阅读说明：本技术 一种新型掩膜版 (Novel mask ) 是由 兰沈凯 吴杰明 李岩 范俊 郭启好 于 2019-09-23 设计创作，主要内容包括：本发明公开了一种新型掩膜版,包括掩膜版本体,所述掩膜版本体的下表面设有遮光层形成遮光区,所述掩膜版本体的下表面还形成有透光区,所述掩膜版的的下方还设有曝光基板,所述曝光基板对应掩膜版的透光区形成曝光区,所述掩膜版本体的下表面、对应透光区还向内开设有凹槽,所述凹槽的内表面包括与掩膜版本体的下表面平行的第一表面以及与第一表面两端连接的两个内凹曲面,所述内凹曲面使边缘的偏折光束发生全反射,可以使得曝光基板的曝光区不会增大,提高曝光机的加工精度,可以生产更高分辨率、高开口率的产品。(The invention discloses a novel mask, which comprises a mask body, wherein a light shielding layer is arranged on the lower surface of the mask body to form a shading area, a light transmitting area is also formed on the lower surface of the mask body, an exposure substrate is also arranged below the mask, the exposure substrate forms an exposure area corresponding to the light transmitting area of the mask, grooves are further inwards formed in the lower surface of the mask body and the corresponding light transmitting area, the inner surfaces of the grooves comprise a first surface parallel to the lower surface of the mask body and two concave curved surfaces connected with the two ends of the first surface, and the concave curved surfaces enable deflected light beams at the edges to be totally reflected, so that the exposure area of the exposure substrate cannot be increased, the processing precision of an exposure machine is improved, and products with higher resolution and high aperture opening ratio can be produced.)

1. The utility model provides a novel mask version, includes the mask version body, the lower surface of mask version body is equipped with the light shield layer and forms the shading district, the lower surface of mask version body still is formed with the printing opacity district, the below of mask version still is equipped with the exposure base plate, the printing opacity district that the exposure base plate corresponds the mask version forms the exposure district, a serial communication port, the lower surface of mask version body, correspond the printing opacity district still inwards set up flutedly, the internal surface of recess includes the first surface parallel with the lower surface of mask version body and two indent curved surfaces of being connected with first surface both ends, indent curved surface makes the partial refraction light beam at edge take place the total reflection.

2. The novel mask according to claim 1, wherein the light-shielding material of the light-shielding layer is a black photoresist or a reflective metal.

3. The novel mask as claimed in claim 1, wherein the mask body is made of quartz glass.

4. The mask according to claim 1, wherein the exposure substrate is made of quartz glass.

5. The novel mask according to claim 3, wherein the angle of incidence of the deflected beam is greater than 42 °, and the concave surface has an inclination of less than 48 ° at the position of incidence of the deflected beam.

6. The novel mask according to claim 1, wherein the concave curved surface is a smooth curved surface, and the width of the concave curved surface is 0.5 μm.

Technical Field

The invention relates to the technical field of exposure in display products, in particular to a novel mask.

Background

In the production process of displays or semiconductor products, a mask plate is usually used for performing an exposure process, and a conventional mask plate is formed by plating a layer of chrome film or other light-shielding materials on a uniform quartz substrate, so as to form a light-shielding region and a light-transmitting region for light leakage.

Under ideal conditions, the mask plate and the glass substrate are horizontally arranged, absolutely parallel vertical light beams penetrate through a light transmission area on the mask plate, and an exposure area corresponding to the width of the parallel vertical light beams can be obtained on the glass substrate, but in the actual exposure process, as shown in fig. 1, because a plurality of deflection light beams are included in the light beams, only approximately parallel vertical light beams can be obtained, and then the deflection light beams can deflect to a corresponding shading area on the glass substrate after being refracted by the horizontal lower surface of the mask plate, so that the actually obtained exposure width value W1 is greater than the width value W2 of the light transmission area on the mask plate.

Disclosure of Invention

In order to overcome the defects of the prior art, the invention provides a novel mask, wherein a groove is formed inwards on the lower surface of a mask body, the inner surface of the groove comprises a first surface parallel to the lower surface of the mask body and two concave curved surfaces connected with two ends of the first surface, so that deflected light beams at the edge of a light transmitting area can be subjected to total reflection through the concave curved surfaces, the exposure area of an exposure substrate cannot be increased, the processing precision of an exposure machine is improved, and products with higher resolution and high aperture opening ratio can be produced.

The technical effect to be achieved by the invention is realized by the following scheme: the utility model provides a novel mask version, includes the mask version body, the lower surface of mask version body is equipped with the light shield layer and forms the shading district, the lower surface of mask version body still is formed with the printing opacity district, the below of mask version still is equipped with the exposure base plate, the printing opacity district that the exposure base plate corresponds the mask version forms the exposure district, the lower surface of mask version body, correspond the printing opacity district still inwards set up flutedly, the internal surface of recess includes the first surface parallel with the lower surface of mask version body and two indent curved surfaces of being connected with first surface both ends, indent curved surface makes the partial refraction light beam at edge take place the total reflection.

Preferably, the light-shielding material of the light-shielding layer is a black photoresist or a reflective metal.

Preferably, the mask body is made of quartz glass.

Preferably, the material of the exposure substrate is quartz glass.

Preferably, the incident angle of the deflected light beam is greater than 42 °, and the inclination of the concave curved surface at the position where the deflected light beam is incident is less than 48 °.

Preferably, the concave curved surface is a smooth curved surface, and the width of the concave curved surface is 0.5 μm.

The invention has the following advantages:

Through inwards seting up the recess at the lower surface of mask version body, the internal surface of recess includes the first surface parallel with the lower surface of mask version body and two indent curved surfaces of being connected with first surface both ends, can make the inflection light beam at printing opacity district edge can take place the total reflection through indent curved surface for the exposure area of exposure base plate can not increase, improves the machining precision of exposure machine, can produce the product of higher resolution ratio, high aperture ratio.

Drawings

FIG. 1 is a schematic diagram of a mask exposure structure in the prior art;

FIG. 2 is a schematic view of the exposure structure of a novel mask according to the present invention.

Detailed Description

the invention is described in detail below with reference to the drawings, wherein examples of the embodiments are shown in the drawings, wherein like or similar reference numerals refer to like or similar elements or elements having like or similar functions throughout. The embodiments described below with reference to the drawings are illustrative and intended to be illustrative of the invention and are not to be construed as limiting the invention.

In the description of the present invention, it is to be understood that the terms "length", "width", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", and the like, indicate orientations or positional relationships based on those shown in the drawings, and are used only for convenience in describing the present invention and for simplicity in description, and do not indicate or imply that the devices or elements referred to must have a particular orientation, be constructed in a particular orientation, and be operated, and thus, are not to be construed as limiting the present invention.

Furthermore, the terms "first", "second", "third" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defined as "first," "second," or "third" may explicitly or implicitly include one or more of that feature. In the description of the present invention, "a plurality" means two or more unless specifically defined otherwise.

In the present invention, unless otherwise expressly stated or limited, the terms "mounted," "connected," "secured," "disposed," and the like are to be construed broadly and can, for example, be fixedly connected, detachably connected, or integrally formed; can be mechanically or electrically connected; they may be directly connected or indirectly connected through intervening media, or may be connected through the interconnection of two elements or through the interaction of two elements. The specific meanings of the above terms in the present invention can be understood by those skilled in the art according to specific situations.

As shown in fig. 2, an embodiment of the present invention provides a novel mask, which includes a mask body 100, and taking an upper side of the mask body 100 as a light incident direction and a lower side of the mask body 100 as a light emergent direction, for example, a light shielding layer 200 is disposed on a lower surface of the mask body 100 to form a light shielding region for blocking light beams from passing through, and a light transmitting region 300 is further formed on the lower surface of the mask body 100 to allow light beams to pass through. An exposure substrate 400 is further disposed below the mask, the exposure substrate 400 forms an exposure region 410 corresponding to the light-transmitting region 300 of the mask, and the pattern formed in the light-transmitting region 300 is a pattern to be exposed.

The lower surface of the mask plate body 100 and the corresponding light-transmitting area 300 are further provided with a groove 110 inwards, the inner surface of the groove 110 comprises a first surface 111 parallel to the lower surface of the mask plate body 100 and two concave curved surfaces 112 connected with two ends of the first surface 111, and the concave curved surfaces 112 enable the deflected light beam L2 at the edge to be totally reflected, so that the deflected light beam L2 at the edge of the light-transmitting area 300 can be totally reflected by the concave curved surfaces 112 and cannot fall on the exposure substrate 400, the exposure area 410 of the exposure substrate 400 cannot be enlarged, the processing precision of the exposure machine is improved, and products with higher resolution and high aperture ratio can be produced.

The total reflection is a phenomenon that when a light beam is emitted from an optically dense medium to an interface of an optically sparse medium, the light beam is totally refracted back to the original medium. In the present invention, since the material of the mask body 100 is an optically dense medium for air, a total reflection phenomenon can be formed as long as the concave curved surface 112 of the groove 110 is designed to satisfy that the incident angle of the deflected light velocity L2 of the edge is greater than the critical angle.

Since the first surface 111 of the recess 110 is a horizontal surface parallel to the lower surface of the reticle body 100, the deflected light beam L2 and the vertical light beam L1 incident on the first surface 111 can be directly irradiated on the exposure substrate 400, so that the overall illumination of the exposure area 410 can be unaffected.

In the present invention, for example, the mask and the exposure substrate 400 are horizontally disposed, the exposure light beam vertically enters the mask body 100 from above the mask, and enters the exposure substrate 400 in the light-transmitting region 300 of the mask body 100 to form the exposure region 410, when the edge light beam of the mask light-transmitting region 300 has the deflected light beam L2, the deflected light beam L2 is totally reflected toward the concave curved surface 112 of the mask body 100, so that the deflected light beam L2 at the edge does not fall on the exposure substrate 400, and the exposure region 410 of the exposure substrate 400 is not enlarged.

In the present invention, the light-shielding material of the light-shielding layer 200 may be a black photoresist or a reflective metal, and the light-transmitting region 300 may be an opening without the light-shielding layer 200 or a transparent layer, which is not specifically limited and described in detail herein.

The mask body 100 is made of quartz glass, and the exposure substrate 400 is also made of quartz glass. When the mask body 100 is made of quartz glass, according to the refractive index of quartz being 1.5 and the refractive index of air being 1, the total reflection occurs when the incident angle of the edge deflected light beam L2 is greater than 42 ° and the inclination of the concave curved surface 112 at the incident position of the deflected light beam L2 is less than 48 ° as known from the calculation formula of refraction. Preferably, the concave curved surface 112 is a smooth curved surface, and the width of the concave curved surface is 0.5 μm, so as to conform to the difference between the width of the light-transmitting region on the reticle body 100 and the width of the exposure substrate 400 actually exposed.

Finally, it should be noted that the above embodiments are only used for illustrating the technical solutions of the embodiments of the present invention and not for limiting the same, and although the embodiments of the present invention are described in detail with reference to the preferred embodiments, it should be understood by those skilled in the art that modifications or equivalent substitutions can be made on the technical solutions of the embodiments of the present invention, and these modifications or equivalent substitutions cannot make the modified technical solutions depart from the scope of the technical solutions of the embodiments of the present invention.