Method and device for purifying polycrystalline silicon by centrifugal directional solidification
阅读说明：本技术 一种多晶硅离心定向凝固提纯方法与装置 (Method and device for purifying polycrystalline silicon by centrifugal directional solidification ) 是由 徐国林 范占军 王志 钱国余 马晓琳 孟范兴 柳云 杨瑞芬 曹永柱 白宇峰 于 2021-08-06 设计创作，主要内容包括：一种多晶硅离心定向凝固提纯方法与装置,采用旋转离心定向凝固原理,即通过一中间腔体通有循环冷媒的冷却体以一定转速插入熔融硅液中,由于冷却体与熔融硅液存在较大温度梯度,硅液会在冷却体上凝固一层纯度高的结晶体,间隔一段时间后将冷却体与结晶体一同上升并借助外力分离,达到快速高效提纯的目的。本发明重点以2-4N级工业硅为原料制备纯度为6-7N级多晶硅的方法,提供一种冶金法太阳能级多晶硅的定向凝固提纯装置与定向凝固方法,该装置具有单炉产能大、除杂效果好、连续化生产,工序时间短、运行能耗低的特点,适合于规模化生产。(A centrifugal directional solidification method and apparatus for purifying polycrystalline silicon features that a cooling body with circulating refrigerant in its middle cavity is inserted in molten silicon at a certain speed, and the silicon liquid is solidified to form a layer of high-purity crystal on the cooling body. The invention provides a directional solidification purification device and a directional solidification method for solar grade polycrystalline silicon by a metallurgical method, which are mainly used for preparing polycrystalline silicon with the purity of 6-7N by taking 2-4N grade industrial silicon as a raw material.)
1. A polysilicon centrifugal directional solidification purification device is characterized by comprising a main furnace chamber, an auxiliary furnace chamber, a lower furnace body, a cooling body, a lifting and rotating device, a crucible body, a lifting and dumping mechanism, a silicon material secondary feeding system, a vertical column, an auxiliary furnace chamber lifting mechanism, a refrigerant closed-loop circulation system, a vacuum system, a furnace temperature control system, a power supply electric control system and a furnace body circulating water cooling system;
the main furnace chamber consists of a furnace bottom, a furnace barrel and a furnace cover, all parts are welded by stainless steel, and a double-layer water cooling structure is adopted; a resistance heater and a heat preservation thermal field are arranged in the main furnace chamber; the furnace cover is of an elliptical end enclosure structure, the front side of the furnace cover is provided with a quartz glass observation window with a water cooling structure, and the middle part of the outer side of the furnace barrel is provided with an infrared thermometer interface which is connected with a furnace temperature control system; the lower part of the outer side of the furnace cylinder is provided with a vacuum pipeline interface which is connected with a furnace body vacuum system;
the auxiliary furnace chamber is arranged right above the main furnace chamber, and two vacuum gate valves are arranged between the two chambers; a cooling body lifting and rotating device is arranged at the upper part of the auxiliary furnace chamber, a vertical double-linear guide rail and a ball screw combined sliding table are adopted, a stepping motor and a speed reducer drive a screw to rotate, and a screw nut drives a lifting frame to ascend and descend; the lifting frame is connected with the cooling body and a circulating refrigerant pipeline through an upper magnetic current sealing body and a lower magnetic current sealing body which are fixed, a wedge-shaped belt wheel is arranged outside a cooling body rod, the rotating motor drives the cooling body to rotate through the wedge-shaped belt, so that the functions of ascending and descending, rotating and air ventilation of the cooling body in the auxiliary furnace chamber can be realized, and the part, extending out of the auxiliary furnace chamber, of the cooling body is sealed by a metal welding corrugated pipe;
the cooling body lifting and rotating device is arranged at the upper part of the auxiliary furnace chamber, the lifting and descending stroke of the cooling body lifting and rotating device is required to meet the requirement that the cooling body is inserted into the main furnace chamber from the auxiliary furnace chamber to a distance of about 200mm below the liquid level of silicon liquid in a crucible of the main furnace chamber, the cooling body surface is lifted back to the auxiliary furnace chamber after the silicon crystal grows in each crystallization, and after a vacuum gate valve between the main furnace chamber and the auxiliary furnace chamber is closed, a front furnace door of the auxiliary furnace chamber can be opened under the condition that the process atmosphere of the main furnace chamber is maintained unchanged, and crystalline silicon materials are knocked and separated;
the refrigerant closed circulation system comprises a stainless steel pipeline, a valve, a tank body, a gas compression circulating pump, a water tank heat exchanger, a gas flow controller, a pressure gauge, a pressure relief valve and a safety valve, wherein all the parts are connected through pipelines;
the lower furnace body is of a rectangular cubic single-layer stainless steel plate structure, a reinforced channel steel rib plate is welded outside the lower furnace body, hard carbon felt heat preservation layers are arranged on the inner furnace walls, a vacuum-sealed overhaul furnace cleaning door is arranged in front of or behind the lower furnace body, and a waste silicon material discharging door is arranged on the side of the lower furnace body;
the crucible lifting and dumping mechanism adopts a double-hydraulic-cylinder structure, one single-stage telescopic anti-rotation hydraulic cylinder is responsible for lifting the crucible, and the other two-stage or multi-stage telescopic hydraulic cylinder is responsible for dumping the crucible. The crucible supporting plate of the lifting hydraulic cylinder is divided into an upper layer and a lower layer, the upper layer is of a circular sandwich plate structure, the lower layer is of a rectangular single plate slotted plate structure with reinforcing rib plates, the upper layer and the lower layer are hinged through a rotating shaft at one side, the other side is hinged with the front end of a crucible dumping hydraulic cylinder body and a rotating shaft at the head part of a push rod, and a dumping hydraulic cylinder is arranged below the side of the lower layer supporting plate;
the secondary silicon material feeding system is arranged on a furnace cover of the main furnace chamber, adopts a hydraulic rotating shaft lower turning plate sealing structure, and feeds granular silicon materials to be purified into the crucible through a silicon material guide pipe (graphite material) by utilizing gravity. The upper side of the silicon material containing barrel is communicated with a vacuum pipeline and a valve, when materials need to be fed, the turning plate and the vacuum valve are closed firstly to carry out vacuum pressure relief, the upper cover of the silicon material containing barrel is opened to load the silicon materials, then the upper cover is closed to seal, the vacuum valve is opened to carry out gas replacement vacuumizing, and when the vacuum negative pressure of the silicon material containing barrel is consistent with that of the main furnace chamber, the turning plate is opened, the silicon materials slide downwards to be added into the crucible. The secondary feeding process operation is carried out under the condition of maintaining the process atmosphere of the main furnace chamber unchanged, the waste silicon material containing barrel is made of graphite, and the lower part of the waste silicon material containing barrel is provided with the roller and the limiting rail, so that the discharging operation of the waste silicon material after the furnace is stopped is facilitated.
The lifting mechanism of the stand column and the auxiliary furnace chamber adopts a trapezoidal screw rod and nut structure, under the blowing-out state, the auxiliary furnace chamber is lifted by the rotation drive of the speed reduction motor and rises together with the furnace cover of the main furnace chamber, the main furnace chamber is opened by matching with manual side pulling, the cleaning, the inspection and the maintenance operation are carried out, and a lifting support of the lifting mechanism is not only a connector with the auxiliary furnace chamber, but also a vertical base of a ball screw combined sliding table of a cooling body lifting and rotating device.
2. The device for purifying polycrystalline silicon by centrifugal directional solidification according to claim 1, wherein the cooling body is divided into an upper part and a lower part, the lower part is an inner layer high-purity graphite piece and an outer layer high-purity graphite piece, and the upper part is an inner layer high-temperature resistant stainless steel pipe and an outer layer high-temperature resistant stainless steel pipe which are connected in a thread sealing way; a plurality of small holes are distributed at the bottom of the lower inner layer hollow cavity and communicated with the outer inner cavity, a refrigerant enters the inner layer hollow cavity of the cooling body through the magnetic flow sealing body, the outer layer is cooled from the inner side at the head of the bottom of the cooling body, and then the refrigerant returns out of the furnace chamber through the magnetic flow sealing body through the inner layer and the outer layer.
3. The apparatus for purifying polysilicon by centrifugal directional solidification according to claim 2, wherein a heat insulating layer is further disposed between the inner and outer layers of the cooling body except the bottom head portion, so as to prevent the refrigerant from performing heat exchange during the vertical transmission process at the longer rod portion of the cooling body as much as possible, and the cold energy of the refrigerant directly reaches the bottom head portion of the cooling body, thereby forming a larger temperature gradient of a solid-liquid interface, and the heat insulating layer is made of a temperature-resistant aerogel material with superior performance.
4. The apparatus for purifying polysilicon by centrifugal directional solidification according to claim 1 or 3, wherein the refrigerant is a safe inert gas comprising one of helium, argon, nitrogen, and the like, preferably argon.
5. A method for purifying polycrystalline silicon by centrifugal directional solidification is characterized by comprising the following steps:
step 1: placing a silicon material in a crucible under the initial state of starting up for the first time or stopping and starting up again, lifting the crucible to a main furnace chamber, starting a vacuum system for gas replacement and vacuumizing, filling protective argon into the furnace after the leakage detection is less than 3Pa/10min is qualified, maintaining the furnace pressure of 10000-12000Pa, starting a power switch of a graphite heater, adjusting the power once every 0.5 hour, increasing the furnace temperature to 1550 ℃ and maintaining, reducing the heating power after the solid silicon material is completely melted, and controlling the furnace temperature to 1450-1480 ℃;
step 2: turning on a cooling body rotating power supply, setting the rotating speed to be 20-80 r/min, introducing a large-flow circulating coolant medium into the cooling body, turning on two vacuum gate valves between the main chamber and the auxiliary chamber, quickly lowering the cooling body to the liquid level of the silicon liquid, slowly inserting the cooling body into the position 200mm below the liquid level of the silicon liquid at the speed of 10mm/s, and performing rotary centrifugal directional solidification crystallization purification; when the thickness of the crystal reaches 30-40 mm (about 8-10 kg), slowly lifting the cooling body at the speed of 10mm/s to leave the liquid level, then lifting the cooling body at the speed of 20mm/s to the auxiliary furnace chamber, and quickly closing the two vacuum gate valves;
and step 3: charging gas into the auxiliary furnace chamber, vacuum-releasing pressure, stopping the cooling body from rotating, opening the furnace door of the auxiliary furnace chamber, placing the auxiliary furnace chamber into a receiving container, tapping the upper edge of the crystal to separate the crystal from the cooling body, taking out the crystal, closing the furnace door of the auxiliary furnace chamber, performing gas replacement and vacuum-pumping on the auxiliary furnace chamber, and charging protective argon;
and 4, step 4: according to the circulation steps 2 and 3, performing multi-time rotation centrifugal directional solidification crystallization purification, and continuously introducing a large-flow circulation refrigerant medium into the cooling body in the whole process without interruption;
and 5: when the silicon liquid level of the crucible for crystallization purification is reduced to the total liquid height of less than 250mm, under the condition of maintaining the process atmosphere of the main furnace chamber unchanged, carrying out secondary feeding process operation, firstly closing a turning plate and a vacuum pipeline valve of a secondary feeding system, carrying out vacuum pressure relief, then opening an upper cover of a silicon material containing cylinder body to load silicon materials, wherein the silicon materials have particle diameters of 5-20mm, then closing the upper cover for sealing, opening the vacuum pipeline valve for gas replacement and vacuumizing, when the vacuum negative pressure of the silicon material containing cylinder body is consistent with that of the main furnace chamber, opening the turning plate, allowing the silicon materials to slide downwards along a guide pipe to be added into the crucible, closing the turning plate and the vacuum pipeline valve of the secondary feeding system after feeding is completed, heating and melting, and repeating the step 4;
step 6: repeating the steps 4 and 5 repeatedly, starting the crucible descending and dumping process operation after 2-3 times, at the moment, lifting the cooling body to the auxiliary furnace chamber, closing the vacuum gate valve, closing the vacuum pipeline valve of the secondary feeding system, starting to descend the crucible to a specified position, starting the dumping mechanism, pouring the residual molten silicon material in the crucible into a waste silicon material container, returning to the dumping mechanism, lifting the crucible to the main furnace chamber, and performing the secondary feeding, melting and purifying cycle process operation again;
and 7: and (4) blowing out the furnace for cooling, taking out the waste silicon material, cleaning, checking and overhauling and replacing the crucible according to the operation condition of the device equipment.
Technical Field
The invention belongs to the technical field of metallurgical solar grade polycrystalline silicon production, particularly relates to a directional solidification technology for efficiently removing metal impurities in polycrystalline silicon, and provides a method and a device for purifying polycrystalline silicon by centrifugal directional solidification.
Background
The photovoltaic power generation green clean energy is used as one of solar energy utilization modes, the development is rapid in recent years, the main base material is solar-grade polycrystalline silicon (the purity is more than or equal to 99.9999 percent and 6N), and the solar-grade polycrystalline silicon is mainly prepared by a chemical method, namely an improved Siemens method industrial silicon purification technology at present. The metallurgical polycrystalline silicon technology is also a method for preparing solar grade polycrystalline silicon, is widely concerned by the industry due to the potential advantages of low project investment, short process flow, low energy consumption, environmental friendliness and the like, and becomes a hot spot and a key point of technical research.
The development of polysilicon is a severe technical competition, an independent intellectual property right is required to be established, the competitiveness of enterprises is enhanced, and the high and new technology 'improving the product quality and reducing the production cost' is the only way out. Technology for preparing solar grade polysilicon by metallurgy methodThe method adopts a series of combined and integrated technologies, wherein a directional solidification process is a very important part of the technology, a silicon ingot is subjected to unidirectional growth by controlling the temperature and thermal field change, and metal elements with small segregation coefficients such as Fe, Al, Ca, Cr, Ni, Cu and Zn (the segregation coefficient of most metal impurities in silicon is less than 10) are subjected to impurity segregation effect-3) And the like are enriched in the final solidified layer, thereby achieving the purpose of removing metal impurities.
The directional solidification technology can effectively remove metal impurities in the polycrystalline silicon, and is highly accepted by the industry technology. There are also many methods and devices for directional solidification designed according to the technological principles, such as DSS bridgman method, EMCP electromagnetic continuous casting method, FZ zone refining method, CZ crystal pulling method, etc. However, the existing methods have the problems of high energy consumption and low efficiency, the DSS Bridgman method adopts the method of adding raw materials into the same crucible for melting by one time and then realizing directional solidification molding by controlling temperature gradient heat dissipation, the growth speed of the crystal is slow by 0.8-1.0 mm/min, the solid-liquid interface keeps macroscopic static state, impurities discharged from the solid cannot be rapidly and uniformly diffused into the liquid, and the effect of removing the impurities at one time is not good; the EMCP electromagnetic continuous casting method integrates cold crucible induction melting and continuous casting technologies, can effectively improve the purification effect and shorten the production period, but the adoption of the water-cooled copper crucible consumes a large amount of induction heat energy and is not beneficial to reducing the energy consumption; although not specially used for purifying polycrystalline silicon, the FZ zone-melting refining method and the CZ crystal pulling method have the directional solidification function, forced refrigerants are not used, the solidified crystals are long cylindrical, the growth period is long, the energy consumption is high (about 30 Kwh/Kg), the ratio of the volume V of a molten pool of the FZ zone-melting refining method to the solid-liquid interface area S (V/S) is small, and the effective discharge of impurities is not facilitated. Based on this, the conventional polysilicon purification technology and device by the directional solidification method are difficult to consider in the aspects of energy consumption cost and purification efficiency, and the large-scale production application of the device in the technical field of solar-grade polysilicon production by the metallurgical method is restricted.
Disclosure of Invention
The invention aims to overcome the defects of the existing polysilicon directional solidification technology in the aspect of removing metal impurities, particularly provides a method for preparing polysilicon with the purity of 6-7N by taking 2-4N industrial silicon as a raw material, and provides a directional solidification purification device and a directional solidification method for solar-grade polysilicon by a metallurgical method.
The overall concept of the invention is as follows: a centrifugal directional solidification and purification device and method for polysilicon adopt the principle of rotary centrifugal directional solidification, namely a cooling body with a circulating refrigerant introduced through an intermediate cavity is inserted into molten silicon liquid at a certain rotating speed, because the cooling body and the molten silicon liquid have a large temperature gradient, the silicon liquid can solidify a layer of crystal with high purity on the cooling body, and after a period of time, the cooling body and the crystal rise together and are separated by means of external force, thereby achieving the purpose of rapid and efficient purification.
According to the principle of directional solidification impurity segregation, the purification effect and the effective segregation coefficient k of the impurity elements are obtainedeffIn connection with, to reduce keffThe method for reducing the crystal growth speed and the thickness of the impurity enrichment layer on the solid-liquid interface is generally adopted. In the process of solidification and crystallization of molten silicon, if a solid phase, a solid-liquid interface and a liquid phase are in a relatively static state macroscopically, the aim of slowing down the growth speed of the crystal is to inhibit unstable balanced growth of crystal grains, because silicon belongs to a facet phase, the free energy of different crystal faces is different, the crystal face with the lowest surface free energy can grow preferentially, the thickness of the solid-liquid interface (namely an impurity enrichment layer) can be increased at a higher crystal growth speed, a larger temperature gradient (a short distance and a large temperature difference) cannot be formed to enable excessive branched dendritic crystals to grow, the number of crystal boundaries is increased by increasing the number of the dendritic crystals, and the impurities are easily enriched in the crystal boundaries, so that the aim of efficiently removing the impurities cannot be achieved. However, there is no practical significance in industrially reducing the crystal growth rate, which is equivalent to reducing the production efficiency, and increasing the temperature gradient and reducing the thickness of the enrichment layer are effective methods.
The rotary centrifugal directional solidification technology is adopted, a rotary cooling body is inserted into molten silicon liquid to directly drive a liquid phase on the solid-liquid interface side to flow in an accelerating mode, the distance between the solid-liquid interface and a high-temperature region in the liquid phase is shortened due to heat energy carried by the flowing silicon liquid, large temperature gradient is formed, growth of crystal dendrite is effectively inhibited, the solid-liquid interface can be stably and stably pushed to grow rapidly in a better state, and the crystallization of the round can be finished when the solid phase thickness of crystals reaches a certain value and the balance state is damaged. Meanwhile, the flowing silicon liquid accelerates the diffusion speed of impurities near a solid-liquid interface to the melt, thereby greatly reducing the thickness of an impurity enrichment layer, reducing the effective segregation coefficient of the impurities and enhancing the purification effect. In addition, the rotating centrifugal directional solidification structure is also beneficial to increasing the design of the ratio (V/S) of the volume V of the molten pool to the solid-liquid interface area S, impurities discharged by solid-phase solidification crystallization can be fully mixed into the liquid-phase molten pool, and the purification effect is also enhanced. The invention aims to remove the solar-grade polycrystalline silicon metal impurities with high efficiency and low cost by utilizing the rotary centrifugal directional solidification technology and by the cooperation of the realization of the device function and the operation process, and overcomes the defects of the prior art and equipment.
In order to achieve the purpose, the technical solution of the invention is as follows:
the device mainly comprises a main furnace chamber, an auxiliary furnace chamber, a lower furnace body, a cooling body, a lifting and rotating device, a crucible body, a lifting and dumping mechanism, a silicon material secondary feeding system, a vertical column and auxiliary furnace chamber lifting mechanism, a refrigerant closed-loop circulating system, a vacuum system, a furnace temperature control system, a power supply electric control system and a furnace body circulating water cooling system.
The main furnace chamber consists of a furnace bottom, a furnace barrel and a furnace cover, all parts are welded by stainless steel, and a double-layer water cooling structure is adopted; a resistance heater and a heat preservation thermal field are arranged in the main furnace chamber; the resistance heater is an annular high-purity graphite heater and is connected with a power supply through a plurality of hollow water-cooling structure electrode rods on the lower side of the furnace barrel; the protective thermal field is composed of a graphite cylinder, a graphite cover plate and a hard or soft carbon felt, and the temperature of a thermal field temperature zone can reach 1600 ℃ or higher; the furnace cover is of an elliptical seal head structure, a quartz glass observation window of a water cooling structure is arranged on the front side of the furnace cover, and the running condition in the furnace is observed through the observation window. In addition, an infrared thermometer interface is arranged in the middle of the outer side of the furnace barrel and is connected with a furnace temperature control system; the lower part of the outer side of the furnace cylinder is provided with a vacuum pipeline interface which is connected with a furnace body vacuum system.
The auxiliary furnace chamber is arranged right above the main furnace chamber, and two vacuum gate valves are arranged between the two chambers; a cooling body lifting and rotating device is arranged at the upper part of the auxiliary furnace chamber, a vertical double-linear guide rail and a ball screw combined sliding table are adopted, a stepping motor and a speed reducer drive a screw to rotate, and a screw nut drives a lifting frame to ascend and descend; the lifting frame is connected with the cooling body and a circulating refrigerant pipeline through an upper magnetic current sealing body and a lower magnetic current sealing body which are fixed, a wedge-shaped belt wheel is arranged outside a cooling body rod, the rotating motor drives the cooling body to rotate through the wedge-shaped belt, so that the functions of ascending and descending, rotating and air ventilation of the cooling body in the auxiliary furnace chamber can be realized, and the part, extending out of the auxiliary furnace chamber, of the cooling body is sealed by a metal welding corrugated pipe;
and the lifting and descending stroke of the cooling body lifting and rotating device arranged at the upper part of the auxiliary furnace chamber is required to meet the requirement that the cooling body is inserted into the main furnace chamber from the auxiliary furnace chamber to a distance of about 200mm below the liquid level of the silicon liquid in the crucible of the main furnace chamber. And lifting the silicon crystal growing on the surface of the cooling body to the auxiliary furnace chamber after each crystallization, and opening a front furnace door of the auxiliary furnace chamber to knock and separate the crystal silicon material under the condition of keeping the process atmosphere of the main furnace chamber unchanged after closing a vacuum gate valve between the main furnace chamber and the auxiliary furnace chamber.
The cooling body is divided into an upper part and a lower part, the lower part is an inner high-purity graphite piece and an outer high-purity graphite piece, the upper part is an inner high-temperature resistant stainless steel pipe and an outer high-temperature resistant stainless steel pipe, and the cooling body is formed by threaded sealing connection; a plurality of small holes are distributed at the bottom of the hollow inner layer of the lower part and communicated with the inner cavity of the outer layer, a refrigerant enters the hollow inner layer of the cooling body through the magnetic current sealing body, the outer layer is cooled from the inner side at the head part of the bottom of the cooling body, and then the refrigerant returns out of the furnace chamber through the magnetic current sealing body through the cavities of the inner layer and the outer layer; the cooling body is internally and externally provided with a heat insulation layer besides the bottom head, heat exchange of a refrigerant in the up-and-down transmission process of the longer rod part of the cooling body is prevented as far as possible, the cold quantity of the refrigerant directly reaches the bottom head of the cooling body, the large temperature gradient of a solid-liquid interface is formed, and the heat insulation layer is made of a temperature-resistant aerogel material with excellent performance.
The refrigerant is a safe inert gas, and comprises one of helium, argon, nitrogen and the like, and argon is preferred.
The refrigerant closed circulation system comprises a stainless steel pipeline, a valve, a tank body, a gas compression circulating pump, a water tank heat exchanger, a gas flow controller, a pressure gauge, a pressure relief valve and a safety valve, wherein the parts are connected through pipelines. The refrigerant enters a closed cavity in the cooling body to be heated and expanded, then returns out of the furnace body, is cooled by the water tank heat exchanger and enters the tank body for buffering, and forms a sealed closed cycle with the gas circulating pump, so that the usage amount of the refrigerant is reduced to the maximum extent.
The crucible body is an arc quartz crucible or a ceramic quartz crucible, and the high-purity graphite tri-petal pot protective body is arranged outside the crucible and can bear the temperature of 1600 ℃. The crucible is fastened and fixed on the upper edge of the high-purity graphite three-petal pot protective body, is arranged on the graphite bottom support step of the crucible, and is connected to an upper layer supporting plate of the crucible lifting and dumping mechanism together with the ceramic thermal baffle through graphite or ceramic bolts.
The lower furnace body is of a rectangular cubic single-layer stainless steel plate structure, a reinforced channel steel rib plate is welded outside the lower furnace body, a hard carbon felt heat preservation layer is arranged on the inner furnace wall, a vacuum-sealed overhaul furnace cleaning door is arranged in front of or behind the lower furnace body, and a waste silicon material discharging door is arranged on the side of the lower furnace body.
The crucible lifting and dumping mechanism adopts a double-hydraulic-cylinder structure, one single-stage telescopic anti-rotation hydraulic cylinder is responsible for lifting the crucible, and the other two-stage or multi-stage telescopic hydraulic cylinder is responsible for dumping the crucible. The lifting hydraulic cylinder crucible supporting plate is two-layer from top to bottom, the upper layer is of a circular sandwich plate structure, the lower layer is of a rectangular single plate slotted rib plate structure, the upper layer and the lower layer are hinged through a rotating shaft on one side, the other side and the crucible are hinged through the front end of a hydraulic cylinder body and the rotating shaft on the head of a push rod, and the hydraulic cylinder is poured under the side of the supporting plate on the lower layer.
The secondary silicon material feeding system is arranged on a furnace cover of the main furnace chamber, adopts a hydraulic rotating shaft lower turning plate sealing structure, and feeds granular silicon materials to be purified into the crucible through a silicon material guide pipe (graphite material) by utilizing gravity. The upper side of the silicon material containing barrel is communicated with a vacuum pipeline and a valve, when materials need to be fed, the turning plate and the vacuum valve are closed firstly to carry out vacuum pressure relief, the upper cover of the silicon material containing barrel is opened to load the silicon materials, then the upper cover is closed to seal, the vacuum valve is opened to carry out gas replacement vacuumizing, and when the vacuum negative pressure of the silicon material containing barrel is consistent with that of the main furnace chamber, the turning plate is opened, the silicon materials slide downwards to be added into the crucible. The secondary feeding process operation is realized under the condition of maintaining the process atmosphere of the main furnace chamber unchanged.
The barrel for containing the waste silicon materials is made of graphite, and the lower part of the barrel is provided with the roller and the limiting rail, so that the discharging operation of the waste silicon materials after the furnace is stopped is facilitated.
The lifting mechanism of the upright post and the auxiliary furnace chamber adopts a trapezoidal screw rod and nut structure, under the blowing-out state, the auxiliary furnace chamber is driven by the rotation of the speed reducing motor to lift together with the furnace cover of the main furnace chamber, and the main furnace chamber is opened by matching with manual side pulling to carry out cleaning, inspection and maintenance operations. The lifting support of the lifting mechanism is not only a connector with the auxiliary furnace chamber, but also a vertical base of the ball screw combined sliding table of the cooling body lifting and rotating device.
A method for purifying polycrystalline silicon by centrifugal directional solidification comprises the following steps:
step 1: placing a silicon material in a crucible under the initial state of starting up for the first time or stopping and starting up again, lifting the crucible to a main furnace chamber, starting a vacuum system for gas replacement and vacuumizing, filling protective argon into the furnace after the leakage detection is less than 3Pa/10min is qualified, maintaining the furnace pressure of 10000-12000Pa, starting a power switch of a graphite heater, adjusting the power once every 0.5 hour, increasing the furnace temperature to 1550 ℃ and maintaining, reducing the heating power after the solid silicon material is completely melted, and controlling the furnace temperature to 1450-1480 ℃;
step 2: turning on a cooling body rotating power supply, setting the rotating speed to be 20-80 r/min, introducing a large-flow circulating coolant medium into the cooling body, turning on two vacuum gate valves between the main chamber and the auxiliary chamber, quickly lowering the cooling body to the liquid level of the silicon liquid, slowly inserting the cooling body into the position 200mm below the liquid level of the silicon liquid at the speed of 10mm/s, and performing rotary centrifugal directional solidification crystallization purification; when the thickness of the crystal reaches 30-40 mm (about 8-10 kg), slowly lifting the cooling body at the speed of 10mm/s to leave the liquid level, then lifting the cooling body at the speed of 20mm/s to the auxiliary furnace chamber, and quickly closing the two vacuum gate valves;
and step 3: and (3) inflating the auxiliary furnace chamber, releasing pressure in vacuum, stopping the rotation of the cooling body, opening the furnace door of the auxiliary furnace chamber, putting the auxiliary furnace chamber into the receiving container, tapping the upper edge of the crystal to separate the crystal from the cooling body, and taking out the crystal. Closing the furnace door of the auxiliary furnace chamber, performing gas replacement and vacuum pumping of the auxiliary furnace chamber, and filling protective argon;
and 4, step 4: according to the circulation steps 2 and 3, performing multi-time rotation centrifugal directional solidification crystallization purification, and continuously introducing a large-flow circulation refrigerant medium into the cooling body in the whole process without interruption;
and 5: and when the silicon liquid level of the crucible for crystallization and purification is reduced to the total liquid height of less than 250mm, carrying out secondary feeding process operation under the condition of maintaining the process atmosphere of the main furnace chamber unchanged. Closing the turning plate and the vacuum pipeline valve of the secondary feeding system, performing vacuum pressure relief, opening the upper cover of the silicon material containing cylinder body to load silicon materials, wherein the silicon materials have the particle size of 5-20mm, closing the upper cover for sealing, opening the vacuum pipeline valve to perform gas replacement vacuumizing, and opening the turning plate and the silicon materials to slide down along the guide pipe to be added into the crucible when the vacuum negative pressure of the silicon material containing cylinder body is consistent with that of the main furnace chamber. And (4) after the feeding is finished, closing the turning plate of the secondary feeding system and the vacuum pipeline valve, heating and melting, and repeating the step 4.
Step 6: repeating the steps 4 and 5 repeatedly, starting the crucible descending and dumping process operation after 2-3 times, at the moment, lifting the cooling body to the auxiliary furnace chamber, closing the vacuum gate valve, closing the vacuum pipeline valve of the secondary feeding system, starting to descend the crucible to a specified position, starting the dumping mechanism, pouring the residual molten silicon material in the crucible into a waste silicon material container, returning to the dumping mechanism, lifting the crucible to the main furnace chamber, and performing the secondary feeding, melting and purifying cycle process operation again;
and 7: and (4) blowing out the furnace for cooling, taking out the waste silicon material, cleaning, checking and overhauling and replacing the crucible according to the operation condition of the device equipment.
The invention has the following remarkable effects:
1. the device of the invention utilizes the rotation of the cooling body to drive the liquid-phase silicon liquid on the solid-liquid interface side to flow in an accelerated manner, thereby reducing the thickness of the impurity enrichment layer, reducing the effective segregation coefficient of the impurities and strengthening the purification effect.
2. The cooling body is lifted and taken out when the solidified and grown crystal reaches a certain thickness, the technical requirement of enhancing the temperature gradient is met better, although the process operation is not intelligent, the cold quantity of the refrigerant is reasonably and efficiently utilized, the production energy consumption is reduced, the purification effect is stabilized, and the production capacity in unit time is improved.
3. The refrigerant adopts inert gas, reduces the dangerous factors of safe production and enhances the operation safety of the device.
4. The invention realizes the functional combination of cooling body lifting and rotating, secondary feeding, crucible lifting and dumping and the like, ensures that the whole device has reasonable and compact design, realizes the continuous large-scale industrial production requirement of centrifugal directional solidification and purification, has high single-furnace production capacity, and greatly improves the production efficiency and the utilization rate of silicon materials.
5. The continuous production crucible has high utilization rate, the crystalline silicon material and the waste silicon material are naturally separated after being discharged from the furnace and purified, the working procedure of sawing and cutting the silicon ingot is not needed, the crushing strength is reduced, and the mass production cost is saved.
Drawings
FIG. 1 is a schematic diagram of the rotational centrifugal directional solidification of the present invention.
FIG. 2 is a schematic structural diagram of the rotary centrifugal directional solidification device of the present invention.
FIG. 3 is a functional diagram of the rotary centrifugal directional solidification device of the present invention.
As shown in the figure: 1-circulating refrigerant 2-cooling body 3-crystal 4-solid-liquid interface 5-molten silicon liquid 6-crucible body 7-crucible graphite collet 8-ceramic thermal baffle 9-graphite resistance heater 10-heat preservation thermal field 11-main furnace chamber 12-silicon material guide pipe 13-silicon material secondary feeding system 14-to-be-purified granular silicon material 15-upright post 16-auxiliary furnace chamber lifting mechanism 17-lifting support 18-double-linear guide rail and ball screw combined sliding table 19-magnetic flow sealing body 20-wedge-shaped belt wheel rotating mechanism 21-metal welding corrugated pipe 22-auxiliary furnace chamber 23-vacuum gate valve 24-lower furnace body 25-maintenance and cleaning furnace door 26-waste silicon material discharging furnace door 27-waste silicon material container 28-crucible lifting mechanism 28 29-crucible dumping mechanism.
Detailed Description
The following examples used in the present invention are illustrative to demonstrate the effects of the present invention, but the scope of the technical solutions of the present invention is not limited by the examples, and the scope of the present invention is subject to the scope described in the claims.
Example 1:
the method is characterized in that 2N-grade industrial silicon with purity is used as a raw material, and centrifugal directional solidification purification is carried out.
(1) 200 kilograms of solid silicon material is placed in the crucible body 6, the crucible is lifted to the main furnace chamber 11, a vacuum system is started to perform gas replacement and vacuum pumping, protective argon is filled, the furnace pressure is maintained at 10000-12000Pa, a power switch of the graphite heater 9 is started, the furnace temperature is raised to 1550 ℃ and maintained, after the solid silicon material is completely melted, the heating power is reduced, and the furnace temperature is controlled to 1450-1480 ℃.
(2) Opening a power supply of a wedge-shaped belt wheel rotating mechanism 20 of the cooling body 2, setting the rotating speed to be 30r/min, introducing large-flow circulating refrigerant argon into the cooling body from a connector of a magnetic current sealing body 19, opening two vacuum gate valves 23 between the main chamber and the auxiliary chamber, quickly lowering the cooling body to the liquid level of the silicon liquid, slowly inserting the cooling body into the position 200mm below the liquid level of the silicon liquid at the speed of 10mm/s, and performing rotary centrifugal directional solidification crystallization purification; when the thickness of the crystal reaches 30mm (about 8 kg), the cooling body is lifted slowly at the speed of 10mm/s to leave the liquid level, and then lifted into the auxiliary furnace chamber at the speed of 20mm/s, and the two vacuum gate valves 23 are closed quickly.
(3) And (3) inflating air into the auxiliary furnace chamber 22, releasing pressure in vacuum, closing the cooling body to rotate 20, opening the furnace door of the auxiliary furnace chamber, putting the auxiliary furnace chamber into a receiving container, tapping the upper edge of the crystal to separate the crystal 3 from the cooling body 2, and taking out the purified silicon material S1 a. And closing the furnace door of the auxiliary furnace chamber, performing gas replacement and vacuum pumping on the auxiliary furnace chamber, and filling protective argon.
(4) And (5) repeating the circulating steps (2) and (3), and performing multiple times of rotation, centrifugation, directional solidification, crystallization and purification to obtain purified silicon materials S2a, S3a and S4a … … S15 a.
(5) And (5) carrying out secondary feeding process operation, and obtaining purified silicon materials S1b, S2b and S3b … … S15b from the step (4).
(6) And (4) descending the crucible to a specified position, starting the dumping mechanism, dumping the residual molten silicon material in the crucible into a waste silicon material container, and returning the crucible to the main furnace chamber. And performing secondary feeding, melting and purification cyclic process operation again.
The purified silicon material obtained in the embodiment reaches 5.5N-grade purity through detection and assay, namely the total amount of metal impurities of Fe, Al, Ca, Cr, Ni, Cu and Zn is less than 5 ppm.
Example 2:
the method is characterized in that 4N-grade industrial silicon with purity is used as a raw material, and centrifugal directional solidification purification is carried out.
The process was carried out in the same manner as in example 1 except that the process parameters were changed to 60r/min in the rotational speed of the cooling member 2.
Purified silicon materials S2a, S3a … … S15a and S1b, S2b and S3b … … S15b are obtained.
The purified silicon material obtained in the embodiment reaches 7N-grade purity through detection and assay, namely the total amount of metal impurities of Fe, Al, Ca, Cr, Ni, Cu and Zn is less than 0.1 ppm.