阅读说明：本技术 一种提高牧草种子活力的方法 (Method for improving activity of grass seeds ) 是由 解继红 姚蒙 唐芳 弓艳春 刘亚玲 赵彦 于林清 贾振宇 张跃华 于静怡 于 2021-06-18 设计创作，主要内容包括：本发明公开了一种提高牧草种子活力的方法,包括以下步骤：(1)对种子进行预处理,得到预处理种子；(2)将预处理种子放入离子注入机中,并采用间歇式脉冲注入方式进行低能氮离子束的注入同时伴随有热效应和/或无热效应,控制低能氮的注入总剂量为(3000-8000)×2.6×10～(13)ions/cm～(2),能量为20-30keV,氮离子束流大小为10-15mA；本发明中通过利用低能氮离子注入技术,并控制有热或者无热效应能够进一步提高种子的质量及产量。(The invention discloses a method for improving the activity of grass seeds, which comprises the following steps: (1) pretreating seeds to obtain pretreated seeds; (2) the pre-treated seeds are put into an ion implanter, and the low-energy nitrogen ion beam is implanted by adopting an intermittent pulse implantation mode with a thermal effect and/or a non-thermal effect, and the total implantation dose of the low-energy nitrogen is controlled to be (3000- 13 ions/cm 2 The energy is 20-30keV, and the size of the nitrogen ion beam is 10-15 mA; the invention can further improve the quality and the yield of the seeds by utilizing the low-energy nitrogen ion implantation technology and controlling the thermal effect or the non-thermal effect.)

1. A method for improving the activity of grass seeds is characterized by comprising the following steps:

(1) pretreating seeds to obtain pretreated seeds;

(2) the pre-treated seeds are put into an ion implanter, and the low-energy nitrogen ion beam is implanted by adopting an intermittent pulse implantation mode with a thermal effect and/or a non-thermal effect, and the total implantation dose of the low-energy nitrogen is controlled to be (3000-¹³ions/cm²The energy is 20-30keV, and the size of the nitrogen ion beam is 10-15 mA.

2. A method for improving the activity of grass seeds as claimed in claim 1, wherein in the step (1), the pretreatment is carried out by the following specific operations: sieving seeds, sorting the seeds, removing impurity seeds, selecting full-grained forage grass seeds without diseases and insect pests, and naturally drying to obtain the pretreated seeds.

3. The method for improving the activity of grass seeds as claimed in claim 1, wherein in the step (2), the pulse dose of the intermittent pulse injection mode is (400-¹³ions/cm²The time interval between each implantation is 20-40s, and the vacuum degree during implantation is controlled at 1.0 × 10^-2-3.0×10^-2Pa。

4. The method for improving the seed vigor of pasture grass as claimed in claim 1, wherein the implantation of the low-energy nitrogen ion beam is performed while the thermal effect is generated, and the implantation dosage of the low-energy nitrogen is controlled to be (3000-5000) x 2.6 x 10¹³ions/cm²。

5. A method for increasing the seed vigor of pasture grass according to claim 1, wherein the implantation of the low energy nitrogen ion beam is performed without thermal effectsThe implantation dosage of the low-energy nitrogen is controlled to be (5000-¹³ions/cm²。

Technical Field

The invention relates to the technical field of pasture planting, in particular to a method for improving the activity of pasture seeds.

Background

There are many techniques for improving seed vigor and further achieving high yield by treating plant seeds with a physicochemical method. The traditional chemical substance seed treatment method comprises plant growth regulator treatment, trace element fertilizer treatment and chemical agent treatment (seed world, 2009.5, seed treatment method and application, plum loyalty and the like), the method is widely applied in the aspects of sterilization, disease prevention, seed vitality improvement, high yield and the like, but the chemical treatment method is easy to damage the soil environment.

With the development of modern science and technology, the technology of applying physical method to treat crop seeds to make the crop seeds have high yield and high quality is increasingly applied to agricultural production, and many studies at home and abroad show that: under certain conditions, various physical means are adopted to treat seeds before sowing, so that the seed vitality can be improved, the seed germination can be promoted, and the yield and the quality of crops can be improved (crop journal, 2008.6, research progress of seed physical treatment technology, Wangming and the like). The core of the treatment technology is mainly to use electric field, magnetic field, magnetized water, sound wave, laser, plasma, etc.

At present, the patented technologies in china are: electrostatic field seed treatment method, patent no: 87105063.3, respectively; the method for comprehensively treating seeds by a direct current electric field has the following patent numbers: 00135603.8, respectively; method for plasma treatment of crop seeds, patent No.: 02116968.3. the prior research results have the following technologies: the germination vigor and the germination rate are obviously improved by using the magnetized water to soak the wheat; the chlorophyll content of the seedling is increased, the water retention is enhanced, thereby being beneficial to forming strong seedlings and improving the wheat yield (northwest agricultural science, 1997, 6(4), the research of the magnetized water seed soaking on the physiological metabolism and yield increasing effect of the wheat, Zhao forest, etc.); the magnetic field treatment of corn, Chinese cabbage, green bean, tomato, soybean seeds can increase the yield (seed, 1985(2), influence of magnetic field on the growth of corn in seedling stage and economic character, chapter of name, physical report, 1992(12) application of magnetic technology to crop seeds, homomingxin, etc.). The wheat seeds are treated by ultrasonic wave, the germination rate and the emergence rate can be improved, the yield is increased by 8-10%, the cotton can be bolled out 3 days in advance after being treated by ultrasonic wave, and the boll-forming rate is improved (Zhejiang agricultural science, 1998.10(2), the biological effect of physical factor treatment on crop seeds, strong house and the like).

The biological effect of ion beam implantation can be divided into the following stages, (1) physical stage: the incident ions collide with the target atoms, resulting in atomic excitation, ionization and energy loss, and the slowed original man-shot ions are also deposited in Gaussian distribution. (2) A chemical stage: as the energy of the incident ions is transferred, the atoms are dissociated, and the incident ions are deposited, the energy exchanged with the target molecules is rapidly released, thereby forming an ionization peak (i.e., Bragg peak) having a relatively high ionization density. In this case, if the Bragg peak stays exactly on the genetic material of the organism, it causes DNA fragmentation, rearrangement, resulting in structural variation of the chromosome (i.e. chromosomal deletions, inversions, duplications and translocations) (3) biological stage: the molecular damage cannot be repaired by the metabolic function of the cell, showing the following biological effects: cell death, cell mutation, and genetic variation of progeny [7 ]. Compared with the above technologies, the ion beam implantation technology has many advantages, such as being accelerated or decelerated under the action of an electric field or a magnetic field to obtain different energies; it can be precisely controlled so that a parallel beam can be obtained, and also can be focused into a micro-beam; good straightness of the particle beam within the solid, etc. First, conventional radiation and ion implantation have energy effects, but they are deposited differently, and ion implantation has a peak (Bragg peak) whose position is controlled by the ion energy. In front of the peak, the target substance is less damaged, the back is not damaged. That is, damage to the organism by the implanted ions is localized, mainly causing displacement and rearrangement of target atoms, accompanied by the occurrence of cascade collisions. The energy deposition of the traditional radiation in the organism is mainly electron stopping power, and mainly causes ionization and excitation of target molecules and atoms. Calculations have shown that an incident ion of 30keV can cause a shift of several hundred atoms. In contrast, low-energy ions have more serious damage to biological tissues in the range and more obvious mutagenesis effect (Benzpo et al, 1999 Benzpo, Yuyuhong, Huyuping, Qin Guangyong, Zhao Weijuan, Sumingjie, 1999, biological effect and application of ion beams, university of Henan, 33 (2): 178-182); secondly, the ions have static mass and may react with surrounding biomolecules after being moderated to form new molecules or groups; thirdly, the ion beam has an etching effect. The etching is mainly caused by sputtering, and the sputtering belongs to a cold processing process, so that adjacent tissues or organelles cannot be injured, the traditional irradiation processing on cells belongs to an injurious hot processing effect, and the adjacent tissues or cells which are not irradiated are greatly injured, so that the processing effect of the charged ion beam on the cells is obviously better than that of the traditional irradiation on the cells; fourth, the ions are charged and exchange with the surface charges of the living being, causing a change in the electrical properties of the living being, and so on.

The pasture is the grass or other herbaceous plants eaten by the raised livestock, has strong regeneration capacity, can be harvested for many times in one year, is rich in various trace elements and vitamins, and therefore becomes the first choice for raising the livestock, and the quality of pasture varieties directly influences the economic benefit of animal husbandry and needs to be paid attention to; the quality of the pasture is influenced by various factors, and factors such as the quality of pasture seeds, the planting environment, the planting method and the like are important aspects; the quality of the grass seeds has a crucial effect on the quality of the pasture due to the carrying of the genetic genes of the pasture; therefore, how to provide a method for improving the activity of grass seeds is a problem which needs to be solved urgently by the technical personnel in the field.

Disclosure of Invention

In view of the above, the present invention provides a method for improving the seed vigor of pasture grasses, thereby improving the yield of pasture grasses.

In order to achieve the purpose, the invention adopts the following technical scheme: a method for improving the activity of grass seeds comprises the following steps:

(1) pretreating seeds to obtain pretreated seeds;

(2) the pre-treated seeds are put into an ion implanter, and the low-energy nitrogen ion beam is implanted by adopting an intermittent pulse implantation mode with a thermal effect and/or a non-thermal effect, and the total implantation dose of the low-energy nitrogen is controlled to be (3000-¹³ions/cm²The energy is 20-30keV, and the size of the nitrogen ion beam is 10-15 mA.

The invention has the beneficial effects that: the invention can further improve the quality and the yield of the seeds by utilizing the low-energy nitrogen ion implantation technology and controlling the thermal effect or the non-thermal effect.

The temperature of 80 ℃ reached when there was a thermal effect in the machine is due to the self-heating of the machine, the seeds obtained being blackened; when no heat effect exists, the obtained seeds maintain the original color.

Preferably, in step (1), the pretreatment specifically comprises: sieving seeds, sorting the seeds, removing impurity seeds, selecting full-grained forage grass seeds without diseases and insect pests, and drying the forage grass seeds in a natural environment to obtain the pretreated seeds.

Preferably, in the step (2), the pulse dose of the intermittent pulse implantation manner is (400-¹³ions/cm²The time interval between each implantation is 20-40s, and the vacuum degree during implantation is controlled at 1.0 × 10^-2-3.0×10^{- 2}Pa。

Preferably, when the implantation of the low-energy nitrogen ion beam is carried out while the thermal effect is accompanied, the implantation dosage of the low-energy nitrogen is controlled to be (3000-¹³ions/cm²。

Adopt above-mentioned technical scheme's beneficial effect: under the conditions, the pasture is sowed within one week after injection, the yield of the pasture is improved by 10-130%, the content of crude protein is improved by about 5-20%, and the content of crude fat is improved by 5-20%.

Preferably, when the implantation of the low-energy nitrogen ion beam is carried out without thermal effect, the implantation dosage of the low-energy nitrogen is controlled to be (5000-¹³ions/cm²。

Adopt above-mentioned technical scheme's beneficial effect: under the conditions, the yield of the roegneria kamoji is improved by 10 to 150 percent, the content of crude protein is improved by about 5 to 20 percent, and the content of crude fat is improved by 5 to 25 percent after the roegneria kamoji is sowed within one week after injection.

According to the technical scheme, compared with the prior art, the method for improving the activity of the grass seeds has the advantages of small physiological damage, wide mutation spectrum, high mutation frequency, certain repeatability and directionality; moreover, the forage grass seeds with excellent quality can be obtained, the quality and the yield of the forage grass planted subsequently can be improved, and better economic benefit can be obtained.

Detailed Description

The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.

Example 1

The method for improving the activity of the grass seeds comprises the following steps:

(1) screening the seeds of the Elymus mollis without the Gordon, sorting the seeds, removing the seeds with impurities, selecting the forage grass seeds with full grains and no plant diseases and insect pests, and drying to obtain dry seeds;

(2) adhering dry seed embryo to plate with double-sided adhesive in spiral outward rotation mode with the center of the plate as center, placing the plate with adhered dry seed into the target chamber of ion implanter for low-energy nitrogen ion beam implantation, performing low-energy nitrogen ion beam implantation in intermittent pulse implantation mode while controlling the low-energy nitrogen implantation dosage to be 5000 × 2.6 × 10¹³ions/cm²The energy is 25keV, and the size of the nitrogen ion beam is 12 mA; wherein the pulse dose of the intermittent pulse implantation method is 400 × 2.6 × 10¹³ions/cm²Interval time of each injection is 30s, vacuum during injectionDegree of 2.5X 10^-2Pa。

Example 2

The method for improving the activity of the grass seeds comprises the following steps:

(1) sieving the Jinbei Cherokee goosegrass seeds, sorting the seeds, removing the seeds with impurities, selecting the forage grass seeds with full grains and no plant diseases and insect pests, and drying to obtain dry seeds;

(2) adhering dry seed embryo to plate with double-sided adhesive in spiral outward turning mode with the center of the plate as center, placing the plate with adhered dry seed into the target chamber of ion implanter for low-energy nitrogen ion beam implantation, performing low-energy nitrogen ion beam implantation in intermittent pulse implantation mode while controlling the implantation dosage of low-energy nitrogen to 7000 × 2.6 × 10¹³ions/cm²The energy is 30keV, and the size of the nitrogen ion beam is 12 mA; wherein the pulse dose of the intermittent pulse implantation method is 600 × 2.6 × 10¹³ions/cm²The interval time between each injection is 30s, and the vacuum degree during injection is 2.0 multiplied by 10^-2Pa。

Example 3

The method for improving the activity of the grass seeds comprises the following steps:

(1) screening girdling No. 4 leymus chinensis seeds, sorting the seeds, removing the seeds with impurities, selecting the forage grass seeds with full grains and no plant diseases and insect pests, and drying to obtain dry seeds;

(2) adhering dry seed embryo to plate with double-sided adhesive in spiral outward rotation mode with the center of the plate as center, placing the plate with adhered dry seed into the target chamber of ion implanter for low-energy nitrogen ion beam implantation, performing low-energy nitrogen ion beam implantation in intermittent pulse implantation mode while controlling the implantation dosage of low-energy nitrogen at 8000 × 2.6 × 10¹³ions/cm²The energy is 20-30keV, and the size of the nitrogen ion beam is 15 mA; wherein the pulse dose of the intermittent pulse implantation method is 600 × 2.6 × 10¹³ions/cm²The interval time between each injection is 30s, and the vacuum degree during injection is 2.0 multiplied by 10^-2Pa。

Example 4

The method for improving the activity of the grass seeds comprises the following steps:

(1) screening the alfalfa seeds of No. 3 miscellaneous flowers in the grassland, sorting the seeds, removing light impurities mixed in the seeds, screening the seeds, removing the seeds with the impurities, selecting the forage grass seeds with full grains and no plant diseases and insect pests, and drying to obtain dry seeds;

(2) adhering dry seed embryo to plate with double-sided adhesive in spiral outward rotation mode with the center of the plate as the center, placing the plate with adhered dry seed into the target chamber of ion implanter for low-energy nitrogen ion beam implantation, performing low-energy nitrogen ion beam implantation in intermittent pulse implantation mode accompanied by heat effect, and controlling the implantation dosage of low-energy nitrogen to be 4000 × 2.6 × 10¹³ions/cm²The energy is 25keV, and the size of the nitrogen ion beam is 12 mA; wherein the pulse dose of the intermittent pulse implantation is 600, the implantation interval is 20s, and the vacuum degree is 1.6 × 10^-2Pa。

Example 5

The method for improving the activity of the grass seeds comprises the following steps:

(1) firstly, screening the seeds of the Pleioblastus Xinzhou, sorting the seeds, removing impurities with lighter weight mixed in the seeds, finally screening the seeds, removing the seeds with the impurities, selecting the forage grass seeds with full grains and no plant diseases and insect pests, and drying to obtain dry seeds;

(2) adhering dry seed embryo to plate with double-sided adhesive in spiral outward rotation mode with the center of the plate as center, placing the plate with adhered dry seed into the target chamber of ion implanter for low-energy nitrogen ion beam implantation, performing low-energy nitrogen ion beam implantation in intermittent pulse implantation mode with heat effect, and controlling the implantation dosage of low-energy nitrogen to 3000 × 2.6 × 10¹³ions/cm²The energy is 25keV, and the size of the nitrogen ion beam is 10-15 mA; wherein the pulse dose of the intermittent pulse implantation is 600, the implantation interval is 20s, and the vacuum degree is 1.6 × 10^-2Pa。

Example 6

The method for improving the activity of the grass seeds comprises the following steps:

(1) screening girald wildrye grass seeds No. 4, sorting the seeds, removing light impurities mixed in the seeds, screening the seeds, removing the seeds with the impurities, selecting forage grass seeds with full grains and no plant diseases and insect pests, and drying to obtain dry seeds;

(2) adhering seed embryo to a plate with double-sided adhesive in a spiral outward rotation mode with a dish core as a center, placing the plate with adhered grass dry seeds into a target chamber of an ion implanter for low-energy nitrogen ion beam implantation, performing low-energy nitrogen ion beam implantation in an intermittent pulse implantation mode with no thermal effect, and controlling the implantation dosage of low-energy nitrogen to be 8000 x 2.6 x 10¹³ions/cm²The energy is 20-30keV, and the size of the nitrogen ion beam is 10-15 mA; wherein the pulse dose of the intermittent pulse implantation is 400-600, the implantation interval time is 20-40s, and the vacuum degree during implantation is 1.0 × 10^-2-3.0×10^{- 2}Pa。

The results of the experiments on germination indices of the inventive examples and the control (without low energy nitrogen ion beam implantation) are shown in tables 1-6 below:

TABLE 1 influence of Low energy Nitrogen ion Beam implantation (no thermal Effect) on the Germination index of Elymus mongolicus

Treatment dosage	Control (0)	5000×2.6×1013ions/cm2	Increase the ratio
				Index of germination	14.2	15.68	10.42％

TABLE 2 influence of low-energy nitrogen ion beam implantation (no thermal effect) on germination index of Amur Centipedae

TABLE 3 influence of low-energy nitrogen ion beam implantation (no thermal effect) on Germination index of Gegen No. 4

Treatment dosage	Control (0)	8000×2.6×1013ions/cm2	Increase the ratio
				Index of germination	9.78	11.28	15.34％

TABLE 4 influence of Low energy Nitrogen ion Beam implantation (with thermal Effect) on the germination index of No. 3 Medicago sativa L.var.prairi

Treatment dosage	Control (0)	4000×2.6×1013ions/cm2	Increase the ratio
				Index of germination	16.47	17.52	6.38％

TABLE 5 Effect of Low energy Nitrogen ion Beam implantation (with thermal Effect) on the Germination index of Swisseria chensinensis

Treatment dosage	Control (0)	3000×2.6×1013ions/cm2	Increase the ratio
				Index of germination	15.88	17.42	9.70％

TABLE 6 influence of Low-energy Nitrogen ion Beam implantation (with thermal Effect) on Geum ruffii Georgi germination index

Treatment dosage	Control (0)	3000×2.6×1013ions/cm2	Increase the ratio
				Index of germination	15.55	18.31	17.75％

As can be seen from tables 1-6 above, the germination index was significantly improved after the low energy nitrogen ion beam implantation technique was used as compared to the control group.

The previous description of the disclosed embodiments is provided to enable any person skilled in the art to make or use the present invention. Various modifications to these embodiments will be readily apparent to those skilled in the art, and the generic principles defined herein may be applied to other embodiments without departing from the spirit or scope of the invention. Thus, the present invention is not intended to be limited to the embodiments shown herein but is to be accorded the widest scope consistent with the principles and novel features disclosed herein.