阅读说明：本技术 用于构建液体透镜的聚合物介电涂层 (For constructing the Polymeric dielectric coating of liquid lens ) 是由 罗伯特·艾伦·贝尔曼 本杰明·吉恩·巴普蒂斯特·弗朗索瓦·博尔格 米歇尔·道恩·法比安 蒂莫西 于 2019-05-22 设计创作，主要内容包括：提供一种电润湿光学装置。所述电润湿光学装置包括第一窗口、第二窗口、和设置在所述第一窗口和所述第二窗口之间的腔。所述电润湿光学装置额外地包括设置在所述腔内的第一液体和第二液体,所述第一液体和所述第二液体实质上彼此不混溶且具有不同的折射率,从而所述第一液体和所述第二液体之间的界面限定可变透镜。所述电润湿光学装置还包括与所述第一液体电连接的公共电极和设置在所述腔的侧壁上、且通过绝缘聚合物介电层与所述第一液体和所述第二液体绝缘的驱动电极。所述绝缘聚合物介电层可利用引发式化学气相沉积(iCVD)形成。(A kind of electrowetting Optical devices are provided.The electrowetting Optical devices include first window, the second window and the chamber being arranged between the first window and second window.The electrowetting Optical devices extraly include the first liquid and second liquid of setting in the cavity, first liquid and the second liquid it is substantially unmixing each other and have different refractive index, thus the interface definition variable lens between first liquid and the second liquid.The electrowetting Optical devices further include on the public electrode being electrically connected with first liquid and the side wall that the chamber is arranged in and by the driving electrodes of insulating polymer dielectric layer and the insulation of first liquid and the second liquid.The insulating polymer dielectric layer can utilize initiation formula chemical vapor deposition (iCVD) formation.)

1. a kind of electrowetting Optical devices, comprising:

First window, the second window and the chamber being arranged between the first window and second window；

The first liquid and second liquid in the cavity is set, and first liquid and the second liquid have different foldings Rate is penetrated, thus the interface definition variable lens between first liquid and the second liquid；

The public electrode being electrically connected with first liquid；With

It is arranged on the side wall of the chamber and exhausted by insulating polymer dielectric layer and first liquid and the second liquid The driving electrodes of edge, the insulating polymer dielectric layer have the glass transformation temperature (T higher than 85 DEG C_g),

Wherein the insulating polymer dielectric layer is formed in the driving electrodes by initiation formula chemical vapor deposition (iCVD).

2. electrowetting Optical devices according to claim 1, wherein the insulating polymer dielectric layer includes amorphous fluorine Polymer.

3. electrowetting Optical devices according to claim 1, wherein the insulating polymer dielectric layer includes polytetrafluoroethyl-ne Alkene.

4. electrowetting Optical devices according to claim 1, wherein the insulating polymer dielectric layer covalence graft is to institute It states in driving electrodes.

5. electrowetting Optical devices according to claim 1, wherein the insulating polymer dielectric layer includes poly- (ethylene- Co- tetrafluoroethene), fluoroethylenepropyl.ne, perfluoroalkoxyalkanes, 1H, 1H, 2H, 2H- perfluoro decyl acrylate or tetrafluoro Ethylene and 2, the copolymer of fluoro- 1, the 3- dioxole of bis- (trifluoromethyl) -4, the 5- bis- of 2-.

6. electrowetting Optical devices according to any one of claim 1 to 5, wherein the insulating polymer dielectric layer has The thickness having from about 0.5 micron to about 10 micron.

7. electrowetting Optical devices according to any one of claim 1 to 5, wherein the insulating polymer dielectric layer has The thickness having from about 0.5 micron to about 2.5 micron.

8. electrowetting Optical devices according to any one of claim 1 to 5, wherein the insulating polymer dielectric layer It is characterized in that indicating that the surface roughness of initiation formula chemical vapor deposition (iCVD) technique has being averaged most less than 200nm The feature of big height.

9. a kind of method for being coated with Electrowetting device, which comprises

In a vacuum chamber by the electrode base board being arranged on the side wall of chamber positioning；

Gaseous monomer and gaseous state initiator are guided into the vacuum chamber；

The surface of the electrode base board is contacted with the gaseous monomer and the gas-initiation agent；With

The gas-initiation agent is activated to polymerize the gaseous monomer and form the insulating polymer contacted with the driving electrodes Dielectric layer；

Wherein the insulating polymer dielectric layer is formed by initiation formula chemical vapor deposition (iCVD).

10. according to the method described in claim 9, further comprising:

In the preceding processing electrode base board being located in the vacuum chamber, wherein the processing includes roughening, polishes, electronics Beam, IR radiation, gamma radiation, plasma irradiating, heat treatment, laser irradiation or their combination.

11. according to the method described in claim 9, wherein the monomer includes difluorocarbene, ethylenedioxy thiophene, trivinyl Trimethyl cyclotrisiloxane, hydroxyethyl methacrylate, vinyl pyrrolidone, vinyl monomer, functionalized propylene acid esters, official Methacrylate, double methacrylate, double methyl methacrylate and vinylsiloxane can be changed.

12. the method according to any one of claim 9 to 11, wherein the contact procedure is from about 14 DEG C to about 40 DEG C At a temperature of execute.

13. the method according to any one of claim 9 to 11, wherein the activation step is from about 75 DEG C to about 150 It is executed at a temperature of DEG C.

14. the method according to any one of claim 9 to 11, wherein the insulating polymer dielectric layer includes poly- (second Alkene -co- tetrafluoroethene), fluoroethylenepropyl.ne, perfluoroalkoxyalkanes, 1H, 1H, 2H, 2H- perfluoro decyl acrylate or four Vinyl fluoride and 2, the copolymer of fluoro- 1, the 3- dioxole of bis- (trifluoromethyl) -4, the 5- bis- of 2-.

15. the method according to any one of claim 9 to 11, wherein the insulating polymer dielectric layer has from about 0.5 micron to about 10 microns of thickness.

16. the method according to any one of claim 9 to 11, wherein the insulating polymer dielectric layer is characterized in that Indicate that the surface roughness of initiation formula chemical vapor deposition (iCVD) technique has the averaged maximum height less than 200nm Feature.

17. a kind of electrowetting Optical devices, comprising:

First window, the second window and the chamber being arranged between the first window and second window；

The first liquid and second liquid in the cavity is set, and first liquid and the second liquid have different foldings Rate is penetrated, thus the interface definition variable lens between first liquid and the second liquid；

The public electrode being electrically connected with first liquid；With

It is arranged on the side wall of the chamber and exhausted by insulating polymer dielectric layer and first liquid and the second liquid The driving electrodes of edge, the insulating polymer dielectric layer have the glass transformation temperature (T higher than 85 DEG C_g),

Wherein the insulating polymer dielectric layer is formed in the driving electrodes by initiation formula chemical vapor deposition (iCVD), And

Wherein described device by driving voltage from 0V to maximum drive voltage, be subsequently returned to 0V sequence and be applied to the driving The contact angle hysteresis no more than 3 ° is shown when electrode.

18. electrowetting Optical devices according to claim 17, wherein the insulating polymer dielectric layer includes polytetrafluoro Ethylene.

19. electrowetting Optical devices according to claim 17, wherein the insulating polymer dielectric layer has from about 0.5 The thickness of micron to about 10 microns.

20. electrowetting Optical devices described in any one of 7 to 19 according to claim 1, wherein the insulating polymer dielectric Layer is characterized in that indicating that the surface roughness of initiation formula chemical vapor deposition (iCVD) technique has putting down less than 200nm The feature of equal maximum height.

Technical field

This disclosure relates to for the improved Polymeric dielectric coating in electrowetting Optical devices, and more specifically, It is related to playing the Polymeric dielectric coating of both hydrophobic layer and dielectric layer effect in liquid lens.

Background technique

Traditional liquid lens based on electrowetting is that is, oily phase based on the indoor two kinds of unmixing liquid of chamber is arranged in And conductive phase, the latter are water base.Two liquid phases usually form triple interfaces on the isolated substrate for including dielectric material.Change The electric field for being applied to liquid can change wetability of one of liquid relative to chamber wall, this have change two kinds of liquid it Between the effect of the shape of meniscus that is formed.In addition, in various applications, the variation of meniscus shape leads to the change of the focal length of lens Change.

The dielectric features being present between electrode and immiscible liquids are utilized in the configuration of traditional liquid lens.Usually using poly- Object material is closed as the insulating properties feature, because they can provide electrical insulating property and show the profit relative to one of liquid The required hydrophobicity of moist matter.It is corresponding that electrowetting is that a kind of property in both wherein insulating layer and hydrophobic layer is able to achieve The phenomenon that wetting effect.Many researchs have been intended to optimize the property of these polymeric layers, to reduce and contact water contact angle Voltage minimization needed for angular lag.Meanwhile used material should be chemical inertness and stable, to ensure reproducibility And the long-life.

Therefore, there is a need in the art for the insulating materials for improving the material properties for insulating layer.With more high dielectric constant It can be realized in the Optical devices with more and more thinner device architecture in conjunction with the polymer material of more low interface energy or surface energy Electrowetting.It will enable using thinner insulating layer with lower application potential, the liquid lens that this can be changed into improvement is reliable Property, performance and manufacturing cost.

Summary of the invention

According to some embodiments of present disclosure, a kind of electrowetting Optical devices are provided.The electrowetting optics dress It sets including first window, the second window and the chamber being arranged between the first window and second window.The electrowetting Optical devices extraly include the first liquid and second liquid of setting in the cavity, first liquid and second liquid Body is substantially unmixing each other and has different refractive index, thus the interface between first liquid and the second liquid Limit variable lens.The electrowetting Optical devices further include the public electrode being electrically connected with first liquid and are arranged in institute The driving electricity stated on the side wall of chamber and insulated by insulating polymer dielectric layer and first liquid and the second liquid Pole, the insulating polymer dielectric layer have the glass transformation temperature (T higher than 85 DEG C_g).The insulating polymer dielectric layer can It is formed using formula chemical vapor deposition (initiated chemical vapor deposition, iCVD) is caused.

According to some embodiments of present disclosure, a kind of method for being coated with Electrowetting device is provided.The side Method includes: to position the electrode base board being arranged on the side wall of chamber in a vacuum chamber；Gaseous monomer and gaseous state initiator are guided To in the vacuum chamber；The surface of the electrode base board is contacted with the gaseous monomer and the gas-initiation agent；And activation The gas-initiation agent is to polymerize the gaseous monomer and form the insulating polymer dielectric layer contacted with the driving electrodes.Institute Insulating polymer dielectric layer is stated to be formed by initiation formula chemical vapor deposition (iCVD).

According to some embodiments of present disclosure, a kind of electrowetting Optical devices are provided.The electrowetting optics dress It sets including first window, the second window and the chamber being arranged between the first window and second window.The electrowetting Optical devices extraly include the first liquid and second liquid of setting in the cavity, first liquid and second liquid Body is substantially unmixing each other and has different refractive index, thus the interface between first liquid and the second liquid Limit variable lens.The electrowetting Optical devices further include the public electrode being electrically connected with first liquid and are arranged in institute The driving electricity stated on the side wall of chamber and insulated by insulating polymer dielectric layer and first liquid and the second liquid Pole, the insulating polymer dielectric layer have the glass transformation temperature (T higher than 85 DEG C_g).The insulating polymer dielectric layer can It is formed using formula chemical vapor deposition (iCVD) is caused.The electrowetting Optical devices by driving voltage from 0V to maximum drive Voltage is subsequently returned to show the contact angle hysteresis no more than 3 ° when 0V sequence is applied to the driving electrodes.

Additional feature and advantage will be illustrated in following detailed description, and to those skilled in the art, this A little additional feature and advantage from the description it will be evident that, or by practice embodiment as described herein (including Following detailed description, claim and the attached drawing of accompanying) and recognize.

It should be understood that both foregoing general description and the following detailed description are only exemplary, and it is intended to mention For for understanding the essence of present disclosure and appended claims and general introduction or the frame of feature.

Attached drawing including accompanying is to provide further understanding to the principle of present disclosure, and attached drawing is incorporated into this theory In bright book and form part of this specification.Attached drawing illustrates one or more embodiments, and reinstates with specification one In the principle and operation of explaining present disclosure by way of example.It should be appreciated that the sheet disclosed in the specification and drawings The various features of disclosure can be applied in combination with any and all.Mode by way of non-limiting example, present disclosure Various features can be combined with each other according to following implementation.

Detailed description of the invention

It is the description of each figure in the attached drawing to accompanying below.Each figure is not drawn necessarily to scale, and in order to clear and For the sake of simplicity, certain features of each figure and certain views may amplify display in ratio or in the diagram.

In the accompanying drawings:

Fig. 1 is the schematic sectional view according to the exemplary electrical wetting of optical device of some embodiments of present disclosure.

Specific embodiment

Additional feature and advantage will be illustrated in following detailed description, and to those skilled in the art, this A little additional feature and advantage from the description it will be evident that, or by practice embodiment as described below and Claim and the attached drawing of accompanying and recognize.

As it is used herein, term "and/or", when in listing two or more projects in use, mean can Any one of listed item is used alone, or two or more any groups in listed item can be used It closes.For example, the composition can only include A if composition is described as comprising component A, B, and/or C；It only include B；Only Include C；Combination comprising A and B；Combination comprising A and C；Combination comprising B and C；Or the combination comprising A, B and C.

In this document, such as first and second, top and bottom and similar relational terms are only used for an entity Movement with another entity or movement distinguish, without require or imply these entities or act between it is any it is actual this Kind relationship or sequence.

For those skilled in the art and the personnel for making or using present disclosure, it will expect in the disclosure Appearance is modified.It will thus be appreciated that shown in the accompanying drawings and being merely to illustrate property of implementations described above purpose, and It is not intended to limit the scope of the disclosure, scope of the present disclosure by according to the Patent Law principle explanation for including doctrine of equivalents Appended claims limit.

For the purpose of present disclosure, term " coupling " (with its form of ownership) generally mean that two components directly or It is connected to each other indirectly.This connection can be substantially fixing or can be movable in nature.This connection can To be realized by two components and any additional intermediary element, and any additional intermediary element can be with landform integral with one another Single entirety is formed integrally as single entirety, or with two components.Unless otherwise indicated, this connection can be this It is permanent in matter, or can be substantially can be removed or dissoluble.

As it is used herein, the term " about " amount of referring to, size, formula, parameter and other quantity and characteristic are not and not It must be accurate, but can according to need approximate and/or greater or lesser, reflection tolerance conversion coefficient, rounds up, measures Error etc. and other factors well known by persons skilled in the art.When term " about " is used to describe the endpoint of value or range, this Disclosure should be read to include signified occurrence or endpoint.No matter whether the endpoint of the number value or range in specification is remembered Carry " about ", the endpoint of the number value or range is intended to include two kinds of embodiments: a kind of to be modified by " about ", one kind is not by repairing " about " Decorations.It will be further appreciated that the endpoint of each range is either associated with another endpoint to be also independently of another end Point is all meaningful.

As used herein term " substantial " and its variant are intended to suggest that described feature is equal or approximately equal to One value or description.For example, " substantially planar " surface is intended to mean that flat or near flat surface.In addition, " essence On " it is intended to mean that two values are equal or approximately equal.In some embodiments, about 10% between " substantial " can indicate Interior value, such as each other in about 5%, or each other in about 2%.

Direction term used herein --- such as upper and lower, right, left, forward and backward, top, bottom --- is only referring to being drawn Figure use, be not meant to imply absolute orientation.

As it is used herein, term " described ", "a" or "an" mean "at least one", and should not necessarily be limited by " only one ", unless clearly pointing out on the contrary.Thus, for example, referring to that " component " includes having two or more in this way Component embodiment, unless the context is clearly stated.

Term " immiscible " and " unmixing ", which refer to, not to be formed homogeneous mixture when being added together or works as The liquid that bottom line mixes when another liquid is added in a kind of liquid.In this specification and following following claims, when two The partial miscibility of kind of liquid lower than 2%, lower than 1%, (all values are in given temperature lower than 0.5% or when being lower than 0.2% Measured in range (such as at 20 DEG C)), then it is assumed that two kinds of liquid are unmixing.Liquid herein is in wide temperature range (e.g., including -30 DEG C to 85 DEG C and from -20 DEG C to 65 DEG C) has low intermiscibility.

In various embodiments, a kind of electrowetting Optical devices are provided.The electrowetting Optical devices include the first window Mouth, the second window and the chamber being arranged between the first window and second window.The electrowetting Optical devices are additional Ground includes the first liquid and second liquid of setting in the cavity, and first liquid and the second liquid are substantially each other It is unmixing and there is different refractive index, so that interface definition between first liquid and the second liquid is variable saturating Mirror.The electrowetting Optical devices further include the public electrode being electrically connected with first liquid and the side wall that the chamber is arranged in Driving electrodes that are upper and being insulated by insulating polymer dielectric layer and first liquid and the second liquid, the insulation Polymer dielectric layer has the glass transformation temperature (T higher than 85 DEG C_g).The insulating polymer dielectric layer can utilize initiation formula Vapor deposition (iCVD) is learned to be formed.

Utilize formation insulating polymer dielectric on the iCVD electrode found in electrowetting Optical devices or other substrates Layer makes it possible to be formed with required physical property (including increased dielectric property, low-surface-energy, low surface roughness, increase For the chemoresistance of the adhesiveness of substrate, improvement, more than the increased glass transformation temperature of thermal aging temperature) combination Coating.With the tradition using such as conventional chemical vapor (CVD) or plasma enhanced chemical vapor deposition (PECVD) Technology is compared to form coating, and the versatility of iCVD method as disclosed herein is capable of forming with improved material properties Insulating polymer dielectric layer.

As described in more detail below, in Fig. 1, the unit of electrowetting Optical devices or liquid lens is usually by two Transparent insulation plate and side wall limit.Lower plate is nonplanar, including cone or cylindrical depression or groove, and it includes non-conductive Or insulating liquid.The rest part of unit is filled with conducting liquid, and the conducting liquid and insulating liquid are unmixing, has different Refractive index and substantially identical density.One or more driving electrodes are located on the side wall of groove.Can in driving electrodes and Heat insulating lamina is introduced between corresponding liquid, to provide electrowetting in the dielectric surface with long-term chemical durability.It is public Electrode is contacted with conducting liquid.By electrowetting phenomenon, two kinds of liquid can be changed according to the voltage V applied between the electrodes Between interface curvature.Therefore, according to the voltage applied, the light beam across the unit perpendicular to the plate in droplet area will More or less defocused to some extent.Conducting liquid is usually the aqueous solution of saliferous.Non-electrically conductive liquid be usually oil, alkane, Or the mixture of alkane, it may be possible to halogenation.

In some embodiments, the voltage between the voltage at adjustable public electrode and the voltage at driving electrodes Difference.It can control and adjust voltage difference so that the interface (i.e. meniscus) between liquid is moved to desired position along the side wall of chamber It sets.Pass through the side wall moving boundary along chamber, thus it is possible to vary the focus (for example, diopter) of liquid lens, gradient, astigmatism, And/or higher order aberratons.In addition, the dielectric property and/or surface of liquid lens and its component can property during operating liquid lens Matter can change.For example, the dielectric property of liquid and/or insulation component can should be exposed to voltage difference, temperature with the time Variation and other factors and change.As another example, the surface of insulation component can should be exposed to the first liquid with the time Body and second liquid and change.In turn, the variation of liquid lens property is with component (for example, its insulation component) property with it The variation of matter can make the reliability of liquid lens and performance characteristics degenerate.

Liquid lens structure

Referring now to fig. 1, the simplification sectional view of exemplary fluids lens 100 is provided.The structure of liquid lens 100 is not Mean to limit, and may include any structure as known in the art.In some embodiments, liquid lens 100 can wrap Include lens body 102 and the chamber formed in lens body 102 104.First liquid 106 and second liquid 108 may be provided at chamber In 104.In some embodiments, the first liquid 106 can be polar liquid, also referred to as conducting liquid.Extraly or replace Dai Di, second liquid 108 can be nonpolar liquid and/or insulating liquid, also referred to as non-electrically conductive liquid.In some embodiment party In formula, the first liquid 106 and second liquid 108 can be unmixing each other and have different refractive index, thus the first liquid Interface 110 between second liquid forms lens.In some embodiments, the first liquid 106 and second liquid 108 can With substantially identical density, this can help to be avoided the physical orientation due to changing liquid lens 100 (for example, due to gravity Effect) caused by interface 110 change in shape.

In some embodiments for the liquid lens 100 described in Fig. 1, chamber 104 may include first part (or top Space) 104A and second part (or base part) 104B.For example, as described herein, the second part 104B of chamber 104 can It is limited by the hole in the middle layer of liquid lens 100.Additionally or alternatively, as described herein, the first part of chamber 104 104A can be limited by the groove in the first outer layer of liquid lens 100 and/or is arranged outside hole in the intermediate layer.In some realities It applies in mode, at least part of the first liquid 106 may be provided in the first part 104A of chamber 104.Additionally or alternatively, Second liquid 108 may be provided in the second part 104B of chamber 104.For example, substantial all or part of second liquid 108 It may be provided in the second part 104B of chamber 104.In some embodiments, the periphery at interface 110 is (for example, the side wall with chamber The edge at the interface of contact) it may be provided in the second part 104B of chamber 104.

The interface 110 of liquid lens 100 (referring to Fig. 1) can be adjusted via electrowetting.For example, can be in the first liquid 106 (insulate for example, being located in the surface of chamber 104 as described herein nearby and with the first liquid 106 with the surface of chamber 104 One or more driving electrodes) between apply voltage, to increase or decrease the surface of chamber 104 relative to the first liquid 106 Wetability and the shape for changing interface 110.In some embodiments, the shape at interface 110 can be changed in adjustment interface 110, this Change the focal length or focus of liquid lens 100.For example, the change of this focal length can be such that liquid lens 100 is able to carry out certainly Dynamic focusing function.Additionally or alternatively, adjustment interface 110 tilts interface relative to the optical axis 112 of liquid lens 100.Example Such as, this inclination can make liquid lens 100 other than providing astigmatism variation or high order optical aberrations correction, additionally it is possible to execute Optical image stabilization (OIS) function.Adjustment interface 110 do not need liquid lens 100 relative to imaging sensor, fixed lens or Lens stack, shell or in which may incorporate liquid lens 100 camera model other component carry out physics movement can be real It is existing.

In some embodiments, the lens body 102 of liquid lens 100 may include first window 114 and the second window 116.In some such embodiments, chamber 104 may be provided between first window 114 and the second window 116.In some realities It applies in mode, lens body 102 may include multiple layers that lens body 102 is collectively formed.For example, embodiment party shown in Fig. 1 In formula, lens body 102 may include the first outer layer 118, middle layer 120 and the second outer layer 122.In some such embodiment party In formula, middle layer 120 may include passing through the hole to be formed.First outer layer 118 can be bound to the side (example of middle layer 120 Such as, object side).For example, the first outer layer 118 can be bound to middle layer 120 at the 134A of engaging portion.Engaging portion 134A can be viscous Mixture combines, laser combines (for example, laser welding), mechanical closure or can protect the first liquid 106 and second liquid 108 Hold any other suitable combination in chamber 104.Additionally or alternatively, the second outer layer 122 can be bound to middle layer 120 The other side (for example, at image side).For example, during the second outer layer 122 can be bound at engaging portion 134B and/or engaging portion 134C The each of interbed 120, engaging portion 134B and 134C can be configured according to herein in regard to described in the 134A of engaging portion. In some embodiments, middle layer 120 may be provided between the first outer layer 118 and the second outer layer 122, the hole in middle layer Opposite sides can be covered by the first outer layer 118 and the second outer layer 122, and at least part of chamber 104 can be limited at hole It is interior.Therefore, a part for covering the first outer layer 118 of chamber 104 can be used as first window 114, cover the second outer layer 122 of chamber A part can be used as the second window 116.

In some embodiments, chamber 104 may include first part 104A and second part 104B.For example, shown in Fig. 1 Embodiment in, the second part 104B of chamber 104 can be limited by the hole in middle layer 120, and the first part 104A of chamber can be set It sets between the second part 104B and first window 114 of chamber 104.In some embodiments, the first outer layer 118 may include Groove as shown in Figure 1, the first part 104A of chamber 104 may be provided in the groove of the first outer layer 118.Therefore, the of chamber 104 A part of 104A may be provided at the outside in the hole in middle layer 120.

In some embodiments, chamber 104 (for example, second part 104B of chamber 104) can be taper as shown in Fig. 1, So that the sectional area of chamber 104 reduces along optical axis 112 from object side to the direction at image side.For example, the second part of chamber 104 104B may include narrow end 105A and wide end 105B.Term " narrow " and " width " are relative terms, it is meant that narrow end 105A compares wide end 105B is narrow.Such conical cavity can help to keep the interface 110 between the first liquid 106 and second liquid 108 along optical axis 112 alignment.In other embodiments, chamber 104 is taper so that the sectional area of chamber 104 along optical axis from object side to At increasing on the direction of image side or non-tapered, so that the sectional area of chamber 104 keeps substantially constant along optical axis.

In some embodiments, imaging can enter the liquid lens 100 described in Fig. 1 by first window 114, can It is reflected at interface 110 between the first liquid 106 and second liquid 108, and it is saturating to leave liquid by the second window 116 Mirror 100.In some embodiments, the first outer layer 118 and/or the second outer layer 122 may include enough transparencies so that imaging Light passes through.For example, the first outer layer 118 and/or the second outer layer 122 may include polymer, glass, ceramics or glass ceramic material. In some embodiments, the outer surface of the first outer layer 118 and/or the second outer layer 122 can be substantially planar.Therefore, Even if liquid lens 100 may be used as lens (for example, imaging by refracting through interface 110), outside liquid lens 100 Surface is also possible to flat, and the outer surface rather than fixed lens is bent like that.In other embodiments, the first outer layer 118 and/or second the outer surface of outer layer 122 can be curved (for example, concave or convex).Therefore, liquid lens 100 can wrap Include integrated fixed lens.In some embodiments, middle layer 120 may include metal, polymer, glass, ceramics or glass pottery Ceramic material.Because imaging can be passed through via the hole in middle layer 120, middle layer 120 can be transparent or impermeable Bright.

In some embodiments, liquid lens 100 (referring to Fig. 1) may include be electrically connected with the first liquid 106 it is public Electrode 124.Additionally or alternatively, liquid lens 100 may include be arranged on the side wall of chamber 104 and with the first liquid 106 and One/or the multiple driving electrodes 126 that second liquid 108 insulate.It describes as described herein, it can be to 124 He of public electrode Driving electrodes 126 provide different voltage to change the shape at interface 110.

In some embodiments, liquid lens 100 (referring to Fig. 1) may include conductive layer 128, and conductive layer 128 is at least A part is arranged in chamber 104.For example, conductive layer 128 may include being bound to by the first outer layer 118 and/or the second outer layer 122 The conductive coating of middle layer 120 is applied to before middle layer.Conductive layer 128 may include metal material, conducting polymer materials, its His suitable conductive material or their combination.Additionally or alternatively, conductive layer 128 may include single-layer or multi-layer, wherein one It can be conduction a bit or all.In some embodiments, conductive layer 128 can limit public electrode 124 and/or driving electrodes 126.For example, conductive layer 128 can be applied before the first outer layer 118 and/or the second outer layer 122 are bound to middle layer To the substantial entire outer surface of middle layer 120.After conductive layer 128 is applied to middle layer 120, conductive layer can be by It is divided into various conducting elements (for example, public electrode 124 and/or driving electrodes 126).In some embodiments, liquid is saturating Mirror 100 may include the scribing line 130A in conductive layer 128, and public electrode 124 and driving electrodes 126 are isolated from each other (for example, electricity Isolation).In some embodiments, scribing line 130A may include the gap in conductive layer 128.For example, scribing line 130A is that width is About 5 μm, about 10 μm, about 15 μm, about 20 μm, about 25 μm, about 30 μm, about 35 μm, about 40 μm, about 45 μm, about 50 μm or by arranging The gap for any range that value out limits.

It is same as shown in fig. 1, liquid lens 100 may include be arranged in it is in chamber 104, be located in the top of driving electrodes 126 Insulation component 132 in portion.For example, insulation component 132 may include combining by the first outer layer 118 and/or the second outer layer 122 The insulating coating of middle layer 120 is applied to before to middle layer.In some embodiments, insulation component 132 may include inciting somebody to action Second outer layer 122 is bound to after middle layer 120 and is applied to conductive layer before the first outer layer 118 is bound to middle layer 128 and second window 116 insulating coating.Therefore, insulation component 132 can cover at least one of the conductive layer 128 in chamber 104 Divide and the second window 116.In some embodiments, as described herein, insulation component 132 can be sufficiently transparent, So that imaging can pass through the second window 116.

In some embodiments for the liquid lens 100 described in Fig. 1, insulation component 132 can cover driving electrodes 126 At least part (for example, the part in chamber 104 is arranged in driving electrodes) so that the first liquid 106 and second liquid 108 with Driving electrodes insulation.Additionally or alternatively, at least part that the public electrode 124 in chamber 104 is arranged in can be not exhausted Edge element 132 covers.Therefore, as described herein, public electrode 124 can be electrically connected with the first liquid 106.In some implementations In mode, insulation component 132 may include the hydrophobic surface layer of the second part 104B of chamber 104.As described herein, this to dredge Water meter surface layer can help to second liquid 108 is maintained in the second part 104B of chamber 104 (for example, by nonpolarity second Attraction between liquid and hydrophobic material) and/or the periphery at interface 110 is enable to move along hydrophobic surface layer (for example, logical Cross electrowetting) to change the shape at interface.In addition, liquid lens 100 shown in Fig. 1, are based at least partially on insulation component 132, it can express the contact angle hysteresis (that is, interface 110 at) between liquid 106 and 108 no more than 3 °.As made herein , " contact angle hysteresis " refers in driving voltage from 0V to maximum drive voltage, is subsequently returned to 0V (that is, relative to public Electrode 124) difference of the contact angle of the measurement of second liquid 108 and insulation component 132 when being sequentially applied to driving electrodes 126 (for example, supplied to driving voltage of driving electrodes and supplied to the difference between the common voltage of public electrode).Such as this paper institute It using, initial contact angle maximum when no voltage can be 25 °, and under " maximum drive voltage ", since electrowetting is imitated The increase of contact angle caused by fruit can be at least 15 °.In other embodiments, driving voltage can provide AC 1kHz voltage. In some embodiments, useful voltage can be in the range of from about 25V to about 70V.For applying alive driver Selection is not intended to limit, and the thickness of adjustable insulation component 132 is to be suitble to be provided by selected driver Any drive voltage range.

Referring now to fig. 1, the embodiment for configuring liquid lens 100, so that the side of chamber 104 is arranged in driving electrodes 126 It insulate on wall and by insulation component 132 and the first liquid 106 and second liquid 108.Insulation component 132 include shown in The insulating outer layer 132A that one liquid 106 and second liquid 108 contact.In some embodiments, insulating outer layer 132A includes benefit One or more layers insulating polymer dielectric layer formed with iCVD.In addition, in the liquid lens 100 described in realizing Fig. 1, absolutely Edge outer layer 132A (for example, insulating polymer dielectric layer) plays exhausted relative to the electricity of liquid 106 and 108 and driving electrodes 126 Edge and hydrophobic dual function relative to the first liquid 106, for this angle, insulation component 132 is monolithic. The liquid lens 100 described in Fig. 1 relies on a monolithic insulating outer layer 132A in view of it, relative to other more complicated configurations Insulation component 132 (for example, those of the layer for relying on multiple and different types), can be for the angle for handling and/or manufacturing It is advantageous.

In the embodiment for the liquid lens 100 described in Fig. 1, the thickness of the insulating outer layer 132A of insulation component 132 Be from about 0.5 micron to about 10 micron, from about 1 micron to about 10 micron, from about 1 micron to about 9 micron, from about 1 micron to about 8 microns, from about 1 micron to about 7 micron, from about 1 micron to about 6 micron, from about 1 micron to about 5 micron, from about 1 micron to about 4 microns, whole values from about 1 micron to about 3 micron, from about 1 micron to about 2 micron and between these thickness endpoints.Example Such as, in some embodiments, the thickness of the insulating outer layer 132A for the liquid lens 100 described in Fig. 1 be from about 0.5 micron to About 2 microns.In other embodiments, the thickness of insulating outer layer 132A can from about 0.5 micron to about 10 micron, from about 0.5 In the range of whole values of the micron to about 5 microns, from about 0.5 micron to about 2.5 micron and between these thickness endpoints.

Due to the unexpected combination of the hydrophobicity and insulating property (properties) of the insulating outer layer 132A of insulation component 132, in Fig. 1 The liquid lens 100 of description provides some advantages relative to the configuration of traditional liquid lens.In these advantages, it is believed that insulation The insulating polymer dielectric layer of outer layer 132A is that lens 100 provide improved temperature stability.It is also believed that outer layer 132A's is exhausted Edge polymer dielectric layer provides improved chemical stability (for example, compared with polymer hydrophobic layer) for lens, for example, such as existing As judging after heat ageing processing.In such a process, liquid lens 100 is electric from 0V to maximum drive by driving voltage It presses, be subsequently returned to be shown when 0V (that is, relative to public electrode 124) is sequentially applied to driving electrodes 126 no more than 3 ° Contact angle hysteresis (that is, interface 110 at) between liquid 106 and 108, wherein insulation component 132A to be subjected to including and going Progress sequence applies driving voltage after ionized water contacts one week heat ageing process at 85 DEG C.Further, it is further believed that outer The insulating polymer dielectric layer of layer 132A ensures that this layer has to be allowed to use liquid saturating in the electrowetting application based on DC The electrology characteristic of mirror 100.In addition to this, it is further believed that compared to traditional insulation contacted with liquid (such as liquid 106,108) The outer polymer hydrophobic layer of feature, the insulating polymer dielectric layer of outer layer 132A provide excellent scratch resistance and UV resistance.

Insulating polymer dielectric layer

The application technology of traditional material and they

The chemical environment of Electrowetting device is used for for many different types of polymerizations in wherein insulating polymer dielectric layer It may be harsh for object system, because corresponding polymeric layer can be submerged constantly in a liquid, and as the time can The influence of other factors vulnerable to chemical reaction, the insulation that leaches or can significantly change them and/or hydrophobic characteristics.These Dielectric polymers are immersed in the expansion and/or plasticizing that can result in polymer in the liquid of Electrowetting device.This is working as lens Be subjected to can prematurely the glass transformation temperature (Tg) higher than polymeric layer of aging dielectric polymers at a temperature of heating When be particularly true.Any of these variations can have negative effect to the reliability of the Electrowetting device of completion.

The conventional method for being used to form polymeric layer is related to the technique based on solution.Application technology based on solution can be in shape At final coating in lead to the problem of (for example, residual chemical, low durability are horizontal, the damage to substrate and laborious Program).When polymer solution is deposited on the substrate for Electrowetting device, the solvent of evaporation and resulting film can appoint Selection of land is further crosslinked using subsequent processing step.Except the use solved above based on solution application technology the problem of it Outside, the liquid coating formed with this method is also likely to be present when leading to the problem of uniform, thin, continuous film, wherein described Film can express out gap because of surface tension effect.These holidays any or combination or dress immediately can be caused It sets failure or plant failure can be caused at any time, lead to device reliability problem.

Another technology for the polymer insulation layer being commonly used to manufacture in Electrowetting device includes chemical vapor deposition (CVD), the example is the Gorham technique for depositing paraxylene.Have using CVD deposition paraxylene and forms uniform guarantor The advantages of shape coating, but have the shortcomings that adhesiveness of going on business to the substrate performance of lower layer.Another establishes chemical gaseous phase for a long time Coating technology is plasma enhanced chemical vapor deposition (PECVD), and monomer species are bombarded with plasma ion wherein, The fragmentation of monomer is ultimately caused, this leads to the polymerization of free free radical by the reaction of complex series.Resulting PECVD film is high Degree is crosslinked and mechanical performance is secured, however, non-selective initiation step destroys the property of polymer, the example is that surface is thick Rugosity.

It is related to the processing of these above-mentioned dielectric polymers and corresponding material properties in order to help to overcome The challenge of connection, it is solvent-free to utilize that initiation formula chemical vapor deposition (iCVD) can be used in electrowetting Optical devices disclosed herein Polymerization manufactures insulating polymer dielectric layer, and the solvent-free polymeric method, which realizes, multiple and different tolerable is present in electricity The chain growth polymerization object of environmental condition in wetting of optical device.The ability of these insulating polymer dielectric layers is formed using iCVD Counterpart substrate can also be made in the case where not changing overall permanence (for example, mechanical strength and shape size) of counterpart substrate Surface modification.

Initiation formula chemical vapor deposition (iCVD)

Initiation formula chemical vapor deposition or iCVD are typically used as traditional free free radical polymerization to form functional chain Increase, the polymer deposition process of addition-type polymers film.This iCVD technique can be simultaneously by initiator and monomers reagents to steam Vapour or gas phase are introduced into reactor.Initiator can be thermally decomposed using heat filament for free radical species, wherein reactive Then free radical species can pass through on absorption migration to substrate with monomer molecule at moderate temperatures.The heat of heat filament causes can From about 65 DEG C to about 300 DEG C, from about 100 DEG C to about 300 DEG C, from about 150 DEG C to about 250 DEG C, from about 75 DEG C to about 150 DEG C Or carried out under the temperature range from about 100 DEG C to about 200 DEG C, when initiator molecule is thermally decomposed to form radical initiator, Radical initiator species can cause the free free radical polymerization for the monomer being deposited on substrate, with formed thin polymer film without Generate any volatile byproducts.Using iCVD method, Macroscopic single crystal and film form the two and occur simultaneously in counterpart substrate On surface.In some embodiments, this step iCVD manufacturing method is only needed using monomer and initiator, without making With any solvent and/or additional purification step.

As the solvent-free process using iCVD summarized can effectively reduce to substrate make can be by sudden and violent by substrate The potentially harmful modification (for example, layering, expansion, contraction or fold) for being exposed to organic solvent and being easy to introduce.ICVD is also heat " mild ", because iCVD polymerization can be under the low surface temperature (for example, from about 15 DEG C to about 40 DEG C) inputted with low energy It carries out, so that the coating process and on a large scale hot rapid wear substrate (thermally vulnerable substrate) (for example, Paper, fabric and film) it is compatible.In some embodiments, gaseous monomer and gaseous state initiator can be from about 15 DEG C to about 40 DEG C At a temperature of contact and polymerize on substrate.

In some embodiments, the surface temperature of iCVD technique can be identified as following temperature: at such a temperature, diluted Gaseous monomer is concentrated on deposition rate is increased up to hundreds of nm/min in cooling substrate, while passing through balanced reaction Rate and the rate of adsorption of gaseous monomer keep smooth polymer surfaces.

ICVD technique can execute in the range of 10-100Pa (75-750mTorr) at low operating pressures, typically, To allow the conformal coating of the superfine object of such as particle etc.As used herein term " conformal " be defined as implying that by The feature of such as angle, ratio or the like of the object of coating generally is held.Except initiator species utilize relatively low filament Other than the thermal degradation of temperature, without being electrically excited for gas, and the growth of insulating polymer dielectric layer is carried out via conventional polymeric approach. It can get using this iCVD technology and divide greater than 10nm/ minutes, greater than 25nm/ minutes, greater than 50nm/ minutes, greater than 75nm/ Clock, the deposition rate greater than 100nm/ minutes or greater than 150nm/ minutes.

In iCVD technique, the substrate being applied is typically held at room temperature or near room temperature.In contrast, such as The PTFE base containing prepolymerized PTFE particle of DuPontEtc hydrophobic fluropolymer wet spray version Have to be sintered together at 315 DEG C of > using preceding.In some embodiments, substrate to be coated be heated to room temperature with On temperature, such as 35 DEG C, 50 DEG C, 75 DEG C, 100 DEG C or 150 DEG C.In other embodiments, substrate is maintained at lower than room temperature At a temperature of, such as 20 DEG C, 15 DEG C, 10 DEG C, 5 DEG C, 0 DEG C, -5 DEG C, -10 DEG C or -25 DEG C.In other embodiments, to be coated The substrate of cloth can maintain at about room temperatures, from about 20 DEG C to about 75 DEG C, from about 25 DEG C to about 60 DEG C, from about 20 DEG C to about 35 DEG C, Or from about 25 DEG C to about 30 DEG C.

The fluorinated hydrophobic coating that wet process applies may include harmful surfactant, and be likely difficult to equably deposit. Different from the coating that traditional wet process applies, it can be used immediately after deposit using the coating that iCVD is deposited, be living without surface Property agent and without post-process (that is, without high temperature drying or annealing).However, post-processing can be applied for any desired application Step is in the form of modification of surfaces or surface chemistry.

One layer of traditional coating process one time apply coating as solution coating, CVD, and/or PECVD etc.For example, working as Parylene is typically used in coating in application, common be added Parylene for additional and individual hydrophobic topsheet coating Layer, this needs multiple processing step.Use iCVD to realize as deposition tool and only applies gradient coating or layer in a step Shape coating.In some embodiments, iCVD technique can apply insulating polymer dielectric layer as single layer, gradient layer, and/or more Layer.In some embodiments, iCVD technique can apply insulating polymer dielectric layer as gradient coating.For example, in some realities It applies in mode, insulating polymer dielectric layer may include first layer, hand in the major part or first part's height of wherein first layer Join and the fluid of high-tg polymer or the copolymer chemoresistance including that can provide to(for) Electrowetting device are (for example, be higher than 85℃).In some embodiments, first layer can cover (capped) with the second layer or be classified (graded), and described second Layer may include low surface energy polymeric (for example, 17 fluorine last of the ten Heavenly stems ester of (methyl) acrylic acid；Acrylic acid octafluoro pentyl ester).In some implementations In mode, iCVD technique can construct gradient in a chamber by the flow of monomer needed for operating during depositing operation Insulating polymer dielectric layer.

ICVD precursor material

1. substrate

It in some embodiments, is (the ginseng of conductive layer 128 using the substrate that iCVD is coated in electrowetting Optical devices See Fig. 1).Conductive layer 128 may include metal material, conducting polymer materials, other suitable conductive materials or their group It closes.Additionally or alternatively, conductive layer 128 may include single-layer or multi-layer, and some or all of them can be conductive.Some In embodiment, conductive layer 128 can limit public electrode 124 and/or driving electrodes 126 (referring to Fig. 1).For example, by first Outer layer 118 and/or the second outer layer 122 are bound to before middle layer 120, and conductive layer 128 can be applied to the reality of middle layer 120 Entire outer surface in matter (referring to Fig. 1).In some embodiments, the polymer for being coupled to the iCVD deposition of conductive layer 128 can It is conformal with 128 substrate height of conductive layer.It in some embodiments, can be in low temperature substrates for the reaction condition of iCVD technique Using low initiation temperature (for example, from about 75 DEG C to about 150 DEG C) on (for example, from about 20 DEG C to about 35 DEG C), so that they are protected It holds at room temperature or near room temperature and avoids the common Attacks due to substrate of the method for such as plasma CVD etc Caused damage.

The material that can be used as substrate of additional type includes but is not limited to: metal, metal oxide, ceramics, glass, fiber Other conventional apparatus baseplate materials of substrate and such as silicon etc.In some embodiments, substrate can be plastics, including But be not limited to: thermoplastic, thermosetting plastics and biopolymer are (for example, polyethylene (PE), polypropylene (PP), poly- to benzene Naphthalate (PET), dimethyl silicone polymer (PDMS), polystyrene (PS), polycarbonate (PC), polytetrafluoroethylene (PTFE) (PTFE) and other).

In some embodiments, substrate can be handled before iCVD technique to improve adhesiveness.For example, in some realities Apply in mode, the configuration of surface of substrate can be exposed to electron beam, IR radiation, gamma radiation, plasma irradiating, heat treatment and/ Or laser irradiation so that substrate rough surface, so as to improve adhesiveness.In some embodiments, insulating polymer dielectric layer It can be on covalence graft to driving electrodes 126 or conductive layer 128 (referring to Fig. 1).

2. monomer

The Exemplary ethylene base monomer of iCVD technique can be used for by following formula I to formula individually or with mutual any combination XII is indicated:

Wherein R, R₁、R₂And R₃It is each independently selected from hydrogen, alkyl, fluoroalkyl, aralkyl, alkenyl, heteroarylalkyl and carboxylic Base；Halogen (for example, bromine, chlorine, fluorine etc.), hydroxyl, alkoxy, aryloxy group, carboxyl, amino, acyl amino, amide groups, amino first Acyl group, sulfydryl, sulfonate group, sulfoxide group；X includes hydrogen, alkyl, naphthenic base, Heterocyclylalkyl, aryl, heteroaryl, aralkyl, miscellaneous Aralkyl and-(CH₂)_nY, wherein Y is selected from by hydrogen, alkyl, naphthenic base, Heterocyclylalkyl, aryl, heteroaryl, aralkyl, heteroaryl alkane Base, nitro, halogen, hydroxyl, alkoxy, aryloxy group, carboxyl, heteroaryloxy, amino, acyl amino, amide groups, carbamyl The group of base, sulfydryl, sulfonate group and sulfoxide group composition；And n is 1-10 (including 1 and 10).

As it is used herein, " alkyl " group includes having from 1 to about 20 carbon atom and typically from 1 to 12 Carbon or the in some embodiments straight chain or branched alkyl group of from 1 to 8 carbon atom.As employed herein, " alkyl group " includes group of naphthene base defined below.Alkyl group can be substituted or unsubstituted.Straight chained alkyl base The example of group includes methyl, ethyl, n-propyl, normal-butyl, n-pentyl, just base, n-heptyl and n-octyl group.Branched alkane The example of base group includes but is not limited to: isopropyl, sec-butyl, tert-butyl, neopentyl and isopentyl group.It is representative to take Such as amino, sulfydryl, hydroxyl, cyano, alkoxy, and/or such as F, Cl, Br and I race etc can be used in the alkyl group in generation Halogen group carries out one or many substitutions.As it is used herein, term halogenated alkyl is that have one or more halogen radicals The alkyl group of group.In some embodiments, halogenated alkyl refers to perhaloalkyl groups.

Group of naphthene base is such as, but not limited to cyclopropyl, cyclobutyl, cyclopenta, cyclohexyl, suberyl and cyclooctyl base The cyclic alkyl radical of group etc.In some embodiments, group of naphthene base has 3 to 8 member rings, and in other embodiment party In formula, the quantity of ring carbon atom is in the range of from 3 to 5,6 or 7.Group of naphthene base can be substituted or unsubstituted.Ring Alkyl group further includes such as, but not limited to norborny, adamantyl, bornyl, amphene base (camphenyl), different amphene base With the polycyclic naphthene base group of carene base (carenyl) group etc；Such as, but not limited to naphthalane base (decalinyl) and The condensed ring of similar group etc.Group of naphthene base further includes being replaced by linear or branched alkyl group group as defined above Ring.Representative substituted group of naphthene base can be mono-substituted or replace more than once, such as, but not limited to: 2,2-；2,3-； 2,4-；2,5-；Or 2, bis- substituted cyclohexyl group of 6- or it is mono-, two- or three-replace norborny or cycloheptyl radicals, It can be replaced by such as alkyl, alkoxy, amino, sulfydryl, hydroxyl, cyano and/or halogen group.

Alkenyl group is straight chain, branch or cyclic alkyl with 2 to about 20 carbon atoms, and further includes at least one A double bond.In some embodiments, alkenyl group has from 1 to 12 carbon or typically from 1 to 8 carbon atom.Alkenyl Group can be substituted or unsubstituted.Alkenyl group includes, for example, vinyl, acrylic, 2- cyclobutenyl, 3- cyclobutenyl, Isobutenyl, cyclohexenyl group, cyclopentenyl, cyclohexadienyl, butadienyl, pentadienyl and hexadienyl group etc..Alkene Base group can be similar to alkyl group and be substituted.There are two the alkenyl groups in attachment site for divalent alkenyl group, i.e. tool, including but It is not limited to CH-CH=CH₂, C=CH₂Or C=CHCH₃。

As it is used herein, " aryl " or " fragrant " group is free from heteroatomic cyclic aromatic hydrocarbon.Aryl group Including monocycle, bicyclic and polycyclic system.Therefore, aryl group include but is not limited to phenyl, heptalene base (heptalenyl), Biphenylene, and indenes phenyl (indacenyl), fluorenyl, phenanthryl, triphenylene, pyrenyl, aphthacene base (naphthacenyl),Base (chrysenyl), xenyl, anthryl, indenyl, indanyl (indanyl), pentalene base and naphthyl group.One In a little embodiments, aryl group includes 6-14 carbon in the loop section of group, and include in other embodiments from 6 to 12 or even 6-10 carbon atoms.Phrase " aryl group " include containing such as condensed aromatic-fat ring system (for example, Indanyl, tetralyl and similar group) etc condensed ring group.Aryl group can be substituted or unsubstituted.

In some embodiments, R, R₁、R₂、R₃And X can be each independently selected from including hydrogen；Halogen (that is, F, Cl, Br, And I)；Hydroxyl；Alkoxy, alkenyloxy group, alkynyloxy group, aryloxy group, aralkoxy, heterocyclic oxy group and heterocyclylalkoxy groups group；Carbonyl (oxo)；Carboxyl；Ester；Urethane (urethane)；Oxime；Azanol；Alkoxyamine；Aralkoxy amine；Mercaptan；Thioether；Dimethyl sulfoxide, Sulfone, sulfonyl；Sulfonamide；Amine；N- oxide；Hydrazine；Hydrazides；Hydrazone；Azide；Amide；Urea；Amidine；Guanidine；Enamine；Acid imide；It is different Cyanate；Isothiocyanates；Cyanate；Thiocyanates；Imines；Nitryl group；Nitrile (that is, CN)；With the substitution of their combination Base group.

In some embodiments, iCVD technique can be used for polymerizeing the fluoromonomers containing vinyl bonds.Fluoropolymer Dissolubility is typically very limited, and needs to carry out liquid-based film casting technique using aggressive solvent.Make in iCVD technique No steam technologies avoid the difficulty as caused by surface tension and non-wetted effect, so that ultrathin membrane (< 10nm) can apply To substantially any substrate.In some embodiments, iCVD technology can be used for applying insulating polymer dielectric from fluoropolymer Layer, the fluoropolymer includes but is not limited to polytetrafluoroethylene (PTFE), poly- (ethylene -co- tetrafluoroethene), fluoroethylenepropyl.ne, perfluor Alkoxy alkane, 1H, 1H, 2H, 2H- perfluoro decyl acrylate or tetrafluoroethene and 2, bis- (trifluoromethyl) -4, the 5- bis- of 2- The copolymer of fluoro- 1,3- dioxole.In some embodiments, insulating polymer dielectric layer includes that amorphous fluorine is poly- Close object.In other embodiments, insulating polymer dielectric layer includes polytetrafluoroethylene (PTFE).

In some embodiments, iCVD technique can be used for polymerizeing containing from including but not limited to vinylsiloxane monomer Polysiloxanes " silicone resin (silicone) " coating that the monomer of siloxanes is formed.In some embodiments, with have Seldom or the coating without crosslinking is compared, and the fine and close network of silicone functionalities can make corresponding coating for expanding and dissolving more Has resistance.In other embodiments, iCVD applicable polymer may include both fluorine part and oxyalkylene segment.

In some embodiments, the monomer for iCVD technique may include acrylate cross linked dose.In some embodiment party In formula, the monomer for iCVD technique may include 17 fluorine last of the ten Heavenly stems ester of (methyl) acrylic acid；Acrylic acid octafluoro pentyl ester；Poly- (divinyl Base benzene)；2,4,6- trimethyls -2,4,6- trivinyl cyclotrisiloxane；2,4,6,8- tetramethyls -2,4,6,8- tetravinyls Cyclotetrasiloxane；Six vinyl disiloxane；Or their combination.

In some embodiments, iCVD copolymer may include that one or more fluoromonomers can be used for one or more Adjust the vinyl monomer of surface energy, surface roughness, crystallinity, thermal stability and mechanical performance together.It is this in electricity The control of the surface nature of the interface of damping device and respective fluid can be important in electrowetting application, because of surface Can and roughness can the directly contact angle realized of decision liquid and the corresponding lag between advancing angle and receding angle.Some In embodiment, crystallization is reduced using the monomer of proper ratio in copolymerization to be reduced a possibility that forming pin hole, the pin hole It is covered derived from the imperfect surface occurred when two or more crystalline regions meet.In some embodiments, some to make The film without pin hole can be needed in the application of insulating polymer dielectric layer.In some embodiments, after heat, electron beam, UV The surface nature of changeable iCVD polymeric layer is handled, this can lead to the variation of the contact angle of observation and lag behavior.

3. initiator

It can may include halogen for the exemplary free radical initiator of iCVD technique individually or with mutual any combination Element, azo-compound (for example, azodiisobutyronitrile and 1,1 '-azo is bis- (cyclohexane carbonitrile)), organic peroxide (for example, Di-tert-butyl peroxide and benzoyl peroxide), inorganic peroxide (for example, peroxydisulfate) and known in the art Any other organic and inorganic or transition-metal catalyst, to generate free radicals initiator.

The material properties of insulating polymer dielectric layer

In optical electrowetting device, the optical liquid lens such as controlled by electrowetting, insulating polymer dielectric layer can It contacts with second fluid and is contacted with first fluid.In some embodiments, when including with first fluid and second fluid Such as when being contacted in the wide temperature range from about -40 DEG C to about 85 DEG C, the dielectric property of insulation dielectric layer (for example, dielectric constant, Breakdown voltage, fissipation factor) it can be maintained at any time.In some embodiments, insulating polymer dielectric layer be present in Any chemical action may not be present in first fluid and second fluid in electrowetting Optical devices.

In some embodiments, the insulating polymer dielectric layer of optical electrowetting device is one or more following by presenting The polymer of feature is made:

Insulative polymer material is electrical insulating dielectric material；

Insulative polymer material is hydrophobic and/or low polar, it may for example comprise between about 0mN/m and about 4mN/m Polarity；

Insulating materials is the polymer with low relative dielectric constant ∈ r, is preferably existed when being used as wettable surface It is below about 3.5 under 1kHz；

Insulative polymer material, which has, to be greater than about 1MV/m, greater than about 2MV/m, greater than about 3MV/m or is greater than about Short-circuit risks are minimized and increase the dielectric service life by the high-breakdown-voltage of 4MV/m；

Insulative polymer material has a low loss factors D, and typically below about 0.05, below about 0.03 or be lower than About 0.01；

Polymer material some time in and in wide temperature range, especially about -50 DEG C to about+125 DEG C it Between, between about -40 DEG C to about+110 DEG C or between about -40 DEG C to about+85 DEG C have high reliability (that is, not damaging)；

Insulative polymer material and second fluid (for example, conductive fluid) and first fluid (for example, non conducting fluid) Between do not have or with limited physical/chemical effect, therefore insulative polymer material has most of chemicals The resistance of height；

Insulative polymer material does not have or adsorbs with limited water, is less than about 0.3% within typically every 24 hours Or it is less than about 0.1% in every 24 hours；

Insulative polymer material does not dissolve in conductive fluid and non conducting fluid between -40 DEG C and+85 DEG C；

Insulative polymer material has the high grade of transparency (transmissivity > 90% in visible wavelength) and/or low optical color It dissipates；

As tested ASTM D3359-02 measurement by adhesiveness, insulative polymer material has conductive layer 128 Good adhesiveness (referring to Fig. 1), to facilitate the spontaneous layering for preventing dielectric polymers in the presence of fluid；

There is insulative polymer material low UV and visible light to adsorb, to limit temperature rise simultaneously during the irradiation of the light of device Prevent/avoid the chemical reaction between insulating substrate and the fluid of contact；

The feature of insulative polymer material can be to indicate that the surface of initiation formula chemical vapor deposition (iCVD) technique is thick Rugosity have less than 200nm, less than 100nm, less than 50nm, less than 25nm, less than 20nm, less than 10nm, less than 5nm, be less than The feature of 2nm or the averaged maximum height less than 1nm；

Insulative polymer material has the high glass transformation temperature of high melting temperature and 85 DEG C or more.

In some embodiments, insulating polymer dielectric layer can have greater than about 85 DEG C, greater than about 95 DEG C, be greater than about 105 DEG C, greater than about 115 DEG C or greater than about 125 DEG C of glass transformation temperature.In some embodiments, insulating polymer is situated between The glass transformation temperature that electric layer is promoted, which can help to work as, is exposed to the first fluid used in electrowetting Optical devices and second Both chemical stability and the physical stability of insulating polymer dielectric layer are improved when fluid.

In some embodiments, the porosity of the insulating polymer dielectric layer formed using iCVD method can be controlled.Example Such as, in some embodiments, the size and density of the porosity of polymer film can pass through the Thermal CVD of manipulation iCVD method Condition (such as pressure, filament temperature, substrate temperature, monomer are to ratio of initiator and residence time) and it is controlled.In other implementations In mode, the selection of monomer or various of monomer and optionally free radical initiator can help to control porosity.

In embodiments disclosed herein, iCVD polymerization technique has proven to extremely general.In some embodiments, ICVD is not needed using solvent, and iCVD causes step and do not cause the degradation of monomer and decouple from film growth site.Cause This, may not be present surface tension and wetting removal effect, while resulting dielectric polymers are equably coated with the substrate of lower layer Geometry.In other embodiments, the additional advantage of the polymer film of these iCVD preparation can be relative to height in length and breadth Than the coating more evenly of feature, because not competed between film growth (deposition) and damage (etching).Finally, in some realities It applies in mode, the polymer film of iCVD preparation can express low-down surface roughness.

According to some embodiments, electrowetting Optical devices include the voltage source for applying alternating voltage, to change The meniscus formed between conducting liquid and non-electrically conductive liquid, to control the focal length of lens.In some embodiments, electricity profit Wet Optical devices further include driver or the like for controlling lens, wherein the lens and driver or similar Electronic device is integrated in liquid lens.In other embodiments, electrowetting Optical devices may include multiple being incorporated at least one The lens of a driver or like.

Electrowetting Optical devices can be used as or can be variable focal length liquid lens, optical zoom, Ophthalmoligic instrument, have Device, image stabilization device, beam deflecting device, variable illumination apparatus and any other use electricity of variable inclined light shaft A part of the Optical devices of wetting.In some embodiments, liquid lens/electrowetting Optical devices may be incorporated into or be mounted on Including such as camera gun, mobile telephone display, endoscope, rangefinder, dentistry camera, barcode reader, light beam In any one or more equipment including deflector, and/or microscope.

Although elaborating illustrative embodiments and embodiment for purpose of explanation, foregoing description is not intended to Present disclosure and scope of the appended claims are limited in any way.Therefore, not substantially away from the disclosure spirit and In the case where various principles, the above-described embodiment and examples can be made changes and modifications.All such modifications and variations It is intended to be included within the scope of the present disclosure and is protected by following following claims.