阅读说明：本技术 防伪纸图纹及其制备方法和防伪纸及其制备方法 (Anti-counterfeiting paper pattern and preparation method thereof, anti-counterfeiting paper and preparation method thereof ) 是由 刘卫东 蹇钰 赵红梅 刘萃 陈庚 孙明珠 邵光胜 王斌 刘�东 于 2020-05-18 设计创作，主要内容包括：本发明提供了一种防伪纸图纹的制备方法、一种防伪纸图纹、一种防伪纸的制备方法和一种防伪纸。防伪纸图纹的制备方法包括：在防伪纸的基材上设置光反应材料,并使光反应材料渗入基材内；设定图案造型,并制作包含图案造型的掩膜；将掩膜设置在基材的表面上,并遮盖至少部分光反应材料；使用曝光光源对基材进行曝光处理；使用溶剂对基材进行洗涤,在基材上形成图案造型样式的防伪纸图纹。本发明所提供的防伪纸图纹的制备方法所制备而成的图案精细度高,并适于与相关技术中防伪元件相结合,使现有的防伪元件获得相较于相关技术所特有的防伪效果,降低伪造的可能性。(The invention provides a preparation method of an anti-counterfeiting paper pattern, a preparation method of anti-counterfeiting paper and anti-counterfeiting paper. The preparation method of the anti-counterfeiting paper pattern comprises the following steps: arranging a photoreaction material on a base material of the anti-counterfeiting paper, and enabling the photoreaction material to permeate into the base material; setting a pattern model and manufacturing a mask containing the pattern model; arranging a mask on the surface of the base material and covering at least part of the photoreactive material; exposing the substrate by using an exposure light source; and (3) washing the base material by using a solvent, and forming the anti-counterfeiting paper pattern with a pattern modeling style on the base material. The pattern prepared by the preparation method of the anti-counterfeiting paper pattern provided by the invention has high fineness, and is suitable for being combined with anti-counterfeiting elements in related technologies, so that the existing anti-counterfeiting elements have special anti-counterfeiting effects compared with the related technologies, and the possibility of counterfeiting is reduced.)

1. A preparation method of anti-counterfeiting paper patterns is characterized by comprising the following steps:

arranging a photoreaction material on a base material of the anti-counterfeiting paper, and enabling the photoreaction material to permeate into the base material;

setting a pattern model and manufacturing a mask containing the pattern model;

disposing the mask on the surface of the substrate and covering at least a portion of the photoreactive material;

exposing the substrate by using an exposure light source;

and washing the base material by using a solvent, and forming the anti-counterfeiting paper pattern of the pattern modeling style on the base material.

2. The method for preparing the anti-counterfeiting paper pattern according to claim 1, wherein the step of washing the substrate with a solvent to form the anti-counterfeiting paper pattern with the pattern modeling style on the substrate further comprises the following steps:

performing calendaring treatment on at least part of the pattern of the anti-counterfeiting paper to enable the calendered part to form a patterned transparent window;

wherein the part without calendering forms a patterned watermark.

3. The method for preparing the pattern of the anti-counterfeiting paper according to claim 2,

the transparency of the patterned transparent window is greater than that of the patterned watermark;

the transparency of the patterned transparent window is greater than that of the anti-counterfeiting paper pattern;

the transparency of the exposed area on the anti-counterfeiting paper pattern is greater than that of the unexposed area on the anti-counterfeiting paper pattern.

4. The method for preparing the anti-counterfeiting paper pattern according to claim 2, wherein the method further comprises the following steps of performing calendering treatment on at least part of the anti-counterfeiting paper pattern to form a patterned transparent window on the calendered part:

and processing an optical anti-counterfeiting element in the patterned transparent window to enable the patterned transparent window and the optical anti-counterfeiting element to be combined to form the anti-counterfeiting window.

5. The method for preparing the pattern of the anti-counterfeiting paper according to claim 4,

the optical anti-counterfeiting element comprises at least one of a convex lens, a concave lens, a polaroid, a holographic wide strip, a micro-lens wide strip, an optically variable wide strip, liquid crystal ink, optically variable ink and plasma resonance ink.

6. The method for preparing the pattern of the anti-counterfeiting paper according to claim 2,

the minimum width or the minimum diameter of the patterned transparent window is less than or equal to 100 mu m;

the minimum width or minimum diameter of the patterned watermark is less than or equal to 100 μm.

7. The method for preparing the pattern of the anti-counterfeiting paper according to claim 2,

the step of disposing the photoreactive material on the substrate may further comprise, before the step of disposing the photoreactive material on the substrate: providing a printed pattern on the substrate; wherein the printing pattern is an offset printing pattern and/or a gravure printing pattern and/or a silk-screen printing pattern and/or a flexography printing pattern;

the method comprises the following steps of arranging a photoreactive material on a base material, and enabling the photoreactive material to permeate into the base material: and arranging a photoreactive material on the base material, enabling the photoreactive material to be superposed with at least part of the printing pattern, and enabling the photoreactive material to permeate into the base material.

8. The method for preparing the pattern of the anti-counterfeiting paper according to claim 2,

the step of disposing the photoreactive material on the substrate may further comprise, before the step of disposing the photoreactive material on the substrate: cutting a partial area of the base material to form a thinning area in the partial area;

the method comprises the following steps of arranging a photoreactive material on a base material, and enabling the photoreactive material to permeate into the base material: and arranging a photoreactive material on the base material, overlapping the photoreactive material with at least part of the thinning area, and enabling the photoreactive material to permeate into the base material.

9. The method for preparing the pattern of the anti-counterfeiting paper according to claim 2,

the step of disposing the photoreactive material on the substrate may further comprise, before the step of disposing the photoreactive material on the substrate: arranging a paper-making watermark on the base material;

the method comprises the following steps of arranging a photoreactive material on a base material, and enabling the photoreactive material to permeate into the base material: and arranging a photoreactive material on the base material, so that the photoreactive material is superposed with at least part of the papermaking watermark, and the photoreactive material is infiltrated into the base material.

10. The method for preparing the pattern of the anti-counterfeiting paper according to claim 9,

the papermaking watermarks comprise black watermarks, no watermarks and white watermarks;

the transparency of the overlapping area of the black watermark and the patterned window is I1, the transparency of the overlapping area of the watermark-free window and the patterned window is I2, the transparency of the overlapping area of the white watermark and the patterned window is I3, and I1< I2< I3.

11. The method for preparing the pattern of the anti-counterfeiting paper according to any one of claims 1 to 10,

the photoreactive material comprises a light-cured material or a negative photoresist;

the pattern modeling forms a pattern area on the substrate, wherein the pattern area is suitable for the exposure light source to penetrate through, and the area outside the pattern area is suitable for shielding the exposure light source;

the step of exposing the substrate with an exposure light source includes: exposing the base material through the mask by using the exposure light source to expose the photoreactive material on the pattern area;

the step of washing away the photoreactive material on the substrate using a solvent includes: the photoreactive material is washed out of the areas outside the pattern using a solvent.

12. The method for preparing the pattern of the anti-counterfeiting paper according to claim 11,

the photocuring material is at least one of compounds selected from an acrylate system, a methacrylate system, an acrylamide system, an N-vinyl system, a mercaptan-olefin system, a mercaptan-alkyne system, a vinyl ether system, an oxetane system and an epoxy system; and/or

The negative photoresist is selected from at least one of cyclized rubber-bis-azido system or polyvinyl cinnamate system.

13. The method for preparing the pattern of the anti-counterfeiting paper according to any one of claims 1 to 10,

the photoreactive material comprises a positive photoresist;

the pattern modeling forms a pattern area on the substrate, wherein the pattern area is suitable for shielding the exposure light source, and the area outside the pattern area is suitable for the exposure light source to transmit;

the step of exposing the substrate with an exposure light source includes: exposing the base material through the mask by using the exposure light source to expose the photoreactive material on the region outside the pattern;

the step of washing away the photoreactive material on the substrate using a solvent includes: the photoreactive material is washed out of the areas outside the pattern using a solvent.

14. The method for preparing the pattern of the anti-counterfeiting paper according to claim 13,

the positive photoresist is selected from one of ortho-diazo naphthoquinone-phenolic resin systems.

15. The method for preparing the pattern of the anti-counterfeiting paper according to any one of claims 1 to 10,

the exposure light source is one of a UV polar lamp light source, a UV electrodeless lamp light source, a UV-LED light source, a laser light source or a blue light lamp light source; wherein the emission wavelength of the exposure light source is in the range of 190 nm-510 nm; and/or

The solvent is selected from one or more of water, aqueous solution containing surfactant, acidic aqueous solution, alkaline aqueous solution and organic solvent.

16. The method for preparing the pattern of the security paper as claimed in any one of claims 1 to 10, wherein the step of providing the photoreactive material on the substrate comprises:

arranging a filling area on the surface of the base material;

filling the filling region with the photoreactive material.

17. The method for preparing the pattern of the anti-counterfeiting paper according to any one of claims 1 to 10,

the photoreactive material contains a colored dye or pigment.

18. A security paper pattern prepared according to the method of any one of claims 1 to 17.

19. A preparation method of anti-counterfeiting paper is characterized by comprising the following steps:

arranging anti-counterfeiting paper patterns on a base material of the anti-counterfeiting paper;

the anti-counterfeiting paper pattern is prepared by using the anti-counterfeiting paper pattern preparation method according to any one of claims 1 to 17.

20. The method for producing security paper according to claim 19,

the method comprises the following steps of arranging the anti-counterfeiting paper pattern on the base material of the anti-counterfeiting paper: carrying out ink-free imprinting on the pattern of the anti-counterfeiting paper; and/or

The anti-counterfeiting paper is characterized in that anti-counterfeiting characteristics are arranged on the base material of the anti-counterfeiting paper, and the anti-counterfeiting paper pattern is arranged on the base material of the anti-counterfeiting paper and comprises the following steps: combining the anti-counterfeiting paper pattern with the anti-counterfeiting feature; wherein the anti-counterfeiting feature comprises at least one of overprint, invisible text, rainbow printing, coding and digital printing.

21. A security paper prepared according to the method of preparing a security paper of claim 19 or 20.

22. The security paper of claim 21, comprising:

patterning the transparent window and the patterned watermark;

wherein at least part of the patterned transparent window and at least part of the patterned watermark are overlapped or connected.

Technical Field

The invention relates to the technical field of anti-counterfeiting, in particular to a preparation method of an anti-counterfeiting paper pattern, a preparation method of anti-counterfeiting paper and anti-counterfeiting paper.

Background

At present, the existing anti-counterfeiting paper is generally provided with anti-counterfeiting windows, wherein the manufacture of partial anti-counterfeiting windows mainly adopts a die cutting method and cuts are formed on a dried anti-counterfeiting paper base material, so that the anti-counterfeiting paper depends on equipment, is difficult to form fine patterns and is easy to forge. In addition, some anti-counterfeiting windows are manufactured by a method of forming open pores without depositing paper pulp, and have the problems that fine patterns are difficult to form and are easy to forge. In addition, the manufacturing of a part of anti-counterfeiting windows adopts an immersion method, and transparent paper is formed by filling organic substances, so that the problems that fine patterns are difficult to form and counterfeiting is easy to occur are also caused.

Disclosure of Invention

In order to improve at least one of the above technical problems, an object of the present invention is to provide a method for preparing patterns of security paper.

The invention also aims to provide a security paper pattern prepared by the preparation method of the security paper pattern.

The invention also aims to provide a preparation method of the anti-counterfeiting paper containing the preparation method of the anti-counterfeiting paper pattern.

The invention further aims to provide the anti-counterfeiting paper prepared by the preparation method of the anti-counterfeiting paper.

In order to achieve the above object, the technical solution of the first aspect of the present invention provides a method for preparing patterns of anti-counterfeiting paper, comprising: arranging a photoreactive material on a base material and enabling the photoreactive material to permeate into the base material; setting a pattern model and manufacturing a mask containing the pattern model; masking the mask over at least a portion of the surface of the substrate; exposing the substrate by using an exposure light source; washing away the photoreactive material on the substrate using a solvent; and drying the base material, and forming anti-counterfeiting paper patterns in corresponding areas covered by the mask.

The preparation method provided by the scheme is characterized in that the photoreactive material is arranged on the surface of the base material of the anti-counterfeiting paper and is used for enabling the photoreactive material to permeate into the base material. The photoreactive material is processed on the surface of the base material of the anti-counterfeiting paper in a roll coating, spraying, dip coating and other modes so as to enable the photoreactive material to permeate into the base material. The shape of the mask determines the shape of the anti-counterfeiting paper pattern formed, so that the anti-counterfeiting paper pattern has a set pattern shape, and compared with a pattern formed by die cutting a window on an anti-counterfeiting paper substrate or punching and embedding a plastic film in paper making in the related technology, the anti-counterfeiting paper pattern provided by the scheme can provide a larger design space, form a more complex pattern, and can retain other anti-counterfeiting elements such as a paper-making watermark or a safety line and the like in the anti-counterfeiting paper pattern. Covering the surface of the base material by using a mask, wherein the mask has a specific pattern shape, carrying out exposure treatment by using an exposure light source, carrying out corresponding photochemical reaction on a photoreactive material, and obviously changing the solubility of the adopted material in a corresponding solvent after the reaction and before the reaction; after the solvent washs like this, can control the marginal shape of the anti-fake paper pattern that generates through the pattern molding of mask, simultaneously because photoreaction material has plasticity, fiberizing, performance characteristics such as film forming after the reaction, the marginal shape of the anti-fake window of patterning that the pattern molding control through the mask generated makes the edge clear sharp more, and the pattern is more meticulous, thereby has higher recognition degree, makes anti-fake paper pattern play effectual anti-fake effect.

Followed by washing with a solvent to remove the uncured photoreactive material. Wherein the photoreactive material may be dissolved by a solvent before curing, but the photoreactive material is hardly dissolved by water after curing. And drying to form anti-counterfeiting paper patterns in the corresponding areas covered by the mask. According to the preparation method of the anti-counterfeiting paper pattern, the anti-counterfeiting paper pattern formed by coating and filling, photomask exposure and solvent elution has clear and sharp edges, and the pattern fineness can reach within 100 mu m, so that the anti-counterfeiting paper printed by a subsequent process can embody the anti-counterfeiting effect at a finer place, and the use safety of the anti-counterfeiting paper is improved. The formed pattern of the anti-counterfeiting paper has the advantages of high pattern fineness, capability of preventing counterfeiting means such as scanning and copying, and the like, and can form the effects of a fully-open window safety line and the like so as to further improve the possibility of identifying counterfeiting and improve the using safety of the anti-counterfeiting paper.

In addition, the step of drying the base material may be hot air drying, infrared drying, or drying using a dedicated papermaking drying device.

In addition, the preparation method of the anti-counterfeiting paper pattern in the technical scheme provided by the invention can also have the following additional technical characteristics:

in any of the above technical solutions, the step of washing the base material with a solvent to form the pattern of the security paper with the pattern modeling pattern on the base material further includes: performing calendaring treatment on at least part of the pattern of the anti-counterfeiting paper to enable the calendered part to form a patterned transparent window; wherein the part without calendering forms a patterned watermark.

Through carrying out the press polish and handling, extrude anti-counterfeit paper pattern, can increase surface smoothness and inside closely knit degree, and then promote the transparency through the anti-counterfeit paper pattern of press polish processing, obtain the transparent window of patterning. The method can be used for calendering all areas of the anti-counterfeiting paper patterns and can also be used for calendering partial areas of the anti-counterfeiting paper patterns to form a combination form of a patterned transparent window and a patterned watermark so as to obtain the anti-counterfeiting effect of partial transparent and partial non-transparent parts. The patterned transparent window formed through calendaring treatment has the characteristics of high pattern fineness and capability of being observed through the patterned transparent window, has the advantages of being capable of preventing counterfeiting means such as scanning and copying, can form the effects of a fully-open window safety line and the like, and improves the use safety of the anti-counterfeiting paper. Of course, the patterned watermark may be formed without performing the calendering process. Thus, three different pattern forms of the patterned transparent window, the patterned watermark and the combination of the patterned transparent window and the patterned watermark can be formed by carrying out subsequent processing on the pattern of the anti-counterfeiting paper.

In the above technical solution, the transparency of the patterned transparent window is greater than the transparency of the patterned watermark; the transparency of the patterned transparent window is greater than that of the anti-counterfeiting paper pattern; the transparency of the exposed area on the anti-counterfeiting paper pattern is greater than that of the unexposed area on the anti-counterfeiting paper pattern.

The patterned watermark and the patterned transparent window can enable the anti-counterfeiting paper to have the characteristic of transparency change, can be used for anti-counterfeiting, and can also be combined with other anti-counterfeiting characteristics on the anti-counterfeiting paper to have a new anti-counterfeiting effect.

In the above technical solution, after the step of performing calendering on at least a part of the pattern of the security paper to form a patterned transparent window on the calendered part, the method further comprises: and processing an optical anti-counterfeiting element in the patterned transparent window to enable the patterned transparent window and the optical anti-counterfeiting element to be combined to form the anti-counterfeiting window.

After the optical anti-counterfeiting element is processed on the patterned transparent window, the optical anti-counterfeiting element can be observed through the patterned transparent window. Because the patterned transparent window has the patterned edge, the optical anti-counterfeiting effect generated by the patterned optical anti-counterfeiting element can be observed through the patterned transparent window, so that the anti-counterfeiting window has a detection or self-checking function, namely, the function of detecting the authenticity of the anti-counterfeiting paper through the anti-counterfeiting window or the function of detecting the authenticity of the optical anti-counterfeiting element through the patterned transparent window. Thus, the patterned transparent window technology and the optical anti-counterfeiting technology are combined to form the anti-counterfeiting window, so that the anti-counterfeiting window obtains the special anti-counterfeiting effect compared with the transparent window, the distinguishing degree between the bill and the fake bill made by means of counterfeiting, changing and the like such as scanning, copying and the like is improved, and the possibility of counterfeiting is reduced.

In the above technical solution, the optical anti-counterfeit element includes at least one of a convex lens, a concave lens, a polarizing plate, a holographic wide bar, a micro lens wide bar, an optically variable wide bar, liquid crystal ink, optically variable ink, and plasma resonance ink.

In the above technical solution, the minimum width or the minimum diameter of the patterned transparent window is less than or equal to 100 μm; the minimum width or minimum diameter of the patterned watermark is less than or equal to 100 μm.

The width or diameter is used to indicate the graphic size of the patterned transparent window or patterned watermark. Wherein, the minimum width refers to the smallest one of the vertical distances from any one end point to any one side in the polygon figure. For example, in the case where the patterned transparent window or the patterned watermark is a rectangle, the minimum width refers to the size of the short side of the rectangle, and in the case where the patterned transparent window or the patterned watermark is a triangle, the minimum width refers to the smallest one of the vertical distances from the three vertices in the graph to the three sides respectively corresponding to the three vertices. Where the minimum diameter refers to the diameter dimension of a circle for the case where the patterned transparent window or the patterned watermark is circular. For the case where the patterned transparent window or the patterned watermark is elliptical, the minimum diameter is the minor diameter dimension of the ellipse. In addition, for the irregular figure, the irregular figure can be divided into a plurality of figures such as a polygon and a circle, and the minimum width of the polygon and the minimum diameter of the circle are the minimum. Thus, by setting the minimum width and the minimum diameter, the graphic size of the patterned transparent window and the patterned watermark can be limited. Meanwhile, it can be understood that in the case where the pattern size is small, the lines constituting the pattern become finer. For example, the patterned transparent window and the patterned watermark may have sharper and sharper edges.

Wherein the minimum width or minimum diameter may be 30 μm, 50 μm, 80 μm, 100 μm, or the like.

Therefore, the patterned transparent window and the patterned watermark formed by the preparation method provided by the technical scheme have clear and sharp edges, so that the anti-counterfeiting paper printed by the subsequent process can embody the anti-counterfeiting effect at a finer place, the possibility of identifying counterfeit bills and altering bills is improved, and the use safety of the anti-counterfeiting paper is improved. The anti-counterfeiting effect can be further improved by controlling the transparency of the patterned transparent window and matching with the optical anti-counterfeiting element or the image-text mark on the base material.

In addition, it can be understood that the minimum width or the minimum diameter of the patterned transparent window obtained by the preparation method provided by the technical scheme can reach the size of less than or equal to 100 μm, and the patterned transparent window with the width or the diameter of more than 100 μm can be also prepared by the preparation method provided by the technical scheme; similarly, the minimum width or the minimum diameter of the patterned watermark obtained by the preparation method provided by the technical scheme can reach the size of less than or equal to 100 μm, and the patterned watermark with the width or the diameter of more than 100 μm can be prepared by the preparation method provided by the technical scheme.

In the above technical solution, before the step of disposing the photoreactive material on the substrate, the method further comprises: the step of disposing the photoreactive material on the substrate may further comprise, before the step of disposing the photoreactive material on the substrate: providing a printed pattern on the substrate; wherein the printing pattern is an offset printing pattern and/or a gravure printing pattern and/or a silk-screen printing pattern and/or a flexography printing pattern; the method comprises the following steps of arranging a photoreactive material on a base material, and enabling the photoreactive material to permeate into the base material: and arranging a photoreactive material on the base material, enabling the photoreactive material to be superposed with at least part of the printing pattern, and enabling the photoreactive material to permeate into the base material.

Through set up the printing pattern on the substrate, make photoreaction material and at least partial printing pattern coincidence, so that the transparent window of patterning and the printing pattern overprinting that form, to the condition that is provided with the optics anti-fake component, further make the printing pattern and anti-fake window cooperate, thereby can embody anti-fake effect in more slight department through making the printing pattern, in order to realize being different from the anti-fake effect of the printing pattern among the correlation technique, and then improve the pseudo-identification effect of distinguishing of the anti-fake paper that is provided with anti-fake paper pattern.

Further, on some security papers, the printed patterns on the security papers may be combined with fluorescent materials, infrared materials, phosphorescent materials, magnetic materials, anti-copy rings, overprinting, micro-text, rainbow printing, and the like.

In the above technical solution, before the step of disposing the photoreactive material on the substrate, the method further comprises: cutting or polishing partial area of the base material to form a thinning area in the partial area; the method comprises the following steps of arranging a photoreactive material on a base material, and enabling the photoreactive material to permeate into the base material: and arranging a photoreactive material on the base material, overlapping the photoreactive material with at least part of the thinning area, and enabling the photoreactive material to permeate into the base material.

Through cutting or polishing on the substrate and handle and form the attenuate region, make photoreactive material and at least partial attenuate regional coincidence, so that the transparent window of patterning and the regional overprinting of attenuate that form, to the condition that is provided with optics anti-fake component, further make the attenuate region and anti-fake window cooperate, thereby can embody anti-fake effect in more slight department through making the attenuate region, in order to realize being different from the anti-fake effect in the attenuate region among the correlation technique, and then improve the pseudo-identification effect of distinguishing of the anti-fake paper that is provided with anti-fake paper pattern.

In the above technical solution, before the step of disposing the photoreactive material on the substrate, the method further comprises: arranging a paper-making watermark on the base material; the method comprises the following steps of arranging a photoreactive material on a base material, and enabling the photoreactive material to permeate into the base material: and arranging a photoreactive material on the base material, so that the photoreactive material is superposed with at least part of the papermaking watermark, and the photoreactive material is infiltrated into the base material.

Through set up the papermaking watermark on the substrate, make photoreaction material and at least partial papermaking watermark coincidence to make the transparent window of patterning and the papermaking watermark chromatography that forms, to the condition that is provided with the optics anti-fake component, further make the papermaking watermark cooperate with anti-fake window, thereby can embody anti-fake effect in more slight department through making the papermaking watermark, in order to realize being different from the anti-fake effect of the papermaking watermark among the correlation technique, and then improve the false-proof identification effect of distinguishing of the anti-fake paper that is provided with anti-fake paper pattern.

In the technical scheme, the papermaking watermarks comprise black watermarks, no watermarks and white watermarks; the transparency of the overlapping area of the black watermark and the patterned transparent window is I1, the transparency of the overlapping area of the non-watermark and the patterned transparent window is I2, the transparency of the overlapping area of the white watermark and the patterned transparent window is I3, and I1< I2< I3.

The papermaking watermarks with different gray levels are arranged, so that the types of the papermaking watermarks are diversified, the black watermarks, the non-watermarks and the white watermarks are respectively matched with the patterned transparent windows, the anti-counterfeiting characteristics are diversified, and the anti-counterfeiting identification effect of the anti-counterfeiting paper provided with the anti-counterfeiting paper patterns can be improved.

In addition, after the patterned transparent window and the black watermark, the watermark-free area and the white watermark area are superposed, patterns with different gray levels can be formed under the condition of light transmission, coding is carried out according to the light transmission, and different light transmission numerical values are obtained according to different gray levels. In this way, when the authenticity of the anti-counterfeiting paper is detected, the gray scale value of the papermaking watermark under the patterned transparent window can be detected by adopting the transmission light source for irradiation and image acquisition; or detecting the transparency value of the overlapping area of the patterned transparent window and the paper-making watermark; or detecting the boundary smoothness value of the patterned transparent window; or the gray level distribution condition of the overlapping area of the patterned transparent window and the black watermark, the non-watermark and the white watermark is compared with the standard value to test the authenticity of the anti-counterfeiting paper, so that the means for testing the authenticity of the anti-counterfeiting paper can be increased, and the anti-counterfeiting effect of the anti-counterfeiting paper is improved.

In the above technical solution, the photoreactive material includes a photo-curable material or a negative photoresist; the pattern modeling forms a pattern area on the substrate, wherein the pattern area is suitable for the exposure light source to penetrate through, and the area outside the pattern area is suitable for shielding the exposure light source; the step of exposing the substrate with an exposure light source includes: exposing the base material through the mask by using the exposure light source to expose the photoreactive material on the pattern area; the step of washing away the photoreactive material on the substrate using a solvent includes: the photoreactive material is washed out of the areas outside the pattern using a solvent.

The substrate can be provided with a photo-curing material or negative photoresist (negative photoresist is also called negative photoresist), the mask covers the region of the substrate provided with the photo-curing material or negative photoresist, and meanwhile, the pattern of the mask is a pattern region formed by hollowing out on the mask, namely, the hollowed-out part on the mask is a set pattern. The exposure light source can pass through the pattern area, and the area outside the pattern area is suitable for shielding the exposure light source, so that the exposure light source can expose the light-cured material or the negative photoresist in the pattern area when carrying out exposure treatment. The exposure treatment can make the photo-curing material undergo the reaction of curing or negative photoresist undergo the reaction of cross-linking or dimerization, etc., so that its structure is reinforced and is not dissolved in solvent, and the unexposed portion is dissolved in solvent. After the photo-curing material in the pattern area is cured or the negative photoresist is crosslinked, the photo-curing material or the negative photoresist which is not exposed outside the pattern area is washed away by using a solvent, so that the pattern of the pattern shape is formed on the base material by the photo-curing material or the negative photoresist which is exposed.

Or in the above technical solution, the substrate may be provided with a light-curing material or a negative photoresist, the mask covers a region of the substrate on which the light-curing material or the negative photoresist is provided, and the mask shielding portion is a set pattern shape, so that the exposure light source can pass through a region outside the pattern, and the pattern region is adapted to shield the exposure light source, so that the exposure light source exposes the light-curing material or the negative photoresist outside the pattern region when performing exposure processing. Wherein, the exposure treatment can make the photo-curing material or negative photoresist generate cross-linking or dimerization reaction, so that the structure is strengthened and is not dissolved in the solvent, and the unexposed part is dissolved in the solvent. After the photo-curing material or the negative photoresist outside the pattern area reacts, the photo-curing material or the negative photoresist which is not exposed to light in the pattern area is washed away by using a solvent, so that the photo-curing material or the negative photoresist which is exposed to light forms a pattern with another mode on the base material.

In the above technical solution, the photo-curable material is at least one compound selected from an acrylate system, a methacrylate system, an acrylamide system, an N-vinyl system, a thiol-olefin system, a thiol-alkyne system, a vinyl ether system, an oxetane system, and an epoxy system; and/or the negative photoresist is selected from at least one of a cyclized rubber-bis-azide system or a polyvinyl cinnamate system.

Wherein, the acrylate system, the methacrylate system and the acrylamide system adopt a free radical photoinitiator to initiate polymerization, and the vinyl ether system, the oxetane system and the epoxy system adopt a cationic initiator to initiate polymerization. The radical initiator includes a cleavage type photoinitiator and a hydrogen abstraction type photoinitiator. The cracking type photoinitiator comprises benzoin, benzil, acetophenone, alpha-hydroxy ketone, alpha-amino ketone, benzoyl formate and acylphosphine oxide photoinitiators; the hydrogen abstraction photoinitiator includes benzophenone, thioxanthone and anthraquinone photoinitiators. The cation initiator is sulfonium salt and iodonium salt. Further, the photocurable material is preferably an acrylate, a methacrylate, or an acrylamide which can be removed by water or an alkaline aqueous solution.

In the above technical solution, the photoreactive material comprises a positive photoresist (positive photoresist is also called as positive photoresist), and the pattern is formed on the substrate to form a pattern region, wherein the pattern region is suitable for shielding the exposure light source, and an area outside the pattern region is suitable for the exposure light source to transmit; the step of exposing the substrate with an exposure light source includes: exposing the base material through the mask by using the exposure light source to expose the photoreactive material on the region outside the pattern; the step of washing away the photoreactive material on the substrate using a solvent includes: and washing away the photoreactive material in the outer pattern exposure area by using a solvent.

The positive photoresist can be arranged on the substrate, the mask covers the area of the substrate provided with the positive photoresist, the shading part on the mask is consistent with the set pattern shape, and the mask can shade the exposure light source, so that the exposure light source can not pass through the pattern area shaded by the mask, and meanwhile, the area outside the pattern outside the mask is suitable for the exposure light source to penetrate through, so that the exposure light source can expose the positive photoresist in the area outside the pattern when carrying out exposure treatment. In which a positive photoresist dissociates into a structure that dissolves in a solvent after exposure and can be washed away by the solvent. Thus, the exposed positive-working photoresist in the area outside the pattern is washed away with a solvent, so that the unexposed positive-working photoresist forms a patterned pattern on the substrate.

Or positive photoresist can be arranged on the substrate, the mask covers the area of the substrate on which the positive photoresist is arranged, and the hollow part on the mask is consistent with the set pattern shape, so that the exposure light source can expose the positive photoresist in the pattern area through the pattern area of the mask. Wherein the positive photoresist reacts into a structure dissolved in a solvent after being exposed to light, and can be washed away by the solvent. Thus, the exposed positive photoresist in the pattern region is washed away using a solvent, thereby allowing the unexposed positive photoresist to form a pattern of another pattern of the pattern configuration on the substrate.

In the above technical solution, the positive photoresist is selected from one of o-diazonaphthoquinone-phenolic resin systems.

In the above technical solution, the exposure light source is one of a UV polar lamp light source, a UV electrodeless lamp light source, a UV-LED light source, a laser light source or a blue light source; wherein the emission wavelength of the exposure light source is in the range of 190 nm-510 nm; and/or the solvent is selected from one or more of water, an aqueous solution containing a surfactant, an acidic aqueous solution, a basic aqueous solution and an organic solvent.

The radiation initiated polymerization by the exposure light source can raise the molecular energy level of the photosensitive component of the polymerizable composition in the photoreactive material to a higher excited state in a short period of time, and at a sufficient concentration, can cause the free radicals to polymerize in 1 minute or even in a shorter period of time, such as 1 second. The actual form of radiation is numerous and may include electromagnetic radiation, such as visible light, ultraviolet radiation, X-rays, or gamma radiation; or particle radiation such as alpha radiation, beta radiation, or high energy protons or neutron beams.

The mask can block the light that the exposure light source jetted out for the light that the exposure light source jetted out can see through the regional not covered of mask on the pattern region, and the light that the exposure light source jetted out can realize like this exposing to the anti-fake paper substrate of filling photoreaction material, forms the pattern of the figurative high-accuracy fineness of setting for the pattern that corresponds the mask contains. Wherein, it is sharp that the edge in the unexposed region is exposed the district, and the transparency in exposed area is higher than unexposed region for the pattern molding is more meticulous, thereby has higher distinguishability, makes anti-fake paper pattern can play effectual anti-fake effect.

In addition, it can be understood that the type of the solvent is matched with the type of the photoreactive material, the solvent can wash away the photoreactive material in the unexposed region outside the pattern, and the photoreactive material in the exposed region cannot be washed away and retained, so that after drying treatment, the exposed region forms the pattern of the anti-counterfeiting paper. This is because the selected solvent is insoluble in the photo-crosslinking or photo-polymerization reaction of the exposed region. The exposed areas can then be solvent cleaned, baked to form patterned features.

In the scheme, the photoreactive material in the unexposed area is washed away by using a solvent, and the photoreactive material in the area covered by the mask is not cured; the photoreactive material in the mask covering area can be dissolved in the solvent and washed away by the solvent, so that the residue on the anti-counterfeiting paper substrate is reduced, and the cleanness of the surface of the anti-counterfeiting paper substrate is ensured, thereby facilitating the subsequent process. Wherein the alkaline aqueous solution is aqueous solution added with sodium hydroxide or potassium hydroxide, the acidic water soluble solution is aqueous solution added with sulfuric acid or hydrochloric acid, and the organic solvent comprises one or more of alcohols, esters and ketones. It will be appreciated that the aqueous solution is selected in relation to the photoreactive material and that the solvent needs to be capable of dissolving the photoreactive material before curing but not the photoreactive material after curing.

Such as ethoxylated bisphenol and dimethacrylate (SR 384 by Saedoma company), can be dissolved by acetone but can not be dissolved after photocrosslinking, and such as acrylate, polyethylene glycol and diacrylate (SR 259) which are cured by free radicals can be dissolved by water but are difficult to dissolve by water after photocrosslinking, and such as polyvinyl cinnamic acid negative photoresist is dissolved in butanone, and dimerization reaction is carried out by exposure to light and is not dissolved in butanone. When the photoreactive material is positive photoresist, the mask is composed of a pattern region shielded by light and a region outside the pattern transmitted by the light, the light source exposes the region outside the pattern through the mask, the solvent can wash away the photoreactive material in the reacted region outside the pattern, the photoreactive material in the pattern region cannot be washed away and reserved, and the patterned watermark feature is formed after drying. The positive photoresist such as an o-diazonaphthoquinone-linear phenolic resin system is subjected to photolysis reaction after illumination, forms carboxylic acid groups after rearrangement, can be dissolved in a dilute alkali solution, and an unexposed area cannot be dissolved in the dilute alkali solution, so that the unexposed area can be cleaned and dried by the alkali solution to form a patterned watermark characteristic.

In the above technical solution, the step of disposing the photoreactive material on the substrate includes: arranging a filling area on the surface of the base material; filling the filling region with the photoreactive material.

The preparation method provided by the scheme is used for planning the area of the anti-counterfeiting paper pattern by arranging the filling area on the surface of the base material, so that the possibility that the photoreactive material permeates into other parts on the base material in the process of manufacturing the anti-counterfeiting paper pattern is reduced, and the dosage of the photoreactive material and a solvent for washing the photoreactive material can be effectively controlled, so that the cost is reduced.

In the above technical solution, the photoreactive material contains a colored dye or pigment.

Adding a colored dye or pigment into the photoreactive material, and mixing to make the photocuring material contain the colored dye or pigment. The formed pattern of the anti-counterfeiting paper can be colored by arranging colored dye or pigment. To the condition that anti-fake paper pattern includes the transparent window of patterning, be equipped with anti-fake materials such as optics anti-fake element in the transparent window of patterning, observe through the transparent window of patterning that has the colour, can also demonstrate anti-fake performance in the transparent window that has the colour, provide different visual perceptions.

The technical scheme of the second aspect of the invention provides an anti-counterfeiting paper pattern which is prepared by using the preparation method of the anti-counterfeiting paper pattern of any one of the technical schemes of the first aspect.

The anti-counterfeiting paper pattern provided by the technical scheme of the second aspect of the invention is prepared by using the preparation method of the anti-counterfeiting paper pattern of any one of the technical schemes of the first aspect, so that all the beneficial effects of any one of the technical schemes are achieved, and the details are not repeated herein.

The technical scheme of the third aspect of the invention provides a preparation method of anti-counterfeiting paper, which comprises the following steps: arranging anti-counterfeiting paper patterns on a base material of the anti-counterfeiting paper; the anti-counterfeiting paper pattern is prepared by using the preparation method of the anti-counterfeiting paper pattern according to any one of the technical schemes of the first aspect.

The preparation method of the anti-counterfeiting paper provided by the technical scheme of the third aspect of the invention comprises the preparation method of any one of the technical schemes of the first aspect, so that all the beneficial effects of any one of the technical schemes are achieved, and the details are not repeated herein.

It is understood that a plurality of security paper patterns may be provided on the substrate of the security paper. The patterns of the anti-counterfeiting paper can be overlapped with one another to form overprints, and can also be connected and spliced together.

In the above technical solution, the step of arranging the pattern of the security paper on the base material of the security paper comprises: carrying out ink-free imprinting on the pattern of the anti-counterfeiting paper; and/or the anti-counterfeiting paper is provided with anti-counterfeiting characteristics on the base material, and the step of arranging anti-counterfeiting paper patterns on the base material of the anti-counterfeiting paper comprises the following steps: combining the anti-counterfeiting paper pattern with the anti-counterfeiting feature; wherein the anti-counterfeiting feature comprises at least one of overprint, invisible text, rainbow printing, coding and digital printing.

Through carrying out the no printing ink impression to anti-counterfeiting paper pattern, can make anti-counterfeiting paper pattern have unevenness's hierarchical structure, through can distinguishing the true and false of anti-counterfeiting paper through touch, feeling promptly, also can demonstrate special anti-counterfeiting effect through the anti-counterfeiting paper pattern after the impression, especially be equipped with the condition that patterned transparent window and some anti-counterfeiting elements cooperate, anti-counterfeiting elements include bar code, two-dimensional code, safety line, papermaking watermark etc.. Through the uneven patterned transparent window, observation at different angles can be carried out, so that the anti-counterfeiting element can display different anti-counterfeiting characteristics at different angles, and the anti-counterfeiting effect of the anti-counterfeiting paper is further improved.

In addition, the anti-counterfeiting paper patterns can be combined with other anti-counterfeiting measures such as overprint, invisible characters, rainbow printing, coding, digital printing and the like to show a special anti-counterfeiting effect.

The technical scheme of the fourth aspect of the invention provides anti-counterfeiting paper which is prepared according to the preparation method of the anti-counterfeiting paper of any one of the technical schemes of the third aspect.

The anti-counterfeiting paper provided by the technical scheme of the fourth aspect of the invention is prepared by the preparation method of the anti-counterfeiting paper of any one of the technical schemes of the third aspect, so that all the beneficial effects of any one of the technical schemes are achieved, and the details are not repeated herein.

It is worth to say that the anti-counterfeiting paper can be provided with one anti-counterfeiting paper pattern or a plurality of anti-counterfeiting paper patterns. The pattern of the anti-counterfeiting paper can be processed to form a patterned transparent window and/or a patterned watermark. Thus, the anti-counterfeiting paper can be provided with a patterned transparent window without a patterned watermark; or a patterned watermark is arranged without a patterned transparent window; or both a patterned transparent window and a patterned watermark. It is understood that the number of the patterned watermarks may be one or more, and the number of the patterned transparent windows may be one or more.

In the above technical solution, the anti-counterfeit paper comprises: patterning the transparent window and the patterned watermark; wherein at least part of the patterned transparent window and at least part of the patterned watermark are overlapped or connected.

The anti-counterfeiting paper provided by the technical scheme comprises: the condition that partial area or all area of the patterned transparent window is overlapped with partial area or all area of the patterned watermark, and the condition that the patterned transparent window is connected with the patterned watermark.

Through setting up patterning transparent window and patterning watermark into the form of overlapping or concatenation to combine together different anti-counterfeit characteristics, make anti-counterfeit paper have new visual perception, thereby obtain more diversified anti-counterfeit characteristics, with the anti-fake degree of distinguishing that improves anti-counterfeit paper, and then further improve the possibility of discerning forging, changing and making counterfeit money, improve anti-counterfeit paper's safety in utilization. It is further understood that two patterned transparent windows may also be superimposed or spliced; the two patterned watermarks may also be superimposed or stitched.

Additional aspects and advantages of the invention will be set forth in part in the description which follows, and in part will be obvious from the description, or may be learned by practice of the invention.

Drawings

The above and/or additional aspects and advantages of the present invention will become apparent and readily appreciated from the following description of the embodiments, taken in conjunction with the accompanying drawings of which:

FIG. 1 is a flow chart of a method for preparing patterns of anti-counterfeiting paper according to an embodiment of the invention;

FIG. 2 is a block flow diagram of a method for preparing patterns on anti-counterfeiting paper according to an embodiment of the invention;

FIG. 3 is a block flow diagram of a method for preparing patterns on anti-counterfeiting paper according to an embodiment of the invention;

FIG. 4 is a block flow diagram of a method for preparing patterns on anti-counterfeiting paper according to an embodiment of the invention;

FIG. 5 is a block flow diagram of a method for preparing patterns on anti-counterfeiting paper according to an embodiment of the invention;

FIG. 6 is a block flow diagram of a method for preparing patterns on anti-counterfeiting paper according to an embodiment of the invention;

FIG. 7 is a block flow diagram of step S20 according to an embodiment of the present invention;

FIG. 8 is a block flow diagram of a method of making security paper according to one embodiment of the present invention;

FIG. 9 is a schematic view of a security paper according to an embodiment of the present invention;

FIG. 10 is a schematic view of a security paper according to an embodiment of the present invention;

FIG. 11 is a schematic view of a security paper according to an embodiment of the present invention;

FIG. 12 is a schematic view of a security paper according to an embodiment of the present invention;

FIG. 13 is a schematic view of a security paper according to an embodiment of the present invention;

FIG. 14 is a schematic view of a security paper according to an embodiment of the present invention;

FIG. 15 is a schematic view of a security paper according to an embodiment of the present invention;

FIG. 16 is a schematic view of a security paper according to an embodiment of the present invention;

FIG. 17 is a schematic view of a security paper according to an embodiment of the present invention;

fig. 18 is a schematic view of a security paper according to an embodiment of the present invention.

Detailed Description

In order that the above objects, features and advantages of the present invention can be more clearly understood, a more particular description of the invention will be rendered by reference to the appended drawings. It should be noted that the embodiments and features of the embodiments of the present application may be combined with each other without conflict.

In the following description, numerous specific details are set forth in order to provide a thorough understanding of the present invention, however, the present invention may be practiced in other ways than those specifically described herein, and therefore the scope of the present invention is not limited by the specific embodiments disclosed below.

Methods of making a security paper pattern, a method of making a security paper, and a security paper according to some embodiments of the present invention are described below with reference to fig. 1 to 18.

Some embodiments of the present application provide a method for preparing a pattern of anti-counterfeiting paper.