阅读说明：本技术 一种具有清洗装置的抛光机及其使用方法 (Polishing machine with cleaning device and using method thereof ) 是由 徐永亮 陈宇超 钱超 岳甫 刘彬 姜恒 于 2021-07-30 设计创作，主要内容包括：本申请的一种具有清洗装置的抛光机,抛光机包括相互对应的且均可转动的上抛光盘和下抛光盘,清洗装置包括设置在抛光机上且为中空结构的清洗柱,沿清洗柱的周向上设置有喷头组件,喷头组件与清洗柱连通,喷头组件的喷射方向朝向待清洗的抛光盘。本申请提供一种具有清洗装置的抛光机,能够对每个上抛光盘同时进行清洗,解决了人工刷洗上抛光盘时存在的费时费力、清洗不彻底的问题。本申请还提供了一种具有清洗装置的抛光机的使用方法,清洗过程由清洗程序控制清洗装置,启动清洗程序后自动开始清洗,清洗完成后自动停止,清洗期间设备无需人员看守,省时省力。(The application discloses burnishing machine with belt cleaning device, burnishing machine include mutual correspondence and equal rotatable last polishing dish and lower polishing dish, and belt cleaning device is provided with the shower nozzle subassembly including setting up on the burnishing machine and for hollow structure's washing post in the circumference along washing post, shower nozzle subassembly and washing post intercommunication, the abluent polishing dish is treated to the injection direction orientation of shower nozzle subassembly. The application provides a burnishing machine with belt cleaning device can wash simultaneously polishing dish on every, has solved the manual work and has scrubbed the problem that wastes time and energy, wash not thorough that exist when polishing dish. The application also provides a use method of the polishing machine with the cleaning device, the cleaning process is realized by controlling the cleaning device through the cleaning program, the cleaning process is automatically started after the cleaning program is started, the cleaning process is automatically stopped after the cleaning process is finished, the equipment does not need to be watched by personnel during the cleaning process, and time and labor are saved.)

1. The utility model provides a burnishing machine with belt cleaning device, burnishing machine is including mutual correspondence and all rotatable last polishing dish and lower polishing dish, its characterized in that, belt cleaning device is including setting up on the burnishing machine and for hollow structure's washing post, follow be provided with the shower nozzle subassembly in the circumference of washing post, the shower nozzle subassembly with wash the post intercommunication, the abluent polishing dish is treated to the injection direction orientation of shower nozzle subassembly.

2. The polisher of claim 1, wherein the cleaning column is disposed on the lower polishing plate and the spray direction of the spray head assembly is toward the upper polishing plate.

3. The polishing machine with a cleaning device according to claim 2, wherein the spray heads in each spray head assembly are distributed along the axial direction of the cleaning column.

4. The polishing machine with a cleaning device according to claim 3,

along the direction close to the lower polishing disk, the spray heads in the spray head assembly are a first spray head, a second spray head, a third spray head and a fourth spray head in sequence;

and a first circular area, a second circular area, a third circular area and a fourth circular area are sequentially arranged on the upper polishing disc along the center of the upper polishing disc in an outward extending manner, and the adjacent areas are partially overlapped.

The spraying direction of the first spray head faces to the third annular area of the upper polishing disc;

the spraying direction of the second spray head faces to the second circular ring area of the upper polishing disc;

the spraying direction of the third spray head faces the first circular area of the upper polishing disk;

the spraying direction of the fourth spray head faces the fourth annular area of the upper polishing disk.

5. The polishing machine with the cleaning device according to claim 4, wherein the included angle between the first spray head and the cleaning column is 10-80 degrees; the included angle between the second spray head and the cleaning column is 10-80 degrees; the included angle between the third spray head and the cleaning column is 10-80 degrees; the included angle between the fourth spray head and the cleaning column is 10-80 degrees.

6. The polishing machine with the cleaning device as claimed in any one of claims 1 to 5, wherein a valve is provided at an end of the cleaning column away from the lower polishing disk, and the valve and the polishing machine are electrically connected to a controller respectively, and the controller is used for controlling the opening and closing of the valve and the operation of the polishing machine.

7. The polishing machine with the cleaning device as claimed in claim 6, wherein a retainer ring is sleeved on the side surface of each upper polishing disk.

8. The polishing machine with a cleaning device as claimed in claim 6, wherein a gap is formed between the connection part of the cleaning column and the lower polishing disk, and the fluid for cleaning flows to the lower polishing disk through the gap after filling the cleaning column.

9. A method of using a polishing machine having a cleaning device, the method comprising:

lifting an upper polishing disk of the polishing machine to the top;

the controller starts a cleaning program to clean the polishing disc through the cleaning device;

and after the cleaning is finished, the polishing machine and the valve are automatically shut down.

10. The use method of the polishing machine with the cleaning device according to claim 9, wherein the cleaning program is a program preset in the controller; the cleaning program comprises any one or combination of any several of a first cleaning stage, a second cleaning stage, a third cleaning stage and a fourth cleaning stage, and a fifth cleaning stage;

the first cleaning stage: opening a valve, rotating the upper polishing disc clockwise at the rotating speed of 10-20rmp, and cleaning for 1-5 min;

the second cleaning stage: opening a valve, rotating the upper polishing disc clockwise at the rotating speed of 30-40rmp, and cleaning for 1-5 min;

the third cleaning stage: opening a valve, rotating the upper polishing disc anticlockwise at a rotating speed of 10-20rmp, and cleaning for 1-5 min;

the fourth cleaning stage: opening a valve, rotating the upper polishing disc anticlockwise at the rotating speed of 30-40rmp, and cleaning for 1-5 min;

the fifth cleaning stage: and closing the valve, rotating the upper polishing disc anticlockwise at the rotating speed of 5-10rmp, and cleaning for 0.2-1 min.

Technical Field

The application relates to the technical field of polishing machines, in particular to a polishing machine with a cleaning device and a using method thereof.

Background

Polishers are often used for mechanical polishing and waxing. The working principle is as follows: the motor drives the polishing discs which are arranged in the polishing machine and are opposite up and down to rotate at a high speed, and the polishing discs and the polishing agent act together and rub the surface to be polished, so that the aims of removing paint surface pollution, oxide layers and shallow marks can be fulfilled. The rotation speed of the polishing disk is generally 1500-3000r/min, and is mostly continuously variable, and can be adjusted at any time during construction according to requirements.

In the actual polishing process of workpieces, on one hand, the polishing disc easily generates chips in the polishing process, so that the pollution is caused to the surrounding environment, and part of the chips even adhere to the polishing disc, so that the polishing effect is poor, and the cleaning is difficult. On the other hand, polishing agent is generally used during polishing, and the polishing agent is easily adhered to a polishing disc and pollutes a workpiece to be polished next time if the workpiece is not cleaned timely.

The scheme for cleaning the polishing disc in the prior art is manual scrubbing: brushing the polishing disc by using a brush, and removing crystals in gaps of the polishing disc by using a cutter to ensure no crystals and no dirt; then the polishing disk is washed by a water gun, and the disk surface is touched and visually observed by hands to ensure that no fragments, crystals, hard substances or rust exists. The method has low automation control degree, wastes time and labor, and has dead angles in brushing and incomplete cleaning, thereby causing poor polishing quality.

Disclosure of Invention

The application provides a polishing machine with a cleaning device and a using method thereof, and aims to solve the problems of time and labor waste and incomplete cleaning existing when a polishing disc is manually brushed.

The technical scheme adopted by the application is as follows:

the utility model provides a burnishing machine with belt cleaning device, burnishing machine is including mutual correspondence and equal rotatable last polishing dish and lower polishing dish, including setting up on the burnishing machine and for hollow structure's washing post, follow be provided with the shower nozzle subassembly in the circumference of washing post, the shower nozzle subassembly with wash the post intercommunication, the polishing dish that washs is treated to the injection direction orientation of shower nozzle subassembly.

Further, the cleaning column is arranged on the lower polishing disk, and the spraying direction of the spray head assembly faces the upper polishing disk.

Further, the spray heads in each spray head assembly are distributed along the axial direction of the cleaning column.

Furthermore, along the direction close to the lower polishing disk, the spray heads in the spray head assembly are a first spray head, a second spray head, a third spray head and a fourth spray head in sequence;

and a first circular area, a second circular area, a third circular area and a fourth circular area are sequentially arranged on the upper polishing disc along the center of the upper polishing disc in an outward extending manner, and the adjacent areas are partially overlapped.

The spraying direction of the first spray head faces to the third annular area of the upper polishing disc;

the spraying direction of the second spray head faces to the second circular ring area of the upper polishing disc;

the spraying direction of the third spray head faces the first circular area of the upper polishing disk;

the spraying direction of the fourth spray head faces the fourth annular area of the upper polishing disk.

Furthermore, the included angle between the first spray head and the cleaning column is 10-80 degrees; the included angle between the second spray head and the cleaning column is 10-80 degrees; the included angle between the third spray head and the cleaning column is 10-80 degrees; the included angle between the fourth spray head and the cleaning column is 10-80 degrees.

Furthermore, a valve is arranged at one end, away from the lower polishing disc, of the cleaning column, the valve and the polishing machine are electrically connected with a controller respectively, and the controller is used for controlling the opening and closing of the valve and the operation of the polishing machine.

Furthermore, a retainer ring is sleeved on the side surface of each upper polishing disk.

Furthermore, a gap is formed between the connection part of the cleaning column and the lower polishing disc, and fluid for cleaning flows to the lower polishing disc through the gap after the cleaning column is filled with the fluid.

In another aspect, the present application also provides a method for using a polishing machine with a cleaning device, the method comprising:

lifting an upper polishing disk of the polishing machine to the top;

starting a cleaning program through a controller for cleaning;

and after the cleaning is finished, the polishing machine and the valve are automatically shut down.

Further, the cleaning program is a program preset in the controller; the cleaning program comprises any one or combination of any several of a first cleaning stage, a second cleaning stage, a third cleaning stage and a fourth cleaning stage, and a fifth cleaning stage;

the first cleaning stage: opening a valve, rotating the upper polishing disc clockwise at the rotating speed of 10-20rmp, and cleaning for 1-5 min;

the second cleaning stage: opening a valve, rotating the upper polishing disc clockwise at the rotating speed of 30-40rmp, and cleaning for 1-5 min;

the third cleaning stage: opening a valve, rotating the upper polishing disc anticlockwise at the rotating speed of 10-20rmp, and cleaning for 1-5 min;

the fourth cleaning stage: opening a valve, rotating the upper polishing disc anticlockwise at the rotating speed of 30-40rmp, and cleaning for 1-5 min;

the fifth cleaning stage: and closing the valve, rotating the upper polishing disc anticlockwise at the rotating speed of 5-10rmp, and cleaning for 0.2-1 min.

The technical scheme of the application has the following beneficial effects:

the application provides a burnishing machine with belt cleaning device can wash simultaneously polishing dish on every, has solved the manual work and has scrubbed the problem that wastes time and energy, wash not thorough that exist when polishing dish.

The use method of the polishing machine with the cleaning device is further provided, the cleaning device is controlled by the cleaning program in the cleaning process, the cleaning is automatically started after the cleaning program is started, the cleaning is automatically stopped after the cleaning is finished, the equipment does not need to be watched by personnel during the cleaning, and time and labor are saved.

Drawings

In order to more clearly explain the technical solution of the present application, the drawings needed to be used in the embodiments will be briefly described below, and it is obvious to those skilled in the art that other drawings can be obtained according to the drawings without creative efforts.

FIG. 1 is a schematic view of a polishing machine having a cleaning device according to the present embodiment;

FIG. 2 is a schematic structural diagram of a cleaning column according to the present embodiment;

FIG. 3 is a top view of the cleaning column provided in this embodiment;

FIG. 4 is a front view of the washing column provided in the present embodiment;

FIG. 5 is a schematic view of a polishing machine of the specific cleaning device provided in this embodiment during cleaning;

FIG. 6 is a schematic diagram illustrating the division of the upper polishing pad according to this embodiment;

fig. 7 is a flowchart of a cleaning method of the polishing machine of the specific cleaning device provided in this embodiment.

Illustration of the drawings:

wherein, 1-upper polishing disk, 11-first upper polishing disk, 12-second upper polishing disk, 13-third upper polishing disk, 14-fourth upper polishing disk;

2-lower polishing disk;

3-a cleaning column, 31-a first spray head assembly, 32-a second spray head assembly, 33-a third spray head assembly, 34-a fourth spray head assembly, and 35-a water inlet;

331-a first spray head, 332-a second spray head, 333-a third spray head, 334-a fourth spray head;

131-a first circular area, 132-a second circular area, 133-a third circular area, 134-a fourth circular area;

7-a retainer ring.

Detailed Description

Referring to fig. 1, a schematic diagram of a polishing machine with a cleaning device according to the present embodiment is shown; FIG. 2 is a schematic structural diagram of a cleaning column according to the present embodiment; FIG. 3 is a top view of the cleaning column provided in this embodiment; FIG. 4 is a front view of the washing column provided in the present embodiment; FIG. 5 is a schematic view of a polishing machine of the specific cleaning device provided in this embodiment during cleaning; FIG. 6 is a schematic diagram illustrating the division of the upper polishing pad according to this embodiment; fig. 7 is a flowchart of a cleaning method of the polishing machine of the specific cleaning device provided in this embodiment.

The polishing machine works on the principle that a motor drives a polishing disk which is arranged in the polishing machine and is opposite up and down to rotate at a high speed, such as an LED lining polishing machine for polishing an LED lining, a plane polishing machine for single-side grinding or polishing of silicon wafers, sapphire, glass, mechanical sealing parts, aluminum alloy, stainless steel appearance parts and the like. The polishing machine is generally composed of a plurality of upper polishing disks 1 and a lower polishing disk 2 which are symmetrically arranged, wherein the plane of the upper polishing disk 1 is corresponding to the upper and lower surfaces of the lower polishing disk 2.

The application provides a pair of burnishing machine with belt cleaning device, belt cleaning device is provided with the shower nozzle subassembly including setting up on the burnishing machine and for hollow structure's washing post 3 in the circumference along washing post 3, shower nozzle subassembly and washing 3 intercommunications of post, and the injection direction orientation of shower nozzle subassembly treats abluent polishing dish. When the spraying direction of the spray head component faces to the upper polishing disk 1, the upper polishing disk 1 can be cleaned; when the spraying direction of the spray head assembly faces the lower polishing disk 2, the lower polishing disk 2 can be cleaned. Also can set up two sets of shower nozzle subassemblies from top to bottom simultaneously on rinsing post 3, go up shower nozzle subassembly orientation polishing dish 1, lower shower nozzle subassembly orientation polishing dish 2 down. Or the spray head in the spray head assembly is rotatably connected with the cleaning column 3, and the spray head can be rotated according to actual conditions to adjust the spraying direction of the spray head assembly.

The present embodiment provides that the washing column 3 is disposed on the lower polishing platter 2 with the spray direction of the head assembly directed toward the upper polishing platter 1.

Referring to fig. 2 and 3, a plurality of nozzle assemblies are arranged along the circumferential direction of the cleaning column 3, and the number of the nozzle assemblies is the same as that of the upper polishing plates 1; each of the head assemblies corresponds to each of the upper polishing plates 1 one to one. For example, when there are four upper polishing disks 1 in the polishing machine, and thus there are four sets of head assemblies, the spraying directions of the four sets of head assemblies are respectively directed to the corresponding upper polishing disks 1, so that each upper polishing disk 1 can be cleaned.

In the embodiment, the spray heads in each spray head assembly are distributed along the axial direction of the cleaning column 3; the distance between the spray heads is equal. Referring to fig. 4 and 5, the dotted lines in fig. 5 indicate water jets ejected from the nozzles during cleaning. In order to enable the spray head assembly to perform overall dead-angle-free cleaning on the upper polishing disk 1, the spray heads in the spray head assembly are a first spray head 331, a second spray head 332, a third spray head 333 and a fourth spray head 334 in sequence along the direction close to the lower polishing disk 2. Referring to fig. 6, the spraying regions of the first, second, third and fourth spraying heads 331, 332, 333 and 334 correspond to the first, second, third and fourth circular regions 131, 132, 133 and 134 of the upper polishing platter 1, respectively, with a partial overlap between adjacent regions.

Further, the spraying direction of the first spraying head 331 is toward the third circular area 133 of the upper polishing disk 1, and the angle between the first spraying head 331 and the cleaning column 3 is 10-80 °.

The second spray head 332 sprays toward the second annular region 132 of the upper polishing platter 1, and the angle between the second spray head 332 and the cleaning column 3 is 10-80 °.

The third nozzle 333 is directed toward the first circular region 131 of the upper polishing platter 1, and the third nozzle 333 is formed at an angle of 10-80 ° with respect to the spin column 3.

In order to clean the side walls of the upper polishing disks 1, the present embodiment is provided with a retainer ring 7 on the side surface of each upper polishing disk 1. The fourth spray head 334 has a spray direction toward the fourth annular region 134 of the upper polishing platter 1. And the fourth spray head 334 forms an angle of 10-80 deg. with the washing column 3. Preferably, the retainer ring 7 is made of stainless steel. The diameter of each spray head is 0.5-10 mm. Preferably, the first circular area 131 is a circular area formed when the center of the polishing disc is the center of a circle and the diameter is 200 mm; the second circular ring area 132 takes the center of the polishing disk as the center of a circle, the diameter of the inner circle of the second circular ring area 132 is 150mm, and the diameter of the outer circle of the second circular ring area 132 is 350 mm; the third annular region 133 takes the center of the polishing disc as the center of a circle, the diameter of the inner circle of the third annular region 133 is 300mm, and the diameter of the outer circle of the third annular region 133 is 485 mm; the center of the polishing disc is taken as the center of the fourth annular area 134, the diameter of the inner circle of the fourth annular area 134 is 450mm, and the diameter of the outer circle of the fourth annular area 134 is 485 mm.

The above embodiment can realize the all-round cleaning of the upper polishing disk 1, and besides, the embodiment can also realize the cleaning of the lower polishing disk 2. The cleaning column 3 is arranged on the lower polishing disc 2, a gap is formed between the cleaning column 3 and the connecting part of the lower polishing disc 2, the cleaning column 3 is filled with cleaning fluid and then flows to the lower polishing disc 2 through the gap, and a water outlet hole is formed in the side wall of the lower polishing disc 2, so that the lower polishing disc 2 is cleaned.

Based on above embodiment, let in the rivers in to rinsing post 3, rivers spray through the shower nozzle of rinsing post 3 and go out, can realize carrying out the full aspect washing to last polishing dish 1 in the burnishing machine, and the shower nozzle of rinsing post 3 is along the circumference of rinsing post 3, the axial distributes, and the shower nozzle is the installation of angle, can guarantee that the region of shower nozzle water spray in local range does not have the space, guarantee that whole last polishing dish 1 can cover completely when the water spray, evenly wash, and simultaneously, the water in rinsing post 3 passes through under the space flow direction polishing dish 2, thereby the washing to whole polishing dish is realized.

In the embodiment, in order to realize automatic cleaning, a valve is arranged at one end of the cleaning column 3, which is far away from the lower polishing disc 2, and is used for controlling the water flow to enter and exit, the valve and the polishing machine are respectively and electrically connected with a controller, and the controller is used for controlling the opening and closing of the valve and the operation of the polishing machine. The controller is a PLC controller.

The present application also includes a method of using a polishing machine having a cleaning device, see fig. 7, comprising:

first, the upper polishing plate 1 of the polishing machine is raised to the top.

Then, the controller starts a cleaning program to clean the polishing disk through the cleaning device.

The cleaning program is a program preset in the controller. The cleaning program comprises any one or any combination of a first cleaning stage, a second cleaning stage, a third cleaning stage and a fourth cleaning stage, and a fifth cleaning stage.

A first cleaning stage: and opening the valve, rotating the upper polishing disc 1 clockwise at the rotating speed of 10-20rmp, and cleaning for 1-5 min.

And a second cleaning stage: and opening the valve, rotating the upper polishing disc 1 clockwise at the rotating speed of 30-40rmp, and cleaning for 1-5 min.

And a third cleaning stage: and opening the valve, rotating the upper polishing disc 1 anticlockwise at the rotating speed of 10-20rmp, and cleaning for 1-5 min.

And a fourth cleaning stage: and opening the valve, rotating the upper polishing disc 1 anticlockwise at the rotating speed of 30-40rmp, and cleaning for 1-5 min.

A fifth cleaning stage: and closing the valve, rotating the upper polishing disc 1 anticlockwise at the rotating speed of 5-10rmp, and cleaning for 0.2-1 min.

Preferably, the cleaning procedure in this embodiment sequentially performs cleaning according to a first cleaning stage, a second cleaning stage, a third cleaning stage, a fourth cleaning stage and a fifth cleaning stage, and in this embodiment, the preferred rotation speed of the first cleaning stage is 15rmp, and the preferred cleaning time is 1 min; in the embodiment, the preferred rotating speed of the second cleaning stage is 35rmp, and the preferred cleaning time is 1 min; in the embodiment, the preferred rotating speed of the third cleaning stage is 15rmp, and the preferred cleaning time is 1 min; in the embodiment, the preferable rotating speed of the fourth cleaning stage is 35rmp, and the preferable cleaning time is 1 min; the preferred speed of the fifth washing stage in this embodiment is 5rmp, with a preferred washing duration of 0.2 min.

And finally, automatically shutting down the polishing machine after cleaning.

In this embodiment, referring to fig. 1 and 5, the polishing machine has four upper polishing pads 1, a first upper polishing pad 11, a second upper polishing pad 12, a third upper polishing pad 13, a fourth upper polishing pad 14, and a lower polishing pad 2. When the four upper throwing closing discs are arranged in a rectangular shape in a pairwise opposite mode, the cleaning columns 3 are arranged on the lower polishing disc 2 and are opposite to the center of the rectangular shape, the four groups of spray head assemblies are distributed along the circumferential direction of the central column, and the included angle between the adjacent spray head assemblies is equal to the included angle between the diagonal lines of the rectangular shape.

The four sets of showerhead modules are a first showerhead module 31, a second showerhead module 32, a third showerhead module 33, and a fourth showerhead module 34, respectively. The spraying direction of the first spray head assembly 31 corresponds to the spraying direction of the first upper polishing disk 11, the spraying direction of the second spray head assembly 32 corresponds to the spraying direction of the second upper polishing disk 12, the spraying direction of the third spray head assembly 33 corresponds to the spraying direction of the third upper polishing disk 13, and the spraying direction of the fourth spray head assembly 34 corresponds to the spraying direction of the fourth upper polishing disk 14.

Each set of four spray heads, for example, the third spray head assembly 33 includes four spray heads, which are a first spray head 331, a second spray head 332, a third spray head 333, and a fourth spray head 334. The spraying direction of the first spray head 331 is toward the third circular area 133 of the third upper polishing pad 13; the second spray head 332 sprays toward the second annular region 132 of the third upper polishing disk 13; the third head 333 is directed toward the first circular area 131 of the third upper polishing platter 13; the fourth spray head 334 sprays in a direction toward the fourth annular region 134 of the third upper polishing disk 13.

The upper polishing disk 1 of the polishing machine is first raised to the top. And then the controller starts a cleaning program to clean the polishing disc through the cleaning device: the water valve is opened, and cleaning water is introduced from the water inlet 35 of the cleaning column 3, and the water pressure is 0.6KGf/cm²The above. After the cleaning water is filled in the cavity of the cleaning column 3, the four nozzles of the first nozzle assembly 31 are aligned to correspond to the first upper polishing plate 11 for cleaning, meanwhile, the four nozzles of the second nozzle assembly 32 are aligned to the second upper polishing plate 12 for cleaning, meanwhile, the four nozzles of the third nozzle assembly 33 are aligned to the third upper polishing plate 13 for cleaning, and meanwhile, the four nozzles of the fourth nozzle assembly 34 are aligned to the fourth upper polishing plate 14 for cleaning.

In the cleaning process, the four upper polishing disks are rotated at the process speed of 5rmp-50rpm through the controller, so that the water column can be cleaned through the whole circular surface of the upper polishing disk, and the problem of cleaning dead angles is effectively solved; different washing effects can be brought by different rotating speeds, so that fragments, crystals, hard matters and rust on the lower surface of the upper polishing disc can be fully washed; the whole cleaning process is controlled by a PLC program, the cleaning water flow and the upper disc polishing disc run according to a set process after the cleaning mode is started, the cleaning can be started automatically, and the cleaning is stopped automatically after the cleaning is finished. During cleaning, workers can perform other operations, and the equipment does not need to be watched by personnel.

The embodiments provided in the present application are only a few examples of the general concept of the present application, and do not limit the scope of the present application. Any other embodiments extended according to the scheme of the present application without inventive efforts will be within the scope of protection of the present application for a person skilled in the art.