阅读说明：本技术 用于以介电阻挡方式进行等离子体处理的电极装置 (Electrode arrangement for plasma treatment in a dielectrically impeded manner ) 是由 迪尔克·万德克 米尔科·哈恩 里昂哈德·图尔蒂格 卡尔-奥托·施托克 梅拉妮·里克 于 2018-07-23 设计创作，主要内容包括：本发明涉及一种用于对物体的表面以介电阻挡方式进行等离子体处理的电极装置,所述电极装置具有至少一个柔性的、面状的电极(1)和由面状的、柔性的第一材料构成的电介质(2),所述电介质借助于阻碍直接的电流流动的层(3)保护电极(1)免受待处理的表面影响。所述电介质(2)能够经由具有突出部(7)的结构(4)放置在所述待处理的表面上,其中在所述突出部(7)之间构成用来构成等离子体的空气腔(5),所述空气腔具有朝向待处理的表面敞开的侧和通过电介质(2)的阻碍直接的电流流动的层(3)形成的底部侧的封闭部。所述结构(4)具有大量由第二材料构成的间隔元件(6),所述第二材料的柔性小于第一材料的柔性,并且结构(4)的突出部(7)部分地或者完全地通过间隔元件(6)形成。(The invention relates to an electrode device for the dielectrically impeded plasma treatment of a surface of an object, comprising at least one flexible, planar electrode (1) and a dielectric (2) made of a planar, flexible first material, which protects the electrode (1) from the surface to be treated by means of a layer (3) that impedes the direct flow of current. The dielectric (2) can be placed on the surface to be treated via a structure (4) having projections (7), wherein air chambers (5) for forming a plasma are formed between the projections (7), said air chambers having a side which is open toward the surface to be treated and a bottom-side closure which is formed by a layer (3) of the dielectric (2) which impedes the direct current flow. The structure (4) has a plurality of spacer elements (6) made of a second material, the flexibility of which is less than the flexibility of the first material, and the projections (7) of the structure (4) are formed partially or completely by the spacer elements (6).)

1. Electrode device for the dielectrically impeded treatment of a surface of an object with a flexible, planar electrode (1) and a dielectric (2) made of a planar, flexible first material, which protects the electrode (1) from the surface to be treated by means of a layer (3) that impedes the direct flow of current, wherein the dielectric (2) can be placed on the surface to be treated via a structure (4) having projections (7), and wherein air chambers (5) for forming a plasma are formed between the projections (7), which air chambers have a side that is open toward the surface to be treated and a bottom-side closure that is formed by the layer (3) of the dielectric (2) that impedes the direct flow of current, characterized in that the structure (4) has a plurality of spacer elements (6) made of a second material, the second material is less flexible than the first material, wherein the projections (7) of the structure (4) are formed partially or completely by the spacer elements (6).

2. The electrode device according to claim 1, characterized in that the spacer elements (6) are connected to each other via a connecting section (18) which has a smaller bending resistance and/or a smaller torsion resistance than the spacer elements (6).

3. The electrode device according to claim 1 or 2, characterized in that the spacing elements (6) are connected to one another by connecting tabs (14) and in this way constitute a spacing grid.

4. The electrode device as claimed in claim 3, wherein the spacer grid is constructed in one piece.

5. The electrode device according to any one of the preceding claims, characterized in that the spacer element (6) is embedded in the interior of the projection (7), in particular completely embedded in the interior of the projection (7), in order to reinforce the projection (7).

6. The electrode device according to claim 5, characterized in that the projection (7) of the structure (4) is formed by the spacing element (6) and the dielectric (2), wherein the spacing element (6) is embedded, in particular completely embedded, in the dielectric (2) surrounding the spacing element (6).

7. The electrode device according to claim 6, characterized in that the dielectric (2) surrounding the spacer element (6) is formed in one piece with a layer (3) of the dielectric (2) that impedes direct current flow.

8. The electrode device according to any one of claims 1 to 4, characterized in that the projection (7) of the structure (4) is formed completely by the spacer element (6), wherein the spacer element (6) is connected on its side facing the electrode (1) to the layer (3) of the dielectric (2) that counteracts direct current flow, and on its side facing the surface to be treated forms an abutment surface on the surface to be treated.

9. An electrode device according to any one of the preceding claims, characterized in that the structure (4) is a grid structure consisting of mutually adjoining walls forming the projections (7), which walls delimit a large number of chambers (17) constituting the air chamber (5).

10. The electrode device according to any one of claims 1 to 7, characterized in that the structure (4) is constituted by protruding nodules forming the protrusions (7), which nodules constitute the air cavity (5) in their gap.

11. An electrode device according to claim 8, characterized in that the spacer element (6) has the form of a protruding nodule, which nodule constitutes the air chamber (5) in its gap.

12. The electrode device as claimed in claim 10 or 11, characterized in that the nodules are cylindrically, conically or frustoconically shaped.

13. The electrode device as claimed in one of claims 1 to 10 or 12, characterized in that the spacer elements (6) are each formed by a surrounding wall.

14. The electrode device according to claim 13, characterized in that the surrounding walls of the spacer elements (6) each surround an air chamber (5).

15. The electrode device as claimed in claim 13 or 14, characterized in that the surrounding wall sections each have a quadrangular, in particular rectangular or square, circular, oval or polygonal, in particular honeycomb-shaped, cross section.

16. Electrode device according to any of the preceding claims, characterized in that the spacer elements (6) and/or the protrusions (7) of the structure (5) have a uniform height.

Technical Field

The invention relates to an electrode arrangement for the dielectrically impeded plasma treatment of a surface of an object, comprising at least one flexible, planar electrode and a dielectric made of a planar, flexible first material, which protects the electrode from the surface to be treated by means of a layer that impedes a direct current flow, wherein the dielectric can be placed on the surface to be treated by means of a structure having projections, and an air chamber for forming a plasma is formed between the projections, said air chamber having a side that is open toward the surface to be treated and a bottom side that is formed by the layer of the dielectric that impedes a direct current flow.

Background

At least one electrode of the electrode arrangement can be connected to a high voltage, which is preferably used as an alternating voltage, which is necessary for generating the plasma.

The electrode arrangement can be designed particularly advantageously for using the surface of the object to be treated as counter electrode. For this purpose, the object must be an electrical conductor, for example a human or animal body or other electrical conductor, the skin surface of which should be treated.

For this purpose, it is possible, for example, to generate the plasma using only a single electrode and to use the surface or the object as a counter electrode (ground). Thereby, a large treatment depth inside the object is advantageously achieved.

Furthermore, it is possible, for example, to provide at least two electrodes in the electrode arrangement, which are charged with the same high-voltage potential, so that the surface to be treated, on which the electrode arrangement is provided, serves as a counter electrode for the formation of the plasma. Alternatively, it is possible, for example, for the two electrodes to be supplied with an alternating high voltage in antiphase, wherein the surface to be treated also acts as counter electrode.

Alternatively, however, it is also possible, for example, for at least two electrodes to be used as electrodes and counter electrodes, so that plasma is generated between the electrodes and can become effective as surface plasma in the body. However, only a small treatment depth can be achieved in the object region with normal energy input.

An "air chamber" is understood in the context of the present application as a cavity which is usually filled with air, but can also be filled with a suitable gas for a particular application in order to form a particular plasma.

It is important for an electrode arrangement of the type mentioned at the outset that the dielectric forms a coherent layer, by means of which the electrode is protected from the surface to be treated. This layer hinders direct or electrical current flow between the electrode and the surface to be treated and is for the purposes of this application a layer that hinders direct current flow.

An electrode arrangement of the initially mentioned type is known from DE 102009060627B 4. The structure is realized as follows: the electrode arrangement can also be placed on an irregularly arched surface to perform the plasma treatment. In order to be able to form an air chamber necessary for forming the plasma between the surface to be treated and the layer of the dielectric which impedes the direct flow of current, it is proposed that the dielectric is provided on its side directed toward the surface to be treated with a structure having projections. The structure is formed here, for example, by raised nodes which form air-permeable gaps.

A further electrode arrangement of the initially mentioned type is known from DE 102015117715 a 1. The electrode device is also constructed in a structure by means of which plasma can be generated when the electrode device is placed on a surface. The structure is a lattice structure formed by walls adjoining one another, which delimit a large number of chambers forming an air chamber, which have a bottom-side closure formed by a layer of dielectric which impedes direct current flow and a side which is open toward the surface to be treated. The chamber can have a square, circular, elliptical or polygonal cross section, for example.

The known electrode device has proven to be reliable and is particularly also suitable for treating skin surfaces of the human or animal body. The plasma treatment enables improved absorption of therapeutically or cosmetically effective substances, so that the plasma treatment enhances the desired therapeutic or cosmetic effect. In addition to this, the plasma treatment ensures effective bacteriostasis, since it destroys microorganisms and in particular exerts a bactericidal and fungicidal action on the skin. In addition, plasma treatment causes an increase in microcirculation in the tissue.

In order to make such a treatment possible even on irregularly three-dimensionally shaped surfaces, both the electrodes and the dielectric and the structure by means of which the electrode arrangement is placed on the surface to be treated must be flexibly formed. In order to achieve the best possible adaptation of the electrode arrangement to the surface to be treated, it is desirable here for the components of the electrode arrangement and in particular the dielectric of the electrode arrangement to be composed of a material that is as flexible as possible. This also provides the following advantages when treating the human or animal body: the electrode device can be carried on the body particularly comfortably and comfortably.

At the same time, however, it must be ensured that: a predetermined distance between the surface to be treated and the layer of the dielectric which impedes direct current flow is maintained in order to ensure that a plasma is formed in the gap in the desired manner and thus effective plasma treatment. In the electrode arrangements known from the prior art, it must therefore be ensured that: the air chamber formed by the structure and its projections has a predetermined size and in particular a predetermined height during the treatment.

By means of this requirement, physical limits are set when selecting flexible materials for the electrode arrangements and in particular for the dielectric of the electrode arrangements from the electrode arrangements known from the prior art. If a material with too high a flexibility is selected for this purpose, a preset height of the air cavity and thus a preset distance between the surface to be treated and the layer of the dielectric that impedes direct current flow can no longer be ensured. This is because the projections of the structure constituting the air cavity do not have the required rigidity in this case and deform to an undesirable extent during handling. Thereby reducing the effectiveness of the plasma treatment or even completely impeding effective plasma treatment.

Disclosure of Invention

The invention is therefore based on the problem of improving the electrode arrangement in such a way that the shape thereof better matches the surface to be treated and at the same time an effective plasma treatment is achieved, while maintaining the advantages of the known electrode arrangement mentioned.

In order to achieve this object, an electrode arrangement of the type mentioned at the outset is characterized according to the invention in that the structure has a multiplicity of spacer elements of a second material which is less flexible than the first material, wherein the projections of the structure are formed partially or completely by the spacer elements.

The spacer element advantageously ensures a defined spacing between the surface to be treated and the layer of the dielectric which impedes direct current flow. For this purpose, the spacer element is made of a second material, which is less flexible than the first material, from which the dielectric of the electrode arrangement is made. The electrode device according to the invention is realized in the manner described: the dielectric can be made of a particularly flexible material which cannot be used in the known electrode arrangements for the reasons explained above, in order to improve the adaptation of the electrode arrangement to the surface to be treated while maintaining the required distance between the surface to be treated and the layer which impedes the direct current flow.

The lower flexibility of the material can be achieved, for example, by: materials are used which have a greater hardness, in particular a greater shore hardness. The lower flexibility of the material can also be achieved by: an elastic material having a lower elasticity is used. The elasticity of the material can be quantified here, for example, by its modulus of elasticity and/or its elasticity tensor.

Suitable materials for producing flexible dielectrics are, for example, flexible silicones, in particular silicone rubbers.

With the electrode device according to the invention, it is possible, for example, for the dielectric of the electrode device to be produced from a flexible silicone with a shore hardness which is less than the smallest shore hardness of the silicones which can be used for producing the known electrode devices. It is possible, for example, to use silicone with a hardness of between 10 shore and 40 shore, preferably between 15 shore and 25 shore, in particular 20 shore, for the production of the dielectric. The shore hardness specified in the present application is referred to herein as the shore hardness of shore a.

The electrode arrangement according to the invention advantageously makes it possible to avoid the projections of the structure from deforming in an undesired manner during the treatment, so that the necessary spacing between the surface to be treated and the dielectric, coherent layer that impedes the direct current flow to the electrode, is ensured. The height of the spacer elements here essentially determines the distance between the surface to be treated and the layer of the dielectric which impedes direct current flow and thus the height of the air chamber for forming the plasma. Advantageously, the height of the spacer element can be between 0.05mm and 3.0mm, for example, for this purpose.

Advantageously, it is possible, for example, for the spacer element to be made of a stable plastic which has a lower flexibility than the material used for the dielectric, wherein the latter can be, for example, a flexible silicone. Advantageously, it is also possible, for example, for not only the dielectric but also the spacer element of the electrode device according to the invention to be made of a flexible silicone of the type mentioned above, wherein a silicone with a greater shore hardness is used for the spacer element than for the dielectric. However, the material used for the spacer element is in principle arbitrary and only has to have a lower flexibility than the material of the dielectric.

The projections of the structure can be formed entirely by the spacer elements. In this case, the projection is constituted by the spacer element only. However, the projections of the structure can also be formed only partially by the spacer elements. In this case, the spacer element is, however, an integral part of the projection, but the projection has one or more further integral parts in addition to the spacer element.

The electrode arrangement according to the invention makes it possible to advantageously implement: the structure has a significantly higher flexibility in the plane than in the height. In particular, it can be advantageously achieved here that: the structure, and thus the electrode arrangement, has a small resistance to bending and/or twisting, so as to be able to adapt its shape well to the surface to be treated, while at the same time it has a large resistance to stretching, i.e. a large stability, with respect to forces that act substantially perpendicular to the surface to be treated, so that it is possible to ensure that an air chamber is obtained.

In an advantageous development of the invention, the spacer elements are connected to one another via connecting sections which have a lower bending resistance and/or a lower torsion resistance than the spacer elements.

The connecting section can advantageously be a connecting section made of a first or third material, which is more flexible than the second material. The lower flexibility of the connecting section relative to the spacer element is in this case achieved by a greater flexibility of the material of the connecting section relative to the material of the spacer element.

Alternatively or additionally to this, the shape of the connecting section can be designed such that the connecting section has a lower rigidity than the spacer element. The connecting section between the spacer elements can be designed particularly thin or narrow in relation to the spacer elements, in particular with a smaller width and/or a smaller height than the spacer elements.

The connecting section between the spacer elements can be formed, for example, by the dielectric of the electrode arrangement, in particular by a layer of the dielectric which impedes a direct current flow. For this purpose, the spacer element can be connected, for example, to the side of the dielectric facing the surface to be treated, in particular to the side of the layer of the dielectric that impedes direct current flow facing the surface to be treated. Since the first material of the dielectric has a greater flexibility than the second material of the spacer element, this can be achieved particularly simply in this way: the connecting section has a lower rigidity than the spacer element.

In a further advantageous development of the invention, it is proposed that the spacer elements are connected to one another by connecting webs and in this way form a spacer grid.

Advantageously, the shape of the connecting webs is designed such that the connecting webs have a lower rigidity than the spacer elements. For this purpose, the connecting webs between the spacer elements can be designed particularly thin and/or narrow in relation to the spacer elements. For this purpose, the connecting webs can have a smaller width and/or a smaller height than the spacer elements.

In particular, it can be advantageously achieved that the spacer grid has a significantly higher flexibility in the plane than in the height. In particular, it can be advantageously achieved here that: the spacer grid has a low resistance to bending and/or twisting in order to enable its shape to be well matched to the surface to be treated, while the spacer grid has at the same time a high resistance to stretching with respect to forces which act substantially perpendicularly to the surface to be treated, that is to say are relatively stable with respect to this force, so that an air chamber can be ensured.

The connecting webs of the spacer grid can advantageously be made of the same material as the spacer elements themselves, i.e. of the second material.

Alternatively, however, the connecting web can also consist of another material. The material of the connecting webs can in particular be a material which is more flexible than the material of the spacer elements. The rigidity of the connecting web can thereby advantageously be further reduced.

An embodiment of the electrode arrangement according to the invention in which the spacer elements form a spacer grid, wherein the spacer elements are connected to one another by connecting webs, provides the advantages according to the invention: the stability of the structure and its projections and thus the air chambers formed between the projections can be improved.

In a further advantageous development of the invention, it is proposed that the spacer grid is formed in one piece. This provides the following advantages: the spacer grid can be produced particularly simply and inexpensively, for example by casting or 3D printing.

In a further advantageous development of the invention, the spacer element is embedded, in particular completely embedded, in the interior of the projection in order to reinforce the projection. In this case, the projection of the structure is thus formed only partially by the spacer element. The spacer element acts here as a reinforcement of the projection and in particular increases the rigidity of the projection. The spacer element can in particular be completely embedded, i.e. surrounded on all sides.

This embodiment offers the following advantages: the bearing surfaces of the electrode arrangements on the surface to be treated are not necessarily formed by spacer elements. The structure can be made of a material with a particularly high flexibility, in particular a particularly low stiffness, into which the spacer elements made of a material with a lower flexibility, in particular a greater stiffness, are embedded. The bearing surface on the surface to be treated is thus formed by the more flexible material of the structure. This advantageously enables, on the one hand, a secure holding of the electrode arrangement on the surface to be treated and a particularly good adaptation of the shape of the electrode arrangement to the surface to be treated. On the other hand, this advantageously makes it possible to: the electrode arrangement is perceived as being particularly comfortable on the surface of the human or animal body.

In a further advantageous development of the invention, it is proposed that the projection of the structure is formed by a spacer element and a dielectric, wherein the spacer element is embedded, in particular completely embedded, in the dielectric surrounding the spacer element.

Thus, in this embodiment, the spacer element is at least partially, preferably completely, embedded in a dielectric medium, which at least partially, preferably completely, surrounds the spacer element. Since the material of the dielectric has a greater flexibility than the material of the spacer element according to the invention, the advantages mentioned in connection with the advantageous development described above can be achieved in a particularly simple manner by means of the present embodiment.

In this case, advantageously, the part of the structure surrounding the spacer element, in particular the dielectric part surrounding the spacer element, is designed to be placed against the skin of the living being.

In a further advantageous development of the invention, it is proposed that the dielectric surrounding the spacer element is formed in one piece with a layer of the dielectric which impedes a direct current flow.

It is thereby proposed that the dielectric surrounding the spacer element and the layer of the dielectric which impedes a direct current flow are produced in one piece. Advantageously, in particular the entire dielectric together with the part of the dielectric surrounding the spacer element can be formed in one piece, i.e. manufactured in one piece.

This embodiment of the electrode device according to the invention provides the following advantages: the electrode arrangement can be produced in a particularly simple and cost-effective manner by means of casting. In this case, the spacer element can be simply cast into the dielectric. But it is also advantageous that it can be quickly constructed by 3D printing according to the type of sample.

Alternatively, however, it is also conceivable for the part of the structure surrounding the spacer element, in particular the part of the dielectric surrounding the spacer element, to be produced as a separate part in order to be subsequently applied to a layer of the dielectric which impedes a direct current flow. The secure connection can be established in the usual manner, i.e. mechanically in the housing structure, positively and/or materially, in particular by means of gluing or welding. It is also possible here to cast the spacer elements into the structure.

This shape of the separately manufactured structure provides the following advantages: in particular, an easy exchangeability of the part of the electrode device that is in contact with the wound can be achieved when cleaning the wound. For this purpose, the separate structure together with the spacer element can be used as a removable disposable part or can also be sterilized simply due to its small volume.

The spacer element itself can advantageously likewise be produced in a corresponding manner by casting or 3D printing.

In a further advantageous development of the invention, it is provided that the projection of the structure is formed completely by the spacer element. The spacer element is connected on its side facing the electrode to a layer that impedes the direct flow of current and forms an abutment surface on the surface to be treated on its side facing the surface to be treated.

In this embodiment, the projections of the structure are thus formed only by the spacer elements. The spacer elements are therefore not embedded in the projections, but rather form the projections themselves and are added for this purpose to the layer that impedes the direct flow of current on the side facing away from the surface to be treated, that is to say are connected thereto. The secure connection between the spacer element and the dielectric layer can then be carried out either again in the usual manner, i.e. mechanically in the housing structure, positively and/or materially, in particular by means of gluing or welding. On the side facing away from the electrode, i.e. on the side of the spacer element facing the surface to be treated, the spacer element forms an abutment surface at the surface to be treated. In this embodiment, the spacer element is thus placed on the surface to be treated during treatment.

This embodiment offers the following advantages: the electrode arrangement can be produced particularly simply, since the spacer element only has to be added to the dielectric after its production, for example in a casting process or in a 3D printing process.

The connection between the spacer element and the dielectric layer that impedes direct current flow can advantageously be a releasable connection. This provides the following advantages: in particular, during the treatment of wounds, an easy exchangeability of the spacer element in contact with the wound is achieved, which in turn serves as a removable disposable part or can be easily sterilized due to its small volume.

The spacer element can advantageously be designed to rest against the skin of the living being.

In a further advantageous development of the invention, it is proposed that the structure is a lattice structure formed by mutually adjoining walls forming projections, which delimit a large number of chambers forming air chambers. The grid structure can advantageously be formed in one piece, in particular with a dielectric layer that impedes direct current flow. Alternatively, however, the grid structure can also be produced as a separate part and added to the layer of the dielectric which impedes the direct current flow.

The spacer elements can advantageously be embedded in the walls of the lattice structure, in particular completely embedded in the walls of the lattice structure.

Such a lattice structure known from DE 102015117715 a1 mentioned at the outset offers the following advantages in combination with the spacer elements of the electrode arrangement according to the invention: it can be made particularly flexible and can be easily designed and at the same time the distance between the surface to be treated and the layer that impedes direct current flow is reliably ensured by the spacer element according to the invention — thus ensuring an effective formation of the plasma.

In a further advantageous development of the invention, it is provided that the structure is formed by projecting nubs forming projections, which nubs form air chambers in their gaps. The spacer element can advantageously be embedded in the nodule, in particular completely embedded in the nodule.

The nodes can advantageously be formed in a cylindrical, conical or truncated conical manner.

This embodiment, in which the structure is constituted by protruding nodules, offers the following advantages: the nodes allow simple and inexpensive production and good adaptation to the surface to be treated when using sufficiently flexible materials, wherein a sufficient formation of the air chambers necessary for forming the plasma can be ensured by the spacer elements according to the invention.

In a further advantageous development of the invention, it is proposed that the projections of the structure are formed completely by the spacer elements in the manner described above, and that the spacer elements have the form of projecting nodules which form air chambers in their gaps. The nodes can advantageously be formed in a cylindrical, conical or truncated conical manner.

This modified form of the electrode device according to the invention is thus similar to the previously described modified form, however wherein the spacer elements themselves have the form of protruding nodules. Accordingly, the nodules are made of a second material that is less flexible than the first material from which the dielectric of the electrode arrangement is made.

Such an embodiment of the spacer element in the form of a protruding nodule offers the following advantages: the junction can be produced particularly simply and inexpensively. For this purpose, the structure can be formed in particular in one piece with the spacer elements in the form of projecting nubs forming the projections, so that production can be carried out particularly simply and inexpensively, for example by casting or 3D printing.

In a further advantageous development of the invention, it is proposed that the spacer elements are each formed by a circumferential wall.

The wall portion in this case runs around the spacer element on a side which is not the side of the spacer element facing the surface to be treated and which is not the side of the spacer element facing the layer which impedes a direct current flow. The surrounding wall forms in this way a boundary of the side of the interior space surrounded by it. The circumferential wall section forming the respective spacer element can in this case be formed by a single circumferential wall or by a plurality of walls adjoining one another. The height of the spacer element is determined by the height of the surrounding wall.

In a further advantageous development of the invention, it is proposed that the circumferential wall sections of the spacer elements each surround an air chamber.

The spacer elements can be arranged in the electrode arrangement such that the air chamber is designed to form a plasma within an interior bounded by the surrounding walls of the respective spacer element.

The surrounding walls of the spacer element can advantageously each have a quadrangular, in particular rectangular or square cross section. However, the surrounding wall of the spacer element can also advantageously have a circular or oval cross section. However, the surrounding wall of the spacer element can also advantageously have a polygonal, in particular honeycomb-shaped, cross section.

The material thickness of the wall can advantageously form less than 20%, in particular less than 10%, of the maximum width of the space surrounded by the wall. The material thickness of the wall can advantageously be, for example, between 0.1mm and 1.0 mm.

Such an embodiment of the electrode arrangement according to the invention with the spacer elements each formed by a surrounding wall provides the following advantages according to the invention: the spacer element has a particularly high stability due to its shape. The spacer element can thus be produced with little material expenditure. The spacer element furthermore has a particularly small cross-sectional area. This again advantageously achieves that: the protrusions of the structure occupy only a small area on the surface to be treated and a large part of the surface to be treated is available for constituting an air chamber and thus for constituting a plasma. Thereby, advantageously, a particularly efficient plasma treatment is possible.

In a further advantageous development of the invention, it is provided that the spacer elements and/or the projections of the structure have a uniform height.

This advantageously enables a particularly homogeneous formation of the plasma. In addition to this, it is possible in this way to form chambers between the projections, the sides of which are closed and form closed air chambers when the electrode arrangement is placed on the surface to be treated. Studies have shown that a suitable plasma can also be formed in such a closed chamber.

Drawings

The invention shall be elucidated in detail below on the basis of an embodiment which is schematically shown in the drawing. The figures show:

fig. 1a) shows a view of the upper side of a first embodiment of an electrode arrangement;

FIG. 1b) shows a vertical section along the line A-A in FIG. 1 a);

FIG. 1c) shows a detail view of a detail from FIG. 1 b);

fig. 2a) shows a view of the support side of a first embodiment of the electrode arrangement;

fig. 2B) shows a vertical section along the line B-B in fig. 2 a);

FIG. 3a) shows a horizontal section along the line C-C in FIG. 1 b);

FIG. 3b) shows a horizontal section along the line D-D in FIG. 1 b);

fig. 4a) shows a view of the upper side of a second embodiment of the electrode arrangement;

fig. 4b) shows a vertical section along the line a-a in fig. 4 a);

fig. 4c) shows a detail view of detail a in fig. 4 b);

fig. 5a) shows a view of the support side of a second embodiment of the electrode arrangement;

fig. 5B) shows a vertical section along the line B-B in fig. 5 a);

fig. 6a) shows a horizontal section along the line C-C in fig. 4 b);

fig. 6b) shows a horizontal section along the line D-D in fig. 4 b);

fig. 7a) shows a view of the upper side of a third embodiment of the electrode arrangement;

fig. 7b) shows a vertical section along the line a-a in fig. 7 a);

fig. 7c) shows a detail view of detail a in fig. 7 b);

fig. 8a) shows a view of the support side of a third embodiment of the electrode arrangement;

fig. 8B) shows a vertical section along the line B-B in fig. 8 a).

Detailed Description

The exemplary embodiment shown in fig. 1a) shows the upper side 8 of the first exemplary embodiment of the electrode arrangement for the plasma treatment of the surface of an object in a dielectrically impeded manner, i.e. the side facing away from the surface to be treated. The upper side 8 of the dielectric 2 can be seen with a substantially square cross section. On one side, the electrode arrangement extends into the tab-like projection 10. The dielectric 2 has a plurality of through openings 11, which allow, for example, the removal of a fluid, in particular a liquid, from the surface to be treated. The electrode device also has a plurality of wing sections 12, which are particularly flexibly designed with a small thickness and are adhesively designed on the underside thereof, in order to achieve the fixation of the electrode device on the skin of a living being, optionally around a wound.

The dielectric is made of a particularly flexible silicone having a low hardness of only 20 shore. The dielectric 2 thus has only a very low rigidity, but its shape can be matched very well to the surface to be treated.

Fig. 1b) shows a vertical section through the electrode arrangement along the line a-a in fig. 1 a). Details can be taken from the detail view of detail a in fig. 1 c). A flexible, planar electrode 1 can be seen, which is surrounded on all sides by a dielectric 2. The dielectric 2 forms, in particular, a layer 3 that impedes the flow of direct or electrical current, said layer extending along the entire surface of the electrode 1 so as to completely protect the electrode from the surface to be treated. Thereby, a direct or electrical current flow from the electrode 1 to the surface to be treated is hindered.

The dielectric 2 can be placed on the surface to be treated via a structure 4 with projections 7 and here air chambers 5 for forming the plasma are formed between the projections 7. The air chamber 5 has a bottom-side closure formed by the layer 3 of the dielectric 2, which impedes the direct flow of current, and a side which is open toward the surface to be treated, i.e., is open on the support side 9 of the electrode arrangement.

It can also be seen that not only the dielectric 2 has a through opening 11, but also the electrode 1 has a through opening 13. The through-openings 11 of the dielectric are aligned with the through-openings 13 of the electrodes and the air chamber 5 between the projections 7 of the structure 4, so that a fluid, in particular a liquid, can be conducted out of the surface to be treated through the through-openings 11, 13.

Furthermore, it can be seen from fig. 1b) and 1c) that the structure 4 has a plurality of spacer elements 6, which in this embodiment are made of a stable plastic. The flexibility of the stabilized plastic is here less than the flexibility of the silicone from which the dielectric 2 is made.

The spacer elements 6 are in this exemplary embodiment each formed by a circumferential wall which surrounds the air chamber 5 in each case. The surrounding wall of the insulating element 6 has a rectangular cross section.

As can furthermore be seen from fig. 1b) and 1c), the projection 7 of the structure 4 is formed in part by the spacer element 6, i.e. by the spacer element 6 and the dielectric 2. The spacer element 6 is completely embedded in the surrounding dielectric 2 in this case, so that a reinforcement of the projection 7 is formed. The dielectric 2 surrounding the separating element 6 is formed integrally with the layer 3 of the dielectric 2, which impedes the direct flow of current. This makes it possible to produce the dielectric 2 in a casting process in which the separating element 6 is cast into the dielectric 2 particularly easily and inexpensively.

The spacer elements 6 are connected to one another via connecting sections 18 which have a lower bending resistance and a lower torsion resistance than the spacer elements 6. The connecting sections 18 between the spacer elements 6 are formed by the dielectric 2, i.e. by the layer 3 of the dielectric 2, which impedes the direct flow of current. Since the particularly flexible silicone of the dielectric 2 has a greater flexibility than the stable plastic of the spacer element 6, this can be achieved particularly simply in this way: the connecting section 18 has a lower bending and torsion resistance than the spacer element 6. The structure 4 is thus significantly more flexible in the plane than in the height.

The electrode arrangement is placed on the surface to be treated during treatment by means of a very soft and flexible dielectric 2.

Not only the spacer elements 6 but also the projections 7 of the structure 4 have a uniform height in this embodiment.

It becomes clear that the electrode 1 also extends into the tab-like projection 10. The dielectric 2 has a recess 15 in the region of the tab-like projection 10, via which the electrode 1 can be contacted to deliver the high voltage necessary for generating the plasma, preferably as an alternating voltage.

Fig. 2a) shows the support side 9 of the electrode arrangement of the first exemplary embodiment. It can be seen in particular that the structure 4 is designed as a lattice structure, which is formed by walls adjoining one another, which form the projections 7, wherein the walls delimit a plurality of chambers 17, which form the air chambers 5. The walls of the lattice structure form bearing surfaces on the surface to be treated on the surface facing the surface to be treated.

The tab-like projection 10 has two recesses 15 for respectively contacting the electrodes 1 of the electrode arrangement, since the electrode arrangement as a whole has two electrodes 1, as will become more clear hereinafter.

Fig. 2B) shows a vertical section through the electrode arrangement along the line B-B in fig. 2 a). It can be seen here that the electrode arrangement has two electrodes 1 which are surrounded on all sides by a dielectric 2. The dielectric 2 therefore has a central region 16 into which the electrode 1 does not extend.

The spacer element 6 is embedded in the wall formed by the dielectric 2, which wall forms the protrusion 7.

In addition, reference can be made to the above description of fig. 1a) to 1c) with regard to fig. 2a) and 2 b).

Fig. 3a) shows a horizontal section through the electrode arrangement of the first embodiment along the line C-C in fig. 1 b). Here, it can be seen that the structure 4 has a large number of spacer elements 6 which, together with the dielectric 2, form projections 7. The spacer elements 6 are each formed by a circumferential wall and each surround an air chamber 5, which is formed in a chamber 17 bounded by the walls of the grid structure 4. Whereby the walls of the spacer elements 6 here surround the chambers 17 formed by the walls of the grid structure 4.

It can clearly be seen that each spacer element 6 has a quadrangular cross section.

Fig. 3b) shows a horizontal section through the electrode device of the first embodiment along the line D-D of fig. 1 b). It can be seen here that the electrode arrangement has two electrodes 1 and a central region 16 of the dielectric 2, into which the electrodes 1 do not extend. The electrodes 1 each extend into a lug-like projection 10 for the purpose of making contact therewith.

It can also be seen that the through opening 11 of the dielectric 2 has a smaller diameter than the through opening 13 of the electrode 1. It can thereby be ensured that the dielectric 2 surrounds the electrode 1 from all around so that the electrode 1 is completely protected from the surface to be treated. For the same purpose, the dielectric 2 extends beyond the surface of the electrode 1 at the lateral edges thereof, so that the electrode 1 is also completely surrounded by the dielectric 2 at the lateral edges of the electrode arrangement.

In addition, reference can be made to the description of fig. 1 and 2 with regard to fig. 3a) and 3 b).

Fig. 4, 5 and 6 show a second exemplary embodiment of an electrode arrangement according to the invention in a view corresponding to fig. 1, 2 or 3.

This second embodiment of the electrode device according to the invention differs from the first embodiment, as can be seen in particular in fig. 4b), 4c), 5b) and 6a), in that: the spacer elements 6 are connected to one another by connecting tabs 14. The spacer elements 6 form a spacer grid in this way. This makes it possible to achieve a particularly high stability of the spacer element 6, which ensures particularly reliably that the necessary distance between the surface to be treated and the layer 3, which impedes the direct flow of current, is maintained during the treatment.

The spacer grid formed by the spacer elements 6 by means of the connecting webs 14 is formed in one piece in the present exemplary embodiment so that it can be produced in a particularly simple manner by casting.

In addition, reference can be made to the statements of the first exemplary embodiment with regard to the exemplary embodiments shown in fig. 4 to 6.

Fig. 7 and 8 show a third exemplary embodiment of an electrode arrangement according to the invention in a view form corresponding to fig. 1 or 2 and fig. 4 or 5.

The difference of this third embodiment of the electrode device according to the invention from the first and second embodiments, as seen in fig. 7b), 7c), 8a) and 8b), consists in: the projections 7 of the structure 4 are formed only by the spacer elements 6. The spacer element 6 is connected to the layer 3 of the dielectric 2, which impedes the direct flow of current, on its side facing the electrode 1. On the side of the spacer element 6 opposite to the surface to be treated, the spacer element 6 forms an abutment surface at the surface to be treated. The spacer element 6 has a uniform height here, is designed to rest on the skin of the living being and to be placed on the skin during treatment.

In contrast to the first and second exemplary embodiments, in the third exemplary embodiment shown in fig. 7 and 8, the spacer element 6 is therefore not embedded in the projection 7, but the spacer element 6 itself forms the complete projection 7. For this purpose, the spacer element 6 and the layer 3 of the dielectric 2, which impedes direct current flow, are joined to one another by adhesion, i.e., are firmly connected to one another by a material-fit connection.

The spacer elements 6 are each formed by a surrounding wall which has a substantially square cross section and surrounds the air chamber 5. In addition, in contrast to the first and second exemplary embodiments, in this third exemplary embodiment, an air chamber 5 is also present in the intermediate spaces between the different spacer elements 6, in which air chamber the plasma can be formed.

In accordance with the second exemplary embodiment, the spacer elements 6 are also connected to one another in the third exemplary embodiment by connecting webs 14. In this way, the spacer element 6 forms a spacer grid which is formed in one piece and which can be produced in a particularly simple manner by casting.

In addition, reference may be made to the statements made with respect to the first and second embodiments with respect to the third embodiment shown in fig. 7 and 8.