阅读说明：本技术 一种基于RGBW的Micro-LED制备系统 (Micro-LED preparation system based on RGBW ) 是由 张永爱 范贵星 周雄图 吴朝兴 林坚普 林志贤 郭太良 于 2021-01-27 设计创作，主要内容包括：本发明提出一种基于RGBW的Micro-LED制备系统,包括显影机、刻蚀机、光源模组,还包括在光源模组发光方向上顺序设置的掩膜版和覆有光刻胶的阵列基板；光源模组包括四组光源,每组光源对应显示像素内的一个子像素结构,掩膜版包括多个透光区,每个透光区的中心在阵列基板上的投影均位于与该透光区相对应的子像素结构的中心；当对光刻胶曝光时,四组光源同时透过掩膜版透光区对子像素结构处的光刻胶进行曝光,各组光源的曝光光照强度、曝光光照时长根据与该光源对应的子像素结构需填充的量子点胶体体积决定；显影机、刻蚀机对曝光后的阵列基板进行后续加工以使储液槽成型；本发明可解决由于对量子点的封胶厚度不同导致子像素发光亮度不均衡的问题。(The invention provides an RGBW-based Micro-LED preparation system, which comprises a developing machine, an etching machine, a light source module, a mask plate and an array substrate, wherein the mask plate and the array substrate are sequentially arranged in the light emitting direction of the light source module; the light source module comprises four groups of light sources, each group of light sources corresponds to one sub-pixel structure in the display pixel, the mask comprises a plurality of light-transmitting areas, and the projection of the center of each light-transmitting area on the array substrate is positioned at the center of the sub-pixel structure corresponding to the light-transmitting area; when the photoresist is exposed, the four groups of light sources simultaneously penetrate through the light-transmitting area of the mask plate to expose the photoresist at the sub-pixel structure, and the exposure illumination intensity and the exposure illumination duration of each group of light sources are determined according to the volume of the quantum dot colloid to be filled in the sub-pixel structure corresponding to the light source; the developing machine and the etching machine carry out subsequent processing on the exposed array substrate so as to form a liquid storage tank; the invention can solve the problem of unbalanced brightness of the sub-pixels caused by different sealing glue thicknesses of the quantum dots.)

1. The utility model provides a Micro-LED preparation system based on RGBW for prepare the reservoir in four sub-pixel structures in the Micro-LED display pixel on array substrate which characterized in that: the preparation system comprises a developing machine, an etching machine, a light source module for photoresist exposure, a mask plate and an array substrate, wherein the mask plate and the array substrate are sequentially arranged in the light emitting direction of the light source module; the light source module comprises four groups of light sources with different light directions, each group of light sources corresponds to one sub-pixel structure in the display pixel, the mask comprises a plurality of light-transmitting areas, and under the irradiation of the light source module, the projection of the center of each light-transmitting area on the array substrate is positioned at the center of the sub-pixel structure corresponding to the light-transmitting area; when the photoresist is exposed, the four groups of light sources simultaneously penetrate through the light transmission area of the mask plate to expose the photoresist at the sub-pixel structure of the array substrate, and the exposure illumination intensity and the exposure illumination duration of each group of light sources are determined according to the volume of the quantum dot glue body to be filled in the sub-pixel structure corresponding to the light source; and the developing machine and the etching machine carry out subsequent processing on the exposed array substrate so as to form the liquid storage tank.

2. The RGBW-based Micro-LED fabrication system of claim 1, wherein: the four sub-pixel structures are a red sub-pixel, a green sub-pixel, a blue sub-pixel and a white sub-pixel which are filled with sub-point colloids with different volumes; each sub-pixel structure comprises a liquid storage tank, a UV-LED is arranged below each liquid storage tank, and quantum dot colloid is filled in each liquid storage tank;

the length and width of each sub-pixel are respectively a first lengthAnd a first widthAmong said sub-pixels in the same said display pixelThe gap therebetween is the first gap；

The included angles between the incident directions of the four groups of light sources and the array substrate are equal to be a first angle；

When the photo-etching machine is exposed, because the exposure illumination intensity and the exposure illumination duration of the photo-etching glue at the red sub-pixel, the green sub-pixel, the blue sub-pixel and the white sub-pixel are different, the depths of the finally formed liquid storage grooves in the red sub-pixel, the green sub-pixel, the blue sub-pixel and the white sub-pixel are different.

3. An RGBW based Micro-LED fabrication system according to claim 2, wherein: the first angleThe first distanceThe first lengthThe first widthAnd the first gapHas the advantages ofThe relationship (2) of (c).

4. RGBW based Micro-LED preparation according to claim 2A system, characterized by: when the first distance d between the mask plate and the array substrate is kept unchanged by controlling the mask plate, the incident directions of four groups of light source rays can be adjusted by controlling the light source module, and the first angle is changedAnd respectively exposing different sub-pixels in the display pixels by the four groups of light sources.

5. An RGBW based Micro-LED fabrication system according to claim 2, wherein: when the light source module is controlled, the incident directions of the four groups of light source rays are kept unchanged, namely, the first angle is enabled to be the sameWhen the light source is kept unchanged, the first distance d between the mask and the array substrate can be adjusted by controlling the mask, so that the four groups of light sources respectively expose different sub-pixels in the display pixels.

6. An RGBW based Micro-LED fabrication system according to claim 2, wherein: in the light source light direction, the four sub-pixel structures included by the display pixel are rectangles with equal size, and the sizes of the sub-pixels and the corresponding light-transmitting areas on the mask are the same.

7. The RGBW-based Micro-LED fabrication system of claim 1, wherein: the photoresist is a positive photoresist; the developing machine can spray developing solution to the exposed array substrate to dissolve the exposed photoresist; the etching machine can etch the array substrate processed by the developing machine, so that liquid storage tanks with different depths are formed in the four sub-pixel structures in the display pixel.

8. The RGBW-based Micro-LED fabrication system of claim 1, wherein: the preparation system further comprises a loading platform for loading the array substrate, a mask plate module for fixing the mask plate, a dryer for drying the array substrate, a UV-LED mounting module for mounting a UV-LED at the bottom of the liquid storage tank, a quantum dot colloid packaging module for adding quantum dot colloid with the volume corresponding to the depth of the liquid storage tank into the liquid storage tank, and a glue sealing module for sealing the groove opening of the liquid storage tank with glue.

9. An RGBW based Micro-LED fabrication system according to claim 8, wherein: when the liquid storage tank notch is subjected to glue sealing treatment, the thickness of the glue sealing layer at each liquid storage tank notch is the same.

10. The RGBW-based Micro-LED fabrication system of claim 1, wherein: the display pixels are arranged in a longitudinal and transverse array mode at the array substrate; in each display pixel, the distribution positions of the sub-pixel structures of different colors are the same.

Technical Field

The invention relates to the technical field of displays, in particular to an RGBW-based Micro-LED preparation system.

Background

Micro-LEDs (Micro light emitting diodes) are a new generation of display technology, with higher brightness, better light emitting efficiency, but lower power consumption than existing OLED (organic light emitting diode) technologies. According to the Micro-LED technology, the LED structure is designed to be thin-film, Micro-miniature and arrayed, and the size of the Micro-LED is only about 1-10 mu m. The Micro-LED has the greatest advantages of micron-scale spacing, addressing control and single-point drive luminescence of each pixel (pixel), long service life and wide application range.

Compared with the traditional RGB display screen, the RGBW display screen comprises a white (W) sub-pixel besides a red (R), a green (G) and a blue (B) sub-pixel, and the transmittance of an LCD, the luminous efficiency of an OLED display unit area and the like can be greatly improved by adding the white sub-pixel, so that the purposes of low power consumption, energy conservation and environmental protection can be realized.

Quantum dots QDs are semiconductor nanoparticles composed of group II-VI or III-V elements, typically ranging in size from a few nanometers to tens of nanometers. Due to the existence of quantum confinement effect, the originally continuous energy band of the quantum dot material is changed into a discrete energy level structure, and the quantum dot material can emit visible light after being excited by the outside. The quantum dot material has a smaller full width at half maximum of a light-emitting peak, and the light-emitting color can be adjusted through the size, structure or components of the quantum dot material, so that the color saturation and color gamut can be improved when the quantum dot material is applied to the Micro-LED display field. Due to the characteristics of quantum dot materials, the quantum dot materials are often applied to Micro-LEDs as light-emitting crystal grains.

In quantum dot packaging, liquid storage tanks (grooves) with the same size are generally adopted when the quantum dots corresponding to the four colors of red, green, blue and white are packaged, but the quantum dot colloid packaging amounts corresponding to different colors are different, so that when the liquid storage tanks are sealed with glue, the sealing glue thickness is different, further, the light-emitting brightness of the sub-pixels with different colors is unbalanced, and the display effect is poor.

Disclosure of Invention

The invention provides an RGBW-based Micro-LED preparation system which can solve the problem of unbalanced brightness of sub-pixels caused by different sealing thicknesses of quantum dots.

The invention adopts the following technical scheme.

A Micro-LED preparation system based on RGBW is used for preparing liquid storage tanks in four sub-pixel structures in Micro-LED display pixels on an array substrate, and comprises a developing machine, an etching machine, a light source module used for photoresist exposure, a mask plate and the array substrate, wherein the mask plate and the array substrate are sequentially arranged in the light emitting direction of the light source module; the light source module comprises four groups of light sources with different light directions, each group of light sources corresponds to one sub-pixel structure in the display pixel, the mask comprises a plurality of light-transmitting areas, and under the irradiation of the light source module, the projection of the center of each light-transmitting area on the array substrate is positioned at the center of the sub-pixel structure corresponding to the light-transmitting area; when the photoresist is exposed, the four groups of light sources simultaneously penetrate through the light transmission area of the mask plate to expose the photoresist at the sub-pixel structure of the array substrate, and the exposure illumination intensity and the exposure illumination duration of each group of light sources are determined according to the volume of the quantum dot glue body to be filled in the sub-pixel structure corresponding to the light source; and the developing machine and the etching machine carry out subsequent processing on the exposed array substrate so as to form the liquid storage tank.

The four sub-pixel structures are a red sub-pixel, a green sub-pixel, a blue sub-pixel and a white sub-pixel which are filled with sub-point colloids with different volumes; each sub-pixel structure comprises a liquid storage tank, a UV-LED is arranged below each liquid storage tank, and quantum dot colloid is filled in each liquid storage tank;

the length and width of each sub-pixel are respectively a first lengthAnd a first widthThe gap between the sub-pixels in the same display pixel is a first gap；

The included angles between the incident directions of the four groups of light sources and the array substrate are equal to be a first angle；

When the photo-etching machine is exposed, because the exposure illumination intensity and the exposure illumination duration of the photo-etching glue at the red sub-pixel, the green sub-pixel, the blue sub-pixel and the white sub-pixel are different, the depths of the finally formed liquid storage grooves in the red sub-pixel, the green sub-pixel, the blue sub-pixel and the white sub-pixel are different.

The first angleThe first distanceThe first lengthThe first widthAnd the first gapHas the advantages ofThe relationship (2) of (c).

When the first distance d between the mask plate and the array substrate is kept unchanged by controlling the mask plate, the incident directions of four groups of light source rays can be adjusted by controlling the light source module, and the first angle is changedAnd respectively exposing different sub-pixels in the display pixels by the four groups of light sources.

When the light source module is controlled, the incident directions of the four groups of light source rays are kept unchanged, namely, the first angle is enabled to be the sameWhen the light source is kept unchanged, the first distance d between the mask and the array substrate can be adjusted by controlling the mask, so that the four groups of light sources respectively expose different sub-pixels in the display pixels.

In the light source light direction, the four sub-pixel structures included by the display pixel are rectangles with equal size, and the sizes of the sub-pixels and the corresponding light-transmitting areas on the mask are the same.

The photoresist is a positive photoresist; the developing machine can spray developing solution to the exposed array substrate to dissolve the exposed photoresist; the etching machine can etch the array substrate processed by the developing machine, so that liquid storage tanks with different depths are formed in the four sub-pixel structures in the display pixel.

The preparation system further comprises a loading platform for loading the array substrate, a mask plate module for fixing the mask plate, a dryer for drying the array substrate, a UV-LED mounting module for mounting a UV-LED at the bottom of the liquid storage tank, a quantum dot colloid packaging module for adding quantum dot colloid with the volume corresponding to the depth of the liquid storage tank into the liquid storage tank, and a glue sealing module for sealing the groove opening of the liquid storage tank with glue.

When the liquid storage tank notch is subjected to glue sealing treatment, the thickness of the glue sealing layer at each liquid storage tank notch is the same.

The display pixels are arranged in a longitudinal and transverse array mode at the array substrate; in each display pixel, the distribution positions of the sub-pixel structures of different colors are the same.

The invention has the beneficial effects that:

1. under the condition of keeping the relative position of the mask and the array substrate unchanged, the four groups of light sources provided by the light source module expose the sub-pixels with different colors through the light-transmitting area of the mask at the same time. The invention can complete the exposure of all sub-pixels without contraposition by maintaining the relative positions of the mask and the array substrate, thereby avoiding incomplete exposure caused by contraposition errors.

2. The invention is based onCan adjust the first distanceOr a first angleSo that four groups of light sources expose different groups of sub-pixels. Thereby ensuring the accuracy of sub-pixel exposure.

3. Each display pixel comprises a red sub-pixel, a green sub-pixel, a blue sub-pixel and a white sub-pixel, the red sub-pixel, the green sub-pixel, the blue sub-pixel and the white sub-pixel respectively correspond to four groups of light sources with different incidence directions, and the illumination intensity and the illumination time of each group of light sources are determined according to the volume of quantum dot glue bodies needing to be filled in the sub-pixels with the colors corresponding to the group of light sources. The photoresist has different solubility in the developing solution due to different illumination intensity and illumination time, and the characteristics can ensure that the depths formed by the liquid storage tanks corresponding to different groups of light sources during etching are different.

In summary, the system of the invention provides four groups of light sources with different illumination intensities and illumination times at the same time to expose the four sub-pixels with different colors, and then the four sub-pixels are developed and etched by the developing machine and the etching machine to form four liquid storage tanks with different depths, so that the liquid storage tanks of the sub-pixels with different colors can package quantum dot colloids with corresponding volumes, the sealing glue thickness of each liquid storage tank can be ensured to be consistent, the balance of the light-emitting brightness of the sub-pixels is improved, and the display effect is improved.

The invention can effectively solve the problem of unbalanced brightness of the sub-pixels caused by different sealing adhesive thicknesses of the quantum dots, and in addition, the Micro-LED based on the RGBW is beneficial to displaying with higher brightness in an outdoor environment by adding the white pixels, thereby improving the watching adaptability of users.

Drawings

The invention is described in further detail below with reference to the following figures and detailed description:

FIG. 1 is a schematic structural diagram of a Micro-LED manufacturing system based on RGBW according to an embodiment of the present invention;

FIG. 2 is a schematic diagram of a three-dimensional structure of a Micro-LED according to an embodiment of the present invention;

FIG. 3 is a schematic plane structure diagram of a Micro-LED according to an embodiment of the present invention;

FIG. 4 isA first length provided by one embodiment of the present inventionFirst widthFirst gap, first gapFirst angle ofAnd a first distanceThe solving of the relation between the two is shown schematically;

FIG. 5 is a schematic diagram of a relationship between a sub-pixel and a transparent region according to an embodiment of the present invention;

FIG. 6 is a schematic diagram of a three-dimensional structure of a Micro-LED in the prior art according to an embodiment of the present invention;

FIG. 7 is a schematic plane structure diagram of a Micro-LED in the prior art according to an embodiment of the present invention.

In the figure: 101-a light source module; 102-a mask plate; 103-a loading platform; 104-an array substrate; 105-a developing machine; 106-etching machine;

201-red sub-pixel; 202-green sub-pixel; 203-blue sub-pixel; 204-white sub-pixel; 205-display pixels;

301-an adhesive sealing layer, 302-a liquid storage tank, 303-a UV-LED, 304-an array substrate covered with the adhesive sealing layer;

501-a light-transmitting area; 502-subpixel architecture;

601-reservoir in traditional technology; 602-array substrate in conventional technology;

701-a sealant layer in the traditional technology; 702-reservoir in conventional technology; 703-UV-LEDs in conventional technology.

Detailed Description

The present example discloses a Micro-LED manufacturing system based on RGBW, and those skilled in the art can refer to the contents and appropriately modify the technical details to realize the purpose. It is expressly intended that all such similar substitutes and modifications which would be obvious to one skilled in the art are deemed to be included in the invention. While the methods and applications of this invention have been described in terms of preferred embodiments, it will be apparent to those of ordinary skill in the art that variations and modifications in the methods and applications described herein, as well as other suitable variations and combinations, may be made to implement and use the techniques of this invention without departing from the spirit and scope of the invention.

In Micro-LED display equipment in the prior art, quantum dots corresponding to different color sub-pixels generate different light absorption energies with the same brightness, so that quantum dot colloids with different body types are required to be adopted for enabling the sub-pixels with different colors to emit light uniformly. However, in the conventional technology, each reservoir of the Micro-LED array substrate is generally the same in size, as shown in fig. 6, 601 in fig. 6 is the reservoir, and 602 is the array substrate. The liquid storage tanks with the same size can be used for ensuring that the thicknesses of the liquid storage tanks of the sub-pixels with different colors are not consistent when the liquid storage tanks are sealed with glue, as shown in fig. 7, wherein 701 is a sealing glue layer, 702 is the liquid storage tank, and 703 is the UV-LED in fig. 7. The different sealing glue thickness leads to different brightness of quantum dots after the quantum dots emit light through the sealing glue layer, so that the luminance of the sub-pixels with different colors is not balanced, and the display effect is poor.

In this embodiment, as shown in the figure, the system for manufacturing Micro-LEDs based on RGBW is used for manufacturing the liquid storage tanks 302 in the four sub-pixel structures 502 in the Micro-LED display pixels 205 on the array substrate, and includes a developing machine 105, an etching machine 106, a light source module 101 for exposing photoresist, a mask plate 102 and an array substrate 104 coated with photoresist, which are sequentially arranged in the light emitting direction of the light source module; the light source module comprises four groups of light sources with different light directions, each group of light sources corresponds to one sub-pixel structure in a display pixel, the mask comprises a plurality of light-transmitting areas 501, and under the irradiation of the light source module, the projection of the center of each light-transmitting area on the array substrate is positioned at the center of the sub-pixel structure corresponding to the light-transmitting area; when the photoresist is exposed, the four groups of light sources simultaneously penetrate through the light transmission area of the mask plate to expose the photoresist at the sub-pixel structure of the array substrate, and the exposure illumination intensity and the exposure illumination duration of each group of light sources are determined according to the volume of the quantum dot glue body to be filled in the sub-pixel structure corresponding to the light source; and the developing machine and the etching machine carry out subsequent processing on the exposed array substrate so as to form the liquid storage tank.

The four sub-pixel structures are a red sub-pixel 201, a green sub-pixel 202, a blue sub-pixel 203 and a white sub-pixel 204 which are filled with sub-dot colloids with different volumes; each sub-pixel structure comprises a liquid storage tank, a UV-LED303 is arranged below each liquid storage tank, and quantum dot colloid is filled in each liquid storage tank;

the length and width of each sub-pixel are respectively a first lengthAnd a first widthThe gap between the sub-pixels in the same display pixel is a first gap；

The included angles between the incident directions of the four groups of light sources and the array substrate are equal to be a first angle；

When the photo-etching machine is exposed, because the exposure illumination intensity and the exposure illumination duration of the photo-etching glue at the red sub-pixel, the green sub-pixel, the blue sub-pixel and the white sub-pixel are different, the depths of the finally formed liquid storage grooves in the red sub-pixel, the green sub-pixel, the blue sub-pixel and the white sub-pixel are different.

It should be noted that the color presented by each sub-pixel is determined by the filled quantum dots. The quantum dots can emit colored light when being stimulated by light or electricity, the color of the light is determined by the composition material and the size and the shape of the quantum dots, the larger the general particle is, the longer the particle can absorb, and the smaller the particle is, the shorter the particle can absorb. The quantum dots with the size of 8 nanometers can absorb red of long wave and show blue, and the quantum dots with the size of 2 nanometers can absorb blue of short wave and show red. This property enables the quantum dots to change the color of light emitted by the light source. The quantum dots corresponding to the sub-pixels of different colors are also different in size. The white light emitted by the white sub-pixel is composite light, so that quantum dots with different sizes are filled in quantum dot colloid filled in a liquid storage tank of the white sub-pixel. Photoresist is an organic compound that changes solubility in a developing solution after exposure to ultraviolet light. A positive photoresist is a type of photoresist in which, after exposure, exposed portions are soluble in a developing solution and unexposed portions are insoluble. The solubility of the positive photoresist adopted by the embodiment of the invention in the developing solution is improved along with the increase of the illumination intensity and the illumination time.

Under the condition of maintaining the relative position of the mask and the array substrate 104 unchanged, the four groups of light sources provided by the light source module 101 pass through the light-transmitting area of the mask at the same time to expose the sub-pixels with different colors, and the illumination intensity and the illumination time of each group of light sources are determined according to the volume of the quantum dot glue body to be filled in the sub-pixels with the colors corresponding to the group of light sources.

It should be noted that, by maintaining the relative position between the mask and the array substrate 104 unchanged, the problem that the sub-pixel part region is repeatedly exposed or not exposed due to the alignment error of exposing the sub-pixels with different colors by moving the mask can be solved. Four groups of light sources with different incidence directions are adopted to simultaneously penetrate through the light-transmitting area of the mask plate to expose the sub-pixels of different groups. Therefore, the exposure of all the sub-pixels can be completed by only one-time irradiation, so that the exposure efficiency is improved, and the productivity is improved.

In addition, because the quantum dots of the sub-pixels with different colors are irradiated by the UV-LED with the same power to produce the same brightness, the quantum dots are required to be different, namely the quantum dots are different in volume. Therefore, under the condition that the volumes of the quantum dot colloids are different, the sealant layers of the sub-pixels with different colors are required to be the same, and the depths of the liquid storage tanks for loading the quantum dot colloids are required to be different. The solubility of the photoresist adopted by the embodiment of the invention in the developing solution is increased along with the increase of the illumination intensity and the illumination time, and the photoresist can be exposed by utilizing light sources with different illumination time and illumination intensity according to the characteristic, so that liquid storage tanks with different depths are etched. In summary, the invention determines how deep the liquid storage tank is used according to the volume of the quantum dot colloid corresponding to the sub-pixels with different colors, and then determines the irradiation intensity and the irradiation time of the light source according to the depth of the liquid storage tank.

The first angleThe first distanceThe first lengthThe first widthAnd the first gapHas the advantages ofThe relationship (2) of (c).

When the first distance d between the mask plate and the array substrate is kept unchanged by controlling the mask plate, the incident directions of four groups of light source rays can be adjusted by controlling the light source module, and the first angle is changedAnd respectively exposing different sub-pixels in the display pixels by the four groups of light sources.

When the light source module is controlled, the incident directions of the four groups of light source rays are kept unchanged, namely, the first angle is enabled to be the sameWhen the light source is kept unchanged, the first distance d between the mask and the array substrate can be adjusted by controlling the mask, so that the four groups of light sources respectively expose different sub-pixels in the display pixels.

In the light source light direction, the four sub-pixel structures included by the display pixel are rectangles with equal size, and the sizes of the sub-pixels and the corresponding light-transmitting areas on the mask are the same.

The photoresist is a positive photoresist; the developing machine can spray developing solution to the exposed array substrate to dissolve the exposed photoresist; the etching machine can etch the array substrate processed by the developing machine, so that liquid storage tanks with different depths are formed in the four sub-pixel structures in the display pixel.

Alternatively, as shown in fig. 1, the exposed array substrate 104 may pass through the developing machine 105 and the etching machine 106 once to complete the development etching by moving the loading platform 103.

Optionally, in a specific embodiment, the quantum dot colloids corresponding to the red, green, blue, and white sub-pixels generate light with the same brightness, and the volume of the quantum dot colloid is required: red subpixel < white subpixel < green subpixel < blue subpixel.

Four groups of light sources with different incident directions respectively comprise: the light source comprises a first light source, a second light source, a third light source and a fourth light source, wherein the first light source exposes the red sub-pixel, the second light source exposes the green sub-pixel, the third light source exposes the blue sub-pixel, and the fourth light source exposes the white sub-pixel.

When the illumination time of the first light source, the second light source, the third light source and the fourth light source is the same, the illumination intensity is as follows: first light source < fourth light source < second light source < third light source.

When the illumination intensities of the first light source, the second light source and the third light source are the same, the illumination time is as follows: first light source < fourth light source < second light source < third light source.

When the illumination time and the illumination intensity are different, after the illumination of four groups of light sources, the solubility of the photoresist on each color sub-pixel needs to be ensured: red subpixel < white subpixel < green subpixel < blue subpixel.

Optionally, the first lengthFirst widthFirst gap, first gapFirst angle ofAnd a first distanceThe relation betweenCan be obtained as shown in fig. 4, a is the center of the light-transmitting region, B is the center of a certain sub-pixel, 0 is the center of the display pixel, AO is the first distanceAngle AB0 is a first angle(ii) a ThenAnd is(ii) a Thus, it is possible to provide。

Optionally, controlling the mask to keep a first distance d between the mask and the array substrate 104 unchanged; the light source module 101 is controlled to adjust the incident directions of the four light sources, and the first angle is changed to expose the sub-pixels of different groups by the four light sources.

It should be noted that, by adjusting four groups of light sources to expose sub-pixels of different groups, it is avoided that the exposure effect is deteriorated because the light-transmitting area cannot correspond to each display pixel due to moving the mask 102.

Optionally, the light source module 101 is controlled to keep the incident directions of the four groups of light sources unchanged, so that the first angle is kept unchanged; and controlling the mask, and adjusting a first distance d between the mask and the array substrate 104 to expose the sub-pixels of different groups by the four groups of light sources.

It should be noted that, when the array substrate 104 is loaded, the mask plate needs to be moved, and at that time, the mask plate is simultaneously adjusted, and the first distance d between the mask plate and the array substrate 104 is changed, so that the four groups of light sources expose different groups of sub-pixels. This may effectively save total manufacturing time.

Optionally, the four sub-pixels included in the display pixel are rectangles with equal size, and the size of the sub-pixels is the same as that of the light-transmitting area.

Optionally, in a specific embodiment, as shown in fig. 5, 501 is a light-transmitting region, 502 is four sub-pixels, and the light-transmitting region 501 and the sub-pixels 502 are rectangles of equal size. The light-transmitting area is arranged in the sub-pixel and is in an equal-size rectangle, the light source is ensured to penetrate through the light-transmitting area to expose the whole sub-pixel, the partial position of the sub-pixel is prevented from being not exposed, and the condition that the exposure of the sub-pixel which does not belong to the light-transmitting area is influenced by the overlarge light-transmitting area is also avoided.

The preparation system further comprises a loading platform for loading the array substrate, a mask plate module for fixing the mask plate, a dryer for drying the array substrate, a UV-LED mounting module for mounting a UV-LED at the bottom of the liquid storage tank, a quantum dot colloid packaging module for adding quantum dot colloid with the volume corresponding to the depth of the liquid storage tank into the liquid storage tank, and a glue sealing module for sealing the groove opening of the liquid storage tank with glue.

When the liquid storage tank openings are subjected to glue sealing treatment, the thickness of the glue sealing layers 301 at the liquid storage tank openings is the same.

The display pixels are arranged in a longitudinal and transverse array mode at the array substrate; in each display pixel, the distribution positions of the sub-pixel structures of different colors are the same.

It should be noted that, since the present invention uses a positive photoresist, only the exposed photoresist can be dissolved in the developer, and the solubility of the photoresist increases with the increase of the illumination time and the illumination intensity. After the same time of dissolution, the depths of the grooves formed on the sub-pixels with different colors are different, and the depths of the liquid storage tanks formed by etching are different during the subsequent etching.

In the embodiment of the invention, under the condition that the relative position of the mask and the array substrate 104 is maintained unchanged, four groups of light sources provided by the light source module 101 expose sub-pixels with different colors through the light-transmitting area of the mask at the same time. The embodiment of the invention can complete the exposure of all the sub-pixels without carrying out alignment by maintaining the relative positions of the mask and the array substrate 104, thereby avoiding incomplete exposure caused by alignment errors. Embodiments of the invention are as followsCan adjust the first distanceOr a first angleSo that four groups of light sources expose different groups of sub-pixels. Thereby ensuring the accuracy of sub-pixel exposure. In the embodiment of the invention, each display pixel comprises a red sub-pixel, a green sub-pixel, a blue sub-pixel and a white sub-pixel, which respectively correspond to four groups of light sources with different incidence directions, and the illumination intensity and the illumination time of each group of light sources are determined according to the volume of quantum glue dispensers to be filled in the sub-pixels with the colors corresponding to the group of light sources. The photoresist is not good due to the illumination intensity and illumination timeAnd meanwhile, the solubility of the liquid crystal in the developing solution is different, and the characteristics can ensure that the depths of the liquid storage tanks corresponding to different groups of light sources are different when the liquid storage tanks are etched. To sum up, the system in the embodiment of the present invention exposes the four sub-pixels with different colors by providing four groups of light sources with different illumination intensities and illumination times at the same time, and then performs development and etching by the developing machine 105 and the etching machine 106 to form four liquid storage tanks with different depths, so that the liquid storage tanks of the sub-pixels with different colors can encapsulate quantum dot colloids with corresponding volumes, thereby ensuring consistent sealant thickness of each liquid storage tank, improving the balance of the luminance of the sub-pixels, and improving the display effect.

It is noted that, herein, relational terms such as first and second, and the like may be used solely to distinguish one entity or action from another entity or action without necessarily requiring or implying any actual such relationship or order between such entities or actions. Also, the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or apparatus. Without further limitation, an element defined by the phrase "comprising an … …" does not exclude the presence of other identical elements in a process, method, article, or apparatus that comprises the element.

All the embodiments in the present specification are described in a related manner, and the same and similar parts among the embodiments may be referred to each other, and each embodiment focuses on the differences from the other embodiments. In particular, for the system embodiment, since it is substantially similar to the method embodiment, the description is simple, and for the relevant points, reference may be made to the partial description of the method embodiment.

The above description is only for the preferred embodiment of the present invention, and is not intended to limit the scope of the present invention. Any modification, equivalent replacement, or improvement made within the spirit and principle of the present invention shall fall within the protection scope of the present invention.