阅读说明：本技术 一种富氮锰硅钛基材料的制备方法 (A kind of preparation method of richness nitrogen manganese silicon titanium base material ) 是由 梁新腾 曾建华 戈文荪 陈均 陈炼 于 2019-08-30 设计创作，主要内容包括：本发明涉及材料技术领域,尤其是一种富氮锰硅钛基材料的制备方法,所述富氮锰硅钛基材料的制备方法,化学成分以质量百分数计为：Mn含量40-60％,Ti含量10-20％,Si含量4-8％,N含量15-25％,其余为Fe和C,其包括如下步骤：a、将锰硅钛基础材料破碎后,再研磨成一定粒度的细粉；b、将步骤a中得到的细粉压制成球状；c、将球状锰硅钛基础材料送入加热氮化炉的装料坩埚中；d、球状锰硅钛基础材料在加热氮化炉中进行氮化。该富氮锰硅钛基材料制备方法氮化效率高,锰硅钛基基础材料N的收得率高,N能够提高材料的抗拉强度和屈服强度,显著增加了锰硅钛基基础材料的强度,N是一种廉价的合金化元素,制备成本低。(The present invention relates to field of material technology, especially a kind of preparation method of rich nitrogen manganese silicon titanium base material, the preparation method of the richness nitrogen manganese silicon titanium base material, chemical component is calculated in mass percent are as follows: Mn content 40-60%, Ti content 10-20%, Si content 4-8%, N content 15-25%, remaining is Fe and C comprising following steps: a, by after manganese silicon titanium-based plinth material fragmentation, then is ground into the fine powder of certain particle size；B, fine powder obtained in step a is suppressed into glomeration；C, spherical manganese silicon titanium basic material is sent into the charging crucible of heating nitriding furnace；D, spherical manganese silicon titanium basic material is nitrogenized in heating nitriding furnace.The richness nitrogen manganese silicon titanium base material preparation method efficiency of nitridation is high, the recovery rate of manganese silicon titanium-based basic material N is high, and N can be improved the tensile strength and yield strength of material, significantly increase the intensity of manganese silicon titanium-based basic material, N is a kind of cheap alloy element, and preparation cost is low.)

1. a kind of preparation method of richness nitrogen manganese silicon titanium base material, it is characterised in that: the chemistry of the richness nitrogen manganese silicon titanium base material at Divide and is calculated in mass percent are as follows: Mn content 40-60%, Ti content 10-20%, Si content 4-8%, N content 15-25%, remaining For Fe and C, include the following steps:

A, by after manganese silicon titanium-based plinth material fragmentation, then it is ground into the fine powder of certain particle size；

B, fine powder obtained in step a is suppressed into glomeration；

C, spherical manganese silicon titanium basic material is sent into the charging crucible of heating nitriding furnace, the heating nitriding furnace includes furnace body (1), the first track (2), walking dolly (3), charging crucible, adding thermal resistance (4), temperature measuring equipment, furnace body (1) include being connected to one Rise bringing-up section, soaking zone, temperature descending section, the inlet end of bringing-up section be provided with first can plug-type sealed door, temperature descending section go out Mouthful end be provided with second can plug-type sealed door, the surrounding of bringing-up section inlet end is provided with multiple nitrogen inlets (5), cools down The surrounding of section outlet end is provided with multiple nitrogen outlet pipes, the first track (2), walking dolly (3), charging crucible, adding thermal resistance (4), temperature measuring equipment is arranged in furnace body (1)；

Walking dolly (3) matching is arranged on the first track (2), and walking dolly (3) can be mobile along the first track (2), dress Expect crucible be arranged in walking dolly (3), adding thermal resistance (4) be evenly distributed on the bringing-up section of furnace body (1), soaking zone side and Top；

D, spherical manganese silicon titanium basic material is nitrogenized in heating nitriding furnace, specifically: being first turned on first can be plug-type close Close door, close second can plug-type sealed door, walking dolly (3) is mobile along the first track (2), make walking dolly (3) all Into in the bringing-up section of furnace body (1), turn off first can plug-type sealed door, then by nitrogen inlet (5) be passed through with pressure The nitrogen of power makes full of nitrogen in furnace body (1), and adding thermal resistance (4) work of bringing-up section carries out spherical manganese silicon titanium basic material Heating makes spherical manganese silicon titanium basic material be heated to 950-960 DEG C, after the completion of spherical manganese silicon titanium basic material heating, will walk Trolley (3) is moved in the soaking zone of furnace body (1) along the first track (2), is kept the temperature 300-310min in soaking zone, is subsequently heated Resistance (4) stops working, and walking dolly (3) is moved to the temperature descending section of furnace body (1) along the first track (2), until being cooled to room Temperature, finally open second can plug-type sealed door, walking dolly (3) is moved to outside furnace body (1), to complete spherical manganese silicon The nitridation of titanium basic material.

2. a kind of preparation method of rich nitrogen manganese silicon titanium base material as described in claim 1, it is characterised in that: in step a, manganese The chemical component of silicon titanium basic material is calculated in mass percent are as follows: Mn content 55-65%, Ti content 15-25%, Si content 5- 10%, remaining is Fe and C.

3. a kind of preparation method of rich nitrogen manganese silicon titanium base material as described in claim 1, it is characterised in that: in step a, carefully The grade of powder≤200 mesh, and the 80% of sum is no less than less than 250 mesh grades.

4. a kind of preparation method of rich nitrogen manganese silicon titanium base material as described in claim 1, it is characterised in that: in stepb, carefully Bonding agent and moisture, which is added, in powder compacting glomeration manganese silicon titanium-based plinth materials process makes spherical manganese silicon using sunning after balling-up Moisture≤0.5% in titanium basic material.

5. a kind of preparation method of rich nitrogen manganese silicon titanium base material as claimed in claim 4, it is characterised in that: bonding agent is swelling Soil.

6. a kind of preparation method of rich nitrogen manganese silicon titanium base material as described in claim 1, it is characterised in that: in stepb, pressure The diameter of section of spherical manganese silicon titanium basic material is made between 10-15mm.

7. a kind of preparation method of rich nitrogen manganese silicon titanium base material as described in claim 1, it is characterised in that: the length of furnace body (1) Degree is between 40-60m.

8. a kind of preparation method of rich nitrogen manganese silicon titanium base material as claimed in any one of claims 1 to 7, it is characterised in that: Heating nitriding furnace further includes controller, and adding thermal resistance (4), temperature measuring equipment are connected with controller.

9. a kind of preparation method of rich nitrogen manganese silicon titanium base material as claimed in claim 8, it is characterised in that: walking dolly (3) On be provided with walking power device, walking power device can make walking dolly (3) mobile along the first track (2), and it is dynamic to walk Power device is connected with controller.

10. a kind of preparation method of rich nitrogen manganese silicon titanium base material as described in claim 1, it is characterised in that: further include second Track, the second track are located at the outside of furnace body (1), and the second track is connected with the first track (2), and the second track and the first rail Road (2) surrounds circle.

Technical field

The present invention relates to field of material technology, especially a kind of preparation method of rich nitrogen manganese silicon titanium base material.

Background technique

Manganese silicon titanium base material is made of Mn, Ti, Si, Fe, C etc. as a kind of alloy, is increasingly being used in industry In, still, some place it is higher to the intensity requirement of material, current manganese silicon titanium base material be not able to satisfy its intensity requirement without It can be used, to influence the use of manganese silicon titanium base material.

Summary of the invention

Technical problem to be solved by the invention is to provide a kind of preparation methods of the high rich nitrogen manganese silicon titanium base material of intensity.

The technical solution adopted by the present invention to solve the technical problems is: a kind of preparation side of richness nitrogen manganese silicon titanium base material The chemical component of method, the richness nitrogen manganese silicon titanium base material is calculated in mass percent are as follows: Mn content 40-60%, Ti content 10- 20%, Si content 4-8%, N content 15-25%, remaining is Fe and C, is included the following steps:

A, by after manganese silicon titanium-based plinth material fragmentation, then it is ground into the fine powder of certain particle size；

B, fine powder obtained in step a is suppressed into glomeration；

C, spherical manganese silicon titanium basic material is sent into the charging crucible of heating nitriding furnace, the heating nitriding furnace includes furnace Body, the first track, walking dolly, charging crucible, adding thermal resistance, temperature measuring equipment, furnace body include the bringing-up section to link together, protect Temperature section, temperature descending section, the inlet end of bringing-up section be provided with first can plug-type sealed door, the outlet end of temperature descending section is provided with Two can plug-type sealed door, the surrounding of bringing-up section inlet end is provided with multiple nitrogen inlets, the surrounding of temperature descending section outlet end Multiple nitrogen outlet pipes are provided with, the first track, walking dolly, charging crucible, adding thermal resistance, temperature measuring equipment are arranged at furnace body In；

Walking dolly matching is arranged on the first track, and walking dolly can be moved along the first track, and charging crucible is set It sets in walking dolly, adding thermal resistance is evenly distributed on the side and top of the bringing-up section of furnace body, soaking zone；

D, spherical manganese silicon titanium basic material is nitrogenized in heating nitriding furnace, specifically: being first turned on first can push and pull Formula sealed door, close second can plug-type sealed door, walking dolly is moved along the first track, walking dolly is made to fully enter furnace In the bringing-up section of body, turn off first can plug-type sealed door, the nitrogen with pressure is then passed through by nitrogen inlet, makes furnace Nitrogen is full of in body, spherical manganese silicon titanium basic material is heated in the adding thermal resistance work of bringing-up section, makes spherical manganese silicon titanium-based Plinth material is heated to 950-960 DEG C, and after the completion of spherical manganese silicon titanium basic material heating, walking dolly is moved to along the first track In the soaking zone of furnace body, 300-310min is kept the temperature in soaking zone, subsequently adding thermal resistance stops working, by walking dolly along first Track is moved to the temperature descending section of furnace body, until be cooled to room temperature, finally open second can plug-type sealed door, walking dolly is moved It moves to furnace body, to complete the nitridation of spherical manganese silicon titanium basic material.

Further, the chemical component of manganese silicon titanium basic material is calculated in mass percent are as follows: Mn content in step a 55-65%, Ti content 15-25%, Si content 5-10%, remaining is Fe and C.

Further, in step a, grade≤200 mesh of fine powder, and sum is no less than less than 250 mesh grades 80%.

Further, in stepb, fine powder, which is suppressed, is added bonding agent and water in glomeration manganese silicon titanium-based plinth materials process Point, using sunning after balling-up, make moisture≤0.5% in spherical manganese silicon titanium basic material.

Further, bonding agent is bentonite.

Further, in stepb, suppressing the diameter of section of glomeration manganese silicon titanium basic material between 10-15mm.

Further, the length of furnace body is between 40-60m.

Further, heating nitriding furnace further includes controller, adding thermal resistance, temperature measuring equipment are connected with controller.

Further, being provided with walking power device on walking dolly, walking power device can make walking dolly edge First track is mobile, and power device of walking is connected with controller.

Further, further including the second track, the second track is located at the outside of furnace body, the second track and the first track phase Connection, and the second track and the first track surround circle.

The beneficial effects of the present invention are: richness nitrogen manganese silicon titanium base material preparation method provided by the invention, first by manganese silicon titanium After basic material is broken, then it is ground into the fine powder of certain particle size, fine powder is then suppressed into glomeration again, finally by spherical manganese silicon titanium Basic material is fed in heating nitriding furnace and is nitrogenized, and spherical manganese silicon titanium basic material is first heated to 950-960 by when nitridation DEG C, 300-310min is then kept the temperature, is finally cooled to room temperature, nitridation process whole process is under nitrogen atmosphere, to obtain this hair Bright richness nitrogen manganese silicon titanium base material；The richness nitrogen manganese silicon titanium base material preparation method efficiency of nitridation is high, the receipts of manganese silicon titanium-based basic material N Yield is high, and obtained rich nitrogen manganese silicon titanium base material performance is stablized；It include the N of 15-25% in rich nitrogen manganese silicon titanium base material, N can The tensile strength and yield strength for improving material, significantly increase the intensity of manganese silicon titanium-based basic material, and N is a kind of cheap conjunction Alloying element, preparation cost is low, has preferable technical-economic index and overall economic efficiency.

Detailed description of the invention

Fig. 1 is the structural schematic diagram of present invention heating nitriding furnace；

Fig. 2 is enlarged drawing at A in Fig. 1；

Marked in the figure: furnace body 1, the first track 2, walking dolly 3, adding thermal resistance 4, nitrogen inlet 5.

Specific embodiment

The present invention will be further explained below with reference to the attached drawings.

As shown in Figure 1 and Figure 2, a kind of preparation method of rich nitrogen manganese silicon titanium base material, the change of the richness nitrogen manganese silicon titanium base material It studies and point is calculated in mass percent are as follows: Mn content 40-60%, Ti content 10-20%, Si content 4-8%, N content 15-25%, Remaining is Fe and C, and for C content less than 3%, fusing point is 1200-1265 DEG C, is included the following steps:

A, by after manganese silicon titanium-based plinth material fragmentation, then it is ground into the fine powder of certain particle size；

B, fine powder obtained in step a is suppressed into glomeration；

C, spherical manganese silicon titanium basic material is sent into the charging crucible of heating nitriding furnace, the heating nitriding furnace includes furnace Body 1, the first track 2, multiple walking dollies 3, multiple charging crucibles, adding thermal resistance 4, temperature measuring equipment, furnace body 1 include being connected to one Rise bringing-up section, soaking zone, temperature descending section, the inlet end of bringing-up section be provided with first can plug-type sealed door, temperature descending section go out Mouthful end be provided with second can plug-type sealed door, the surrounding of bringing-up section inlet end is provided with multiple nitrogen inlets 5, temperature descending section The surrounding of outlet end is provided with multiple nitrogen outlet pipes, the first track 2, walking dolly 3, charging crucible, adding thermal resistance 4, thermometric Device is arranged in furnace body 1；The matching of walking dolly 3 is arranged on the first track 2, and walking dolly 3 can be along the first track 2 Mobile, charging crucible is arranged in walking dolly 3, and adding thermal resistance 4 is evenly distributed on the side of the bringing-up section of furnace body 1, soaking zone The top and；

D, spherical manganese silicon titanium basic material is nitrogenized in heating nitriding furnace, specifically: being first turned on first can push and pull Formula sealed door, close second can plug-type sealed door, walking dolly 3 is moved along the first track 2, make walking dolly 3 all into In the bringing-up section for entering furnace body 1, turn off first can plug-type sealed door, make the space in furnace body 1 at a relative closure, then It is passed through the nitrogen with pressure by nitrogen inlet 5, makes nitridation process whole process can be made to be in nitrogen full of nitrogen in furnace body 1 Under atmosphere, spherical manganese silicon titanium basic material is heated in the work of adding thermal resistance 4 of bringing-up section, makes spherical manganese silicon titanium basic material It is heated to 950-960 DEG C, after the completion of spherical manganese silicon titanium basic material heating, walking dolly 3 is moved to furnace body along the first track 2 In 1 soaking zone, 300-310min is kept the temperature in soaking zone, subsequently adding thermal resistance 4 stops working, by walking dolly 3 along first Track 2 is moved to the temperature descending section of furnace body 1, until be cooled to room temperature, finally open second can plug-type sealed door, by walking dolly 3 are moved to the outside of furnace body 1, remaining nitrogen can nitrogen outlet pipe go out, to complete the nitridation of spherical manganese silicon titanium basic material, Obtain rich nitrogen manganese silicon titanium base material.

In step a, the chemical component of manganese silicon titanium basic material is calculated in mass percent are as follows: Mn content 55-65%, Ti contain 15-25%, Si content 5-10% are measured, remaining is Fe and C.After manganese silicon titanium-based plinth material fragmentation, then it is ground into certain particle size Fine powder, the grade of fine powder preferably≤200 mesh, and be no less than the 80% of sum less than 250 mesh grades.

Spherical manganese silicon titanium basic material can be nitrogenized convenient for being sent in heating nitriding furnace, facilitated nitrogen and added It is flowed in tropical resources furnace, is conducive to the nitridation of manganese silicon titanium basic material, entered in manganese silicon titanium basic material convenient for N, spherical manganese silicon The diameter of section of titanium basic material is preferably between 10-15mm.By being obtained in a large number of experiments and practice, first by manganese silicon titanium-based plinth After material fragmentation, then it is ground into the fine powder of certain particle size, fine powder is then suppressed into glomeration again, manganese silicon titanium-based can be improved in this way Plinth material nitriding result and efficiency of nitridation.Glomeration manganese silicon titanium basic material, in stepb, fine powder are suppressed for the ease of fine powder Bonding agent and moisture, which is added, in compacting glomeration manganese silicon titanium-based plinth materials process makes spherical manganese silicon titanium using sunning after balling-up Moisture≤0.5% in basic material, bonding agent can use bentonite, and when compacting, the amount that bonding agent is added is total weight 2-5%, the amount of the moisture of addition are that the 2-4%. pressing pressure of total weight is not more than 30KN.

Spherical manganese silicon titanium basic material is nitrogenized in heating nitriding furnace, and the present invention heats nitridation furnace structure simply, even Continuous nitridation production capacity is strong, efficiency of nitridation is high, and the recovery rate energy stability contorting of nitrogen is between 60-80%.Heating nitridation stove heating For heating to the spherical manganese silicon titanium basic material in charging crucible, soaking zone is used for the spherical manganese in charging crucible section Silicon titanium basic material is kept the temperature, and temperature descending section is used to cool down to the spherical manganese silicon titanium basic material in charging crucible, is nitrogenized When, spherical manganese silicon titanium basic material passes sequentially through bringing-up section, soaking zone, temperature descending section, by being obtained in largely practicing and testing, furnace The length of body 1 is preferably between 40-60m, the equal length of bringing-up section, soaking zone, temperature descending section.

In order to realize the automatic operation of nitridation, bringing-up section, the temperature of soaking zone, temperature descending section are accurately controlled, guarantees nitridation Effect, heating nitriding furnace further include controller, adding thermal resistance 4, temperature measuring equipment are connected by signal data line with controller, Bringing-up section, soaking zone, temperature descending section are provided with temperature measuring equipment, and temperature measuring equipment is preferably built-in thermocouple.For the ease of walking Trolley 3 moves on the first track 2, and walking power device is provided on walking dolly 3, and walking power device can make to walk small Vehicle 3 is moved along the first track 2, and power device of walking is connected by signal data item with controller, power device of walking Opening and closing is automatically controlled by controller.In order to reduce cost, it can also be connected with zipper in the front end of first walking dolly 3, drawn Chain pass through second can the setting of plug-type sealed door, passing through zipper, to pull walking dolly 3 mobile；Alternatively, small in the last one walking The rear end of vehicle 3 is connected with push rod, push rod pass through first can plug-type sealed door setting, the promotion walking dolly 3 for passing through push rod moves It is dynamic.

In order to realize consecutive production, is passed in and out in furnace body 1 convenient for walking dolly 3, further include the second track, the second track position In the outside of furnace body 1, the second track is connected with the first track 2, and the second track and the first track 2 surround circle.

In conclusion the rich nitrogen manganese silicon titanium base material preparation method that invention provides, first by manganese silicon titanium-based plinth material fragmentation Afterwards, then it is ground into the fine powder of certain particle size, fine powder is then suppressed into glomeration again, finally just send spherical manganese silicon titanium basic material Enter to heat in nitriding furnace and be nitrogenized, spherical manganese silicon titanium basic material is first heated to 950-960 DEG C by when nitridation, is then kept the temperature 300-310min is finally cooled to room temperature, and nitridation process whole process is under nitrogen atmosphere, to obtain rich nitrogen manganese silicon titanium of the invention Sill；The richness nitrogen manganese silicon titanium base material preparation method efficiency of nitridation is high, and the recovery rate of manganese silicon titanium-based basic material N is high, obtains Rich nitrogen manganese silicon titanium base material performance stablize；It include the N of 15-25% in rich nitrogen manganese silicon titanium base material, N can be improved the anti-of material Tensile strength and yield strength significantly increase the intensity of manganese silicon titanium-based basic material, by rich nitrogen manganese silicon titanium-based material of the invention Material is researched and analysed, and relative to manganese silicon titanium-based basic material, every 1% can increase in the rich nitrogen manganese silicon titanium base material after nitridation The tensile strength and yield strength of its 115MPa or so, enhanced strength effect is fine, and N is a kind of cheap alloy element, system It is standby at low cost, there is preferable technical-economic index and overall economic efficiency.