阅读说明：本技术 波导的形成方法以及包含该波导的sf6气体无源传感器 (The forming method of waveguide and SF6 gas passive sensor comprising the waveguide ) 是由 乔磊 廖志军 刘瑞 郑哲 崔文朋 池颖英 陈婷 李春晖 李纪平 于 2019-08-30 设计创作，主要内容包括：本发明公开了一种波导的形成方法以及包含该波导的SF6气体无源传感器,波导的形成方法包括下列步骤：在硅衬底上生长绝缘层；在绝缘层的表面旋涂光刻胶；光刻光刻胶并形成波导结构；在波导结构内气相淀积玻璃以形成玻璃波导层；应用剥离技术除去没有被光刻的光刻胶以及位于波导结构以外的玻璃以形成波导主体；在波导主体上旋涂聚合物；光刻聚合物并固化后以形成腔室支柱；以及将腔室支柱的顶部通过键合技术形成腔室,多个腔室连接形成波导。本发明的波导的形成方法以及包含该波导的SF6气体无源传感器,其采用无源设计增加产品寿命、提升传感器灵敏度、具备实时在线监测功能。(SF6 gas passive sensor the invention discloses a kind of forming method of waveguide and comprising the waveguide, the forming method of waveguide include the following steps: to grow insulating layer on a silicon substrate；In the surface spin coating photoresist of insulating layer；Photoetching photoresist simultaneously forms waveguiding structure；Vapor deposition glass is in waveguiding structure to form glass waveguide layer；The photoresist not being photo-etched using lift-off technology removing and the glass other than waveguiding structure are to form waveguide body；The spin on polymers in waveguide body；To form chamber pillar after photolithographic polymer and solidification；And the top of chamber pillar is formed into chamber by bonding techniques, multiple chambers connect to form waveguide.The forming method of waveguide of the invention and SF6 gas passive sensor comprising the waveguide use passive design to increase life of product, promote transducer sensitivity, have real time on-line monitoring function.)

1. a kind of forming method of waveguide, characterized in that it comprises the following steps:

Insulating layer is grown on a silicon substrate；

In the surface spin coating photoresist of the insulating layer；

Photoresist described in photoetching is to form waveguiding structure；

Vapor deposition glass is in the waveguiding structure to form glass waveguide layer；

The photoresist not being photo-etched and the glass other than the waveguiding structure are removed to form waveguide master Body；

The spin on polymers in the waveguide body；

To form chamber pillar after polymer described in photoetching and solidification；And

Chamber is formed on the top for being bonded the chamber pillar, and multiple chambers connect to form waveguide.

2. the forming method of waveguide as described in claim 1, which is characterized in that the waveguide is spiral shape waveguide.

3. the forming method of waveguide as claimed in claim 2, which is characterized in that in the light for removing and not being photo-etched Photoresist and glass other than the waveguiding structure further include removing to remain using heating technique to be formed after waveguide body Steam.

4. the forming method of waveguide as described in claim 1, which is characterized in that the insulating layer is for being isolated the silicon substrate With the glass.

5. the forming method of waveguide as described in claim 1, which is characterized in that the polymer uses PDMS polymer.

6. the forming method of waveguide as described in claim 1, which is characterized in that the photoresist uses SU8 photoresist.

7. the forming method of waveguide as described in claim 1, which is characterized in that described to remove the photoetching not being photo-etched Glue and the glass other than the waveguiding structure use lift-off technology.

8. a kind of SF6 gas passive sensor, it includes the waveguide that forming method as described in claim 1 is formed, features It is, the SF6 gas passive sensor includes:

Silicon substrate；

Insulating layer is grown on the silicon substrate, and the waveguide is arranged on the insulating layer；

Light input interface is connected to one end of the waveguide；

Light output interface is connected to the other end of the waveguide；And

Polymer is coated on the junction of the light input interface and light output interface and the waveguide.

9. the SF6 gas passive sensor based on non-dispersive infrared as claimed in claim 8, which is characterized in that the waveguide For spiral shape waveguide.

10. SF6 gas passive sensor as claimed in claim 8, which is characterized in that the polymer is polymerize using PDMS Object.

Technical field

The present invention relates to high-tension apparatus monitorings, sensory field, especially with regard to a kind of forming method of waveguide.

Background technique

In power industry, high-tension switch gear accounts for about 80% or more SF6 gas consumption, and the gas consumption of Medium voltage switch or circuit breaker accounts for about 10%.In 2014, ring network cabinet total amount was up to 119.93 ten thousand faces, and wherein SF6 gas ring network cabinet accounts for 64%, i.e. SF6 gas looped network Cabinet total amount is in 76.76 ten thousand faces；It is domestic at present that there are Novel intelligent substation 5182,2 monitoring devices are purchased with each website It calculates, accounts for the monitoring device that the intelligent substation of total 10% (500) more renews every year, an annual requirement is 1000；SF6 Gas-monitoring equally also has very big market demand in conduit line, and by taking Beijing as an example, there are about cable shafts for Beijing More than 7200, about 36 myriametre of conduit line, pilot fills one group of monitoring device for 200 meters at present, and other points are 1000 meters of assembly one Group.So in conclusion it is very necessary that reasonable normal use, which simultaneously monitors SF6 gas, for current actual demand amount 's.

SF6 gas sensing devices service life based on electrion ionization method is shorter, work that cannot be steady in a long-term, drift Move big, easily wrong report, unsuitable quantitative on-line checking；Although the SF6 gas sensing devices based on electrochemical process have preferable steady It is qualitative, but since sensor participates in reacting, it is possible to create secondary pollution will regularly replace sensor, increase later period investment.Mesh It is preceding the study found that SF6 detection device and equipment based on infrared absorption method have greater advantage in performance, but equipment volume is huge Greatly, detection cycle is long, is not suitable for building monitoring network and is measured in real time.Meanwhile traditional SF6 gas detection sensor is mostly Active device, active device will necessarily introduction means service life and powerup issues.Although existing handheld device solves equipment The excessive problem of volume, but there are battery powerup issues, and it is passive detection that secondly the equipment, which carries out gas detection, i.e., only in people Discovery gas leakage is possible to when inspection, can not carry out real-time online detection.

The information disclosed in the background technology section is intended only to increase the understanding to general background of the invention, without answering When being considered as recognizing or imply that the information constitutes the prior art already known to those of ordinary skill in the art in any form.

Summary of the invention

It is an object of the present invention to provide a kind of forming methods of waveguide, the waveguide material because of light on sensor surface layer It is propagated in material, and optical fiber and sensor direct-coupling, does not need special light absorption gas chamber and optical path reflection unit, thus can subtracted Skinny device volume and the advantages of avoiding secondary pollution；Life of product is increased using passive design, promotion transducer sensitivity, is had Real time on-line monitoring function.

To achieve the above object, the present invention provides a kind of forming methods of waveguide, including the following steps: on a silicon substrate Grow insulating layer；In the surface spin coating photoresist of insulating layer；Photoetching photoresist simultaneously forms waveguiding structure；The gas phase in waveguiding structure Deposited glass is to form glass waveguide layer；The photoresist not being photo-etched and the glass other than waveguiding structure are removed with shape At waveguide body；The spin on polymers in waveguide body；To form chamber pillar after photolithographic polymer and solidification；And by chamber The top of pillar forms chamber by bonding techniques, and multiple chambers connect to form waveguide.

In a preferred embodiment, waveguide is spiral shape waveguide.

In a preferred embodiment, the photoresist not being photo-etched and the glass other than waveguiding structure are being removed Glass further includes that remaining steam is removed using heating technique after waveguide body to be formed.

In a preferred embodiment, insulating layer is for being isolated silicon substrate and glass.

In a preferred embodiment, polymer uses PDMS polymer.

In a preferred embodiment, photoresist uses SU8 photoresist.

In a preferred embodiment, the photoresist not being photo-etched and the glass other than waveguiding structure are removed Using lift-off technology.

Another object of the present invention is to provide a kind of SF6 gas passive sensors, the wave because of light on sensor surface layer It leads in material and propagates, and optical fiber and sensor direct-coupling, do not need special light absorption gas chamber and optical path reflection unit, thus The advantages of equipment volume can be reduced and avoid secondary pollution.

To achieve the above object, the present invention provides a kind of SF6 gas passive sensor, above-mentioned forming method system is used The waveguide made, SF6 gas passive sensor include silicon substrate and the insulating layer that is grown on silicon substrate, and waveguide is arranged in insulating layer On；Light input interface is connected to one end of waveguide；Light output interface is connected to the other end of waveguide；And it is coated on light The polymer of the junction of input interface and light output interface and waveguide.

In a preferred embodiment, waveguide is spiral shape waveguide.

In a preferred embodiment, polymer uses PDMS polymer.

Compared with prior art, the forming method of waveguide of the invention and the SF6 gas passive sensing comprising the waveguide Device have the advantages that its because light is propagated in the waveguide material on sensor surface layer, and optical fiber and sensor direct-coupling, Not the advantages of not needing special light absorption gas chamber and optical path reflection unit, thus equipment volume can be reduced and avoid secondary pollution. And it uses passive design to have the function of to increase life of product, promote transducer sensitivity, have real time on-line monitoring.

Detailed description of the invention

Fig. 1 is the flow chart of the forming method of waveguide according to an embodiment of the present invention；

Fig. 2 is the schematic cross-section of the step 301 of the forming method of waveguide according to an embodiment of the present invention；

Fig. 3 is the schematic cross-section of the step 302 of the forming method of waveguide according to an embodiment of the present invention；

Fig. 4 is the schematic cross-section of the step 303 of the forming method of waveguide according to an embodiment of the present invention；

Fig. 5 is the schematic cross-section of the step 304 of the forming method of waveguide according to an embodiment of the present invention；

Fig. 6 is the schematic cross-section of the step 305 of the forming method of waveguide according to an embodiment of the present invention；

Fig. 7 is the schematic cross-section of the step 306 of the forming method of waveguide according to an embodiment of the present invention；

Fig. 8 is the schematic cross-section of the step 307 of the forming method of waveguide according to an embodiment of the present invention；

Fig. 9 is the schematic cross-section of the step 308 of the forming method of waveguide according to an embodiment of the present invention；

Figure 10 is the cross section structure schematic diagram of waveguide according to an embodiment of the present invention；

Figure 11 is the light path schematic diagram of SF6 gas passive sensor according to an embodiment of the present invention.

Main appended drawing reference explanation:

1- silicon substrate, 2- insulating layer, 3- waveguide, 31- photoresist layer, 32- waveguiding structure, 33- glass waveguide layer, 34- wave Lead main body, 35- polymer, 36- pillar, 37- chamber, 4- optical fiber input interface, 5- optical fiber output interface, 6- spiral shape waveguide.

Specific embodiment

With reference to the accompanying drawing, specific embodiments of the present invention will be described in detail, it is to be understood that guarantor of the invention Shield range is not limited by the specific implementation.

Unless otherwise explicitly stated, otherwise in entire disclosure and claims, term " includes " or its change Changing such as "comprising" or " including " etc. will be understood to comprise stated element or component, and not exclude other members Part or other component parts.

A kind of forming method of waveguide proposed in this paper follows lambert Bill (Lamber-Beer) theorem.The theorem can Foundation as gas concentration quantitative detection.When the gas that light penetrating concentration hooks, portion of energy is actually taken up by gas, and light intensity occurs Decaying.It is assumed that light intensity be I0 a monochromic beam through distance be L even concentration gas after, output intensity I, then I and I0 meets following relationship: I=I₀e^-aCL.I in formula₀It is the incident intensity of light；I is light through the output intensity after gas；A is gas Body absorption coefficient；The concentration of C expression gas；L indicates the distance (light path) that light transmits in gas.As it can be seen that working as incident intensity one Periodically, output intensity I is about coefficient a, the function of light path L and gas concentration C.A is related with light channel structure with the ingredient of gas, In the case where the single light channel structure of gas componant determines, a is a fixed value, which can be found out by experiment.It is fixed in a- In the case where, gas concentration is bigger, and light path is longer, and the value of output intensity I is smaller, which provides for gas concentration quantitative Theoretical foundation.According to actual needs, reasonable gas absorbing model is designed, measurement result is analyzed, gas to be measured can be acquired The concentration of body.

As shown in Figure 1, Fig. 1 is the flow chart of the forming method of waveguide according to an embodiment of the present invention.According to this hair A kind of forming method of waveguide of bright preferred embodiment, includes the following steps 301 to 308:

Referring to Fig. 2, the section that Fig. 2 is the step 301 of the forming method of waveguide according to an embodiment of the present invention shows It is intended to, in step 301, grows insulating layer (silicon dioxide layer 2) on silicon substrate 1, insulating layer is for being isolated silicon substrate 1 and glass Glass；

Referring to Fig. 3, the section that Fig. 3 is the step 302 of the forming method of waveguide according to an embodiment of the present invention shows It is intended to, in step 302, in the surface spin coating SU8 photoresist 31 of insulating layer；

Referring to Fig. 4, the section that Fig. 4 is the step 303 of the forming method of waveguide according to an embodiment of the present invention shows It is intended to, in step 303, photoetching photoresist 31 simultaneously forms waveguiding structure 32, and waveguiding structure 32 is helical structure；

Referring to Fig. 5, the section that Fig. 5 is the step 304 of the forming method of waveguide according to an embodiment of the present invention shows It is intended to, in step 304, vapor deposition glass is in waveguiding structure 32 to form glass waveguide layer 33；

Referring to Fig. 6, the section that Fig. 6 is the step 305 of the forming method of waveguide according to an embodiment of the present invention shows It is intended to, in step 305, removes the photoresist 31 not being photo-etched using lift-off technology and other than waveguiding structure 32 Glass removes remaining steam using heating technique to form waveguide body 34, e.g. uses oven or other heating skills Art etc.；

Referring to Fig. 7, the section that Fig. 7 is the step 306 of the forming method of waveguide according to an embodiment of the present invention shows It is intended to, in step 306, the spin coating PDMS polymer 35 in waveguide body 34；

Referring to Fig. 8, the section that Fig. 8 is the step 307 of the forming method of waveguide according to an embodiment of the present invention shows It is intended to, in step 307, to form chamber pillar 36 after photolithographic polymer 35 and solidification；And

Referring to Fig. 9, the section that Fig. 9 is the step 308 of the forming method of waveguide according to an embodiment of the present invention shows It is intended to, in step 308, the top of chamber pillar 36 is formed into chamber 37 by bonding techniques, multiple chambers connect shape Helical waveguide.

As shown in Figure 10, Figure 10 is the structural schematic diagram of SF6 gas passive sensor according to an embodiment of the present invention. A kind of SF6 gas passive sensor according to the preferred embodiment of the present invention uses the waveguide of above-mentioned forming method manufacture, SF6 gas passive sensor includes silicon substrate 1 and the insulating layer being grown on silicon substrate 12 and the waveguide being arranged on insulating layer 2 3；Light input interface 4 is connected to one end of waveguide 3；Light output interface 5 is connected to the other end of waveguide 3；And it is coated on Light input interface 4 and light output connect 5 mouthfuls of PDMS polymer 35 with the junction of waveguide 3.

In some embodiments, waveguide 3 is spiral shape waveguide.The main material of insulating layer 2 is silica.Spiral shape Waveguide 6 is mainly formed by sulfide waveguide material.

It during actual formation waveguide, is modeled using FIMMWAVE software, by multiple 37 connection groups of chamber Build up spiral shape waveguide 6.FIMMWAVE is a general, efficient 3D waveguide full vector pattern search engine, includes almost institute Some geometries, such as SOI, polymer, etching GaAs/AlGaAs waveguide, scattering LiNbO3 waveguide, single and multi-core optical It is fine.The software includes multiplicity, efficient solver, for optimizing common rectangular configuration, often in photoelectron or with one As refractive index profile optical fibre ring in encounter, or for simulating 2D the and 3D optical transport in waveguide.Wave is provided by emulator The stringent solution of dynamic equation, and consider all reflections of intermediate node.Make emulation that there are accurate simulation other methods in this way The function for the structure that (such as BPM) cannot be simulated includes high-index-contrast structure, is used for silicon and III-V Semiconductor Photonics. By assembling predetermined component, as simple straight flange structure, warp architecture, pyramidal structure and periodic structure etc., then will They are inserted into the component of other users assembling, and the design pattern of this dexterity allows simulation complication system to become to be easy to.In order to The volume for reducing sensor as far as possible, is improved the signal-to-noise ratio of microsensor, is obtained based on lambert's beer's law, light passes in the waveguide To distance L must maximize, therefore simple linear type waveguide must can not promote performance, therefore optical path takes spiral shell Revolve structure.Structure using FIMMWAVE optimization waveguide is as shown in figure 11, and Figure 11 is SF6 gas according to an embodiment of the present invention The light path schematic diagram of body passive sensor.

From Figure 11, practical light enters spiral shape waveguide 6 from left end optical fiber input interface 4, connects 5 from the output of right end light Mouth output, the length of optical path is related to the number of light pitch of the laps, and is much larger than linear transmission, i.e. this kind of structure can be obviously improved biography Sensor signal-to-noise ratio and resolution ratio.

In conclusion the forming method of waveguide of the invention and the SF6 gas passive sensor comprising the waveguide have Following advantages: it is because light is propagated in the waveguide material on sensor surface layer, and optical fiber and sensor direct-coupling, does not need special Light absorption gas chamber and optical path reflection unit, thus equipment volume can be reduced and the advantages of avoid secondary pollution.And it is used Passive design has the function of to increase life of product, promotes transducer sensitivity, has real time on-line monitoring.

The aforementioned description to specific exemplary embodiment of the invention is in order to illustrate and illustration purpose.These descriptions It is not wishing to limit the invention to disclosed precise forms, and it will be apparent that according to the above instruction, can much be changed And variation.The purpose of selecting and describing the exemplary embodiment is that explaining specific principle of the invention and its actually answering With so that those skilled in the art can be realized and utilize a variety of different exemplary implementation schemes of the invention and Various chooses and changes.The scope of the present invention is intended to be limited by claims and its equivalents.

It should be understood by those skilled in the art that, embodiments herein can provide as method, system or computer program Product.Therefore, complete hardware embodiment, complete software embodiment or reality combining software and hardware aspects can be used in the application Apply the form of example.Moreover, it wherein includes the computer of computer usable program code that the application, which can be used in one or more, The computer program implemented in usable storage medium (including but not limited to magnetic disk storage, CD-ROM, optical memory etc.) produces The form of product.

The application is referring to method, the process of equipment (system) and computer program product according to the embodiment of the present application Figure and/or block diagram describe.It should be understood that every one stream in flowchart and/or the block diagram can be realized by computer program instructions The combination of process and/or box in journey and/or box and flowchart and/or the block diagram.It can provide these computer programs Instruct the processor of general purpose computer, special purpose computer, Embedded Processor or other programmable data processing devices to produce A raw machine, so that being generated by the instruction that computer or the processor of other programmable data processing devices execute for real The device for the function of being specified in present one or more flows of the flowchart and/or one or more blocks of the block diagram.

These computer program instructions, which may also be stored in, is able to guide computer or other programmable data processing devices with spy Determine in the computer-readable memory that mode works, so that it includes referring to that instruction stored in the computer readable memory, which generates, Enable the manufacture of device, the command device realize in one box of one or more flows of the flowchart and/or block diagram or The function of being specified in multiple boxes.

These computer program instructions also can be loaded onto a computer or other programmable data processing device, so that counting Series of operation steps are executed on calculation machine or other programmable devices to generate computer implemented processing, thus in computer or The instruction executed on other programmable devices is provided for realizing in one or more flows of the flowchart and/or block diagram one The step of function of being specified in a box or multiple boxes.

Finally it should be noted that: the above embodiments are merely illustrative of the technical scheme of the present invention and are not intended to be limiting thereof, to the greatest extent Invention is explained in detail referring to above-described embodiment for pipe, it should be understood by those ordinary skilled in the art that: still It can be with modifications or equivalent substitutions are made to specific embodiments of the invention, and without departing from any of spirit and scope of the invention Modification or equivalent replacement, should all cover within the scope of the claims of the present invention.