阅读说明：本技术 一种cvd工艺用金属基座的导向孔损伤修复方法 (Method for repairing damage of guide hole of metal base for CVD (chemical vapor deposition) process ) 是由 高圣根 朱东海 于 2020-07-17 设计创作，主要内容包括：本发明公开了一种CVD工艺用金属基座的导向孔损伤修复方法,在金属基座需要修复的部位加工出替换的通孔,加工出匹配的插入件,插入件先在低温下收缩插入通孔,后在常温下膨胀与通孔的内壁形成过盈配合,完成与金属基座的组装。本发明使得插入件与金属基座完美相结合,不会发生松动、脱落；且材料相同,无缝隙,导热均匀；修复过程中不产生大量的热量,不会对金属基座的表面造成灼伤和污染；组装后进行阳极氧化处理,耐腐蚀性更加均匀,从而达到了修复受损金属基座,使其得到再次使用,增加使用寿命,节约成本的目的。(The invention discloses a method for repairing damage of a guide hole of a metal base for a CVD (chemical vapor deposition) process, which is characterized in that a replaced through hole is processed at a part of the metal base to be repaired, a matched insert is processed, the insert is contracted and inserted into the through hole at a low temperature and then expanded at normal temperature to form interference fit with the inner wall of the through hole, and the assembly with the metal base is completed. The invention enables the insert and the metal base to be perfectly combined, and looseness and falling cannot occur; the materials are the same, no gap exists, and heat conduction is uniform; a large amount of heat is not generated in the repairing process, and the surface of the metal base is not burnt and polluted; after the metal base is assembled, anodic oxidation treatment is carried out, and the corrosion resistance is more uniform, so that the aims of repairing the damaged metal base, reusing the damaged metal base, prolonging the service life and saving the cost are fulfilled.)

1. A method for repairing damage of a guide hole of a metal base for a CVD (chemical vapor deposition) process is characterized by comprising the following steps: the method specifically comprises the following steps:

(1) cutting a through hole which is concentric with the damaged guide hole and has an inner diameter larger than that of the damaged guide hole in the damaged guide hole area on the metal base, and replacing the damaged guide hole;

(2) machining an insert which is made of the same material as the metal base, has the same shape as the through hole in the step (1) and has an inner diameter larger than the inner diameter of the through hole, and machining an inner hole which is concentric with the insert and has the same shape and inner diameter as the guide hole on the insert;

(3) placing the insert processed in the step (2) in a low-temperature environment for cooling and shrinking for a period of time;

(4) rapidly inserting the insert cooled and shrunk in the step (3) into the through hole machined in the step (1);

(5) and (3) placing the metal base inserted with the insert in the step (4) in a normal temperature environment for standing, wherein the insert expands at normal temperature and finally forms interference fit with the inner wall of the through hole, so that the metal base is assembled.

2. The method according to claim 1, wherein the method comprises the steps of: in the step (1), the inner diameter of the through hole is 21.995-22.005 mm.

3. The method according to claim 2, wherein the method comprises the steps of: in the step (2), the outer diameter of the insert is 22.06-22.07 mm.

4. The method according to claim 3, wherein the method comprises the steps of: the tolerance of the inner diameter of the insert and the through hole is 0.055-0.075 mm.

5. The method according to claim 4, wherein the method comprises the steps of: the insert should have a radial shrinkage greater than 0.075 mm.

6. The method according to claim 1, wherein the method comprises the steps of: in the step (3), the low-temperature environment is a liquid nitrogen environment.

7. The method according to claim 1, wherein the method comprises the steps of: in the step (3), the cooling shrinkage time of the insert in the low-temperature environment is more than 4 minutes.

8. The method according to claim 7, wherein the method comprises the steps of: the cooling shrinkage time is 7-8 minutes.

9. The method according to claim 1, wherein the method comprises the steps of: in the step (4), the time for inserting the insert into the through hole is less than 30 seconds.

10. The method according to claim 1, wherein the method comprises the steps of: in the step (5), after the insert and the metal base are assembled, anodic oxidation treatment is required.

Technical Field

The invention relates to the technical field of CVD (chemical vapor deposition) processes applied to semiconductor and LCD/OLED (liquid crystal display/organic light emitting diode) production, in particular to a method for repairing damage of a guide hole of a metal base for the CVD processes.

Background

Metal susceptors (aluminum parts) are widely used in industrial processes, especially in the field of semiconductor and LCD/OLED manufacturing, and it is often necessary to perform a CVD (plasma chemical vapor deposition) process on a glass substrate, and this process generally requires a heating device built in the metal susceptor to provide a certain amount of heat to meet the temperature conditions required for performing the CVD (plasma chemical vapor deposition) process.

The CVD (plasma chemical vapor deposition) process is carried out by activating reaction gas with plasma to promote chemical reaction on the surface or near-surface space of the substrate to produce a solid film. Under the action of high-frequency or direct-current electric field, the source gas is ionized to form plasma, low-temperature plasma is used as an energy source, a proper amount of reaction gas is introduced, and the plasma discharge is utilized to activate the reaction gas and realize chemical vapor deposition.

In order to meet the requirement of a CVD (plasma chemical vapor deposition) process, a glass substrate generally needs to be lifted, and in some occasions, the glass substrate needs to be inclined at a certain angle. In the long-time working process, particularly in the process that the glass substrate deflects and inclines, the support rod generates frequent friction and collision with the hole wall and the port of the guide hole; in addition, due to the corrosion of the gas used in the CVD (plasma chemical vapor deposition) process, damages such as damage, cracks, depressions, etc. are generated on the hole wall and the port of the pilot hole, and the hole wall and the port of the pilot hole need to be periodically repaired, so as to achieve the purposes of recycling, prolonging the service life, saving the cost, etc.

At present, the adopted repair method is to process a through hole with larger inner diameter around the damaged guide hole, process a replacement part containing an inner hole with the same shape and inner diameter as the original guide hole, and insert the replacement part into the through hole; in order to ensure normal insertion, the outer diameter of the replacement part is generally smaller than the inner diameter of the through hole, so that a gap is formed between the inserted replacement part and the inner wall of the through hole; and then, the replacement part is connected with the metal base by adopting a welding mode at two ends of the gap.

The repair method has the following defects or disadvantages:

1. because the metal base needs heat conduction in the process, and a gap still exists at the joint part of the replacement part and the through hole, so that the heat conductivity coefficient of the metal base body and the heat conductivity coefficient of the metal base body are different, and uneven heat conduction of the metal base can be caused.

2. Because the metal base body (aluminium) is different with the material of welding position (tin), and expend with heat and contract with cold coefficient is different, in long-time use, through expend with heat and contract with cold for it is insecure and takes place not hard up, even takes place to drop to replace the piece and metal base is connected.

3. A large amount of heat generated during the welding operation easily burns the surface of the metal base, blackens the surface of the metal base, and contaminates the metal base, and the formed weld needs to be removed, requiring an additional process.

4. In the long-term use process, an oxide film (protective film) formed on a welding part by anodic oxidation treatment is easy to fade, so that not only the corrosion resistance cannot be enhanced, but also the corrosion resistance may be reduced, and a new problem needs to be solved.

Disclosure of Invention

The invention aims to overcome the defects and shortcomings of the prior art and provide a method for repairing the damage of a guide hole of a metal base for a CVD (chemical vapor deposition) process, wherein a replaced through hole is processed at the part of the metal base to be repaired, and a matched insert is processed; the defects of uneven heat conduction, looseness, falling, pollution to a metal base and influence on corrosion resistance caused by replacing a damaged part by adopting a welding mode are avoided or prevented, so that the purposes of repairing the damaged metal base, reusing the damaged metal base, prolonging the service life and saving the cost are achieved.

In order to achieve the purpose, the invention provides the following technical scheme:

1. a method for repairing damage of a guide hole of a metal base for a CVD (chemical vapor deposition) process is characterized by comprising the following steps: the method specifically comprises the following steps:

(1) cutting a through hole which is concentric with the damaged guide hole and has an inner diameter larger than that of the damaged guide hole in the damaged guide hole area on the metal base, and replacing the damaged guide hole;

(2) machining an insert which is made of the same material as the metal base, has the same shape as the through hole in the step (1) and has an inner diameter larger than the inner diameter of the through hole, and machining an inner hole which is concentric with the insert and has the same shape and inner diameter as the guide hole on the insert;

(3) placing the insert processed in the step (2) in a low-temperature environment for cooling and shrinking for a period of time;

(4) rapidly inserting the insert cooled and shrunk in the step (3) into the through hole machined in the step (1);

(5) and (3) placing the metal base inserted with the insert in the step (4) in a normal temperature environment for standing, wherein the insert expands at normal temperature and finally forms interference fit with the inner wall of the through hole, so that the metal base is assembled.

Further, in the step (1), the inner diameter of the through hole is 21.995-22.005 mm.

Further, in the step (2), the outer diameter of the insert is 22.06-22.07 mm.

Further, the tolerance of the inner diameter of the insert and the through hole is 0.055-0.075 mm.

Further, the radial shrinkage of the insert is required to be greater than 0.075 mm.

Further, in the step (3), the low-temperature environment is a liquid nitrogen environment.

Further, in the step (3), the cooling shrinkage time of the insert in the low-temperature environment is more than 4 minutes.

Further, the cooling shrinkage time is 7-8 minutes.

Further, in the step (4), the time for inserting the insert into the through hole is less than 30 seconds.

Further, in the step (5), after the insert is assembled with the metal base, an anodic oxidation treatment is required.

Compared with the prior art, the invention has the beneficial effects that:

the invention processes a replacement through hole at the part of the metal base needing to be repaired, processes a matched insert, firstly shrinks at low temperature and inserts into the through hole, then expands at normal temperature and forms interference fit with the inner wall of the through hole, and completes the assembly with the metal base; the insert and the metal base are perfectly combined, and loosening and falling cannot occur; the materials are the same, no gap exists, and heat conduction is uniform; a large amount of heat is not generated in the repairing process, and the surface of the metal base is not burnt and polluted; after the metal base is assembled, anodic oxidation treatment is carried out, and the corrosion resistance is more uniform, so that the aims of repairing the damaged metal base, reusing the damaged metal base, prolonging the service life and saving the cost are fulfilled.

Drawings

FIG. 1 is a flow chart of an embodiment of the invention.

Detailed Description

The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.