阅读说明：本技术 基于旋转式光伏晶片双面清洗方法 (Double-side cleaning method based on rotary photovoltaic wafer ) 是由 钱诚 冯春 田晓东 于 2021-06-25 设计创作，主要内容包括：本发明涉及光伏晶片技术领域,具体地说,涉及基于旋转式光伏晶片双面清洗设备及其清洗方法。其至少包括：顶部清洗机构,顶部清洗机构包括清洗架,清洗架底部转动设有毛刷辊,底部边缘打扫机构,底部边缘打扫机构包括连接架,连接架固定在清洗架靠近端部的底部,连接架内表面开设有调节槽,调节槽内部转动设有调节丝杆,调节丝杆外壁滑动设有打扫架,打扫架外壁设有调节板,调节板与调节丝杆外壁螺纹配合连接,打扫架内部转动设有打扫辊,打扫辊外壁等间距设有多个打扫毛刷,本发明可以对光伏晶片上表面清洗的同时打扫底部边缘处,清理效果更佳,有利于降低劳动强度,且可以根据光伏晶片的长度调节清洗的范围。(The invention relates to the technical field of photovoltaic wafers, in particular to a rotary photovoltaic wafer-based double-sided cleaning device and a cleaning method thereof. It at least comprises: the cleaning device comprises a cleaning frame, a brush roller is arranged at the bottom of the cleaning frame in a rotating mode, a bottom edge cleaning mechanism comprises a connecting frame, the connecting frame is fixed at the bottom of the cleaning frame close to the end portion, an adjusting groove is formed in the inner surface of the connecting frame, an adjusting screw rod is arranged inside the adjusting groove in a rotating mode, a cleaning frame is arranged on the outer wall of the adjusting screw rod in a sliding mode, an adjusting plate is arranged on the outer wall of the cleaning frame and connected with the outer wall of the adjusting screw rod in a threaded fit mode, a cleaning roller is arranged inside the cleaning frame in a rotating mode, a plurality of cleaning brushes are arranged on the outer wall of the cleaning roller at equal intervals, the cleaning device can clean the bottom edge of the photovoltaic wafer while cleaning the upper surface of the photovoltaic wafer, the cleaning effect is better, labor intensity is favorably reduced, and the cleaning range can be adjusted according to the length of the photovoltaic wafer.)

1. The cleaning method based on the rotary photovoltaic wafer double-sided cleaning equipment is characterized by comprising the following steps of: the operation steps are as follows:

(I) cleaning preparation stage

In the cleaning preparation stage, cleaning equipment of the rotary photovoltaic wafer double-sided cleaning equipment is in a working state;

(II) cleaning stage

S4, the output shaft of the rotating motor (121) drives the brush roller (120) to rotate at the bottom of the cleaning frame (110), so that the brush roller (120) rotates to brush dust and impurities on the surface of the photovoltaic wafer, meanwhile, the output shaft of the cleaning motor (2212) drives the cleaning roller (221) to rotate inside the cleaning frame (220), and when the cleaning brush (2211) rotates along with the cleaning roller (221), the bottom edge of the photovoltaic wafer can be cleaned;

s5, conveying water in the water tank (134) from the water conveying pipe (133) to the inside of the fixed tank (131) by the water pump, and then washing the upper surface of the photovoltaic wafer by water flow at the position sprayed by the water outlet (1310);

s6, pushing and pulling the connecting frame (210), so that the top cleaning mechanism (100) and the bottom edge cleaning mechanism (200) slide on the outer wall of the photovoltaic wafer, the roller (231) is driven to rotate inside the rotary groove (230), the outer wall of the roller (231) rolls along the outer wall of the photovoltaic wafer, and when the top cleaning mechanism (100) cleans the upper surface of the photovoltaic wafer, the bottom edge cleaning mechanism (200) cleans the bottom edge of the photovoltaic wafer.

2. The cleaning method based on the rotary photovoltaic wafer double-sided cleaning equipment as claimed in claim 1, characterized in that:

the cleaning stage also includes a step S7 after the step S6:

s7, the motor in the induced draft fan (2230) below the cleaning frame (220) drives the fan to rotate, so that the dust at the bottom edge of the photovoltaic wafer and the cleaned sewage are absorbed in the collection box (223) to be collected.

3. The cleaning method based on the rotary photovoltaic wafer double-sided cleaning equipment as claimed in claim 2, characterized in that:

the collecting box (223) is also provided with a filter screen, and dust and sewage are filtered by the filter screen (224) and fall into the collecting box (223).

4. The cleaning method based on the rotary photovoltaic wafer double-sided cleaning equipment as claimed in claim 1, characterized in that:

the photovoltaic wafer is sucked by the mechanical arm and passes through the space between the two bottom edge cleaning mechanisms (200) at the two sides, so that the photovoltaic wafer can pass through the space between the top cleaning mechanism (100) and the bottom edge cleaning mechanism (200).

5. The cleaning method based on the rotary photovoltaic wafer double-sided cleaning equipment as claimed in claim 1, characterized in that:

the cleaning preparation stage includes:

s1, an output shaft of a moving motor (1140) drives a moving screw rod (114) to rotate inside a groove (113), so that the surface of a moving plate (1120) slides along the threads of the outer wall of the moving screw rod (114), a moving plate (112) slides inside the groove (113) according to the length of a photovoltaic wafer, the distance between two fixed frames (111) is adjusted, and the outer wall of a connecting frame (210) is positioned on two sides of the photovoltaic wafer;

s2, driving the movable box (132) at the end of one of the fixed boxes (131) to slide in the other fixed box (131), enabling the movable box (132) to slide out of the fixed box (131), enabling water entering the fixed box (131) to enter the movable box (132), flowing out of a plurality of communication holes (1320), adjusting the range of water sprinkling, driving the sliding rod (124) to slide out of the sliding groove (123), enabling the extension brush (1240) to extend from the outer side of the sliding groove (123), and adjusting the range of brushing according to different lengths of the photovoltaic wafers;

and S3, positioning the top cleaning mechanism (100) on the upper surface of the photovoltaic wafer, and positioning the cleaning frame (220) at the bottom of the photovoltaic wafer through the connecting frame (210).

6. The cleaning method based on the rotary photovoltaic wafer double-sided cleaning equipment as claimed in claim 5, wherein the cleaning method comprises the following steps:

after the step S3, the turntable (213) is held to drive the adjusting screw rod (212) to rotate inside the adjusting groove (211), the surface of the adjusting plate (222) is driven to slide along the threads on the outer wall of the adjusting screw rod (212), so that the cleaning frame (220) is driven to move up and down, the distance from the cleaning frame (220) to the bottom of the photovoltaic wafer is adjusted according to the thickness of the photovoltaic wafer, and the end part of the cleaning brush (2211) can be attached to the edge of the bottom of the photovoltaic wafer.

7. The cleaning method based on the rotary photovoltaic wafer double-sided cleaning equipment as claimed in claim 1, characterized in that:

the water outlet (1310) may also spray a cleaning solution.

8. The cleaning method based on the rotary photovoltaic wafer double-sided cleaning equipment as claimed in claim 1, characterized in that:

the brush roller (120) and the sweeping roller (221) keep synchronous rotation.

Technical Field

The invention relates to the technical field of photovoltaic wafers, in particular to a double-side cleaning method based on a rotary photovoltaic wafer.

Background

The photovoltaic wafer is used as a solar cell separating plate, the wafer mainly refers to the directional growth and subsequent slicing of a silicon crystal of a solar power generation (photovoltaic) upstream material, when the solar photovoltaic wafer is used, as the photovoltaic wafer is located outdoors for a long time for use, a large amount of dust easily falls on the surface of the photovoltaic wafer, and the normal use of the solar photovoltaic wafer can be influenced without long-time cleaning, a worker is required to clean the photovoltaic wafer regularly, the existing cleaning equipment can only clean the upper surface of the photovoltaic wafer and cannot clean the bottom edge of the photovoltaic wafer, so that the worker is required to clean the bottom edge of the photovoltaic wafer again, the workload is increased, the cleaning area of the conventional cleaning equipment cannot be adjusted according to photovoltaic wafers of different lengths, and the practicability is low.

Disclosure of Invention

The invention aims to provide a double-sided cleaning device based on a rotary photovoltaic wafer and a cleaning method thereof, so as to solve the problems in the background technology.

The invention discloses a cleaning method based on rotary photovoltaic wafer double-sided cleaning equipment, which comprises the following operation steps:

1. cleaning preparation stage

In the cleaning preparation stage, cleaning equipment of the rotary photovoltaic wafer double-sided cleaning equipment is in a working state;

2. cleaning phase

S4, the output shaft of the rotating motor drives the brush roller to rotate at the bottom of the cleaning frame, so that the brush roller rotates to brush dust and impurities on the surface of the photovoltaic wafer, meanwhile, the output shaft of the sweeping motor drives the sweeping roller to rotate inside the sweeping frame, and when the sweeping brush rotates along with the sweeping roller, the bottom edge of the photovoltaic wafer can be swept;

s5, conveying water in the water tank to the inside of the fixed tank from the water conveying pipe by the water pump, and then washing the upper surface of the photovoltaic wafer by water flow at the position sprayed by the water outlet;

s6, pushing and pulling the connecting frame to enable the top cleaning mechanism and the bottom edge cleaning mechanism to slide on the outer wall of the photovoltaic wafer and drive the roller to rotate inside the rotary groove, the outer wall of the roller rolls along the outer wall of the photovoltaic wafer, and when the top cleaning mechanism cleans the upper surface of the photovoltaic wafer, the bottom edge cleaning mechanism cleans the bottom edge of the photovoltaic wafer.

Preferably, the cleaning method based on the rotary photovoltaic wafer double-sided cleaning device of the invention further comprises a step S7 after the step S6 in the cleaning stage:

s7, the fan is driven to rotate by a motor inside the induced draft fan below the cleaning frame, and dust at the edge of the bottom of the photovoltaic wafer and the cleaned sewage are adsorbed inside the collection box and collected.

Preferably, in the cleaning method based on the rotary type photovoltaic wafer double-sided cleaning equipment, the collecting box is further provided with a filter screen, and dust and sewage are filtered by the filter screen and fall into the collecting box.

Preferably, according to the cleaning method based on the rotary type photovoltaic wafer double-side cleaning device, the photovoltaic wafer is adsorbed by the mechanical arm and passes through the space between the two bottom edge cleaning mechanisms on the two sides, so that the photovoltaic wafer can pass through the space between the top cleaning mechanism and the bottom edge cleaning mechanism.

Preferably, the cleaning method based on the rotary photovoltaic wafer double-sided cleaning equipment comprises the following cleaning preparation stages:

s1, driving the movable screw rod to rotate inside the groove by the output shaft of the movable motor, so that the surface of the movable plate slides along the thread on the outer wall of the movable screw rod, and according to the length of the photovoltaic wafer, the movable plate slides inside the groove, and the distance between the two fixed frames is adjusted, so that the outer walls of the connecting frames are positioned at two sides of the photovoltaic wafer;

s2, driving the movable box at the end of one of the fixed boxes to slide in the other fixed box, enabling the movable box to slide out of the fixed box, enabling water entering the fixed box to enter the movable box, flowing out of the plurality of communication holes, adjusting the sprinkling range, driving the sliding rod to slide out of the sliding groove, enabling the extension brush to extend from the outer side of the sliding groove, and adjusting the brushing range according to different lengths of the photovoltaic wafers;

and S3, positioning the top cleaning mechanism on the upper surface of the photovoltaic wafer, and positioning the cleaning frame at the bottom of the photovoltaic wafer through the connecting frame.

Preferably, according to the cleaning method based on the rotary type photovoltaic wafer double-sided cleaning equipment, after the step of S3, the turntable is held to drive the adjusting screw rod to rotate inside the adjusting groove, the surface of the adjusting plate is driven to slide along the threads on the outer wall of the adjusting screw rod, so that the cleaning frame is driven to move up and down, the distance from the cleaning frame to the bottom of the photovoltaic wafer is adjusted according to the thickness of the photovoltaic wafer, and the end part of the cleaning brush can be attached to the edge of the bottom of the photovoltaic wafer.

Preferably, in the cleaning method based on the rotary photovoltaic wafer double-sided cleaning equipment, the water outlet can also spray cleaning liquid.

Preferably, according to the cleaning method based on the rotary photovoltaic wafer double-sided cleaning device, the brush roller and the sweeping roller are kept rotating synchronously.

Compared with the prior art, the invention has the beneficial effects that:

1. according to the double-side cleaning method based on the rotary photovoltaic wafer, the distance from the cleaning frame to the bottom of the photovoltaic wafer is adjusted according to the thickness of the photovoltaic wafer, the end portion of the cleaning brush can be attached to the edge of the bottom of the photovoltaic wafer, so that when the cleaning brush rotates along with the cleaning roller, the edge of the bottom of the photovoltaic wafer can be cleaned, the top cleaning mechanism cleans the upper surface of the photovoltaic wafer, the edge of the bottom of the photovoltaic wafer can be cleaned by the edge cleaning mechanism, the cleaning effect of the photovoltaic wafer is improved, and the labor intensity is reduced.

2. According to the double-side cleaning method based on the rotary photovoltaic wafer, when the connecting frame is placed on the outer side of the photovoltaic wafer, the outer wall of the roller is attached to the outer wall of the photovoltaic wafer, the connecting frame is pushed and pulled, the top cleaning mechanism and the bottom edge cleaning mechanism slide on the outer wall of the photovoltaic wafer, the roller is driven to rotate inside the rotary groove, the outer wall of the roller rolls along the outer wall of the photovoltaic wafer, the friction resistance between the outer wall of the connecting frame and the outer wall of the photovoltaic wafer can be reduced, and the photovoltaic wafer can be moved and cleaned more easily and conveniently.

3. In the double-sided cleaning method based on the rotary photovoltaic wafer, the dust at the edge of the bottom of the photovoltaic wafer and the cleaned sewage are adsorbed inside the collecting box to be collected, so that the dust at the edge of the bottom of the photovoltaic wafer is cleaned more completely, the dust and the sewage can be filtered through the filter screen firstly, the sewage is collected from the inside of the collecting box, the sewage is collected conveniently and uniformly, and the follow-up recycling is facilitated.

4. According to the double-side cleaning method based on the rotary photovoltaic wafer, the distance between the two fixing frames can be adjusted according to the length of the photovoltaic wafer, the sprinkling range and the brushing range are adjusted simultaneously, the follow-up cleaning of the photovoltaic wafers with different lengths is facilitated, and the applicability is stronger.

Drawings

FIG. 1 is an assembly view showing the overall structure of the present embodiment 1;

FIG. 2 is an exploded view of the top cleaning mechanism of the present embodiment 1;

FIG. 3 is a structural exploded view of the bottom edge sweeping mechanism of the present embodiment 1;

FIG. 4 is an exploded view of the cleaning frame of the present embodiment 1;

FIG. 5 is a schematic view of the roller structure of this embodiment 2;

FIG. 6 is an exploded view of the collecting box of the present embodiment 3;

FIG. 7 is a schematic structural diagram of the embodiment 3 at the point A in FIG. 6;

FIG. 8 is an exploded view of the washing rack of this embodiment 4;

FIG. 9 is an exploded view of the sprinkler of this embodiment 4;

fig. 10 is an exploded view of the brush roller according to the embodiment 4.

The various reference numbers in the figures mean:

100. a top cleaning mechanism; 110. a cleaning frame; 111. a fixed mount; 112. a movable plate; 1120. moving the plate; 113. a groove; 114. moving the screw rod; 1140. a moving motor; 120. a brush roller; 121. rotating the motor; 122. a rotating rod; 1220. cleaning the brush; 123. a chute; 124. a slide bar; 1240. an extension brush; 130. a watering device; 131. a fixed box; 1310. a water outlet; 132. a movable box; 1320. a communicating hole; 133. a water delivery pipe; 134. a water tank;

200. a bottom edge sweeping mechanism; 210. a connecting frame; 211. an adjustment groove; 212. adjusting the screw rod; 213. a turntable; 220. a cleaning frame; 221. a cleaning roller; 2211. cleaning a brush; 2212. a cleaning motor; 222. an adjusting plate; 223. a collection box; 2230. an induced draft fan; 2231. a cavity; 2232. an eccentric gear; 2233. a linkage motor; 224. a filter screen; 2240. a buffer spring; 230. rotating the groove; 231. and a roller.

Detailed Description

The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.

In the description of the present invention, it is to be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", and the like, indicate orientations and positional relationships based on those shown in the drawings, and are used only for convenience of description and simplicity of description, and do not indicate or imply that the equipment or element being referred to must have a particular orientation, be constructed and operated in a particular orientation, and thus, should not be considered as limiting the present invention.

Example 1

Referring to fig. 1-4, the present embodiment provides a double-side cleaning apparatus based on a rotary photovoltaic wafer, which at least comprises:

the top cleaning mechanism 100 comprises a cleaning frame 110, a brush roller 120 is rotatably arranged at the bottom of the cleaning frame 110, the cleaning frame 110 can be positioned on the upper surface of a photovoltaic wafer, then the brush roller 120 is rotatably arranged at the bottom of the cleaning frame 110, so that the brush roller 120 rotatably brushes dust and impurities on the surface of the photovoltaic wafer to improve the cleaning effect, the end part of the brush roller 120 is connected with an output shaft of a rotating motor 121, the rotating motor 121 is embedded in the inner layer of the cleaning frame 110, the rotating motor 121 is powered on to work, and the output shaft of the rotating motor 121 drives the brush roller 120 to rotate more easily and conveniently;

when the top cleaning mechanism 100 is used specifically, the cleaning frame 110 is positioned on the upper surface of the photovoltaic wafer, and the output shaft of the rotating motor 121 drives the brush roller 120 to rotate at the bottom of the cleaning frame 110, so that the brush roller 120 rotates and brushes dust and impurities on the surface of the photovoltaic wafer.

The bottom edge cleaning mechanism 200 comprises two symmetrical bottom edge cleaning mechanisms 200, each bottom edge cleaning mechanism 200 comprises a connecting frame 210, each connecting frame 210 is fixed at the bottom of a cleaning frame 110 close to the end portion, an adjusting groove 211 is formed in the inner surface of each connecting frame 210, an adjusting screw rod 212 is rotatably arranged in each adjusting groove 211, the end portion of each adjusting screw rod 212 rotatably extends out of each adjusting groove 211 and is fixedly connected with a turntable 213, the turntable 213 is held to drive the adjusting screw rods 212 to rotate in the adjusting grooves 211, a cleaning frame 220 is slidably arranged on the outer wall of each adjusting screw rod 212, an adjusting plate 222 is arranged on the outer wall of each cleaning frame 220, the adjusting plates 222 are in threaded fit connection with the outer wall of each adjusting screw rod 212, when the adjusting screw rods 212 rotate, the surfaces of the adjusting plates 222 can be driven to slide along the threads on the outer wall of the adjusting screw rods 212, so that the cleaning frames 220 are driven to move up and down, a cleaning roller 221 is rotatably arranged in each cleaning frame 220, a plurality of cleaning brushes 2211 are arranged on the outer wall of each cleaning roller 221 at equal intervals, can be according to the thickness regulation of photovoltaic wafer and clean the distance of frame 220 to photovoltaic wafer bottom, make and clean brush 2211 tip and can laminate photovoltaic wafer bottom edge, thereby when cleaning brush 2211 and rotating along with cleaning roller 221, can clean the bottom edge of photovoltaic wafer, when making top wiper mechanism 100 wash the upper surface of photovoltaic wafer, bottom edge cleaning mechanism 200 can clean photovoltaic wafer bottom edge, improve the photovoltaic wafer cleaning performance, save intensity of labour, cleaning roller 221 end connection has cleaning motor 2212, cleaning motor 2212 outer wall is fixed at link 210 outer wall, will clean motor 2212 switch on power, make its work, it is more light convenient inside cleaning frame 220 to drive cleaning roller 221 by cleaning motor 2212 output shaft.

In particular use of the bottom edge cleaning mechanism 200 of the present invention, when the top cleaning mechanism 100 is positioned on the top surface of a photovoltaic wafer, the cleaning frame 220 is positioned on the bottom of the photovoltaic wafer via the connecting frame 210, then, the turntable 213 is held to drive the adjusting screw rod 212 to rotate in the adjusting groove 211, and the surface of the adjusting plate 222 is driven to slide along the thread on the outer wall of the adjusting screw rod 212, so as to drive the cleaning frame 220 to move up and down, the distance from the cleaning frame 220 to the bottom of the photovoltaic wafer is adjusted according to the thickness of the photovoltaic wafer, so that the end of the cleaning brush 2211 can be attached to the edge of the bottom of the photovoltaic wafer, then the output shaft of the cleaning motor 2212 drives the cleaning roller 221 to rotate inside the cleaning frame 220, when the cleaning brush 2211 rotates along with the cleaning roller 221, the bottom edge of the photovoltaic wafer can be cleaned, and the bottom edge cleaning mechanism 200 can clean the bottom edge of the photovoltaic wafer while the top cleaning mechanism 100 cleans the upper surface of the photovoltaic wafer.

It should be noted that the transmission fixing device of the photovoltaic wafer is not the invention point of the present application. Therefore, there is no specific expression in this application, and the space between the two bottom edge cleaning mechanisms 200 on both sides is for conveniently adsorbing the photovoltaic wafer by the robot arm, so that the photovoltaic wafer can smoothly pass through between the top cleaning mechanism 100 and the bottom edge cleaning mechanism 200.

Example 2

In order to reduce the frictional resistance between the outer wall of the connecting frame 210 and the outer wall of the photovoltaic wafer, and to make the photovoltaic wafer easier and more convenient to move and clean, the embodiment is different from embodiment 1 in that please refer to fig. 5, in which:

the inner surface of the connecting frame 210 is provided with a rotating groove 230, the rotating groove 230 is internally provided with a plurality of rollers 231 in a rotating manner, the rollers 231 are used for rolling on the outer wall of the photovoltaic wafer, when the connecting frame 210 is placed on the outer side of the photovoltaic wafer, the outer wall of each roller 231 is attached to the outer wall of the photovoltaic wafer, the connecting frame 210 is pushed and pulled, the top cleaning mechanism 100 and the bottom edge cleaning mechanism 200 slide on the outer wall of the photovoltaic wafer, the rollers 231 are driven to rotate inside the rotating groove 230, the outer wall of each roller 231 rolls along the outer wall of the photovoltaic wafer, the friction resistance between the outer wall of the connecting frame 210 and the outer wall of the photovoltaic wafer can be reduced, and the photovoltaic wafer can be more easily and conveniently cleaned by moving.

Example 3

In order to make the dust and the cleaned sewage at the bottom edge of the photovoltaic wafer adsorbed inside the collecting box 223 for collecting, and uniformly collecting the sewage for the convenience of subsequent recycling, the present embodiment is different from embodiment 1 in that please refer to fig. 6 to 7, wherein:

clean frame 220 inner chamber bottom and insert and be equipped with collecting box 223, collecting box 223 inner wall is equipped with draught fan 2230, switch on the power supply with draught fan 2230, make its work, it rotates to drive the fan by the inside motor of draught fan 2230, can make the dust of photovoltaic wafer bottom edge and the sewage after the washing adsorb inside collecting box 223, thereby make photovoltaic wafer bottom edge dust clean cleaner, collecting box 223 top is equipped with filter screen 224, filter screen 224 adopts the mesh diameter to be 0.5-1.0 mm's polyurethane filter screen and makes, fixedly connected with buffer spring 2240 between filter screen 224 bottom and the collecting box 223 top, dust and sewage can filter through filter screen 224 earlier, make sewage from dropping inside collecting box 223, conveniently collect the sewage in unison, be convenient for follow-up recycle.

Specifically, in order to avoid filter screen 224 to block up, cavity 2231 has been seted up at collecting box 223 top edge, the inside rotation of cavity 2231 has eccentric gear 2232, eccentric gear 2232 end connection has linkage motor 2233, linkage motor 2233 outer wall inlays and establishes at collecting box 223 inlayer, with linkage motor 2233 switch on, make its work, it is more light convenient inside cavity 2231 to drive eccentric gear 2232 by linkage motor 2233 output shaft, eccentric gear 2232 outer wall is closely laminated with filter screen 224 bottom, when eccentric gear 2232 rotates, can drive the reciprocating up-and-down motion of filter screen 224, thereby can make the better filtration of sewage get off, avoid blockking up, the practicality is stronger.

Example 4

In order to adjust the cleaning range according to the length of the photovoltaic wafer and improve the applicability, the embodiment is different from embodiment 1, please refer to fig. 8-10, in which:

the cleaning rack 110 comprises two symmetrical fixing racks 111, wherein a groove 113 is formed in the top of one fixing rack 111, a movable plate 112 is fixedly connected to the end of the other fixing rack 111, the movable plate 112 slides inside the fixing rack 111, the movable plate 112 can slide inside the groove 113 according to the length of the photovoltaic wafer, the distance between the two fixing racks 111 is adjusted, and the outer wall of the connecting rack 210 can be located on two sides of the photovoltaic wafer, so that the outer wall of the photovoltaic wafer with different lengths can be fixed, and the subsequent cleaning of the photovoltaic wafers with different lengths is facilitated.

It is worth mentioning that, in order to make the movable plate 112 slide more easily and improve the degree of automation, the outer wall of the movable plate 112 near the end portion is provided with the movable plate 1120, the inner wall of the groove 113 is rotatably provided with the movable screw 114, the surface of the movable screw 114 is in threaded fit with the surface of the movable plate 1120, the end portion of the movable screw 114 is connected with the movable motor 1140, the outer wall of the movable motor 1140 is embedded inside the fixed frame 111, the movable motor 1140 is powered on to work, and the output shaft of the movable motor 1140 drives the movable screw 114 to rotate inside the groove 113, so that the surface of the movable plate 1120 slides along the threads on the outer wall of the movable screw 114, the movable plate 112 slides more easily, and the degree of automation is high.

Further, in order to adjust the scope of watering, wash rack 110 front surface is equipped with watering device 130, watering device 130 includes the fixed case 131 of two symmetries, a plurality of delivery ports 1310 have been seted up to fixed case 131 bottom equidistant, fixed case 131 tip intercommunication has raceway 133, raceway 133 tip has water tank 134 through the water pump intercommunication, water tank 134 outer wall is fixed at wash rack 110 tip, can be carried fixed case 131 inside with the inside water of water tank 134 from raceway 133 by the water pump, then wash photovoltaic wafer upper surface by a plurality of delivery port injection department rivers, ensure the cleaning performance 1310, guarantee structural integrity 1310.

Specifically, two fixed casees 131 are hollow structure, wherein a fixed case 131 tip intercommunication has movable box 132, movable box 132 slides inside another fixed case 131, movable box 132 bottom intercommunication has a plurality of intercommunicating pores 1320, can be when adjusting the wash rack 110 according to photovoltaic wafer length, the movable box 132 that drives one of them fixed case 131 tip slides inside another fixed case 131, make movable box 132 roll-off fixed case 131, the inside water that gets into fixed case 131 gets into inside movable box 132, flow from a plurality of intercommunicating pores 1320, can adjust the scope of watering according to photovoltaic wafer's length, and the practicality is stronger.

In addition, in order to adjust the brushing range, the brush roller 120 includes two symmetrical rotating rods 122, a plurality of washing brushes 1220 are provided on the outer walls of the rotating rods 122, a chute 123 is arranged in one rotating rod 122, a sliding rod 124 is arranged in the chute 123 in a sliding manner, the end part of the sliding rod 124 is fixedly connected with the end part of the other rotating rod 122, a plurality of extension brushes 1240 are arranged on the outer wall of the sliding rod 124, the extension brushes 1240 are made of nylon materials and can be twisted at will and have long service life, when the slide bar 124 is located inside the slide slot 123, the extension brush 1240 can be deformed to be located inside the slide slot 123, and, as adjusted according to the length of the photovoltaic wafer, the sliding rod 124 can be driven to slide out of the sliding slot 123, so that the extending brush 1240 can be extended from the outer side of the sliding slot 123, therefore, the brushing range can be adjusted according to different lengths of the photovoltaic wafers, the extending brush 1240 brushes impurities on the surfaces of the photovoltaic wafers along with the rotation of the rotating rod 122, and the practicability is higher.

Example 5

This example provides a cleaning method based on a rotary photovoltaic wafer double-sided cleaning device, using the cleaning device of examples 1-4, and operating steps thereof are as follows:

(I) cleaning preparation stage

S1, the output shaft of the moving motor 1140 drives the moving screw 114 to rotate inside the groove 113, so that the surface of the moving plate 1120 slides along the thread of the outer wall of the moving screw 114, the moving plate 112 slides inside the groove 113 according to the length of the photovoltaic wafer, and the distance between the two fixed frames 111 is adjusted, so that the outer wall of the connecting frame 210 can be positioned at two sides of the photovoltaic wafer;

s2, driving the movable box 132 at the end of one of the fixed boxes 131 to slide in the other fixed box 131, so that the movable box 132 slides out of the fixed box 131, the water entering the fixed box 131 enters the movable box 132 and flows out of the plurality of communication holes 1320, adjusting the sprinkling range, and simultaneously driving the sliding rod 124 to slide out of the chute 123, so that the extension brush 1240 extends from the outer side of the chute 123, thereby adjusting the brushing range according to different lengths of the photovoltaic wafers;

s3, positioning the top cleaning mechanism 100 on the upper surface of the photovoltaic wafer, positioning the cleaning frame 220 at the bottom of the photovoltaic wafer through the connecting frame 210, holding the turntable 213 to drive the adjusting screw rod 212 to rotate inside the adjusting groove 211, driving the surface of the adjusting plate 222 to slide along the thread on the outer wall of the adjusting screw rod 212, driving the cleaning frame 220 to move up and down, adjusting the distance from the cleaning frame 220 to the bottom of the photovoltaic wafer according to the thickness of the photovoltaic wafer, and enabling the end part of the cleaning brush 2211 to be attached to the edge of the bottom of the photovoltaic wafer;

(II) cleaning stage

S4, the output shaft of the rotating motor 121 drives the brush roller 120 to rotate at the bottom of the cleaning frame 110, so that the brush roller 120 rotates to brush dust and impurities on the surface of the photovoltaic wafer, meanwhile, the output shaft of the cleaning motor 2212 drives the cleaning roller 221 to rotate inside the cleaning frame 220, and when the cleaning brush 2211 rotates along with the cleaning roller 221, the bottom edge of the photovoltaic wafer can be cleaned;

s5, conveying the water in the water tank 134 from the water conveying pipe 133 to the inside of the fixed tank 131 by a water pump, and then washing the upper surface of the photovoltaic wafer by water flow at the position sprayed by a plurality of water outlets 1310;

s6, the connecting frame 210 is pushed and pulled, so that the top cleaning mechanism 100 and the bottom edge cleaning mechanism 200 slide on the outer wall of the photovoltaic wafer, the roller 231 is driven to rotate inside the rotary groove 230, the outer wall of the roller 231 rolls along the outer wall of the photovoltaic wafer, and the bottom edge cleaning mechanism 200 can clean the bottom edge of the photovoltaic wafer while the top cleaning mechanism 100 cleans the upper surface of the photovoltaic wafer;

s7, the fan is driven to rotate by the motor inside the induced draft fan 2230, so that dust at the edge of the bottom of the photovoltaic wafer and cleaned sewage are adsorbed inside the collecting box 223 to be collected, the dust and the sewage can be filtered by the filter screen 224 and fall into the collecting box 223, and the sewage is collected uniformly.

Further, the water outlet 1310 may also spray a cleaning solution, i.e. clean water or cleaning solution is used according to choice.

Further, the brush roller 120 and the sweeping roller 221 are kept rotating synchronously to achieve the top and bottom cleaning together.

The foregoing shows and describes the general principles, essential features, and advantages of the invention. It will be understood by those skilled in the art that the present invention is not limited to the embodiments described above, and the preferred embodiments of the present invention are described in the above embodiments and the description, and are not intended to limit the present invention. The scope of the invention is defined by the appended claims and equivalents thereof.