," and "third" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance.

In the description of the present invention, it should be noted that, unless otherwise explicitly specified or limited, the terms "mounted," "connected," and "connected" are to be construed broadly, e.g., as meaning either a fixed connection, a removable connection, or an integral connection; can be mechanically or electrically connected; the two elements may be directly connected or indirectly connected through an intermediate medium, or may be communicated with each other inside the two elements, or may be wirelessly connected or wired connected. The specific meanings of the above terms in the present invention can be understood in specific cases to those skilled in the art.

In addition, the technical features involved in the different embodiments of the present invention described below may be combined with each other as long as they do not conflict with each other.

As described in the background art, in the process of crystallizing an a-Si film layer by using a conventional laser crystallization apparatus or laser annealing equipment, as shown in fig. 1, laser energy may suddenly change at a certain moment, the size of P-Si crystal grains generated by sudden laser irradiation is greatly suddenly changed, the uniformity of the generated P-Si film layer is reduced, and a relatively significant crystallization defect occurs. In order to solve the problem of sudden change of laser energy in the prior art, a laser energy monitor is arranged in a laser crystallization device or laser annealing equipment, as shown in fig. 2, the existing laser crystallization device comprises a laser 1 for emitting laser, 3 total reflection mirrors 2 for changing the direction of a light path, a beam splitter 3 for splitting part of the laser into laser energy monitors 4, an attenuator 5 arranged in front of the laser energy monitor 4 for attenuating the split laser, and an optical system 6 for changing the properties of a light beam. However, when the laser crystallization device is used for crystallizing the A-Si film layer, only the change of laser energy can be monitored, and the laser energy cannot be kept stable.

Based on this, an embodiment of the present invention provides a laser energy compensation system, as shown in fig. 3, the laser energy compensation system includes: the laser monitoring system comprises a first beam splitter 10, an adjusting module 20 and a monitoring module 30, wherein the first beam splitter 10 is used for receiving a laser signal W, dividing the laser signal W into a first laser signal Wc and a second laser signal Wd, transmitting the first laser signal Wc to the monitoring module 30 and transmitting the second laser signal Wd to the adjusting module 20; the monitoring module 30 is configured to determine whether the first beam of laser signal Wc changes, and transmit a determination result to the adjusting module 20; the adjusting module 20 is configured to adjust the second laser signal Wd according to the determination result, and transmit the adjusted second laser signal W2 to the optical path where the laser signal W is located.

The laser energy compensation system provided by the embodiment of the invention can be used in a device needing to compensate laser, can form a closed loop with a corresponding device, and monitors and compensates the change of laser energy in real time. Specifically, the laser signal W may be a laser signal emitted by a laser, and after the laser energy compensation system operates, the laser signal W is a sum of the laser signal emitted by the laser and the adjusted second beam laser signal W2.

Optionally, the laser energy compensation system provided by the embodiment of the invention may be used in a laser crystallization device or a laser annealing apparatus, and monitor the change of the laser energy, and compensate the laser energy according to the change of the laser energy, so that the laser energy is kept stable. In addition, the laser energy compensation system provided in the embodiment of the present invention may also be used in other devices that need to compensate for laser energy, which is not limited in the present invention.

According to the laser energy compensation system provided by the embodiment of the invention, the first beam splitter is arranged to transmit the laser energy to be monitored to the adjusting module and the monitoring module respectively, the monitoring module can monitor whether the laser energy changes, when the laser energy changes suddenly, the monitoring module is used for transmitting the judgment result to the adjusting module, and the adjusting module can determine the laser sudden change amount according to the judgment result and compensate the laser energy, so that the laser energy is kept stable. When the laser energy compensation system is used in a laser crystallization device or laser annealing equipment, the stability of laser irradiated on the surface of A-Si can be improved, the occurrence rate of crystallization defects is reduced, and the crystallization yield is improved.

As an optional implementation manner of the embodiment of the present invention, as shown in fig. 3, the adjusting module 20 may include: a first attenuator 21, an amplifier 22, a microprocessor 23, and a laser combiner 24; the microprocessor 23 is connected to the first attenuator 21 and the amplifier 22, and the microprocessor 23 is configured to control the first attenuator 21 and/or the amplifier 22 to adjust the second laser signal Wd according to the determination result, and transmit the adjusted second laser signal W2 to the first inlet of the laser combiner 24; the first input of the laser combiner 24 is configured to receive the adjusted second laser signal W2, the second input of the laser combiner 24 is configured to receive the original laser signal W1, and the laser combiner 24 is configured to combine the adjusted second laser signal W2 and the original laser signal W1, and output the combined signal to the optical path where the original laser signal W1 is located from the output of the laser combiner 24. The laser signal W output from the laser combiner 24 can again enter the monitoring module 30 and the adjusting module 20 through the first beam splitter 10 for monitoring and compensation, so that a closed-loop control loop can be formed for the laser signal W.

According to the laser energy compensation system provided by the embodiment of the invention, the first attenuator and the amplifier are arranged in the adjusting module, and when the laser energy changes suddenly, the microprocessor can control the first attenuator and/or the amplifier to increase or attenuate the laser energy for compensation, so that the original laser signal is in a stable state.

As an optional implementation manner of the embodiment of the present invention, as shown in fig. 3, the monitoring module 30 may include: a monitor 31 and a second attenuator 32, wherein the second attenuator 32 is used for transmitting the first laser signal Wc to the monitor 31 after attenuating; the monitor 31 is configured to determine whether the attenuated first laser beam changes, and transmit a determination result to the adjusting module 20.

According to the laser energy compensation system provided by the embodiment of the invention, the second attenuator is arranged in the monitoring module, and the second attenuator can attenuate the first laser signal and transmit the first laser signal to the monitor, so that the damage to the monitor caused by the overlarge energy of the first laser signal is avoided.

As an optional implementation manner of the embodiment of the present invention, as shown in fig. 3, the adjusting module 20 may further include: a first mirror 25, the first mirror 25 being configured to receive the adjusted second laser signal W2 and reflect the adjusted second laser signal W2 to the first entrance of the laser combiner 24.

As an optional implementation manner of the embodiment of the present invention, as shown in fig. 3, the monitoring module may further include: and a second mirror 33, wherein the second mirror 33 is configured to receive the first laser signal Wc and reflect the first laser signal Wc to the second attenuator 32.

Optionally, the laser power compensation system may further include two mirrors 11 and 12, and the two mirrors 11 and 12 are used for reflecting the laser signal W to the first beam splitter 10.

According to the laser energy compensation system provided by the embodiment of the invention, the reflecting mirrors are arranged in the adjusting module and the monitoring module, so that the propagation direction of the laser signal in the optical path can be changed, and the laser signal can be transmitted to the corresponding element.

Optionally, the first mirror 25, the second mirror 33, and the mirrors 11 and 12 may be total reflection mirrors, the total reflection mirrors may reduce energy loss of the laser signal during the reflection process, and in addition, the first mirror 25, the second mirror 33, and the mirrors 11 and 12 may also be other elements that implement the reflection function, which is not limited in the present invention.

An embodiment of the present invention further provides a laser crystallization apparatus, as shown in fig. 4, the laser crystallization apparatus includes: the laser device 40, the second beam splitter 41, and the laser energy compensation system 42 according to any one of the above embodiments, wherein the second beam splitter 41 is configured to receive the laser signal W, divide the laser signal W into a third laser signal Wa and a fourth laser signal Wb, use the third laser signal Wa to irradiate a product to be processed, and transmit the fourth laser signal Wb to the laser energy compensation system 42; the laser energy compensation system 42 is configured to monitor whether the fourth laser signal Wb changes, and when the fourth laser signal Wb changes, the laser energy compensation system 42 is configured to adjust the fourth laser signal Wb and transmit the adjusted fourth laser signal W2 to an optical path where the laser signal W is located.

In the laser crystallization apparatus provided in the embodiment of the present invention, the laser energy compensation system is arranged in the laser crystallization apparatus, and a laser energy closed-loop control system can be formed with the existing laser crystallization apparatus to monitor the original laser signal emitted by the laser in real time, specifically, after the laser energy compensation system starts to work, the laser signal W includes the original laser signal W emitted by the laser and the adjusted fourth laser signal W2, so that the laser crystallization apparatus can not only monitor the change of the laser energy irradiating the product to be processed in real time, but also compensate the laser energy when the laser energy changes suddenly, so that the laser energy irradiating the product to be processed is in a dynamic stable state.

As an optional implementation manner of the embodiment of the present invention, as shown in fig. 4, the laser crystallization apparatus may further include: and a third reflector 43, wherein the third reflector 43 is configured to receive the fourth laser signal Wb and reflect the fourth laser signal Wb to the laser energy compensation system 42. By providing the third mirror 43 in the laser crystallization apparatus, the propagation direction of the fourth laser signal Wb can be changed so that the fourth laser signal Wb can be transmitted to the laser energy compensation system 42.

Optionally, as shown in fig. 4, the laser crystallization apparatus may further include a fourth mirror 44, a fifth mirror 45, and a sixth mirror 46, wherein the third mirror 43, the fourth mirror 44, the fifth mirror 45, and the sixth mirror 46 may continuously change the propagation direction of the fourth laser signal Wb in the laser crystallization apparatus, so that the fourth laser signal Wb may be finally transmitted to the laser energy compensation system 42. The provision of a plurality of mirrors in the laser crystallization apparatus can make the reflected fourth laser signal Wb far away from the optical path of the original laser signal W1, which facilitates sufficient space in the laser crystallization apparatus for the laser energy compensation system 42 to be disposed, and also makes the beam vertically downward before being reflected by the sixth mirror 46 to the laser energy compensation system 42.

Optionally, the third reflector 43 to the sixth reflector 46 may be total reflectors, the total reflectors may reduce energy loss of the laser signal in the reflection process, and the third reflector 43 to the sixth reflector 46 may also be other elements for implementing the reflection function, which is not limited in the present invention. Meanwhile, the laser crystallization device provided by the embodiment of the invention is not limited to the plurality of reflectors, and more reflectors can be arranged in the laser crystallization device to realize the reflection function.

As an optional implementation manner of the embodiment of the present invention, as shown in fig. 4, the laser crystallization apparatus may further include: and the linear conversion system 47 is used for receiving the compensated third beam of laser signal, converting the compensated third beam of laser signal into a line beam, and irradiating the line beam to a product to be processed. Specifically, the original laser light emitted from the laser 40 is usually a point beam, and the linear optical system 47 can convert the point beam into a line beam to irradiate on the product to be processed, so as to facilitate the crystallization of the product to be processed.

As an optional implementation manner of the embodiment of the present invention, the laser crystallization apparatus may further include: and the bearing platform 48 is used for bearing a product to be processed, wherein the product to be processed is a substrate containing a film to be crystallized. Alternatively, the film to be crystallized may be an a-Si film layer.

As shown in fig. 4, in the laser crystallization apparatus provided in the embodiment of the present invention, a laser capability compensation system compensates an original laser signal W1 according to an adjusted fourth laser signal W2 to obtain a laser signal W, a second beam splitter 41 divides the laser signal W into a third laser signal Wa and a fourth laser signal Wb, and a first beam splitter 10 in the laser energy compensation system 42 divides the fourth laser signal Wb into a first laser signal Wc and a second laser signal Wd, assuming that a splitting ratio of the first beam splitter 10 is f 3: f4, the splitting ratio of the second beam splitter 41 is f 1: f2, the attenuation ratio of the first attenuator is k2, the amplification ratio of the amplifier is k1, and assuming that the loss of the laser light during transmission is 0, the following formulas (1) to (6) can be obtained from the transmission of the laser signal in the laser crystallization apparatus.

W-W1 + W2 formula (1)

W ═ Wa + Wb formula (2)

Wa/Wb ═ f1/f2 formula (3)

Wb ═ Wc + Wd equation (4)

Wc/Wd f3/f4 equation (5)

W2 ═ (k1 ═ k2) × Wd equation (6)

The laser signal irradiated on the product to be processed by the laser crystallization device is Wa, so the value of Wa can be calculated according to the above formula (1) to formula (6), Wa can be expressed by formula (7),

specifically, the equality relationships between Wa and the variables W1, k1, k2 can be obtained according to the above formula (7); when the laser energy W1 emitted by the laser changes, the monitor 31 monitors the energy change, transmits the judgment result to the microprocessor 23, and the microprocessor 23 controls the parameter changes of k1 and k2, so that the Wa can be dynamically compensated and is in a dynamic stable state.

According to the laser crystallization device provided by the embodiment of the invention, the laser energy compensation system is arranged in the laser crystallization device, and the laser energy compensation is carried out in time when the laser energy change is monitored, so that closed-loop compensation control is formed, therefore, the laser crystallization device provided by the embodiment of the invention can improve the stability of laser irradiated on the surface of A-Si, reduce the occurrence rate of crystallization defects and improve the crystallization yield.

An embodiment of the present invention further provides a method for compensating laser energy by a laser crystallization apparatus, which is applied to the laser crystallization apparatus according to any one of the above embodiments, and as shown in fig. 5, the method includes the following steps:

step S101: the second beam splitter is adopted to receive the laser signal, divide the laser signal into a third beam of laser signal and a fourth beam of laser signal, use the third beam of laser signal for irradiating the product to be processed, and transmit the fourth beam of laser signal to the laser energy compensation system;

step S102: and monitoring whether the fourth laser signal changes or not through the laser energy compensation system, adjusting the fourth laser signal through the laser energy compensation system when the fourth laser signal changes, and transmitting the adjusted laser signal to a light path where the laser signal is located for compensation.

The method for compensating the laser energy of the laser crystallization device provided by the embodiment of the invention monitors whether the fourth laser signal changes through the laser energy monitoring system, and compensates the fourth laser signal when the fourth laser signal changes. Therefore, the method for compensating the laser energy by the laser crystallization device provided by the embodiment of the invention can improve the stability of the laser irradiated on the surface of the A-Si, reduce the occurrence rate of crystallization defects and improve the crystallization yield.

Although the present invention has been described in detail with respect to the exemplary embodiments and the advantages thereof, those skilled in the art will appreciate that various changes, substitutions and alterations can be made to the embodiments without departing from the spirit and scope of the invention as defined by the appended claims. For other examples, one of ordinary skill in the art will readily appreciate that the order of the process steps may be varied while maintaining the scope of the present invention.

Moreover, the scope of the present application is not intended to be limited to the particular embodiments of the process, machine, manufacture, composition of matter, means, methods and steps described in the specification. As one of ordinary skill in the art will readily appreciate from the disclosure of the present invention, processes, machines, manufacture, compositions of matter, means, methods, or steps, presently existing or later to be developed, that perform substantially the same function or achieve substantially the same result as the corresponding embodiments described herein may be utilized according to the present invention. Accordingly, the appended claims are intended to include within their scope such processes, machines, manufacture, compositions of matter, means, methods, or steps.