阅读说明：本技术 脱模剂用化合物及其制备方法 (Compound for mold release agent and preparation method thereof ) 是由 金炫中 金洪彻 李圣徒 于 2020-08-26 设计创作，主要内容包括：本发明涉及一种超薄型脱模剂及其制备方法,更详细地涉及一种即使在连续蒸镀机中连续或不连续地施加热,也可以以超薄形式进行涂覆而没有热变形的脱模剂的制备方法。(The present invention relates to an ultra-thin release agent and a method for preparing the same, and more particularly, to a method for preparing a release agent that can be coated in an ultra-thin form without thermal deformation even if heat is continuously or discontinuously applied in a continuous vapor deposition machine.)

1. A compound for a mold release agent, comprising a structure represented by the following chemical formula 1:

[ chemical formula 1]

In the chemical formula 1, the metal oxide is represented by,

l is an aliphatic derivative or aromatic derivative having 1 to 20 carbon atoms;

m and n are each 0 or 1;

R₁and R₂Each independently being a hydrogen atomOr a derivative having a substituted or unsubstituted aliphatic hydrocarbon group or perfluoroalkyl group and having 1 to 40 carbon atoms;

B₁and B₂Each independently-O-, -COO-, -NHCOO-, or a combination thereof;

G₁and G₂Each independently is H, CH₃、CH₂A is or is omitted, wherein A is F, Cl, Br or I;

y and Z are each independently an alkyl group having 1 to 6 carbon atoms.

2. The compound for a mold release agent according to claim 1, wherein the total molecular weight of the compound for a mold release agent is 300-4000 g/mol.

3. A compound for a mold release agent, comprising a structure represented by the following chemical formula 2:

[ chemical formula 2]

In the chemical formula 2, the first and second organic solvents,

L₁and L₂Each independently is an aliphatic derivative or an aromatic derivative having 1 to 40 carbon atoms;

m, n, o and p are each 0 or 1;

R₁、R₂、R₃and R₄A derivative having 1 to 40 carbon atoms each independently being a hydrogen atom or a substituted or unsubstituted aliphatic hydrocarbon group or perfluoroalkyl group;

B₁、B₂、B₃and B₄Each independently-O-, -COO-, -NHCOO-, or a combination thereof;

G₁and G₂Each independently is H, CH₃、CH₂A is or is omitted, wherein A is F, Cl, Br or I;

y and Z are each independently an alkyl group having 1 to 6 carbon atoms;

x is-CH₂-or-O-。

4. The compound for a mold release agent according to claim 3, wherein the total molecular weight of the compound for a mold release agent is 300-4000 g/mol.

5. A mold release agent comprising the compound for mold release agent described in any one of claims 1 to 4.

6. A coating method wherein the release agent according to claim 5 is vacuum-evaporated.

7. The coating method according to claim 6, wherein the release agent is a single compound, and the release agent is vacuum-evaporated continuously or discontinuously.

8. The coating method according to claim 6, wherein the vacuum-evaporated release agent is removed using an alcohol having 1 to 10 carbon atoms or other organic solvent.

Technical Field

The present invention relates to a compound for a mold release agent and a method for preparing the same, and more particularly, to a compound for a mold release agent which can be coated in an ultra-thin form without thermal deformation even if heat is continuously or discontinuously applied in a continuous vapor deposition machine, and a method for preparing the same.

Background

As the industry using plastic films increases, the demand for film coatings with additional functions increases, and various coating techniques are required. There have been many technological advances in continuous coating processes that allow continuous coating when coating thin films.

A release agent using an amino alkyd resin or the like (korean patent laid-open publication No. 10-1541989) or a silicone release agent (korean patent laid-open publication No. 10-2015-0008696), a fluorine-based release agent (japanese laid-open patent publication No. 2014-129517), or the like is added to a resin material and used as a hard coat material of a thin film, or even if used directly as a release agent, a release agent having a film thickness of 1 μm or more, which is coated by a wet process such as spin coating and photocured, is widely used in most cases (korean patent laid-open publication No. 10-2019-0088462).

In the case of the wet coating process, it is difficult to form an ultra-thin film of 1 micron or less, and air pollution problems and the like are caused by using a solvent, and thus, a vacuum evaporation process capable of uniformly coating an ultra-thin film of 1 micron or less has been developed as compared with such a wet process. The vacuum deposition process is mainly a batch process, but continuous deposition techniques such as roll-to-roll that can be continuously performed have been advanced for the purpose of improving productivity and effective lamination.

In addition, with the development of advanced IT technology, a complicated continuous evaporation process, such as continuously coating or releasing a display substrate or a circuit board, etc., is introduced. For example, a release layer for easily removing a subsequent functional coating layer also requires a function of vapor-depositing coating without deformation even if heat is continuously or discontinuously applied in a vacuum evaporator. However, when a conventional release agent is applied by continuous vapor deposition, the release agent may not be reused when it is deformed and decomposed during evaporation due to applied heat, or melted and solidified around a heat source such as a crucible for a vapor deposition material, or vapor deposited by applying heat again after cooling, and most of the release agent is in a liquid state and unstable when it exists in a liquid phase in a vacuum state, and therefore, the inside of a vapor deposition machine is contaminated.

Therefore, there is a need for development of a release agent in the form of a solid powder which should have thermal stability when it is continuously vapor-deposited in a vapor deposition machine, should not be thermally deformed even when it is discontinuously heated and cooled, and should not contaminate the interior of the vapor deposition machine due to undesired evaporation in a high vacuum state for a long period of time, and can be easily handled by an operator.

Disclosure of Invention

Technical problem to be solved

In order to solve the above problems, an object of the present invention is to provide a compound for a mold release agent which is easy to handle chemicals and can form an ultrathin film in a vacuum state as a stable solid mold release agent, and a method for producing the same.

Technical scheme

According to a first aspect of the present invention, there is provided a compound for a mold release agent comprising a structure represented by the following chemical formula 1:

[ chemical formula 1]

In the chemical formula 1, L is an aliphatic derivative or an aromatic derivative having 1 to 20 carbon atoms; m and n are each 0 or 1; r₁And R₂A derivative having 1 to 40 carbon atoms each independently being a hydrogen atom or a substituted or unsubstituted aliphatic hydrocarbon group or perfluoroalkyl group; b is₁And B₂Each independently-O-, -COO-, -NHCOO-, or a combination thereof; g₁And G₂Each independently is H, CH₃、CH₂A (wherein, A is F, Cl, Br or I) or is omitted; y and Z are each independently an alkyl group having 1 to 6 carbon atoms.

According to a second aspect of the present invention, there is provided a compound for a mold release agent comprising a structure represented by the following chemical formula 2:

[ chemical formula 2]

In the chemical formula 2, L₁And L₂Each independently is an aliphatic derivative or an aromatic derivative having 1 to 40 carbon atoms; m, n, o and p are each 0 or 1; r₁、R₂、R₃And R₄A derivative having 1 to 40 carbon atoms each independently being a hydrogen atom or a substituted or unsubstituted aliphatic hydrocarbon group or perfluoroalkyl group; b is₁、B₂、B₃And B₄Each independently-O-, -COO-, -NHCOO-, or a combination thereof; g₁And G₂Each independently is H, CH₃、CH₂A (wherein, A is F, Cl, Br or I) or is omitted; y and Z are each independently an alkyl group having 1 to 6 carbon atoms; x is-CH₂-or-O-.

According to a third aspect of the present invention, there is provided a mold release agent comprising the compound for mold release agent.

According to a fourth aspect of the present invention, there is provided a coating method for vacuum evaporation of a release agent.

Advantageous effects

The compound for a mold release agent of the present invention improves the weak points of the conventional mold release agent which deforms by thermal deformation and chemical bonding in a continuous or discontinuous vapor deposition machine system which performs vapor deposition continuously or intermittently, has a molecular weight of 300-4000g/mol which can be vapor deposited in a vacuum vapor deposition machine, and excludes a functional group which may cause thermal deformation, so that vapor deposition can be performed without causing a change or deformation in the molecular weight due to thermal decomposition, chemical bonding, or the like which a release material receives at the time of vapor deposition, and continuous operation of continuous vapor deposition or intermittent vapor deposition in an ultra-thin form can be performed without causing deformation due to thermal decomposition or bonding even if vapor deposition heat is applied which is continuously or discontinuously repeated, so that productivity can be improved. Further, the compound for a mold release agent of the present invention is characterized in that it can be easily removed with a solvent such as alcohol, and thus a mold release process can be easily performed.

Drawings

Fig. 1 is a graph showing temperature stability in a crucible and thickness change and vacuum degree change in a vacuum evaporator according to time, which occur when vapor deposition is performed in a vacuum evaporator in example 1 of the present invention.

Fig. 2 shows the results of a change in the state of a material when evaporation is performed by repeating heating several times, a change in the contact angle of a coated surface, and a change in haze after coating.

Detailed Description

The present invention will be described in more detail below.

The compound for a mold release agent of the present invention comprises a structure represented by the following chemical formula 1 or chemical formula 2:

[ chemical formula 1]

In the chemical formula 1, L is an aliphatic derivative or an aromatic derivative having 1 to 20 carbon atoms; m and n are each 0 or 1; r₁And R₂A derivative having 1 to 40 carbon atoms each independently being a hydrogen atom or a substituted or unsubstituted aliphatic hydrocarbon group or perfluoroalkyl group; b is₁And B₂Each independently-O-, -COO-, -NHCOO-, or a combination thereof; g₁And G₂Each independently is H, CH₃、CH₂A (wherein, A is F, Cl, Br or I) or is omitted; y and Z are each independently an alkyl group having 1 to 6 carbon atoms.

[ chemical formula 2]

In the chemical formula 2, L₁And L₂Each independently is an aliphatic derivative or an aromatic derivative having 1 to 40 carbon atoms; m, n, o and p are each 0 or 1; r₁、R₂、R₃And R₄A derivative having 1 to 40 carbon atoms each independently being a hydrogen atom or a substituted or unsubstituted aliphatic hydrocarbon group or perfluoroalkyl group; b is₁、B₂、B₃And B₄Each independently-O-, -COO-, -NHCOO-, or a combination thereof; g₁And G₂Each independently is H, CH₃、CH₂A (wherein, A is F, Cl, Br or I) or is omitted; y and Z are each independently an alkyl group having 1 to 6 carbon atoms; x is-CH₂-or-O-.

The total molecular weight of the compound for a mold release agent of the present invention may be 300-4000 g/mol.

According to another aspect of the present invention, there is provided a mold release agent comprising the compound for mold release agent.

According to another aspect of the present invention, there is provided a coating method of vacuum evaporation of the release agent.

The compound for a mold release agent used in the present invention or the mold release agent containing the compound for a mold release agent should be a single compound rather than a mixed phase so that mold release properties can be stably realized without thermal deformation even when vapor deposition is repeated continuously or discontinuously.

Further, vacuum evaporation may be performed by a continuous or discontinuous process using the release agent prepared according to the present invention, and when a release process is performed after evaporation or coating requiring a release function, solvent removal may be used in addition to a physical method of a dry process. Although not particularly limited, alcohols having 1 to 10 carbon atoms including methanol, ethanol, propanol, butanol, pentanol, hexanol, and other organic solvents may be used to remove the release agent.

The present invention will be described in more detail below with reference to synthesis examples and examples. However, the scope of the present invention is not limited thereto.

[ examples ]

1. Synthesis example 1

Hexamethylene-bis (perfluorohexaethylcarbamate) was prepared as follows.

A100 mL round-bottom flask was charged with 20g of perfluorohexylethyl alcohol and 40g of 1, 3-bistrifluoromethylbenzene, and stirred at room temperature for 30 minutes. To this solution was added 4.62g of hexamethylene diisocyanate, slowly warmed to 75 ℃ with vigorous stirring, a drop of dibutyltin dilaurate catalyst was added, and vigorously stirred for 20 hours. When the isocyanate peak in FTIR spectrum was confirmed (2270-2290 cm)^-1) When disappeared, cooling was performed, and the solvent and impurities were primarily removed using a rotary evaporator, and secondary purification was performed in a vacuum oven at 1 torr (torr) and 50 ℃ to obtain a solid in the form of white powder. NMR, FTIR and GC/MS spectra are consistent with the following structures.

< hexamethylene-bis (perfluorohexaethylcarbamate) >

2. Synthesis example 2

4-methyl-2, 3-phenyl-bis (perfluorohexylethylcarbamate) was prepared as follows.

A100 mL round-bottom flask was charged with 20g of perfluorohexylethyl alcohol and 40g of 1, 3-bistrifluoromethylbenzene, and stirred at room temperature for 30 minutes. To this solution was added 4.78g of toluene-2, 4-diisocyanate, slowly warmed to 75 ℃ with vigorous stirring, a drop of dibutyltin dilaurate catalyst was added, and vigorous stirring was carried out for 20 hours. When the isocyanate peak in FTIR spectrum was confirmed (2270-2290 cm)^-1) When disappeared, cooling was performed, and the solvent and impurities were primarily removed using a rotary evaporator, and secondary purification was performed in a vacuum oven at 1 torr (torr) and 50 ℃ to obtain a solid in the form of white powder. NMR, FTIR and GC/MS spectra are consistent with the following structures.

<4 methyl-2, 3 phenyl-bis (perfluorohexylethylcarbamate) >

3. Synthesis example 3

1, 4-phenylene-bis (perfluorohexylethyl carbamate) was prepared as follows.

A100 mL round-bottom flask was charged with 20g of perfluorohexylethyl alcohol and 40g of 1, 3-bistrifluoromethylbenzene, and stirred at room temperature for 30 minutes. To this solution was added 4.41g of p-phenylene diisocyanate, slowly warmed to 75 ℃ with vigorous stirring, a drop of dibutyltin dilaurate catalyst was added, and vigorously stirred for 20 hours. When the isocyanate peak in FTIR spectrum was confirmed (2270-2290 cm)^-1) When disappeared, cooling was performed, and the solvent and impurities were primarily removed using a rotary evaporator, and secondary purification was performed in a vacuum oven at 1 torr (torr) and 50 ℃ to obtain a solid in the form of white powder. NMR, FTIR and GC/MS spectra are consistent with the following structures.

<1, 4-phenylene-bis (perfluorohexylethylcarbamate) >

4. Synthesis example 4

Methylene diphenyl-bis (perfluorohexylethyl carbamate) was prepared as follows.

A100 mL round-bottom flask was charged with 20g of perfluorohexylethyl alcohol and 40g of 1, 3-bistrifluoromethylbenzene, and stirred at room temperature for 30 minutes. To this solution was added 6.87g of methylene diphenyl diisocyanate, slowly warmed to 100 ℃ with vigorous stirring, a drop of dibutyltin dilaurate catalyst was added, and vigorously stirred for 20 hours. When the isocyanate peak in FTIR spectrum was confirmed (2270-2290 cm)^-1) When disappeared, cooling was performed, and the solvent and impurities were primarily removed using a rotary evaporator, and secondary purification was performed in a vacuum oven at 1 torr (torr) and 75 ℃ to obtain a solid in the form of white powder. NMR, FTIR and GC/MS spectra are consistent with the following structures.

< methylenediphenyl-bis (perfluorohexylethyl carbamate) >

5. Synthesis example 5

2, 4-di-2-octylcarbamoyltoluene was prepared as follows.

10g of toluene-2, 4-diisocyanate and 20g of toluene were charged in a 100mL round-bottom flask and stirred at room temperature for 30 minutes. To this solution was added 10g of 2-octane, slowly warmed to 75 ℃ with vigorous stirring, stirred for 4 hours, and warmed to 90 ℃ with vigorous stirring for 16 hours. When the isocyanate peak in FTIR spectrum was confirmed (2270-2290 cm)^-1) When disappeared, cooling was performed, and the solvent and impurities were primarily removed using a rotary evaporator, and secondary purification was performed in a vacuum oven at 1 torr (torr) and 90 ℃ to obtain a solid in the form of light brown/white powder. NMR, FTIR and GC/MS spectra are consistent with the following structures.

<2, 4-di-2-octylcarbamoyltoluene >

6. Synthesis example 6

2, 4-Dodecanoaminotoluenes were prepared as follows.

10g of toluene-2, 4-diisocyanate and 20g of toluene were charged in a 100mL round-bottom flask and stirred at room temperature for 30 minutes. To this solution was added 21.40g of 1-dodecanol, slowly warmed to 75 ℃ with vigorous stirring, a drop of dibutyltin dilaurate catalyst was added, and vigorously stirred for 20 hours. When the isocyanate peak in FTIR spectrum was confirmed (2270-2290 cm)^-1) When disappeared, cooling was performed, and the solvent and impurities were primarily removed using a rotary evaporator, and secondary purification was performed in a vacuum oven at 1 torr (torr) and 75 ℃ to obtain a solid in the form of white powder. NMR, FTIR and GC/MS spectra are consistent with the following structures.

<2, 4-Dodecancarbamoyltoluene >

7. Synthesis example 7

Bis (perfluorohexylethyl) sebacate was prepared as follows.

A100 mL round bottom flask was charged with 20g of sebacic acid and 72.01g of perfluorohexylethyl alcohol, slowly warmed to 130 ℃ with vigorous stirring, added with 11.1mL of concentrated sulfuric acid and vigorously stirred for 20 hours. At this time, it is set so that water can be condensed and removed under a nitrogen atmosphere. The temperature was cooled to normal temperature, then 2g of hydrotalcite was added to remove the acid and filtered to obtain a clear solution, for which the solvent and impurities were initially removed using a rotary evaporator and a secondary purification was performed in a vacuum oven at 1 torr and 75 ℃ to obtain a solid in the form of a white/light brown powder. NMR, FTIR and GC/MS spectra are consistent with the following structures.

Bis (perfluorohexylethyl) sebacate

8. Synthesis example 8

1,2,3, 4-butanetetracarboxylic acid-tetrakis (perfluoroethyl ester) was prepared as follows.

A100 mL round-bottom flask was charged with 20g of perfluorohexylethyl alcohol and 40g of 1, 3-bistrifluoromethylbenzene, and stirred at room temperature for 30 minutes. To this solution 3.21g of 1,2,3, 4-butanetetracarboxylic acid were added, the temperature was slowly raised to 110 ℃ with vigorous stirring, 0.5ml of concentrated sulfuric acid was added and the mixture was vigorously stirred for 20 hours. At this time, it is set so that water can be condensed and removed under a nitrogen atmosphere. The temperature was cooled to normal temperature, then 2g of hydrotalcite was added to remove the acid and filtered to obtain a clear solution, for which the solvent and impurities were initially removed using a rotary evaporator and a secondary purification was performed in a vacuum oven at 1 torr and 75 ℃ to obtain a solid in the form of a white/light brown powder. NMR, FTIR and GC/MS spectra are consistent with the following structures.

<1,2,3, 4-Butanetetracarboxylic acid-tetrakis (perfluoroethyl ester) >

9. Synthesis example 9

(2-Perfluoroethylether ethyl) benzene was prepared as follows.

A100 mL round-bottom flask was charged with 20g of perfluorohexylethyl alcohol and 40g of 1, 3-bistrifluoromethylbenzene, and stirred at room temperature for 30 minutes. To this solution was added 4.39g of sodium hydroxide, slowly warmed to 65 ℃ with vigorous stirring, and vigorously stirred for 4 hours. Thereafter, 11.18g of (2-bromoethyl) benzene were added, and the mixture was heated to 75 ℃ and vigorously stirred for 5 hours. Thereafter, the mixture was transferred to a separatory funnel, and 100g of hydrochloric acid having a concentration of 3 mol was added thereto, followed by addition of 100g of acetone, washing and filtration to obtain a clear solution. For the clear solution, the solvent and impurities were initially removed using a rotary evaporator and a second purification was performed in a vacuum oven at 1 torr and 75 ℃ to obtain a solid as a white powder. NMR, FTIR and GC/MS spectra are consistent with the following structures.

< 2-Perfluorohexylethylether ethyl) benzene >

Example 1: evaluation of Dry vacuum deposition Process

The powder prepared in synthesis example 2 of the above synthesis examples was subjected to vacuum evaporation. The powder prepared in the synthesis example was charged into the effusion cell of the vacuum evaporator, and the relationship between the temperature rise process according to the temperature with time, the change in the degree of vacuum in the vacuum evaporator during evaporation, and the corresponding increase in thickness is shown in fig. 1.

Example 2: evaluation of vacuum deposition characteristics

Using the powder prepared in the synthesis example 2, the procedure of example 1 was repeated several times. In the course of evaporation by repeating temperature rise and cooling, the evaporation rate was measured asSecond andtemperature per second, state before/after evaporation, contact angle and haze at thicknesses of 100nm and 200nm and are shown in fig. 2.