Middle frame of electronic equipment, manufacturing method of middle frame, shell of electronic equipment and electronic equipment
阅读说明：本技术 电子设备的中框及其制作方法、电子设备的外壳和电子设备 (Middle frame of electronic equipment, manufacturing method of middle frame, shell of electronic equipment and electronic equipment ) 是由 张春姣 周天济 于 2020-11-27 设计创作，主要内容包括：本发明涉及一种电子设备的中框及其制作方法、电子设备的外壳和电子设备。上述电子设备的中框包括基材、设置在基材上的涂料层和设置在涂料层远离基材一侧的光学薄膜层,制备涂料层的原料包括涂料主剂和稀释剂,按质量份数计,涂料主剂包括：树脂15份～35份、颜料20份～40份、溶剂25份～45份及助剂1份～6份,光学薄膜层包括至少一个高折射率层和至少一个低折射率层,高折射率层和低折射率层交替设置,且光学薄膜层中远离基材的最外层为高折射率层,电子设备的中框的Lab颜色色度指标为：L＝55～65,a＝10～20,b＝15～30。上述电子设备的中框具有粉金色的外观,亮度较高,且不会对电子设备的信号造成干扰。(The invention relates to a middle frame of electronic equipment, a manufacturing method of the middle frame, a shell of the electronic equipment and the electronic equipment. Above-mentioned electronic equipment's center includes the substrate, sets up the dope layer on the substrate and sets up the optics thin layer of keeping away from substrate one side at the dope layer, and the raw materials of preparation dope layer include coating main agent and thinner, and according to the mass fraction, the coating main agent includes: 15-35 parts of resin, 20-40 parts of pigment, 25-45 parts of solvent and 1-6 parts of auxiliary agent, wherein the optical thin film layer comprises at least one high-refractive-index layer and at least one low-refractive-index layer, the high-refractive-index layer and the low-refractive-index layer are alternately arranged, the outermost layer far away from the base material in the optical thin film layer is the high-refractive-index layer, and Lab color chromaticity indexes of a middle frame of the electronic equipment are as follows: l is 55-65, a is 10-20, and b is 15-30. The middle frame of the electronic equipment has a golden appearance, is high in brightness, and cannot interfere with signals of the electronic equipment.)
1. A bezel of an electronic device, comprising: the coating comprises a substrate, a coating layer arranged on the substrate and an optical thin film layer arranged on one side of the substrate, wherein the coating layer is far away from the optical thin film layer on one side of the substrate, the raw materials for preparing the coating layer comprise a coating main agent, and the coating main agent comprises the following components in parts by mass: 15-35 parts of resin, 20-40 parts of pigment, 25-45 parts of solvent and 1-6 parts of auxiliary agent, wherein the pigment comprises naphthol red and silver powder in a mass ratio of 1 to (1-1.25), the optical thin film layer comprises at least one high refractive index layer and at least one low refractive index layer, the high refractive index layer and the low refractive index layer are alternately arranged, the outermost layer far away from the base material in the optical thin film layer is the high refractive index layer, and the Lab color chromaticity index of a middle frame of the electronic equipment is as follows: l is 55-65, a is 10-20, and b is 15-30.
2. The middle frame of the electronic equipment as claimed in claim 1, wherein the raw material for preparing the coating layer further comprises a diluent, and the mass ratio of the diluent to the coating main agent is (2-4) to 1.
3. The electronic device middle frame according to claim 1, wherein the resin is acrylonitrile butadiene styrene copolymer; and/or the solvent is 783 slow dry water.
4. The middle frame of the electronic device according to any one of claims 1 to 3, wherein the thickness of the paint layer is 13 μm to 17 μm.
5. The middle frame of the electronic device according to claim 1, wherein the total thickness of the optical thin film layer is 200nm to 400 nm; and/or the total number of the high refractive index layer and the low refractive index layer is 3-5.
6. The middle frame of an electronic device according to claim 1, wherein the optical thin film layer is composed of a first high refractive index layer, a low refractive index layer, and a second high refractive index layer, which are sequentially stacked, the first high refractive index layer is closer to the paint layer than the second high refractive index layer, the first high refractive index layer has a thickness of 20nm to 50nm, the low refractive index layer has a thickness of 150nm to 180nm, and the second high refractive index layer has a thickness of 20nm to 40 nm.
7. The middle frame of an electronic device according to claim 1, wherein the optical thin film layer is composed of a first high refractive index layer, a first low refractive index layer, a second high refractive index layer, a second low refractive index layer, and a third high refractive index layer, which are stacked in this order, the first high refractive index layer is closer to the paint layer than the third high refractive index layer, the first high refractive index layer has a thickness of 40nm to 60nm, the first low refractive index layer has a thickness of 105nm to 125nm, the second high refractive index layer has a thickness of 38nm to 60nm, the second low refractive index layer has a thickness of 20nm to 40nm, and the third high refractive index layer has a thickness of 15nm to 25 nm.
8. The electronic device middle frame according to any one of claims 1 to 3 and 5 to 7, wherein the material of the high refractive index layer is selected from Nb2O5、TiO2、Si3N4And SiOxNyWherein x is more than 0 and less than or equal to 2, and y is more than 0 and less than or equal to 3; and/or the material of the low refractive index layer is SiO2。
9. The middle frame of the electronic device according to any one of claims 1 to 3 and 5 to 7, further comprising a first UV glue layer disposed between the paint layer and the optical film layer and/or a second UV glue layer disposed on a side of the optical film layer away from the substrate.
10. The middle frame of the electronic device according to claim 9, wherein the thickness of the first UV glue layer is 8 μm to 12 μm; the thickness of the second UV adhesive layer is 8-12 mu m.
11. A manufacturing method of a middle frame of electronic equipment is characterized by comprising the following steps:
forming a coating layer on a substrate, wherein the raw materials for preparing the coating layer comprise a coating main agent, and the coating main agent comprises the following components in parts by mass: 15-35 parts of resin, 20-40 parts of pigment, 25-45 parts of solvent and 1-6 parts of auxiliary agent, wherein the pigment comprises naphthol red and silver powder in a mass ratio of 1: 1-1.25; and
forming an optical thin film layer on one side of the coating layer, which is far away from the substrate, and manufacturing a middle frame of the electronic equipment; the optical thin film layer comprises at least one high refractive index layer and at least one low refractive index layer, the high refractive index layer and the low refractive index layer are alternately arranged, the outermost layer far away from the base material in the optical thin film layer is the high refractive index layer, and Lab color chromaticity indexes of a middle frame of the electronic equipment are as follows: l is 55-65, a is 10-20, and b is 15-30.
12. The method for manufacturing the middle frame of the electronic device according to claim 11, wherein the coating layer is formed on the substrate by spraying; and/or forming the optical thin film layer by adopting a sputtering mode.
13. The method for manufacturing the middle frame of the electronic device according to claim 11 or 12, wherein before the step of forming the optical thin film layer on the side of the paint layer away from the substrate, the method further comprises: forming a first UV adhesive layer on one side of the coating layer, which is far away from the substrate, wherein the optical thin film layer is formed on one side of the first UV adhesive layer, which is far away from the substrate; and/or after the step of forming the optical thin film layer on the side of the coating layer away from the substrate, the method further comprises the following steps: and forming a second UV adhesive layer on one side of the optical film layer far away from the substrate.
14. An electronic device case comprising a cover plate and a middle frame, wherein the middle frame is the middle frame of the electronic device according to any one of claims 1 to 10 or the middle frame of the electronic device manufactured by the manufacturing method of the middle frame of the electronic device according to any one of claims 11 to 13.
15. An electronic device comprising the housing of claim 14 and a circuit board assembly located within the housing.
Technical Field
The present invention relates to the field of electronic devices, and in particular, to a middle frame of an electronic device, a manufacturing method thereof, a housing of an electronic device, and an electronic device.
Background
With the wide use of electronic equipment, people constantly seek the high performance of the electronic equipment and also seek the fashionable appearance, the golden color and the rose color in the fashionable appearance are the color effect which people always pursue, and the pink golden color with the golden and rose colors is the favorite color of people in the aspect of visual effect.
Among the electronic devices most frequently used by people, a cellular phone is a device that is used substantially every day. In the appearance of the mobile phone, the front cover and the rear cover are basically made of glass and composite plates, different appearance colors are realized in a silk-screen printing and film pasting mode, but the middle frame part cannot use the glass and the composite plates, the materials used by the middle frame are usually aluminum alloy and aluminum-plastic mixtures, and different appearance colors cannot be realized in the production mode of the panel due to the special appearance of the middle frame.
To obtain a pink gold color on the middle frame, a direct metallization method or a method of spraying ink is generally adopted. However, since the metal layer interferes with the electronic signal and the metal plating usually comprises gold, gold itself has a problem of high price, so that the method of obtaining a pink gold color by direct metal plating cannot be widely used. And the mode of spraying the ink is adopted, the bright-colored degree and the brightness of the color can be reduced due to the limitation of materials, and the golden ink is difficult to match, so that the golden effect of the golden powder generated by the mode of directly plating the metal can not be achieved.
Disclosure of Invention
Accordingly, there is a need for an electronic device middle frame and a manufacturing method thereof, wherein the electronic device middle frame is bright in appearance and has a high-brightness pink gold color without interfering with signals of the electronic device.
In addition, it is necessary to provide a housing of an electronic device and the electronic device.
A bezel of an electronic device, comprising: the coating comprises a substrate, a coating layer arranged on the substrate and an optical thin film layer arranged on one side of the substrate, wherein the coating layer is far away from the optical thin film layer on one side of the substrate, the raw materials for preparing the coating layer comprise a coating main agent, and the coating main agent comprises the following components in parts by mass: 15-35 parts of resin, 20-40 parts of pigment, 25-45 parts of solvent and 1-6 parts of auxiliary agent, wherein the pigment comprises naphthol red and silver powder in a mass ratio of 1 to (1-1.25), the optical thin film layer comprises at least one high refractive index layer and at least one low refractive index layer, the high refractive index layer and the low refractive index layer are alternately arranged, the outermost layer far away from the base material in the optical thin film layer is the high refractive index layer, and the Lab color chromaticity index of a middle frame of the electronic equipment is as follows: l is 55-65, a is 10-20, and b is 15-30.
In one embodiment, the raw materials for preparing the coating layer further comprise a diluent, and the mass ratio of the diluent to the coating main agent is (2-4) to 1.
In one embodiment, the resin is an acrylonitrile butadiene styrene copolymer; and/or the solvent is 783 slow dry water.
In one embodiment, the thickness of the paint layer is 13-17 μm.
In one embodiment, the total thickness of the optical thin film layer is 200nm to 400 nm; and/or the total number of the high refractive index layer and the low refractive index layer is 3-5.
In one embodiment, the optical thin film layer is composed of a first high refractive index layer, a low refractive index layer and a second high refractive index layer which are sequentially stacked, the first high refractive index layer is closer to the paint layer than the second high refractive index layer, the thickness of the first high refractive index layer is 20nm to 50nm, the thickness of the low refractive index layer is 150nm to 180nm, and the thickness of the second high refractive index layer is 20nm to 40 nm.
In one embodiment, the optical thin film layer is composed of a first high refractive index layer, a first low refractive index layer, a second high refractive index layer, a second low refractive index layer and a third high refractive index layer which are sequentially stacked, the first high refractive index layer is closer to the paint layer than the third high refractive index layer, the thickness of the first high refractive index layer is 40nm to 60nm, the thickness of the first low refractive index layer is 105nm to 125nm, the thickness of the second high refractive index layer is 38nm to 60nm, the thickness of the second low refractive index layer is 20nm to 40nm, and the thickness of the third high refractive index layer is 15nm to 25 nm.
In one embodiment, the material of the high refractive index layer is selectedself-Nb2O5、TiO2、Si3N4And SiOxNyWherein x is more than 0 and less than or equal to 2, and y is more than 0 and less than or equal to 3; and/or the material of the low refractive index layer is SiO2。
In one embodiment, the middle frame of the electronic device further comprises a first UV glue layer arranged between the coating layer and the optical film layer and/or a second UV glue layer arranged on one side of the optical film layer far away from the substrate.
In one embodiment, the thickness of the first UV adhesive layer is 8-12 μm; the thickness of the second UV adhesive layer is 8-12 mu m.
A manufacturing method of a middle frame of electronic equipment comprises the following steps:
forming a coating layer on a substrate, wherein the raw materials for preparing the coating layer comprise a coating main agent, and the coating main agent comprises the following components in parts by mass: 15-35 parts of resin, 20-40 parts of pigment, 25-45 parts of solvent and 1-6 parts of auxiliary agent, wherein the pigment comprises naphthol red and silver powder in a mass ratio of 1: 1-1.25; and
forming an optical thin film layer on one side of the coating layer, which is far away from the substrate, and manufacturing a middle frame of the electronic equipment; the optical thin film layer comprises at least one high refractive index layer and at least one low refractive index layer, the high refractive index layer and the low refractive index layer are alternately arranged, the outermost layer far away from the base material in the optical thin film layer is the high refractive index layer, and Lab color chromaticity indexes of a middle frame of the electronic equipment are as follows: l is 55-65, a is 10-20, and b is 15-30.
In one embodiment, the coating layer is formed on the substrate by spraying; and/or forming the optical thin film layer by adopting a sputtering mode.
In one embodiment, before the step of forming the optical film layer on the side of the coating layer away from the substrate, the method further comprises the following steps: forming a first UV adhesive layer on one side of the coating layer, which is far away from the substrate, wherein the optical thin film layer is formed on one side of the first UV adhesive layer, which is far away from the substrate; and/or after the step of forming the optical thin film layer on the side of the coating layer away from the substrate, the method further comprises the following steps: and forming a second UV adhesive layer on one side of the optical film layer far away from the substrate.
A shell of electronic equipment comprises a cover plate and a middle frame, wherein the middle frame is the middle frame of the electronic equipment or the middle frame of the electronic equipment manufactured by the manufacturing method of the middle frame of the electronic equipment.
An electronic device comprises the shell and a circuit board assembly positioned in the shell.
The middle frame of the electronic equipment comprises a substrate, a coating layer and an optical film layer. Constitute through the raw materials of adjustment dope layer for the dope layer presents pink, and combines the rete design of optical film layer, cooperates with the dope layer, makes the Lab colour chromaticity index of electronic equipment's center do: l is 55-65, a is 10-20, b is 15-30, and the color is golden. Simultaneously, optical film layer includes high refractive index layer and low refractive index layer, and the high refractive index layer is located the outmost of keeping away from the substrate, and rete mutual interference, cooperation can improve the bulk brightness of electronic equipment's center, and the colour effect of more pure dope layer is more gorgeous, and luminance is higher. In addition, the coating layer and the optical film layer in the middle frame of the electronic equipment are matched with each other, a metal plating layer is not needed, and interference to signals of the electronic equipment is avoided. Therefore, the middle frame of the electronic equipment not only has the appearance of bright pink gold color, but also does not interfere with electronic signals.
Drawings
FIG. 1 is a schematic structural diagram of a middle frame of an electronic device according to an embodiment;
FIG. 2 is a schematic diagram of a structure of an optical thin film layer in a bezel of the electronic device shown in FIG. 1;
FIG. 3 is another schematic structural view of an optical thin film layer in a bezel of the electronic device shown in FIG. 1;
fig. 4 is a process flow diagram of a method for manufacturing a middle frame of an electronic device according to an embodiment.
Detailed Description
In order that the invention may be more fully understood, reference will now be made to the following description taken in conjunction with the accompanying drawings. The detailed description sets forth the preferred embodiments of the invention. This invention may, however, be embodied in many different forms and should not be construed as limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete.
Unless defined otherwise, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. The terminology used in the description of the invention herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention.
Referring to fig. 1, a middle frame 100 of an electronic device according to an embodiment includes: a substrate 110, a coating layer 120 disposed on the substrate 110, and an optical film layer 130 disposed on a side of the coating layer 120 away from the substrate 110.
In particular, the electronic device may be a handheld electronic device. In one embodiment, the electronic device is a mobile phone, a tablet computer, or the like.
Specifically, the base material 110 is a finished-shape middle frame body which is temporarily not colored. For example, the substrate 110 is a material that can be injection molded, such as aluminum alloys and aluminum plastic compounds.
Wherein, the raw materials of the coating layer 120 include a coating main agent and a diluent. Specifically, the mass ratio of the diluent to the coating is (2-4) to 1. Further, the mass ratio of the diluent to the coating is 3: 1. During the spraying process, diluents are typically added to reduce the resin viscosity and improve the processing properties. In one embodiment, the diluent is 783 slow dry water, which is a clear liquid mixed with ketones, esters, benzenes, and surfactants.
The main agent of the coating comprises resin, pigment, solvent and auxiliary agent. Specifically, the coating main agent comprises the following components in parts by weight: 15 to 35 portions of resin, 20 to 40 portions of pigment, 25 to 45 portions of solvent and 1 to 6 portions of auxiliary agent.
In one embodiment, the resin is an acrylonitrile butadiene styrene copolymer (ABS resin). The resin is a film forming substance in the coating main agent, and can also improve the hardness of the coating layer 120 and improve the chemical properties such as luster, water resistance, acid and alkali resistance and the like. In this embodiment, since the middle frame substrate 110 is made of aluminum alloy or aluminum-plastic mixture, and ABS resin is used as the film forming material, the adhesion between the paint layer 120 and the substrate 110 can be improved compared to other resins, such as epoxy resin and phenolic resin. Specifically, the mass part of the resin is 15 parts, 18 parts, 20 parts, 25 parts, 30 parts or 35 parts.
The pigment comprises naphthol red and silver powder in a mass ratio of 1: 1-1.25. Further, the pigment includes naphthol red and silver powder in a mass ratio of 1: 1. The pigment is added to the coating in powder form by fine grinding to impart a pink color to the coating layer 120. In one embodiment, the pigment is 20 parts, 25 parts, 30 parts, 35 parts, or 40 parts by weight.
The mass portion of the solvent is 25 parts, 30 parts, 35 parts, 40 parts or 45 parts. In one embodiment, the solvent is 783 slow dry water, which is a clear liquid mixed with ketones, esters, benzenes, and surfactants. 783 the slow drying water is a very slow drying solvent, is mainly used as a screen printing ink diluent, has the characteristics of strong dissolving power, no toxicity, small smell, high boiling point, slow volatilization, no water, no chlorine and heavy metals, stable physical and chemical properties, good leveling property and the like, has excellent dissolving performance, and can particularly exert high dissolving power in the later stage of evaporation, so that the film has good flatness, no orange peel and good gloss.
The mass portion of the auxiliary agent is 1 portion, 2 portions, 3 portions, 5 portions or 6 portions. In one embodiment, the adjuvant is a dispersant. The auxiliary agent is formed by combining various characteristic compounds, and is added into the coating in a small amount to obtain the effect of improving the workability of the coating. For example, the auxiliary agent is an antifoaming agent, a leveling agent, or a dispersing agent. Specifically, in the embodiment, the auxiliary agent is a dispersant with the model of A-002. It is understood that in other embodiments, the auxiliary agent is not limited to the above-mentioned materials, and may also be an auxiliary agent commonly used in the art, and is not described herein again.
Specifically, the paint layer 120 is formed on the substrate 110 by spraying. In one embodiment, the preparation process of the coating layer 120 is as follows: weighing the coating main agent and the diluent. Wherein, the coating main agent comprises the following components in parts by weight: 15 to 35 portions of resin, 20 to 40 portions of pigment, 25 to 45 portions of solvent and 1 to 6 portions of auxiliary agent; the coating main agent is stirred and mixed uniformly, then filtered by 420-mesh gauze (aiming at screening out large-particle substances), added with the diluent and mixed uniformly, and the mixed coating main agent and the diluent are sprayed on the surface of the substrate 110 uniformly by using a spray gun. During the spraying process, diluents are typically added to reduce the resin viscosity and improve the processing properties.
Further, the thickness of the coating layer 120 is 13 μm to 17 μm. In one embodiment, the thickness of the paint layer 120 is 13 μm, 14 μm, 15 μm, 16 μm, or 17 μm. In the present embodiment, the paint layer 120 mainly provides a body color tone of the middle frame 100 of the electronic device, and serves as a transition layer between the middle frame substrate 110 and the optical thin film layer 130.
Specifically, the optical thin film layer 130 includes at least one high refractive index layer and at least one low refractive index layer, the high refractive index layer and the low refractive index layer are alternately disposed, and the outermost layer of the optical thin film layer 130 away from the substrate 110 is the high refractive index layer. Specifically, the total number of the optical thin film layers 130 is 3 to 5. The total thickness of the optical thin film layer 130 is 200nm to 400 nm. In one embodiment, the total thickness of the optical thin film layer 130 is 200nm, 250nm, 300nm, 350nm, or 400 nm. Further, the total thickness of the optical thin film layer 130 is 200nm to 300nm, and further, the total thickness of the optical thin film layer 130 is 250nm to 300 nm.
Referring to fig. 2, in some embodiments, the optical thin film layer 130 is composed of a first high refractive index layer 131, a first low refractive index layer 133 and a second high refractive index layer 135 which are sequentially stacked, the first high refractive index layer 131 is closer to the paint layer 120 than the second high refractive index layer 135, the thickness of the first high refractive index layer 131 is 20nm to 50nm, the thickness of the first low refractive index layer 133 is 150nm to 180nm, and the thickness of the second high refractive index layer 135 is 20nm to 40 nm. Specifically, the thickness of the first high refractive-index layer 131 is 20nm, 25nm, 30nm, 35mn, 40nm, 45nm, or 50 nm. The first low refractive index layer 133 has a thickness of 150nm, 160nm, 170nm, or 180 nm. The thickness of the second high refractive index layer 135 is 20nm, 25nm, 30nm, 35nm, or 40 nm.
In particular, the material of the high refractive index layer is selected from Nb2O5、TiO2、Si3N4And SiOxNyOne kind of (1). Wherein x is more than 0 and less than or equal to 2, and y is more than 0 and less than or equal to 3. The material of the low refractive index layer is SiO2. In this document, a material having a refractive index of 1.8 or more is referred to as a high refractive index material, and a material having a refractive index of 1.5 or less is referred to as a low refractive index material.
Referring to fig. 3, in another embodiment, the optical thin film layer 130 is composed of a first high refractive index layer 131, a first low refractive index layer 133, a second high refractive index layer 135, a second low refractive index layer 137, and a third high refractive index layer 139, which are sequentially stacked, the first high refractive index layer 131 is closer to the paint layer 120 than the third high refractive index layer 139, the thickness of the first high refractive index layer 131 is 40nm to 60nm, the thickness of the first low refractive index layer 133 is 105nm to 125nm, the thickness of the second high refractive index layer 135 is 38nm to 60nm, the thickness of the second low refractive index layer 137 is 20nm to 40nm, and the thickness of the third high refractive index layer 139 is 15nm to 25 nm. Specifically, the thickness of the first high refractive-index layer 131 is 40nm, 45nm, 50nm, 55mn, or 60 nm. Further, the thickness of the first high refractive index layer 131 is 44nm to 57 nm. The thickness of first low refractive index layer 133 is 105nm, 110nm, 115nm, 120nm, or 125 nm. Further, the thickness of the first low refractive index layer 133 is 114nm to 123 nm. The thickness of the second high refractive index layer 135 is 38nm, 45nm, 50nm, 55nm, or 60 nm. Further, the thickness of the second high refractive index layer 135 is 38nm to 57 nm. The thickness of the second low refractive index layer 137 is 20nm, 25nm, 30nm, 35nm, or 40 nm. The thickness of the third high refractive-index layer 139 is 15nm, 20nm, or 25 nm. Further, the thickness of the third high refractive-index layer 139 is 17nm to 24 nm.
It is understood that the total number of the optical thin film layers 130 is not limited to 3 or 5, but may be 7, 9, etc., but the total number of the optical thin film layers 130 is set to 3 or 5, considering the cost, the processing efficiency, etc. all together.
In particular, the material of the high refractive index layer is selected from Nb2O5、TiO2、Si3N4And SiOxNyOne kind of (1). Wherein x is more than 0 and less than or equal to 2, and y is more than 0 and less than or equal to 3. The material of the low refractive index layer is SiO2。
The optical film layer 130 mainly functions to adjust the overall color of the middle frame to a desired color range and to adjust the overall brightness of the middle frame. Since the effect of the pink gold color cannot be achieved by using the paint layer 120 as a ground color, one optical thin film layer 130 is formed on the paint layer 120 in a plurality of layers, and in the present embodiment, the reflective color of the middle frame is made to exhibit the range of the LAB value specified by the pink gold color by adjusting the lamination order of the layers, the thickness of the layers, and the material of the optical thin film layer 130, and the brightness of the middle frame 100 of the electronic device can be improved.
Further, in order to ensure the uniformity and hardness of the middle frame, the optical thin film layer 130 is formed by sputtering, and during the sputtering process, the middle frame is formed by revolution and rotation in the machine.
In some embodiments, the bezel 100 of the electronic device further includes a first UV glue layer 140 and a second UV glue layer 150. The first UV glue layer 140 is disposed between the paint layer 120 and the optical film layer 130, and the second UV glue layer 150 is disposed on a side of the optical film layer 130 away from the substrate 110. The thickness of the first UV glue layer 140 is 8-12 μm. The thickness of the second UV adhesive layer 150 is 8-12 μm.
The main function of the first UV glue layer 140 is to protect the paint layer 120, to enhance the adhesion of the paint layer 120, and to insulate and insulate heat, and the first UV glue layer 140 does not interfere with the color of the middle frame 100 of the electronic device. The first UV glue layer 140 is a transparent protection layer. The UV adhesive layer is used as a protective layer, can be quickly cured and molded under lower temperature and ultraviolet illumination, and has less damage to the coating layer 120 compared with other protective layers requiring high-temperature heating. Specifically, the main component of the first UV glue layer 140 is an ultraviolet curable resin. For example, the raw material of the first UV glue layer 140 includes a UV main agent and a diluent. The UV main agent comprises: monomer, prepolymer, photoinitiator and auxiliary agent. The prepolymer can be epoxy acrylate, acrylic resin, polyurethane acrylate and the like. The monomer is IBOA, HDDA, TMPTA and the like, and the photoinitiator is benzophenone and the like. It is understood that the above list only a few commonly used raw materials for the UV glue layer, but the raw materials for the UV glue layer are not limited thereto.
Further, when the first UV glue layer 140 is used, the UV main agent and the diluent are mixed according to a certain ratio. In one embodiment, the mass ratio of the UV main agent to the diluent is 1: 1. The diluent is 783 slow dry water, and is a transparent liquid prepared by mixing ketones, esters, benzenes and surfactants.
The preparation process of the first UV glue layer 140 includes: the pre-baking temperature is 50-60 ℃, and the pre-baking time is 3-5 min; the humidity of the spraying room is 45-70%, and the temperature of the spraying room is 18-25 ℃; the irradiation energy of the UV furnace was 900mj/cm2～1200mj/cm2. The above list only shows one common process for preparing the UV adhesive layer, but the process is not limited thereto, and may also be a process for preparing a UV adhesive layer commonly used in the art.
Further, the thickness of the first UV glue layer 140 is 8 to 12 μm. In one embodiment, the thickness of the first UV glue layer 140 is 8 μm, 9 μm, 10 μm, 11 μm or 12 μm.
The second UV glue layer 150 mainly protects the optical film layer 130, and simultaneously improves the wear resistance of the whole middle frame 100 of the electronic device. The composition and the preparation process of the second UV adhesive layer 150 are the same as those of the first UV adhesive layer 140, and are not described herein again.
Furthermore, the Lab color chromaticity index of the middle frame of the electronic device is: l is 55-65, a is 10-20, and b is 15-30.
The middle frame 100 of the electronic device of the above embodiment has at least the following advantages:
(1) the middle frame 100 of the electronic device includes a substrate 110, a paint layer 120, a first UV glue layer 140, an optical film layer 130, and a second UV glue layer 150, which are sequentially disposed. The raw material composition of the coating layer 120 is adjusted, so that the coating layer 120 appears pink. And the film layer design of the optical film layer 130 is combined and matched with the composition of the coating layer 120, so that the color of the middle frame is in the range of LAB value specified by the golden color, meanwhile, the overall brightness of the middle frame is improved, and the color effect is more gorgeous and better than that of the pure coating layer 120. The middle frame 100 of the electronic device does not contain a metal layer, and thus does not interfere with signals of the electronic device.
(2) The first UV glue layer 140 in the middle frame 100 of the electronic device can protect the paint layer 120, so that the adhesion force of the paint layer 120 is enhanced, the second UV glue layer 150 can protect the optical thin film layer 130, and the first UV glue layer 140 and the second UV glue layer 150 cannot influence the color of the middle frame.
Referring to fig. 4, a method for manufacturing a middle frame of an electronic device according to an embodiment is a method for manufacturing a middle frame of an electronic device according to the embodiment, and includes the following steps:
step S210: a coating layer is formed on the substrate.
The coating layer is prepared from the following raw materials in parts by mass: 15 to 35 portions of resin, 20 to 40 portions of pigment, 25 to 45 portions of solvent and 1 to 6 portions of auxiliary agent. The raw materials for preparing the coating layer also comprise a diluent. Specifically, the mass ratio of the diluent to the coating is (2-4) to 1. Further, the mass ratio of the diluent to the coating is 3: 1. During the spraying process, diluents are typically added to reduce the resin viscosity and improve the processing properties. In one embodiment, the diluent is 783 slow dry water, which is a clear liquid mixed with ketones, esters, benzenes, and surfactants.
In one embodiment, the resin is an acrylonitrile butadiene styrene copolymer (ABS resin). The resin is a film forming substance in the coating main agent, and can also improve the hardness of the coating layer and improve the chemical properties such as luster, water resistance, acid and alkali resistance and the like. In the embodiment, the material of the middle frame substrate is aluminum alloy or aluminum-plastic mixture, and the ABS resin is used as the film forming material, so that the adhesion between the coating layer and the substrate can be improved compared with other resins, such as epoxy resin, phenolic resin, and the like. Specifically, the mass part of the resin is 15 parts, 18 parts, 20 parts, 25 parts, 30 parts or 35 parts.
The pigment comprises naphthol red and silver powder in a mass ratio of 1: 1-1.25. Further, the pigment includes naphthol red and silver powder in a mass ratio of 1: 1. The pigment is added to the coating in powder form by fine grinding, so that the coating layer appears pink. In one embodiment, the pigment is 20 parts, 25 parts, 30 parts, 35 parts, or 40 parts by weight.
The mass portion of the solvent is 25 parts, 30 parts, 35 parts, 40 parts or 45 parts. In one embodiment, the solvent is 783 slow dry water, which is a clear liquid mixed with ketones, esters, benzenes, and surfactants. 783 the slow drying water is a very slow drying solvent, is mainly used as a screen printing ink diluent, has the characteristics of strong dissolving power, no toxicity, small smell, high boiling point, slow volatilization, no water, no chlorine and heavy metals, stable physical and chemical properties, good leveling property and the like, has excellent dissolving performance, and can particularly exert high dissolving power in the later stage of evaporation, so that the film has good flatness, no orange peel and good gloss.
The mass portion of the auxiliary agent is 1 portion, 2 portions, 3 portions, 5 portions or 6 portions. In one embodiment, the adjuvant is a dispersant. The auxiliary agent is formed by combining various characteristic compounds, and is added into the coating in a small amount to obtain the effect of improving the workability of the coating. For example, the auxiliary agent is an antifoaming agent, a leveling agent, or a dispersing agent. Specifically, in the embodiment, the auxiliary agent is a dispersant with the model of A-002. It is understood that in other embodiments, the auxiliary agent is not limited to the above-mentioned materials, and may also be an auxiliary agent commonly used in the art, and is not described herein again.
Specifically, a coating layer is formed on the substrate in a spraying mode. In one embodiment, the process of forming the coating layer on the substrate is as follows: weighing the coating main agent and the diluent. Wherein, the coating main agent comprises the following components in parts by weight: 15 to 35 portions of resin, 20 to 40 portions of pigment, 25 to 45 portions of solvent and 1 to 6 portions of auxiliary agent; the coating main agent is stirred and mixed uniformly, then filtered by 420-mesh gauze (aiming at screening out large-particle substances), added with the diluent and mixed uniformly, and the mixed coating main agent and the diluent are sprayed on the surface of the base material uniformly by using a spray gun. During the spraying process, diluents are typically added to reduce the resin viscosity and improve the processing properties.
Further, the thickness of the coating layer is 13-17 μm. In one embodiment, the thickness of the paint layer is 13 μm, 14 μm, 15 μm, 16 μm or 17 μm. In this embodiment, the paint layer is mainly to provide the body tone of the middle frame of the electronic device and to serve as a transition layer between the middle frame substrate and the optical thin film layer.
Step S220: and forming a first UV adhesive layer on one side of the coating layer, which is far away from the substrate.
Wherein the thickness of the first UV adhesive layer is 8-12 μm. In one embodiment, the thickness of the first UV glue layer is 8 μm, 9 μm, 10 μm, 11 μm or 12 μm. The main effect of first UV glue film is the protection dope layer, plays the effect of reinforcing dope layer adhesion force, still can play insulating and thermal-insulated effect simultaneously, and first UV glue film can not cause the interference to the colour of electronic equipment's center. The first UV adhesive layer is a transparent protective layer. The UV adhesive layer is used as a protective layer, can be quickly cured and molded at a lower temperature under ultraviolet illumination, and has less damage to a coating layer compared with other protective layers needing high-temperature heating. Specifically, the main component of the first UV adhesive layer is ultraviolet light-curable resin. For example, the raw material of the first UV glue layer includes a UV main agent and a diluent. The UV main agent comprises: monomer, prepolymer, photoinitiator and auxiliary agent. The prepolymer can be epoxy acrylate, acrylic resin, polyurethane acrylate and the like. The monomer is IBOA, HDDA, TMPTA and the like, and the photoinitiator is benzophenone and the like. It is understood that the above list only a few commonly used raw materials for the UV glue layer, but the raw materials for the UV glue layer are not limited thereto.
Further, when the first UV adhesive layer is used, the UV main agent and the diluent are prepared according to a certain proportion. In one embodiment, the mass ratio of the UV main agent to the diluent is 1: 1. The diluent is 783 slow dry water, and is a transparent liquid prepared by mixing ketones, esters, benzenes and surfactants.
The preparation process of the first UV adhesive layer comprises the following steps: the pre-baking temperature is 50-60 ℃, and the pre-baking time is 3-5 min; the humidity of the spraying room is 45-70%, and the temperature of the spraying room is 18-25 ℃; the irradiation energy of the UV furnace was 900mj/cm2～1200mj/cm2. The above list only shows one common process for preparing the UV adhesive layer, but the process is not limited thereto, and may also be a process for preparing a UV adhesive layer commonly used in the art.
Step S230: and forming an optical thin film layer on one side of the first UV adhesive layer, which is far away from the substrate.
And forming the optical thin film layer by adopting a sputtering coating mode. Furthermore, in order to ensure the uniformity and the hardness of the middle frame, in the sputtering coating process, a mode of coating revolution and rotation of the middle frame in a machine table is adopted. The process parameters in the sputter coating process may be those commonly used in the art, and are not described herein again.
Specifically, the optical thin film layer comprises at least one high refractive index layer and at least one low refractive index layer, the high refractive index layer and the low refractive index layer are alternately arranged, and the outermost layer of the optical thin film layer, which is far away from the substrate, is the high refractive index layer. Specifically, the total number of the optical thin film layers is 3 to 5. The total thickness of the optical thin film layer is 200 nm-400 nm. In one embodiment, the total thickness of the optical thin film layer is 200nm, 250nm, 300nm, 350nm, or 400 nm. Further, the total thickness of the optical thin film layer is 200nm to 300nm, and further, the total thickness of the optical thin film layer is 250nm to 300 nm.
In some embodiments, the optical thin film layer is composed of a first high refractive index layer, a first low refractive index layer and a second high refractive index layer which are sequentially stacked, the first high refractive index layer is closer to the paint layer than the second high refractive index layer, the thickness of the first high refractive index layer is 20nm to 50nm, the thickness of the first low refractive index layer is 150nm to 180nm, and the thickness of the second high refractive index layer is 20nm to 40 nm. Specifically, the thickness of the first high refractive-index layer is 20nm, 25nm, 30nm, 35mn, 40nm, 45nm, or 50 nm. The first low refractive index layer has a thickness of 150nm, 160nm, 170nm, or 180 nm. The second high refractive index layer has a thickness of 20nm, 25nm, 30nm, 35nm, or 40 nm.
In particular, the material of the high refractive index layer is selected from Nb2O5、TiO2、Si3N4And SiOxNyOne kind of (1). Wherein x is more than 0 and less than or equal to 2, and y is more than 0 and less than or equal to 3. The material of the low refractive index layer is SiO2. In this document, a material having a refractive index of 1.8 or more is referred to as a high refractive index material, and a material having a refractive index of 1.5 or less is referred to as a low refractive index material.
In other embodiments, the optical film layer comprises a first high refractive index layer, a first low refractive index layer, a second high refractive index layer, a second low refractive index layer and a third high refractive index layer which are sequentially stacked, the first high refractive index layer is closer to the paint layer than the third high refractive index layer, the thickness of the first high refractive index layer is 40 nm-60 nm, the thickness of the first low refractive index layer is 105 nm-125 nm, the thickness of the second high refractive index layer is 38 nm-60 nm, the thickness of the second low refractive index layer is 20 nm-40 nm, and the thickness of the third high refractive index layer is 15 nm-25 nm. Specifically, the thickness of the first high refractive-index layer is 40nm, 45nm, 50nm, 55mn, or 60 nm. Further, the first high refractive index layer has a thickness of 44nm to 57 nm. The first low refractive index layer has a thickness of 105nm, 110nm, 115nm, 120nm, or 125 nm. Further, the first low refractive index layer has a thickness of 114nm to 123 nm. The second high refractive index layer has a thickness of 38nm, 45nm, 50nm, 55nm, or 60 nm. Further, the second high refractive index layer has a thickness of 38nm to 57 nm. The second low refractive index layer has a thickness of 20nm, 25nm, 30nm, 35nm, or 40 nm. The thickness of the third high refractive index layer is 15nm, 20nm or 25 nm. Further, the third high refractive index layer has a thickness of 17nm to 24 nm.
It is to be understood that the total number of optical thin film layers is not limited to 3 or 5, but may be 7, 9, etc., but is set to 3 or 5, taking into consideration the cost, processing efficiency, etc.
In particular, the material of the high refractive index layer is selected from Nb2O5、TiO2、Si3N4And SiOxNyOne kind of (1). Wherein x is more than 0 and less than or equal to 2, and y is more than 0 and less than or equal to 3. The material of the low refractive index layer is SiO2。
The optical film layer mainly has the functions of adjusting the whole color of the middle frame to a required color range and adjusting the whole brightness of the middle frame. In the embodiment, the reflective color of the middle frame is in the range of LAB value specified by the golden color of the powder gold, and the brightness of the middle frame of the electronic equipment can be improved by adjusting the lamination sequence, the thickness and the material of each film layer of the optical film layer.
Step S240: and forming a second UV adhesive layer on one side of the optical film layer, which is far away from the substrate, so as to manufacture the middle frame of the electronic equipment.
The second UV glue layer mainly has the functions of protecting the optical film layer and the whole middle frame, and improving the performances of the middle frame of the electronic equipment, such as wear resistance and the like. The composition and preparation process of the second UV adhesive layer are the same as those of the first UV adhesive layer, and are not described herein again.
Furthermore, the Lab color chromaticity index of the middle frame of the electronic device is: l is 55-65, a is 10-20, and b is 15-30.
The method for manufacturing the middle frame of the electronic equipment in the embodiment at least has the following advantages:
(1) according to the manufacturing method of the middle frame of the electronic equipment, the coating layer, the first UV adhesive layer, the optical thin film layer and the second UV adhesive layer are sequentially formed on the base material. The coating layer is pink by adjusting the raw material composition of the coating layer. And the film layer design of the optical film layer is combined, and the optical film layer is matched with the composition of the coating layer, so that the color of the middle frame is in an LAB value range specified by a golden color, meanwhile, the overall brightness of the middle frame is improved, and the color effect is more gorgeous and better than that of a pure coating layer. And the manufacturing method of the middle frame of the electronic equipment combines the ink spraying and film coating modes, so that the signal of the electronic equipment cannot be interfered.
(2) The first UV glue film in the center of the electronic equipment can protect the paint layer, plays a role in enhancing the adhesive force of the paint layer, the second UV glue film can protect the optical thin layer, the first UV glue film and the second UV glue film are transparent protective layers, UV illumination and low-temperature heating can be adopted in the manufacturing process, and the color of the center of the electronic equipment cannot be influenced.
(3) The preparation process of the coating layer and the optical film layer of the middle frame of the electronic equipment is mature, and the processing is convenient.
(4) The debugging color of the middle frame of the electronic equipment is convenient, and the stability of batch production is good.
The housing of the electronic device of an embodiment includes a cover plate and the middle frame of the electronic device of the above embodiment. In particular, the electronic device may be a handheld electronic device. In one embodiment, the electronic device is a mobile phone, a tablet computer, or the like. The shell of the electronic equipment has the middle frame of pink gold color, higher brightness and gorgeous color, and meets the requirements of users on the appearance of the pink gold color.
The electronic device of an embodiment includes a housing of the electronic device of the above embodiment and a circuit board assembly located in the housing. In particular, the electronic device may be a handheld electronic device. In one embodiment, the electronic device is a mobile phone, a tablet computer, or the like. The electronic equipment has the middle frame with the pink gold color, higher brightness and gorgeous color, and meets the requirements of users on the appearance of the pink gold color.
The following are specific examples:
example 1
The manufacturing process of the middle frame of the electronic device in this embodiment is specifically as follows:
(1) the coating layer with the thickness of 16 μm is formed on the substrate by spraying. Wherein, the raw materials of the coating layer consist of a coating main agent and 783 slow dry water (diluent) with the mass ratio of 1: 3. The coating main agent consists of 20 parts of ABS resin, 30 parts of naphthol red and silver powder (pigment) with the mass ratio of 1: 1, 30 parts of 783 slow dry water (solvent) and 2 parts of dispersing agent (auxiliary agent) according to the parts by mass.
(2) And forming a first UV adhesive layer with the thickness of 12 mu m on the side of the coating layer away from the substrate. The raw materials of the first UV adhesive layer consist of 783 slow dry water (diluent), a photoinitiator and a defoaming agent in a mass ratio of 50: 2.
(3) And sputtering the side, far away from the substrate, of the first UV adhesive layer in sequence to form a first high-refractive-index layer, a first low-refractive-index layer and a second high-refractive-index layer, so as to obtain the optical thin film layer. Wherein the first high refractive index layer is made of TiO2The thickness is 24 nm; the material of the first low refractive index layer is SiO2The thickness is 177 nm; the material of the second high refractive index layer is TiO2And the thickness is 27 nm.
(4) And forming a second UV adhesive layer with the thickness of 12 mu m on the side, away from the substrate, of the second high-refractive-index layer. The raw material of the second UV adhesive layer consists of a UV main agent and 783 slow dry water (diluent) in a mass ratio of 1: 1.
Example 2
The manufacturing process of the middle frame of the electronic device in this embodiment is specifically as follows:
(1) the coating layer with the thickness of 16 μm is formed on the substrate by spraying. Wherein, the raw materials of the coating layer consist of a coating main agent and 783 slow dry water (diluent) with the mass ratio of 1: 3. The coating main agent consists of 20 parts of ABS resin, 30 parts of naphthol red and silver powder (pigment) with the mass ratio of 1: 1, 30 parts of 783 slow dry water (solvent) and 2 parts of dispersing agent (auxiliary agent) according to the parts by mass.
(2) And forming a first UV adhesive layer with the thickness of 12 mu m on the side of the coating layer away from the substrate. The raw materials of the first UV adhesive layer consist of 783 slow dry water (diluent), a photoinitiator and a defoaming agent in a mass ratio of 50: 2.
(3) And sputtering the side, far away from the substrate, of the first UV adhesive layer in sequence to form a first high-refractive-index layer, a first low-refractive-index layer, a second high-refractive-index layer, a second low-refractive-index layer and a third high-refractive-index layer to obtain the optical thin film layer. Wherein the material of the first high refractive index layer is Nb2O5The thickness is 44 nm; the material of the first low refractive index layer is SiO2The thickness is 114 nm; the material of the second high refractive index layer is Nb2O5The thickness is 50 nm; the material of the second low refractive index layer is SiO2The thickness is 32 nm; the material of the third high refractive index layer is Nb2O5And the thickness is 19 nm.
(4) And forming a second UV adhesive layer with the thickness of 12 mu m on the side of the third high-refractive-index layer far away from the substrate. The raw material of the second UV adhesive layer consists of a UV main agent and 783 slow dry water (diluent) in a mass ratio of 1: 1.
Example 3
The manufacturing process of the middle frame of the electronic device of embodiment 3 is similar to that of the electronic device of embodiment 2, except that: the optical thin film layer is made of different materials and has different thickness. In the optical thin film layer of example 3, the material of the first high refractive index layer was TiO2The thickness is 45 nm; first low refractive indexThe material of the layer is SiO2And the thickness is 120 nm. The material of the second high refractive index layer is TiO2The thickness is 38 nm; the material of the second low refractive index layer is SiO2The thickness is 40 nm; the third high refractive index layer is made of TiO2And the thickness is 17 nm.
Example 4
The manufacturing process of the middle frame of the electronic device of embodiment 4 is similar to that of the electronic device of embodiment 2, except that: the optical thin film layer is made of different materials and has different thickness. In the optical thin film layer of example 4, the material of the first high refractive index layer was SiOxNyThe thickness is 55 nm; the material of the first low refractive index layer is SiO2And the thickness is 123 nm. The material of the second high refractive index layer is SiOxNyThe thickness is 50 nm; the material of the second low refractive index layer is SiO2The thickness is 21 nm; the material of the third high refractive index layer is SiOxNyAnd the thickness is 24 nm.
Example 5
The manufacturing process of the middle frame of the electronic device of embodiment 5 is similar to that of the electronic device of embodiment 2, except that: the middle frame of the electronic device of example 5 does not contain the first UV glue layer. And in the optical thin film layer of example 5, the material of the first high refractive index layer was Nb2O5The thickness is 57 nm; the material of the first low refractive index layer is SiO2117nm thick; the material of the second high refractive index layer is Nb2O5The thickness is 57 nm; the material of the second low refractive index layer is SiO2The thickness is 30 nm; the material of the third high refractive index layer is Nb2O5And the thickness is 17 nm.
Table 1 film layer design of the examples
The following are test sections:
1. the L, a and b colorimetric values of the CIE1976LAB color system for the middle frame of the electronic device fabricated in the example using the D65 light source were obtained using a colorimeter, as shown in table 1 below.
TABLE 1 colorimetric and Brightness values data for the examples
Value of L
a value
b value
Example 1
63
12
20
Example 2
63
13
17
Example 3
60
15
25
Example 4
63
19
25
Example 5
63
19
25
As can be seen from table 1 above, the Lab color chromaticity index of the middle frame of the electronic device of the embodiment is: the color of the light-emitting diode is 55-65, a is 10-20, b is 15-30, and the appearance is bright and has high brightness.
2. The adhesion between the color layer (including the paint layer, the UV glue layer, and the optical film layer) and the substrate and the vibration abrasion resistance of the color layer of the middle frame of the electronic device prepared in example were tested, and the results shown in table 2 below were obtained. Wherein, the adhesion test adopts a 3M adhesive tape test for marking a hundred grids, and the corresponding standard is confirmed according to the damage condition. An adhesion of 5B indicates good adhesion. The wear resistance test is carried out by using steel wool.
TABLE 2 colorimetric and Brightness values data for the examples
Adhesion force
Vibration wear resistance
Example 1
5B
Without falling off
Example 2
5B
Without falling off
Example 3
5B
Without falling off
Example 4
5B
Without falling off
Example 5
5B
Without falling off
It can be seen from the above experimental data that the adhesion between the color layer and the base material in the middle frame of the electronic device of the above embodiment is good, and the abrasion resistance is good.
The technical features of the embodiments described above may be arbitrarily combined, and for the sake of brevity, all possible combinations of the technical features in the embodiments described above are not described, but should be considered as being within the scope of the present specification as long as there is no contradiction between the combinations of the technical features.
The above-mentioned embodiments only express several embodiments of the present invention, and the description thereof is more specific and detailed, but not construed as limiting the scope of the invention. It should be noted that, for a person skilled in the art, several variations and modifications can be made without departing from the inventive concept, which falls within the scope of the present invention. Therefore, the protection scope of the present patent shall be subject to the appended claims.