阅读说明：本技术 一种聚焦型线性阳极层离子源 (Focusing type linear anode layer ion source ) 是由 陈伟 高生 何国军 于 2019-11-04 设计创作，主要内容包括：本发明属于离子源技术领域,具体涉及一种聚焦型线性阳极层离子源,包括一具有长条状安装槽的壳体,所述安装槽的槽腔中心处设有一竖向布置的磁体,所述磁体与安装槽的槽壁之间设有阳极,所述安装槽的槽口中心处设有内阴极,所述内阴极的两侧对称布置有外阴极,所述外阴极与内阴极的磁极靴之间形成阴极缝隙,且该内阴极的最低面低于外阴极的最低面2-5mm；通过将内阴极的最低面设置成低于外阴极的最低面,内外阴极高度差所形成的磁场法线,控制喷射角度,形成聚焦效应可以显著的提高单位面积上的等离子体的数量,使得相同的功率下,该线性阳极层离子源能达到更较好的表面处理效果,或表面刻蚀,或薄膜表面辅助沉积的效果。(The invention belongs to the technical field of ion sources, and particularly relates to a focusing type linear anode layer ion source which comprises a shell with a long strip-shaped installation groove, wherein a vertically-arranged magnet is arranged at the center of a groove cavity of the installation groove, an anode is arranged between the magnet and the groove wall of the installation groove, an inner cathode is arranged at the center of a notch of the installation groove, outer cathodes are symmetrically arranged on two sides of the inner cathode, a cathode gap is formed between the outer cathode and a magnetic pole shoe of the inner cathode, and the lowest surface of the inner cathode is 2-5mm lower than the lowest surface of the outer cathode; the lowest surface of the inner cathode is set to be lower than that of the outer cathode, the magnetic field normal line formed by the height difference of the inner cathode and the outer cathode controls the spraying angle, the focusing effect is formed, the number of plasmas in a unit area can be obviously increased, and the linear anode layer ion source can achieve a better surface treatment effect or a surface etching effect or a film surface auxiliary deposition effect under the same power.)

1. The focusing type linear anode layer ion source is characterized by comprising a shell (10) with an elongated mounting groove (11), wherein a vertically-arranged magnet (20) is arranged at the center of a groove cavity of the mounting groove (11), an anode (30) is arranged between the magnet (20) and the wall of the mounting groove (11), an inner cathode (40) is arranged at the center of a notch of the mounting groove (11), outer cathodes (50) are symmetrically arranged on two sides of the inner cathode (40), a cathode gap (401) is formed between the outer cathodes (50) and magnetic pole shoes of the inner cathode (40), and the lowest surface of the inner cathode (40) is 2-5mm lower than the lowest surface of the outer cathode (50).

2. The focused linear anode layer ion source according to claim 1, wherein the anode (30) is a rectangular hollow square tube, and circulating cooling water is introduced into the rectangular hollow square tube to cool the anode (30).

3. The focused linear anode layer ion source according to claim 2, wherein the water supply pipe for communicating the rectangular hollow square pipe is provided with a water flow regulating valve for regulating the flow of the circulating cooling water, and the water outlet pipe is provided with a temperature detecting probe for detecting the temperature of the surface of the anode (30).

4. The focused linear anode layer ion source according to claim 1, wherein the magnet (20) and the bottom and two side walls of the mounting groove (11) enclose to form two independent discharge chambers (1), an anode support (12) is disposed in the discharge chamber (1), a gas injection hole (13) penetrating through the housing (10) is disposed at the bottom of the discharge chamber (1), the anode support (12) is provided with a continuous large-diameter gas inlet channel (121) and a continuous small-diameter gas inlet channel (122) which are communicated to the gas injection hole (13) for injecting gas into the discharge chamber (1), and the diameter of the gas injection hole (13) is smaller than that of the large-diameter gas inlet channel (121).

5. The focused linear anode layer ion source according to claim 4, wherein the gas injection hole (13) has a hole diameter ratio to the large diameter section gas inlet channel (121) of 1: (1.5-3); the aperture ratio of the large-diameter section air inlet channel (121) to the small-diameter section air inlet channel (122) is (1.5-2.5): 1.

6. the focused linear anode layer ion source according to claim 4, wherein a gas distribution block (60) is disposed at a gas inlet end of the gas injection hole (13), the gas distribution block (60) has a receiving space to form a gas inlet chamber (61), a gas inlet channel (601) is disposed on the gas distribution block (60) to communicate the gas injection hole (13) with the gas inlet chamber (61), and a gas supply assembly (62) is disposed on a side of the gas distribution block (60) away from the housing (10) to supply gas to the gas inlet chamber (61).

7. The focusing type linear anode layer ion source according to claim 1, wherein a plurality of concave cavities (41) are arranged on one side of the inner cathode (40) adjacent to the chamber of the installation groove (11), cathode cooling pipes (42) are embedded in the concave cavities (41), and circulating cooling water is filled in the cathode cooling pipes (42).

Technical Field

The invention belongs to the technical field of ion sources, and particularly relates to a focusing type linear anode layer ion source.

Background

The anode layer ion source is based on the theory of glow discharge and the movement of charged particles in an electromagnetic field, and the working principle is as follows: the high voltage is applied to the anode, the inner cathode and the outer cathode are grounded, the gas between the anode and the cathode generates glow discharge to generate a large amount of electrons and ions, the plasma enters the vacuum cavity through the slit outlet between the inner cathode and the outer cathode, and the electron movement track in the plasma can be bound due to the approximately orthogonal electric field and magnetic field at the outlet to form annular Hall current, so that the movement range of electrons is limited, the collision probability of the electrons and neutral gas molecules or atoms can be increased, and the ionization rate of the gas is improved. The positive ions in the area near the surface of the anode are extracted from the outlet under the common acceleration of the potential difference between the anode and the cathode and the Hall current to form an ion beam, so that the ion source is the anode layer ion source.

With the development of thin film materials and surface treatment technologies, the application requirements of people on ion sources are continuously improved, the anode layer ion source technology is also rapidly developed, according to different structural characteristics, the anode layer ion source can be divided into a cylindrical anode layer ion source and a linear anode layer ion source, although the two anode layer ion sources are different in geometric form, the anode layer ion source and the linear anode layer ion source both comprise structures such as an outer cathode, an inner cathode, an anode, a magnetic seat and a permanent magnet, and an electromagnetic field system, a gas distribution system, a water cooling system and other main parts of the ion source are constructed by the. The magnetic field distribution of the anode layer ion source has great influence on the extraction of ions, ion energy, ion beam current density, gas consumption and the like, and the distribution of magnetic lines of force must be reasonable in order to obtain ideal ion beam current for large-area uniform auxiliary coating and cleaning.

Disclosure of Invention

The invention aims to provide a focusing type linear anode layer ion source, which realizes the focusing control of plasma by controlling the ion emission angle of the anode layer ion source.

In order to achieve the purpose, the invention adopts the following technical scheme:

the utility model provides a linear anode layer ion source of focus type, includes a casing that has rectangular form mounting groove, the cell cavity center department of mounting groove is equipped with a vertical layout's magnet, be equipped with the positive pole between the cell wall of magnet and mounting groove, the notch center department of mounting groove is equipped with interior negative pole, the bilateral symmetry of interior negative pole has outer negative pole, form the negative pole gap between the magnetic pole boots of outer negative pole and interior negative pole, and the minimum face of this interior negative pole is less than the minimum face 2-5mm of outer negative pole.

Preferably, the anode is a rectangular hollow square tube, and circulating cooling water is introduced into the rectangular hollow square tube to cool the anode.

Preferably, a water supply pipe for communicating the rectangular hollow square pipe is provided with a water flow regulating valve for regulating the flow of circulating cooling water, and a water outlet pipe is provided with a temperature detection probe for detecting the temperature of the surface of the anode.

Preferably, the magnet and the groove bottom and the two side groove walls of the mounting groove enclose to form two independent discharge chambers, an anode support is arranged in the discharge chamber, a gas injection hole penetrating through the shell is formed in the bottom of the discharge chamber, a continuous large-diameter section gas inlet channel and a continuous small-diameter section gas inlet channel are arranged on the anode support and communicated to the gas injection hole to inject gas into the discharge chamber, and the aperture of the gas injection hole is smaller than that of the large-diameter section gas inlet channel.

Preferably, the aperture ratio of the gas injection hole to the large-diameter section gas inlet passage is 1: (1.5-3); the aperture ratio of the large-diameter section air inlet channel to the small-diameter section air inlet channel is (1.5-2.5): 1.

preferably, the inlet end department in gas injection hole is equipped with the branch gas piece, the branch gas piece a accommodation space has and constitutes the storehouse of admitting air, the branch gas piece on be equipped with inlet channel intercommunication gas injection hole and the storehouse of admitting air, the branch gas piece keep away from one side of casing and be equipped with the air feed subassembly and supply air to in the storehouse of admitting air.

Preferably, one side of the inner cathode close to the groove cavity of the mounting groove is provided with a plurality of concave cavities, cathode cooling pipes are embedded in the concave cavities, and circulating cooling water is introduced into the cathode cooling pipes.

Compared with the prior art, the invention has the following technical effects:

according to the focusing type linear anode layer ion source provided by the invention, the lowest surface of the inner cathode is set to be lower than the lowest surface of the outer cathode, so that an acute angle is formed between the opening connecting line of the cathode gaps at two sides and the anode plane, ions and electrons generated after gas molecules are ionized are ejected outwards under the pushing of the vacuum pressure difference between the ion source cavity and the outside, and the ejection angle is controlled by the magnetic field normal line formed by the height difference of the inner cathode and the outer cathode to form a focusing effect. Therefore, the number of plasmas in a unit area can be obviously increased, so that the linear anode layer ion source can achieve a better surface treatment effect, or a surface etching effect, or a film surface auxiliary deposition effect under the same power.

Additional features and advantages of the invention will be set forth in the detailed description which follows.

Drawings

FIG. 1 is a cross-sectional view of a focused linear anode layer ion source according to the present invention;

FIG. 2 is an exploded view of the ion source of the linear anode layer of FIG. 1;

FIG. 3 is a schematic diagram of a focusing type linear anode layer ion source provided by the present invention;

FIG. 4 is a photograph of test example 1 before fingerprint cleaning;

FIG. 5 is a photograph of the finger print of FIG. 4 after 10 minutes of cleaning;

FIG. 6 is a photograph of a substrate in test example 2 before cleaning;

FIG. 7 is a photograph of the substrate of FIG. 6 after 5 minutes of cleaning;

FIG. 8 is a photograph of the substrate of FIG. 6 after 10 minutes of cleaning;

the reference numbers in the figures illustrate: 1-discharge chamber, 10-shell, 11-mounting groove, 12-anode support, 121-large diameter section air inlet channel, 122-small diameter section air inlet channel, 123-anode insulating pad, 13-air injection hole, 20-magnet, 201-upper pole shoe, 202-lower pole shoe, 30-anode, 40-inner cathode, 401-cathode gap, 41-cavity, 42-cathode cooling tube, 50-outer cathode, 60-air distribution block, 601-air inlet channel, 61-air inlet bin and 62-air supply assembly.

Detailed Description

In order to make the technical means, the creation characteristics, the achievement purposes and the effects of the invention easy to understand, the invention is further clarified by combining the specific drawings.

It will be understood that when an element is referred to as being "secured to" another element, it can be directly on the other element or intervening elements may also be present. When an element is referred to as being "connected" to another element, it can be directly connected to the other element or intervening elements may also be present. The terms "vertical," "horizontal," "left," "right," and the like as used herein are for illustrative purposes only and do not denote a unique embodiment.

Unless defined otherwise, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. The terminology used herein in the description of the invention is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention. As used herein, the term "and/or" includes any and all combinations of one or more of the associated listed items.

Referring to fig. 1 and 2, the present invention provides a focusing type linear anode layer ion source, which includes a housing 10 having an elongated mounting groove 11, a magnet 20 arranged vertically is disposed at the center of the cavity of the mounting groove 11, an anode 30 is disposed between the magnet 20 and the wall of the mounting groove 11, an inner cathode 40 is disposed at the center of the notch of the mounting groove 11, outer cathodes 50 are symmetrically disposed at two sides of the inner cathode 40, a cathode gap 401 is formed between the outer cathode 50 and the magnetic pole shoes of the inner cathode 40, and the lowest surface of the inner cathode 40 is 2-5mm lower than the lowest surface of the outer cathode 50.

According to the linear anode layer ion source provided by the invention, the lowest surface of the inner cathode 40 is set to be 2-5mm lower than the lowest surface of the outer cathode 50, so that the opening of the cathode gap 401 forms an included angle relative to the emission surface of the anode 30, ions and electrons generated after gas molecules are ionized are ejected outwards under the pushing of the vacuum pressure difference between the ion source cavity and the outside, and the ejection angle is controlled by the magnetic field normal line formed by the height difference between the inner cathode and the outer cathode to form a focusing effect. Therefore, the number of plasmas in a unit area can be obviously increased, so that the linear anode layer ion source can achieve a better surface treatment effect, or a surface etching effect, or a film surface auxiliary deposition effect under the same power.

In the present invention, the magnet 20 is a columnar permanent magnet capable of forming a magnetic field in a vertical direction. The upper end of the magnet 20 is provided with an upper pole shoe 201 and is abutted against the inner cathode 40, and the lower end is provided with a lower pole shoe 202 and is abutted against the groove bottom of the mounting groove 11.

Further, according to the present invention, in a specific embodiment of the present invention, the anode 30 is a rectangular hollow square tube, and the anode 30 is cooled by introducing circulating cooling water into the rectangular hollow square tube. It should be noted that, in the conventional linear anode layer ion source, a hollow pipe with a diameter of 6mm-8mm is embedded in the anode for cooling the anode, and the anode is indirectly cooled by introducing large-flow circulating cooling water into the hollow pipe, however, this cooling method cannot effectively maintain the whole ion source within a normal temperature range under high-power and long-time working conditions. Therefore, the anode 30 is set into the rectangular hollow square tube, and the circulating cooling water is directly introduced into the rectangular hollow square tube, so that the direct cooling of the anode 30 is realized, the implementation of the technical scheme obviously improves the cooling effect of the anode 30, the traditional welding process required for embedding the hollow tube into the anode is omitted, the welding process is omitted, the water leakage condition caused by weld joint cracking is avoided, and the reliability of water cooling is improved; specifically, the anode 30 may be made of a thick-wall stainless steel square tube to obtain the maximum cooling effect, thereby bearing high power.

Further, according to the present invention, a water supply pipe for communicating the rectangular hollow square pipe is provided with a water flow regulating valve for regulating the flow rate of the circulating cooling water, and a water outlet pipe is provided with a temperature detecting probe for detecting the temperature of the surface of the anode 30. By adding the temperature detection probe and the water flow regulating valve in the water cooling system, the temperature of the surface of the anode 30 is accurately controlled, the plasma ionization rate is controlled under different powers, the same linear anode layer ion source is realized, and the kinetic energy requirements of high-pressure cleaning and low-pressure auxiliary deposition can be met simultaneously. Specifically, the inventor of the present application finds that, by adopting the technical scheme provided by the present invention, the linear anode layer ion source can stably operate for a long time under the high power condition that the current is 8A and the voltage is 420V.

In the invention, the magnet 20 and the groove bottom and two side groove walls of the mounting groove 11 are enclosed to form two independent discharge chambers 1, an anode support 12 is arranged in the discharge chamber 1, a gas injection hole 13 penetrating through the shell 10 is arranged at the bottom of the discharge chamber 1, the anode support 12 is provided with a continuous large-diameter section gas inlet channel 121 and a continuous small-diameter section gas inlet channel 122 which are communicated with the gas injection hole 13 to inject gas into the discharge chamber 1, and the aperture of the gas injection hole 13 is smaller than that of the large-diameter section gas inlet channel 121. Specifically, the anode support 12 is provided with an anode insulating pad 123, and the anode 30 is fixed on the anode insulating pad 123. The plurality of gas injection holes 13 are formed along the length direction of the housing 10, so that multi-point gas injection is realized, and the most uniform gas ionization effect can be obtained even if the ion source is lengthened.

In a specific use process, the gas is injected in a multi-stage pore size changing mode, so that the streaming phenomenon of high-pressure gas caused by a gas supply bottle can be relieved; in addition, the gas enters the discharge chamber 1 through the gas injection hole 13, the large-diameter gas inlet channel 121 and the small-diameter gas inlet channel 122, the pressure of the gas supply bottle is effectively buffered due to the multi-stage diameter change of the gas channel, and the flow rate of the gas entering the discharge chamber is slowed; the difference in vacuum pressure outside the discharge chamber and the ion source is changed so that the low flow rate gas achieves sufficient ionization in the discharge chamber.

Further, the aperture ratio of the gas injection holes 13 to the large-diameter section gas inlet passage 121 is 1: (1.5-3); the aperture ratio of the large-diameter section air inlet passage 121 to the small-diameter section air inlet passage 122 is (1.5-2.5): 1.

in the invention, the gas distribution block 60 is arranged at the gas inlet end of the gas injection hole 13, the gas distribution block 60 is provided with an accommodating space to form a gas inlet bin 61, a gas inlet channel 601 is arranged on the gas distribution block 60 to communicate the gas injection hole 13 with the gas inlet bin 61, and a gas supply assembly 62 is arranged on one side of the gas distribution block 60, which is far away from the shell 10, to supply gas to the gas inlet bin 61.

In the invention, a plurality of cavities 41 are arranged on one side of the inner cathode 40 close to the groove cavity of the mounting groove 11, cathode cooling pipes 42 are embedded in the cavities 41, and circulating cooling water is introduced into the cathode cooling pipes 42. Specifically, two cavities 41 are provided.

In a specific embodiment of the present invention, as shown in fig. 3, the outer cathodes 50 located at both sides of the anode 30 are fixedly connected to both ends of the casing 10 to form a structure with a strip-shaped through hole at the center, and the inner cathode 40 is disposed at the strip-shaped through hole and forms an annular cathode gap 401 with the outer cathodes.

The focusing type linear anode layer ion source provided by the invention is flexible in installation mode, can be hoisted and can also be installed by adopting a flange. The inner cathode 40 is fixed on the housing 10 via the magnet 20, and the outer cathode 50 is fixed on the wall of the mounting groove 11, that is, the inner cathode 40 and the outer cathode 50 can be independently disassembled, and maintenance and repair can be performed without disassembling the whole.