阅读说明：本技术 一种用于OLED掩膜版及坩埚表面LiF材料清洗的组合物 (Composition for cleaning LiF material on surfaces of OLED mask and crucible ) 是由 刘小勇 李丛香 房龙翔 叶鑫煌 于 2021-07-08 设计创作，主要内容包括：本发明属于表面活性剂技术领域,具体涉及一种用于OLED掩膜版及坩埚表面LiF材料清洗的组合物,按质量百分数之和为100%计,包括0.1-5%的特定的乙二醇基Gemini型两性离子表面活性剂,5-20%无机强碱性物质,0.5-20%有机助剂,0.1-5%螯合剂,余量为高纯水。本发明通过特定的乙二醇基Gemini型两性离子表面活性剂与无机强碱混配,可以快速并有效去除蒸镀工艺中掩膜版及蒸镀设备坩埚上附着的LiF电极材料,大大提高了锂盐的溶解度,解决了市面上产品存在的沉淀问题,且易清洗无残留。(The invention belongs to the technical field of surfactants, and particularly relates to a composition for cleaning LiF materials on the surfaces of OLED masks and crucibles, which comprises, by mass percent, 100%, 0.1-5% of a specific ethylene glycol Gemini type zwitterionic surfactant, 5-20% of an inorganic strong alkaline substance, 0.5-20% of an organic auxiliary agent, 0.1-5% of a chelating agent, and the balance of high-purity water. According to the invention, the specific ethylene glycol Gemini type zwitterionic surfactant is mixed with the inorganic strong base, so that the LiF electrode material attached to a mask plate in an evaporation process and a crucible of evaporation equipment can be quickly and effectively removed, the solubility of lithium salt is greatly improved, the problem of precipitation of products on the market is solved, and the lithium salt is easy to clean and has no residue.)

1. A composition for cleaning LiF materials on the surfaces of OLED masks and crucibles is characterized in that: the composition comprises the following components in percentage by mass, wherein the sum of the mass percentages is 100%: 0.1-5% of glycol group Gemini type zwitterionic surfactant, 5-20% of inorganic strong alkaline substance, 0.5-20% of organic auxiliary agent, 0.1-5% of chelating agent and the balance of high-purity water;

the ethylene glycol Gemini type zwitterionic surfactant is selected from the following structures:

at least one surfactant, wherein n is an integer between 2 and 16, and R is one of methyl, ethyl, n-propyl, n-butyl and n-pentyl.

2. The composition of claim 1, wherein the composition is used for cleaning LiF material on the surface of OLED mask and crucible: the preparation method of the ethylene glycol Gemini type zwitterionic surfactant comprises the following steps:

1) adding polyethylene glycol 1, epichlorohydrin 2 and sodium hydroxide into a three-necked bottle according to a molar ratio of 1:1.2:1, adding 50mL of ethanol as a solvent, reacting at 40 ℃ for 10h, after the reaction is finished, quenching the system with water, extracting with ethyl acetate, spin-drying the solvent, and recrystallizing with n-hexane to obtain white solid glycidyl ether 3, wherein the structure of the white solid glycidyl ether is as follows:n is an integer between 2 and 16;

2) adding glycidyl ether 3 and N, N-dimethylethylenediamine 4 into an ethanol solution containing 10wt% of sodium hydroxide according to a molar ratio of 2:1, stirring and mixing uniformly, heating and refluxing for 40h, after the reactant is cooled, carrying out suction filtration to remove inorganic salts, carrying out reduced pressure distillation on filtrate to remove a solvent and an unreacted N, N-dimethylethylenediamine raw material, and recrystallizing with an acetone-methanol mixed solvent to obtain an intermediate 5, wherein the structural formula of the intermediate is as follows:n is an integer between 2 and 16;

3) adding the prepared intermediate 5, sodium chlorosulfonate and sodium hydroxide into a reaction bottle according to the molar ratio of 1:2:1, dissolving into 50mL of isopropanol-water mixed solvent, uniformly stirring, reacting for 4h at 45 ℃, then heating to the reflux temperature, continuing to react for 60h, and continuously adjusting the pH of the reaction system to be =8-9 by using a saturated sodium carbonate solution in the reaction process; after the reaction is finished, distilling under reduced pressure to remove the solvent, dissolving the residue in hot absolute ethyl alcohol, filtering while the residue is hot to remove solid impurities, concentrating the filtrate to half volume, cooling in ice water bath, separating out the solid, filtering, recrystallizing and drying to obtain the final productTo a white solid product 6 of the formula:and n is an integer between 2 and 16.

3. The composition for cleaning LiF material on the surface of OLED mask and crucible as claimed in claim 1 or 2, wherein: in the chemical structural formula of the ethylene glycol Gemini type zwitterionic surfactant, n is an integer between 2 and 10.

4. The composition of claim 1, wherein the composition is used for cleaning LiF material on the surface of OLED mask and crucible: the inorganic strong alkaline substance is at least one of lithium hydroxide, sodium hydroxide, potassium hydroxide, strontium hydroxide, calcium hydroxide, barium hydroxide, sodium carbonate, potassium carbonate, sodium bicarbonate and potassium bicarbonate.

5. The composition of claim 1, wherein the composition is used for cleaning LiF material on the surface of OLED mask and crucible: the organic auxiliary agent is any one or more of ethylene glycol methyl ether, ethylene glycol ethyl ether, ethylene glycol butyl ether, ethylene glycol, propylene glycol, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol monobutyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether and propylene glycol monobutyl ether.

6. The composition of claim 1, wherein the composition is used for cleaning LiF material on the surface of OLED mask and crucible: the chelating agent is one or more of ethylenediamine tetraacetic acid, disodium ethylenediamine tetraacetic acid, tetrasodium ethylenediamine tetraacetic acid, citric acid, sodium citrate, glucose, sodium gluconate, sodium tripolyphosphate and 18-crown-6.

7. The composition of claim 1, wherein the composition is used for cleaning LiF material on the surface of OLED mask and crucible: the high-purity water is deionized water, and the conductivity of the high-purity water at 25 ℃ is not lower than 18 MOmega.

8. The composition of claim 1, wherein the composition is used for cleaning LiF material on the surface of OLED mask and crucible: the preparation method of the composition comprises the following steps: adding an inorganic strong alkaline substance, an organic auxiliary agent and an ethylene glycol Gemini type zwitterionic surfactant into high-purity water, forming a uniform system at a stirring speed of 200rpm, and adding a chelating agent while stirring to finally obtain a uniform, stable, clear and transparent solution.

Technical Field

The invention belongs to the technical field of surfactants, and particularly relates to a chemical preparation used in the field of OLED (organic light emitting diode), which is used for cleaning LiF materials on the surfaces of an OLED mask and a crucible.

Background

The OLED evaporation technology is well established in OLED display manufacturing processes. The evaporation technique requires a precise evaporation apparatus, and a Fine Metal Mask (FMM) for evaporation. The FMM determines the height and size of the pixels of the OLED display screen, which are typically patterned from a 30-50 micron thick invar alloy and bound to a metal reticle frame. The crucible has the advantages of high purity, good heating consistency, excellent thermal conductivity, thermal shock resistance and the like, and has strong chemical inertia, and chemical reaction is not easy to occur at high temperature, so the crucible is widely applied to OLED evaporation equipment. In the repeated evaporation process, the cathode material lithium fluoride can be deposited on the FMM and the crucible, so that blockage and pollution are caused, and the subsequent evaporation effect is seriously influenced. Both the crucible and the FMM need to be cleaned periodically during production to ensure their subsequent performance.

The traditional crucible and FMM electrode material are mainly cleaned by acid washing, so that the traditional crucible and FMM electrode material not only has strong corrosivity, but also generates waste acid which is difficult to treat, pollutes the environment and causes the increase of the preparation cost of the OLED display. Patent application publication No. CN 112718692A discloses a method for cleaning LiF crystal of OLED crucible parts, wherein electronic-grade concentrated nitric acid and electronic-grade concentrated hydrochloric acid are mixed according to the volume ratio of 1-3:1-3 to obtain mixed liquid medicine, and the mixed liquid medicine is placed into an ultrasonic groove body to carry out ultrasonic treatment on crucible parts so as to achieve the effect of cleaning LiF. Patent CN 11501085 a discloses a method for cleaning Mask in vacuum evaporation equipment, which uses nitric acid solution as electrolyte, uses the Mask to be cleaned as anode, and achieves cleaning effect by connecting with power supply cathode to make the metal film on the Mask surface dissolve in nitric acid electrolyte. The acid washing mode is adopted, so that the corrosion to equipment is strong, the generated waste acid pollutes the environment, and the waste liquid treatment cost is high. At present, an alkali washing mode is adopted in the market, and patent application publication No. CN 112676243A discloses a method for cleaning an Open Mask surface LiF material of an OLED Mask, wherein electronic-grade ammonia water, electronic-grade hydrogen peroxide and pure water of more than 10M omega are mixed according to the volume ratio of 1:1-3:2-4 to obtain mixed liquid medicine, and the mixed liquid medicine is put into an ultrasonic groove for ultrasonic treatment to achieve the effect of cleaning LiF. At present, the problems of low cleaning efficiency, poor cleaning effect, low solubility to lithium salt, large amount of precipitate generated in the cleaning process, low service life and the like exist in the alkaline cleaning mode in the market. According to the invention, a specific ethylene glycol Gemini type amphoteric surfactant is added into the cleaning agent, so that the critical micelle concentration is low, the dosage of the surfactant is reduced, the solubility of the cleaning agent to lithium salt is greatly improved, and the problem of precipitation generated in the cleaning process is solved.

Disclosure of Invention

The invention mainly solves the technical problem of providing the composition for cleaning the LiF material on the surfaces of the OLED mask and the crucible, and the specific ethylene glycol Gemini type zwitterionic surfactant is added, so that the LiF electrode material attached to the mask and the crucible of evaporation equipment in the evaporation process can be quickly and effectively removed, the solubility of a cleaning agent to lithium salt is greatly improved, the problem of precipitation in the cleaning process is solved, and the cleaning efficiency can be effectively improved.

In order to solve the above problems, the present invention is implemented by the following technical solutions.

The composition for cleaning the LiF material on the surfaces of the OLED mask and the crucible comprises the following components in percentage by mass, wherein the total mass percentage of the components is 100%: 0.1-5% of specific glycol group Gemini type zwitterionic surfactant, 5-20% of inorganic strong alkaline substance, 0.5-20% of organic auxiliary agent, 0.1-5% of chelating agent and the balance of high-purity water.

The specific glycol-based Gemini type zwitterionic surfactant is selected from the following structures:

at least one surfactant, wherein n is an integer between 2 and 16, R is one of a linear saturated alkane group of C1-C5, methyl, ethyl, n-propyl, n-butyl and n-pentyl.

The preparation method of the specific glycol-based Gemini type zwitterionic surfactant comprises the following steps:

1) adding polyethylene glycol 1, epichlorohydrin 2 and sodium hydroxide into a three-necked bottle according to a molar ratio of 1:1.2:1, adding 50mL of ethanol as a solvent, reacting at 40 ℃ for 10 hours, after the reaction is finished, quenching the system with water, extracting with ethyl acetate, spin-drying the solvent, and recrystallizing with n-hexane to obtain white solid glycidyl ether 3; wherein the polyethylene glycol has a structural formula:the structure of the obtained product glycidyl ether 3 is:n is an integer between 2 and 16;

2) adding glycidyl ether 3 and N, N-dimethylethylenediamine 4 into an ethanol solution containing 10wt% of sodium hydroxide according to a molar ratio of 2:1, stirring and mixing uniformly, heating and refluxing for 40h, after the reactant is cooled, carrying out suction filtration to remove inorganic salts, carrying out reduced pressure distillation on filtrate to remove a solvent and an unreacted N, N-dimethylethylenediamine raw material, and recrystallizing with an acetone-methanol mixed solvent to obtain an intermediate 5, wherein the structural formula of the intermediate is as follows:n is an integer between 2 and 16;

3) adding the prepared intermediate 5, sodium chlorosulfonate and sodium hydroxide into a reaction bottle according to the molar ratio of 1:2:1, and dissolving in 50mL of isopropanol-water(volume ratio is 1:1) and stirring uniformly. The reaction was carried out at 45 ℃ for 4 h. And then the temperature is increased to the reflux temperature, and the reaction is continued for 60 hours (the pH value of the reaction system is continuously adjusted to 8-9 by using a saturated sodium carbonate solution in the reaction process). After the reaction, the solvent was distilled off under reduced pressure, and the residue was dissolved in hot absolute ethanol and filtered while hot to remove solid impurities. Concentrating the filtrate to half volume, placing in ice water bath for cooling, separating out solids, filtering, recrystallizing (acetone-ethanol mixed solvent), and drying to obtain a white solid product 6, wherein the structural formula is as follows:n is an integer between 2 and 16.

According to the specific ethylene glycol Gemini type zwitterionic surfactant, the ethylene glycol groups can form multi-point adsorption with electrode materials on the surface, and a PEG chain can wrap lithium fluoride, so that the effect of solubilizing the lithium fluoride is achieved, the dissolution of the electrode materials is accelerated, and the solubility of lithium salts is greatly improved; the molecules of the zwitterionic surfactant have both cationic groups and anionic groups, have charges and repel each other, can effectively prevent the aggregation of particles in the cleaning process, solve the problem of precipitation in the cleaning process and have good dispersibility; the amphoteric ion surfactant has stronger intermolecular action, mutually promotes adsorption on a solution interface, has high interface adsorption density, can effectively reduce surface tension and enhance permeability; the use of Gemini type surface activity can greatly reduce the dosage of the surface active agent and improve the surface activity.

The inorganic strong alkaline substance is at least one of lithium hydroxide, sodium hydroxide, potassium hydroxide, strontium hydroxide, calcium hydroxide, barium hydroxide, sodium carbonate, potassium carbonate, sodium bicarbonate and potassium bicarbonate.

The organic auxiliary agent is any one or more of ethylene glycol methyl ether, ethylene glycol ethyl ether, ethylene glycol butyl ether, ethylene glycol, propylene glycol, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol monobutyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether and propylene glycol monobutyl ether.

The chelating agent is one or more of ethylenediamine tetraacetic acid, disodium ethylenediamine tetraacetic acid, tetrasodium ethylenediamine tetraacetic acid, citric acid, sodium citrate, glucose, sodium gluconate, sodium tripolyphosphate and 18-crown-6.

The high-purity water is deionized water, and the conductivity of the high-purity water at 25 ℃ is not lower than 18 MOmega.

The preparation method of the composition comprises the following steps: adding an inorganic strong alkaline substance, an organic auxiliary agent and a specific glycol group Gemini type amphoteric ion surfactant into high-purity water, forming a uniform system at a stirring speed of 200rpm, and adding a chelating agent while stirring to finally obtain a uniform, stable, clear and transparent solution.

The invention has the following remarkable advantages:

by adding the specific ethylene glycol Gemini type zwitterionic surfactant, the ethylene glycol can form multi-point adsorption with electrode materials on the surface, and a PEG chain can wrap lithium fluoride, so that the effect of solubilizing the lithium fluoride is achieved, the dissolution of the electrode materials is accelerated, and the solubility of lithium salts is greatly improved; the molecules of the zwitterionic surfactant have both cationic groups and anionic groups, have charges and repel each other, so that the aggregation of particles in the cleaning process can be effectively prevented, and the problem of precipitation in the cleaning process is solved; the amphoteric ion surfactant has stronger intermolecular action, mutually promotes adsorption on a solution interface, has high interface adsorption density, can effectively reduce surface tension, enhances permeability and improves cleaning efficiency; the use of Gemini type surface activity can greatly reduce the dosage of the surface active agent and improve the surface activity. The components in the composition are matched with each other, so that the LiF electrode material attached to a mask plate and a crucible of evaporation equipment in an evaporation process can be quickly and effectively removed, the solubility of lithium salt is greatly improved, the problem of precipitation of products on the market is solved, the composition is easy to clean and has no residue, and the cleaning efficiency of the mask plate and the crucible can be effectively improved. Meanwhile, the composition is non-toxic and non-corrosive, has little smell, does not pollute the environment, and has the characteristics of low foam, easy rinsing and the like.

Drawings

FIG. 1 is a comparative diagram of a reticle before (a) and after (b) cleaning;

FIG. 2 is a comparative view of the crucible before (a) and after (b) cleaning.

Detailed Description

The composition for cleaning the LiF material on the surfaces of the OLED mask and the crucible comprises the following components in percentage by mass, wherein the total mass percentage of the components is 100%: 0.1-5% of specific glycol group Gemini type zwitterionic surfactant, 5-20% of inorganic strong alkaline substance, 0.5-20% of organic auxiliary agent, 0.1-5% of chelating agent and the balance of high-purity water.

The specific glycol-based Gemini type zwitterionic surfactant is selected from the following structures:

at least one surfactant, wherein n is an integer between 2 and 16, R is one of a linear saturated alkane group of C1-C5, methyl, ethyl, n-propyl, n-butyl and n-pentyl.

The preparation method of the specific glycol-based Gemini type zwitterionic surfactant comprises the following steps:

(1) adding polyethylene glycol 1, epichlorohydrin 2 and sodium hydroxide into a three-necked bottle according to a molar ratio of 1:1.2:1, adding 50mL of ethanol as a solvent, reacting at 40 ℃ for 10h, after the reaction is finished, quenching the system with water, extracting with ethyl acetate, spin-drying the solvent, and recrystallizing with n-hexane to obtain white solid glycidyl ether 3, wherein the reaction equation is as follows:

(2) adding glycidyl ether 3 and N, N-dimethylethylenediamine 4 into an ethanol solution containing 10wt% of sodium hydroxide according to a molar ratio of 2:1, stirring and mixing uniformly, heating and refluxing for 40h, after a reactant is cooled, carrying out suction filtration to remove inorganic salts, carrying out reduced pressure distillation on a filtrate to remove a solvent and an unreacted N, N-dimethylethylenediamine raw material, and recrystallizing with an acetone-methanol mixed solvent to obtain an intermediate 5, wherein the reaction equation is as follows:

(3) adding the prepared intermediate 5, sodium chlorosulfonate and sodium hydroxide into a reaction bottle according to the molar ratio of 1:2:1, dissolving in 50mL of isopropanol-water (the volume ratio is 1:1) mixed solvent, and uniformly stirring. The reaction was carried out at 45 ℃ for 4 h. And then the temperature is increased to the reflux temperature, and the reaction is continued for 60 hours (the pH value of the reaction system is continuously adjusted to 8-9 by using a saturated sodium carbonate solution in the reaction process). After the reaction, the solvent was distilled off under reduced pressure, and the residue was dissolved in hot absolute ethanol and filtered while hot to remove solid impurities. Concentrating the filtrate to half volume, placing the filtrate in an ice water bath for cooling, separating out solids, filtering, recrystallizing (acetone-ethanol mixed solvent) and drying to obtain a white solid product 6, wherein the reaction equation is as follows:

the characterization data for compound 6 for the particular glycol based Gemini zwitterionic surfactant used when n is 2 is as follows:

¹H NMR(300MHz，DMSO-d6),δ:3.30(s,6H,CH3),3.46(q,4H,CH2),3.54(t,4H,CH2),3.25-3.50(m,4H,CH2),3.52(t,4H,CH2),3.38-3.63(m,4H,CH2),3.68(t,4H,CH2),3.80(t,4H,CH2),3.85(t,4H,CH2),4.42(t,2H,CH),5.37(s,2H,OH),5.4(s,2H,OH).

¹³C NMR(125MHz，DMSO-d6),δ:45,50.1,57.2,58,63.4,65.3,66.6,67.3,70.1,70.7.

HRMS Calculation C22H44O12N2Cl2Na2S2(M + H)⁺710.63, found 710.45. when n is 4, compound 6 is characterized as follows:

¹H NMR(300MHz，DMSO-d6),δ:3.30(s,6H,CH3),3.25-3.50(s,4H,CH2),3.38-3.63(m,4H,CH2),3.47(m,4H,CH2),3.52(m,20H,CH2),3.54(m,8H,CH2),3.68(m,8H,CH2),3.70(m,4H,CH2),4.42(t,2H,CH),5.37(s,2H,OH),5.4(s,2H,OH).

¹³C NMR(125MHz，DMSO-d6),δ:45.8,50.1,56.6,56.9,57.2,61.3,63.4,65,67.3,70.3,70.4.

HRMS Calculation C30H64O18N2Cl2Na2S2(M + H)⁺922.84, found 922.36.

According to the specific ethylene glycol Gemini type zwitterionic surfactant, the ethylene glycol groups can form multi-point adsorption with electrode materials on the surface, and a PEG chain can wrap lithium fluoride, so that the effect of solubilizing the lithium fluoride is achieved, the dissolution of the electrode materials is accelerated, and the solubility of lithium salts is greatly improved; the molecules of the zwitterionic surfactant have both cationic groups and anionic groups, have charges and repel each other, can effectively prevent the aggregation of particles in the cleaning process, solve the problem of precipitation in the cleaning process and have good dispersibility; the amphoteric ion surfactant has stronger intermolecular action, mutually promotes adsorption on a solution interface, has high interface adsorption density, can effectively reduce surface tension and enhance permeability; the use of Gemini type surface activity can greatly reduce the dosage of the surface active agent and improve the surface activity.

The inorganic strong alkaline substance is at least one of lithium hydroxide, sodium hydroxide, potassium hydroxide, strontium hydroxide, calcium hydroxide, barium hydroxide, sodium carbonate, potassium carbonate, sodium bicarbonate and potassium bicarbonate.

The organic auxiliary agent is any one or more of ethylene glycol methyl ether, ethylene glycol ethyl ether, ethylene glycol butyl ether, ethylene glycol, propylene glycol, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol monobutyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether and propylene glycol monobutyl ether.

The chelating agent is one or more of ethylenediamine tetraacetic acid, disodium ethylenediamine tetraacetic acid, tetrasodium ethylenediamine tetraacetic acid, citric acid, sodium citrate, glucose, sodium gluconate, sodium tripolyphosphate and 18-crown-6.

The high-purity water is deionized water, and the conductivity of the high-purity water at 25 ℃ is not lower than 18 MOmega.

The preparation method of the composition comprises the following steps: firstly adding inorganic strong alkaline substances into water, adding an organic auxiliary agent, then adding a specific glycol-based Gemini type amphoteric ion surfactant, forming a uniform system at a stirring speed of 200rpm, and then adding a chelating agent while stirring to finally obtain a uniform, stable, clear and transparent solution.

In order to make the present invention more comprehensible, the technical solutions of the present invention are further described below with reference to specific embodiments, but the present invention is not limited thereto.

Detergent compositions of different compositions were formulated according to the formulations in table 1.

TABLE 1 Components and their contents in different cleaning agent compositions

A mask plate and a crucible with a vapor deposition electrode material of lithium fluoride are respectively soaked in the cleaning agent composition prepared in the examples 1 to 5 and the comparative examples 1 to 4, the operation time is set at the set operation temperature, the mask plate and the crucible are taken out and cleaned by deionized water, and the mask plate and the crucible are blown dry by nitrogen. Observation was performed with an optical microscope and an electron microscope to confirm the cleaning effect. The operating conditions and the results are shown in tables 2 and 3, respectively.

TABLE 2 cleaning Effect of different cleaning agent compositions on the mask

TABLE 3 crucible cleaning effect of different cleaning agent compositions

Remarking: since the lithium fluoride layer on the crucible is thick, a long cleaning time is required.

As can be seen by combining the tables 1 to 3, the cleaning agent combination can effectively remove the lithium fluoride evaporated electrode material on the mask and the crucible within the set temperature and time, the system has no precipitate, the solution with uniform dissolution is obtained, the rinsing is easy, no residue is left, the mask and the crucible are not corroded, and the cleaning agent combination can be repeatedly used.

After the mask plate and the crucible are soaked and cleaned by the medicinal composition, rinsing, wherein the rinsing process comprises the following steps: and after the liquid medicine soaking is finished, placing the cleaning device in deionized water, spraying and rinsing for 10 minutes at normal temperature, and air-drying.

Compared with the example 1, the comparative example 1 does not contain the organic auxiliary agent, can completely strip and dissolve the lithium fluoride at the operation temperature, but cannot be rinsed cleanly, and has no corrosion to materials.

Compared with the example 1, the comparative example 2 does not contain the chelating agent, can completely strip and dissolve the lithium fluoride at the operation temperature, but is easy to adsorb particles on the surfaces of the mask and the crucible, cannot be rinsed cleanly and does not corrode a material substrate.

Compared with the example 1, the SDS is used for replacing the ethylene glycol Gemini type zwitterionic surfactant in the comparative example 3, the system is uniform and stable at the operation temperature, the lithium fluoride can be completely stripped, but the stripped lithium fluoride is difficult to completely dissolve, precipitates exist, and the material is not corroded.

Compared with the example 1, the comparative example 4 does not contain the ethylene glycol based Gemini type zwitterionic surfactant, the system is uniform and stable at the operation temperature, the lithium fluoride can be completely stripped, but the stripped lithium fluoride is difficult to completely dissolve, the system has precipitates, and the system has no corrosion to materials.

As can be shown by the above example 1 and comparative examples 1-4, the organic auxiliary agent helps to rinse, the chelating agent has the functions of resisting static electricity and preventing dirt from being adhered back, the ethylene glycol Gemini type zwitterionic surfactant improves the surface activity of the system, greatly increases the solubility of lithium fluoride for an electrode material, and can effectively prevent the generation of precipitation aggregation, and each component is absent.

FIG. 1 is a graph showing the effects before and after cleaning of MASK substrates with the cleaning agent composition of example 1, wherein a is before cleaning of MASK substrates and b is after cleaning of MASK substrates.

FIG. 2 is a graph showing the effects before and after the crucible was cleaned with the cleaning agent composition of example 1, wherein a represents before the crucible was cleaned and b represents after the crucible was cleaned. It can be seen that the cleaning effect meets the requirements, no precipitate is generated, and no LiF residue is left.

The above embodiments describe the present invention in detail, but they are only examples and do not limit the scope of the invention. All equivalent modifications and substitutions made by the present specification are within the scope of the present invention and are included in the patent protection scope of the present invention.