阅读说明：本技术 具有浮雕结构的防伪元件及其生产方法 (Security element and its production method with embossment structure ) 是由 H.洛克比勒 C.富斯 T.格哈特 M.R.J.谢勒 F.阿姆索尔 M.拉姆 M.法伊弗 于 2018-03-19 设计创作，主要内容包括：本发明涉及一种用于生产诸如钞票、支票等的防伪文件的防伪元件(S),其在背景前显示主题,防伪元件(S)具有浮雕结构(7、10、12-14、16、17),该浮雕结构覆盖防伪元件(S)的主题区域(1、4)并在那里提供主题并且覆盖防伪元件(S)的背景区域(2)并在那里提供背景,其中具有轮廓区域(3),其界定了主题与背景,其也由浮雕结构形成,其中轮廓的浮雕结构(12、14和17)不同于主题区域的浮雕结构(10、13、16a)和背景区域(2)的浮雕结构(7、16b),从而在一方面轮廓(3)与另一方面主题区域(1、4)和背景区域(2)之间存在亮度和/或颜色对比。(The present invention relates to one kind for producing such as banknote, the Security element (S) of the security document of check etc., it shows topics before background, Security element (S) has embossment structure (7, 10, 12-14, 16, 17), the embossment structure covers the motif area (1 of Security element (S), 4) and there theme is provided and cover the background area (2) of Security element (S) and background is provided there, wherein there are contour area (3), which define themes and background, it is also formed by embossment structure, the wherein embossment structure (12 of profile, 14 and 17) be different from motif area embossment structure (10, 13, 16a) and the embossment structure (7 of background area (2), 16b), to profile (3) on the one hand and another aspect motif area (1, 4) and There are brightness and/or color contrasts between background area (2).)

1. a kind of for producing the Security element of the security document of banknote, check etc., the display pattern in background, In, the Security element (S) has embossment structure (7,10,12,13,14,16,17), which covers Security element (S) Area of the pattern (1,4) and provide there and pattern and cover the background area (2) of Security element (S) and back is provided there Scape, which is characterized in that provide contour area (3), which define area of the pattern (1,4) and background area (2) and its also by Embossment structure is formed, wherein the embossment structure (12,14,17) of the contour area is different from the embossment knot of area of the pattern (1,4) The embossment structure (7,16) of structure (12,13,16a) and background area (2), thus contour area (3) and another aspect on the one hand There are brightness and/or color contrasts between area of the pattern (1,4) and background area (2).

2. Security element as described in claim 1, which is characterized in that the embossment structure (12,14) of the contour area (3) has There is sub-wave length grating.

3. Security element as claimed in claim 2, which is characterized in that the area of the pattern (1,4) and background area (2) are on the contrary There is no sub-wave length grating.

4. Security element as claimed in claim 2 or claim 3, which is characterized in that the embossment structure of the contour area (3) has moth Ocular structure (14).

5. Security element according to claim 4, which is characterized in that the area of the pattern (1,4) and background area (2) are anti- There is no moth ocular structure.

6. the Security element as described in any one of claims 1 to 5, which is characterized in that the embossment knot of the contour area (3) Structure (12,14) has microcavity.

7. such as Security element described in any one of claims 1 to 6, which is characterized in that the embossment knot of the contour area (3) Structure has micro-mirror structure.

8. the Security element as described in any one of claims 1 to 7, which is characterized in that the embossment knot of the contour area (3) Structure has holographic structure.

9. such as Security element described in any item of the claim 1 to 8, which is characterized in that the embossment knot of the contour area (3) Structure has retroreflective structure.

10. Security element as claimed in any one of claims 1-9 wherein, which is characterized in that the embossment of the contour area (3) Structure is metal, layer compound high reflecting or being coated with generation color effects.

11. the Security element as described in any one of claims 1 to 10, which is characterized in that the embossment structure forms profile Region (3), contour area (3) structuring.

12. Security element as claimed in claim 11, which is characterized in that the structuring of the contour area (3) includes profile The micro- text or item of information that interruption and/or naked eyes in region (3) can not be detected or be differentiated.

13. a kind of security document with the Security element as described in any one of claims 1 to 12.

14. a kind of production method of the Security element (S) of security document for banknote, check etc., the Security element The display pattern in background, wherein generate embossment structure (7,10,12,13,14,16,17), which covers anti-fake member The area of the pattern (1,4) of part (S) simultaneously provides pattern there and covers the background area (2) and there of Security element (S) Background is provided, which is characterized in that provide contour area (3), which define area of the pattern (1,4) and background area (2) and It is also formed by embossment structure, wherein the embossment structure (12,14,17) of the contour area (3) be different from area of the pattern (1, 4) embossment structure (7,16b) of embossment structure (10,13,16a) and background area (2), thus contour area (3) on the one hand There are brightness and/or color contrasts between another aspect area of the pattern and background area (2).

15. production method as claimed in claim 14, which is characterized in that the Security element is according to claim 1 in 12 Any one produce.

Technical field

The present invention relates to a kind of for producing the Security element of the security document of banknote, check etc., in background Display pattern, the Security element have embossment structure, and the area of the pattern of embossment structure covering Security element simultaneously provides there It pattern and covers the background area of Security element and background is provided there.

The invention further relates to a kind of security documents with Security element.

Finally, the present invention relates to a kind of production method for Security element, the Security element for produce such as banknote, The security document of check etc., Security element display pattern in background, wherein generating embossment structure, embossment structure covering is anti- The area of the pattern of pseudo- element simultaneously provides pattern there, and its cover Security element background area and back is provided there Scape.

Background technique

The anti-counterfeiting characteristic of banknote includes pattern, such as symbol, image or true color image, is designed to realize especially good Perception level and prevent forge safety.For example, these patterns come from following publication: H.Lochbihler, " Colored images generated by metallic sub-wavelength gratings ", Opt.Express, 2009, volume 17, the 12189-12196 pages；WO 2012/156049 A1；EP 1434695 B1；EP 2453269 A1； WO 2013/091858 A9；102014011425 A1 of US 9188716 B2 and DE.

However, the pattern with such Security element needs to be changed in terms of sentience under the conditions of poor lighting Into.

Summary of the invention

Therefore, the purpose of the present invention is to improve the Security element for the type mentioned in introduction, security document and production process, To improve sentience.It can should simply be produced simultaneously.

The present invention defines in claim 1,10 and 11.

Security element for producing the security document of banknote, check etc. has embossment structure, and Security element is being carried on the back Display pattern on scape, the area of the pattern of embossment structure covering Security element simultaneously provide pattern there and cover Security element Background area simultaneously provides background there；Additionally, it is provided contour area, which define area of the pattern and background area and its Also it is formed by embossment structure, wherein the embossment structure of contour area is different from the embossment structure of area of the pattern and floating for background area Structure is carved, so that there are brightness and/or colors between contour area and another aspect area of the pattern and background area on the one hand Comparison.

In the method for the Security element of the security document for producing banknote, check etc., Security element is in background Upper display pattern, generate embossment structure, the embossment structure cover Security element area of the pattern and there offer pattern and Cover the background area of Security element and background be provided there, and provide contour area, which define area of the pattern and Background area and its also formed by embossment structure, wherein the embossment structure of contour area be different from area of the pattern embossment structure With the embossment structure of background area, to exist between contour area and another aspect area of the pattern and background area on the one hand Brightness and/or color contrast.

The present invention is based on following discoveries: if pattern is easier to identify by the high profile that compares by itself and background description. In order to realize particularly preferred comparison and promote manufacturability, profile is also limited by embossment structure, and the contour structure is in contour area In it is different from area of the pattern and background area, thus on the one hand contour area and another aspect area of the pattern and background area it Between there are brightness and/or color contrasts.By this method, registration requirements are avoided, for example there is high color pair in traditional It will appear in the printing of the profile of ratio.Meanwhile can be designed so that profile to realize the maximum contrast with pattern and background, i.e., Such as bright profile can also be easy to accomplish.Therefore, the present invention significantly increases pattern for the sentience of observer.

For example, by proper choice of the profile geometries of embossment structure, may be implemented contour area and area of the pattern and Comparison between background area.Embossment structure is typically coated such as metal or high refraction coating or the layer for generating color effects Compound, such as known to from WO2008/080499A1.In order to generate pattern, known different embossment knot from the prior art Structure utilizes these embossment structures, comparison can be realized between area of the pattern and background area.From the prior art, such as The known embossment structure with micro mirror (referring to DE102010049617A1).These micro mirrors can be with pixel arrangement, each pixel Micro mirror with identical orientation.Furthermore, it is possible to using fresnel structure (referring to EP1562758B1), or can also be with micro mirror It is applied in combination.For micro mirror, be from 1 μm to maximum 100 μm of relief height it is known, lateral dimensions from less than 10 μm to 100 μ M or less.Another known embossment structure for generating pattern is the holographic grating of embossed holographic form.They include having The metallization embossment structure of 500nm to 2 μm of screen periods, and it is arranged so that observer perceives the figure in first order of diffraction Case or true color image.US9188716B1 generates multicolour pattern using the embossment structure of retroreflective structure form.In order to produce Raw pattern or background, one-dimensional or two-dimensional sub-wavelength grating are also known, such as from publication H.Lochbihler, " Colored images generated by metallic sub-wavelength gratings ", Opt.Express, 2009, volume 17, the 12189-12196 pages or WO 2012/156049.Pass through the embossment knot with differently contoured parameter The arrangement pixel-based of structure can generate true color image with zero order of diffraction, can be used for generating pattern in background. In addition, by sequence show specific embossment structure, such as micro-structure, can cause in the picture movement effects (referring to DE102010047250A1).All these different types of embossment structures can use in the context of the present invention and group It closes, to generate pattern and background, i.e., in area of the pattern and background area, and generates profile.Certainly, different embossment structures can It is respectively used to background area and area of the pattern and profile.Key point is, between contour area and area of the pattern and is taking turns There is with the naked eye appreciable optical contrast between wide region and background area.Another example of sub-wavelength structure is so-called moth Ocular structure (referring to WO2006/026975A2 and EP2453269A1).Coloured silk can be generated by colouring or dyeing embossment structure Colored pattern.

In extending one, by correspondingly designing embossment structure, structuring can be provided for contour area.Structuring can be with Mean the interruption of contour area and/or including the micro- text that can not detect of naked eyes or information.

Contour area is also possible to the contour line in complex pattern.Complex pattern is made of multiple pattern elements, wherein one A pattern element is understood to that when relative to another pattern element optical perception be background, so that contour area defines background Another area of the pattern of region, that is, complex pattern one area of the pattern and complex pattern.In a particular embodiment, profile region Domain is also possible to non-structured.

Detailed description of the invention

Below based on example, with reference, the present invention will be described in more detail, and attached drawing can also show spy required in this invention Sign.It is shown in figure:

Fig. 1 is the plan view of the Security element in background with multiple patterns, and wherein profile defines pattern in background,

Fig. 2 be tool there are three region I, II and III Security element S schematic cross section, three regions I, II and Area of the pattern, contour area and background area of the III corresponding to the Security element of Fig. 1,

Fig. 3 is analogous to the diagram of Fig. 2, wherein other embossment structures are used for area of the pattern, background area and profile region Domain, and

Fig. 4 is the view similar with Fig. 2 and 3, wherein again, other embossment structures are used for area of the pattern, background area And contour area.

Specific embodiment

Fig. 1 shows Security element S, and the hummingbird with the title of an emperor's reign is shown on structured background as pattern.Pattern Region 1 and background area 2 are formed by different embossment structures, embossment structure reflection when form optical contrast, so as to Naked eyes perceive pattern.Pattern is defined from background by narrow profile.The title of an emperor's reign is also by profile from background protrusions.Profile region Contours profiles in domain 3 are also generated by embossment structure, and embossment structure is designed to make they and area of the pattern 1,4 and background area Domain 2 is contrasted.This significantly increases the sentience of pattern for observer.Area of the pattern 1,4 and background area 2 are by embossment Structure is formed, and embossment structure is for example metallized and is embedded in dielectric.This is equally applicable to profile 3.By proper choice of floating The profile geometries of structure are carved to create the comparison between different zones.

Fig. 2 shows the exemplary schematic cross-sections of this embossment structure.Here range I corresponds to area of the pattern 1 Or 4, region II corresponds to background area 2, and region III corresponds to contour area 3.Security element S is formed on basilar memebrane 5, Embossing paint layer 6 is applied with thereon then embossment structure metallizes wherein introducing embossment structure.Upper paint layer 8 and cover film 9 Security element S is completed, the window area of such as banknote can be crossed over.

In the embodiment of holographic grating 7,10, region I and region II are formed with sinusoidal profile.Holographic grating 7 It is different in terms of resulting image with 10 design.It is real by the sub-wave length grating 12 in the III of region to compare contour area 3 It is existing.Sub-wave length grating 12 can be one-dimensional or two-dimensional and periodic.It is relative to holographic grating 7 and the generation pair of holographic grating 10 Than, and the pattern formed by area of the pattern 1,4 is therefore highlighted in the background formed by background area 2 as profile.

Fig. 3 shows another embodiment, largely can freely be selected with the embossment structure illustrated in region I, II and III It selects, as long as there is comparison between region I and II and generate comparison between region III and region I and II.In the implementation of Fig. 3 In example, background area 2 is formed in different ways.On the one hand, i.e., in some parts, it is formed by holographic grating 7, another party Face is formed that is, in other parts by smooth surface 15.Area of the pattern is realized by micro-mirror device 13.In the III of region, wheel Wide area filling has light absorbing moth ocular structure 14.

Fig. 4 shows the embodiment that contour area realizes light border.Here region I and II design has transmission hologram light Grid, such as those of known to from DE102014011425A1.In addition to the 0th order of diffraction 0.O. and the first order of diffraction 1.O., they Have the effect of in transmission additional, i.e., incident radiation E is not only reflected as reflected radiation R, such as in the embodiment shown in figs. 2 and 3 The case where, but also partly transmitted as transmitted radiation T.This means that transmission light pattern is also possible.In region III In, this is combined with traditional holographic grating, is opaque after metallization.Therefore, it obtains and is carrying on the back in the plan view Area of the pattern 1,4 is defined in scene area 2, which results in bright profiles.Structure in Fig. 4 also shows the pattern in transmission. On the direction of observation, contour line, that is, region III looks like dark and enhances the sentience of the pattern.This in transmission A little changes in contrast can be realized very universally by opaque profile.Suitable embossment structure for this purpose is metal Change, and aspect ratio possessed by the profile having i.e. depth and the ratio in period are less than 0.4.Specific example is smooth gold Categoryization surface, micro mirror array, matt structure or traditional holographic structure etc..Transmittance structure especially can be to be mentioned from introduction In the Lochbihler arrived, Opt.Express publication or those of known to from WO2012/156049.This transmittance structure Seem darker than the opaque metal structure with low aspect ratio usually in reflection, because transmission light component reduces instead It penetrates.Therefore such as bright profile of these flat structures significantly improves perception of the pattern in reflection.

Certainly only as an example, the implementation of Fig. 2 to 4 to be illustrated different embossment structures lateral into III in region I Arrangement.Arrangement of micromirrors, Fresnel shape structure, μ lens, holographic grating, retroreflective structure, one-dimensional or two-dimensional sub-wavelength grating or Other of moth ocular structure and microcavity combine equally possible, and brightness and/or face between each region are provided to viewer Colour contrast.

Dark structure can also be provided in contour area.This structure seems from different direction of observations (preferably all) It is dark.For this purpose, moth ocular structure 14 used in Fig. 3 is specially suitable.Become known for generating this moth from document The distinct methods of ocular structure 14.As an example, with reference to above-mentioned WO2006/026975A2 or EP1434695B1.These publications are retouched The metal random surface of evaporation has been stated, refractive index gradient layer is formed and there is good absorption.Constructional depth therein is excellent Choosing is greater than 50nm, and the average headway between adjacent height is less than 500nm, because of referred to herein as sub-wavelength structure.This random surface It can be generated from plastic-substrates (such as PMMA) using plasma etching process.Alternatively, periodical cloth also can be used The moth ocular structure set.It it is known that the dark color that high comparison is generated with the moth ocular structure that multilayer (such as so-called gamut coating) covers (referring to EP2453269A1).Moreover, the structure with average headway greater than 500nm can show high suction after metallization It produces effects fruit.This so-called microcavity preferably has a hemispherical concave depressions, and the ratio of depth and pore size is greater than 0.5, and that This is adjacently positioned, such as with hexagon or orthogonally arranges.EP1434695B1 discloses a kind of moth ocular structure, small by the period It is formed in the metallization crossed grating of 420nm.Moreover, two-dimensional and periodic sub-wave length grating can be used for light absorption, such as Described in WO2012/156049A1.The grating is also applied for colour filter.It can choose the geometric parameter of grating, so that occurring most Big light absorption and average reflection is less than 20%, preferably smaller than 10%.

Boundary between background area, area of the pattern and contour area can be by being used as this structure of colour filter come real It is existing.These are not necessarily black, but also can occur with other colors, such as red or blue.However, dark color is for pattern Sentience be advantageous.These described metal sub-wavelength structures show increased light absorption in limit of visible spectrum, It is partly due to the RESONANCE ABSORPTION of light, this leads to the coloration of reflection.Since the average absorption in visible wavelength region is always above The average absorption of mirror-smooth surface such as micro mirror, therefore ensure that between contour area and area of the pattern and/or background area High comparison.Alternatively, these structures may also seem not dark from certain directions.For example, contour area can also be by micro- Mirror filling, micro mirror orientation all having the same, therefore only illuminated brightly simultaneously in an angle.Although this is lacked with following Point: when time domain III illuminates (undesirably), therefore under the angle from some angle, contour area is in certain conditions The boundary between pattern and background will not be generated down, still, for this disadvantage, be technically very easy to realize structure, because Not need production other structures, especially no nanostructure other than micro mirror.Then it can only be realized by micro mirror For the embossment structure of background area, contour area and area of the pattern, wherein the only directed change of the micro mirror between different zones. Advantageously, the undesirable angle illuminated in these regions is selected, so that it is for example almost imperceptible in this region, is owned Mirror can be farthest downwardly oriented, and only be occurred at very inclined visual angle so that illuminating effect.It alternatively, can be with The inclination along east-west direction is selected, wherein the aligned orientation of micro mirror is at for example in east orientation pole distant place orientation.

Embossment structure with low aspect ratio suitably forms bright profile.After metallization, this structure is transmiting In be largely opaque, and will be bright for observer in reflection.It is particularly suitable to thus Micro mirror, holographic grating, retroreflective structure and plane surface.

If embossment structure can change the gamut color in contour area to realize boundary using gamut coating.

For good sentience, the average brightness of contour area is less than in reflection and optionally also in transmission The 50% of area of the pattern and the average brightness of background area.Alternatively, the average brightness of contour area be higher than reflection in and 20% or more of the average brightness of area of the pattern and background area optionally also in transmission.

, it is preferable to use micro mirror, holographic grating and/or zigzag grating in area of the pattern and background area, in profile region In domain, sub-wavelength structure (especially colour filter or moth eye), holographic grating and/or matt structure are used.

Photolithography method manufacture, such as electron beam system or Myocardial revascularization bylaser system is preferably used in embossment structure, such as sharp It is worked with two-photon absorption process.Alternatively, it can be generated in two stages photoetching process.In first step, received Rice structuring.For example, this is carried out by electron beam lithographic process.Alternatively, laser beam interference method can also be used.It is non- Periodical moth ocular structure can also be by plasma etching or by being generated with ultrashort laser pulse structuring.Subsequent In step, keep the original part of this structure or copy smooth with photoresist.For this purpose suitable method be mainly spin coating or Dip-coating.Then embossment structure is carved into photoresist in lithography step, and the desired zone of exposed structure.The process can To be carried out in direct exposure process by Myocardial revascularization bylaser device.Then resulting original part can be carried out to galvanic electricity duplication transfer or made Duplication transfer is carried out with photosensitive polymer (such as Ormocere).The surface texture of the stamp produced in this way then can be with It is replicated side by side over larger areas by step and repeat process.By being replicated on the surface to the electric print of original part progress, Impression cylinder can be made from it.Finally, the structure can be stamped on film in the process continuously roll-to-roll.Nano impression side Hot padding or embossing of the method such as in UV curing materials are suitable herein.Finally, imprint membrane is by evaporation of metal.Common steaming Hair technology is electron-beam vapor deposition, thermal evaporation or sputtering.As metal material, can be used aluminium, silver, copper, palladium, gold, chromium, The metals such as nickel, iron, cobalt and/or tungsten and its alloy.After vapor deposition, optionally structure is laminated in cover film 9 and is used in combination It is protected.Instead of simple metal coating, embossment structure can also be coated with multilayered structure.For this purpose, especially using so-called color Coating is moved, is made of semi-transparent metal layer, dielectric spacer and the metal mirror layer being disposed below.Specially suitable electricity is situated between Matter is SiO₂、MgF₂、Ta₂O₅, ZnS and polymer.Another alternative solution is the dielectric coating with high-index material. If additionally needing metallization removal region on membrane component, before vapor deposition, color is washed in printing on desired zone, then It is removed after vapor deposition.Alternatively, these regions can also use laser metallization removal or wet chemical etching method Manufacture.

In another embodiment, pattern (such as in the form of lines) has movement effects.Area of the pattern 1,4 is by a series of Micro mirror generates, and has " scroll bar " effect, for example, from DE102010047250A1 it is known that wherein slant pattern when bright light Beam can move up and down.The movement of multiple light beams can be identical or in opposite direction.Such pattern is with outline form It is obviously more easily seen, because of observer's " confusion " on the contrary that may only see bright light reflection.Contour area makes practical shape Formula is high-visible for observer.For example, it can be realized by carrying out colour filter to sub-wavelength structure, or if necessary to dark Colour wheel is wide, then can be realized by moth ocular structure.In particularly advantageous modification, discoloration coating (example has been can be set in micro mirror Such as three-decker with sequence absorber, dielectric, reflector).Particularly advantageously, the embossment structure in contour area changes The color print of the coating is become, such as by using suitable sub-wavelength structure.Therefore, bright or dark profile not only can be generated Line, and particularly, the contour line with the color other than the color in movement effects can also be generated.

Especially in contour area using sub-wavelength structure can produce another effect is that higher transmissions.With strong Metal sub-wavelength grating and flat surfaces, the holographic grating or micro-mirror structure of transmission form sharp contrast.Especially when moth eye is tied Structure be used for contour area when, the latter look like when viewed from above it is dark and laterally observation when be it is bright (such as when When being used in banknote window).(especially for example also there are two thin absorbed layers for tool, therefore structure is inhaled in the case where discoloration coating Receive device, dielectric, absorber) and/or when using colour filter sub-wavelength structure in contour area, the color of contour area may It is different from the color of area of the pattern, movement effects can be generated between plan view and transverse view.When from top and back lighting, wheel Wide region itself can also show different colors.

Reference signs list

1,4 area of the pattern

2 background areas

3 contour areas

5 basilar memebranes

6 embossing paint layers

7 holographic structures

8 coatings

9 cover films

10 holographic structures

12 sub-wave length gratings

13 micro-mirror structures

14 moth ocular structures

15 smooth domains

16 transmission hologram gratings

17 opaque holographic gratings

S Security element

E incident radiation

R reflected radiation

T transmitted radiation

0.O. zero level

1.O. level-one

The region I-III