阅读说明：本技术 废液存储装置和湿式蚀刻系统 (Waste liquid storage device and wet etching system ) 是由 徐蕊 曹飞 钟仁聪 于 2017-08-16 设计创作，主要内容包括：一种废液存储装置(10)及具有该废液存储装置(10)的湿式蚀刻系统,用于存储湿式蚀刻产生的废液(20),废液(20)包括第一溶质(22)和第二溶质(24),第二溶质(24)为第一溶质(22)发生放热氧化反应的催化剂,废液存储装置(10)包括第一储液罐(11)和连接外部的络合剂溶液源(30)与第一储液罐(11)的第一管路(12),第一储液罐(11)用于存储废液(20),第一管路(12)用于将络合剂(32)导引到第一储液罐(11),络合剂(32)用于抑制第二溶质(24)对第一溶质(22)反应的催化能力。其中,湿式蚀刻系统(100)包括用于蚀刻工件和产生废液(20)的湿式蚀刻机台(40)和废液存储装置(10)。(The utility model provides a waste liquid storage device (10) and have wet etching system of this waste liquid storage device (10), be used for saving waste liquid (20) that wet etching produced, waste liquid (20) include first solute (22) and second solute (24), second solute (24) are the catalyst that first solute (22) took place exothermic oxidation reaction, waste liquid storage device (10) include first liquid storage pot (11) and connect outside complexing agent solution source (30) and first pipeline (12) of first liquid storage pot (11), first liquid storage pot (11) are used for storing waste liquid (20), first pipeline (12) are used for leading complexing agent (32) to first liquid storage pot (11), complexing agent (32) are used for restraining the catalytic power of second solute (24) to first solute (22) reaction. The wet etching system (100) comprises a wet etching machine table (40) and a waste liquid storage device (10), wherein the wet etching machine table is used for etching workpieces and generating waste liquid (20).)

A waste liquid storage device for storing a waste liquid generated by wet etching, the waste liquid including a first solute and a second solute that is a catalyst for an exothermic oxidation reaction of the first solute, the waste liquid storage device comprising:

the first liquid storage tank is used for storing the waste liquid; and

a first conduit connecting an external source of a complexing agent solution to the first reservoir, the first conduit for directing the complexing agent to the first reservoir, the complexing agent for inhibiting catalytic ability of the second solute to react with the first solute.

The waste liquid storage device of claim 1, wherein the first solute comprises H2O 2;

the second solute comprises copper ions and molybdenum ions;

the complexing agent comprises an ethylenediaminetetraacetic acid solution.

The waste liquid storage device according to claim 2, wherein a ph value of the complexing agent is acidic, and a ph value of the waste liquid after the complexing reaction between the complexing agent and the second solute is acidic.

The waste fluid storage device of claim 1, comprising a second pipe connecting a wet etcher to the first tank, the second pipe being configured to guide the waste fluid generated by the wet etcher to the first tank.

The waste liquid storage device according to claim 4, wherein the waste liquid storage device comprises a first detection device, and the first detection device is connected with the second pipeline and is used for sampling and detecting the concentration of the second solute.

The waste liquid storage device according to claim 5, wherein the first detection means detects the second solute concentration when the waste liquid flows in the second line and detects the second solute concentration again at a predetermined time interval.

The waste liquid storage device of claim 6, comprising:

a first valve disposed on the first line; and

and a first controller connected with the first detection device and the first valve, wherein the first controller controls the opening degree of the first valve according to the concentration so as to stably inhibit the catalytic capacity of the second solute for reacting with the first solute.

The waste liquid storage device of claim 7, comprising:

the early warning device is used for sending out an early warning signal; and

connect early warning device's second detection device, second detection device is used for detecting in the first liquid storage pot the temperature of waste liquid, early warning device is in send early warning signal when the temperature is higher than first predetermined temperature.

The waste liquid storage device of claim 8, comprising a third conduit connecting an external source of ice water to the first reservoir, the third conduit for directing the ice water to the first reservoir, the ice water for reducing the temperature of the waste liquid.

The waste liquid storage device of claim 9, comprising:

a second valve disposed in the third line; and

and the second controller is connected with the second valve and the second detection device and is used for controlling the second valve to be opened and closed so as to control whether the third pipeline flows out the ice water or not.

The waste liquid storage device of claim 10, wherein the second controller controls the second valve to open when the temperature is higher than the first predetermined temperature to control the third pipeline to flow the ice water out to the first liquid storage tank.

The waste liquid storage device of claim 11, wherein after the second valve is opened, when the temperature of the waste liquid decreases to a second predetermined temperature, the second controller closes the second valve to control the third pipeline to stop flowing the ice water out to the first liquid storage tank.

The waste fluid storage device of claim 1, comprising a fourth conduit connecting the first and second fluid reservoirs, the fourth conduit being disposed at a bottom of the first fluid reservoir where the waste fluid accumulates, the fourth conduit being configured to direct the waste fluid in the first fluid reservoir to the second fluid reservoir.

The waste fluid storage device of claim 13, wherein the fourth conduit is provided with a first water pump for pumping the waste fluid from the first reservoir to the second reservoir.

A wet etching system, comprising:

the wet etching machine is used for etching the workpiece and generating waste liquid; and

a waste liquid storage device as claimed in any of claims 1 to 14.

A wet etching system as recited in claim 15, wherein the wet etching system includes the second reservoir for storing the waste fluid purged from the waste fluid storage device.

The wet etching system of claim 16, wherein the second reservoir includes a third detection device for detecting a temperature of the waste fluid in the second reservoir.

The wet etching system of claim 17, wherein the second tank is provided with a fifth pipe connected to the outside, the fifth pipe being provided at a bottom of the second tank where the waste liquid accumulates, the fifth pipe being for guiding the waste liquid in the second tank to the outside.

A wet etching system according to claim 18, wherein the fifth pipe is provided with a second water pump for pumping the waste liquid in the second liquid storage tank to the outside.