阅读说明：本技术 一种柔性等离子体源特性分析系统 (Flexible plasma source characteristic analysis system ) 是由 蒋睿珈 刘诗筠 于 2021-09-09 设计创作，主要内容包括：本发明公开一种柔性等离子体源特性分析系统,包括柔性等离子体源放电子系统和放电参数采集检测子系统,柔性等离子体源放电子系统包括脉冲电源和柔性等离子体源,脉冲电源和柔性等离子体源电性连接,放电参数采集检测子系统包括电气特性分析部、光学特性分析部和温度特性分析部,电气特性分析部、光学特性分析部和温度特性分析部分别与柔性等离子体源放电子系统连接。本发明的柔性等离子体源特性分析系统能够准确高效的分析不同激励源下柔性CDBD的放电特性、光学特性、光谱特性以及温度特性,得到放电功率、传输电荷、能量利用效率、放电产生的主要粒子及反应器表面温度等参数,以及随外加电压以及放电频率等电源参数的演变规律。(The invention discloses a flexible plasma source characteristic analysis system which comprises a flexible plasma source discharge subsystem and a discharge parameter acquisition and detection subsystem, wherein the flexible plasma source discharge subsystem comprises a pulse power supply and a flexible plasma source, the pulse power supply is electrically connected with the flexible plasma source, the discharge parameter acquisition and detection subsystem comprises an electrical characteristic analysis part, an optical characteristic analysis part and a temperature characteristic analysis part, and the electrical characteristic analysis part, the optical characteristic analysis part and the temperature characteristic analysis part are respectively connected with the flexible plasma source discharge subsystem. The flexible plasma source characteristic analysis system can accurately and efficiently analyze the discharge characteristic, the optical characteristic, the spectral characteristic and the temperature characteristic of the flexible CDBD under different excitation sources to obtain parameters such as discharge power, transmission charge, energy utilization efficiency, main particles generated by discharge, surface temperature of a reactor and the like, and an evolution rule of power source parameters such as external voltage, discharge frequency and the like.)

1. A flexible plasma source characterization system, comprising: comprises a flexible plasma source discharge system and a discharge parameter acquisition and detection subsystem,

the flexible plasma source discharge subsystem comprises a pulse power supply and a flexible plasma source, the pulse power supply is electrically connected with the flexible plasma source,

the discharge parameter acquisition and detection subsystem comprises an electrical characteristic analysis part, an optical characteristic analysis part and a temperature characteristic analysis part, and the electrical characteristic analysis part, the optical characteristic analysis part and the temperature characteristic analysis part are respectively connected with the flexible plasma source discharge subsystem.

2. The flexible plasma source characterization system according to claim 1, wherein: the pulse power supply adopts a microsecond pulse power supply or a microsecond/nanosecond pulse power supply.

3. The flexible plasma source characterization system according to claim 1, wherein: microsecond output frequency of the pulse power supply is 0.9-1.1 kHz, voltage amplitude is 0-12 kV, rising/falling edges are 7.5 mu s, and pulse width is set to be 6.5 mu s.

4. The flexible plasma source characterization system according to claim 1, wherein: the pulse power supply comprises a power supply source, a first boosting module, a second boosting module, an IGBT (insulated gate bipolar transistor), a transformer and a pulse generator, wherein the power supply source is respectively connected with the second boosting module and the IGBT through the first boosting module, the second boosting module is connected with the transformer in series, the IGBT is connected with the pulse generator in series, the power supply source adopts an energy storage lithium battery, and the turn ratio of the transformer is 50: 2500.

5. The flexible plasma source characterization system according to claim 1, wherein: the flexible plasma source comprises a high-voltage electrode, a ground electrode and a flexible insulating medium, wherein the high-voltage electrode and the ground electrode are arranged in the flexible insulating medium in a staggered mode.

6. The flexible plasma source characterization system according to claim 2, wherein: the electrical characteristic analysis part comprises an oscilloscope, a high-voltage probe, a differential probe, a Rogowski coil and a measuring capacitor, the oscilloscope is respectively connected with the high-voltage probe, the differential probe and the Rogowski coil, the Rogowski coil and the measuring capacitor are connected in series between the pulse power supply and the flexible plasma source, and the differential probe is connected with the measuring capacitor in parallel.

7. The flexible plasma source property analysis system according to claim 1 or 6, wherein: the optical characteristic analysis part adopts a spectrometer and a luminescence image acquisition device, an optical fiber probe of the spectrometer is fixed right in front of the flexible plasma source and is 1cm away from a discharge area, the optical fiber probe is electrically connected with a computer, the computer is used for storing spectral data of the flexible plasma source, and the computer comprises an electromagnetic shielding device;

the luminous image acquisition device is arranged on the front face of the plasma source, and an image acquisition distance is arranged between the luminous image acquisition device and the flexible plasma source.

8. The flexible plasma source characterization system according to claim 1, wherein: the temperature characteristic analysis part comprises an infrared thermal imager which is arranged on the front surface of the flexible plasma source and is provided with a temperature collection distance.

9. The flexible plasma source characterization system according to claim 7, wherein: the luminous image acquisition device adopts a digital camera.

10. The flexible plasma source characterization system according to claim 6, wherein: the oscilloscope adopts a digital oscilloscope.

Technical Field

The invention relates to the technical field of plasma sources, in particular to a flexible plasma source characteristic analysis system.

Background

In life, skin diseases caused by accidental abrasion, large-area burn, postoperative wound care and fungal infection need to repair a skin protective layer as soon as possible and kill fungi to prevent further infection and suppuration of the wound, which is also the focus of constant attention of the medical community. The wound treatment commonly used in medicine is mainly a chemical agent method, and the adopted chemical agents mainly comprise 75% of alcohol, iodophor, purple liquid medicine, hydrogen peroxide and the like. These agents often need to be stored in specific containers and environments, are highly irritating to wound tissue, and are complex to handle and process.

In recent years, the low-temperature plasma technology is rapidly developed, and compared with the existing sterilization technology, the plasma sterilization technology is superior to other sterilization modes in the aspects of working temperature, application range, inactivation time and the like. In an atmospheric environment, gas discharge is the main means for obtaining plasma, including high temperature plasma (equilibrium plasma) and low temperature plasma (non-equilibrium plasma). There are many ways to generate low temperature Plasma, mainly including Glow Discharge (Glow Discharge), Corona Discharge (Corona Discharge), Dielectric Barrier Discharge (DBD), sliding Arc Discharge (GAD), and Atmospheric Pressure Plasma Jet (APPJ). The Dielectric Barrier Discharge (DBD) includes a Surface Dielectric Barrier Discharge (SDBD) and a Coplanar Dielectric Barrier Discharge (CDBD), wherein in the CDBD excitation form, the upper electrode and the ground electrode are buried deep in the dielectric, so that oxidation of the electrodes is avoided, the service life of the electrodes is greatly prolonged, plasma is generated in a thin layer above the electrode system, and a human body does not directly contact the upper electrode, so that a leakage risk is avoided.

At present, a plasma device based on a CDBD discharge technology initially shows good application effect and prospect, the existing technical research mainly focuses on exploring the application effect and reaction mechanism of the plasma device in the fields of disinfection and sterilization, wound treatment, food preservation and the like, and the discharge characteristic of the flexible CDBD under different working conditions is researched less systematically.

Therefore, there is a need for a plasma source characteristic analysis system for searching the discharge characteristic, optical characteristic, spectral characteristic and temperature characteristic of the flexible CDBD under different excitation sources to obtain parameters such as discharge power, transmission charge, energy utilization efficiency, main particles generated by discharge, reactor surface temperature and the like, and the evolution rule of power source parameters such as applied voltage and discharge frequency and the like, so as to optimize the discharge parameters and provide a data base for power source research and development.

Disclosure of Invention

The invention aims to provide a flexible plasma source characteristic analysis system, which is used for solving the problems in the prior art, can accurately and efficiently analyze the discharge characteristic, the optical characteristic, the spectral characteristic and the temperature characteristic of a flexible CDBD under different excitation sources to obtain parameters such as discharge power, transmission charge, energy utilization efficiency, main particles generated by discharge, reactor surface temperature and the like, and an evolution rule of power source parameters such as external voltage, discharge frequency and the like.

In order to achieve the purpose, the invention provides the following scheme: the invention provides a flexible plasma source characteristic analysis system, which comprises a flexible plasma source electron discharge system and a discharge parameter acquisition and detection subsystem,

the flexible plasma source discharge subsystem comprises a pulse power supply and a flexible plasma source, the microsecond pulse power supply is electrically connected with the flexible plasma source,

the discharge parameter acquisition and detection subsystem comprises an electrical characteristic analysis part, an optical characteristic analysis part and a temperature characteristic analysis part, and the electrical characteristic analysis part, the optical characteristic analysis part and the temperature characteristic analysis part are respectively connected with the flexible plasma source discharge subsystem.

Preferably, the pulse power supply adopts microsecond pulse power supply or microsecond/nanosecond pulse power supply.

Preferably, the output frequency of the microsecond pulse power supply is 0.9 kHz-1.1 kHz, the voltage amplitude is 0-12 kV, the rising/falling edges are both 7.5 mus, and the pulse width is set to be 6.5 mus.

Preferably, the pulse power supply comprises a power supply source, a first boosting module, a second boosting module, an IGBT, a transformer and a pulse generator, the power supply source is connected with the second boosting module and the IGBT through the first boosting module respectively, the second boosting module is connected with the transformer in series, the IGBT is connected with the pulse generator in series, wherein the power supply source adopts an energy storage lithium battery, and the turn ratio of the transformer is 50: 2500.

Preferably, the flexible plasma source comprises a high voltage electrode, a ground electrode and a flexible insulating medium, and the high voltage electrode and the ground electrode are staggered in the flexible insulating medium.

Preferably, the electrical characteristic analysis part comprises an oscilloscope, a high-voltage probe, a differential probe, a rogowski coil and a measurement capacitor, the oscilloscope is respectively connected with the high-voltage probe, the differential probe and the rogowski coil, the rogowski coil and the measurement capacitor are connected in series between the pulse power supply and the flexible plasma source, and the differential probe is connected in parallel with the measurement capacitor.

Preferably, the optical characteristic analysis part adopts a spectrometer and a luminescence image acquisition device, a fiber probe of the spectrometer is fixed right in front of the flexible plasma source and 1cm away from the discharge region, the fiber probe is electrically connected with a computer, the computer is used for storing spectral data of the flexible plasma source, and the computer comprises an electromagnetic shielding device;

the luminous image acquisition device is arranged on the front face of the plasma source, and an image acquisition distance is arranged between the luminous image acquisition device and the flexible plasma source.

Preferably, the temperature characteristic analysis portion includes an infrared thermal imager, the infrared thermal imager is disposed on a front surface of the flexible plasma source, and a temperature collection distance is disposed between the infrared thermal imager and the flexible plasma source.

Preferably, the light-emitting image acquisition device adopts a digital camera.

Preferably, the oscilloscope is a digital oscilloscope.

The invention discloses the following technical effects:

the flexible plasma source characteristic analysis system provided by the invention utilizes the flexible plasma source discharge system and the discharge parameter acquisition and detection subsystem to generate various plasmas, can fully and accurately obtain parameters such as discharge power, transmission charge, energy utilization efficiency, main particles generated by discharge, reactor surface temperature and the like of the flexible plasma source according to the discharge characteristics, optical characteristics, spectral characteristics and temperature characteristics of the plasmas under different excitation sources, and can optimize the discharge parameters along with the evolution rules of power supply parameters such as external voltage, discharge frequency and the like, and meanwhile, can provide a data base for power supply research and development.

Drawings

In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings needed to be used in the embodiments will be briefly described below, and it is obvious that the drawings in the following description are only some embodiments of the present invention, and it is obvious for those skilled in the art to obtain other drawings without inventive exercise.

FIG. 1 is a diagram of a flexible plasma source discharge system and a discharge parameter detection and acquisition system in an embodiment of the present invention;

fig. 2 is a schematic circuit diagram of a small microsecond pulse power supply according to an embodiment of the present invention.

Detailed Description

The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.

In order to make the aforementioned objects, features and advantages of the present invention comprehensible, embodiments accompanied with figures are described in further detail below.

The present invention provides a flexible plasma source characteristic analysis system, referring to fig. 1-2. The flexible plasma source characteristic analysis system comprises a flexible plasma source electron discharge system and a discharge parameter acquisition and detection subsystem.

The flexible plasma source discharge subsystem comprises a pulse power supply and a flexible plasma source, wherein the pulse power supply adopts a micro/nanosecond pulse power supply, the pulse power supply in the embodiment is a high-voltage micro/second pulse power supply, as shown in fig. 2, the high-voltage micro/second pulse power supply comprises a power supply, a first boosting module, a second boosting module, an IGBT, a transformer and a pulse generator, the power supply adopts an energy storage lithium battery, the output voltage of the power supply is 3.7V, on one hand, the power supply raises the voltage to 5V to 12V through the first boosting module to supply power to the IGBT and the pulse generator, on the other hand, the power supply raises the voltage to 5V to 12V through the first boosting module and then passes through the second boosting module to the transformer with the turn ratio of 50:2500, and finally obtains the pulse power supply with the frequency of 1kHz and adjustable voltage. A small energy storage lithium battery is used for replacing 220V alternating voltage as an input voltage source of the circuit. The lithium battery can be charged repeatedly and used, has small volume and is convenient to carry, and as the integral input of a power circuit, the lithium battery is more convenient and flexible than the direct use of 220V commercial power. The microsecond pulse power supply in the embodiment has an output frequency of 1kHz (+ -0.1), a voltage amplitude of 0-12 kV, rising/falling edges of 7.5 mus, and a pulse width of 6.5 mus.

The flexible plasma source comprises a high-voltage electrode, a ground electrode and a flexible insulating medium, wherein the high-voltage electrode and the ground electrode are arranged in the flexible insulating medium in a staggered mode. In this embodiment, the high-voltage electrode and the ground electrode both use copper as a processing material, specifically, the high-voltage electrode and the ground electrode use 35 μm thick brass with 0.2mm width, and the high-ground electrode and the ground electrode are arranged in a crossed manner to form a comb-shaped electrode structure with 0.4mm gaps and dense arrangement. The flexible insulating medium is made of Polyimide (PEI). In order to connect the reactor with the exciting power supply firmly and generate large-area uniform plasma, the two ends of the electrode are respectively provided with a high-voltage wire and a low-voltage wire interface with the diameter of 0.5 mm. In order to ensure the stability of the operation of the flexible plasma source and the electrical safety when a human body contacts, the external insulating medium can effectively cover the whole electrode, so that the electrode and the blocking medium (the flexible insulating medium) realize gapless contact.

The discharge parameter acquisition and detection subsystem comprises an electrical characteristic analysis part, an optical characteristic analysis part and a temperature characteristic analysis part, and the electrical characteristic analysis part, the optical characteristic analysis part and the temperature characteristic analysis part are respectively connected with the flexible plasma source discharge subsystem.

The electrical characteristic analysis part comprises an oscilloscope, a high-voltage probe, a differential probe, a Rogowski coil and a measuring capacitor, the oscilloscope is electrically connected with the high-voltage probe, the differential probe and the Rogowski coil respectively, the Rogowski coil and the measuring capacitor are connected between a microsecond pulse power supply and a flexible plasma source in series, and the differential probe is connected to two ends of the measuring capacitor in parallel. In this embodiment, the oscilloscope is a digital oscilloscope.

The optical characteristic analysis part comprises a spectrometer and a luminescence image acquisition device, in the embodiment, the spectrometer adopts an Ocean Optics HR4000CG spectrometer, the optical resolution is 0.75nm, the wavelength detection range is 200-1100 nm, during measurement, an optical fiber probe of the spectrometer is fixed right in front of the flexible plasma source and 1cm away from a discharge area formed by the plasma source, and is connected with a computer through a circuit to store and analyze the spectral data of the flexible plasma source, and the computer is shielded by a cube iron box in order to reduce the electromagnetic interference during discharge. The luminous image acquisition device adopts a Canon EOS6D digital camera, the Canon EOS6D digital camera is placed on the front surface of the electrode of the flexible plasma source, the lens of the digital camera is 15cm away from a discharge area formed by the plasma source, the lens model is EF100/28LMIS, and the camera parameters are set as follows: aperture value 4.0, exposure time 1/4s, sensitivity ISO 25600.

The temperature characteristic analysis part comprises an infrared thermal imager, in the embodiment, the infrared thermal imager is Fotric 223s and is fixed on the front surface of the flexible electrode device, an instrument probe is 7cm away from a discharge area and is used for collecting the surface temperature of the electrode during discharge, the temperature detection range is 0-350 ℃, and the measurement precision is +/-0.1 ℃.

The discharge parameter detection and acquisition system in the embodiment feeds back by collecting and analyzing data of the flexible plasma source discharge system, and adjusts discharge parameters to ensure human body contact safety.

The flexible plasma source characteristic analysis system of the embodiment is utilized to analyze the electrical characteristics, the optical characteristics and the thermal characteristics of the flexible plasma source, and the measured voltage and the measured current can clearly evaluate the discharge performance of the discharge plasma device under different operating parameters, and ensure that the current and the voltage generated by the discharge plasma are within the human body contact safety range under corresponding operating conditions.

The concentration and the type of the active particles in the discharge process can be represented by measuring capacitance and comparing the emission spectrum intensity, and the concentration of the active particles is continuously increased along with the increase of voltage as can be seen from a spectrogram. It can be clearly shown that different excitation sources produce emission spectra of different intensities at different applied voltages and frequencies. The emission spectrum intensity and the discharge power are important parameters of the application of the plasma in the biomedical field, the concentration and the reaction intensity of active ions generated in the discharge process are represented, and the research on the transmission charge quantity and the emission spectrum intensity under the conditions of different excitation sources and different applied voltages and frequencies has important significance.

The surface temperature measurement ensures the comfort and safety of human body contact.

The analysis object includes four flexible plasma sources: the number of the electrodes of the type I and the type II is 14, the length of a single electrode of the type I is 64mm, and the length of a single electrode of the type II is only 43.25 mm; the length of each of the second type and the third type is 43.25mm, but the number of the electrodes of the third type is 66; the type three is reduced by 0.5 in equal proportion into a type four, and the influence of the length, the width and the area of a single electrode strip on discharge is researched by respectively using the type one, the type two and the type three as well as the type three and the type four as three groups.

When the electrical characteristic analysis is carried out, microsecond pulse power supply excitation and nanosecond pulse power supply excitation are respectively adopted.

Analyzing by comparing the voltage current waveform, instantaneous power calculation, spectrogram measurement and temperature of the flexible plasma source discharge under nanosecond and microsecond pulse excitation respectively:

(1) the discharge of the flexible plasma source occurs from the end due to the polarity effect at the edge of the flexible electrode; the end part of the power supply is arc-shaped, so that the electric field intensity of the end part is greatly reduced, and the dielectric medium is not easy to break down.

(2) In a single pulse period, the flexible plasma source discharges once at the rising edge and the falling edge of the pulse respectively, and the maximum current difference between the rising edge and the falling edge is not large, which is probably caused by that after the discharge at the rising edge is finished, the charge on the electrode of the flexible plasma source is not dissipated in time, the conductance loss of the flexible plasma source is small, and not too much energy is lost.

(3) Instantaneous total power P_tTotal power P of air gap discharge_gTotal discharge power P of dielectric layer_dBoth increase with increasing applied voltage. Electrode strip length, electrode strip quantity and flexible electrode area all have certain influence to discharge power, and the concrete expression does: when the external power supply voltage, the electrode width and the number of the electrodes are fixed, the longer the electrode strip is, the larger the instantaneous power is; when the width and the length of the electrode strips are fixed, the number of the electrode strips is read, the higher the breakdown voltage is, and the higher the instantaneous power is.

(4) Under the condition of ensuring that the amplitude and the frequency of the applied voltage are the same, the power of the four types of reactors is between 25 and 35 percent; when the voltage amplitude is 4kV and the frequency is 1kHz, the discharge efficiency of the type one is 31.64 percent, and the discharge efficiency of the type two is 28.07 percent; at a voltage amplitude of 5kV and a frequency of 1kHz, the discharge efficiency of type three was 33.63%, and the discharge efficiency of type four was 33.96%.

(5) The discharge charge quantity of the flexible plasma source is also improved along with the improvement of the voltage and the frequency of an external power supply; under the condition that the external power supply voltage is the same, the transfer charge amount type is three, the type I, the type II and the type IV; when the amplitude of the power supply voltage is 4kV and the frequency is 1kHz, the maximum transmission charge quantity of the type I is 263nC, and the maximum transmission charge quantity of the type II is 238 nC; at a power supply voltage amplitude of 5kV and a frequency of 1kHz, the maximum amount of transferred charge of type three was 1110.6nC, and the maximum amount of transferred charge of type four was 211.6 nC.

(6) A second positive band spectral line of N2 generated by N2(C3 pi _ u) and N2(B3 pi _ g) transitions can be obviously observed in the emission spectrum of the flexible plasma source, and the emission spectrum is difficult to measure due to the low concentration of active particles generated by other molecular transitions; from the spectrogram, it can be seen that the particle concentration increases with increasing voltage and frequency.

(7) Under the condition that the room temperature is 26.3 ℃, by observing and recording the surface temperature of the flexible plasma source under the excitation of a 180s small microsecond pulse power supply, the surface temperature of the four reactors rapidly rises within the first 10s, slowly rises within 10s to 90s, and tends to be stable after 90s, and the highest temperature does not exceed 57 ℃.

According to the invention, the combination of the oscilloscope, the differential probe, the high-voltage probe and the current coil can convert the discharge intensity into specific digital information representation, so that the discharge characteristic, the optical characteristic, the spectral characteristic and the temperature characteristic of the flexible CDBD under different excitation sources can be accurately and efficiently analyzed.

The above-described embodiments are merely illustrative of the preferred embodiments of the present invention, and do not limit the scope of the present invention, and various modifications and improvements of the technical solutions of the present invention can be made by those skilled in the art without departing from the spirit of the present invention, and the technical solutions of the present invention are within the scope of the present invention defined by the claims.