阅读说明：本技术 脉冲阴极电弧沉积 (Pulsed cathodic arc deposition ) 是由 尤卡·科莱赫迈宁 于 2020-02-10 设计创作，主要内容包括：一种用于将材料以阴极电弧沉积到物体上的组件。该组件包括旋转靶和用于接纳待涂覆物体的腔室。可旋转靶具有喷射等离子体材料的表面。阳极环位于距可旋转靶表面的第一距离处。阳极环具有带有中心轴线的开口,该中心轴线平行于可旋转靶的旋转轴线且相对于旋转轴线以第二距离错开布置。火花装置设置在该腔室内,用于在可旋转靶的表面产生电弧。该组件被配置用于将从靶表面射出的带电粒子流经由阳极环的开口引导至待涂覆物体。(An assembly for cathodic arc deposition of material onto an object. The assembly includes a rotating target and a chamber for receiving an object to be coated. The rotatable target has a surface from which plasma material is ejected. The anode ring is located at a first distance from the surface of the rotatable target. The anode ring has an opening with a central axis parallel to the axis of rotation of the rotatable target and offset from the axis of rotation by a second distance. A spark arrangement is disposed within the chamber for generating an arc at the surface of the rotatable target. The assembly is configured to direct a stream of charged particles emitted from the target surface to an object to be coated via the opening of the anode ring.)