阅读说明：本技术 一种实现大面积多光源高均匀性曝光装置及其制作方法 (Device for realizing large-area multi-light-source high-uniformity exposure and manufacturing method thereof ) 是由 叶芸 曹项红 郭太良 林映飞 江宗钊 杨涛 张翔 于 2020-12-31 设计创作，主要内容包括：本发明涉及一种实现大面积多光源高均匀性曝光装置,其特征在于：包括多光源切换装置、线光源、抛物面四棱台反光罩,曝光台面,其特征在于：所述抛物面四棱台反光罩上下端面贯通,其四周面均为曲面,抛物面四棱台反光罩上端开口小于下端开口且上端开口位于线光源正下方,所述线光源设置若干且均安装在多光源切换装置上并经其步序切换,所述曝光台面位于抛物面四棱台反光罩下端开口下方,所述抛物面四棱台反光罩周面均为双层结构,将光照直接接触的部分定义为外层,即内外分别为光吸收层与反射层,该多光源高均匀性曝光装置结构简单,有效降低成本。(The invention relates to an exposure device for realizing large-area multi-light-source high uniformity, which is characterized in that: including many light source auto-change over device, line source, parabolic four-edged terrace reflector, exposure mesa, its characterized in that: the end surface link up about the four terrace with edge of paraboloid reflector, its four global is the curved surface, and the opening of four terrace with edge reflectors upper end is less than lower extreme opening and upper end opening and is located under the line source, the line source sets up a plurality ofly and all installs on many light source auto-change over device and switches over through its preface, the exposure mesa is located four terrace with edge reflectors lower extreme opening below of paraboloid, four terrace with edge reflectors global is bilayer structure, is the partial definition of illumination direct contact for outer, is light absorption layer and reflecting layer inside and outside respectively promptly, this many light source high homogeneity exposure device simple structure, effective reduce cost.)

1. The utility model provides a realize high homogeneity exposure device of many light sources of large tracts of land, includes many light source auto-change over device, line source, parabolic four prismatic table reflectors, the exposure mesa, its characterized in that: the end surface link up about the four terrace with edge of paraboloid reflector, its four global is the curved surface, and the opening of four terrace with edge of paraboloid reflector upper end is less than lower extreme opening and upper end opening and is located under the line source, the line source sets up a plurality ofly and all installs on many light source auto-change over device and switches through its preface, the exposure mesa is located four terrace with edge of paraboloid reflector lower extreme opening below, four terrace with edge of paraboloid reflector global is bilayer structure, is outer with the partial definition of illumination direct contact, and inside and outside is light absorbing layer and reflector layer respectively.

2. An exposure apparatus for realizing large area multiple light sources high uniformity according to claim 1, wherein: the linear light source is positioned at the upper opening of the parabolic quadrangular frustum reflector, and the upper opening of the parabolic quadrangular frustum reflector can be rectangular or square.

3. An exposure apparatus for realizing large area multiple light sources high uniformity according to claim 2, wherein: the line light source category may be mercury lamp light sources: the light source comprises a G line, an H line and an I line, wherein the wavelengths are 436nm, 405nm and 365nm respectively, and the excimer laser light source comprises: including XeF, XeCl, KrF, ArF, wavelength is 351nm, 308nm, 248nm, 193nm respectively, fluorine laser light source: comprising F₂The wavelength was 157 nm.

4. An exposure apparatus for realizing large area multiple light sources high uniformity according to claim 1, wherein: the parabolic quadrangular frustum pyramid reflector comprises a double-layer structure, an outer layer (reflecting layer) material of the double-layer structure is a material with high reflectivity and low diffuse reflectivity, the reflectivity is more than or equal to 90% -95%, the diffuse reflectivity is less than or equal to 5% -10%, and an inner layer (light absorption layer) material is a low-reflection metal plate material subjected to blackening and roughening treatment.

5. The exposure apparatus according to claim 4, wherein the apparatus comprises: the parabolic quadrangular frustum pyramid reflector is characterized in that light intensity adjusting holes are formed in the reflecting layer in a penetrating mode, a plurality of rows of light intensity adjusting holes are formed in the light intensity adjusting holes in an up-down parallel mode, the apertures of the light intensity adjusting holes in different rows are different, and the apertures of the light intensity adjusting holes in the same row are the same.

6. An exposure apparatus for realizing large area multiple light sources high uniformity according to claim 1, wherein: the light absorption layer has different internal density distribution and gradually decreases in density from the light source to the far light source.

7. An exposure apparatus for realizing large area multiple light sources high uniformity according to claim 1, wherein: the multi-light source switching device comprises an air cylinder and a guide rail, the output end of the air cylinder is fixedly connected with a U-shaped slide bar bending part, two sides of the slide bar are in sliding butt joint with the guide rail, and a plurality of line light sources are uniformly distributed along the length direction of the slide bar and are pushed and pulled through the air cylinder to perform light source switching adjustment.

8. A method for manufacturing an exposure apparatus for realizing high uniformity of a large area multiple light sources, which is characterized by adopting the exposure apparatus for realizing high uniformity of a large area multiple light sources as claimed in any one of claims 1 to 7 and comprising the following steps: step S1, manufacturing a parabolic quadrangular frustum pyramid reflector; step S2, manufacturing a paraboloid structure at the inner side of the paraboloid quadrangular frustum pyramid; step S3, using Tracepro or other optical simulation software to simulate the light receiving uniformity of the paraboloid reflecting surface, and obtaining an optimal density array by simulating the arrangement of the array patterns of the light absorption layers with different densities; and step S4, making a reflecting layer array pattern, actually measuring the light uniformity, and then correcting the density distribution of the light absorption layer array to obtain the exposure effect with high uniformity.

Technical Field

The invention relates to the technical field of exposure equipment, in particular to a device for realizing large-area multi-light-source high-uniformity exposure and a manufacturing method thereof.

Background

Photolithography has wide applications in semiconductor manufacturing, integrated circuit, LED manufacturing, flexible PCB circuit boards, flexible printing manufacturing, and the like. Along with the increasingly higher requirements of the market on the product performance, the competition becomes more intense.

Furthermore, the devices face significant challenges in performance as well as cost. The equipment of the large-area exposure machine on the market at present only has a single exposure light source, and the compatibility of different photosensitive adhesives is not high. On the other hand, when the distribution of energy exposed to the substrate by the light source is different, especially when the large-area patterning preparation process is involved, the difference between the energy at the edge and the energy at the center of a large-area machine station is larger and larger, and the uniformity is difficult to reach more than 90%, so that the difference of the energy absorbed by the photosensitizer is caused, the edge of a pattern formed by photoetching is uneven in different degrees, the product performance quality is reduced, and the product development of the large-area photoetching process is restricted. Meanwhile, the adoption of the efficient energy-saving long-life UVLED to replace the traditional mercury lamp UV exposure lamp source is a future development trend, but the problem of exposure uniformity of the UVLED is a great challenge for popularization and application at present.

Disclosure of Invention

In view of the deficiencies of the prior art, the present invention provides an exposure apparatus for realizing high uniformity of large area multiple light sources and a method for fabricating the same, which has a reasonable structure and a low cost.

In order to solve the technical problems, the technical scheme of the invention is as follows: including many light source auto-change over device, line source, parabolic four-edged terrace reflector, exposure mesa, its characterized in that: the end surface link up about the four terrace with edge of paraboloid reflector, its four global is the curved surface, and the opening of four terrace with edge of paraboloid reflector upper end is less than lower extreme opening and upper end opening and is located under the line source, the line source sets up a plurality ofly and all installs on many light source auto-change over device and switches through its preface, the exposure mesa is located four terrace with edge of paraboloid reflector lower extreme opening below, four terrace with edge of paraboloid reflector global is bilayer structure, is outer with the partial definition of illumination direct contact, is light absorption layer and reflector layer inside and outside respectively promptly.

Furthermore, the position of the line light source is at the upper opening of the parabolic quadrangular frustum reflector, the opening at the upper end of the parabolic quadrangular frustum reflector can be rectangular or square, the position of the line light source is at the upper opening of the parabolic quadrangular frustum reflector and is a focus of the parabolic surface, the area of the opening is determined according to the area of an exposure table board, the larger the area of the table board is, the larger the area of the lower opening is, and the center of the line light source is coincided with the diagonal center of the rectangle or square.

Further, the line light source may be a mercury lamp light source: the light source comprises a G line, an H line and an I line, wherein the wavelengths are 436nm, 405nm and 365nm respectively, and the excimer laser light source comprises: including XeF, XeCl, KrF, ArF, wavelength is 351nm, 308nm, 248nm, 193nm respectively, fluorine laser light source: comprising F₂The wavelength was 157 nm.

Furthermore, the parabolic quadrangular frustum pyramid reflector comprises a double-layer structure, the outer layer (reflecting layer) of the double-layer structure is made of a material with high reflectivity and low diffuse reflectivity, the reflectivity is greater than or equal to 90% -95%, the diffuse reflectivity is less than or equal to 5% -10%, and the inner layer (light absorption layer) of the double-layer structure is made of a blackened and coarsened low-reflection metal plate material.

Furthermore, all run through on the parabolic four-edged table reflector reflection stratum and seted up the light intensity regulation hole, the light intensity regulation hole is all parallel to be opened up a plurality of rows and the equal difference in aperture of the light intensity regulation hole of different rows from top to bottom, and the light intensity regulation hole's of same row aperture is all the same.

Furthermore, the density distribution of the light absorption layer is different and gradually decreases from the light source to the far light source.

Furthermore, many light source auto-change over devices include cylinder and guide rail, the cylinder output links firmly with the draw runner kink of a U type, and this draw runner both sides all with guide rail slip butt joint, the line source all distributes a plurality ofly along draw runner length direction and carries out the light source through the cylinder push-and-pull and switch the regulation.

A manufacturing method for realizing a large-area multi-light-source high-uniformity exposure device comprises the following steps: step S1, manufacturing a parabolic quadrangular frustum pyramid reflector; step S2, manufacturing a paraboloid structure at the inner side of the paraboloid quadrangular frustum pyramid; step S3, using Tracepro or other optical simulation software to simulate the light receiving uniformity of the paraboloid reflecting surface, and obtaining an optimal density array by simulating the arrangement of the array patterns of the light absorption layers with different densities; and step S4, making a reflecting layer array pattern, actually measuring the light uniformity, and then correcting the density distribution of the light absorption layer array to obtain the exposure effect with high uniformity.

Compared with the prior art, the invention has the following beneficial effects: the multi-light source switching device can be flexibly selected according to the photosensitive adhesives with different wavelengths, has multiple purposes, and greatly reduces the manufacturing cost. The density distribution of the light absorption layer is corrected in different areas of the inner surface of the paraboloid quadrangular frustum pyramid, and irradiance with uniformity of 95% or more of the light receiving surface can be obtained. Because the upper and lower opening areas of the paraboloid quadrangular frustum pyramid can be adjusted according to the actual process, and the density and distribution of the array material can be corrected, the structure can be widely applied to the photoetching process for manufacturing large-area patterns, and has great practical significance for realizing large-area high-uniformity exposure, reducing the manufacturing cost and the like.

The present invention will be described in further detail with reference to the accompanying drawings and specific embodiments.

Drawings

FIG. 1 is a schematic configuration diagram of an embodiment of the present invention;

FIG. 2 is a schematic view of a light reflecting layer of a parabolic quadrangular frustum reflector at A;

FIG. 3 is an assembly view of a parabolic quadrangular frustum reflector according to an embodiment of the present invention;

FIG. 4 is a schematic structural diagram of a multi-light-source switching device according to an embodiment of the present invention;

FIG. 5 is a graph of the uniformity of light intensity distribution in an unoptimized optical simulation in an embodiment of the present invention;

fig. 6 is a schematic diagram showing the illuminance uniformity result of Tracepro modeling simulation of the density distribution of the light absorption layer array on the inner surface of the parabolic frustum pyramid reflector in the embodiment of the present invention.

FIG. 7 is a diagram of the uniformity of the light intensity distribution of the optimized optical simulation in the embodiment of the present invention.

In the figure: the device comprises a 1-multi-light source switching device, a 2-linear light source, a 3-paraboloid quadrangular frustum reflector, a 4-exposure table surface, a 5-light absorption layer, a 6-reflection layer, a 7-light intensity adjusting hole, an 8-cylinder, a 9-guide rail and a 10-slide bar.

Detailed Description

In order to make the aforementioned and other features and advantages of the invention more comprehensible, embodiments accompanied with figures are described in detail below.

As shown in fig. 1-7, an exposure device for realizing large-area multi-light-source high uniformity comprises a multi-light-source switching device 1, a line light source 2, a parabolic quadrangular frustum reflector 3 and an exposure table top 4, and is characterized in that: the end surface link up about the four terrace with edge of paraboloid reflector, its four global is the curved surface, and the opening of four terrace with edge of paraboloid reflector upper end is less than lower extreme opening and upper end opening and is located under the line source, the line source sets up a plurality ofly and all installs on many light source auto-change over device and switches through its preface, the exposure mesa is located four terrace with edge of paraboloid reflector lower extreme opening below, four terrace with edge of paraboloid reflector global is bilayer structure, is outer with the partial definition of illumination direct contact, is light absorbing layer 5 and reflector layer 6 inside and outside respectively promptly.

In the embodiment of the invention, the position of the linear light source is at the upper opening of the parabolic quadrangular frustum reflector, the upper opening of the parabolic quadrangular frustum reflector can be rectangular or square, the position of the linear light source is at the upper opening of the parabolic quadrangular frustum reflector and is the focus of the paraboloid, the opening area is determined according to the area of the exposure table, the larger the area of the exposure table is, the larger the area of the lower opening is, and the center of the linear light source is coincided with the diagonal center of the rectangle or square. In this embodiment, the opening size on the parabolic quadrangular frustum pyramid reflector is as follows: length 320mm, width 250mm, lower opening size is: length 720mm, width 650mm, exposure mesa size: the length is 1400mm, the width is 1050mm, and the distance between the opening on the paraboloid quadrangular frustum and the exposure table is 1200 mm.

In an embodiment of the present invention, the line light source may be a mercury lamp light source: the light source comprises a G line, an H line and an I line, wherein the wavelengths are 436nm, 405nm and 365nm respectively, and the excimer laser light source comprises: including XeF, XeCl, KrF, ArF, wavelength is 351nm, 308nm, 248nm, 193nm respectively, fluorine laser light source: comprising F₂And the wavelength is 157nm, and preferably, the combination of the G line light source and the H line light source is placed on the slide bar and is switched by means of telescopic driving of the air cylinder. The type and the number of the multiple light sources can be designed according to the actual process, and the multiple light sources can be placed on the slide bar at the same time.

In the embodiment of the invention, the parabolic quadrangular frustum reflector comprises a double-layer structure, the outer layer (reflecting layer) material of the double-layer structure is a material with high reflectivity and low diffuse reflectivity, the reflectivity is more than or equal to 90-95 percent, the diffuse reflectivity is less than or equal to 5-10 percent, and materials such as mirror silver, polished mirror aluminum oxide and the like, in this embodiment, the embossed bean-grain silver mirror aluminum plate is selected, the inner layer (light absorption layer) is made of a blackened and roughened low-reflection metal plate material, the light absorption layer is provided with array substances with different distribution densities according to the difference of the light intensity of each part to weaken the light intensity, the dividing method is designed according to the area of the light source and the exposure table, and is divided into three parts in the embodiment, the shape of the partial array can be rectangular, circular, oval, parallelogram, rhombus, triangle or other polygonal arrays and the like.

In the embodiment of the invention, the reflecting layers of the parabolic quadrangular frustum reflecting cover are all provided with light intensity adjusting holes 7 in a penetrating way, the light intensity adjusting holes are all provided with a plurality of rows in parallel up and down, the apertures of the light intensity adjusting holes in different rows are all different, and the apertures of the light intensity adjusting holes in the same row are all the same.

In the embodiment of the invention, the light absorption layer has different internal density distribution, and the density of the light absorption layer gradually decreases from the position close to the light source to the position far away from the light source, and the light absorption layer array material in the embodiment is preferably a metal material, in particular a coarsened and blackened aluminum plate.

In the embodiment of the invention, the multi-light source switching device comprises an air cylinder 8 and a guide rail 9, the output end of the air cylinder is fixedly connected with a bent part of a U-shaped slide bar 10, two sides of the slide bar are in sliding butt joint with the guide rail, a plurality of linear light sources are uniformly distributed along the length direction of the slide bar and are pushed and pulled by the air cylinder to switch and adjust the light sources, and the linear light sources are fixedly arranged on the slide bar at intervals.

A manufacturing method for realizing a large-area multi-light-source high-uniformity exposure device is carried out according to the following steps:

step S1, manufacturing a parabolic quadrangular frustum pyramid reflector;

measuring the length a, the width b and the height h (namely the focus of the paraboloid) of the light receiving surface of the paraboloid quadrangular frustum pyramid reflector, and manufacturing the paraboloid quadrangular frustum pyramid reflector, wherein in the embodiment, referring to fig. 3, paraboloids 1 and 2 are respectively translated in the opposite directions along the x direction for a certain distance to obtain two horizontally opposite groove curved surfaces; rotating 90 degrees, and respectively and reversely translating for a certain distance along the y direction to obtain another two vertically opposite groove curved surfaces. The 4 concave curved surfaces can form a standard rectangular compound parabolic reflecting cup;

s2, manufacturing a paraboloid structure in the paraboloid quadrangular frustum pyramid;

the inner paraboloid is of a two-layer structure, the part in direct contact with illumination is defined as an outer layer, namely the paraboloid is a light reflection layer, the outer layer is an octagonal round hole array pattern reflection layer with different densities, equal distances and unequal diameters, the reflection layer is a high-reflection embossed bean-pattern mirror aluminum plate, and preferably, the mirror silver or polished mirror aluminum with high reflection and low diffuse reflectance is selected; the inner layer is a blackened aluminum plate or other metal materials which are used as a light absorption layer to weaken the light intensity distribution, the specific density distribution is adjustable, and the geometric figure of the blackened aluminum plate or other metal plates in the embodiment is selected to be an octagon circle;

and step S3, simulating the light receiving uniformity of the paraboloidal reflecting surface by using Tracepro or other optical simulation software, and obtaining an optimal density array by simulating the arrangement pattern of the light absorption layer arrays with different densities.

Referring to fig. 5, 6 and 7, which are schematic diagrams of light receiving uniformity of the reflecting surface regulated by different densities of the light absorption layer arrays, uniformity of the simulation result is gradually optimized from less than 50% to near 95% by performing density multiple regulation distribution of the light absorption layer arrays in different areas of near light measurement and far light measurement. The simulation results show the feasibility of achieving uniformity with this density array modulation.

And step S4, making a reflecting layer array pattern, actually measuring the light uniformity, and then correcting the actual distribution of the array density of the light absorption layer to obtain the exposure effect with high uniformity.

Manufacturing an octagonal round hole array pattern reflecting layer: and (4) simulating by the optical simulation software of the step S3 that the paraboloidal reflecting surface diverges to the octagonal round hole array graph obtained by the uniform light intensity of the light receiving surface, converting the array graph obtained by laser, digital machine tool, etching and other methods in CAD format, and then carrying out blackening and coarsening on the aluminum plate combined with the embossed bean-pattern mirror surface aluminum plate graph by adopting anodic oxidation, black coloring, black inlaying and black chromium plating or chemical blackening process. After the fabrication, the measurement is performed, and points for uniformity measurement are selected for the exposure mesa, in this embodiment, 25 light-receiving positions are selected for uniformity measurement and calculation. The actual distribution position and density of the light absorption layer are continuously corrected until uniformity of 95% or more is obtained, the optimal light intensity distribution is obtained, and the process is ended. In actual operation, according to the requirements of products and processes, the uniformity adjustment is not limited, and the area of the exposure table surface is not limited.

The present invention is not limited to the above preferred embodiments, and any one can derive other various forms of exposure apparatus and methods for manufacturing the same, which achieve high uniformity of a large area and multiple light sources. All equivalent changes and modifications made according to the claims of the present invention should be covered by the present invention.