阅读说明：本技术 激光退火装置和激光退火设备 (Laser annealing device and laser annealing equipment ) 是由 路兆里 赵东升 于 2019-09-19 设计创作，主要内容包括：本发明实施例提供一种激光退火装置和激光退火设备。激光退火装置包括输出激光的激光装置以及将所述激光引导至退火室的光学装置,所述光学装置包括在激光传输光路上依次设置的准直机构、补偿机构和聚焦结构,所述补偿机构用于对激光的初始光斑剖面进行补偿,使初始光斑剖面形成标准对称形态。本发明通过在准直机构与聚焦结构之间设置补偿机构,补偿机构对激光的初始光斑剖面进行优化,使初始光斑剖面形成标准对称形态,消除了初始光斑剖面的变形和偏移,保证了激光光束能量分布的均匀性,而且可以延长激光窗的使用时间。(The embodiment of the invention provides a laser annealing device and laser annealing equipment. The laser annealing device comprises a laser device for outputting laser and an optical device for guiding the laser to the annealing chamber, wherein the optical device comprises a collimating mechanism, a compensating mechanism and a focusing structure which are sequentially arranged on a laser transmission light path, and the compensating mechanism is used for compensating an initial light spot profile of the laser to enable the initial light spot profile to form a standard symmetrical form. The compensation mechanism is arranged between the collimation mechanism and the focusing structure and optimizes the initial spot profile of the laser, so that the initial spot profile forms a standard symmetrical form, the deformation and the deviation of the initial spot profile are eliminated, the uniformity of the energy distribution of the laser beam is ensured, and the service time of a laser window can be prolonged.)

1. The laser annealing device is characterized by comprising a laser device for outputting laser and an optical device for guiding the laser to an annealing chamber, wherein the optical device comprises a collimation mechanism, a compensation mechanism and a focusing structure which are sequentially arranged on a laser transmission light path, and the compensation mechanism is used for compensating an initial spot profile of the laser to enable the initial spot profile to form a standard symmetrical form.

2. The laser annealing device according to claim 1, wherein the compensation mechanism includes a beam splitting unit and a flipping unit, wherein,

the beam splitting unit is used for processing the incident beam from the collimation mechanism into a first beam and a second beam; the first light beam and the second light beam with the original light spot section turned are fitted, and the light beam with the original light spot section in the standard symmetrical form is output to the focusing structure;

and the turning unit is used for turning the initial spot profile of the second light beam.

3. The laser annealing apparatus of claim 2, wherein the beam splitting unit comprises a beam splitter that forms the first beam by reflection and the second beam by transmission.

4. The laser annealing apparatus according to claim 3, wherein the beam splitter has a reflectivity of 50% and a transmissivity of 50%.

5. The laser annealing device according to claim 2, wherein the turning unit comprises a first reflecting mirror and a second reflecting mirror which are oppositely arranged, the first reflecting mirror and the second reflecting mirror are arranged on one side of the transmission surface of the beam splitter, an included angle between the first reflecting mirror and the transmission surface of the beam splitter is 67.5 degrees, and an included angle between the second reflecting mirror and the transmission surface of the beam splitter is 67.5 degrees.

6. The laser annealing device of claim 1, wherein the compensation mechanism is disposed between the fourth mirror of the collimation mechanism and the fifth mirror of the focusing structure.

7. The laser annealing device according to any one of claims 1 to 6, wherein the laser device comprises a housing forming a gas circulation chamber and a laser tube forming a resonance chamber, and a discharge electrode and a gas purification device for eliminating gas impurities on a laser output path are arranged in the resonance chamber.

8. The laser annealing apparatus of claim 7, wherein the gas purging device comprises at least two electrostatic adsorption tubes fixed on the side wall of the resonance chamber.

9. The laser annealing apparatus of claim 8, wherein the at least two electrostatic adsorption tubes are respectively disposed on the gas passage to and from the discharge electrode.

10. A laser annealing apparatus comprising the laser annealing device according to any one of claims 1 to 9.

Technical Field

The invention relates to the technical field of display preparation, in particular to a laser annealing device and laser annealing equipment.

Background

In recent years, display technology has been rapidly developed, and Thin Film Transistor (TFT) technology has been developed from an original amorphous Silicon (a-Si) TFT to a Low Temperature Polysilicon (LTPS) TFT. Currently, in the actual production of LTPS, an Excimer Laser Annealing (ELA) process is generally used to melt and convert amorphous silicon into polysilicon.

In the excimer laser annealing process, strict requirements are imposed on the initial spot Profile (Raw Beam Profile) of a laser Beam to ensure the stability and the energy distribution uniformity of a Line spot (Line Beam). Because the crystallization effect of polycrystalline silicon depends on the quality of laser to a great extent, when the stability and the energy distribution of the linear light spot of the laser are not uniform, the substrate after laser annealing has the problem of watermarks (Mura) of different degrees, so once the initial light spot profile does not meet the specification requirement, a laser Window (Tube Window) or even a laser Tube (Tube) needs to be replaced. Therefore, the excimer laser annealing process is a process with high process requirement, large consumption of consumable spare parts and high production cost.

Therefore, how to guarantee the quality of the initial spot profile and reduce the amount of consumable spare parts used is a technical problem to be solved in the art.

Disclosure of Invention

The technical problem to be solved by the embodiments of the present invention is to provide a laser annealing device and a laser annealing apparatus, so as to ensure the quality of an initial spot profile and reduce the usage amount of consumable spare parts.

In order to solve the above technical problem, an embodiment of the present invention provides a laser annealing device, including a laser device outputting laser light and an optical device guiding the laser light to an annealing chamber, where the optical device includes a collimating mechanism, a compensating mechanism, and a focusing structure, which are sequentially disposed on a laser transmission light path, and the compensating mechanism is configured to compensate an initial spot profile of the laser light, so that the initial spot profile forms a standard symmetrical shape.

Optionally, the compensation mechanism comprises a beam splitting unit and a flipping unit, wherein,

the beam splitting unit is used for processing the incident beam from the collimation mechanism into a first beam and a second beam; the first light beam and the second light beam with the original light spot section turned are fitted, and the light beam with the original light spot section in the standard symmetrical form is output to the focusing structure;

and the turning unit is used for turning the initial spot profile of the second light beam.

Optionally, the beam splitting unit comprises a beam splitter, which forms the first light beam by reflection and the second light beam by transmission.

Optionally, the reflectivity of the beam splitter is 50% and the transmissivity of the beam splitter is 50%.

Optionally, the upset unit includes relative first speculum and the second mirror that sets up, first speculum and second mirror set up the transmission face one side of beam splitter, first speculum with the contained angle between the transmission face of beam splitter is 67.5, the second mirror with the contained angle between the transmission face of beam splitter is 67.5.

Optionally, the compensation mechanism is disposed between the fourth mirror of the collimation mechanism and the fifth mirror of the focusing structure.

Optionally, the laser device includes a housing forming a gas circulation chamber and a laser tube forming a resonance chamber, and a discharge electrode and a gas purification device for eliminating gas impurities on a laser output path are arranged in the resonance chamber.

Optionally, the gas purification apparatus includes at least two electrostatic adsorption tubes fixed on a side wall of the resonance chamber.

Optionally, the at least two electrostatic absorption tubes are respectively arranged on a passage for gas to enter and exit the discharge electrode.

The embodiment of the invention also provides laser annealing equipment which comprises the laser annealing device.

According to the laser annealing device and the laser annealing equipment provided by the embodiment of the invention, the compensation mechanism is arranged between the collimation mechanism and the focusing structure, and optimizes the initial facula profile of the laser, so that the initial facula profile forms a standard symmetrical form, the deformation and the offset of the initial facula profile are eliminated, the uniformity of the energy distribution of the laser beam is ensured, and the service time of a laser window can be prolonged.

Of course, not all of the advantages described above need to be achieved at the same time in the practice of any one product or method of the invention. Additional features and advantages of the invention will be set forth in the description which follows, and in part will be obvious from the description, or may be learned by practice of the invention. The objectives and other advantages of the embodiments of the invention will be realized and attained by the structure particularly pointed out in the written description and claims hereof as well as the appended drawings.

Drawings

The accompanying drawings are included to provide a further understanding of the invention and are incorporated in and constitute a part of this specification, illustrate embodiments of the invention and together with the example serve to explain the principles of the invention and not to limit the invention. The shapes and sizes of the various elements in the drawings are not to scale and are merely intended to illustrate the invention.

FIG. 1 is a schematic illustration of an initial spot shape under normal conditions;

FIG. 2 is a schematic view of an initial spot shape after deformation;

FIG. 3 is a schematic structural diagram of a laser annealing apparatus according to an embodiment of the present invention;

FIG. 4 is a schematic structural diagram of an optical device according to an embodiment of the present invention;

FIG. 5 is a schematic diagram of an exemplary compensation mechanism according to the present invention;

FIGS. 6, 7 and 8 are schematic diagrams illustrating the operation of the compensating mechanism according to the embodiment of the present invention;

FIG. 9 is a diagram illustrating an exemplary structure of an optical device according to an embodiment of the present invention;

fig. 10 is a schematic structural diagram of a laser device according to an embodiment of the present invention.

Description of reference numerals:

10-a laser device; 11-a housing; 12-laser tube;

13-constant flow fan; 14-a cooling bar; 15-a gas purification device;

16-a low temperature gas purifier; 17-an electrostatic filter; 110 — a gas circulation chamber;

120-a resonant cavity; 121-discharge electrodes; 20-an optical device;

21-an attenuation mechanism; 22-a collimating mechanism; 23-a compensation mechanism;

24-a focusing structure; 25-a light spot monitoring device; 231-a beam splitter;

232-first mirror; 233-a second mirror; 300-annealing chamber;

400-substrate.

Detailed Description

The following detailed description of embodiments of the invention is provided in connection with the accompanying drawings and examples. The following examples are intended to illustrate the invention but are not intended to limit the scope of the invention. It should be noted that the embodiments and features of the embodiments in the present application may be arbitrarily combined with each other without conflict.

In the process of melting and converting amorphous silicon (a-Si) into polycrystalline silicon (p-Si) by adopting excimer laser annealing equipment, strict requirements are imposed on the size and the shape of an initial laser spot. For example, the initial spot size and shape requirements for 308nm ultraviolet light in the existing generation 5 are: an initial spot size (full width at half maximum FWHM) of 35 + -4 mm (vertical) x 14.5 + -3 mm (horizontal), an initial spot pointing stability (2 σ) of less than or equal to 0.45 mrad (LA) for the major axis and less than or equal to 0.15 mrad (mrad) for the minor axis. The inventor of the application finds that after the excimer laser annealing equipment is used for a certain time, the main reason that the size and the shape of the initial light spot do not meet the specification requirements is caused by laser window pollution. Specifically, during each Gas (Gas) usage period, the laser tube is continuously subjected to high-voltage discharge (about 33.6Kv at 500 Hz), so that the Gas partial pressure inside the laser tube is increased, the impurity content is increased, and finally, burn mark (burn mark) stains, marks and other stains are generated on the laser window of the sealed Gas. The laser window is contaminated such that the initial spot Profile (RawBeam Profile) through the laser window is deformed to some extent. Fig. 1 is a schematic diagram of an initial spot shape under a normal condition, and fig. 2 is a schematic diagram of the initial spot shape after deformation. As can be seen from a comparison of fig. 1 and fig. 2, due to the contamination of the laser window, not only the initial spot profile has a severe positional drift in the Short Axis (SA) direction, but also the initial spot profile has a large distortion in the Short Axis direction, resulting in a very uneven energy distribution.

In order to eliminate the deformation of the initial light spot section of the laser annealing device and improve the energy distribution uniformity of the initial light spot section, the embodiment of the invention provides the laser annealing device. Fig. 3 is a schematic structural diagram of a laser annealing apparatus according to an embodiment of the present invention, and as shown in fig. 3, a main structure of the laser annealing apparatus includes a laser apparatus 10 and an optical apparatus 20, wherein the laser apparatus 10 is configured to generate and output a laser L, and the optical apparatus 20 is configured to process and transmit the laser L output by the laser apparatus 10 and guide the laser L to an annealing chamber 300, so that the laser L performs a laser annealing process on a substrate 400 placed in the annealing chamber 300. In the embodiment of the present invention, the laser device 10 may be understood as being used for generating, controlling and outputting laser, and includes one or more lasers, and each laser can regulate and control the power/energy and wavelength of the output laser according to a control signal provided by the control device, so as to output a required laser beam.

Fig. 4 is a schematic structural diagram of an optical device according to an embodiment of the present invention, and as shown in fig. 4, the optical device according to an embodiment of the present invention includes an attenuation mechanism 21, a collimation mechanism 22, a compensation mechanism 23, and a focusing mechanism 24, which are sequentially disposed along a laser propagation direction on a laser transmission optical path. The attenuation mechanism 21 is configured to perform energy control on laser L output by the laser device 10, the collimation mechanism 22 is configured to convert the laser controlled by the attenuation mechanism 21 into parallel light, the compensation mechanism 23 is configured to perform spot profile compensation on the parallel light processed by the collimation mechanism 22, so that the spot profile forms a standard symmetrical form, and the focusing mechanism 24 is configured to perform focusing processing on the spot processed by the compensation mechanism 23 to form a spot with a set size.

In the embodiment of the present invention, the attenuation mechanism 21, the collimation mechanism 22 and the focusing mechanism 24 may adopt optical devices mature in the related art. For example, the attenuation mechanism 21 may be configured by using an attenuation sheet or a wave plate plus a polarization beam splitter prism, and the energy of the laser beam L output from the laser device 10 is controlled in real time by changing the transmittance or polarization direction of the lens. The collimating mechanism 22 may employ a single lens or a telescope assembly, and the laser light is converted into parallel light by the single lens or the telescope assembly. The focusing structure 24 may adopt a lens array, and the light spot is focused by the lens array, and is formed by focusing and imaging to output the light spot with a set size to the annealing chamber. In the embodiment of the invention, the compensation mechanism 23 is arranged between the collimation mechanism 22 and the focusing structure 24, and the initial spot profile of the laser is compensated to eliminate the deformation and the offset of the initial spot profile, so that the initial spot profile returns to a standard symmetrical form in the short axis direction or the long axis direction.

The compensation mechanism of the embodiment of the invention comprises a beam splitting unit and a turning unit, wherein the beam splitting unit is used for processing the incident beam from the collimation mechanism 22 into a first light beam and a second light beam, the turning unit is used for turning the light spot section of the second light beam, and the beam splitting unit is also used for fitting the first light beam and the turned second light beam and outputting the light beam with the light spot section in the standard symmetrical form to the focusing structure 24.

Fig. 5 is a schematic diagram of an implementation structure of a compensation mechanism according to an embodiment of the present invention, and as shown in fig. 5, the beam splitting unit of the implementation structure includes a beam splitter 231, and the beam splitter 231 forms a first light beam by reflection and a second light beam by transmission. Specifically, the reflectance of the beam splitter 231 is 50% and the transmittance is 50%, i.e., the reflectance and transmittance of the beam splitter 231 are each 50%. The beam splitter 231 serves to split the incident light beam into a reflected light beam 50% of the incident light and a transmitted light beam 50% of the incident light. The turning unit 222 of this embodiment includes a first reflecting mirror 232 and a second reflecting mirror 233, and the first reflecting mirror 232 and the second reflecting mirror 233 are disposed on the side of the transmission surface (the surface facing away from the incident light beam) of the beam splitter 231, and are disposed opposite to each other, and are configured to turn the spot profile of the transmitted light beam. As shown in fig. 5, assuming that the laser beam incident on the compensation mechanism is transmitted in the horizontal direction, the reflection surface and the transmission surface of the beam splitter 231 are disposed at 45 ° to the horizontal direction, the reflection surface of the first reflection mirror 232 is disposed at 112.5 ° to the horizontal direction, and the reflection surface of the second reflection mirror 233 is disposed at-22.5 ° to the horizontal direction. That is, the angle between the reflection surface of the first mirror 232 and the transmission surface of the beam splitter 231 is set to 67.5 °, the angle between the reflection surface of the second mirror 233 and the transmission surface of the beam splitter 231 is set to 67.5 °, and the angle between the reflection surface of the first mirror 232 and the reflection surface of the second mirror 233 is set to 45 °.

Fig. 6, 7 and 8 are schematic diagrams illustrating the operation of the compensating mechanism according to the embodiment of the present invention. The working principle of the compensation mechanism according to the embodiment of the present invention will be described below by taking two light rays (the first light ray L1 and the second light ray L2) in the incident light beam as an example. The laser incident beam from the collimating mechanism has a deformed spot profile, and the intensity of the second light L2 is greater than that of the first light L1. When an incident light beam traveling in the horizontal direction enters the beam splitter 231 at an incident angle of 45 °, 50% of the first light beam L1 is reflected as first reflected light LF1 at an angle of 90 ° (vertical direction) to the horizontal direction at a position a of the beam splitter 231, and 50% of the second light beam L2 is reflected as second reflected light LF2 at an angle of 90 ° (vertical direction) to the horizontal direction at a position B of the reflection surface of the beam splitter 231. Thus, since the intensity of the second reflected light LF2 is greater than the intensity of the first reflected light LF1, the intensity of the reflected light at the B position on the beam splitter 231 is greater than the intensity of the reflected light at the a position on the beam splitter 231, as shown in fig. 6.

Meanwhile, when the incident light beam transmitted in the horizontal direction is incident on the beam splitter 231 at an incident angle of 45 °, 50% of the first light L1 is transmitted by the beam splitter 231 at the position a of the beam splitter 231, forming a first transmitted light LT1 transmitted in the horizontal direction; in the position B of the beam splitter 231, 50% of the second light L2 is transmitted by the beam splitter 231, forming second transmitted light LT2 that is transmitted in the horizontal direction. Since the reflection surface of the first reflecting mirror 232 is 112.5 ° from the horizontal direction, the first transmitted light LT1 enters the first reflecting mirror 232 at an incident angle of 22.5 ° and is reflected at-45 ° from the horizontal direction. Since the reflection surface of the second mirror 233 is at-22.5 ° to the horizontal direction, the first transmitted light LT1 reflected by the first mirror 232 enters the second mirror 233 at an incident angle of 22.5 °, is reflected at 90 ° (vertical direction) to the horizontal direction, is transmitted through the beam splitter 231, and exits from the B position of the beam splitter 231. Similarly, the second transmitted light LT2 is incident on the first mirror 232 at an incident angle of 22.5 °, reflected at-45 ° to the horizontal direction, then incident on the second mirror 233 at an incident angle of 22.5 °, reflected at 90 ° (vertical direction) to the horizontal direction, transmitted through the beam splitter 231, and then emitted from the a position of the beam splitter 231, as shown by the long dashed line in fig. 8. In this way, since the intensity of the second transmitted light LT2 is greater than the intensity of the first transmitted light LT1, the intensity of the transmitted light at the B position on the beam splitter 231 is less than the intensity of the transmitted light at the a position on the beam splitter 231, as shown in fig. 7. In fig. 7, the short dashed line indicates the first transmitted light LT1, and the long dashed line indicates the second transmitted light LT 2.

If the initial spot profile of the originally output laser has deformation and position deviation on the short axis, the compensation mechanism of the embodiment of the invention reflects 50% of the laser according to the original path, and after the spot profile is inverted by the reflection of the other 50% of the laser, the reflected spot profile is fitted with the reflected part of the laser to form mutual compensation, so that the deformed and deviated spot profile returns to the standard symmetrical form on the short axis, as shown in fig. 8.

In practice, two compensation mechanisms may be provided, one to eliminate the distortion and deviation of the spot profile in the short axis direction and the other to eliminate the distortion and deviation of the spot profile in the long axis direction.

According to the structure and the working process of the embodiment of the invention, the optical compensation mechanism is arranged between the collimation mechanism and the focusing structure, and the compensation mechanism optimizes the initial laser spot profile of the laser, so that the phenomena of deformation and position deviation of the initial laser spot profile are well solved. Specifically, the compensation mechanism reflects 50% of laser according to the original path, and in addition, 50% of laser is reflected to turn over the light spot section and then is fitted with the reflected part of light to form mutual compensation, so that the deformation and the offset of the light spot section in the short axis direction or the long axis direction are eliminated, the deformed and offset light spot section returns to a standard symmetrical form on the short axis or the long axis, the uniformity of the initial light spot energy distribution is ensured, the substrate is prevented from generating watermark defects after irradiation of excimer laser annealing equipment, the service time of a laser window can be prolonged, the consumption of consumable spare parts in a laser annealing device is reduced, and the production cost is greatly reduced.

Fig. 9 is a schematic diagram of an implementation structure of an optical apparatus according to an embodiment of the present invention, which illustrates a transmission situation of a laser. In the present embodiment, the energy of the laser emitted from the laser device is first adjusted by the attenuation mechanism 21, and then the laser is processed by the collimation mechanism 22 and the compensation mechanism 23, a small portion of the light is transmitted to the light spot monitoring device 25 for monitoring, and the rest of the light is processed by the focusing mechanism 24 and then output to the annealing chamber. Specifically, as shown in fig. 9, the attenuation mechanism 21 includes an Entrance window (entry window, EW) and an attenuator (attentuator, ATT) sequentially arranged along the Laser propagation direction on the Laser (Laser) transmission path, the Entrance window being used for sealing the Laser trail (tail) and transmitting the Laser beam, and the attenuator being 1% ATT for attenuating the output Laser energy to 1%, forming a low power mode. The collimating mechanism 22 includes a first mirror M1, a second mirror M2, a first telescopic assembly TLSP1, a third mirror M3, a second telescopic assembly TLSP2, and a fourth mirror M4, which are arranged in this order along the laser propagation direction on the laser light transmission path. The reflector (Mirror) is used for reflecting the laser, and the Telescope Lens (TLSP) is used for spot collimation (collimation) to convert the laser into parallel light. The focusing structure 24 includes a fifth mirror M5, a sixth mirror M6, a first short-axis telescope TLSA1, a first long-axis telescope TLLA1, a second long-axis telescope TLLA2, a second short-axis telescope TLSA2, and a seventh mirror M7, which are sequentially disposed along the laser propagation direction on the laser light transmission path. The fifth reflecting and transmitting mirror M5 is used for reflecting most of the laser light and transmitting a small part of the laser light; the sixth mirror M6 and the seventh mirror M7 are used for reflecting laser light; two Short Axis Telescope Lens (TLSA) are used for adjusting the minor Axis direction size of the light spot, and two Long Axis Telescope (Long Axis Telescope)e Lens, TLSA) is used for adjusting the size of the long axis direction of the light spot, and the light spot with the set size is formed through focusing and imaging and is output to the annealing chamber. The flare monitoring device 25 is used for monitoring flare and comprises a first initial flare monitor optical path reflector M which is sequentially arranged along the transmission direction of the transmitted small part of laser_RBM1And a second initial light spot monitor light path reflector M_RBM2And an initial spot monitor RBM. Wherein, the initial facula monitor optical path reflector M_RBMFor bringing the laser into a Monitor position, an initial spot Monitor (RBM) is used to Monitor the parameter specification of the initial spot. The compensation mechanism 23 of the embodiment of the present invention is disposed between the collimation mechanism 22 and the focusing structure 24, and specifically disposed between the fourth mirror M4 of the collimation mechanism 22 and the fifth reflection and transmission mirror of the focusing structure 24, and is configured to perform spot profile compensation on the laser light, so that the spot profile forms a standard symmetrical form.

It should be noted that the structure of one beam splitter and two mirrors in fig. 5 is merely an example of a structure. In practical implementation, according to the technical idea of the compensation mechanism in the embodiment of the present invention, other structural forms may be adopted according to actual needs, and the embodiment of the present invention is not specifically limited herein. For example, the reflectivity or transmissivity of the beam splitter may be set to be greater than 50% according to actual needs. As another example, 3 or more mirrors may be provided.

Practical production shows that when the laser window is seriously polluted, not only the initial spot profile is deformed to a certain extent, but also the transmissivity of the laser does not meet the use specification. In general, the production process has strict specifications on the transmittance of laser light, such as the transmittance of a Front laser lens (Front) is required to be more than 97%, and the transmittance of a Rear laser lens (real) is required to be more than 96.5%. When the transmittance of the laser does not satisfy the use of the prescribed rate, the laser lens or the laser window needs to be replaced. At present, the replacement period of the existing laser window is 44 hours and about 8 million pulses, and the replacement period of the laser tube is 120 days and about 50 hundred million pulses. Obviously, for the laser window with large usage amount, high frequency and ultrahigh unit price, the continuous replacement of the laser window can lead to the straight-line increase of the production cost. In addition, when the laser window is seriously polluted, the energy in the laser tube is continuously higher, even an alarm is caused, the production is interrupted, the equipment utilization rate is seriously influenced, and the gas cost is increased.

In order to eliminate impurities in the gas inside the laser device, the prior art generally adopts solutions of improving the electrode material and purifying the gas outside the laser device. The electrode material improvement scheme is to design materials of two discharge electrodes in a laser device so as to avoid the electrode material from reacting with Halogen (Halogen) gas to generate a solid compound, but because the difficulty of improving the materials is high, the scheme is difficult to eliminate impurities of gas in the laser tube in a short period. The gas purification scheme is that a low-temperature gas purifier and an electrostatic filter are respectively arranged outside a laser device and are communicated with the laser device through a pipeline, gas is extracted from the laser device to be purified or filtered, and then other purified or filtered gas is sent back to the laser device. The inventor of the application finds that along with the increase of the single gas use time, the aging and the dirtying of the gas can cause the impurity particles to be obviously increased, and the impurity particles are mainly concentrated in a high-voltage discharge area, but the existing gas purification scheme can not effectively eliminate the impurity particles in the high-voltage discharge area.

Therefore, the embodiment of the invention provides a solution for effectively eliminating impurity particles in a high-voltage discharge area. Fig. 10 is a schematic structural diagram of a laser device according to an embodiment of the present invention. As shown in fig. 10, the main structure of the laser device according to the embodiment of the present invention includes a housing 11, a laser tube 12, a constant-current fan 13, a cooling rod 14, and a gas purification device 15. Wherein the housing 11 forms a gas circulation chamber 110, and the constant flow fan 13 and the cooling bar 14 are disposed in the gas circulation chamber 110 for cooling the gas in the gas circulation chamber 110. The laser tube 12 forms a resonant chamber 120, a pair of discharge electrodes 121 are disposed within the resonant chamber 120, and the resonant chamber 120 is in communication with the gas circulation chamber 110. A Gas Clean (Gas Clean) apparatus 25 of an embodiment of the present invention is disposed in the resonant chamber 120 of the laser tube 12 to eliminate Gas impurities on the laser output path.

The embodiment of the invention provides a technical idea different from the prior art, and the gas purification device is arranged in the laser tube, so that gas impurities in the laser tube can be eliminated, the gas impurities on a laser output path are mainly eliminated, and the gas with high impurity content is reduced to be present on the laser output path, so that a laser window penetrating through a laser beam is prevented from being polluted as far as possible until the laser tube reaches the service life of the laser tube, and the replacement of the laser tube is completed.

In the embodiment of the invention, the gas purification device can adopt the electrostatic adsorption tube to adsorb impurity particles on the laser output path through static electricity. Specifically, 1 group (1 on each of the left and right) of the electrostatic adsorption tubes is fixed to the side wall of the resonance chamber 120 by a fixing device and is supplied with power from an external power source. Preferably, 2 electrostatic adsorption pipes are respectively arranged on a channel for gas to enter and exit from the discharge electrode, namely 1 electrostatic adsorption pipe is arranged on a gas channel for gas to enter the discharge electrode, and the other 1 electrostatic adsorption pipe is arranged on a gas channel for gas to leave the discharge electrode, so that a symmetrical structure is formed, the gas purity of a high-voltage discharge area between the discharge electrodes can be improved, the situation that the gas is aged and dirtied due to the increase of the single gas service time is avoided, and the increase of impurity particles is avoided, and further the pollution aggravation of laser lenses at two ends of a laser output path is avoided.

As shown in fig. 10, the laser apparatus according to the embodiment of the present invention further includes a low-temperature gas purifier 16 and an electrostatic filter 17, and the low-temperature gas purifier 16 and the electrostatic filter 17 are communicated with the laser apparatus through a pipe. The cryogenic gas purifier 16 and the electrostatic filter 17 may be of conventional construction and will not be described in detail herein.

The embodiment of the invention provides a laser annealing device, wherein a gas purification device is arranged in a laser device, and the pollution degree of a laser window is effectively reduced by eliminating gas impurities on a laser output path. The pollution degree of the laser window is reduced, the using times of the laser window can be increased on the premise that the laser transmissivity is ensured to meet the using regulations, meanwhile, the deformation of the section of the initial light spot can be reduced in the service life of the laser window, and the energy distribution uniformity of the initial light spot is ensured. Experiments show that the use frequency of the laser window can be increased by 2 times for the use regulation that the laser transmissivity is more than or equal to 96.5%. The cost of purchasing tens of millions of laser windows can be reduced by increasing the use times of each laser window by 2 times according to the times of hundreds of laser annealing processes per year. Meanwhile, the service life of the laser tube can be prolonged to a certain extent due to the increase of the use times of the laser window. Therefore, the economic benefit generated by the solution of the invention is very obvious and is worth popularizing.

According to the embodiment of the invention, on the premise of not changing the original optical path transmission channel of the laser annealing device and the internal structure of the laser device, the optical compensation mechanism is added in the optical device, and the electrostatic adsorption tube is added in the laser device, so that the initial spot profile of the output laser is optimized, and the use times of the laser window is increased. Due to the small size of the added compensation mechanism and the electrostatic adsorption tube, other structures inside the optical device and the laser device cannot be influenced. Because the arrangement positions of the compensation mechanism and the electrostatic adsorption tube do not influence the gas reaction of the laser, the laser annealing device added with the compensation mechanism and the electrostatic adsorption tube is not influenced in the aspect of laser generation, and the normal process requirements can be met. Because the added compensation mechanism and the electrostatic adsorption tube have low cost and simple installation, the solution of the embodiment of the invention can be applied to a newly designed laser annealing device and can also be applied to a laser annealing device in use, so that the initial facula profile of laser is optimized, the process quality of laser annealing is further improved, the probability of spots in the substrate being poor is reduced, the realizability is high, the practicability is high, the effect is obvious, and the application prospect is good.

Based on the technical concept, the embodiment of the invention also provides laser annealing equipment which comprises the laser annealing device.

In the description of the embodiments of the present invention, it should be understood that the terms "middle", "upper", "lower", "front", "rear", "vertical", "horizontal", "top", "bottom", "inner", "outer", etc. indicate orientations or positional relationships based on those shown in the drawings, and are only for convenience of description and simplicity of description, but do not indicate or imply that the devices or elements referred to must have a particular orientation, be constructed in a particular orientation, and be operated, and thus, should not be construed as limiting the present invention.

In the description of the embodiments of the present invention, it should be noted that, unless explicitly stated or limited otherwise, the terms "mounted," "connected," and "connected" are to be construed broadly, and may be, for example, fixedly connected, detachably connected, or integrally connected; can be mechanically or electrically connected; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. The specific meanings of the above terms in the present invention can be understood in specific cases to those skilled in the art.

Although the embodiments of the present invention have been described above, the above description is only for the convenience of understanding the present invention, and is not intended to limit the present invention. It will be understood by those skilled in the art that various changes in form and details may be made therein without departing from the spirit and scope of the invention as defined by the appended claims.