阅读说明：本技术 视觉上未失真的薄膜电子装置 (Visually undistorted thin film electronic device ) 是由 S·R·哈蒙德 M·F·A·M·范赫斯特 J·A·康克林 于 2019-05-16 设计创作，主要内容包括：提供了视觉上未失真的薄膜电子装置。在一个实施例中,一种用于生产薄膜电子装置的方法包括：在沉积在衬底上的薄膜材料层的叠层中打开划线,以定义所述薄膜电子装置的有源区域和非有源区域,所述叠层包括至少一个有源半导体层。所述有源区域包括所述叠层的未划线区域,而所述非有源区域包括所述叠层中薄膜材料被所述划线去除的区域。所述方法还包括将至少一种划线填充材料沉积到由所述划线打开的间隙中。所述划线填充材料具有嵌入其中的一种或多种着色元素,所述着色元素改变所述非有源区域的光学特性光谱,以获得在行业定义的标准观测器的最小可感知差异内的所述有源区域的光学特性光谱。(A thin film electronic device is provided that is visually undistorted. In one embodiment, a method for producing a thin film electronic device comprises: a scribe line is opened in a stack of thin film material layers deposited on a substrate to define an active area and a non-active area of the thin film electronic device, the stack including at least one active semiconductor layer. The active area comprises an unmarked area of the stack and the inactive area comprises an area of the stack where thin film material is removed by the scribe lines. The method also includes depositing at least one scribe fill material into gaps opened by the scribes. The scribe-fill material has one or more coloring elements embedded therein that alter the optical property spectrum of the non-active area to obtain an optical property spectrum of the active area that is within a minimum perceptible difference of an industry-defined standard observer.)

1. A method for producing a thin film electronic device, the method comprising:

opening a scribe line in a stack of thin film material layers deposited on a substrate to define an active area and a non-active area of the thin film electronic device, wherein the stack of thin film material layers includes at least one active semiconductor layer, wherein the active area includes an unpainted area of the stack of thin film material layers, wherein the non-active area includes an area of the stack of thin film material layers where thin film material was removed by the scribe line;

depositing at least one scribe fill material into a gap opened by the scribe line, wherein the scribe fill material has one or more shading elements embedded therein, wherein the one or more shading elements cause the optical characteristic spectrum of the non-active area to obtain a minimum perceptible difference for an industry-defined standard observer of the optical characteristic spectrum of the active area.

2. The method of claim 1, further comprising:

determining an intensity spectrum for a plurality of colored element input samples;

determining an intensity spectrum of the thin-film material removed from the stack of thin-film material layers;

determining ratios of the plurality of tinting element input samples to generate a scribe fill material ink, wherein the ratios provide a best fit estimate of the intensity spectrum for the thin film material removed from the stack of thin film material layers; and

adjusting a total concentration of the plurality of coloring elements present in the scribe-line filling material ink based on a target film thickness;

wherein depositing the at least one scribe fill material into the gap comprises depositing the scribe fill material ink.

3. The method of claim 1, wherein the optical characteristic spectrum of the non-active region results in the optical characteristic spectrum of the active region being within Δ E2000 ≦ 3.

4. The method of claim 1, wherein the substrate is transparent or opaque with respect to visible light.

5. The method of claim 1, further comprising:

applying a post-deposition process after depositing the at least one scribe fill material, wherein the post-deposition process causes the spectral quality of the scribe fill material to vary to obtain a minimum perceptible difference for an industry-defined standard observer of the optical property spectrum of the active region.

6. The method of claim 1, further comprising:

determining a baseline optical property spectrum for the stack of thin-film material layers in the active region;

determining an optical property spectrum of thin film material remaining in the non-active area prior to depositing the at least one scribe fill material into the gaps opened by the scribe lines;

determining a difference between the baseline optical characteristic spectrum and the optical characteristic spectrum of the thin film material remaining in the non-active region; and

selecting the one or more coloring elements based on the difference.

7. The method of claim 6, wherein the one or more coloring elements are selected at a ratio that drives an optical property spectrum of the scribe fill material to obtain an optical property spectrum of the material removed by opening the scribe.

8. The method of claim 1, wherein the one or more coloring elements comprise a sample of the same semiconductor material as included in the at least one active semiconductor layer.

9. The method of claim 1, wherein the at least one scribe fill material comprises a ceramic.

10. The method of claim 1, wherein depositing the at least one scribe fill material comprises one of:

making at least part of an electrical monolithic interconnection, or

At least a portion of the edge isolation seal is manufactured.

11. The method of claim 1, wherein the at least one active semiconductor layer comprises an organic photovoltaic semiconductor absorber layer.

12. A thin film semiconductor device, the device comprising:

a stack of thin-film material layers deposited on a substrate, the stack of thin-film material layers being subdivided into a plurality of semiconductor device cells divided into an active area and a non-active area by one or more scribe lines, wherein the stack of thin-film material layers comprises at least one active semiconductor layer, wherein a first semiconductor device cell of the plurality of semiconductor device cells defines the active area of the thin-film semiconductor device, wherein the active area comprises a color characteristic defined by a first optical characteristic spectrum; and

forming a non-active area on the substrate adjacent to the active area, the non-active area including at least one scribe fill material embedded with at least one coloring element, the non-active area having a color characteristic defined by a second optical characteristic spectrum;

wherein the first optical property spectrum and the second optical property spectrum match within a minimum perceptible difference of an industry-defined standard observer.

13. The device of claim 12, wherein the active semiconductor layer comprises an organic photovoltaic semiconductor absorber layer.

14. The device of claim 12, wherein the second optical characteristic spectrum of the non-active region yields the first optical characteristic spectrum of the active region with a deviation across the visible spectrum of ≦ 5% and a deviation for at least one wavelength within the visible spectrum of ≦ 2%.

15. The device of claim 12, wherein the second optical characteristic spectrum of the non-active region yields the first optical characteristic spectrum of the active region within Δ E2000 ≦ 3.

16. The apparatus of claim 12, wherein the at least one scribe fill material comprises an electrically insulating material or an electrically conductive material; and is

The at least one coloring element includes a pigment material or a dye material.

17. The device of claim 12, wherein the at least one coloring element comprises a sample of the same semiconductor material as included in the at least one active semiconductor layer.

18. The device of claim 12, wherein the substrate is opaque in the visible spectrum.

19. The apparatus of claim 12, wherein the at least one scribe fill material comprises a ceramic.

20. The apparatus of claim 12, wherein the non-active region comprises one of:

at least a part of an electrical monolithic interconnection, or

The edge isolates at least a portion of the seal.

Background

Industrial-scale thin-film devices, such as photovoltaic modules, typically include a stack of thin-film layers applied to a substrate. To ensure high performance over large areas, the stack of thin film layers is subdivided or "patterned" into a plurality of individual device cells using a scribe method, and material is deposited into the scribe area to form a monolithic interconnect that electrically interconnects the individual device cells. In opening the scribe area between the device cells, the scribing process includes removing one or more previously deposited thin film layers in the area where the scribe lines are formed. The material deposited into the scribe line areas will comprise electrically insulating material, electrically conductive material, or some combination of both electrically insulating and electrically conductive material applied in layers.

One problem associated with thin film devices patterned with scribe lines and monolithic interconnects is that patterning disrupts the uniform appearance of thin film materials applied across the substrate. The visual distortion resulting from these disruptions is a particularly problematic drawback for translucent photovoltaic modules intended for building integrated photovoltaics, such as windows or glass curtain walls, where distortion-free clarity and aesthetic characteristics are highly scrutinized by architects and engineers and builders. Visually significant distortion caused by thin film device patterning is also considered a defect in opaque thin film photovoltaic modules (e.g., for bridging glass panels), which are designed to be opaque in order to hide equipment or other features between floors of a building.

For the reasons stated above, and for other reasons stated below which will become apparent to those skilled in the art upon reading and understanding the present specification, there is a need in the art for a thin film electronic device that is visually undistorted.

Disclosure of Invention

Embodiments of the present disclosure provide methods and systems for a visually undistorted thin film electronic device, and will be understood by reading and studying the following specification.

In one embodiment, a method for producing a thin film electronic device comprises: opening a scribe line in a stack of thin film material layers deposited on a substrate to define an active area and a non-active area of the thin film electronic device, wherein the stack of thin film material layers includes at least one active semiconductor layer, wherein the active area includes an unmarked area of the stack of thin film material layers, wherein the non-active area includes an area of the stack of thin film material layers where the thin film material was removed by the scribe line; and depositing at least one scribe fill material into the gap opened by the scribe, wherein the scribe fill material has one or more shading elements embedded therein, wherein the one or more shading elements alter the optical property spectrum of the non-active area to obtain an optical property spectrum of the active area that is within a minimum perceptible difference of an industry-defined standard observer.

Drawings

Embodiments of the present disclosure may be more readily understood, and further advantages and uses thereof more readily apparent, when considered in view of the description of the preferred embodiments and the following drawings, in which:

fig. 1 is a diagram illustrating a thin film semiconductor device of one embodiment of the present disclosure;

fig. 2 is a diagram illustrating a thin film semiconductor device of one embodiment of the present disclosure;

FIG. 3 is a diagram illustrating a method of one embodiment of the present disclosure;

FIG. 4 is a diagram illustrating a method of one embodiment of the present disclosure;

FIG. 5 is a graph illustrating an intensity spectrum for a coloring element according to one embodiment of the present disclosure;

FIG. 6 is a graph illustrating an intensity spectrum associated with a P2 scribe line of one embodiment of the present disclosure;

FIG. 7 is a graph illustrating an intensity spectrum associated with a P3 scribe line of one embodiment of the present disclosure;

FIG. 8 is a chromaticity diagram associated with the P2 and P3 dashed lines of FIGS. 6 and 7;

FIG. 9 is a graph of optical density versus wavelength and target color matching spectral scribes illustrating scribe fill material inks deposited at various thicknesses according to one embodiment of the present disclosure; and

fig. 10 is a graph illustrating optical density versus thickness.

In accordance with common practice, the various features described are not drawn to scale, but are drawn to emphasize features relevant to the present disclosure. Throughout the drawings and text, reference numerals indicate like elements.

Detailed Description

In the following detailed description, reference is made to the accompanying drawings, which form a part hereof. Specific illustrative embodiments are set forth in which embodiments may be practiced. These embodiments are described in sufficient detail to enable those skilled in the art to practice the embodiments, and it is to be understood that other embodiments may be utilized and that logical, mechanical and electrical changes may be made without departing from the scope of the present disclosure. The following detailed description is, therefore, not to be taken in a limiting sense.

Embodiments of the present disclosure address the problem of visual distortion caused by patterning of thin film modules by introducing the introduction of coloring elements embedded within a scribe fill material deposited in the gaps where the thin film layers are removed. The spectral quality of these coloring elements, in combination with the spectral quality of the scribe fill material in which they are embedded, reintroduces the spectral quality of the thin film material removed during patterning so that the scribe line areas and thin film device cells are visually indistinguishable to a human observer when they are applied into the gap. It should be understood that embodiments of the present disclosure are not limited to the use of coloring element embedding materials used between thin-film device cells forming a monolithic interconnect. Other embodiments may address optical properties and color matching in other areas of the device, such as materials for edge isolation or sealing of the device. It should also be understood that a coloring element may refer to an additive coloring element or a subtractive coloring element. Coloring elements (e.g., pigments or dyes) embedded in the scribe fill material will selectively absorb some wavelengths of incident light while reflecting or transmitting other wavelengths of incident light. For example, in some embodiments involving semi-transparent devices, additive coloring elements may be utilized. In some embodiments involving opaque devices, subtractive coloring elements may be utilized. In other embodiments, a combination of additive coloring elements and subtractive coloring elements may be utilized. It should also be understood that the application of the embodiments described herein is not limited to thin film device units comprising photovoltaic devices, but may be applied to limited thin film device units forming other active electronic devices, such as, but not limited to, light emitting diodes or transparent human interface displays for computer applications.

Fig. 1 is a diagram illustrating a thin film electronic device 100 of one embodiment of the present disclosure. It should be understood that the disclosure provided herein is applicable to any form of thin film electronic device, including any form of thin film semiconductor device, where visually significant distortion caused by thin film device patterning is an issue. Thus, the embodiments disclosed in this specification relating to Organic Photovoltaic (OPV) thin film electronic devices are presented to provide specific example embodiments. Accordingly, it should be understood that the scope of the embodiments is not limited to these examples, but is limited to only organic thin film electronic devices or photovoltaic thin film electronic devices.

In some embodiments, the device 100 is a translucent organic device that may be used, for example, in building-integrated photovoltaic applications (e.g., glazing units) that allow natural lighting to enter the interior space of a building or vehicle. In other embodiments, the device 100 comprises an opaque thin film photovoltaic module, for example for bridging glass panels. As shown in fig. 1, the device 100 includes a plurality of individual device units 101 fabricated on a substrate 105. In alternative embodiments, the substrate 105 may comprise a rigid or non-rigid translucent material, such as a glass plate, acrylic or acrylic glass, rigid or flexible plastic (including plastics not otherwise classified as acrylic), flexible glass, translucent plastic, or film material, or alternatively an opaque material (e.g., metal or ceramic). Each device unit 101 defines an active area 110 of the device 100, which includes active electronic devices, such as, but not limited to, organic photovoltaic devices. Other regions of the device 100 define inactive regions, shown generally at 120. In some embodiments, the non-active area 120 of the device 100 may include an edge seal material (e.g., an electrically insulating edge seal material), as shown at 122. In some embodiments, the non-active region may include a monolithic electrical interconnect that electrically couples adjacent device cells 101 in a series or parallel combination, as shown at 124.

In particular, the device cell 101 includes front and back contact layers 130, 132, a first charge transport layer 134, an active semiconductor layer 136, and a second charge transport layer 138. In some embodiments, the first charge transport layer 134 may compriseIncluding a Hole Transport Layer (HTL), a Hole Collection Layer (HCL), or a Hole Injection Layer (HIL), while the second charge transport layer 138 may include an Electron Transport Layer (ETL), an Electron Collection Layer (ECL), or an Electron Injection Layer (EIL). In other embodiments, the first charge transport layer 134 may comprise an ETL or an ECL, and the second charge transport layer 138 may comprise an HTL or an HCL. For a translucent embodiment, both the front contact layer 130 and the back contact layer 132 may comprise transparent contact layers. For example, the front contact layer 130 and the back contact layer 132 may include transparent contact layers such as, but not limited to, Indium Zinc Oxide (IZO), Indium Tin Oxide (ITO), aluminum-doped zinc oxide (AZO), or gallium-doped zinc oxide (GZO), or other Transparent Conductive Oxides (TCO), which may be deposited by magnetron sputtering or other deposition methods. The first and/or second charge transport layers 134 and 138 may comprise a transparent conductive polymer, such as, but not limited to, poly (3, 4-ethylenedioxythiophene) (PEDOT), which may be blended with polystyrene sulfonate (PSS), or may comprise an oxide layer, such as, but not limited to, tungsten trioxide (WO)₃). The front and/or back contact layers 130 and 132 may also comprise transparent high conductivity polymers such as, but not limited to, PEDOT: PSS layers. In other embodiments, one of the front contact layer 130 or the back contact layer 132 may comprise an opaque material.

The materials forming the various material layers may be sputter deposited or deposited by other suitable methods such as, but not limited to, evaporation/vapor deposition or solution processing methods. The exact composition of the semiconductor active layer 136 may vary, but may include, for example, an organic Bulk Heterojunction (BHJ) layer that includes a blend of an electron donor material (which may be a polymer and/or small molecule) and at least one electron acceptor material (which may be a fullerene or other small molecule or polymer in different implementations). Alternatively, the organic semiconductor active layer 136 may include an organic bilayer having a layered structure of an electron donor material and an electron acceptor material. In other embodiments, active semiconductor layer 136 may comprise another active photovoltaic absorber thin film component, such as a perovskite absorber layer.

For embodiments including photovoltaic devices, in operation, when light enters the device cell 101, the absorbing layer 136 generates electron and hole charges from the absorbed photons. The electron and hole charges are collected in the respective contact layers 130 and 132. Electrical interconnect 124 transfers charge to positive terminal 140 and negative terminal 142, which may be located at the edges of device 100. The positive and negative terminals 140, 142 may, in turn, be coupled to one or more electronic devices (e.g., electrical loads) to provide electrical energy to the devices and/or to store energy generated by the device 100. In other embodiments, active semiconductor layer 136 comprises a non-photovoltaic device. For example, in some embodiments, the active semiconductor layer 136 may comprise a photon emitter layer for a light emitting diode.

During fabrication of the device 100, a stack of thin film materials forming the various device layers of the device cell 101 is deposited over the entire substrate 105, and a series of scribes are cut at least partially into the deposited layers, thereby forming the inactive region 120. The scribing process creates a gap in which portions of the previously deposited thin film material layer are removed. These scribes may then be filled with different layers of scribe fill material depending on the location and purpose of the open scribe. For example, scribe lines cut to define the edges of the device 100 may be filled with an edge sealing material 122. The scribe lines cut to divide the thin film layer into the pattern of individual device cells 101 may be filled with a series of different electrically insulating and conductive materials to form a monolithic electrical interconnect 124 between adjacent device cells 101. In other cases, the scribe lines may be filled with electrically insulative and/or conductive material in order to create an electrical interface (e.g., terminals 140, 142) for electrically coupling the device 100 to an external device or system. Other scribes may serve other purposes.

Regardless of the particular cause of the cut scribe, the uniform appearance of the deposited thin film layer sheet will be interrupted by the creation of scribes because the optical characteristic spectrum of the resulting non-active area 120 (where one or more of the thin film material layers have been removed) will no longer match the optical characteristic spectrum of the active area 110 that did not undergo scribing. It should be understood that as the term is used herein, the "optical property spectrum" of a thin film stack of materials can alternatively refer to the Visible Light Transmission (VLT) spectrum (which would be suitable for transparent or translucent applications where the properties of light passing through the thin film stack are important) or the reflection spectrum (which would be suitable for opaque applications where the properties of light reflected back from the thin film stack are important). Furthermore, because each non-active region 120 may be scribed into the thin film layer at different respective depths, the different non-active regions may have different optical property spectra relative to each other, depending on which and how many of the previously deposited layers have been removed. Furthermore, the scribe fill materials subsequently deposited into the scribe line areas may each have their own inherent spectral characteristics. For example, a scribe line used in the fabrication of monolithic electrical interconnect 124 may have layers of electrically insulative material 125 and electrically conductive material 126 deposited therein to create electrical interconnect 124. In some embodiments, additional and/or other materials may be deposited. Thus, the resulting optical characteristic spectrum of such inactive regions 120 will be a function of the optical characteristic spectrum of any remaining layer of the original deposited material that was not removed by the scribe lines and the optical characteristic spectrum of the scribe line fill material subsequently deposited into the gaps opened by the scribe lines. Any observable discontinuities caused by mismatched optical property spectra will be perceived as visual distortions by an individual viewing or transmitting the device.

The degree to which the resulting non-active area 120 is visually distinguishable from the unmarked active area 110 depends on the deviation between the optical property spectrum of the active area 110 and the optical property spectrum of the resulting non-active area 120. Thus, with embodiments of the present disclosure, the optical characteristic spectrum of the resulting non-active region 120 is adjusted by introducing the coloring element 127 into the one or more scribe line fill materials deposited into the scribe line such that the optical characteristic spectrum of the resulting non-active region 120 substantially obtains the optical characteristic spectrum of the active region 110.

Fig. 2 further details an example embodiment of the apparatus 100 of fig. 1. Thus, elements described with respect to fig. 2 may be used in combination with, or instead of, elements of any of the above-described embodiments. Furthermore, the functional, structural, and other descriptions of elements described above for such embodiments may be applicable to similarly named elements in fig. 2, and vice versa. As shown generally at 200 in fig. 2, scribe line 212 is opened to form a gap 214 in the stack of thin-film device layers 204, thereby defining an inactive region 220 where scribe line 212 is opened and an active region 210 where thin-film device layers 204 remain intact. The various material layers of the active region 210 will each inherently include spectral characteristics that collectively result in a composite of spectral characteristics defining an optical characteristic spectrum associated with the active region 210. When the one or more scribe fill materials 222 are deposited into the gap 214, the inactive region 220 will acquire spectral characteristics defining an optical characteristic spectrum associated with the inactive region 220. As described above, in some cases, the opening of scribe line 212 may go all the way down until substrate 205 removes the entire column of thin film device layers 204. Alternatively, the opening of scribe line 212 may only partially penetrate thin-film device layer 204 such that a portion of the original thin-film material layer 204 is not removed and remains within non-active area 220 (shown at 223). Thus, the spectral characteristics and associated optical characteristic spectrum of the resulting inactive region 220 will be a function of the optical characteristic spectrum of any of the virgin material 223 that was not removed by the scribe 212 and the optical characteristic spectrum of the scribe fill material 222 that is subsequently deposited into the gap 214. With embodiments of the present disclosure, the optical property spectrum of the scribe fill material 222 is manipulated by reinforcing the material with one or more coloring elements 224 embedded within the scribe fill material 222. By enhancing the scribe fill material 222 with the coloring elements 224, the optical characteristic spectrum of the inactive region 222 can be manipulated to obtain the optical characteristic spectrum of the active region 210 to the extent that the visible differences between the regions are not perceptible relative to industry-defined standard observers.

In some embodiments of the present disclosure, the coloring elements 224 may be embedded within the scribe fill material 222 for electrical or other functional purposes. For example, the coloring elements 224 may be embedded within a conductive scribe fill material (e.g., 126) and/or an electrically insulating scribe fill material (e.g., 125) deposited in the gap in order to fabricate the monolithic electrical interconnect 124 or the electrical terminal 140 or 142. In other embodiments, the coloring elements 224 may be embedded within an additional inert scribe fill material 222 deposited primarily for manipulating the optical property spectrum of the inactive region 220. Such coloring materials may be deposited on other scribe fill materials 222 that have a functional purpose, such as for creating monolithic electrical interconnects 124. It should be noted that the deposition of the additional scribe fill material 222 including the embedded coloring elements 225 may also serve to prevent foreign material from intruding into the gap 214 that could otherwise cause device cell shorting, active area thin film layer delamination, or other potential defects. It should be understood that in other embodiments, the coloring elements 224 may be embedded within the scribe fill material 222 used to fabricate the monolithic electrical interconnect and within additional scribe fill material 222 deposited in the gap 214.

Furthermore, in some embodiments, multiple sets of coloring elements 224 are embedded in multiple different layers of scribe fill material 222 to obtain a desired optical property spectrum. For example, the first coloring element 224 may have excellent solubility characteristics deposited with the first scribe fill material 222, while the second coloring element 224 may alternatively have excellent solubility characteristics deposited with the second scribe fill material 222. If a combination of two coloring elements 224 is required to obtain the desired optical property spectrum in the non-active area 220, a first set of coloring elements may be embedded in the first scribe fill material 222 while a second set of coloring elements is embedded in the second scribe fill material 222.

In any of the above manners, the optical characteristic spectrum of the non-active region 222 can thus be manipulated such that the optical characteristic spectra of the active region 210 and the non-active region 220 sufficiently match to produce a uniform appearance across the module without distortion due to color discontinuities of industry-defined standard observers. As the term is used herein, the optical property spectrum of a material refers to the amount of light transmission (or reflectance) and the spectral distribution of wavelengths across the visible spectrum of light emitted from the material. The visible spectrum is generally defined as including light of wavelengths from about 380nm to 680 nm. Although this specification employs standards and definitions promulgated by the international commission on illumination (CIE) to provide illustrative examples, it should be understood that the embodiments described herein may be practiced by reference to other alternative colorimetric standards instead.

Quantifiable in the visible spectrum given selected CIE standard illuminantThe amount of light reflected or transmitted from the object at each wavelength is used to create a spectral curve that defines the color characteristics of the object. Moreover, the human eye is not uniformly sensitive to light over the visible spectrum, but is more sensitive to certain colors than others. Thus, industry standards define a standard colorimetric observer (e.g., the CIE 10 degree standard observer), which includesAndfunctions that quantify the red, blue and green cone sensitivities of a normal human observer to a standard illuminant to meet an industry-defined standard observer to establish an objective colorimetric metric.

CIE tristimulus values (also known as color coordinates) X, Y and Z may be determined by fitting these three standard observer functions (i.e.,and) Multiplied by the transmission (or reflectance, if applicable) of the CIE light source and object respectively, and then summed over the visible spectrum wavelengths to yield X, Y and the Z color coordinate. Those skilled in the art who have studied this disclosure will appreciate that these X, Y and Z color coordinates can be mathematically mapped to any desired color space (e.g., Hunter L, a, b color space or CIE L, a, b color space) in order to perform calculations for comparing colors to determine the degree to which two colors match. Thus, the optical property spectrum of an object may be defined in terms of a coordinate vector comprising X, Y and the Z color coordinate. In some embodiments of the present disclosure, the baseline optical property spectrum for the active areas 110 of the device 100 may thus be obtained by determining the X, Y and Z color coordinates for those active areas 110. This baseline optical characteristic spectrum will be used as the target optical characteristic spectrum to which the X, Y and Z color coordinates of the non-active area 110 are designed by enhancing the scribe fill material 222 with the coloring elements 224Characteristic spectrum.

In general, the acceptable color match between two sample objects typically varies depending on the application. However, for purposes of industrial architectural and architectural window applications, any difference between the optical property spectra of the active area 110 and the non-active area 120 must be at or below a minimum perceptible limit (which may be referred to as a minimum perceptible difference) in order to provide distortion-free window clarity that is expected to meet industry standards.

Establishing an objective measure of the proximity between two optical property spectra for an industry-defined standard observer can be calculated from the distance between two sets of measurements in the three-dimensional color space. For example, given the color coordinates of the active regions 110 and the color coordinates of the inactive regions 120, the rectangular color differences Δ L, Δ a, Δ b can be easily determined in the CIE L, a, b color space. If Δ L is positive, the non-active region 120 is lighter than the active region 110. If negative, the inactive area 120 is darker than the active area 110. If Δ a is positive, the inactive regions 120 are more red or less green than the active regions 110. If Δ a is negative, the inactive region 120 is more green or less red than the active region 110. If Δ b is positive, the inactive region 120 is more yellow and less blue than the active region 110. If Δ b is negative, the inactive region 120 is more blue and less yellow than the active region 110. However, as already noted, the minimum perceptible difference between the two colors is not uniform for all wavelengths across the visible spectrum. Thus, CIE defines a parameter Δ E (total color difference) to establish a standard calculation index that relates human visual judgment to the difference between two perceived colors. At the time of this disclosure, the parameter "Delta E2000" or Δ E2000 is considered to be the most accurate CIE color difference algorithm that can be used to determine human detectability of differences between any two colors in the visible spectrum.

While it is difficult to obtain perfect optical property spectral matching across the entire visible spectrum between adjacent active and inactive regions, perfect matching of colors within minimal perceptible differences is not required. The embodiments presented herein can be used to obtain very close color matching across the visible spectrum (e.g., ≦ 5% deviation), and optionally with a stricter matching criterion (e.g., ≦ 2%) for matching in those regions of the visible spectrum where the human eye is most sensitive in detecting color differences. Based on the Δ E2000 standard, the smallest detectable difference between two colors in the visible spectrum can be considered to occur between Δ E2000 values of 1-3, with a Δ E2000 value of 1 being defined as essentially imperceptible to anyone other than an experienced professional glass inspector.

Thus, with embodiments of the present disclosure, the X, Y and Z color coordinates of the non-active area formed by the scribe line may be modified by embedding the coloring element 224 in the scribe line fill material 222 such that the X, Y and Z color coordinates of the non-active area 120 match the X, Y and Z color coordinates of the active area 110 within a range of Δ E2000 values of 3 or less, resulting in an acceptable distortion-free glass sheet that includes an active electronic module for architectural applications on its surface. In some embodiments, for an industry-defined standard observer of Δ E2000 ≦ 3, the deviation between an active area and an adjacent non-active area may be considered to be within a minimum perceptible difference.

FIG. 3 is a flow chart illustrating a method 300 of manufacturing a visually uniform thin film electronic device according to one embodiment of the invention. It should be understood that the method 300 may be implemented in conjunction with any of the embodiments described above with respect to fig. 1 and 2. Thus, elements of method 300 may be combined with, or substituted for elements of those embodiments described above. Moreover, the functional, structural, and other descriptions of elements described above for such embodiments may be applied to similarly named elements of the method 300, and vice versa.

The method 300 begins at 310 with opening a scribe line in a stack of thin film material layers deposited on a substrate to define an active area and a non-active area of a thin film electronic device, wherein the stack of thin film material layers includes at least one active semiconductor layer. The active area includes an unmarked area of the stack of thin film material layers and the non-active area includes an area of the stack of thin film material layers where the thin film material was scribed away. The method 300 proceeds to 320, where at least one scribe fill material is deposited into the gap opened by the scribe line, where the scribe fill material has one or more shading elements embedded therein, where the one or more shading elements alter the optical characteristic spectrum of the non-active area to obtain an optical characteristic spectrum of the active area that is within a minimum perceptible difference of an industry-defined standard observer.

The scribing performed at 310 may be performed using one of several techniques known to those skilled in the art. In some embodiments, scribing is performed using a laser or mechanical scribe as a localized process to selectively remove layers of previously deposited thin film layers. In some embodiments, the hyperchromic scribe fill material deposited into the scribe at 320 may be applied using a localized deposition technique such as aerosol jet printing or inkjet printing. Both of these techniques have the advantage of being able to deposit material locally to selected areas, can be used to precisely control the amount of material deposited, and are compatible with high throughput manufacturing techniques. However, it should be understood that the embodiments presented herein are not limited to aerosol jet printing and/or inkjet printing. In other embodiments, printing techniques such as, but not limited to, screen printing, gravure printing, and spectral microcontact printing may be used to deposit the color element enhancing material.

In one embodiment, the method 300 may include obtaining a baseline optical characteristic spectrum for an unmarked area of the stack of thin film material layers and an optical characteristic spectrum for any material remaining within the scribe line from which at least a portion of the thin film material layers were removed. The difference between these two optical property spectra may be used to define a desired aggregate color property of the scribe fill material to be added back to the scribe area. The color characteristics of the scribe fill material may be color matched to the color characteristics of the material removed by the scribing process so that the resulting scribed inactive area will be color matched to the unlined active area. In some embodiments, to determine what coloring elements need to be added, the inherent color characteristics of the scribe fill material are established. The scribe fill material is then enhanced with embedded coloring elements that drive the optical property spectrum of the scribe fill material to that of the material removed by the scribe.

It will be appreciated that a person skilled in the art of colorimetry in thin film applications will be able to determine what combination of dyes and/or pigments will best serve as a coloring element embedded in the scribe fill material to concentrate given a target optical property spectrum of the scribe fill materialAnd obtainOptical property spectrum of the removed material. For example, for translucent applications, the coloring elements may include a combination of separate red, blue, and green dyes. The specific combination is formulated in advance and embedded in the material prior to deposition in the scribe area.

It should be understood that the enhanced scribe fill material may, but need not, obtain the final target optical property spectrum immediately upon deposition. That is, in some embodiments, depending on the material properties of the coloring elements and the scribe fill material, a target optical property spectrum may be obtained by the method 300, the method 300 further including aging, curing, or otherwise treating the deposited scribe fill material to bring the material to the target optical property spectrum. For example, the hyperchromic scribe fill material deposited into the scribe lines at 320 may be subjected to thermal and/or light treatment or other treatment that causes a change in the spectral quality of one or more coloring elements embedded within the scribe fill material. For example, one or more coloring elements may change with respect to color, saturation, or opacity. In some embodiments, such post-deposition processes may cause coloring elements embedded within the scribe fill material to interact with each other, or with other components of the scribe fill material, to bring the material to a target optical property spectrum. While in some embodiments such post-deposition processing may occur as part of the manufacturing process of the thin film electronic device, in other embodiments it may occur in whole or in part after fabrication is complete. For example, in some embodiments, it should be understood that the hyperchromic score line filler material may be changed in situ with respect to color, saturation, or opacity after installation of the device. In such embodiments, exposure to the desired ambient illumination and/or heating may comprise a portion of a post-deposition process for obtaining a steady state spectral quality having a target optical property spectrum.

The use of embedded coloring elements to control the optical property spectrum of the scribe fill material can be accomplished in a number of different ways. In one embodiment, a sample of the thin film material used in the device unit 101 may be incorporated into the scribe lane filling material as a coloring element. It would be desirable to measure the use of such materials as coloring elements so as not to alter the electrical properties of the scribe fill material in an adverse manner. For example, where the scribe fill material is introduced into the scribe to provide an electrical insulator, the scribe fill material will need to include such samples with a sufficiently low load so as not to destroy the insulating properties of the scribe fill material. In some embodiments, the optical property spectrum of the scribe fill material may be fine tuned using a sample of the semiconductor active layer material for coarse tuning and embedded additional coloring elements to account for the color properties of other device layers. In some embodiments, the amount of scribe fill material deposited may exceed the thickness of the surrounding thin film layers due to the reduced loading of semiconductor active layer material in the scribe fill material, but this is acceptable because the scribe fill material insulator may be overprinted to ensure complete isolation.

Examples of scribe fill materials that may be used to form an insulating (e.g., dielectric) layer in the scribe area include, but are not limited to, organic polymers such as poly (styrene), poly (methyl methacrylate), poly (vinyl acetate), poly (vinyl alcohol), organic-inorganic hybrid materials such as organosiloxane metal-organic frameworks, or inorganic polymers such as siloxane or thyroxine, or ceramic materials suitable for non-transparent applications, or combinations thereof. Example materials that may be used for the scribe line fill material to form the conductive layer in the scribe line areas include, but are not limited to, semi-transparent conductors and materials such as Indium Tin Oxide (ITO) nanoparticles, Transparent Conductive Oxide (TCO) nanoparticles, and other semi-transparent conductors or semi-conductive organic polymers, or opaque conductors such as silver (Ag) or other metals, nanoparticles, nanowires, or flakes, or combinations thereof.

The color elements used to manipulate the optical property spectrum of the scribe fill material may be selected based not only on their coloration properties, but also on other material properties (e.g., hardness and/or flexibility) and their overall compatibility with the materials into which they are to be deposited and embedded. In some embodiments, the material selected as the coloring element should have the same dissolution characteristics as the scribe fill material that will be embedded therein. That is, the coloring elements are ideally soluble in the same solvent as the scribe fill material so that they can be mixed together prior to deposition. If the scribe-lane filling material is soluble in water, the coloring element selected for embedding within the scribe-lane filling material should also be soluble in water. Similarly, if the scribe fill material is soluble in an organic solvent, the coloring elements selected for embedding within the scribe fill material should also be soluble in the same organic solvent. For example, one skilled in the art of water-soluble dyes may begin with a target optical property spectrum (which may be defined in terms of a set of color coordinates as described above) of a desired water-soluble scribe fill material. Given the target optical property spectrum, they may be selected from water-soluble dyes and/or pigments to be combined with a water-soluble scribe-filling material to yield a scribe-filling material that will achieve the target optical property spectrum. Similarly, given a target optical property spectrum, one skilled in the art of organic solvent soluble molds may then select from a selection of organic solvent soluble molds and/or pigments to combine with the organic solvent soluble scribe fill material to yield a scribe fill material that will achieve the target optical property spectrum. Thus, depending on the insulator material selected and its solubility in various solvents, this will affect the choice of coloring elements used. Most film absorbent materials are unlikely to be water soluble, but many common commercial dyes (e.g., food dyes) are water soluble. If a matching solvent cannot be identified, in some embodiments, the coloring element and the insulator may be printed separately and laminated on top of each other.

As described above, the hyperchromic scribe fill material can be selectively placed in and/or over specific scribes using area selective printing techniques with high resolution. For example, aerosol jet printing and inkjet printing are two deposition techniques that allow for flexible control of the amount of insulator deposited. In alternative embodiments, other printing techniques may be utilized, such as: screen printing, gravure printing, metering rod printing, flexographic printing, and micro-contact printing. All of these techniques utilize ink to accomplish the printing process, and each process requires slightly different ink properties. Generally, however, the inks used to deposit the hyperchromic scribe fill material will have substantially similar properties and include a solvent, a scribe fill material that is soluble in the solvent (whether an insulator (dielectric) or conductor), and a coloring element (soluble in the selected solvent) that produces the desired target optical property spectrum. It will be appreciated, however, that in some cases, for example, the components of the ink may not need to be soluble if a stable suspension can be formed that can be printed by one or more of the techniques described above.

It should also be appreciated that the unscored layers of the active area 110 will need to be able to withstand the application of ink solvent without substantial damage, otherwise the printing process may adversely affect the performance of the device 100. Other additives such as surfactants, tackifiers, crosslinkers, or other additives may also be added to the ink.

After suitable inks for depositing the hyperchromic scribe fill material have been developed and a suitable printing process selected, an example process can be described as follows: thin film photovoltaic modules are prepared by depositing a stack of thin film layers. A scribe line is made (e.g., P3 scribe line or equivalent) and then ink including a hyperchromic scribe fill material is printed inside the scribe line to the necessary thickness to produce a good match of optical property spectrum and intensity to the surrounding active area. In the case where a transparent contact material is placed inside the P2 scribe line, this material may also be overprinted with a suitable ink including another hyperchromic scribe line fill material to similarly reduce or eliminate optical property spectra and intensity mismatches between the P2 scribe line and the surrounding active area. In some embodiments, annealing or other post-deposition processes (e.g., ultraviolet exposure) may be used to place the insulator in place. The result should be a good match of the optical property spectra and intensity of the entire P3 and optionally the P2 scribe, while also providing the necessary insulation protection between the conductor passing through the P3 scribe (shunt resistance) and the P2 conductor and the surrounding environment. Optical characteristic spectral matching should enhance the uniform appearance of the device 100 while also ensuring adequate module performance. This example refers to the P2 and P3 scribe lines defined by conventional P1, P2, and P3 scribe line methods known to those skilled in the art for making monolithic interconnects. However, the introduction of color matching as presently disclosed in this disclosure is also applicable to alternative monolithic interconnect configurations and thin film structures in order to eliminate visual defects caused by optical property spectral discontinuities.

Fig. 4 is a flow chart illustrating a method 400 for manufacturing a suitable ink for depositing a hyperchromic scribe fill material. The method begins at 410 by determining an intensity spectrum for a plurality of shading element input samples. As used herein, the term "intensity spectrum" may alternatively refer to an absorption spectrum, a transmission spectrum, or a reflection spectrum. It should be appreciated that although the illustrative examples described herein relate primarily to the determination of an absorption spectrum, one skilled in the art can readily apply the teachings disclosed herein to more desirable or suitable applications for the determination of a transmission spectrum or a reflection spectrum. In this particular example embodiment, to determine the absorption spectrum, a plurality of available coloring elements are each dissolved into a separate sample of scribe fill material to produce a plurality of separate coloring element input samples, one for each available coloring element. The absorption spectrum of each coloring element input sample is measured in terms of absorption intensity (or optical density, o.d.) versus wavelength. For example, fig. 5 is a graph illustrating a set of industrial dyes (specifically, blue (510), orange (520), black (530), red (540), and yellow 2 (550)) from a PVAc membrane during a laboratory experimentScience and technology CorpTechnologies Corporation) ofSolvent soluble dye) obtained from the sample, and a plot of absorption spectra 510-550. To obtainThese measurements were taken and each coloring element input sample was applied as a thin film having a thickness approximately equal to (e.g., within an order of magnitude) the expected thickness of scribe fill material required to fill a target scribe (e.g., approximately 750nm) onto a transparent substrate.

The method proceeds to 420 and an intensity spectrum of the material layer removed from the thin film stack is determined. That is, the spectral quality of the thin film material removed during patterning is determined. As described above, the difference in optical property spectrum between the baseline optical property spectrum for the unmarked areas of the stack of thin-film material layers and the optical property spectrum of any material remaining within the scribe line can be used to define the desired aggregate color property of the scribe line fill material to be added back to the scribe line areas. For example, fig. 6 illustrates an absorption spectrum obtained in a laboratory experiment in which a standard P2 scribe was cut into a stack of thin film material layers. Curve 610 indicates the difference in VLT spectra between the entire stack of thin film material layers and the area scribed with P2. The curve 610 thus provides a desired target color matching spectrum for adding scribe fill material back to the scribe area.

The method proceeds to 430 with determining ratios of the plurality of tinting element input samples to generate a scribe fill material ink, where the ratios provide a best fit estimate of the intensity spectrum for the material layer removed from the thin film stack. Given the target color matching spectrum 610, the absorption spectrum curve 510-550 may be applied to a linear fitting algorithm or other available data analysis software to determine the combination of shading element input samples that produces the best fit curve for the target color matching spectrum 610. In fig. 6, curve 620 illustrates a curve fit of a set of 5 coloring element input samples illustrated by absorption spectra 510 and 550 in fig. 5 to a target color matching spectrum 610 scribed by P2. In this case, the sample spectral data and the target color matching spectral data of the coloring element input are input into the Igor Pro data analysis software program to calculate a best-fit color matching curve 620 and to generate corresponding least-squares coefficient values indicative of respective concentration ratios of the coloring element input samples that yield a best-fit color match with the VLT spectral difference represented by the target color matching spectrum 610. The quality of the best fit color matching curve 620 is fully acceptable, especially in the 550-650nm range, which is approximately the peak in the photopic region.

Thus, laboratory studies have demonstrated that PVAc material films embedding these coloring elements at a ratio dictated by the values of the linear fit coefficients can be used to adjust the optical property spectrum of the non-active region formed by this P2 scribe and adjust the optical property spectrum to substantially obtain the optical property spectrum of the unpainted stack of thin-film material layers. To track the results, a solution of scribe fill material ink was prepared with 1 wt.% PVAc using coloring elements in a ratio specified by coefficient values, and test films of two thicknesses were prepared. Two film samples of different thickness were made from this scribe-fill material ink. The associated absorption spectrum profile for the first thickness film is shown at 630, while the relatively thicker second thickness profile is shown at 640. As shown by curves 630 and 640, the test film of scribe fill material is either too thick or too thin to provide an exact match in optical density to the best fit color matching curve 620. However, the quality of the spectral matching itself is obvious and a more accurate optical density matching can be achieved by adjusting the thickness.

A similar experiment was performed on a standard P3 scribe, as shown in figure 7. Fig. 7 illustrates the absorption spectra obtained in a laboratory experiment in which a standard P3 scribe was cut into a stack of thin film material layers. In this experiment, curve 710 indicates the difference in VLT spectra between the entire stack of thin film material layers and the area scribed with P3. Curve 710 thus provides the desired target color matching spectrum for adding scribe fill material back to the scribe area. In this case, the same industrial dye is used, so the same absorption spectrum inputs 510-550 are applied to the linear fitting algorithm to determine what combination of colored element input samples are required to obtain the best fit curve for the target color matching spectrum 710. The Igor Pro data analysis software program calculates a best fit color matching curve 720 and corresponding least squares coefficient values for generating the corresponding concentration ratios of the coloring element input samples that match the best fit color of the target color matching spectrum 710. Using coloring elements in a ratio specified by coefficient values, a solution of the scribe fill material ink was again prepared with 1 wt.% PVAc, and test films of two thicknesses were prepared and subjected to spectral measurement as shown by curves 730 and 740. As shown by curves 730 and 740, the thicker test film 740 provided nearly accurate optical density, although the quality of the spectral match was reduced compared to the P2-scribed example in fig. 6. However, such results are not unexpected, as P3 scoring results in the removal of more of the thin film material layer. As a result, the embedded coloring elements play a greater role in the overall VLT spectrum of the resulting inactive region. In any event, this experiment demonstrates the realisation of color matching, i.e. the spectral difference in optical properties represented by the target color matching spectrum scribed by P3.

To quantitatively analyze the quality of the scribed filler material with embedded coloring elements, obtainable from scribed filler material inks that fit the best fit color matching curve ratios, we calculated the CIE 1964(10 °) XYZ tristimulus and XYZ chromaticity values of the P2 and P3 reference (color matching) spectra shown in the examples of fig. 6 and 7.

TABLE 1 calculation of tristimulus, chroma and Δ E2000 values for the CMI procedure

It should be noted that these calculations utilize transmission data, which may be calculated from absorbance and/or reflectance data, and thus may introduce some negligible error due to reflection and scattering. The data are given in table 1, along with the calculated value Δ E2000 comparing the reference spectrum to the fitted values. The quality of the fit is very good as indicated by the low Δ E2000 value (1). The color and brightness data is expressed in standard XYZ tristimulus measurements (cd/m ^ 2). All color metrics can be converted from these values. Chromaticity coordinates (x, y, z) are derived from XYZ luminance values. Fig. 8 provides a plot of xyz chromaticity values to facilitate a visual interpretation of the data. In FIG. 8, the XYZ coordinates of the P2 scribe target color matching spectrum 610 (expressed in standard XYZ tristimulus (cd/m ^ 2)) are shown at 810, the XYZ coordinates of the best fit color matching curve 620 are shown at 812, the XYZ coordinates of the P3 scribe target color matching spectrum 710 are shown at 820, and the XYZ coordinates of the best fit color matching curve 720 are shown at 822.

It should be noted that when filling the score lines with the score line filling material, it is generally desirable to have a total thickness similar to the thickness of the score lines to avoid overfilling or underfilling, which can adversely affect appearance and/or device performance. To ensure a good match between the o.d. and the spectrum between the scribe fill material and the surrounding material, it is necessary to adjust the concentration of the coloring element in the scribe fill material ink to obtain the correct o.d. at the desired film thickness. In other words, once the ratio of coloring elements is determined based on the best-fit coefficient values, the total concentration of coloring elements present in the scribe fill material ink can be adjusted according to the desired film thickness deposited.

Accordingly, the method proceeds to 440, where the total concentration of the plurality of coloring elements present in the scribe line fill material ink is adjusted based on the target film thickness. In one embodiment, once the initial batch of scribe fill material ink has been prepared, films of different thicknesses may be deposited (e.g., via doctor blading) and the intensity spectrum/o.d. and film thickness measured for each film thickness. Fig. 9 is a graph illustrating o.d. versus wavelength for scribe fill material inks deposited at various thicknesses (shown at 910), and a target color matching spectrum 920. For purposes of example, the particular target color matching spectrum shown in fig. 9 corresponds to the target color matching spectrum 710 of the P3 scribe line shown in fig. 7. In this example, the o.d. and corresponding film thickness at the wavelengths of interest 435nm (shown at 902), 620nm (shown at 904), and 675nm (shown at 906) can be used to determine the estimated thickness.

FIG. 10 illustrates one example manner in which an estimated thickness may be determined. Fig. 10 plots o.d. against film thickness. As shown in fig. 10, a least squares linear regression fit (y ═ a + bx) can be calculated from the map for each wavelength of interest (with a best fit curve at 435nm shown at 1002, a best fit curve at 620nm shown at 1004, and a best fit curve at 675nm shown at 1006. those skilled in the art who have studied the present disclosure will appreciate that other wavelengths of interest can be selected depending on the particular application.

From the calculated degree of fit and the desired o.d. in the target color matching spectrum 610, the thickness required to achieve the desired OD can be estimated as shown in table 2 below.

TABLE 2 calculated scribe Filler film thickness estimates and ratios

For example, assuming a target thickness of 750nm for the scribe fill material deposited into the scribe lines, the ratio of the estimated thickness to the target thickness provides an estimate of the dye concentration adjustment that will be required. For example, taking the average of three ratios (3.46, 4.40, and 5.35) indicates that producing the desired o.d. at the target thickness requires an increase in the concentration of coloring elements in the scribe fill material ink of about 4.4 times for the P3 scribe example described in fig. 7 above.

Example embodiments

Example 1 includes a method for producing a thin film electronic device, the method comprising: opening a scribe line in a stack of thin film material layers deposited on a substrate to define an active area and a non-active area of the thin film electronic device, wherein the stack of thin film material layers includes at least one active semiconductor layer, wherein the active area includes an unmarked area of the stack of thin film material layers, wherein the non-active area includes an area of the stack of thin film material layers where the thin film material was removed by the scribe line; depositing at least one scribe fill material into the gap opened by the scribe, wherein the scribe fill material has one or more shading elements embedded therein, wherein the one or more shading elements alter the optical property spectrum of the non-active area to obtain an optical property spectrum of the active area that is within a minimum perceptible difference of an industry-defined standard observer.

Example 2 includes the method of example 1, further comprising: determining an intensity spectrum for a plurality of colored element input samples; determining an intensity spectrum of a material layer removed from the thin film stack; determining a ratio of a plurality of coloring element input samples to generate a scribe fill material ink, wherein the ratio provides a best fit estimate of an intensity spectrum of a material layer removed from a thin film stack; the total concentration of the plurality of coloring elements present in the scribe lane filling material ink is adjusted based on the target film thickness.

Example 3 includes the method of any one of examples 1-2, wherein the optical property spectrum of the inactive region obtains an optical property spectrum of the active region within Δ E2000 ≦ 3.

Example 4 includes the method of any one of examples 1-3, wherein opening the scribe line in the stack of thin film material layers includes selectively removing material from the thin film material layers deposited on the substrate using a laser or a mechanical scribe line.

Example 5 includes the method of any one of examples 1-4, wherein the score line comprises at least one of a P1, P2, or P3 score line.

Embodiment 6 includes the method of any of embodiments 1-5, wherein the substrate is transparent or opaque with respect to visible light.

Example 7 includes the method of any one of examples 1-6, wherein depositing at least one scribe fill material into the gap opened by the scribe line comprises one of aerosol jet printing, ink jet printing, screen printing, gravure printing, and spectral microcontact printing.

Example 8 includes the method of any one of examples 1-7, wherein depositing at least one scribe fill material into the gap opened by the scribe line comprises depositing a scribe fill material ink onto the inactive area, wherein the scribe fill material ink comprises: a solvent, at least one scribe fill material, and one or more coloring elements, wherein the one or more coloring elements and the at least one scribe fill material are soluble in the solvent.

Example 9 includes the method of example 8, wherein the one or more coloring elements are soluble in the solvent.

Example 10 includes the method of any one of examples 8-9, further comprising: determining a baseline optical property spectrum for the stack of thin-film material layers in the active region; determining an optical property spectrum of the thin film material remaining in the non-active area before depositing at least one scribe fill material into the gaps opened by the scribes; determining a difference between the baseline optical characteristic spectrum and an optical characteristic spectrum of the thin film material remaining in the non-active region; and selecting one or more coloring elements based on the difference.

Example 11 includes the method of example 10, wherein the one or more coloring elements are selected at a ratio that drives an optical property spectrum of the scribe line fill material to obtain an optical property spectrum of the material removed by opening the scribe line.

Example 12 includes the method of any one of examples 1-11, wherein the one or more coloring elements comprise a sample of the same semiconductor material as included in the at least one active semiconductor layer.

Example 13 includes the method of any one of examples 1-12, wherein the at least one scribe fill material includes a ceramic.

Example 14 includes the method of any one of examples 1-13, wherein depositing at least one scribe fill material includes fabricating at least a portion of the monolithic electrical interconnect.

Example 15 includes the method of any one of examples 1-14, wherein depositing at least one scribe fill material includes fabricating at least a portion of an edge isolation seal.

Example 16 includes the method of any one of examples 1-15, wherein the active semiconductor layer comprises an organic photovoltaic semiconductor absorber layer

Example 17 includes a thin film semiconductor device, comprising: a stack of thin-film material layers deposited on a substrate, the stack of thin-film material layers being subdivided into a plurality of semiconductor device cells, the semiconductor device cells being divided into an active area and a non-active area by one or more scribe lines, wherein the stack of thin-film material layers comprises at least one active semiconductor layer, wherein a first semiconductor device cell of the plurality of semiconductor device cells defines the active area of the thin-film semiconductor device, wherein the active area comprises a color characteristic defined by a first optical characteristic spectrum; and a non-active region formed on the substrate adjacent the active region, the non-active region including at least one scribe fill material embedded with at least one coloring element, the non-active region having a color characteristic defined by a second optical characteristic spectrum; wherein the first optical property spectrum and the second optical property spectrum match within a minimum perceptible difference of an industry-defined standard observer.

Example 18 includes the device of example 17, wherein the active semiconductor layer comprises an organic photovoltaic semiconductor absorber layer.

Example 19 includes the device of any of examples 17-18, wherein the second optical characteristic spectrum of the inactive region obtains a first optical characteristic spectrum of the active region with a deviation across the visible spectrum of ≦ 5% and a deviation for at least one wavelength within the visible spectrum of ≦ 2%.

Example 20 includes the device of any one of examples 17-19, wherein the second optical characteristic spectrum of the inactive region obtains the first optical characteristic spectrum of the active region within Δ E2000 ≦ 3.

Example 21 includes the apparatus of any one of examples 17-20, wherein the at least one coloring element and the at least one scribe fill material are both materials soluble in the first solvent.

Example 22 includes the apparatus of any one of examples 17-21, wherein the at least one scribe fill material comprises: a first scribe filling material in which the first coloring element is embedded and a second scribe filling material in which the second coloring element is embedded.

Example 23 includes the apparatus of any one of examples 17-22, wherein the at least one scribe fill material comprises an electrically insulating material and the at least one coloring element comprises a pigment material or a dye material.

Example 24 includes the apparatus of any one of examples 17-23, wherein the at least one scribe fill material comprises a conductive material and the at least one coloring element comprises a pigment material or a dye material.

Example 25 includes the device of any one of examples 17-24, wherein the at least one coloring element comprises a sample of the same semiconductor material as included in the at least one active semiconductor layer.

Example 26 includes the device of any one of examples 17-25, wherein the substrate is opaque across the visible spectrum.

Example 27 includes the apparatus of any one of examples 17-26, wherein the at least one scribe fill material comprises a ceramic.

Example 28 includes the device of any one of examples 17-27, wherein the non-active region includes at least a portion of the electrical monolithic interconnect.

Example 29 includes the device of any one of examples 17-28, wherein the non-active region includes at least a portion of the edge isolation seal.

Although specific embodiments have been illustrated and described herein, it will be appreciated by those of ordinary skill in the art that any arrangement which is calculated to achieve the same purpose may be substituted for the specific embodiments shown. This application is intended to cover any adaptations or variations of the embodiments presented. Therefore, it is manifestly intended that the embodiments be limited only by the claims and the equivalents thereof.