阅读说明：本技术 一种利用钽镀层进行微纳结构表面快速加热压印的方法 (Method for carrying out rapid heating and imprinting on surface of micro-nano structure by using tantalum coating ) 是由 周天丰 王子凡 朱展辰 王罡 阮本帅 刘朋 刘志兵 梁志强 王西彬 于 2020-04-01 设计创作，主要内容包括：本发明公开一种利用钽镀层进行微纳结构表面快速加热压印的方法,涉及微纳阵列光学元器件技术领域,首先在模具表面添加一层石墨烯,再增镀一层金属钽,石墨烯与钽在高温下结合生成碳化钽膜,然后对碳化钽膜通电,实现在玻璃模压过程中超精密辅助加热镀层的制作与使用。本发明可以实现高精度微纳阵列光学结构的加工,加工效率高,制造成本低,模具寿命长,具有极高的应用价值。(The invention discloses a method for carrying out rapid heating and imprinting on a micro-nano structure surface by utilizing a tantalum coating, and relates to the technical field of micro-nano array optical components. The invention can realize the processing of the high-precision micro-nano array optical structure, has high processing efficiency, low manufacturing cost and long service life of the die and has extremely high application value.)

1. A method for carrying out rapid heating and imprinting on the surface of a micro-nano structure by using a tantalum coating is characterized by comprising the following steps: the method comprises the following steps:

firstly, processing a micro-nano optical structure on the surface of a mould;

step two, additionally plating a layer of graphene on the surface of the die;

thirdly, additionally plating a layer of metal tantalum, and combining the graphene and the tantalum at a high temperature to generate a tantalum carbide film;

and step four, electrifying the tantalum carbide film to finish the manufacture and use of the auxiliary heating coating in the glass mould pressing process.

2. The method for press forming of high precision auxiliary heating glass using tantalum plating according to claim 1, wherein: the micro-nano optical structure in the first step is hemispherical.

3. The method for press forming of high precision auxiliary heating glass using tantalum plating according to claim 2, wherein: and in the fourth step, the mold is heated in an auxiliary way by changing the intensity of the electrified current, and high-temperature forming is carried out.

Technical Field

The invention relates to the technical field of micro-nano array optical components, in particular to a method for carrying out rapid heating and imprinting on the surface of a micro-nano structure by using a tantalum coating.

Background

The micro-nano array refers to a micro-nano structure surface with a micro geometric topological shape and a specific function in regular array distribution. The micro-nano structure made of different materials, unit shapes and periodic sizes has various optical characteristics, and can realize functions of permeability increasing, polarization splitting, optical waveguide coupling, beam combination transformation, beam shaping and the like by utilizing the imaging characteristics and the diffraction characteristics of the micro-nano structure, so that the micro-nano optical element has important functions and wide application in various fields such as optical imaging display, communication interconnection, position detection, precision manufacturing equipment and the like.

In recent years, with the wide application of micro-electromechanical systems in the fields of aerospace, information communication, biomedical, automatic control, consumer electronics, weapons and the like, how to process high-precision micro-nano array optical structures with various complex shapes is focused on improving the manufacturing precision of the micro-electromechanical systems in the field of micro-electromechanical systems. The glass material has the characteristics of high refractive index, high deformation resistance, low expansion, high imaging quality and the like, and is an ideal material for processing micro-nano array optical elements.

In order to meet the application requirements of micro-nano optical elements, various micro-nano array processing technologies are developed. The focused ion beam processing and the laser processing based on the energy-assisted processing can directly process the surface micro-nano array on the optical element, but the two methods have complex technical process and higher cost, and the processed micro-nano array has poor uniformity. The glass micro-nano array can also be processed by a photoetching technology, but the shape of the micro-nano array is limited. By adopting single-point diamond ultra-precision cutting machining or numerical control grinding and polishing, the complex micro-nano array can be manufactured, the shape precision is high, but the problems of high cost, incapability of mass production and the like exist, and the market demand cannot be met.

Other methods such as micro-grinding and micro-cutting, or the methods are limited by abrasion of a grinding wheel or edge breakage of a cutter, the form and position precision and the surface quality of the processed micro-nano array optical structure cannot meet the precision requirement of ultra-precision machining, and on the other hand, for hard and brittle materials such as glass, the surface after the material is removed is far from meeting the requirement of optical application, and cannot be used in increasingly precise optical systems naturally. However, in the processing technology such as injection molding, the material needs to be liquefied by heating the workpiece to an extremely high temperature, which may damage the internal structure of the material greatly, change the optical characteristics of the material, and cannot be applied to the optical system of the electromechanical system.

At present, a common micro-nano array optical component adopts an ultra-precision die forming technology, a die with nano-scale surface quality is obtained by carrying out ultra-precision processing on a free-cutting material, a layer of film is additionally plated on the surface of the die for protecting the die and prolonging the service life, and die plating materials include but are not limited to a rhenium iridium plating layer, a diamond D L C plating layer and a graphite plating layer.

The rhenium-iridium coating is a rare metal coating which has good affinity with a mold base material and can effectively isolate a chemical reaction between a mold and glass at a high temperature, but the thickness of the coating is not lower than a preset value due to technical reasons, and reaches tens of micrometers, so that the shape precision of a microstructure on the surface of the mold is reduced, and the coating can even directly cover the microstructure on a certain nanometer scale, the diamond D L C coating is mature at present and mainly applied to a hard alloy mold coating, can effectively protect the mold and allow secondary mold repair, but electrons or ions which can move freely do not exist in diamond crystals, so that the coating cannot be electrified to carry out auxiliary heating, the graphite coating is a novel coating, the thickness of the coating is hundreds of nanometers, the micro-nano structure on the surface of the mold is effectively reserved, meanwhile, the micro-nano structure can be electrified to carry out local quick auxiliary heating, but the surface of the graphite coating is rough, and the surface finish of the processed mold is.

In the traditional micro-nano structure array die forming process, the heating mode is mainly infrared lamp radiation or thermal resistance heating, the whole processed workpiece is heated to extremely high temperature, and after cooling, the inside of the whole micro-nano structure array lens can generate larger residual stress, so that the optical characteristics of the material are changed, and the application of the optical characteristics is limited. As the whole workpiece to be processed is heated to the mould pressing temperature, the required heating time is longer, the processing period is prolonged, and the processing efficiency needs to be further improved so as to meet the market demand.

Therefore, it is desirable to provide a new method for performing high-precision press molding of auxiliary heating glass by using a tantalum plating layer to solve the above-mentioned problems in the prior art.

Disclosure of Invention

The invention aims to provide a method for rapidly heating and imprinting the surface of a micro-nano structure by using a tantalum coating, so as to solve the problems in the prior art, realize the processing of a high-precision micro-nano array optical structure, and have the advantages of high processing efficiency, low manufacturing cost, long service life of a mold and extremely high application value.

In order to achieve the purpose, the invention provides the following scheme: the invention provides a method for carrying out rapid heating and imprinting on a micro-nano structure surface by using a tantalum coating, which comprises the following steps:

firstly, processing a micro-nano optical structure on the surface of a mould;

step two, additionally plating a layer of graphene on the surface of the die;

thirdly, additionally plating a layer of metal tantalum, and combining the graphene and the tantalum at a high temperature to generate a tantalum carbide film;

and step four, electrifying the tantalum carbide film to finish the manufacture and use of the auxiliary heating coating in the glass mould pressing process.

Preferably, the micro-nano optical structure in the first step is hemispherical.

Preferably, in the fourth step, the mold is heated by changing the intensity of the current applied thereto, and the high-temperature molding is performed.

Compared with the prior art, the invention has the following technical effects:

the method has the characteristics of high processing precision, high efficiency and good finished product consistency, solves the problems of poor shape precision of a micro structure on the surface of the die, non-conductivity, incapability of being electrified for auxiliary heating, rough surface, poor surface smoothness of the processed die and the like compared with other processing methods, is more suitable for processing the glass micro-nano array, and is a high-efficiency and low-cost processing method.

Drawings

In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings needed in the embodiments will be briefly described below, and it is obvious that the drawings in the following description are only some embodiments of the present invention, and it is obvious for those skilled in the art to obtain other drawings without creative efforts.

FIG. 1 is a process flow diagram of a method for rapid heating and imprinting of a micro-nano structure surface by using a tantalum plating layer according to the present invention;

FIG. 2 is a schematic diagram of a micro-nano structure processed in the invention;

FIG. 3 is a schematic view of a graphene interlayer in the present invention;

FIG. 4 is a schematic view of an enhanced tantalum metal film plating process according to the present invention;

FIG. 5 is a schematic view of the present invention illustrating the auxiliary heating by energization;

in the figure, 1 is a mold substrate, 2 is a nickel phosphide film, 3 is graphene, and 4 is a tantalum carbide film.

Detailed Description

The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.

In order to make the aforementioned objects, features and advantages of the present invention comprehensible, embodiments accompanied with figures are described in further detail below.