阅读说明：本技术 一种超透镜及具有其的光学系统 (Superlens and optical system with same ) 是由 郝成龙 于 2019-07-31 设计创作，主要内容包括：本发明提供一种超透镜及具有其的光学系统,该超透镜包括：基板,能够透光；和设于基板表面的纳米环结构,纳米环结构包括多个圆环状的纳米环和形成于多个纳米环之间的多个空气环间隔；多个纳米环的直径各不相同,且多个纳米环同轴分布；至少部分空气环间隔的高度和宽度中至少一个不相等,使得不同位置的空气环间隔的光相位不同,以限定超透镜的相位分布。本发明通过纳米结构如纳米环结构、纳米柱结构形成超透镜,并且,不同位置的纳米结构具有不同的光相位,形成满足用户需求的相位分布的超透镜,相比现有的光学透镜,本发明的超透镜体积小、重量轻,解决了光学系统小型化、轻量化的问题。(The invention provides a super lens and an optical system with the same, wherein the super lens comprises: a substrate capable of transmitting light; the nanoring structure comprises a plurality of annular nanorings and a plurality of air ring intervals formed among the nanorings; the diameters of the nano rings are different, and the nano rings are coaxially distributed; at least one of the height and width of at least some of the air ring spacings are unequal such that the optical phases of the air ring spacings at different locations are different to define the phase profile of the superlens. The super lens is formed by the nano structures such as the nano ring structure and the nano column structure, and the nano structures at different positions have different optical phases, so that the super lens with phase distribution meeting the requirements of users is formed.)

1. A superlens, comprising:

a substrate capable of transmitting light; and

a plurality of nano-pillar structures arranged on the same surface of the substrate;

the nano-pillar structures are arranged in an array shape, each nano-pillar structure comprises at least one of a negative nano-pillar structure and a hollow nano-pillar structure, the negative nano-pillar structure and the hollow nano-pillar structure are in axial symmetry structures, each negative nano-pillar structure comprises a first cylinder, and each first cylinder is provided with a cylindrical first hollow part extending from the top to the bottom of the first cylinder; the hollow nano-pillar structure comprises a first cylinder having a cylindrical second hollow portion extending from a top to a bottom thereof;

the light phases of the nano-pillar structures at different positions are different to define the phase distribution of the super lens, and the group delay of the nano-pillars at different positions is different to define the chromatic aberration characteristic of the super lens.

2. The superlens of claim 1, wherein the cross-section of the first post is a regular hexagon.

3. The superlens of claim 1, wherein the nano-pillar structures further comprise positive nano-pillar structures comprising a second cylinder.

4. The superlens of claim 2, wherein the nano-pillar structures further comprise positive nano-pillar structures comprising a second cylinder.

5. The superlens of claim 3, wherein the optical phases of the positive and negative nanopillar structures are related to the size of the height and diameter of the corresponding nanopillar structure;

the optical phase of the hollow nano-pillar structure is related to the inner and outer diameters of the hollow nano-pillar structure.

6. The superlens of claim 4, wherein the optical phases of the positive and negative nanopillar structures are related to the size of the height and diameter of the corresponding nanopillar structure;

the optical phase of the hollow nano-pillar structure is related to the inner and outer diameters of the hollow nano-pillar structure.

7. A superlens according to any one of claims 1 to 6, wherein for each nano-pillar structure, the other nano-pillar structures surrounding the nano-pillar structure are located at different vertices of the same regular hexagon, and the nano-pillar structure is located at the center of the corresponding regular hexagon.

8. A superlens according to claim 1 or 2, wherein the superlens has a phase distribution of a positive and negative aspherical lens or an axicon lens.

9. The superlens of claim 8, wherein the superlens has a lens surface optical phaseSatisfies the following conditions:

k is the wave number, r is the distance from each nano-pillar structure to the center of the substrate, and f is the focal length of the superlens.

10. A superlens according to claim 1 or 2, wherein the nano-pillar structure is made of one of the following materials:

photoresist, quartz glass, silicon nitride, titanium oxide and monocrystalline silicon.

11. A superlens according to any one of claims 1 to 6, wherein when the superlens includes different types of nano-pillar structures, the surface of the substrate is divided into a plurality of regions, and the same region is provided with the same type of nano-pillar structures.

12. An optical system, characterized in that the optical system comprises:

at least two superlenses of any one of claims 1 to 11;

wherein at least two said superlenses are spaced apart.

13. The optical system of claim 12, wherein all superlenses have different phase distributions and different group delays, wherein one superlens is configured to correct aberrations of the other superlens, the aberrations including at least one of spherical aberration, coma, astigmatism, curvature of field, distortion, chromatic positional aberration, and chromatic aberration of magnification.

14. The optical system of claim 12, further comprising:

at least one optical component spaced from the superlens, the optical component including a lens distinct from the superlens.

15. The optical system of claim 14, wherein the lens is a refractive lens.

16. The optical system of claim 15, wherein the refractive lens has a phase distribution and a group delay distribution of a spherical positive and negative lens, an infinity corrected lens, a schmitt correction plate, or an aspheric lens.

17. The optical system of claim 16, wherein a plurality of the superlenses are arranged to correct aberrations of the refractive lens, the aberrations including at least one of spherical aberration, coma, astigmatism, curvature of field, distortion, chromatic positional aberration, and chromatic aberration of magnification.

18. A superlens, comprising:

a substrate capable of transmitting light;

the nanoring structure is arranged on the surface of the substrate and comprises a plurality of annular nanorings and a plurality of air ring intervals formed among the nanorings;

the diameters of the nano rings are different, and the nano rings are coaxially distributed;

at least one of the height and the width of at least part of the air ring spaces are unequal, so that the optical phases of the air ring spaces at different positions are different to define the phase distribution of the superlens.

Technical Field

The invention relates to the field of lenses, in particular to a superlens and an optical system with the superlens.

Background

The optical lens plays an important role as a basic component in scientific and industrial fields such as imaging, precision measurement, optical communication and the like. The traditional optical lens is manufactured by a series of complex procedures such as material cutting, surface polishing, fine polishing, film coating and the like. A multi-lens optical system is composed of a plurality of traditional optical lenses, and the system generally comprises a plurality of refraction type lenses or reflection type lenses to finish a specific imaging application, such as infinite imaging, image projection, microscopic imaging and the like. However, the conventional single lens has disadvantages of large volume and heavy weight.

Disclosure of Invention

The invention provides a superlens and an optical system with the superlens.

Specifically, the invention is realized by the following technical scheme:

according to a first aspect of the present invention, there is provided a superlens, comprising:

a substrate capable of transmitting light;

the nanoring structure is arranged on the surface of the substrate and comprises a plurality of annular nanorings and a plurality of air ring intervals formed among the nanorings;

the diameters of the nano rings are different, and the nano rings are coaxially distributed;

at least one of the height and the width of at least part of the air ring spaces are unequal, so that the optical phases of the air ring spaces at different positions are different to define the phase distribution of the superlens.

Optionally, the optical phase of the air ring spacing is related to the size of the height and width of the air ring spacing.

Optionally, the superlens has a phase distribution on an infinity axis with the off-axis aberration correcting lens.

Optionally, the air ring spacing comprises multi-step height air ring spacing.

Optionally, the nanoring structure is equivalent to a multilayer nanoring structure with single-step height air ring spacing and formed by stacking along the height direction.

Optionally, the nanoring structure is equivalent to a two-layer nanoring structure with a single-step height air ring interval, and the nanoring interval is formed by stacking the two layers of nanoring structures along the height direction, and the position of the air ring interval satisfies:

max c₁I_on-axis(z₀)+c₂I_off-axis(z₀)

s.t.a_m+1-a_m＞l

b_m+1-b_m＞l

|Ea_m-Eb_n|＞d_F

a₁＞d,b₁＞d

NA≥NA_min

wherein, I_on-axis(z₀): a focal light intensity map of incident light at 0 field of view;

I_off-axis(z₀): a focus light intensity map of incident light at maximum half field of view incidence;

z₀: the position of the focal point on the optical axis;

c₁、c₂: a weight factor;

a_m: the center position of the interval of the first layer of the mth level air ring, wherein m is the number of the air ring intervals between the current air ring interval and the center of the concentric circle plus 1;

b_m: the center position of the interval of the mth-stage second-layer air ring;

l: the minimum spacing between adjacent air ring spaces of each layer;

d: the minimum radius of the center position of the first layer of air ring interval and the second layer of air ring interval;

Ea_m: the edge positions of the m-th level first layer air ring interval;

Eb_n: the edge positions of the n-th-stage second-layer air ring interval are equal to the number of the air ring intervals between the current air ring interval and the center of the concentric circle plus 1;

d_F: minimum machining precision;

NA: a numerical aperture of the superlens;

NA_min: the minimum numerical aperture.

Optionally, the material of the nanoring structure is one of the following:

photoresist, quartz glass, silicon nitride, titanium oxide and monocrystalline silicon.

According to a second aspect of the present invention, there is provided an optical system comprising:

a mounting frame;

the superlens of the first aspect, wherein the superlens is mounted on the mounting frame.

According to a third aspect of the present invention, there is provided a superlens comprising:

a substrate capable of transmitting light; and

a plurality of nano-pillar structures arranged on the same surface of the substrate;

the nano-pillar structures are arranged in an array shape, the nano-pillar structures comprise at least one of negative nano-pillar structures and hollow nano-pillar structures, the negative nano-pillar structures comprise first pillars, the cross sections of the first pillars are regular hexagons, and the first pillars are provided with cylindrical first hollow parts extending from the tops to the bottoms of the first pillars; the hollow nano-pillar structure comprises a first cylinder having a cylindrical second hollow portion extending from a top to a bottom thereof;

the light phases of the nano-pillar structures at different positions are different to define the phase distribution of the super lens, and the group delay of the nano-pillars at different positions is different to define the chromatic aberration characteristic of the super lens.

Optionally, the nano-pillar structure further comprises a positive nano-pillar structure comprising a second cylinder.

Optionally, the optical phase of the positive and negative nanopillar structures is related to the size of the height and diameter of the corresponding nanopillar structure;

the optical phase of the hollow nano-pillar structure is related to the inner and outer diameters of the hollow nano-pillar structure.

Optionally, for each nano-pillar structure, the other nano-pillar structures surrounding the nano-pillar structure are located on different vertices of the same regular hexagon, and the nano-pillar structure is located at the center of the corresponding regular hexagon.

Optionally, the superlens has a phase distribution of a positive and negative aspherical lens or an axicon lens.

Optionally, the optical phase of the lens surface of the superlens satisfies:

k is the wave number, r is the distance from each nano-pillar structure to the center of the substrate, and f is the focal length of the superlens.

Optionally, the material of the nano-pillar structure is one of the following:

photoresist, quartz glass, silicon nitride, titanium oxide and monocrystalline silicon.

According to a fourth aspect of the present invention, there is provided an optical system comprising:

at least two superlenses according to the third aspect;

wherein at least two said superlenses are spaced apart.

Optionally, the phase distribution and the group delay of all the superlenses are different, wherein one of the superlenses is configured to correct aberrations of the other superlenses, the aberrations including at least one of spherical aberration, coma, astigmatism, curvature of field, distortion, chromatic positional aberration and chromatic aberration of magnification.

Optionally, the optical system further comprises:

an optical assembly spaced from the superlens, the optical assembly including a lens distinct from the superlens.

Optionally, the lens is a refractive lens.

Optionally, the refractive lens has a phase distribution and a group delay distribution of a spherical positive and negative lens, an infinity corrected lens, a schmitt correction plate, or an aspheric lens.

Optionally, a plurality of the superlenses are arranged to correct aberrations of the refractive lens, the aberrations including at least one of spherical aberration, coma, astigmatism, curvature of field, distortion, chromatic positional aberration, and chromatic aberration of magnification.

According to the technical scheme provided by the embodiment of the invention, the super lens is formed by the nano structures such as the nano ring structure and the nano column structure, and the nano structures have different optical phases at different positions to form the super lens with phase distribution meeting the requirements of users.

It is to be understood that both the foregoing general description and the following detailed description are exemplary and explanatory only and are not restrictive of the invention, as claimed.

Drawings

The accompanying drawings, which are incorporated in and constitute a part of this specification, illustrate embodiments consistent with the invention and together with the description, serve to explain the principles of the invention.

FIG. 1A is a schematic cross-sectional view of a superlens in accordance with a first embodiment of the present invention;

FIG. 1B is a top view of a superlens in accordance with one embodiment of the present invention;

FIG. 1C is a schematic focusing diagram of a superlens according to a first embodiment of the present invention;

FIG. 1D is a schematic focusing diagram of a plano-convex lens of the prior art;

fig. 1E is a schematic diagram of a superlens fusing two single-layer nanoring structures into a nanoring structure with a second-order height according to a first embodiment of the present invention;

FIG. 1F is a schematic diagram of another superlens in accordance with a first embodiment of the present invention, in which two single-layer nanoring structures are fused into one nanoring structure with a second-order height;

FIG. 1G is a schematic diagram of another superlens in accordance with a first embodiment of the present invention, in which two single-layer nanoring structures are fused into one nanoring structure with a second-order height;

FIG. 1H is a three-dimensional print write field sequence diagram of a superlens in accordance with a first embodiment of the present invention;

fig. 2 is a schematic diagram of an experimental apparatus for measuring a focal spot size of a superlens according to an embodiment of the present invention.

FIG. 3A is a diagram of focal spot intensity measurements for a 0 ° field of view of a superlens with a 100 μm focal length according to an embodiment of the present invention;

FIG. 3B is a diagram of focal spot intensity measurements for a 5 ° field of view of a superlens with a focal length of 100 μm according to an embodiment of the present invention;

FIG. 3C is a graph of focal spot intensity measurements for a 10 ° field of view of a superlens with a 100 μm focal length in accordance with one embodiment of the present invention;

FIG. 3D is a prior art focal spot intensity measurement plot for a 0 field of view of a spherical aberration corrected lens with a focal length of 100 μm;

FIG. 3E is a prior art focal spot intensity measurement plot for a 5 field of view of a spherical aberration correcting lens with a focal length of 100 μm;

FIG. 3F is a prior art focal spot intensity measurement plot for a 10 field of view of a spherical aberration correcting lens with a focal length of 100 μm;

FIG. 3G is a diagram of focal spot intensity measurement for a 0 ° field of view of a superlens with a 1mm focal length according to an embodiment of the present invention;

FIG. 3H is a diagram of focal spot intensity measurement of an 8 ° field of view of a superlens with a 1mm focal length according to an embodiment of the present invention;

FIG. 3I is a diagram of focal spot intensity measurement of a 16 ° field of view of a superlens with a 1mm focal length according to an embodiment of the present invention;

FIG. 3J is a prior art focal spot intensity measurement plot for a lens 0 field of view with 1mm focal length;

FIG. 3K is a prior art focal spot intensity measurement plot for a lens 8 field of view with 1mm focal length;

FIG. 3L is a prior art focal spot intensity measurement plot for a 16 ° field of view of a 1mm focal length lens;

FIG. 3M is a graph of the superlens modulation transfer function shown in FIGS. 3D-3F;

FIG. 3N is a graph of the lens modulation transfer function shown in FIGS. 3G-3I;

FIG. 4A is an image of a 0 degree field of view of a super lens with a focal length of 1mm according to an embodiment of the present invention;

FIG. 4B is an enlarged view of the center of the image of FIG. 4B;

FIG. 4C is a prior art 0 ° field of view imaging of a resolution target for a 1mm focal length lens;

FIG. 4D is an enlarged view of the center of the image of FIG. 4C;

FIG. 4E is an image of a 16 field of view of a superlens having a 1mm focal length according to one embodiment of the present invention;

FIG. 4F is an image of a 16 field of view of a 1mm focal length lens of the prior art;

FIG. 4G is a schematic diagram of a microscope system with a 1mm focal length superlens as a microscope objective according to one embodiment of the present invention;

FIG. 4H is a resolution target microimage of the microscopy system of FIG. 4G;

FIG. 4I is a photomicrograph of an avian feather from the microscope system of FIG. 4G;

FIG. 5A is a schematic view of a superlens in a second embodiment of the present invention;

FIG. 5B is a schematic view of a negative nanorod structure in a second embodiment of the invention;

FIG. 5C is a schematic diagram of a hollow nano-pillar structure according to a second embodiment of the present invention;

FIG. 5D is a schematic diagram of a positive nanorod structure according to a second embodiment of the invention;

FIG. 5E is a graph showing the relationship between the optical phase and the radius of the nanorod when the operating wavelength is 940nm in the second embodiment of the present invention;

FIG. 5F is a graph showing the relationship between the optical phase and the radius of the nanorod when the operating wavelength is 550nm in the second embodiment of the present invention;

FIG. 5G is a phase diagram of a 100 μm aperture 100 μm superlens having an operating wavelength of 940nm and a focal length of 100 μm according to a second embodiment of the present invention;

FIG. 5H is a machined diameter diagram of a nanopillar structure corresponding to the superlens of FIG. 5G;

FIG. 5I is a simulated focal spot diagram corresponding to the superlens of FIG. 5G;

FIG. 6A is a schematic diagram of a two-piece superlens optical system with an operating wavelength of 940nm according to a second embodiment of the present invention;

FIG. 6B is a radial phase diagram of the first superlens of FIG. 6A;

FIG. 6C is a radial phase diagram of the second superlens of FIG. 6A;

FIG. 6D is a simulated focal spot diagram for 0, 15, and 30 incident light convergence for the superlens optical system of FIG. 6A;

FIG. 6E is a graph of modulation transfer simulation for the superlens optical system of FIG. 6A;

FIG. 6F is a simulated image of the superlens optical system of FIG. 6A;

FIG. 6G is a simulated graph of the energy circle of the superlens optical system of FIG. 6A;

FIG. 7A is a schematic view of a three-piece superlens optical system with an operating wavelength of 550nm according to a second embodiment of the present invention;

FIG. 7B is a radial phase diagram of the third superlens of FIG. 7A;

FIG. 7C is a radial phase diagram of the fourth superlens of FIG. 7A;

FIG. 7D is a radial phase diagram of the fifth superlens of FIG. 7A;

FIG. 7E is a simulated focal spot diagram for 0, 15, and 30 incident light convergence for the superlens optical system of FIG. 7A;

FIG. 7F is a simulated modulation transfer diagram for the superlens optical system of FIG. 7A;

FIG. 7G is a simulated image of the superlens optical system of FIG. 7A;

FIG. 7H is a simulated graph of the energy circle of the superlens optical system of FIG. 7A;

FIG. 8A is a schematic diagram of a hybrid optical system of a superlens refractive optical component operating in the visible light band according to a second embodiment of the present invention;

FIG. 8B is a radial phase profile of the sixth superlens of FIG. 8A at three wavelengths (400nm, 550nm, and 700 nm);

FIG. 8C is a radial phase profile of the seventh superlens of FIG. 8A at three wavelengths (400nm, 550nm, and 700 nm);

FIG. 8D is a simulated focal spot diagram for the hybrid optical system of FIG. 8A for converging incident light at 400nm at 0, 15, and 30;

FIG. 8E is a simulated focal spot for 0, 15, and 30 of the hybrid optical system of FIG. 8A for incident light convergence at 550 nm;

FIG. 8F is a simulated focal spot diagram for 0, 15, and 30 of the hybrid optical system of FIG. 8A for incident light convergence at 700 nm;

FIG. 8G is a simulated graph of the modulation transfer function of the hybrid optical system of FIG. 8A for 400nm incident light;

FIG. 8H is a simulated graph of the modulation transfer function of the hybrid optical system of FIG. 8A at 550nm incident light;

FIG. 8I is a graph of a simulation of the modulation transfer function of the hybrid optical system of FIG. 8A for 700nm incident light;

FIG. 9A is a schematic view of a three-dimensional printing process according to an embodiment of the invention;

fig. 9B is a schematic flow chart of a three-dimensional printing process according to an embodiment of the invention.

Reference numerals:

100: a superlens; 1: a substrate; 2: a nanoring structure; 21: a nanoring; 22: air ring spacing; 3: a nano-pillar structure; 31: a negative nanocolumn structure; 311: a first column; 312: a first hollow section; 32: a hollow nano-pillar structure; 321: a first cylinder; 322: a second hollow section; 33: a positive nanorod structure;

210: a first light source; 220: a variable light attenuation sheet; 230: a filtering system; 231: a first lens; 232: a second lens; 233: a pinhole; 240: a displacement platform; 250: an amplification system; 251: a first microscope objective; 252: a third lens; 253: a first light sensing camera;

310: a second light source; 320: a laser speckle remover; 330: a second microscope objective; 340: a fourth lens; 350: and a second light sensing camera.

Detailed Description

Reference will now be made in detail to the exemplary embodiments, examples of which are illustrated in the accompanying drawings. When the following description refers to the accompanying drawings, like numbers in different drawings represent the same or similar elements unless otherwise indicated. The embodiments described in the following exemplary embodiments do not represent all embodiments consistent with the present invention. Rather, they are merely examples of apparatus and methods consistent with certain aspects of the invention, as detailed in the appended claims.

The terminology used herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention. As used in this specification and the appended claims, the singular forms "a", "an", and "the" are intended to include the plural forms as well, unless the context clearly indicates otherwise. It should also be understood that the term "and/or" as used herein refers to and encompasses any and all possible combinations of one or more of the associated listed items.

It is to be understood that although the terms first, second, third, etc. may be used herein to describe various information, these information should not be limited to these terms. These terms are only used to distinguish one type of information from another. For example, first information may also be referred to as second information, and similarly, second information may also be referred to as first information, without departing from the scope of the present invention. The word "if" as used herein may be interpreted as "at … …" or "when … …" or "in response to a determination", depending on the context. The features of the following examples and embodiments may be combined with each other without conflict.

An optical system composed of a plurality of traditional lenses has the defects of high assembly alignment requirement, reduced utilization rate of aberration correcting light energy of a plurality of lenses, large volume and weight, complex whole system and the like. Although the planar diffraction lens can reduce the volume and weight to some extent, the wavelength-scale cross-sectional structure makes it difficult to accurately distribute the phase, thereby failing to achieve the high resolution.

Optical super-surfaces are rapidly emerging and becoming a mainstream way to achieve miniaturized, planarized optics. Optical super-surfaces have demonstrated super-surface based axicons, blazed gratings, polarizers, holographic dry plates and planar lenses. The continuous 2 pi phase change metasurface makes a single layer aplanatic superlens a reality. At the same time, the double-layer super-surface super-lens corrects all monochromatic aberrations.

The embodiment of the invention provides a super lens, which comprises a light-transmitting substrate and a nano ring structure arranged on the surface of the substrate, wherein the nano ring structure comprises a plurality of annular nano rings and a plurality of air ring intervals formed among the plurality of annular nano rings; the diameters of the nano rings are different, and the nano rings are coaxially distributed; at least one of the height and the width of at least part of the air ring intervals are unequal, and the optical phases of the air ring intervals at different positions are different so as to define the phase distribution of the superlens.

The embodiment of the invention also provides another super lens, which comprises a light-transmitting substrate and a plurality of nano-pillar structures arranged on the same surface of the substrate; the nano-pillar structures are arranged in an array shape, the nano-pillar structures comprise at least one of negative nano-pillar structures and hollow nano-pillar structures, the negative nano-pillar structures comprise first pillars, the cross sections of the first pillars are regular hexagons, and the first pillars are provided with cylindrical first hollow parts extending from the tops to the bottoms of the first pillars; the hollow nano-pillar structure comprises a first cylinder, a second cylinder and a third cylinder, wherein the first cylinder is provided with a cylindrical second hollow part extending from the top to the bottom of the first cylinder; the light phases of the nano-pillar structures at different positions are different to define the phase distribution of the super lens, and the group delay of the nano-pillars at different positions is different to define the chromatic aberration characteristic of the super lens.

The super lens is formed by the nano structures such as the nano ring structure or the nano column structure, and different positions of the nano structures have different optical phases, so that the super lens with phase distribution meeting the requirements of users is formed.

Hereinafter, the two types of superlenses will be described in detail, respectively.

Example one

Referring to fig. 1A and 1B, the superlens 100 of the present embodiment includes a substrate 1 and a nanoring structure 2 disposed on a surface of the substrate, where the nanoring structure 2 includes a plurality of annular nanorings 21 and a plurality of air ring spaces 22 formed between the plurality of nanorings 21. The substrate 1 is transparent, that is, the substrate 1 is made of a transparent material, and the substrate 1 may be made of quartz glass or other transparent materials. In addition, the thickness of the substrate 1 may be designed as required, and optionally, the thickness of the substrate 1 is greater than or equal to 0.17mm (unit: mm) and less than or equal to 2mm, for example, the thickness of the substrate 1 may be 0.17mm, 0.18mm, 0.19mm, 2mm, and the like.

The diameters of the nanorings 21 are different from each other, and the nanorings 21 are coaxially distributed. In this embodiment, the diameter of the nanoring 21 may refer to the inner diameter of the nanoring 21 or the outer diameter of the nanoring 21, and the diameters of the nanorings 21 are different from each other, and the nanorings 21 include: the inner diameters of the nanorings 21 are different from each other, and the outer diameters of the nanorings 21 are different from each other. Correspondingly, the air ring spacers 22 are also circular, the diameters of the air ring spacers 22 are different from each other, and the air ring spacers 22 of the present embodiment are also coaxially distributed. Wherein, the diameter of the air ring interval 22 can refer to the inner diameter of the air ring interval 22, and also can refer to the outer diameter of the air ring interval 22, and the diameters of the air ring intervals 22 are different from each other and include: the inner diameters of the plurality of air ring spaces 22 are different, and the outer diameters of the plurality of air ring spaces 22 are also different.

In this embodiment, at least one of the height and the width of at least some of the air-ring spaces 22 is unequal, so that the optical phases of the air-ring spaces at different positions are different, and thus the different positions of the nanoring structure 2 have different optical phases, so as to define the phase distribution of the superlens 100. Optionally, in some embodiments, the heights of at least some of the air ring spaces 22 are not equal; in some embodiments, the widths of at least some of the air ring spaces 22 are not equal; in certain embodiments, the heights of at least some of the air ring spaces 22 are unequal, and the widths of at least some of the air ring spaces 22 are unequal. It should be noted that the height of the air ring interval 22 refers to the depth of the air ring interval 22, wherein the depth of the air ring interval 22 is along the radial direction perpendicular to the air ring, the width of the air ring interval 22 is the width of the air ring interval 22 in the radial direction, and the width of the air ring interval 22 is the absolute value of the difference between the outer diameter and the inner diameter of the air ring interval 22. In addition, the height and width of the air ring space 22 are nanometer-scale in size. Specifically, different strategies may be employed such that the optical phase of the air ring spacer 22 at different locations is different, for example, optionally, the optical phase of the air ring spacer 22 is related to the height and width of the air ring spacer 22; optionally, the optical phase of the air ring space 22 is related to the size of the height or width of the air ring space 22. The height and/or width dimensions of the air ring spaces 22 at different locations are designed to be unequal so that the optical phase of the nanoring structures 2 at different locations is different.

It should be noted that, in the embodiment of the present invention, the optical phase of the nanoring 21 corresponds to the optical phase of the air ring gap 22, and the optical phases of the nanorings 21 at different positions are also different, so as to define the phase distribution of the superlens 100.

In the embodiment, the nanoring structure 2 is a monolithic structure, and the thickness of the nanoring structure 2 is on the order of micrometers, so that the nanoring structure 2 on the substrate 1 is similar to a planar structure. Alternatively, the nanoring structure 2 may have a thickness of 5 μm or less (unit: micrometer), such as 0.5 μm, 1 μm, 1.5 μm, 2 μm, 2.5 μm, 3 μm, 3.5 μm, 4 μm, 4.5 μm, 5 μm, and the like. Optionally, the nanoring structure 2 has a thickness in the same order of magnitude as the operating wavelength of the superlens 100. In the embodiment of the present invention, the thickness of the superlens 100 refers to the thickness of the nanoring structure 2, and actually, the substrate 1 is only a supporting structure for supporting the nanoring structure 2, and does not affect the optical performance of the superlens 100.

The material of the nanoring structure 2 may be one of the following materials: photoresist, quartz glass, silicon nitride, titanium oxide and monocrystalline silicon; of course, the material of the nanoring structure 2 may be other.

It is understood that the material of the substrate 1 may be the same as or different from that of the nanoring.

In some embodiments, as shown in fig. 1C, the superlens 100 manufactured by using the nanoring structure 2 has a function of infinity corrected aberration focusing/imaging, that is, the superlens 100 has a phase distribution on an infinity axis and an off-axis aberration corrected lens, the image on the axis of the superlens 100 has no spherical aberration, the image on the axis of the superlens 100 has no coma aberration and off-axis aberration, and optionally, the thickness of the superlens 100 is 1 μm, which is in the same order of magnitude as the operating wavelength of the superlens 100 is 0.633 μm. As shown in fig. 1D, the conventional refractive lens (the thickness of the refractive lens is 0.8mm) forms spherical aberration on the axis, forms coma aberration off the axis, and has a lens thickness on the millimeter level, which is much larger than the wavelength level.

Optionally, the air ring spacer 22 includes air ring spacers with multiple heights, that is, the air ring spacer 22 has multiple different heights, for example, the air ring spacer 22 in the third row of fig. 1E has two heights, but the air ring spacer 22 may also have three heights, four heights, or other heights. The air ring interval 22 with n-order height, the optical phase of the air ring interval 22 is (n +1) -order optical phase, that is, the air ring interval 22 has n different heights, and the air ring interval 22 forms (n +1) optical phases with different sizes. Taking the air ring interval 22 in row three of fig. 1E as an example, the height of the air ring interval 22 in the region 221 > the height of the air ring interval 22 in the region 222, and the air ring interval does not exist in the region 223, so the region 221, the region 222, and the region 223 have different optical phases, that is, the air ring interval 22 in two-step height in row three of fig. 1E, forms a three-step optical phase.

Optionally, the nanoring structure 2 is equivalent to a stacked arrangement of multiple nanoring structures with air ring spacing of single-step height along the height direction, that is, multiple nanoring structures with air ring spacing of single-step height are stacked together along the height direction to form the nanoring structure 2 of the superlens.

As a feasible implementation manner, the nanoring structure 2 is equivalent to a two-layer nanoring structure with air ring space of single-step height formed by stacking along the height direction, optionally, the nanoring structure obtained by fusing the two-layer nanoring structure with air ring space 22 of single-step height may include air ring space of second-step height and/or air ring space of single-step height, as shown in fig. 1E, 1F and 1G, wherein the sectional view of the first layer nanoring structure is shown in fig. 1E as row ((r)) and the sectional view of the second layer nanoring structure is shown in fig. 1E as row ((r)) and the third layer of nanoring structure is shown in fig. 1E as row ((r)) of the single-layer nanoring structure with second-step height after fusion. During stacking, for the air ring interval overlapped in the height direction of the two layers of nano-ring structures, the height of the overlapped part is the sum of the height of the air ring interval of the two layers of nano-ring structures, such as the stacking of the first row and the second row in fig. 1E; and for the air ring interval with two layers of nano-ring structures which are not overlapped in the height direction, the height is not changed.

To achieve the superlens 100 function as in the example of fig. 1C, the two nanoring structures with single-step height air-ring spacing are respectively a first layer nanoring structure and a second layer nanoring structure, the air-ring spacing of the first layer nanoring structure is referred to as a first layer air-ring spacing, and the air-ring spacing of the second layer nanoring structure is referred to as a second air-ring spacing. The position of the fused air ring spacing should satisfy the following optimization constraints:

in the formula (1), I_on-axis(z₀) Is a focal light intensity map of incident light at 0 field of view; i is_off-axis(z₀) Is a focal light intensity map of incident light at maximum half field incidence; the light intensity I can be determined based on the rayleigh-somofetil diffraction principle; z is a radical of₀The position of the focal point on the optical axis; c. C₁And c₂For the weighting factor, optionally, c₁＝c₂1, of course, c₁And c₂Other values may also be set; a is_mThe number of the air ring intervals between the current air ring interval and the center of a concentric circle (a concentric circle with a plurality of air ring intervals) is +1, and it can be understood that the air ring interval closest to the center of the circle is the first level, and the number of the stages of the air ring intervals is sequentially increased from the center of the circle to the outside; b_mIs the center position of the second layer air ring interval of the m-th level, and it should be noted that, in the present invention, the center position of the air ring interval refers to the outside of the air ring intervalThe location of the radial edge and the center ring of the inner radial edge; l is the minimum distance between adjacent air ring spaces of each layer, and is optionally 800nm (unit: nm), although l can be set to other values; d is the minimum radius of the center position of the first layer air ring interval and the second layer air ring interval, and optionally, d is 1.4 μm, and of course, d can also be set to other values; ea_mIs the mth stage first layer air ring spacing edge position (including the outer diameter edge and the inner diameter edge); eb_nThe number of the air ring intervals between the current air ring interval and the center of a concentric circle (a concentric circle with a plurality of air ring intervals) is + 1; d_FThe minimum processing precision, which can be achieved when the device for processing the superlens 100 of the present embodiment processes the air ring gap 22, is optionally achieved by forming the nanoring structures 2, d on the substrate 1 by using an electron beam lithography technique_FIs 50 nm; optionally, the nanoring structures 2, d are formed on the substrate 1 by a three-dimensional printing technique_FIs 200 nm; NA is the numerical aperture of the superlens; NA_minIs the minimum numerical aperture, NA for a 100 μm superlens 100_min0.75, NA for a 1mm superlens 100_minIs 0.45.

It is understood that the nanoring structure 2 formed by stacking two nanoring structures with air ring spacing of single step height along the height direction is only an example, and more than two nanoring structures with air ring spacing of single step height may be selected to be stacked along the height direction to form the nanoring structure 2, which is not an example here.

During processing, the fused nanoring structure 2 is directly processed and formed.

Optionally, in the embodiment of the present invention, the widths of all the nanorings 21 are 400nm, and of course, other widths of the nanorings 21 may be selected.

Optionally, when processing the superlens, firstly, the nano-structure 2 is formed on the substrate 1, and then the air ring space 22 is processed on the nano-structure 2 by using a laser or a three-dimensional printing technology, so as to form the nano-ring 21 and the air ring space 22.

In some embodiments, the superlens 100 is fabricated by three-dimensional printing techniques. As shown in FIG. 1H, the entire superlens 100 is divided into a plurality of write fields (m rows, n columns) and printed in a "zigzag" order from (1,1) to (m, n), and the entire print process time is proportional to the number of write fields, within a few minutes to a few hours. It should be understood that the write field sequence may take other forms.

Fig. 2 is a diagram of an experimental setup for measuring the size of the focal spot of the superlens 100, and the line with an arrow in fig. 2 represents light. In some embodiments of the present invention, a he — ne laser is used as the first light source 210 for testing, and the variable optical attenuator 220 is used to adjust the incident light intensity of the entire test system. The filtering system 230 comprising the first lens 231, the second lens 232 and the pinhole 233 realizes spatial filtering, the pinhole 233 is located at the common focal point of the first lens 231 and the second lens 232, and the focal length f1 of the first lens 231 and the focal length f2 of the second lens 232 can be the same or different. The spatial filter system 230 functions to ensure uniformity of the light spot incident on the superlens 100 under test. The superlens 100 is located on the xy bidirectional displacement platform 240, wherein y displacement is used for adjusting the position of the superlens 100 and ensuring that incident light irradiates on the superlens 100; the x displacement is used to measure the focus light intensity distribution of the superlens 100 in the optical axis direction. The magnifying system 250 composed of the first microscope objective 251, the third lens 252 (tube lens) and the first photosensitive camera 253 can capture the spot intensity patterns of the tested superlens 100 at different incident angles θ, and the first photosensitive camera 253 can be a CCD camera, and can also be other types of first photosensitive cameras 253. It should be appreciated that in some examples, the first light source 210 may be selected from other lasers, such as a super-continuum laser in the visible band or a laser in the infrared band. It should also be appreciated that the spatial filtering system 230 is not present in some embodiments due to the good light source characteristics. In addition, the displacement platform 240 may be replaced with a more directional displacement platform. The first lens 231, the second lens 232, and the third lens 252 are normal lenses.

FIGS. 3A to 3C are graphs showing an operating wavelength of 633nm, a numerical aperture of 0.75, a lens thickness of 240nm, a focal length of 100 μm, and a full field of view of 20 °The focal spot test results of the superlens 100 at incident angles θ of 0 °, 5 °, and 10 °, respectively. When the light is incident at 0 degree, the half-height width of the focal spot is 410nm, which is slightly less than the diffraction-limited half-height widthWhere λ is the wavelength and NA is the numerical aperture of the superlens 100. Fig. 3D to 3E are graphs of focal spot simulation results for spherical aberration correcting lenses having an operating wavelength of 633nm and a numerical aperture of 0.75 at incident angles θ of 0 °, 5 °, and 10 °, respectively. Comparing fig. 3B and 3E, and fig. 3C and 3F, respectively, it can be seen that the off-axis aberration of the superlens 100 of the present embodiment is well compensated and corrected compared to the spherical aberration correction lens when the incident angles are 5 ° and 10 °.

Fig. 3G-3I are graphs of focal spot test results for a superlens 100 having an operating wavelength of 633nm, a numerical aperture of 0.45, a lens thickness of 1000nm, a focal length of 1mm, and a full field of view of 32 °, at incident angles of 0 °, 8 °, and 16 °, respectively. At 0 DEG incidence, the half-height width of the focal spot is 720nm, which is approximately equal to the diffraction-limited half-height widthAnd (4) the equivalent. When the light is incident at 8 degrees, off-axis aberration is well compensated and corrected, and the half-height width of a focal spot is 900 nm; when the light enters at 16 degrees, the off-axis aberration is compensated and corrected to a certain extent, and the half-height width of a focal spot is 1300 nm.

To compare the performance of the superlens 100 with that of the prior art refractive lens, the focal spot intensity at the same incident angle for the same numerical aperture and focal length of the refractive lens was also recorded. Fig. 3J to 3L are graphs of focal spot test results of the conventional refractive lens at incident angles of 0 °, 8 ° and 16 °, respectively. Comparing the superlens 100 with existing refractive lenses, which are thicker and more expensive than the superlens 100; in contrast to the focal spot pattern, the superlens 100 may focus the incident light to a smaller size, resulting in a higher resolution.

FIGS. 3M and 3N are Modulation Transfer Function (MTF) diagrams of the superlens 100 according to the present invention and a conventional refractive lens, respectively; wherein, the solid line plus the star curve is the modulation transfer function in the meridian direction, and only the star curve is the modulation transfer function in the sagittal direction. Comparing the modulation transfer function diagram of the superlens 100 with that of the conventional refractive lens, the superlens 100 has a better contrast ratio than that of the conventional refractive lens at the same frequency and the same incident angle, thereby confirming that the superlens 100 has a better resolution ratio than that of the conventional refractive lens.

Fig. 4A and 4B show a 0 ° field-of-view image of a resolution target and its central magnified view, respectively, of a superlens 100 with an operating wavelength of 633nm, a numerical aperture of 0.45, a lens thickness of 1000nm, a focal length of 1mm, and a full field of view of 32 °. In order to compare the actual imaging performance difference between the conventional refractive lens and the superlens 100, fig. 4C and 4D respectively show the resolution target 0 ° field imaging diagram and the central enlarged view of the conventional refractive lens with the same numerical aperture and focal length. As can be seen from the comparison of the imaging graphs, the imaging quality of the superlens 100 is better than that of the existing refractive lens under the condition of 0-degree field imaging. Fig. 4E and fig. 4F are 16 ° field-of-view imaging diagrams of the superlens 100 and the conventional refractive lens, respectively, and it can be seen from comparison between the imaging diagrams, that in the case of 16 ° field-of-view imaging, the imaging quality of the superlens 100 is better than that of the conventional refractive lens.

It should be noted that the superlens 100 can be applied to an optical system. An embodiment of the present invention further provides an optical system, including: and a mounting block and the superlens 100, wherein the superlens 100 is mounted on the mounting block.

Fig. 4G shows an optical system using the superlens 100 described above.

Specifically, fig. 4G shows a schematic diagram of a microscope imaging system of a superlens 100 with a working wavelength of 633nm, a numerical aperture of 0.45, a lens thickness of 1000nm, a focal length of 1mm, and a full field of view of 32 °, and the line with an arrow in fig. 4G indicates the relationship, wherein a second light source 310, such as a he-ne laser, is followed by a laser speckle remover 320 for removing laser speckle. The high-power second microscope objective 330 is used for imaging the sample by high-intensity illumination, the superlens 100 and a fourth lens 340 (which may be a tube lens or other common lens) with a focal length f of 25.4mm form a superlens 100 microscope, and the second photosensitive camera 350 is located on the focal plane of the tube lens for recording a magnified image of the sample. It should be appreciated that in some examples, the second light source 310 may be selected from other lasers, such as a super-continuum laser in the visible band or a laser in the infrared band.

FIG. 4H is a magnified image of the target object taken by the microscopic imaging system shown in FIG. 4G, in which the smallest line is well resolved (single line width 2.2 μm), thus demonstrating that the superlens 100 has a resolution at least better than 2.2 μm; the image length and width was 275 μm x 206 μm and 206 μm, corresponding to a field of view of the microscopic imaging system of at least 275 μm x 206 μm. Fig. 4I shows a bird feather sample, in which feather feathers and feather twigs are clearly visible, thus demonstrating that the above-described microscopic imaging system can be used for practical microscopic imaging.

Example two

Referring to fig. 5A, a superlens according to a second embodiment of the present invention includes a substrate 1 and a nano-pillar structure 3. The substrate 1 is transparent, that is, the substrate 1 is made of a transparent material, and the substrate 1 may be made of quartz glass or other transparent materials. In addition, the thickness of the substrate 1 may be designed as required, and optionally, the thickness of the substrate 1 is greater than or equal to 0.17mm (unit: mm) and less than or equal to 2mm, for example, the thickness of the substrate 1 may be 0.17mm, 0.18mm, 0.19mm, 2mm, and the like.

The nano-pillar structures 3 include a plurality of nano-pillar structures 3, and the plurality of nano-pillar structures 3 are disposed on the same surface of the substrate 1. In this embodiment, the plurality of nanorod structures 3 are arranged in an array. Further, the plurality of nanopillar structures 3 includes at least one of negative nanopillar structures 31 and hollow nanopillar structures 32. As shown in fig. 5B, the negative nano-pillar structure 31 includes a first pillar 311, the cross section of the first pillar 311 is a regular hexagon, and the first pillar 311 has a first hollow 312 in a cylindrical shape extending from the top to the bottom thereof. The negative nanorod structures 31 have a height H in the z-direction in the range of 300nm to 1500nm, for example, H may be set to 300nm, 400nm, 500nm, 600nm, 700nm, 800nm, 900nm, 1000nm, 1100nm, 1200nm, 1300nm, 1400nm, 1500nm, etc.; meanwhile, the negative nanorod structures 31 have a cross-sectional diameter d in the x-y plane ranging from 40nm to 400nm, e.g., d may be set to 40nm, 50nm, 150nm, 200nm, 250nm, 300nm, 350nm, 400nm, etc. As shown in fig. 5C, the hollow nano-pillar structure 32 includes a first cylinder 321 having a second hollow 322 in a cylindrical shape extending from the top to the bottom of the first cylinder 321. The hollow nanorod structures 32 have a height H in the z-direction in the range of 300nm to 1500nm, for example, H may be set to 300nm, 400nm, 500nm, 600nm, 700nm, 800nm, 900nm, 1000nm, 1100nm, 1200nm, 1300nm, 1400nm, 1500nm, etc.; also, the hollow nanorod structures 32 have a cross-sectional outer diameter d in the x-y plane₁And an inner diameter d₂，d₁-d₂In the range of 40nm to 400nm, e.g. d₁-d₂May be set to 40nm, 50nm, 150nm, 200nm, 250nm, 300nm, 350nm, 400nm, and so on.

In some embodiments, the superlens is composed of a plurality of negative nanopillar structures 31 arranged in an array on the same surface of the substrate 1; in some embodiments, the superlens is composed of a plurality of hollow nano-pillar structures 32 arranged in an array on the same surface of the substrate 1; in some embodiments, the superlens is composed of a plurality of negative nano-pillars and a plurality of hollow nano-pillar structures 32 arranged in an array on the same surface of the substrate 1, in this embodiment, the surface of the substrate 1 is divided into a plurality of regions, and the same type of nano-pillar structures 3 are disposed in the same region.

The negative nanorod structure 31 and the hollow nanorod structure 32 of this embodiment are axisymmetric structures, and due to the circular symmetry of the nanorod structure 3, the nanorod structure 3 is not sensitive to the polarization of incident light.

In some embodiments, the nano-pillar structure 3 further includes a positive nano-pillar structure 33, and referring to fig. 5D, the positive nano-pillar structure 33 includes a second cylinder, and the second cylinder is a solid structure, and the positive nano-pillar structure 33 of the present embodiment is also an axisymmetric structure. The positive nanorod structures 33 have a height H in the z-direction in the range of 300nm to 1500nm, e.g., H can be set to 300nm, 400nm, 500nm, 600nm, 700nm, 800nm, 900nm, 1000nm, 1100nm, 1200nm, 1300nm, 1400nm, 1500nm, etc.; meanwhile, the positive nanorod structures 33 have a cross-sectional diameter d in the x-y plane, ranging from 40nm to 400nm, e.g., d may be set to 40nm, 50nm, 150nm, 200nm, 250nm, 300nm, 350nm, 400nm, etc.

Optionally, the superlens is composed of a plurality of negative nanopillars and a plurality of positive nanopillar structures 33 arranged in an array on the same surface of the substrate 1; optionally, the superlens is composed of a plurality of positive nanopillars and a plurality of hollow nanopillar structures 32 arranged in an array on the same surface of the substrate 1; optionally, the superlens is composed of a plurality of negative nano-pillars, a plurality of positive nano-pillar structures 33, and a plurality of hollow nano-pillar structures 32 arranged in an array on the same surface of the substrate 1. It should be noted that, when the superlens includes different types of nano-pillar structures 3, the surface of the substrate 1 is divided into a plurality of regions, and the same type of nano-pillar structures 3 are disposed in the same region.

In addition, in the present embodiment, the light phases of the nano-pillar structures 3 at different positions are different to define the phase distribution of the superlens, and the group delay of the nano-pillars at different positions is different to define the chromatic aberration characteristic of the superlens. Specifically, different strategies may be adopted, such that the optical phases of the nano-pillar structures 3 at different positions are different to define the phase distribution of the superlens, and the group delay of the nano-pillars at different positions is different, for example, in one embodiment, the optical phases of the positive nano-pillar structure 33 and the negative nano-pillar structure 31 are related to the height and diameter of the corresponding nano-pillar structure 3, that is, the optical phase of the positive nano-pillar structure 33 is related to the height and diameter of the positive nano-pillar structure 33, and the optical phase of the negative nano-pillar structure 31 is related to the height and diameter of the negative nano-pillar structure 31. Wherein, the height of the positive nanorod structure 33 is the height of the second cylinder (i.e. H in fig. 5C), and the diameter of the positive nanorod structure 33 is the diameter of the second cylinder (i.e. d in fig. 5C); the height of the negative nanorod structures 31 is the height of the first pillars 311 (H in fig. 5A), and the width of the negative nanorod structures 31 is the diameter of the first hollow 312 on the first pillars 311 (d in fig. 5A). The optical phase of the hollow nano-pillar structure 32 is related to the inner and outer diameters of the hollow nano-pillar structure 32, wherein the height of the hollow nano-pillar structure 32 is the height of the first cylinder 321 (i.e. H in fig. 5B), and the diameter of the hollow nano-pillar structure 32 includes the diameter of the first cylinder 321 (i.e. d in fig. 5B)₁) And a first cylinderDiameter of the second hollow portion 322 on 321 (d in fig. 5B)₂). In other embodiments, the nano-pillar structures 3 at different positions are made of different materials, so that the light phases of the nano-pillar structures 3 at different positions are different.

Referring to fig. 5A again, for each nano-pillar structure 3, the other nano-pillar structures 3 surrounding the nano-pillar structure 3 are located at different vertexes of the same regular hexagon, and the nano-pillar structures 3 are located at the center positions of the corresponding regular hexagons, so that the array arrangement is performed, the number of the nano-pillar structures 3 of the formed superlens is the minimum, and the performance of the formed superlens also meets the requirements; of course, in other embodiments, the plurality of nano-pillars may be arranged in other array shapes.

In the present embodiment, the thickness of the whole structure formed by the plurality of nano-pillar structures 3 is in the micrometer scale, and therefore, the nano-pillar structures 3 on the substrate 1 approximate to a planar structure. Alternatively, the thickness of the overall structure formed by the plurality of nanopillar structures 3 is 5 μm or less (unit: micrometer), such as 0.15 μm, 0.5 μm, 1 μm, 1.5 μm, 2 μm, 2.5 μm, 3 μm, 3.5 μm, 4 μm, 4.5 μm, 5 μm, and the like. Optionally, the thickness of the whole structure formed by the plurality of nano-pillar structures 3 is the same order of magnitude as the operating wavelength of the superlens. In addition, in the embodiment of the present invention, the thickness of the superlens refers to the thickness of the entire structure formed by the plurality of nano-pillar structures 3, and actually, the substrate 1 is only a supporting structure for supporting the plurality of nano-pillar structures 3, and does not affect the optical performance of the superlens.

The material of the nano-pillar structure 3 may be one of the following: photoresist, quartz glass, silicon nitride, titanium oxide and monocrystalline silicon; of course, the material of the nano-pillar structure 3 may be other.

In some embodiments, the superlens has a phase distribution of a positive and negative aspherical lens or axicon lens.

For a superlens with a designed operating wavelength of 940nm, the nano-pillar structure 3 is made of a single crystal silicon material, the design height is 500nm, the side of the corresponding regular hexagonal basic unit is 404.15nm, and fig. 5E shows the relationship between the optical phase at 940nm and the radius of the nano-pillar structure 3. For a superlens with a design working wavelength of 550nm, the nano-pillar structure 3 is made of a single crystal silicon material, the design height is 750nm, the side of the corresponding regular hexagonal basic unit is 381.05nm, and fig. 5F shows the relationship between the optical phase at 550nm and the radius of the nano-pillar structure 3.

FIG. 5G is the optical phase distribution diagram of the lens surface of the spherical aberration correction nano-rod superlens with the working wavelength of 940nm, the focal length of 100 μm and the aperture of 100 μm, and the optical phase thereofSatisfies the following conditions:

in formula (2), k is the wave number; r is the radius of the surface of the superlens (i.e. the surface of the substrate 1), i.e. the distance from each nano-pillar structure 3 to the center of the substrate 1; f is the superlens design focal length.

Since k and f are known, the optical phase of each nanorod structure 3 can be determined according to the formula (2), and after the optical phase of each nanorod structure 3 is determined, the radius of the nanorod structure 3 at the corresponding position is determined according to the relationship between the optical phase at 940nm and the radius of the nanorod structure 3 as shown in fig. 5E.

FIG. 5H is a diameter processing diagram of the nano-pillar structure 3 of the superlens represented by FIG. 5G; fig. 5I is a simulation diagram of the focused spot of 0 ° incident light of the superlens represented by fig. 5G, which can be obtained by calculating the rayleigh-somofeil diffraction integral or its far-field simplified form fraunhofer diffraction formula.

It should be noted that the superlens of the second embodiment of the present invention can be applied to an optical system, and compared to a conventional optical lens, the superlens of the second embodiment of the present invention allows the optical system to be miniaturized, and the superlens optical system is not sensitive to polarization of light.

The embodiment of the present invention further provides an optical system, which may include at least two superlenses according to the second embodiment of the present invention, wherein the at least two superlenses are disposed at an interval.

In some embodiments, the phase profile and group delay are different for all superlenses, with one superlens configured to correct aberrations of the other superlenses. The aberration includes at least one of spherical aberration, coma aberration, astigmatism, curvature of field, distortion, positional aberration, and chromatic aberration of magnification, but the aberration may be other.

FIG. 6A is a schematic diagram of a superlens optical system consisting of two superlenses with an operating wavelength of 940 nm. The system is composed of a first super lens, a second super lens and an image plane. The substrate 1 of the first super lens and the substrate of the second super lens are both made of quartz glass, and the thickness of the first super lens and the thickness of the second super lens are both 775 mu m. The super-surface aperture of the first super lens is 0.9mm, and the light-passing aperture of the back surface of the substrate 1 is 1.85 mm; the air space of 2.4mm is arranged between the first super lens and the second super lens; the super-surface aperture of the second super lens is 7.6mm, and the light-transmitting aperture of the back surface of the substrate 1 is 6.8 mm; the air space between the image plane and the second super lens is 3mm, and the image plane is 0.9mm high.

FIGS. 6B and 6C are optical phase distribution diagrams of the first and second superlenses, respectively, with the optical phase Rad on the ordinate and the radius (unit: mm) on the abscissa. The whole optical system is designed by the optical design software CODE V10.2 and Matlab 2016a, but is not limited thereto. Wherein, the CODE V10.2 provides ray tracing, focal spot simulation, modulation transfer function, energy enclosing circle and imaging simulation; matlab 2016a implements an interior point optimization algorithm to obtain the optical phase distribution on the first and second superlenses. It should be understood that the material and thickness of the substrate 1 depend on the actual design, and other materials and thicknesses may be used.

The superlens optical system shown in fig. 6A can realize the optical characteristics of the superlens group, such as the F number of the image space of 1.5, the back focal length of 3mm, the field of view of 60 °, the thickness of about 3mm, and the operating band of 940nm, and can focus the incident light to the focal spot with diffraction limited size in all the fields of view, thereby providing high-resolution wide-angle imaging.

FIG. 6D is a simulated focal spot diagram of the superlens optical system of FIG. 6A with incident light converging at 0, 15, and 30, all three fields of view reaching or approximately reaching the diffraction limit. FIG. 6E is a simulated modulation transfer function (R for the meridional direction and T for the sagittal direction) for the superlens optical system of FIG. 6A, where all three fields are at or near the modulation transfer function corresponding to the diffraction limit.

To more clearly show the imaging performance of the superlens optical system shown in fig. 6A, fig. 6F shows a simulated imaging diagram of the superlens optical system. As can be seen from fig. 6F, the images of all fields of view are clearly imaged, but the distortion under large angle imaging still exists.

Fig. 6G shows the energy enclosing circles for the system of fig. 6A at 0 °, 15 ° and 30 ° fields of view. As can be seen from fig. 6E, 90% of the energy is within a circle of 1.5 μm diameter at 0 ° and 15 ° fields of view; at a 30 deg. field of view, 90% of the energy is within a circle of 5 μm diameter. The energy-enclosing circle illustrates the high energy utilization of the superlens system.

FIG. 7A is a schematic diagram of a superlens optical system comprising three superlenses with an operating wavelength of 550 nm. The system is composed of a third super lens, a fourth super lens, a fifth super lens and an image plane. The substrates 1 of the third, fourth and fifth superlenses are all made of quartz glass and are 170 μm thick. The super-surface aperture of the third super lens is 0.54mm, and the light-passing aperture of the back surface of the substrate 1 is 0.76 mm; an air space of 3.083mm is arranged between the third super lens and the fourth super lens; the super-surface aperture of the fourth super lens is 8.6mm, and the light-passing aperture of the back surface of the substrate 1 is 8.5 mm; an air interval of 0.1mm is formed between the fourth super lens and the fifth super lens; the super surface aperture of the fifth super lens is 8.4mm, the air space between the image plane with the light aperture of 8.2mm on the back surface of the substrate 1 and the super fifth lens is 3mm, and the image plane is 0.8mm high.

FIGS. 7B and 7D are optical phase distribution diagrams of the third, fourth, and fifth superlenses, respectively, with the optical phase Rad on the ordinate and the radius (unit: mm) on the abscissa. The whole optical system can be designed by the optical design software CODE V10.2 and the scientific calculation software Matlab 2016a, but is not limited thereto. Wherein CODE V10.2 provides ray tracing, focal spot simulation, modulation transfer function, energy enclosing circle and imaging simulation; matlab 2016a implements an interior point optimization algorithm to obtain the optical phase distributions on the third, fourth, and fifth superlenses. It should be understood that the material and thickness of the substrate 1 of the superlens depends on the actual design, and other materials and thicknesses may be used.

The superlens optical system shown in fig. 7A can realize the optical characteristics of an image F number of 1.5, a back focal length of 3mm, a field of view of 60 °, a thickness of about 4mm, and an operating band of 550nm, and can focus incident light to a focal spot of diffraction-limited size in all fields of view, providing high-resolution wide-angle imaging.

FIG. 7E is a simulated focal spot diagram for 0, 15, and 30 incident light convergence for the superlens system of FIG. 7A, all three fields of view reaching or approximately reaching the diffraction limit. FIG. 7F is a simulated modulation transfer function diagram for the superlens optical system of FIG. 7A (where R represents the meridional direction and T represents the sagittal direction), where all three fields reach or are approximately at the modulation transfer function corresponding to the diffraction limit.

To more clearly show the imaging performance of the superlens optical system shown in fig. 7A, fig. 7G shows a simulated imaging diagram of the superlens optical system. As can be seen from fig. 7G, the image is clearly imaged for all fields of view, but the distortion under large angle imaging still exists.

Fig. 7H illustrates the energy enclosing circles for the system of fig. 7A at 0 °, 15 °, and 30 ° fields of view. As can be seen from fig. 7E, 90% of the energy is within a circle of 3.0 μm diameter at 0 ° and 15 ° fields of view; at a 30 deg. field of view, 90% of the energy is within a 6 μm diameter circle. The energy-enclosing circle illustrates the high energy utilization of the superlens system.

In some embodiments, the optical system further comprises an optical assembly spaced from the superlens, the optical assembly of the present embodiment comprising a lens distinct from the superlens. The lens may include one of a refractive lens and a reflective lens, and may also include a refractive lens and a reflective lens.

As a possible implementation, the lens includes a refractive lens, and a superlens refractive optical component hybrid optical system can be implemented, which can focus all wavelength band incident light to a focal spot of about diffraction limited size in all fields of view, providing high resolution wide-angle imaging. Optionally, the refractive lens has a phase distribution and a group delay distribution of a spherical positive and negative lens, an infinity corrected lens, a schmitt correction plate, or an aspheric lens.

FIG. 8A is a hybrid optical system of a superlens refractive optical assembly with an image F-number of 1.5, a back focal length of 3mm, a field of view of 60, and a band of operation covering the entire visible spectrum (wavelengths between 400nm and 700 nm). The system consists of a sixth super lens, a seventh super lens, a refraction lens, an image plane and air intervals in sequence. The material of the substrate 1 of the sixth and seventh superlenses is quartz glass, and the material of the refractive lens is BK7 glass. The thickness of the sixth super lens and the thickness of the seventh super lens are both 170 mu m, the central thickness of the refraction lens is 0.16mm, and the edge thickness of the refraction lens is 0.517 mm. The super surface aperture of the sixth super lens is 1.04mm, and the light transmission aperture of the back surface of the substrate 1 is 1.26 mm; an air space of 3.187mm is arranged between the sixth super lens and the seventh super lens; the super surface aperture of the seventh super lens is 8.6mm, and the light transmission aperture of the back surface of the substrate 1 is 8.4 mm; the air space of 0.1mm is arranged between the seventh super lens and the refraction lens; the front surface of the refraction lens is a plane, the rear surface of the refraction lens is a spherical surface with the radius of 12.185mm, and the aperture of the light transmission is 7.0 mm. The air space between the image surface and the refraction lens is 3mm, and the image surface is 0.9mm high.

FIGS. 8B and 8C are graphs showing the relationship between the radial optical phase and wavelength (three independent wavelengths selected from 400nm, 550nm and 700nm) of the sixth and seventh superlenses, respectively, with the optical phase (unit: radian Rad) on the ordinate and the radius (unit: mm) on the abscissa. The positive nano-pillar structure 33, the negative nano-pillar structure 31 and the hollow nano-pillar structure 3 can be selected correspondingly according to the optical phase diagram under different wavelengths. The whole optical system is designed by the optical design software CODE V10.2 and the scientific calculation software Matlab 2016a together. Wherein CODE V10.2 provides refractive lens curvature calculation, ray tracing, focal spot simulation, modulation transfer function, energy enclosing circle and imaging simulation; matlab 2016a implements an interior point optimization algorithm to obtain the phase distribution on the super-surface 1, super-surface 2. It should be understood that the material and thickness of the substrate 1 depend on the actual design, and other materials and thicknesses may be used.

FIGS. 8D-8F are graphs of converging simulated focal spots for 0, 15, and 30 incident light wavelengths of the hybrid optical system of FIG. 8A at 400nm, 550nm, and 700nm, respectively, for all three fields of view that reach or are approximately at the diffraction limit. Fig. 8G to 8I are simulation graphs of modulation transfer functions of the hybrid optical system of the superlens refractive optical component shown in fig. 8A at incident light wavelengths of 400nm, 550nm and 700nm, respectively, and each of the three wavelengths reaches or approximately reaches the modulation transfer function corresponding to the diffraction limit.

Further optionally, a plurality of superlenses are provided to correct aberrations of the refractive optical component. The aberration may include at least one of spherical aberration, coma aberration, astigmatism, curvature of field, distortion, positional aberration, and chromatic aberration of magnification, and others.

The superlenses of the above-described first and second embodiments solve the problem of miniaturization and weight reduction of optical systems and provide image quality suitable for commercial, industrial, and scientific applications. Thus, the superlens and optical system described above may have wide applications in micro-optics, imaging and spectroscopy, as well as other applications, such as cell phone cameras, security monitoring probes, microscopes, virtual reality projection lenses, and augmented reality projection lenses, among others. In addition, such superlenses can be fabricated by photolithographic techniques or three-dimensional printing techniques, and the fabrication process is compatible with large-scale integration fabrication processes.

Fig. 9A is a schematic diagram of three-dimensional printing laser direct writing. A pulse infrared laser with 780nm wavelength is converged into a negative photoresist film, and at the laser focus position, the ultraviolet sensitive photoresist is connected together by two-photon polymerization and becomes a solid state. The unexposed parts remain liquid and are cleaned away, and the laser focus is moved in the xyz three directions to print complex structures.

Fig. 9B is a flowchart of processing a micro-nano pillar structure, including the following steps:

(1) the writing field sequence may be either "S" as shown or "Z" as shown in fig. 1G, with a square being filled by successive exposure scans in the x-y plane to create a block of area.

(2) Repeat step 1 at a higher Z position to obtain a thicker block (optional).

(3) The nano-pillar structure 3 is printed by dot exposure, and the diameter of the nano-pillar structure 3 is controlled by the exposure amount.

(4) And repeating the step 3 at the Z position which is a little higher to obtain the nano-pillar structure 3 (optional) with higher Z direction. The thickness of the substrate 1 and the height of the nano-pillar structures 3 can be controlled by the multiple laser exposures of step 2 and step 4.

It is to be understood that both the foregoing general description and the following detailed description are exemplary and explanatory only and are not restrictive of the invention, as claimed.

The above description is only for the purpose of illustrating the preferred embodiments of the present invention and is not to be construed as limiting the invention, and any modifications, equivalents, improvements and the like made within the spirit and principle of the present invention should be included in the scope of the present invention.