阅读说明：本技术 一种化学机械研磨的防溅罩 (Splash guard for chemical mechanical polishing ) 是由 刘永 于 2020-07-04 设计创作，主要内容包括：本发明公开了一种化学机械研磨的防溅罩,其设置在圆形板状的研磨平台四周；防溅罩本体包括圆环状的支撑座；支撑座与研磨平台两者的旋转中心轴共线设置；支撑座位于研磨平台的下侧；支撑座的上端面上成型有同轴设置的圆环槽状的下落槽；下落槽内设置有一对左右对称设置的扇环状的固定罩部；固定罩部的外圆柱面上圆周移动设置有扇环状的移动罩部；一对移动罩部同步移动设置；当一对移动罩部之间的开口与一对固定罩部之间的开口相对时,研磨头可从相对的开口中水平移出；一对移动罩部的角度和一对固定罩部的角度之和大于三百六十度。(The invention discloses a splash guard for chemical mechanical polishing, which is arranged around a circular plate-shaped polishing platform; the splash guard body comprises a circular supporting seat; the rotation central shafts of the supporting seat and the grinding platform are arranged in a collinear way; the supporting seat is positioned at the lower side of the grinding platform; the upper end surface of the supporting seat is formed with a coaxially arranged circular ring groove-shaped falling groove; a pair of fan-ring-shaped fixed cover parts which are symmetrically arranged left and right are arranged in the falling groove; a sector ring-shaped movable cover part is arranged on the outer cylindrical surface of the fixed cover part in a circumferential moving manner; the pair of movable cover parts are synchronously arranged; when the opening between the pair of movable cover parts is opposite to the opening between the pair of fixed cover parts, the grinding head can be horizontally moved out of the opposite opening; the sum of the angle of the pair of movable cover portions and the angle of the pair of fixed cover portions is greater than three hundred and sixty degrees.)

1. A splash guard for chemical mechanical polishing is arranged around a circular plate-shaped polishing platform (10); the method is characterized in that: the splash shield comprises a splash shield body (30); the splash guard body (30) comprises a circular supporting seat (31); the rotation central axes of the supporting seat (31) and the grinding platform (10) are arranged in a collinear way; the supporting seat (31) is positioned at the lower side of the grinding platform (10); a ring groove-shaped drop groove (310) which is coaxially arranged is formed on the upper end surface of the supporting seat (31); a pair of fan-ring-shaped fixed cover parts (32) which are arranged symmetrically left and right are arranged in the falling groove (310); a sector ring-shaped movable cover part (33) is arranged on the outer cylindrical surface of the fixed cover part (32) in a circumferential movement manner; a pair of movable cover parts (33) are synchronously arranged; when the opening between the pair of movable cover portions (33) is opposite to the opening between the pair of fixed cover portions (32), the polishing head (20) can be horizontally moved out of the opposite opening; the sum of the angles of the pair of movable cover parts (33) and the angle of the pair of fixed cover parts (32) is more than three hundred and sixty degrees; the upper end face of the grinding platform (10) is coplanar with the horizontal central planes of the movable cover part (33) and the fixed cover part (32).

2. A chemical mechanical polishing splash shield as claimed in claim 1, wherein: the inner cylindrical surface of the drop groove (310) has a diameter smaller than the diameter of the polishing platen (10).

3. A chemical mechanical polishing splash shield as claimed in claim 2, wherein: a circular water retaining ring (11) which is coaxially arranged is formed around the lower end face of the grinding platform (10); the water retaining ring (11) is positioned in the falling groove (310) and the lower end surface of the water retaining ring (11) is higher than the bottom surface of the falling groove (310); an annular upper water retaining ring (311) which is coaxially arranged is formed at the inner side end of the upper end surface of the supporting seat (31).

4. A chemical mechanical polishing splash guard according to any one of claims 1 to 3, wherein: a plurality of downpipes (312) which are uniformly distributed on the circumference are arranged on the bottom surface of the falling groove (310).

5. A chemical mechanical polishing splash shield as claimed in claim 1, wherein: an inner water retaining groove is formed on the inner cylindrical surface of the movable cover part (33); an outer water retaining groove is formed on the inner cylindrical surface of the fixed cover part (32); the cross sections of the inner water retaining groove and the outer water retaining groove are inner waist triangles with the middle parts facing outwards.

6. A chemical mechanical polishing splash shield as claimed in claim 1, wherein: a plurality of connecting rods (321) which are uniformly distributed on the circumference are formed on the bottom surface of the fixed cover part (32); the bottom of the connecting rod (321) is fixed on the bottom surface of the falling groove (310); a sector ring-shaped guide ring (332) which is coaxially arranged is formed on the lower end surface of the movable cover part (33); the guide ring (332) is positioned in the drop groove (310), the outer diameter of the guide ring (332) is the same as that of the drop groove (310), and the inner diameter of the guide ring is the same as that of the fixed cover part (32); a pair of driving support plates (313) which are uniformly distributed on the circumference are fixed on the support seat (31); a driving motor is fixed on the bottom surface of the driving support plate (313); a driving gear (34) is fixed at the upper end of an output shaft of the driving motor; an arc-shaped rack (331) which is coaxially arranged is formed at the lower end of the outer cylindrical surface of the movable cover part (33); the arc-shaped gear rack (331) is meshed with the driving gear (34) on the corresponding side.

Technical Field

The invention relates to the technical field of chemical mechanical polishing, in particular to a splash guard for chemical mechanical polishing.

Background

A Chemical Mechanical Polishing (CMP) process, also called a chemical mechanical planarization process or a chemical mechanical polishing process, is a mainstream polishing process at present, and is used for reducing the surface roughness of a wafer or thinning the wafer. The chemical mechanical polishing machine is at the in-process that carries out the grinding operation, and rotatory grinding platform can be thrown the waste liquid around the grinding platform from grinding platform's surface, contains a large amount of lapping liquid compositions in these waste liquids, consequently, can separate out a large amount of crystallisates after the waste liquid volatilizees, and these crystallisates not only lead to the fact the hindrance to each moving part on the chemical polishing machine, still can cause the corruption to metal part, influence the life of board.

In the prior art, a splash guard is additionally arranged around a grinding platform to prevent waste liquid from splashing on parts around the grinding platform, the splash guard is arranged around the grinding platform and is made of plastic, the splash guard is fixedly connected with three cylinders positioned in different directions, the connection mode adopts a mode that the cylinders are in point contact with the splash guard, when a grinding head is matched with the grinding platform to carry out grinding operation, the splash guard needs to be lifted under the driving of the cylinders so as to cover the grinding platform, and the waste liquid thrown out by the grinding platform in the grinding operation process can be received by the splash guard and then is discharged along the splash guard flowing to a water outlet; after the grinding operation is completed, the grinding head needs to rotate to the next stop point, and at the moment, the air cylinder drives the splash guard to descend below the grinding platform so as to avoid hindering the rotation of the grinding head. In this process, because the splatter shield is a whole, consequently to 3 cylinder driven synchronization requirements of driving the splatter shield very high, if arbitrary 1 cylinder leads to up-and-down velocity and other cylinders inconsistent because of the trouble, will lead to the splatter shield to receive to drag, leads to the cover body distortion, damages even. The deformed splash guard can extrude and pull the cylinder in turn, and the service life of the cylinder is shortened.

Disclosure of Invention

The invention aims to solve the technical problems that the existing splash guard is easy to deform and short in service life, and provides a splash guard for chemical mechanical grinding, which can effectively block liquid splashed by various working machines, prevent the splash guard from deforming, prolong the service life of the machines and save the replacement cost.

The technical scheme for solving the technical problems is as follows: a splash guard for chemical mechanical polishing is arranged around a circular plate-shaped polishing platform; the splash guard comprises a splash guard body; the splash guard body comprises a circular supporting seat; the rotation central shafts of the supporting seat and the grinding platform are arranged in a collinear way; the supporting seat is positioned at the lower side of the grinding platform; the upper end surface of the supporting seat is formed with a coaxially arranged circular ring groove-shaped falling groove; a pair of fan-ring-shaped fixed cover parts which are symmetrically arranged left and right are arranged in the falling groove; a sector ring-shaped movable cover part is arranged on the outer cylindrical surface of the fixed cover part in a circumferential moving manner; the pair of movable cover parts are synchronously arranged; when the opening between the pair of movable cover parts is opposite to the opening between the pair of fixed cover parts, the grinding head can be horizontally moved out of the opposite opening; the sum of the angles of the pair of movable cover parts and the angles of the pair of fixed cover parts is more than three hundred and sixty degrees; the upper end surface of the grinding platform is coplanar with the horizontal central surfaces of the movable cover part and the fixed cover part.

Preferably, the diameter of the inner cylindrical surface of the drop chute is smaller than the diameter of the polishing platen.

Preferably, a coaxially arranged annular water retaining ring is formed around the lower end face of the grinding platform; the water retaining ring is positioned in the falling groove, and the lower end surface of the water retaining ring is higher than the bottom surface of the falling groove; the inner end of the upper end surface of the supporting seat is provided with a ring-shaped upper water retaining ring which is coaxially arranged.

Preferably, the bottom surface of the falling groove is provided with a plurality of downpipes which are uniformly distributed on the circumference.

Preferably, an inner water retaining groove is formed on the inner cylindrical surface of the movable cover part; an outer water retaining groove is formed on the inner cylindrical surface of the fixed cover part; the cross sections of the inner water retaining groove and the outer water retaining groove are inner waist triangles with the middle parts facing outwards.

Preferably, a plurality of connecting rods which are uniformly distributed on the circumference are formed on the bottom surface of the fixed cover part; the bottom of the connecting rod is fixed on the bottom surface of the falling groove; a fan-ring-shaped guide ring which is coaxially arranged is formed on the lower end surface of the movable cover part; the guide ring is positioned in the falling groove, the outer diameter of the guide ring is the same as that of the falling groove, and the inner diameter of the guide ring is the same as that of the fixed cover part; a pair of driving support plates which are uniformly distributed on the circumference are fixed on the supporting seat; a driving motor is fixed on the bottom surface of the driving support plate; a driving gear is fixed at the upper end of an output shaft of the driving motor; the lower end of the outer cylindrical surface of the movable cover part is formed with an arc-shaped rack which is coaxially arranged; the arc-shaped rack is meshed with the driving gear on the corresponding side.

The invention has the beneficial effects that: the structure is simple, the grinding head can move in and out conveniently, the service life of the splash guard is long, and the effect is good; the grinding waste liquid is convenient to collect.

Drawings

FIG. 1 is a schematic top view of an opening of the present invention;

FIG. 2 is a schematic structural view of the cross section A-A of FIG. 1 according to the present invention;

FIG. 3 is a schematic top view of the present invention in normal operation;

in the figure, 10, the polishing platen; 11. a water retaining ring; 20. a grinding head; 30. a splash guard body; 31. a supporting seat; 310. a dropping groove is formed; 311. an upper water retaining ring; 312. a downpipe; 313. a drive support plate; 32. a fixed cover part; 321. a connecting rod; 33. a movable cover part; 331. an arc-shaped rack; 332. a guide ring; 34. the gears are driven.

Detailed Description

As shown in fig. 1 to 3, a splash guard for chemical mechanical polishing is provided around a circular plate-shaped polishing platen 10; the splash shield includes a splash shield body 30; the splash guard body 30 comprises a circular support base 31; the rotation central axes of the supporting seat 31 and the grinding platform 10 are arranged in a collinear way; the supporting seat 31 is located at the lower side of the grinding platform 10; a drop groove 310 in the shape of a circular groove is coaxially formed on the upper end surface of the support seat 31; a pair of fan-ring-shaped fixed cover parts 32 which are arranged symmetrically left and right are arranged in the falling groove 310; a fan-ring-shaped movable cover part 33 is arranged on the outer cylindrical surface of the fixed cover part 32 in a circumferential movement manner; the pair of movable cover parts 33 are synchronously moved; when the opening between the pair of movable cover portions 33 is opposed to the opening between the pair of fixed cover portions 32, the polishing head 20 can be horizontally moved out of the opposed openings; the sum of the angles of the pair of movable hood portions 33 and the angles of the pair of fixed hood portions 32 is greater than three hundred sixty degrees; the upper end surface of the polishing table 10 is coplanar with the horizontal center surfaces of the movable hood section 33 and the fixed hood section 32.

As shown in fig. 2, the inner cylindrical surface of the drop chute 310 has a diameter smaller than that of the polishing platform 10.

As shown in fig. 2, a coaxially arranged annular water retaining ring 11 is formed around the lower end surface of the grinding platform 10; the water retaining ring 11 is positioned in the drop groove 310 and the lower end surface of the water retaining ring 11 is higher than the bottom surface of the drop groove 310; an upper water retaining ring 311 of a ring shape is coaxially formed at the inner end of the upper end surface of the support base 31.

As shown in fig. 2, a plurality of downpipes 312 are disposed on the bottom surface of the dropping chute 310 and are uniformly distributed circumferentially.

As shown in fig. 2, an inner water blocking groove is formed on the inner cylindrical surface of the movable hood portion 33; an outer water retaining groove is formed on the inner cylindrical surface of the fixed hood part 32; the cross sections of the inner water retaining groove and the outer water retaining groove are inner waist triangles with the middle parts facing outwards.

As shown in fig. 1 to 3, a plurality of connecting rods 321 with uniformly distributed circumference are formed on the bottom surface of the fixed cover part 32; the bottom of the connecting rod 321 is fixed on the bottom surface of the drop groove 310; a fan-ring-shaped guide ring 332 coaxially arranged is formed on the lower end surface of the movable cover part 33; the guide ring 332 is located in the drop slot 310 and the guide ring 332 has the same outer diameter as the drop slot 310 and the same inner diameter as the fixed hood portion 32; a pair of driving support plates 313 which are uniformly distributed on the circumference are fixed on the support seat 31; a driving motor is fixed on the bottom surface of the driving support plate 313; a driving gear 34 is fixed at the upper end of an output shaft of the driving motor; an arc-shaped rack 331 which is coaxially arranged is formed at the lower end of the outer cylindrical surface of the movable cover part 33; the arc-shaped rack 331 is engaged with the driving gear 34 of the corresponding side.

The working principle of the splash guard of the chemical mechanical grinding;

as shown in fig. 3 in normal operation, the pair of movable hood parts 33 are located at front and rear positions to block front and rear openings of the pair of fixed hood parts 32, so that waste grinding fluid splashed from the grinding platform 10 in a rotating state is blocked by the pair of movable hood parts 33 and the pair of fixed hood parts 32, so that a splash-proof effect is good, and simultaneously, because the openings are opened by synchronously rotating the pair of movable hood parts 33 to allow the grinding head 20 to horizontally move in and out, problems encountered by the splash-proof hood in the lifting process cannot occur, so that the service life of the splash-proof hood is long; since the stopped waste grinding fluid eventually drops into the drop tank 310, the waste grinding fluid is collected conveniently.

The above description is only a preferred embodiment of the present invention, and for those skilled in the art, the present invention should not be limited by the description herein, since various changes and modifications can be made in the details of the embodiment and the application range according to the spirit of the present invention.