阅读说明：本技术 一种适用于钒渣连续浸出的射流反应装置 (Jet reaction device suitable for vanadium slag is leached in succession ) 是由 彭宏亮 彭毅 申彪 于 2021-04-15 设计创作，主要内容包括：本发明公开一种适用于钒渣连续浸出的射流反应装置,包括喷嘴、一级射流器和二级射流器,喷嘴插接于一级射流器的入口位置,一级射流器的出口插接于二级射流器的入口位置,一级射流器上设有用于输送钒渣熟料的第一吸入管,二级射流器上设有用于输送浸出剂的第二吸入管,喷嘴向一级射流器内部喷射硫酸,一级射流器内部形成负压,第一吸入管向一级射流器内部输送氧化钒颗粒物,钒渣熟料和硫酸在一级射流器进行高强度搅拌,一级射流器的出口向二级射流器内部喷射,二级射流器内部形成负压,第二吸入管向二级射流器内部输送浸出剂,浸出剂和一级射流器喷射的混合物进行高强度搅拌,通过射流器替换立式搅拌罐,避免搅拌盲区,搅拌强度高、效果好。(The invention discloses a jet reaction device suitable for continuously leaching vanadium slag, which comprises a nozzle, a primary ejector and a secondary ejector, wherein the nozzle is inserted at the inlet position of the primary ejector, the outlet of the primary ejector is inserted at the inlet position of the secondary ejector, the primary ejector is provided with a first suction pipe used for conveying vanadium slag clinker, the secondary ejector is provided with a second suction pipe used for conveying leaching agent, the nozzle sprays sulfuric acid into the primary ejector, negative pressure is formed inside the primary ejector, the first suction pipe conveys vanadium oxide particulate matters into the primary ejector, the vanadium slag clinker and the sulfuric acid are stirred at high intensity in the primary ejector, the outlet of the primary ejector sprays into the secondary ejector, negative pressure is formed inside the secondary ejector, the second suction pipe conveys the leaching agent into the secondary ejector, and the mixture sprayed by the leaching agent and the primary ejector is stirred at high intensity, the vertical stirring tank is replaced by the ejector, so that a stirring blind area is avoided, and the stirring intensity is high and the effect is good.)

1. The jet reaction device is characterized by comprising a nozzle, a primary ejector and a secondary ejector, wherein the nozzle is inserted into the inlet of the primary ejector, the outlet of the primary ejector is inserted into the inlet of the secondary ejector, the primary ejector is provided with a first suction pipe for conveying vanadium slag clinker, and the secondary ejector is provided with a second suction pipe for conveying leaching agent.

2. The fluidic reaction device of claim 1, wherein a screw feeder is mounted at the first suction pipe.

3. The fluidic reaction device of claim 2, wherein an electric valve is installed at the second suction pipe.

4. The fluidic reaction device of claim 3, wherein the inlet locations of the primary and secondary ejectors are lined with a ceramic layer.

5. The fluidic reaction device of claim 4, wherein the nozzles and throats of the primary ejector and the secondary ejector are quartz glass tubes.

6. The fluidic reaction device of claim 1, further comprising a sulfuric acid pump in communication with said nozzle and a vertical acid dispensing tank connected to said sulfuric acid pump.

7. The jet reaction device according to claim 6, wherein the number of the vertical acid preparation tanks is at least 1, and each vertical acid preparation tank is respectively communicated with the sulfuric acid pump.

8. The jet flow reaction device as claimed in claim 7, wherein a control valve is arranged on the vertical acid preparation tank.

Technical Field

The invention relates to the technical field of vanadium chemical industry, in particular to a jet reaction device suitable for continuous leaching of vanadium slag.

Background

The leaching process in the vanadium oxide clean production process refers to a process of stirring and reacting vanadium slag roasting clinker and sulfuric acid in a leaching tank to obtain a leaching solution. The leaching process is divided into two reaction stages, the fast reaction stage requires 80% acid addition at 1/4 time and requires vigorous stirring.

The existing leaching device is a vertical stirring tank, can only produce one tank by one tank, cannot form continuous material flow, and is unstable in production process. Because vanadium slag is hard particles and strongly washes stirring blades, a leaching tank has more faults, and a certain stirring blind area exists below the blades of the vertical stirring tank, so that vanadium oxide and sulfuric acid are not sufficiently mixed, when the stirring blind area accumulates too much vanadium oxide, the situation that the mixture of vanadium oxide and sulfuric acid is cut off can occur, especially in the next belt type filtering process, once the vanadium oxide is cut off, a filter cake cannot be formed, the filtering function is very difficult to recover, and the production is often interrupted; meanwhile, because the volume of the vertical stirring tank is large, the mass transfer is slow, the pH on-line monitoring and the acid adding amount control are seriously delayed, when the pH value reaches a limit value, the acid adding amount exceeds the standard, the reaction process is difficult to control, and the leaching rate is influenced.

Therefore, how to solve the problems of insufficient stirring and slow mass transfer of the existing vertical stirring tank is a technical problem to be solved urgently by the technical personnel in the field.

Disclosure of Invention

The invention aims to provide a jet flow reaction device suitable for continuously leaching vanadium slag, which replaces a vertical stirring tank with a jet device to fully stir vanadium slag clinker and sulfuric acid and has the advantage of high mass transfer speed.

In order to solve the technical problem, the invention provides a jet reaction device suitable for continuous leaching of vanadium slag, which comprises a nozzle, a primary ejector and a secondary ejector, wherein the nozzle is inserted into the inlet of the primary ejector, the outlet of the primary ejector is inserted into the inlet of the secondary ejector, the primary ejector is provided with a first suction pipe used for conveying vanadium slag clinker, and the secondary ejector is provided with a second suction pipe used for conveying leaching agent.

Preferably, a screw feeder is installed at the first suction pipe.

Preferably, an electric valve is installed at the second suction pipe.

Preferably, the inlet positions of the primary ejector and the secondary ejector are lined with ceramic layers.

Preferably, the nozzles and throats of the primary ejector and the secondary ejector are quartz glass tubes.

Preferably, the device also comprises a sulfuric acid pump communicated with the nozzle and a vertical acid preparation tank connected with the sulfuric acid pump.

Preferably, the number of the vertical acid preparation tanks is at least 1, and each vertical acid preparation tank is respectively communicated with the sulfuric acid pump.

Preferably, the vertical acid preparation tank is provided with a control valve.

The jet reaction device suitable for continuous leaching of vanadium slag comprises a nozzle, a primary ejector and a secondary ejector, wherein the nozzle is inserted into the inlet of the primary ejector, the outlet of the primary ejector is inserted into the inlet of the secondary ejector, the primary ejector is provided with a first suction pipe used for conveying vanadium slag clinker, and the secondary ejector is provided with a second suction pipe used for conveying leaching agent; the nozzle sprays sulfuric acid into the primary ejector at a constant speed to enable negative pressure to be formed inside the primary ejector, at the moment, a first suction pipe arranged on the primary ejector is influenced by the negative pressure inside the primary ejector, vanadium oxide particles are conveyed into the primary ejector, vanadium slag clinker and sulfuric acid are stirred at a high strength in a diffusion pipe of the primary ejector, a mixture of the vanadium slag clinker and the sulfuric acid is sprayed into the secondary ejector through an outlet of the primary ejector to enable negative pressure to be formed inside the secondary ejector, at the moment, a second suction pipe arranged on the secondary ejector is influenced by the negative pressure inside the secondary ejector, a leaching agent is conveyed into the secondary ejector, the leaching agent and the mixture sprayed by the primary ejector are stirred at a high strength, and finally, the secondary ejector conveys the mixture to the next slow reaction process; through ejector replacement vertical agitator tank, avoid appearing the stirring blind area, have the advantage that stirring effect is good.

Drawings

In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the description of the embodiments or the prior art will be briefly described below, it is obvious that the drawings in the following description are only embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to the provided drawings without creative efforts.

Fig. 1 is a schematic overall structure diagram of an embodiment of the present invention.

Wherein, in fig. 1:

the device comprises a nozzle-1, a primary ejector-2, a secondary ejector-3, a first suction pipe-4, a second suction pipe-5, a screw feeder-6, an electric valve-7, a sulfuric acid pump-8, a vertical acid preparation tank-9 and a control valve-10.

Detailed Description

The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.

Referring to fig. 1, fig. 1 is a schematic overall structure diagram of an embodiment of the present invention.

In a specific embodiment provided by the invention, the vanadium slag clinker leaching device mainly comprises a nozzle 1, a primary ejector 2 and a secondary ejector 3, wherein the nozzle 1 is inserted into the inlet of the primary ejector 2, the outlet of the primary ejector 2 is inserted into the inlet of the secondary ejector 3, the primary ejector 2 is provided with a first suction pipe 4 for conveying vanadium slag clinker, and the secondary ejector 3 is provided with a second suction pipe 5 for conveying leaching agent.

Wherein, nozzle 1 is used for spraying sulphuric acid, one-level ejector 2 is used for forming the sulphuric acid that nozzle 1 sprays and efflux in the sulphuric acid and form the negative pressure in one-level ejector 2 is inside, first suction pipe 4 is used for carrying the vanadium oxide to one-level ejector 2 is inside when one-level ejector 2 is inside to form the negative pressure, one-level ejector 2 is the jet orifice of second grade ejector 3 simultaneously, second grade ejector 3 is used for forming the efflux in the mixture that one-level ejector 2 sprays to form the negative pressure in second grade ejector 3 is inside, second suction pipe 5 is used for when forming the negative pressure in second grade ejector 3 is inside, carry the leaching agent to second grade ejector 3.

Specifically, in the actual application process, the nozzle 1 sprays sulfuric acid into the primary ejector 2 at a constant speed to form negative pressure inside the primary ejector 2, at this time, the first suction pipe 4 arranged on the primary ejector 2 is influenced by the negative pressure inside the primary ejector 2 to convey vanadium oxide particles into the primary ejector 2, so that vanadium slag clinker and sulfuric acid are stirred at high intensity in the diffusion pipe of the primary ejector 2, the mixture of the vanadium slag clinker and the sulfuric acid is sprayed into the secondary ejector 3 through the outlet of the primary ejector 2 to form negative pressure inside the secondary ejector 3, at this time, the second suction pipe 5 arranged on the secondary ejector 3 is influenced by the negative pressure inside the secondary ejector 3 to convey leaching agent into the secondary ejector 3, and the mixture sprayed from the leaching agent and the primary ejector 2 is stirred at high intensity, finally, the secondary ejector 3 conveys the mixture to the next slow reaction process.

It should be noted that, the linear velocities of the whole flow fields in the first-stage ejector 2 and the second-stage ejector 3 are almost the same, the jet velocity is very high, and the jet stirring intensity is much higher than the mechanical stirring intensity under the condition of the same power, so that the first-stage ejector 2 and the second-stage ejector 3 are uniformly diffused and stirred, no obvious low-velocity region exists, and the phenomenon that the pipeline is blocked by solid settlement is avoided.

It should be noted that the screw feeder 6 is installed at the first suction pipe 4, and the screw feeder 6 is used for conveying the vanadium slag clinker to the primary ejector 2 through the first suction pipe 4, and can provide dry and small-particle vanadium slag clinker for the primary ejector 2, so that the vanadium slag clinker and the sulfuric acid are mixed more uniformly; the screw feeder 6 conveys the dried vanadium slag particles instead of wet slag, and the active ingredients of the dilute sulphuric acid are easier to be directly siphoned by micropores in the slag to go deep into the vanadium slag. The reaction kinetic conditions are superior to the original process.

Further, an electric valve 7 is installed at the second suction pipe 5, the electric valve 7 is used for controlling the delivery amount of the leaching agent, when the first-stage ejector 2 sprays the mixed liquid to the second-stage ejector 3, the electric valve 7 is opened to deliver the leaching agent to the second-stage ejector 3, so that the mixed liquid sprayed from the first-stage ejector 2 to the second-stage ejector 3 and the leaching agent are fully mixed and stirred.

In order to overcome the problem that the common ejector cannot be compatible with acid resistance and wear resistance, the inlets of the first-stage ejector 2 and the second-stage ejector 3 are lined with ceramic layers, throats of the first-stage ejector 2 and the second-stage ejector 3 are both glass tubes, pipelines between the sulfuric acid pump 8 and the throats are lined with ceramic, and throats and nozzles of the first-stage ejector 2 and the second-stage ejector 3 are made of glass, so that the ceramic jet ejector is resistant to acid corrosion and alkali corrosion, high in hardness, resistant to scouring and wear, capable of continuously working for a long time and free of maintenance; because the leaching reaction is an exothermic reaction, the process temperature is about 100 ℃, and the quartz glass can bear the heat; moreover, the working condition in the jet reactor can be visually observed.

Similarly, the nozzle 1 is a glass tube, so that the corrosion effect of sulfuric acid on the nozzle 1 when the nozzle 1 sprays sulfuric acid can be reduced, and the service life of the nozzle 1 can be prolonged.

Further, the jet reaction device also comprises a sulfuric acid pump 8 communicated with the nozzle 1 and a vertical acid preparation tank 9 connected with the sulfuric acid pump 8; the number of the vertical acid preparation tanks 9 is at least 1, each vertical acid preparation tank 9 is respectively communicated with the sulfuric acid pump 8, the vertical acid preparation tanks 9 are set to be 2 in the embodiment, wherein 2 vertical acid preparation tanks 9 are dilute sulfuric acid preparation tanks, the two tanks are alternately used for preparing acid, and the dilute sulfuric acid is alternately supplied to the sulfuric acid pump 8, so that the dilute sulfuric acid can be continuously jetted into a throat pipe of the first-stage ejector 2 through the nozzles 1 of the first-stage ejector 2 by the sulfuric acid pump 8, the 2 vertical acid preparation tanks 9 are alternately used, the condition that the sulfuric acid supply of one vertical acid preparation tank 9 is insufficient is avoided, and the efficiency of the leaching process is ensured.

It should be noted that the vertical acid preparation tank 9 is provided with a control valve 10, the control valve 10 is used for controlling sulfuric acid in the vertical acid preparation tank 9, and the system performs automatic control, so that the working efficiency of the jet reaction device is higher.

In summary, the jet reaction device suitable for continuous leaching of vanadium slag provided by this embodiment mainly includes a nozzle, a primary ejector and a secondary ejector, the nozzle is inserted into the inlet of the primary ejector, the outlet of the primary ejector is inserted into the inlet of the secondary ejector, the primary ejector is provided with a first suction pipe for conveying vanadium slag clinker, the secondary ejector is provided with a second suction pipe for conveying leaching agent, the nozzle sprays sulfuric acid into the primary ejector at a constant speed, so that a negative pressure is formed inside the primary ejector, at this time, the first suction pipe arranged on the primary ejector is influenced by the negative pressure inside the primary ejector, so as to convey vanadium oxide particles into the primary ejector, so that the vanadium clinker and sulfuric acid are stirred at a high strength in the diffusion pipe of the primary ejector, and the mixture of the vanadium slag clinker and sulfuric acid is sprayed into the secondary ejector through the outlet of the primary ejector, make the inside negative pressure that forms of second grade ejector, at this moment, set up the second suction pipe on the second grade ejector and receive the inside negative pressure's of second grade ejector influence, carry the leaching agent to second grade ejector inside to carry out the high intensity stirring with the mixture that leaching agent and first-order ejector sprayed, at last, second grade ejector 3 carries the mixture to next slow reaction process.

The previous description of the disclosed embodiments is provided to enable any person skilled in the art to make or use the present invention. Various modifications to these embodiments will be readily apparent to those skilled in the art, and the generic principles defined herein may be applied to other embodiments without departing from the spirit or scope of the invention. Thus, the present invention is not intended to be limited to the embodiments shown herein but is to be accorded the widest scope consistent with the principles and novel features disclosed herein.