阅读说明：本技术 一种高能电子束源控制系统、方法、装置、零件制作方法 (High-energy electron beam source control system, method and device and part manufacturing method ) 是由 张佳 铁维昊 邓伟锋 何宏伟 付恒 魏莹 于 2020-04-10 设计创作，主要内容包括：本发明属于脉冲功率、太赫兹电子束源技术领域,公开了一种高能电子束源控制系统、方法、装置、零件制作方法,采用伪火花放电脉冲用于驱动伪火花间隙放电,产生高能电子束；获得高能电子束之后,电子束后加速脉冲用于后加速间隙加速电子束,提高电子束能量。包括伪火花放电脉冲、伪火花放电间隙、电子束后加速脉冲三部分,伪火花间隙由空心阴极、中间电极、阳极、后加速间隙和绝缘外壳构成,且各个电极中心有小孔,孔径1-3mm与间隙距离、电极板厚度相等；伪火花间隙伪火花间隙构成一个密封腔体,腔体内气压100Pa一下。本发明可以利用在伪火花放电间隙较小尺寸的情况下获得较高的电子束能量。(The invention belongs to the technical field of pulse power and terahertz electron beam sources, and discloses a high-energy electron beam source control system, method, device and part manufacturing method.A pseudo spark discharge pulse is used for driving a pseudo spark gap to discharge to generate a high-energy electron beam; after obtaining the high-energy electron beam, the post-electron-beam acceleration pulse is used for accelerating the electron beam by the post-acceleration gap, so that the energy of the electron beam is improved. The device comprises a pseudo spark discharge pulse, a pseudo spark discharge gap and an electron beam rear acceleration pulse, wherein the pseudo spark gap is composed of a hollow cathode, a middle electrode, an anode, a rear acceleration gap and an insulating shell, a small hole is formed in the center of each electrode, and the hole diameter is 1-3mm and is equal to the gap distance and the thickness of an electrode plate; the pseudo spark gap forms a sealed cavity, and the air pressure in the cavity is 100 Pa. The invention can utilize the fact that a higher electron beam energy is obtained with a smaller size of the pseudo spark discharge gap.)

1. The high-energy electron beam source control method is characterized in that a pseudo spark discharge pulse is adopted for driving a pseudo spark gap to discharge so as to generate a high-energy electron beam; after obtaining the high-energy electron beam, the post-electron-beam acceleration pulse is used for accelerating the electron beam by the post-acceleration gap, so that the energy of the electron beam is improved.

2. The high energy electron beam source control method according to claim 1, wherein the high energy electron beam source control method comprises:

the method comprises the following steps that firstly, a pseudo spark discharge nanosecond pulse source outputs negative polarity pulses, the negative polarity pulses act on a hollow cathode of a pseudo spark gap through a high-voltage lead, and an anode is grounded;

secondly, after the pulse voltage acts on the hollow cathode, a higher electric field is generated in the pseudo spark gap;

thirdly, the ionization wave develops from the hollow cathode to the anode, a high-energy electron beam is detected outside a small hole of the anode, and the high-energy electron beam enters a rear acceleration gap; meanwhile, the post-acceleration pulse voltage of the post-acceleration pulse source acts on the post-acceleration gap to accelerate the electron beam, so that the energy of the electron beam is improved.

3. The high-energy electron beam source control method according to claim 1, wherein the high-energy electron beam source control method is characterized in that the pseudo spark discharge nanosecond pulse source outputs negative polarity pulses, the negative polarity pulses act on a hollow cathode of a pseudo spark gap through a high-voltage wire, and an anode is grounded; after the pulse voltage is applied to the hollow cathode, a higher electric field is generated in the pseudo spark gap, initial electrons of pseudo spark discharge run along a longer path, and the discharge is concentrated near the small hole of the electrode.

4. The high energy electron beam source control method according to claim 1, wherein the pseudo spark discharge voltage driven by the pseudo spark discharge nanosecond pulse source is a high voltage direct current voltage.

5. A high energy electron beam source control system for implementing the method of any one of claims 1 to 4, wherein the high energy electron beam source control system comprises:

the pseudo spark discharge pulse power supply module is used for driving the pseudo spark gap to discharge to generate high-energy electron beams;

the pseudo spark discharge gap module is used for realizing electron beam discharge;

and the post acceleration pulse power supply module is used for accelerating the electron beam in the post acceleration gap and improving the energy of the electron beam.

6. An apparatus for generating and controlling a high energy electron beam source carrying the system for controlling a high energy electron beam source as claimed in claim 5, wherein the apparatus for generating and controlling a high energy electron beam source comprises: the device comprises a hollow cathode, an anode, a rear acceleration gap, a pseudo spark discharge nanosecond pulse source and an electron beam acceleration pulse source;

the hollow cathode is connected with the middle gap, the middle gap is connected with the anode to form a pseudo spark gap, the anode is connected with the rear acceleration gap, the pseudo spark discharge nanosecond pulse source is connected with the hollow cathode, and the acceleration pulse source is connected with the rear acceleration gap through a high-voltage wire after the electron beam.

7. The high energy electron beam source control device according to claim 6, wherein said pseudo spark gap comprises a hollow cathode, an intermediate electrode, an anode, a rear acceleration gap, and an insulating housing;

the hollow cathode is connected with the middle electrode, the middle electrode is connected with the anode to form a pseudo spark gap, the anode is connected with the rear acceleration gap, and an insulating shell is arranged between each electrode.

8. A high energy electron beam source control device according to claim 6, wherein said dummy spark gap is formed as a sealed chamber having a gas pressure of 100 Pa.

9. The high energy electron beam source control device according to claim 6, wherein all the electrodes constituting the pseudo spark gap are formed with circular holes having a diameter of 1-3mm in the middle, and the electrodes are parallel and have the same pitch and diameter.

10. A part manufacturing method, characterized in that the part manufacturing method implements the high-energy electron beam source control method according to any one of claims 1 to 4; the part manufacturing method comprises the following steps: an electronic part manufacturing method, an aviation part manufacturing method, an aerospace part manufacturing method, a bioengineering part manufacturing method, a medical part manufacturing method, and an automotive industry part manufacturing method.

Technical Field

The invention belongs to the technical field of pulse power and terahertz electron beam sources, and particularly relates to a high-energy electron beam source control system, method, device and part manufacturing method.

Background

At present, in the development process of modern high and new technologies, laser beam, electron beam, ion beam (referred to as "three beams" for short) technology makes great contribution, and the fields of play relate to material science, metallurgical technology, large-scale integrated circuit, photoelectronic technology, biotechnology and the like. With the progress of scientific technology, especially in the rapidly developed electronic, aviation, aerospace, bioengineering, medical treatment, automobile industries and the like, higher and higher requirements are put forward on the aspects of manufacturing process, processing precision, use performance and the like of materials or parts, the traditional processing method cannot meet the production requirements, and the development of the high-current charged particle beam technology successfully solves the problems of precision processing, material preparation, synthesis and the like.

As a core component of an electron beam material surface modification apparatus, international well-known companies, research institutions, and well-known universities have invested considerable technical efforts in the research of related technologies. Research shows that high-energy electrons are ejected from the anode small holes in the pseudo spark discharge process to form high-energy electron beams, and the high-energy electron beams are suitable for material surface modification and high-power terahertz radiation. Jiangxing flow et al have prepared silicon nitride (Si) successively under the condition of low-temperature substrate by using ablation of pseudo spark electron beam₃N₄) Zirconium oxide (ZrO)₂) Various thin films such as a refractory metal multilayer film, a nano-silicon film, a nano-palladium film, a diamond film, and a polytetrafluoroethylene film. In the prior art, a high-temperature superconducting YBCO film is prepared by adopting a pseudo spark discharge electron beam. The second prior art uses a pseudo spark discharge electron beam to generate terahertz radiation. The above electron beam sources all drive the pseudo spark discharge based on a dc voltage, which is typically no greater than 35kV for a single gap. Although a plurality of gaps are adoptedSo as to increase the discharge voltage and the electron beam energy, but the direct current discharge voltage is still lower than the discharge voltage under the pulse condition under the influence of the voltage action time. The electron beam energy is still low and still needs to be further improved.

Through the above analysis, the problems and defects of the prior art are as follows: the electron beam source in the prior art drives pseudo spark discharge based on direct current voltage, and is limited by discharge voltage, so that the energy of the electron beam is still low, and the energy of the electron beam is low.

The difficulty in solving the above problems and defects is: increasing the number of gaps can increase the discharge voltage and thus the electron beam energy, but this problem cannot be solved fundamentally. The nanosecond pulses are adopted to drive multi-gap pseudo spark discharge, higher discharge voltage and electron beam energy can be realized under the condition of fewer gaps, and further, electron beams with higher energy can be obtained through the rear acceleration gap. However, the problems of the structural design of the pseudo spark discharge device, impedance matching of the nanosecond pulse power supply and the pseudo spark discharge plasma, reliable discharge of the pseudo spark gap under the nanosecond pulse condition, synchronous matching of the post-acceleration pulse power supply and the pseudo spark discharge power supply and the like still exist.

The significance of solving the problems and the defects is as follows: the method fundamentally breaks through the limit of low pseudo spark discharge voltage, obtains higher discharge voltage and electron beam energy under the condition of less pseudo spark gaps, further improves the electron beam energy by adopting the post-acceleration gap, and really realizes a compact high-energy electron beam source.

Disclosure of Invention

Aiming at the problems in the prior art, the invention provides a high-energy electron beam source control system, a high-energy electron beam source control method, a high-energy electron beam source control device and a part manufacturing method.

The invention is realized in this way, a high-energy electron beam source control method, the high-energy electron beam source control method adopts a pseudo spark discharge pulse for driving the pseudo spark gap to discharge, and generates a high-energy electron beam; after obtaining the high-energy electron beam, the post-electron-beam acceleration pulse is used for accelerating the electron beam by the post-acceleration gap, so that the energy of the electron beam is improved.

Further, the high-energy electron beam source control method comprises the following steps:

the method comprises the following steps that firstly, a pseudo spark discharge nanosecond pulse source outputs negative polarity pulses, the negative polarity pulses act on a hollow cathode of a pseudo spark gap through a high-voltage lead, and an anode is grounded;

secondly, after the pulse voltage acts on the hollow cathode, a higher electric field is generated in the pseudo spark gap;

thirdly, the ionization wave develops from the hollow cathode to the anode, a high-energy electron beam is detected outside a small hole of the anode, and the high-energy electron beam enters a rear acceleration gap; meanwhile, the post-acceleration pulse voltage of the post-acceleration pulse source acts on the post-acceleration gap to accelerate the electron beam, so that the energy of the electron beam is improved.

Further, the high-energy electron beam source control method is characterized in that the pseudo spark discharge nanosecond pulse source outputs negative polarity pulses, the negative polarity pulses act on a hollow cathode of a pseudo spark gap through a high-voltage lead, and an anode is grounded; after the pulse voltage is applied to the hollow cathode, a higher electric field is generated in the pseudo spark gap, initial electrons of pseudo spark discharge run along a longer path, and the discharge is concentrated near the small hole of the electrode.

Further, the pseudo spark discharge voltage driven by the pseudo spark discharge nanosecond pulse source of the high-energy electron beam source control method is obviously high-voltage direct current voltage.

Another object of the present invention is to provide a high energy electron beam source control system for implementing the high energy electron beam source control method, the high energy electron beam source control system comprising:

the pseudo spark discharge pulse power supply module is used for driving the pseudo spark gap to discharge to generate high-energy electron beams;

the pseudo spark discharge gap module is used for realizing electron beam discharge;

and the post acceleration pulse power supply module is used for accelerating the electron beam in the post acceleration gap and improving the energy of the electron beam.

Another objective of the present invention is to provide a high-energy electron beam source generating and controlling device carrying the high-energy electron beam source controlling system, the high-energy electron beam source generating and controlling device comprising: the device comprises a hollow cathode, an anode, a rear acceleration gap, a pseudo spark discharge nanosecond pulse source and an electron beam acceleration pulse source;

the hollow cathode is connected with the middle gap, the middle gap is connected with the anode to form a pseudo spark gap, the anode is connected with the rear acceleration gap, the pseudo spark discharge nanosecond pulse source is connected with the hollow cathode, and the acceleration pulse source is connected with the rear acceleration gap through a high-voltage wire after the electron beam.

Further, the pseudo spark gap comprises a hollow cathode, a middle electrode, an anode, a rear acceleration gap and an insulating shell, wherein the hollow cathode is connected with the middle electrode, the middle electrode is connected with the anode to form the pseudo spark gap, the anode is connected with the rear acceleration gap, and the insulating shell is arranged between the electrodes.

Furthermore, the pseudo spark gap forms a sealed cavity, and the air pressure in the cavity is 100 Pa.

Furthermore, circular holes with the diameter of 1-3mm are formed in the middle of all the electrodes forming the pseudo spark gap, the electrodes are parallel, and the distance is equal to the aperture.

Another object of the present invention is to provide a method for manufacturing a part, wherein the method for manufacturing a part implements the method for controlling a high-energy electron beam source; the part manufacturing method comprises the following steps: an electronic part manufacturing method, an aviation part manufacturing method, an aerospace part manufacturing method, a bioengineering part manufacturing method, a medical part manufacturing method, and an automotive industry part manufacturing method.

By combining all the technical schemes, the invention has the advantages and positive effects that: the invention adopts the pseudo spark discharge pulse to drive the pseudo spark gap to discharge so as to generate high-energy electron beams, the discharge voltage is over 100kV, and the energy of the high-energy electrons reaches about 65 keV. After the electron beam is obtained, an acceleration pulse after the electron beam is used for further accelerating the electron beam by the post-acceleration gap, so that the energy of the electron beam is improved. The structure of the invention enables the pseudo spark gap to form a sealed cavity, and the air pressure in the cavity is 100 Pa. Round holes with the diameter of 1-3mm are formed in the middle of all the electrodes forming the pseudo spark gap, the electrodes are parallel, and the distance is equal to the aperture. The application of the post-acceleration pulse to the post-acceleration gap may further increase the electron beam energy.

The invention relates to a high-energy electron beam source based on double-pulse pseudo spark discharge, namely, pseudo spark discharge pulses are adopted for driving pseudo spark gaps to discharge so as to generate high-energy electron beams. After the electron beam is obtained, an acceleration pulse after the electron beam is used for further accelerating the electron beam by the post-acceleration gap, so that the energy of the electron beam is improved. The device has the advantages of compact structure of the pseudo spark discharge gap, high beam energy of the electron beam and high beam density. The pseudo spark gap comprises a pseudo spark discharge gap and a rear acceleration gap, and the pseudo spark discharge gap and the rear acceleration gap are integrated together and are compact in structure. The diameter of a circular hole formed in the center of each electrode is 1-3mm, the distance between the electrode gaps is equal to the diameter of the circular hole, and the discharge mode is nanosecond pulse pseudo spark discharge.

Drawings

In order to more clearly illustrate the technical solutions of the embodiments of the present application, the drawings needed to be used in the embodiments of the present application will be briefly described below, and it is obvious that the drawings described below are only some embodiments of the present application, and it is obvious for those skilled in the art that other drawings can be obtained from the drawings without creative efforts.

Fig. 1 is a flowchart of a method for controlling a high-energy electron beam source according to an embodiment of the present invention.

FIG. 2 is a schematic structural diagram of a high-energy electron beam source control system provided by an embodiment of the present invention;

FIG. 3 is a schematic structural diagram of a high-energy electron beam source control device provided in an embodiment of the present invention;

in the figure: 1. a pseudo spark discharge pulse power supply module; 2. a pseudo spark discharge gap module; 3. an acceleration pulse power supply module after the electron beam; 4. a hollow cathode; 5. an anode; 6. a post acceleration gap; 7. a pseudo spark gap; 8. a pseudo spark discharge nanosecond pulse source; 9. the electron beam accelerates the pulse source.

Detailed Description

In order to make the objects, technical solutions and advantages of the present invention more apparent, the present invention is further described in detail with reference to the following embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the invention and are not intended to limit the invention.

In view of the problems in the prior art, the present invention provides a high energy electron beam source control system, method, device and method for manufacturing parts, which are described in detail below with reference to the accompanying drawings.

As shown in fig. 1, the method for controlling a high-energy electron beam source provided by the present invention comprises the following steps:

s101: the pseudo spark discharge nanosecond pulse source outputs negative polarity pulses, the negative polarity pulses act on a hollow cathode of a pseudo spark gap through a high-voltage lead, and an anode is grounded;

s102: after the pulse voltage acts on the hollow cathode, a higher electric field is generated in the pseudo spark gap;

s103: the ionization wave develops from the hollow cathode to the anode, a high-energy electron beam is detected outside a small hole of the anode, and the high-energy electron beam enters a rear acceleration gap; meanwhile, the post-acceleration pulse voltage of the post-acceleration pulse source acts on the post-acceleration gap to further accelerate the electron beam and improve the energy of the electron beam.

As shown in fig. 2, the present invention provides a high energy electron beam source control system comprising:

the pseudo spark discharge pulse power supply module 1 is used for driving the pseudo spark gap to discharge to generate high-energy electron beams.

And the pseudo spark discharge gap module 2 is used for realizing electron beam discharge.

And the post-acceleration pulse power supply module 3 is used for accelerating the electron beam in the post-acceleration gap and improving the energy of the electron beam.

The technical solution of the present invention is further described below with reference to the accompanying drawings.

As shown in fig. 3, the present invention provides a high energy electron beam source control device, comprising: the device comprises a hollow cathode 4, an anode 5, a rear acceleration gap 6, a pseudo spark gap 7, a pseudo spark discharge nanosecond pulse source 8 and an electron beam rear acceleration pulse source 9.

The hollow cathode 4 is connected with the middle gap, the middle gap is connected with the anode 5 to form a pseudo spark gap 7, the anode 5 is connected with a rear acceleration gap 6, a pseudo spark discharge nanosecond pulse source 8 is connected with the hollow cathode 4, and an acceleration pulse source 9 after electron beam is connected with the rear acceleration gap 6 through a high-voltage wire.

The pseudo spark gap comprises a hollow cathode 4, a middle electrode, an anode 5, a rear acceleration gap 6 and an insulating shell, wherein the hollow cathode 4 is connected with the middle electrode, the middle electrode is connected with the anode 5 to form a pseudo spark gap 7, the anode 5 is connected with the rear acceleration gap 6, and the insulating shell is arranged between the electrodes.

The working principle of the high-energy electron beam source control device provided by the invention is that the pseudo spark discharge nanosecond pulse source 8 is used for driving the pseudo spark gap to discharge so as to generate high-energy electron beams. The post-acceleration pulse source 9 is used for further accelerating the electron beam in the post-acceleration gap, thereby increasing the energy of the electron beam.

The pseudo spark discharge nanosecond pulse source 8 outputs negative polarity pulses, the negative polarity pulses act on the hollow cathode 4 of the pseudo spark gap through a high-voltage lead, and the anode 5 is grounded. After the application of the pulse voltage to the hollow cathode 4, a high electric field is generated in the pseudo spark gap 7. Since the pseudo-spark discharge operating pressure range is typically less than 100Pa, the initial electrons follow a longer path to the left of the barstar curve, and thus the discharge is concentrated near the electrode orifice. Along with the development of the ionization wave from the hollow cathode 4 to the anode 5, a high-energy electron beam can be detected outside a small hole of the anode 5, the high-energy electron beam enters the rear acceleration gap 6, meanwhile, the rear acceleration pulse voltage of the rear acceleration pulse source 9 of the electron beam acts on the rear acceleration gap 6, the electron beam is further accelerated under the condition that the discharge of the rear acceleration gap 6 is guaranteed, and the energy of the electron beam is improved. Because the pseudo spark discharge voltage driven by the pseudo spark discharge nanosecond pulse source 8 is obviously high-voltage direct-current voltage, electrons can obtain higher energy in the discharge process, and meanwhile, the electron beam output with higher energy can be obtained by further accelerating the electron beam by adopting the post-acceleration pulse.

The electron beam energy generated by the pseudo spark discharge of the device of the invention exceeds 100keV, and the electron beam energy is improved by 40 percent at most after acceleration.

The above description is only for the purpose of illustrating the present invention and the appended claims are not to be construed as limiting the scope of the invention, which is intended to cover all modifications, equivalents and improvements that are within the spirit and scope of the invention as defined by the appended claims.