阅读说明：本技术 多层镀膜玻璃生产工艺 (Production process of multilayer coated glass ) 是由 王安焱 于 2019-12-02 设计创作，主要内容包括：本发明公开了多层镀膜玻璃生产工艺,包括如下步骤：步骤一,基板清洗；步骤二,基板安装；步骤三,抽真空处理；步骤四,镀膜；步骤五,洗涤干燥；步骤六,检测包装；玻璃基板人工检验合格后,将玻璃基板放置在超声波清洗机中的容器内,依次放入中性洗涤剂、蒸馏水、酒精进行超声波清洗,振动后除去玻璃镀膜基面的油脂和脏污,用流水冲洗基板,再放入沸腾的蒸馏水中,取出后迅速吹干,把干燥后的基板装上固定架上备用；将玻璃基板放进真空磁控溅射镀膜机的真空镀膜室；本发明,膜层耐腐蚀和耐磨性能较好,膜层与基板的附着力强,膜层纯度高,可以一次完成多层镀膜,有着极好的膜层均匀性,卓越的边缘覆盖和良好的附着力。(The invention discloses a production process of multilayer coated glass, which comprises the following steps: step one, cleaning a substrate; step two, mounting a substrate; step three, vacuumizing; step four, coating a film; step five, washing and drying; step six, detecting and packaging; after the glass substrate is qualified by manual inspection, placing the glass substrate in a container in an ultrasonic cleaning machine, sequentially placing neutral detergent, distilled water and alcohol for ultrasonic cleaning, removing grease and dirt on a glass coating base surface after vibration, washing the substrate with running water, placing the substrate in boiling distilled water, taking out the substrate and quickly drying the substrate, and mounting the dried substrate on a fixing frame for later use; putting the glass substrate into a vacuum coating chamber of a vacuum magnetron sputtering coating machine; the invention has the advantages of good corrosion resistance and wear resistance of the film layer, strong adhesive force between the film layer and the substrate, high purity of the film layer, capability of completing multi-layer film coating at one time, excellent film layer uniformity, excellent edge coverage and good adhesive force.)

1. The production process of the multilayer coated glass comprises the following steps: step one, cleaning a substrate; step two, mounting a substrate; step three, vacuumizing; step four, coating a film; step five, washing and drying; step six, detecting and packaging; the method is characterized in that:

in the first step, after the glass substrate is qualified through manual inspection, the glass substrate is placed in a container in an ultrasonic cleaning machine, neutral detergent, distilled water and alcohol are sequentially placed in the container for ultrasonic cleaning, after vibration is carried out for 5min, grease and dirt on a glass coating base surface are removed, then the substrate is washed by running water and then placed in boiling distilled water, the substrate is taken out and quickly dried, and the dried substrate is mounted on a fixing frame for later use;

in the second step, the glass substrate is placed in a vacuum coating chamber of a vacuum magnetron sputtering coating machine, air is firstly filled into the vacuum chamber for a period of time, a coating chamber bell jar is lifted, the substrate is installed, the coating chamber is cleaned, and the bell jar is lowered;

continuously vacuumizing the vacuum chamber by using a molecular pump and a mechanical pump, detecting the vacuum degree in the vacuum chamber by using a composite vacuum gauge, and preparing film coating work after the background vacuum degree in the vacuum chamber meets the requirement;

wherein in the fourth step, the glass substrate is conveyed by the rollers which are horizontally arranged, the glass substrate is conveyed into a plurality of sputtering cavities in the sputtering chamber, installing cathode target material in the sputtering cavity, introducing nitrogen, oxygen working gas and argon reactive gas into the sputtering cavity, electrifying the sputtering cathode, under the action of the electric field, electrons are emitted from the surface of the anode, the energy of the electrons is rapidly increased under the acceleration of the electric field, the high-energy electrons collide with gas molecules in the space of the surface area of the cathode, so that the gas molecules are ionized, positively charged particles impact the surface of the cathode at high speed under the acceleration of the electric field to knock out metal particles, meanwhile, as the particles collide the surface of the target to generate a large amount of secondary electrons, the electrons become high-energy electrons under the acceleration of an electric field, so as to maintain the abnormal glow discharge, and the positively charged particles deposit on the glass surface to form a coating layer;

in the fifth step, after the film coating is finished, the power supply is turned off, the vacuum pumping is continued for 0.5h-2h, the coated glass is conveyed to the outlet of the film coating chamber through the roller, and the washing and drying treatment is carried out through the washing and drying machine;

and step six, performing quality detection on the washed and dried glass in a dark room by using a transmissivity and reflectivity measuring instrument, packaging the qualified coated glass into a box, and conveying the box to a finished product warehouse for storage.

2. The process for producing a multilayer coated glass according to claim 1, wherein: in the first step, the cleaned glass cannot be touched by bare hands.

3. The process for producing a multilayer coated glass according to claim 1, wherein: step three is describedIn the vacuum chamber, the background vacuum degree is 10^-3-10^-5Pa。

4. The process for producing a multilayer coated glass according to claim 1, wherein: in step four, the sputtering chamber is provided with four, and installation nickel-chromium alloy cathode target in the first sputtering intracavity lets in argon gas in the first sputtering intracavity, and installation silver cathode target in the second sputtering intracavity lets in argon gas in the second sputtering intracavity, and installation silicon-aluminium cathode target in the third sputtering intracavity lets in argon gas and oxygen in the third sputtering intracavity, and the ratio of argon gas and oxygen volume is 1: 1.2, installing a silicon-aluminum cathode target material in a fourth sputtering cavity, introducing argon and nitrogen into the fourth sputtering cavity, wherein the ratio of the argon to the nitrogen is 1.2: 1.5.

5. the process for producing a multilayer coated glass according to claim 1, wherein: in the second step, the waiting time before conveying the cleaned and dried glass substrate is not more than 10 min.

6. The process for producing a multilayer coated glass according to claim 1, wherein: in the fourth step, the transmission speed range of the glass substrate is ensured to be 90-400 in/min.

7. The process for producing a multilayer coated glass according to claim 1, wherein: in the fourth step, in order to obtain the maximum deposition rate and improve the adhesion of the film layer, the substrate should be placed as close as possible to the cathode while ensuring that the glow discharge itself is not damaged.

8. The process for producing a multilayer coated glass according to claim 1, wherein: in the fourth step, the pressure of the argon is 0.3-0.8 Pa.

Technical Field

The invention relates to the technical field of coated glass, in particular to a production process of multilayer coated glass.

Background

The coated glass is prepared by coating metal, metal oxide film or non-metal oxide film on the surface of glass by pyrolysis method, vacuum method, chemical coating method, etc., or by permeating metal ions into the surface of glass by electro-float method or plasma exchange method to replace the original ions on the surface layer of glass to form a reflecting film. The single-layer film system utilizes the infrared reflection performance of certain film materials to achieve the heat reflection function and utilizes the visible spectrum reflection characteristic of the film to form the reflection color. The multilayer film system utilizes the infrared reflection performance of certain film materials, simultaneously utilizes the interference effect of the film in the visible spectrum range, and achieves the heat reflection function and can form the required reflection color by adjusting the thickness of the film.

Disclosure of Invention

The invention aims to provide a production process of multilayer coated glass, which aims to solve the problems in the background technology.

In order to achieve the purpose, the invention provides the following technical scheme:

the production process of the multilayer coated glass comprises the following steps: step one, cleaning a substrate; step two, mounting a substrate; step three, vacuumizing; step four, coating a film; step five, washing and drying; step six, detecting and packaging;

in the first step, after the glass substrate is qualified through manual inspection, the glass substrate is placed in a container in an ultrasonic cleaning machine, neutral detergent, distilled water and alcohol are sequentially placed in the container for ultrasonic cleaning, after vibration is carried out for 5min, grease and dirt on a glass coating base surface are removed, then the substrate is washed by running water and then placed in boiling distilled water, the substrate is taken out and quickly dried, and the dried substrate is mounted on a fixing frame for later use;

in the second step, the glass substrate is placed in a vacuum coating chamber of a vacuum magnetron sputtering coating machine, air is firstly filled into the vacuum chamber for a period of time, a coating chamber bell jar is lifted, the substrate is installed, the coating chamber is cleaned, and the bell jar is lowered;

continuously vacuumizing the vacuum chamber by using a molecular pump and a mechanical pump, detecting the vacuum degree in the vacuum chamber by using a composite vacuum gauge, and preparing film coating work after the background vacuum degree in the vacuum chamber meets the requirement;

wherein in the fourth step, the glass substrate is conveyed by the rollers which are horizontally arranged, the glass substrate is conveyed into a plurality of sputtering cavities in the sputtering chamber, installing cathode target material in the sputtering cavity, introducing nitrogen, oxygen working gas and argon reactive gas into the sputtering cavity, electrifying the sputtering cathode, under the action of the electric field, electrons are emitted from the surface of the anode, the energy of the electrons is rapidly increased under the acceleration of the electric field, the high-energy electrons collide with gas molecules in the space of the surface area of the cathode, so that the gas molecules are ionized, positively charged particles impact the surface of the cathode at high speed under the acceleration of the electric field to knock out metal particles, meanwhile, as the particles collide the surface of the target to generate a large amount of secondary electrons, the electrons become high-energy electrons under the acceleration of an electric field, so as to maintain the abnormal glow discharge, and the positively charged particles deposit on the glass surface to form a coating layer;

in the fifth step, after the film coating is finished, the power supply is turned off, the vacuum pumping is continued for 0.5h-2h, the coated glass is conveyed to the outlet of the film coating chamber through the roller, and the washing and drying treatment is carried out through the washing and drying machine;

and step six, performing quality detection on the washed and dried glass in a dark room by using a transmissivity and reflectivity measuring instrument, packaging the qualified coated glass into a box, and conveying the box to a finished product warehouse for storage.

According to the technical scheme, in the first step, the cleaned glass cannot be touched by a naked hand.

According to the technical scheme, in the third step, the background vacuum degree in the vacuum chamber is 10^-3-10^-5Pa。

According to the technical scheme, in step four, the sputtering chamber is provided with four, and installation nickel-chromium alloy cathode target in the first sputtering chamber lets in argon gas in the first sputtering chamber, and installation silver cathode target in the second sputtering chamber lets in argon gas in the second sputtering chamber, and installation silicon-aluminum cathode target in the third sputtering chamber lets in argon gas and oxygen in the third sputtering chamber, and the ratio of argon gas and oxygen volume is 1: 1.2, installing a silicon-aluminum cathode target material in a fourth sputtering cavity, introducing argon and nitrogen into the fourth sputtering cavity, wherein the ratio of the argon to the nitrogen is 1.2: 1.5.

according to the technical scheme, in the second step, the waiting time before the glass substrate after being cleaned and dried is conveyed is not more than 10 min.

According to the technical scheme, in the fourth step, the transmission speed range of the glass substrate is ensured to be 90-400 in/min.

According to the above technical solution, in the fourth step, in order to obtain the maximum deposition rate and improve the adhesion of the film layer, the substrate should be placed as close as possible to the cathode on the premise of ensuring that the glow discharge itself is not damaged.

According to the technical scheme, in the fourth step, the pressure of argon is 0.3-0.8 Pa.

Compared with the prior art, the invention has the beneficial effects that: after the glass substrate is qualified by manual inspection, the glass substrate is placed in a container in an ultrasonic cleaning machine, neutral detergent, distilled water and alcohol are sequentially put in the container for ultrasonic cleaning, vibration is carried out for 5min, grease and dirt on a glass coating base surface are removed, then the substrate is washed by running water, the substrate is put in boiling distilled water, the substrate is taken out and dried rapidly, a vacuum chamber is continuously vacuumized, after the background vacuum degree in the vacuum chamber meets the requirement, coating work is carried out, the glass substrate is conveyed into four sputtering chambers in the sputtering chambers, electrons are emitted from the surface of an anode under the action of an electric field, the energy of the electrons is rapidly improved under the acceleration of the electric field, the high-energy electrons collide with gas molecules in the space of the surface area of the cathode, so that the gas molecules are ionized, positively charged particles impact the surface of the cathode at high speed under the acceleration of the electric field, and metal particles are knocke, meanwhile, a large amount of secondary electrons are generated when the particles collide with the surface of the target, the electrons become high-energy electrons under the acceleration of an electric field, so that the abnormal glow discharge is maintained, metal particles discharged from the surface of the target by positively charged particles are deposited on the surface of glass to form a coating layer, a nickel-chromium alloy metal film is formed in the first sputtering cavity, a silver metal film is formed in the second sputtering cavity, a silicon oxide compound film is formed in the third sputtering cavity, a silicon nitride compound film is formed in the fourth sputtering cavity, a multilayer film is formed on the glass substrate, the corrosion resistance and the wear resistance of the film are good, the vacuum magnetron sputtering ensures that the adhesion between the film and the substrate is strong, the purity of the film is high, the multilayer coating can be completed at one time, and the film has excellent uniformity, excellent edge coverage and good adhesion.

Drawings

The accompanying drawings, which are included to provide a further understanding of the invention and are incorporated in and constitute a part of this specification, illustrate embodiments of the invention and together with the description serve to explain the principles of the invention and not to limit the invention. In the drawings:

FIG. 1 is a flow chart of the production process of the present invention.

Detailed Description

The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.

Referring to fig. 1, the present invention provides a technical solution:

the production process of the multilayer coated glass comprises the following steps: step one, cleaning a substrate; step two, mounting a substrate; step three, vacuumizing; step four, coating a film; step five, washing and drying; step six, detecting and packaging;

in the first step, after the glass substrate is qualified through manual inspection, the glass substrate is placed in a container in an ultrasonic cleaning machine, neutral detergent, distilled water and alcohol are sequentially placed in the container for ultrasonic cleaning, after vibration is carried out for 5min, grease and dirt on a glass coating base surface are removed, then the substrate is washed by running water and then placed in boiling distilled water, the substrate is taken out and quickly dried, the dried substrate is mounted on a fixing frame for standby, and in the first step, the cleaned glass cannot be touched by bare hands;

in the second step, the glass substrate is placed in a vacuum coating chamber of a vacuum magnetron sputtering coating machine, air is filled into the vacuum chamber for a period of time, a coating chamber bell jar is lifted, the substrate is mounted, the coating chamber is cleaned, and the bell jar is lowered, wherein in the second step, the waiting time before the cleaned and dried glass substrate is conveyed is not more than 10 min;

in the third step, the vacuum chamber is continuously vacuumized by a molecular pump and a mechanical pump, a composite vacuum gauge is used for detecting the vacuum degree in the vacuum chamber, and after the background vacuum degree in the vacuum chamber meets the requirement, the film coating work can be prepared, wherein in the third step, the background vacuum degree in the vacuum chamber is 10^-3-10^-5Pa；

Wherein in the fourth step, the glass substrate is conveyed by the rollers which are horizontally arranged, and in the fourth step, the transmission speed range of the glass substrate is ensured to be 90-400 in/min; carry the glass substrate to a plurality of sputtering intracavity in the sputtering chamber, at the intracavity installation negative pole target that sputters, in step four, the sputtering chamber is provided with four, and nickel-chromium alloy negative pole target is installed to first sputtering intracavity, lets in argon gas in the first sputtering intracavity, and the intracavity installation silver negative pole target is sputtered to the second, lets in argon gas in the second sputtering intracavity, and the intracavity installation silicon-aluminum negative pole target is sputtered to the third, and argon gas and oxygen are sputtered to the third, and the ratio of argon gas and oxygen volume is 1: 1.2, installing a silicon-aluminum cathode target material in a fourth sputtering cavity, introducing argon and nitrogen into the fourth sputtering cavity, wherein the ratio of the argon to the nitrogen is 1.2: 1.5; in the fourth step, in order to obtain the maximum deposition rate and improve the adhesion of the film layer, the substrate should be placed at the place closest to the cathode as far as possible on the premise of ensuring that the glow discharge is not damaged; respectively introducing nitrogen, oxygen working gas and argon reactive gas into a sputtering cavity, wherein the pressure of argon is 0.3-0.8Pa, electrifying a sputtering cathode, emitting electrons from the surface of an anode under the action of an electric field, rapidly increasing the energy of the electrons under the acceleration of the electric field, enabling high-energy electrons to collide with gas molecules in the space of the surface area of the cathode to ionize the gas molecules, impacting positively charged particles to the surface of the cathode at high speed under the acceleration of the electric field, knocking out metal particles, generating a large amount of secondary electrons due to the collision of the particles with the surface of a target, enabling the electrons to become the high-energy electrons under the acceleration of a glow electric field, maintaining the abnormal discharge, and depositing the metal particles discharged from the surface of the target by the positively charged particles on the surface of glass to form a coating layer;

in the fifth step, after the film coating is finished, the power supply is turned off, the vacuum pumping is continued for 0.5h-2h, the coated glass is conveyed to the outlet of the film coating chamber through the roller, and the washing and drying treatment is carried out through the washing and drying machine;

and step six, performing quality detection on the washed and dried glass in a dark room by using a transmissivity and reflectivity measuring instrument, packaging the qualified coated glass into a box, and conveying the box to a finished product warehouse for storage.

Based on the above, the invention has the advantages that after the glass substrate is qualified by manual inspection, the glass substrate is placed in a container in an ultrasonic cleaning machine, neutral detergent, distilled water and alcohol are sequentially put in the container for ultrasonic cleaning, after the vibration for 5min, grease and dirt on a glass coating base surface are removed, then the substrate is washed by running water, then the substrate is put in boiling distilled water, taken out and quickly dried, a vacuum chamber is continuously vacuumized, after the background vacuum degree in the vacuum chamber meets the requirement, coating work is carried out, the glass substrate is conveyed into four sputtering cavities in the sputtering chamber, electrons are emitted from the surface of an anode under the action of an electric field, the energy of the electrons is quickly improved under the acceleration of the electric field, high-energy electrons collide with gas molecules in the space of the surface area of the cathode, so that the gas molecules are ionized, and positively charged particles impact the surface of the cathode at high speed under the acceleration of the electric field, the metal particles are knocked out, meanwhile, a large amount of secondary electrons are generated due to the fact that the particles collide the surface of a target, the electrons become high-energy electrons under the acceleration of an electric field, abnormal glow discharge is maintained, the metal particles which are discharged from the surface of the target by positively charged particles are deposited on the surface of glass to form a film coating layer, a nickel-chromium alloy metal film is formed in a first sputtering cavity, a silver metal film is formed in a second sputtering cavity, a silicon oxide compound film is formed in a third sputtering cavity, a silicon nitride compound film is formed in a fourth sputtering cavity, and a multi-layer film is formed on a glass substrate.

It is noted that, herein, relational terms such as first and second, and the like may be used solely to distinguish one entity or action from another entity or action without necessarily requiring or implying any actual such relationship or order between such entities or actions. Also, the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or apparatus.

Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that changes, modifications, substitutions and alterations can be made in these embodiments without departing from the principles and spirit of the invention, the scope of which is defined in the appended claims and their equivalents.