阅读说明：本技术 动力波洗涤器喷嘴、动力波洗涤器及钽铌氢氧化物中氟离子的清洗方法 (The cleaning method of fluorine ion in dynamic wave scrubber nozzle, dynamic wave scrubber and tantalum niobium hydroxide ) 是由 张劲 唐亮 吴美慧 胡松 桂训武 于 2019-09-26 设计创作，主要内容包括：本发明涉及钽铌湿法冶炼领域,具体而言,提供了一种动力波洗涤器喷嘴、动力波洗涤器及钽铌氢氧化物中氟离子的清洗方法。该动力波洗涤器喷嘴包括相互连通的进料段和出料段,所述出料段的侧壁与所述进料段的侧壁之间的夹角为175-178度。该喷嘴的出料段的侧壁与进料段的侧壁之间的夹角为175-178度,由此使得出料段相对于进料段向内倾斜了2-5度,保证了出料速度,该动力波洗涤器喷嘴尤其适用于洗涤液固相,不容易使液固相淤积在喷嘴处,提高了洗涤效率和洗涤效果。该清洗方法采用动力波洗涤法对钽铌氢氧化物中氟离子进行清洗,该方法清洗效率高,氟的去除率高,能减少清洗次数,减少用水量,后期产生的废水少。(The present invention relates to tantalum and niobium hydrometallurgy fields, specifically, provide a kind of dynamic wave scrubber nozzle, in dynamic wave scrubber and tantalum niobium hydroxide fluorine ion cleaning method.The dynamic wave scrubber nozzle includes interconnected feed zone and discharging section, and the angle between the side wall of the discharging section and the side wall of the feed zone is 175-178 degree.Angle between the side wall of the discharging section of the nozzle and the side wall of feed zone is 175-178 degree, so that discharging section has sloped inwardly 2-5 degree relative to feed zone, it ensure that discharging speed, the dynamic wave scrubber nozzle is particularly suitable for washing liquid-solid phase, it is not easy to make liquid-solid phase siltation at nozzle, improves detersive efficiency and washing effect.The cleaning method cleans fluorine ion in tantalum niobium hydroxide using dynamic wave scrubbing method, and this method cleaning efficiency is high, and the removal rate of fluorine is high, can be reduced wash number, reduces water consumption, and the waste water that the later period generates is few.)

1. a kind of dynamic wave scrubber nozzle, which is characterized in that the nozzle includes interconnected feed zone and discharging section, institute Stating the angle between the side wall of discharging section and the side wall of the feed zone is 175-178 degree.

2. dynamic wave scrubber nozzle according to claim 1, which is characterized in that the exit inside diameter of the discharging section and institute Stating the ratio between import internal diameter of discharging section is 0.7:1-0.9:1.

3. a kind of dynamic wave scrubber, which is characterized in that including contact tower and dynamic wave scrubber of any of claims 1 or 2 Nozzle, the dynamic wave scrubber nozzle are set in the contact tower.

4. dynamic wave scrubber according to claim 3, which is characterized in that be additionally provided with tail gas recycle on the contact tower Device.

5. the cleaning method of fluorine ion in a kind of tantalum niobium hydroxide, which is characterized in that using dynamic wave scrubbing method to tantalum niobium hydrogen Fluorine ion is cleaned in oxide.

6. the cleaning method of fluorine ion in tantalum niobium hydroxide according to claim 5, which is characterized in that wanted using right Dynamic wave scrubber described in asking 3 or 4 cleans fluorine ion in tantalum niobium hydroxide.

7. the cleaning method of fluorine ion in tantalum niobium hydroxide according to claim 5, which is characterized in that including following step Rapid: tantalum niobium hydroxide slurry mixes after being transported to the nozzle of dynamic wave scrubber with wash water.

8. the cleaning method of fluorine ion in tantalum niobium hydroxide according to claim 7, which is characterized in that the wash water packet Include weak aqua ammonia；

Preferably, the volume ratio of weak aqua ammonia and tantalum niobium hydroxide is 3:1-8:1.

9. the cleaning method of fluorine ion in tantalum niobium hydroxide according to claim 8, which is characterized in that the temperature of weak aqua ammonia Degree is 40-50 DEG C；

Preferably, the calcined waste heat of tantalum niobium hydroxide is used to be heated to obtain temperature to weak aqua ammonia dilute for 40-50 DEG C Ammonium hydroxide.

10. the cleaning method of fluorine ion in tantalum niobium hydroxide according to claim 7, which is characterized in that after mixing also Include the steps that being separated by solid-liquid separation.

Technical field

The present invention relates to tantalum and niobium hydrometallurgy fields, wash in particular to a kind of dynamic wave scrubber nozzle, dynamic wave Wash the cleaning method of fluorine ion in device and tantalum niobium hydroxide.

Background technique

During tantalum and niobium hydrometallurgy, it is organic that tantalum niobium firstly generates the compound of fluorine, and then is extracted into sec-octyl alcohol etc. In reagent, after the tantalum liquid and niobium liquid for loading organic reagent are separated with impurity, then through back extraction so that the fluoride of tantalum niobium is transferred to water phase Middle formation water phase containing tantalum and water phase containing niobium (being commonly referred to as anti-tantalum liquid and anti-niobium liquid), it is then in anti-tantalum liquid and anti-niobium liquid and ammonium hydroxide and raw At the intermediate products comprising tantalum hydroxide precipitating and niobium hydroxide precipitating, and contain a large amount of fluorine ion impurity in intermediate products, The tantalum hydroxide containing a large amount of fluorine ion impurity and niobium hydroxide must be washed with water completely before drying and calcining.

Since niobium hydroxide precipitating and tantalum hydroxide are precipitated as amorphous sediment, large specific surface area, fluorine ion is mainly with table Face adsorb and the state wrapped up there are in sediment, it is difficult to washes clean, water consumption is very big in washing process.The prior art In, the mode of multiple water washing is mainly taken, detersive efficiency is not high, and can generate a large amount of wash waters, brings to later period wastewater treatment Immense pressure.

In view of this, the present invention is specifically proposed.

Summary of the invention

The first object of the present invention is to provide a kind of dynamic wave scrubber nozzle, which can guarantee discharging speed, And be not easy to make liquid-solid phase siltation at nozzle, detersive efficiency is high, and washing effect is good.

The second object of the present invention is to provide a kind of dynamic wave scrubber, which includes above-mentioned dynamic wave Washer nozzle, thus have the advantages that discharging speed is fast, detersive efficiency is high and washing effect is good.

The third object of the present invention is to provide a kind of cleaning method of fluorine ion in tantalum niobium hydroxide, and this method uses Dynamic wave scrubbing method cleans fluorine ion in tantalum niobium hydroxide, and cleaning efficiency is high, and the removal rate of fluorine is high, can be reduced cleaning Number, reduces the usage amount of wash water, and the waste water that the later period generates is few.

In order to realize above-mentioned purpose of the invention, the following technical scheme is adopted:

In a first aspect, the nozzle includes interconnected charging the present invention provides a kind of dynamic wave scrubber nozzle Section and discharging section, the angle between the side wall of the discharging section and the side wall of the feed zone are 175-178 degree.

As further preferably technical solution, the import internal diameter of the exit inside diameter of the discharging section and the discharging section it Than for 0.7:1-0.9:1.

Second aspect, the present invention provides a kind of dynamic wave scrubbers, including contact tower and above-mentioned dynamic wave scrubber Nozzle, the dynamic wave scrubber nozzle are set in the contact tower.

As further preferably technical solution, device for recovering tail gas is additionally provided on the contact tower.

The third aspect, the present invention provides a kind of cleaning methods of fluorine ion in tantalum niobium hydroxide, are washed using dynamic wave Method is washed to clean fluorine ion in tantalum niobium hydroxide.

As further preferably technical solution, using above-mentioned dynamic wave scrubber to fluorine ion in tantalum niobium hydroxide into Row cleaning.

As further preferably technical solution, comprising the following steps: tantalum niobium hydroxide slurry is transported to dynamic wave It is mixed after the nozzle of washer with wash water.

As further preferably technical solution, the wash water includes weak aqua ammonia；

Preferably, the volume ratio of weak aqua ammonia and tantalum niobium hydroxide is 3:1-8:1.

As further preferably technical solution, the temperature of weak aqua ammonia is 40-50 DEG C；

Preferably, the calcined waste heat of tantalum niobium hydroxide is used to be heated to obtain temperature to weak aqua ammonia as 40-50 DEG C Weak aqua ammonia.

As further preferably technical solution, further include the steps that being separated by solid-liquid separation after mixing.

Compared with prior art, the invention has the benefit that

Angle between the side wall of discharging section and the side wall of feed zone of dynamic wave scrubber nozzle provided by the invention is 175-178 degree ensure that discharging speed, which washes so that discharging section has sloped inwardly 2-5 degree relative to feed zone It washs device nozzle and is particularly suitable for washing liquid-solid phase, it is not easy to make liquid-solid phase siltation at nozzle, improve detersive efficiency and washing Effect.

Dynamic wave scrubber provided by the invention includes above-mentioned dynamic wave scrubber nozzle, thus is used not only for washing Gas phase, additionally it is possible to for washing liquid-solid phase, have the advantages that discharging speed is fast, detersive efficiency is high and washing effect is good.

The cleaning method of fluorine ion is using dynamic wave scrubbing method to tantalum niobium hydrogen-oxygen in tantalum niobium hydroxide provided by the invention Fluorine ion is cleaned in compound, and cleaning efficiency is high, and the removal rate of fluorine is high, can be reduced wash number, reduces water consumption, and the later period produces Raw waste water is few.

Particularly, when being cleaned using above-mentioned dynamic wave scrubber to fluorine ion in tantalum niobium hydroxide, tantalum niobium hydrogen Oxide is not easy siltation at nozzle, and the jet velocity of tantalum niobium hydroxide is fast, can effectively clean in tantalum niobium hydroxide Fluorine, cleaning effect is good.

Detailed description of the invention

It, below will be to specific in order to illustrate more clearly of the specific embodiment of the invention or technical solution in the prior art Embodiment or attached drawing needed to be used in the description of the prior art be briefly described, it should be apparent that, it is described below Attached drawing is some embodiments of the present invention, for those of ordinary skill in the art, before not making the creative labor It puts, is also possible to obtain other drawings based on these drawings.

Fig. 1 is the structural schematic diagram of the dynamic wave scrubber nozzle of one embodiment of the present invention；

Fig. 2 is the structural schematic diagram of tail gas cooling tank in the dynamic wave scrubber of one embodiment of the present invention.

Icon: 1- feed zone；The side wall of 101- feed zone；2- discharging section；The side wall of 201- discharging section；3- inlet exhaust gas； 4- tank body；401- cooling pipeline；402- deflector；5- offgas outlet.

Specific embodiment

To make the object, technical solutions and advantages of the present invention clearer, technical solution of the present invention will be carried out below Clear, complete description.Obviously, the described embodiment is only a part of the embodiment of the present invention, instead of all the embodiments. Based on the embodiments of the present invention, those of ordinary skill in the art obtained institute without making creative work There are other embodiments, belongs to the range that the present invention is protected.The person that is not specified actual conditions in embodiment, according to normal conditions or The condition that manufacturer suggests carries out.

In the description of the present invention, it should be noted that the orientation of the instructions such as term " on ", "lower", "inner" or position are closed System is merely for convenience of description of the present invention and simplification of the description to be based on the orientation or positional relationship shown in the drawings, rather than indicates Or imply that signified device or element must have a particular orientation, be constructed and operated in a specific orientation, therefore cannot understand For limitation of the present invention.

In the description of the present invention, it is also necessary to which explanation is unless specifically defined or limited otherwise, term " connected " is answered It is interpreted broadly, for example, it may be being fixedly connected, may be a detachable connection, or be integrally connected；It can be mechanical connect It connects, is also possible to be electrically connected；It can be directly connected, can also can be in two elements indirectly connected through an intermediary The connection in portion.For the ordinary skill in the art, the tool of above-mentioned term in the present invention can be understood with concrete condition Body meaning.

It should be understood that

In the present invention, if without particularly illustrating, all embodiments mentioned in this article and preferred implementation method It can be combined with each other to form new technical solution.

In the present invention, if without particularly illustrating, all technical characteristics and preferred feature mentioned in this article can be with Intercombination forms new technical solution.

In the present invention, unless otherwise indicated, numberical range " a-b " indicates the breviary of any real combinings between a to b It indicates, wherein a and b is real number.Such as numberical range " 175-178 " expression all lists " 175-178 " herein Between whole real numbers, " 175-178 " be these combinations of values breviary indicate.

" range " disclosed in this invention can be respectively one or more lower limits and one in the form of lower and upper limit A or multiple upper limits.

In the present invention, unless otherwise indicated, it is each reaction or operating procedure can sequentially carry out, can also in sequence into Row.Preferably, reaction method herein is that sequence carries out.

Unless otherwise indicated, profession used herein and meaning phase known to scientific term and one skilled in the art Together.In addition, any method similar to or equal to what is recorded or material can also be applied in the present invention.

Dynamic wave scrubbing technology is one of wet scrubbing, is to be liquidated by fluid column and air-flow, makes cleaning solution and gas Momentum reach balance, to form the froth zone of high velocity turbulent flow on the only way which must be passed of gas, liquid surface area in froth zone It updates greatly and rapidly, enhances gas-liquid heat-transfer and mass transport process, to achieve the purpose that gas phase high-efficient purification.It has following prominent Advantage out: (1) contact area of two-phase is big, and purification efficiency is high；(2) equipment investment is few, cheap, easy for installation, and takes up an area Area is small, saves space, can save about 30% investment compared with conventional wash system；(3) configuration is flexibly, applied widely.

General dynamic wave scrubber is liquid phase and gas phase high speed contact, washs the impurity in gas phase, then output cleaning Gas.Present inventor uses for reference the technology of dynamic wave scrubber washing gas phase, and dynamic wave scrubbing technology is applied to washing Liquid-solid phase washes away the fluorine ion in tantalum hydroxide or niobium hydroxide, wherein tantalum hydroxide or niobium hydroxide are mixed with solid-liquid The form of slurry washed；Meanwhile the washing of liquid-solid phase is adapted to by the nozzle of improvement dynamic wave scrubber.

It should be noted that the multiphase system that above-mentioned " liquid-solid phase " refers to liquid phase and solid phase and deposit.

According to an aspect of the present invention, a kind of dynamic wave scrubber nozzle, institute are provided at least one embodiment Stating nozzle includes interconnected feed zone and discharging section, the folder between the side wall of the discharging section and the side wall of the feed zone Angle is 175-178 degree.

The nozzle of existing dynamic wave scrubber is in Y-shaped, and the feed zone of the nozzle is the lower half of Y-shaped, discharging section For the upper half of Y-shaped, liquid enters from the lower half of Y-shaped nozzle and sprays from the upper half, and the diameter of lower half is small, upper half The diameter in portion is big, and flow velocity reduces suddenly when liquid being caused to flow to the upper half of nozzle, so that washing effect is deteriorated.

Angle between the side wall of discharging section and the side wall of feed zone of dynamic wave scrubber nozzle of the invention is 175- 178 degree, so that discharging section has sloped inwardly 2-5 degree relative to feed zone, it ensure that discharging speed, the dynamic wave scrubber Nozzle is particularly suitable for washing liquid-solid phase, it is not easy to make liquid-solid phase siltation at nozzle, improve detersive efficiency and washing effect.

In the present invention, typical but non-limiting above-mentioned angle is 175 degree, 176 degree, 177 degree or 178 degree.The angle is By the preferred angle that continuous experimental examination obtains, it is not only able to guarantee discharging speed, moreover it is possible to be not easily deposited on liquid-solid phase At nozzle；Angle is excessive, then not can guarantee discharging speed, and washing effect is deteriorated, and detersive efficiency is lower；Angle is too small, then is easy Make liquid-solid phase siltation at nozzle, with the continuous siltation of liquid-solid phase, liquid-solid phase can not be sprayed by eventually leading to nozzle, not only be washed Effect is deteriorated, and also needs irregularly to stop work to nozzle dredging, can seriously affect detersive efficiency.

It is preferably carried out in mode in one kind, the ratio between the import internal diameter of the exit inside diameter of the discharging section and the discharging section For 0.7:1-0.9:1.Typical but non-limiting the ratio between above-mentioned exit inside diameter and import internal diameter are 0.7:1,0.8:1 or 0.9:1. If the ratio between exit inside diameter and import internal diameter are excessive, discharging speed can not be effectively ensured, influence washing effect and detersive efficiency；If The ratio between exit inside diameter and import internal diameter are too small, then are easy to make liquid-solid phase siltation at nozzle, with the continuous siltation of liquid-solid phase, most Cause nozzle that can not spray liquid-solid phase eventually, not only washing effect is deteriorated, and also needs irregularly to stop work to nozzle dredging, can seriously affect Detersive efficiency.

According to another aspect of the present invention, a kind of dynamic wave scrubber is provided at least one embodiment, including Contact tower and above-mentioned dynamic wave scrubber nozzle, the dynamic wave scrubber nozzle are set in the contact tower.

Above-mentioned dynamic wave scrubber includes above-mentioned dynamic wave scrubber nozzle, thus is used not only for washing gas phase, also It can be used in washing liquid-solid phase, and have the advantages that discharging speed is fast, detersive efficiency is high and washing effect is good.

It should be understood that

One or more dynamic wave scrubber nozzles can be set in above-mentioned dynamic wave scrubber.

Above-mentioned dynamic wave scrubber nozzle can be set in contact tower one end or be arranged in the two of contact tower opposite position End, above-mentioned " opposite position " refers to the position being oppositely arranged.When being arranged at contact tower one end, material is washed from above-mentioned spray It is sprayed at mouth, washing material sprays from the plain nozzle of the other end；When being arranged at contact tower both ends, it is washed material and washes Material is washed to spray from said nozzle, washed material sprays from the said nozzle of contact tower one end, and washing material from It is sprayed at the said nozzle of the corresponding other end of contact tower.It is mixed that washed material and washing material carry out contact in contact tower It closes.

It should be understood that the core of above-mentioned dynamic wave scrubber is to include above-mentioned dynamic wave scrubber nozzle, this is dynamic Reeb washer nozzle imparts that dynamic wave scrubber discharging speed is fast, liquid-solid phase is not easy to deposit, detersive efficiency is high and washing effect The good advantage of fruit, in addition, above-mentioned dynamic wave scrubber can also include other general components of this field, it should all be in the present invention Protection scope in.

It is preferably carried out in mode in one kind, is additionally provided with device for recovering tail gas on the contact tower.Device for recovering tail gas For recycling the tail gas generated in washing process, such as ammonia, avoiding tail gas from being directly discharged into atmosphere influences atmospheric environment, environmental protection It is profitable, while the tail gas recycled after having been treated can be with secondary use, high financial profit.

Preferably, above-mentioned device for recovering tail gas includes blower and tail gas cooling tank, the blower respectively with the contact tower Be connected with the tail gas cooling tank, the tail gas cooling tank includes inlet exhaust gas, tank body and offgas outlet, the inlet exhaust gas with The blower is connected, and includes cooling pipeline and deflector in the tank body, is provided with cooling agent in the cooling pipeline, described to lead Flowing plate surround and is set to the cooling pipeline outer wall.

Blower absorbs the tail gas in contact tower, is then entered by inlet exhaust gas in the tank body of tail gas cooling tank, tail gas exists It under the guide functions of deflector, is flowed around cooling pipeline to the direction of offgas outlet, while around cooling pipeline flowing The temperature of tail gas is minimized, and is finally discharged by offgas outlet to carry out next step recycling or processing secondary use.

Preferably, above-mentioned deflector includes helical blade.Above-mentioned helical blade is preferably movably set in cooling pipeline outer wall, To repair or replace respectively when helical blade or cooling pipeline to be damaged.

Above-mentioned cooling agent includes but is not limited to cold water, existing other liquid cooling agents that can be used in cooling or solid-state drop Warm agent.Cold water refers to that temperature is lower than 20 DEG C of water.

It should be noted that above-mentioned cooling agent is in cooling pipeline when cooling agent is cold water or other liquid cooling agents It circulates, the continual cooling agent new for injection in cooling pipeline is realized to maintain the low-temperature condition of cooling pipeline To the effective temperature-reducing of tail gas.In order to be conducive to the flowing of cooling agent, setting and above-mentioned cooling pipeline preferably outside tail gas cooling tank Connected conveying device, the conveying device preferably pump.

When cooling agent is solid-state cooling agent, periodic replacement cooling agent is also needed, to maintain the low-temperature condition of cooling pipeline, Realize the effective temperature-reducing to tail gas.

According to another aspect of the present invention, provide at least one embodiment in a kind of tantalum niobium hydroxide fluorine from The cleaning method of son, cleans fluorine ion in tantalum niobium hydroxide using dynamic wave scrubbing method.The cleaning of the above method is imitated Rate is high, and the removal rate of fluorine is high, can be reduced wash number, reduces water consumption, and the waste water that the later period generates is few.

It should be understood that

Above-mentioned " tantalum niobium hydroxide " refers to tantalum hydroxide and/or niobium hydroxide.After over cleaning, in tantalum niobium hydroxide Fluorine ion washed away.

Above-mentioned " dynamic wave scrubbing method " refers to wash water and the tantalum niobium hydroxide slurry (solid phase in tantalum niobium hydroxide slurry Including tantalum hydroxide and/or niobium hydroxide, liquid phase includes water) method that liquidates at a high speed, when wash water and tantalum niobium hydroxide slurry In the momentum of liquid-solid two-phase when reaching balance, form the froth zone of a high turbulence, in froth zone, liquid-solid two-phase is in height Fast turbulent flow contact, contact surface area is big, and these contact surfaces are constantly updated rapidly, achieve the effect that efficient mass transfer, To make the fluorine ion in tantalum hydroxide and/or niobium hydroxide be washed in liquid phase.

It should be noted that above-mentioned " tantalum niobium hydroxide slurry " refers to the tantalum niobium hydrogen-oxygen including tantalum niobium hydroxide precipitating Compound mother liquor of precipitation of ammonium obtains tantalum niobium hydroxide after being separated by solid-liquid separation, and tantalum niobium hydroxide obtains tantalum niobium hydrogen-oxygen after mixing with water Compound slurry.

It is preferably carried out in mode in one kind, fluorine ion in tantalum niobium hydroxide is carried out using above-mentioned dynamic wave scrubber Cleaning.

Fluorine ion in tantalum niobium hydroxide is cleaned using above-mentioned dynamic wave scrubber in this preferred embodiment, tantalum Niobium hydroxide is not easy siltation at nozzle, and the jet velocity of tantalum niobium hydroxide slurry is fast, can effectively clean tantalum niobium hydrogen Fluorine in oxide, cleaning effect is good, and the removal rate of fluorine is high, moreover it is possible to reduce wash number, reduces the usage amount of wash water, The waste water that later period generates is few.

It is preferably carried out in mode in one kind, comprising the following steps: tantalum niobium hydroxide slurry is transported to dynamic wave and washes It is mixed after washing the nozzle of device with wash water.Above-mentioned " wash water " includes but is not limited to water and/or weak aqua ammonia.Tantalum niobium hydroxide material After slurry is mixed with wash water high speed contact, due to solid phase and liquid phase can rapidly mutual mass transfer, wash water can be by tantalum niobium hydrogen-oxygens Fluorine ion in compound washes out.

It is preferably carried out in mode in one kind, the wash water includes weak aqua ammonia.It should be noted that above-mentioned " weak aqua ammonia " is Finger concentration is 0.05%-0.5%, the ammonium hydroxide that pH is 10.The combination of ammonium ion and fluorine ion in weak aqua ammonia is more preferable, the removal of fluorine Effect is more preferable, can further save water resource, and can alleviate the big problem of wastewater treatment capacity.

It is preferably carried out in mode in one kind, the volume ratio of weak aqua ammonia and tantalum niobium hydroxide is 3:1-8:1.Above-mentioned volume Than typical but non-limiting for 3:1,4:1,5:1,6:1,7:1 or 8:1.The volume ratio of weak aqua ammonia and tantalum niobium hydroxide is upper When stating in range, the fluorine ion in tantalum niobium hydroxide can be effectively removed, and not will cause the waste of weak aqua ammonia；Above-mentioned body Product is than too small, then the removal effect of fluorine ion is bad；Above-mentioned volume ratio is excessive, and a large amount of weak aqua ammonias are unable to get effective use, money Source waste is larger.

It is preferably carried out in mode in one kind, the temperature of weak aqua ammonia is 40-50 DEG C.The temperature of above-mentioned weak aqua ammonia is typical but non- Restrictive is 40 DEG C, 41 DEG C, 42 DEG C, 43 DEG C, 44 DEG C, 45 DEG C, 46 DEG C, 47 DEG C, 48 DEG C, 49 DEG C or 50 DEG C.Above-mentioned temperature Weak aqua ammonia is good to the cleaning effect of the fluorine ion in tantalum niobium hydroxide, through material phase analysis, can remove 95% or more fluorine from Son；Extra ammonia is recycled by the device for recovering tail gas of dynamic wave scrubber.The temperature of weak aqua ammonia is too low, to fluorine The poor removal effect of ion, temperature is excessively high, then can waste of energy.

Preferably, the calcined waste heat of tantalum niobium hydroxide is used to be heated to obtain temperature to weak aqua ammonia as 40-50 DEG C Weak aqua ammonia.The energy can be made to be utilized effectively using the calcined waste-heat weak aqua ammonia of tantalum niobium hydroxide, reduce life Produce cost.

It is preferably carried out in mode in one kind, further includes the steps that being separated by solid-liquid separation after mixing.Separation of solid and liquid can be by tantalum niobium The liquid material of hydroxide solid material and fluoride ion separates, and obtains tantalum niobium hydroxide, fluoride ion product (example Such as ammonium fluoride) and other products (such as ammonium sulfate).

Preferably, it is separated by solid-liquid separation using filter press.Filter press has good effect of separating solid from liquid, performance stabilization, operation The advantages of convenient and safety labor-saving.

Below with reference to embodiment, the present invention will be further described in detail.