阅读说明：本技术 一种带水冷功能的抛光机陶瓷压力盘 (Ceramic pressure disc with water cooling function for polishing machine ) 是由 王永成 于 2019-09-17 设计创作，主要内容包括：本发明适用于半导体和光电加工技术领域,提供了一种带水冷功能的抛光机陶瓷压力盘,包括内部注满水的陶瓷压力盘,所述陶瓷压力盘包括外壳和螺旋板,所述螺旋板固定连接于所述外壳的内壁,且将所述陶瓷压力盘分为上下两个部分,下半部分为平面螺旋状的引导槽,上半部分为扇形槽,该扇形槽的下端与所述引导槽相连通,所述螺旋板最高端的所述扇形槽内连通有出水管；陶瓷压力盘内部加工有螺旋板,且该螺旋板的上下两侧水冷区,上方的扇形槽和下方的引导槽,对内部注入的水进行流向的引导,使得整个内部的水与陶瓷压力盘的接触面积增大,停留时间变长,使得陶瓷压力盘进行冷却的效果好,提高了抛光机陶瓷压力盘的热稳定性。(The invention is suitable for the technical field of semiconductor and photoelectric processing, and provides a ceramic pressure disc of a polishing machine with a water cooling function, which comprises a ceramic pressure disc filled with water, wherein the ceramic pressure disc comprises a shell and a spiral plate, the spiral plate is fixedly connected to the inner wall of the shell and divides the ceramic pressure disc into an upper part and a lower part, the lower part is a planar spiral guide groove, the upper part is a fan-shaped groove, the lower end of the fan-shaped groove is communicated with the guide groove, and a water outlet pipe is communicated with the fan-shaped groove at the highest end of the spiral plate; the inside processing of ceramic pressure dish has the spiral plate, and the upper and lower both sides water-cooling district of this spiral plate, and the guiding groove of the sector groove of top and below carry out the guide of flow direction to the water that inside was poured into for the area of contact increase of whole inside water and ceramic pressure dish, dwell time lengthens, makes ceramic pressure dish carry out refrigerated effectual, has improved the thermal stability of burnishing machine ceramic pressure dish.)

1. The utility model provides a take burnishing machine ceramic pressure dish of water-cooling function which characterized in that: including inside ceramic pressure dish (6) of filling up water, ceramic pressure dish (6) are including shell (61) and spiral plate (62), spiral plate (62) fixed connection in the inner wall of shell (61), and will ceramic pressure dish (6) divide into two parts from top to bottom, and the latter half is plane spiral helicine guiding groove (64), and the first half is the sector groove, the lower extreme of this sector groove with guiding groove (64) are linked together, spiral plate (62) highest end the interior intercommunication of sector groove has outlet pipe (4), spiral plate (62) lowest end the interior intercommunication of guiding groove (64) has inlet tube (5).

2. The ceramic pressure disk with the water cooling function for the polishing machine as claimed in claim 1, wherein: the fan-shaped grooves are formed by a plurality of partition plates (63) which are fixed on the upper surface of the spiral plate (62) in an alternating mode.

3. The ceramic pressure disk with the water cooling function for the polishing machine as claimed in claim 2, wherein: the heights of the partition plates (63) are different, and the upper surfaces of the partition plates are flush with the shell (61).

4. The ceramic pressure disk with the water cooling function for the polishing machine as claimed in claim 3, wherein: the inside center department of ceramic pressure dish (6) is provided with the center pillar, the inside of center pillar has been seted up outlet pipe (4) with inlet tube (5), outlet pipe (4) are located the highest end of center pillar and with the sector groove is linked together, inlet tube (5) are located the lowest end of center pillar and with spiral plate (62) are linked together.

5. The ceramic pressure disk with the water cooling function for the polishing machine as claimed in claim 4, wherein: the partition plate (63) is divided into two types, one side of the partition plate is fixed on the inner wall of the shell (61), and the other side of the partition plate is fixed on the outer wall of the center pillar.

6. The ceramic pressure disk with the water cooling function for the polishing machine as claimed in claim 3, wherein: the starting end and the terminating end of the spiral plate (62) are positioned at different heights on the same straight line.

7. The ceramic pressure disk with the water cooling function for the polishing machine as claimed in claim 4, wherein: the ceramic pressure plate is characterized in that the upper surface of the ceramic pressure plate (6) is covered with a mounting plate (3), the water outlet pipe (4) and the water inlet pipe (5) are arranged in the mounting plate (3), and the water outlet pipe (4) and the water inlet pipe (5) are correspondingly communicated with each other through a central column in the ceramic pressure plate (6) below.

8. The ceramic pressure disk with the water cooling function for the polishing machine as claimed in claim 5, wherein: the extension axle of upper end fixedly connected with cylinder (2) of mounting disc (3), the upper end of cylinder (2) is provided with rotary joint (1).

9. The ceramic pressure disk with the water cooling function for the polishing machine as claimed in claim 1, wherein: the lower surface of the ceramic pressure disc (6) is fixedly connected with a ceramic carrying disc (7), and the lower surface of the ceramic carrying disc (7) is provided with a wafer (8).

10. The ceramic pressure disk with the water cooling function for the polishing machine as claimed in claim 9, wherein: the wafer (8) is positioned on the upper surface of a polishing disk (9) for polishing and grinding the wafer.

Technical Field

The invention belongs to the technical field of semiconductor and photoelectric processing, and particularly relates to a ceramic pressure disc of a polishing machine with a water cooling function.

Background

In the using process of the single-side polishing equipment for the semiconductor wafer, a cylinder is required to be used for pressurizing the back surface of a ceramic disc for adhering the wafer through a pressure disc, and the pressure of the cylinder of the traditional polishing machine is applied to the back surface of the ceramic disc for adhering the wafer through the pressure disc; this structure has the following disadvantages:

the wafer generates heat in the polishing process, and the ceramic disc adhered with the wafer is warped due to the generated heat, so that the polishing precision of the wafer is influenced; after the heat generated by polishing is transmitted to the metal pressure disc through the ceramic carrier disc, the metal pressure disc generates larger thermal deformation, the deformation of the ceramic carrier disc is aggravated, and the processing precision of the wafer is further worsened; the pressure disc made of metal is contacted with the ceramic carrier disc, so that the pollution of metal ions to wafers is increased in the turnover of polishing production, the ceramic disc expands due to the temperature rise of the working surface of the ceramic disc in the working surface process, and the working area of the ceramic disc is greatly deformed due to the expansion of the integral ceramic disc, so that the processing precision of the wafers is influenced; the long-time contact between the ceramic wafer carrying disc and the metal pressure disc can cause the contact surface of the pressure disc made of metal materials to be abraded, so that the precision of the pressurizing surface of the pressure disc is reduced, and the processing precision of the wafer is influenced.

Disclosure of Invention

The invention provides a polishing machine ceramic pressure disc with a water cooling function, and aims to solve the problems that the ceramic disc is deformed by heating during the polishing process of a wafer, and the heat of the ceramic disc is transmitted to the pressure of a metal material above the ceramic disc to cause more serious deformation to influence the precision of the wafer and the metal ion pollution.

The invention is realized in such a way that the ceramic pressure disc with the water cooling function of the polishing machine comprises a ceramic pressure disc filled with water, wherein the ceramic pressure disc comprises a shell and a spiral plate, the spiral plate is fixedly connected to the inner wall of the shell and divides the ceramic pressure disc into an upper part and a lower part, the lower part is a guide groove in a planar spiral shape, the upper part is a fan-shaped groove, the lower end of the fan-shaped groove is communicated with the guide groove, a water outlet pipe is communicated with the fan-shaped groove at the highest end of the spiral plate, and a water inlet pipe is communicated with the guide groove at the lowest end of the spiral plate.

Preferably, the fan-shaped grooves are formed by alternately fixing a plurality of partition plates on the upper surface of the spiral plate.

Preferably, the height of a plurality of the partition boards is different, and the upper surface of the partition boards is flush with the shell.

Preferably, the inside center department of ceramic pressure dish is provided with the center pillar, the inside of center pillar has been seted up the outlet pipe with the inlet tube, the outlet pipe is located the highest end of center pillar and with the sector groove is linked together, the inlet tube is located the lowest end of center pillar and with the spiral plate is linked together.

Preferably, the partition board is divided into two types, one side of the partition board is fixed on the inner wall of the shell, and the other side of the partition board is fixed on the outer wall of the center pillar.

Preferably, the starting end and the terminating end of the spiral plate are located at different heights on the same straight line.

Preferably, the upper surface of the ceramic pressure disc is covered with a mounting disc, the water outlet pipe and the water inlet pipe are arranged in the mounting disc and are correspondingly communicated with the water outlet pipe and the water inlet pipe which are arranged in the central column below the ceramic pressure disc.

Preferably, the upper end fixedly connected with cylinder of mounting disc extends the axle, the upper end of cylinder is provided with rotary joint.

Preferably, the lower surface of the ceramic pressure plate is fixedly connected with a ceramic carrying plate, and the lower surface of the ceramic carrying plate is provided with a wafer.

Preferably, the wafer is located on the upper surface of a polishing disk on which polishing and grinding are performed.

Compared with the prior art, the invention has the beneficial effects that: compared with a metal pressure disc, the ceramic pressure disc with the water cooling function of the invention has extremely high thermal stability, can maintain extremely high precision in the processing process, also avoids the problem of metal ion pollution generated by the pressure disc, has high hardness and good wear resistance, can still maintain extremely high precision after the ceramic pressure disc and the wafer ceramic carrier disc are contacted for a long time, can ensure the precision of wafers, further eliminates thermal expansion deformation possibly caused by heat generated in the polishing process by the cooling function in the ceramic pressure disc, simultaneously cools the wafer ceramic carrier disc, also ensures the precision of the wafer ceramic carrier disc, further ensures the precision of the wafers, and has the cooling function of processing a spiral plate in the ceramic pressure disc and water cooling areas on the upper side and the lower side of the spiral plate, the guide groove of the sector groove of top and below carries out the guide of flow direction to the water that inside was poured into for the area of contact of whole inside water and ceramic pressure dish increases, and dwell time lengthens, makes ceramic pressure dish carry out refrigerated effectual, has improved the thermal stability of burnishing machine ceramic pressure dish.

Drawings

FIG. 1 is a schematic view of the overall structure of the present invention;

FIG. 2 is a schematic overall front view of the present invention;

FIG. 3 is a schematic structural view of a ceramic pressure plate according to the present invention;

FIG. 4 is a schematic plan view of the upper half of the ceramic pressure plate of the present invention;

FIG. 5 is a schematic plan view of the lower half of the ceramic pressure plate of the present invention;

in the figure: 1. a rotary joint; 2. a cylinder; 3. mounting a disc; 4. a water outlet pipe; 5. a water inlet pipe; 6. a ceramic pressure disc; 61. a housing; 62. a spiral plate; 63. a partition plate; 64. a guide groove; 7. a ceramic carrier disc; 8. A wafer; 9. and (7) polishing the disc.

Detailed Description

In order to make the objects, technical solutions and advantages of the present invention more apparent, the present invention is described in further detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the invention and are not intended to limit the invention.

Referring to fig. 1-5, the present invention provides a technical solution: the utility model provides a take water-cooling function's burnishing machine ceramic pressure dish, fill ceramic pressure dish 6 of water including inside, ceramic pressure dish 6 includes shell 61 and spiral plate 62, spiral plate 62 fixed connection is in the inner wall of shell 61, and divide into two parts about ceramic pressure dish 6, the latter half is plane spiral helicine guiding groove 64, the first half is the sector groove, the lower extreme and the guiding groove 64 of this sector groove are linked together, the sector groove in-connection of spiral plate 62 highest end has outlet pipe 4, the guiding groove 64 in-connection of spiral plate 62 lowest end has inlet tube 5.

In the embodiment, when in use, the rotary joint 1 is firstly butted and installed with an upper working device, then the cylinder 2 is started, the cylinder 2 is used for extending the extension shaft downwards, the mounting disc 3 fixed by the extension shaft is pushed to move downwards along with the extension shaft, the mounting disc 3 moving downwards pushes the ceramic pressure disc 6 fixedly connected with the ceramic pressure disc to move downwards, the ceramic pressure disc 6 moves downwards to drive the ceramic carrying disc 7 to move downwards, the ceramic carrying disc 7 moves downwards to drive the wafer 8 to move downwards to be attached to the polishing disc 9 below, and the polishing of lower surface is carried out by polishing dish 9 of below, and the heat that the polishing was polished and is produced carries dish 7 transmission for ceramic pressure dish 6 through the pottery, and water cooling is carried out to it to the water in the ceramic pressure dish 6, has avoided the thermal expansion of ceramic pressure dish 6, also avoids the metal ion pollution problem that original metal material pressure dish produced.

In this embodiment, when in use, the pipe orifice of the water inlet pipe 5 formed on the mounting plate 3 is first butted with the water pipe of the external water pump for supplying water to the inside of the ceramic pressure plate 6, and the pipe orifice of the water outlet pipe 4 formed on the mounting plate 3 is butted with the external water outlet pipe for discharging water from the inside of the ceramic pressure plate 6, the water supply pump is started, the water pump conveys the water inside the water inlet pipe 5 of the mounting plate 3 through the water pipe and flows downwards along the water inlet pipe 5 of the mounting plate 3 into the center pillar water inlet pipe 5 butted with the ceramic pressure plate 6, then flows downwards along the water inlet pipe 5 of the center pillar through the outlet at the lowest end into the guide groove 64 below the ceramic pressure plate 6, and slowly diffuses from inside to outside along the guide groove 64, and when diffusing to the largest circle, the end of the spiral plate 62 is in the position communicated with the fan-shaped groove, through the undermost end that advances the sector groove, increase along with the water yield that gets into wherein afterwards, water is along the slow inside that is filling whole ceramic pressure dish 6 of sector groove, when the water level reached the sector groove highest point, the inside that enters into outlet pipe 4 through the outlet pipe 4 water inlet of seting up on the center pillar, enter into 3 outlet pipes 4 of mounting disc through center pillar outlet pipe 4 afterwards, it is discharged to the external drain pipe of external world to flow through 3 outlet pipe 4 of mounting disc finally, the drain pipe also is provided with the water pump simultaneously, be used for when the working shaft is not inside when supplying water, can be timely will be located the inside water of ceramic pressure dish and take out futilely, avoid water to deposit for a long time in inside and deteriorate, influence the use of ceramic pressure dish 6, also can select not to take out certainly, it cools down to its inside to reserve.

Further, the sector-shaped slots are formed by alternately forming a plurality of partitions 63 fixed to the upper surface of the spiral plate 62.

In the embodiment, the lower bottom surface of the fan-shaped groove is the spiral plate 62, so that the lower bottom surface is gradually reduced, the partition plates 63 which are mutually alternated are arranged in the middle to form a continuous S-shaped water flowing channel, the retention time of water in the fan-shaped groove can be prolonged, the contact area with the ceramic pressure plate 6 body is increased, and the water cooling can be rapidly carried out on the ceramic pressure plate.

Furthermore, the heights of the plurality of partition plates 63 are different, and the upper surfaces of the partition plates are flush with the shell 61; the partition 63 is divided into two types, one side of which is fixed to the inner wall of the case 61 and the other side of which is fixed to the outer wall of the center pillar.

In this embodiment, the height setting of a plurality of baffle 63 differs for the spiral plate 62 that the adaptation height descends gradually, the height setting of baffle 63 flushes with shell 61 upper surface mutually, thereby when ceramic pressure dish 6 is closed to the mounting disc 3 lid, the lower surface of mounting disc 3 can be laminated to the upper end of baffle 63, cut apart inside water, avoid intercommunication each other, it is poor to cause the radiating effect of effect, one side is fixed in shell 61 inner wall, this side of shell 61 inner wall has been sealed, that one side opening of center pillar is left, otherwise the fixed center pillar outer wall of one side, this side of center pillar outer wall has been sealed, that side opening of shell 61 is left, two kinds of mutual alternative baffle 63 stagger, thereby constitute continuous a plurality of S types, make inside rivers carry out the S type and flow and increased rivers at its inside dwell time.

Further, the inside center department of ceramic pressure dish 6 is provided with the center pillar, and outlet pipe 4 and inlet tube 5 have been seted up to the inside of center pillar, and outlet pipe 4 is located the highest end of center pillar and is linked together with the fan-shaped groove, and inlet tube 5 is located the lowest end of center pillar and is linked together with spiral plate 62.

In this embodiment, the center department at ceramic pressure dish 6 sets up the center pillar, the setting of center pillar can be regarded as main bearing on the one hand, accept the pressure that top mounting disc 3 and cylinder 2 exerted, and transmit the pottery of transmitting the below and carry dish 7 and wafer 8, inlet tube 5 and outlet pipe 4 are seted up to the inside of on the other hand center pillar, and inlet tube 5 is located the lower extreme, outlet pipe 4 is located the top, thereby can let water be full of the inside of whole ceramic pressure dish 6, the area of contact of water with ceramic pressure dish 6 has been increased, accelerate the heat dissipation.

Further, the starting end and the terminating end of the spiral plate 62 are located at different heights on the same straight line.

In this embodiment, spiral plate 62 sets up to the heliciform, and the setting of spiral makes the water of below carry out the gentle ascending along spiral plate 62 and prolongs to fill whole ceramic pressure dish 6's inner space, carry out the water-cooling to whole inner space, spiral plate 62 carries out fixed being connected with shell 61 simultaneously, and on shell 61's heat also transmitted spiral plate 62, spiral plate 62 and the contact of water had increased the area of contact of whole ceramic pressure dish 6 with water, had accelerated the water-cooling heat dissipation.

Furthermore, the upper surface of the ceramic pressure plate 6 is covered with the mounting plate 3, and the mounting plate 3 is internally provided with a water outlet pipe 4 and a water inlet pipe 5 which are correspondingly communicated with the water outlet pipe 4 and the water inlet pipe 5 which are arranged on the inner center column of the lower ceramic pressure plate 6.

In this embodiment, mounting disc 3 is fixed at the upper surface of ceramic pressure dish 6, it is sealed to cover the upper surface of ceramic pressure dish 6, avoid overflowing of water, inlet tube 5 and outlet pipe 4 are seted up to the center pillar inside, dock with inlet tube 5 and outlet pipe 4 in the mounting disc 3 of top, thereby both supply water in to ceramic pressure dish 6, also with the log raft play in ceramic pressure dish 6, the cooperation of mounting disc 3 makes the inside hydroenergy of ceramic pressure dish 6 discharge and supply in time, provide basis and support for the water-cooling of ceramic pressure dish 6.

Further, the upper end of the mounting disc 3 is fixedly connected with an extension shaft of the cylinder 2, and the upper end of the cylinder 2 is provided with a rotary joint 1.

In this embodiment, the cylinder 2 is arranged to push the lower mounting plate 3, the ceramic pressure plate 6, the ceramic carrier plate 7 and the wafer 8 to move downwards, so that the wafer 8 is attached to the polishing plate 9 and polished by the polishing plate 9, and the rotary joint 1 is used for screwing with a processing device above, thereby completing the assembly of the whole processing machine.

Further, a ceramic carrier plate 7 is fixedly connected to the lower surface of the ceramic pressure plate 6, and a wafer 8 is arranged on the lower surface of the ceramic carrier plate 7.

In this embodiment, the wafer 8 on the lower surface, which is the function of the ceramic carrier plate 7, is fixed on the surface of the wafer 8, so that the failure of polishing and grinding and the insufficient precision of polishing and grinding of the wafer 8 due to the movement during polishing and grinding are avoided, and the unqualified wafer 8 is manufactured.

Further, the wafer 8 is located on the upper surface of the polishing pad 9 on which polishing is performed.

In the present embodiment, the polishing disk 9 is mounted on the polishing machine, and cooperates with the abrasive or the polishing agent to complete the grinding/polishing operation, and the polishing disk 9 cooperates with the polishing agent and rubs against the lower surface of the wafer 8, so as to achieve the purpose of removing the paint surface contamination, the oxide layer, and the shallow mark.

The above description is only for the purpose of illustrating the preferred embodiments of the present invention and is not to be construed as limiting the invention, and any modifications, equivalents and improvements made within the spirit and principle of the present invention are intended to be included within the scope of the present invention.