阅读说明：本技术 废液存储装置和湿式蚀刻系统 (Waste liquid storage device and wet etching system ) 是由 徐蕊 曹飞 钟仁聪 于 2017-08-16 设计创作，主要内容包括：一种废液存储装置(10)及具有该废液存储装置(10)的湿式蚀刻系统,用于存储湿式蚀刻产生的废液(20),废液(20)包括第一溶质(22)和第二溶质(24),第二溶质(24)为第一溶质(22)发生放热氧化反应的催化剂,废液存储装置(10)包括第一储液罐(11)和连接外部的络合剂溶液源(30)与第一储液罐(11)的第一管路(12),第一储液罐(11)用于存储废液(20),第一管路(12)用于将络合剂(32)导引到第一储液罐(11),络合剂(32)用于抑制第二溶质(24)对第一溶质(22)反应的催化能力。其中,湿式蚀刻系统(100)包括用于蚀刻工件和产生废液(20)的湿式蚀刻机台(40)和废液存储装置(10)。(The utility model provides a waste liquid storage device (10) and have wet etching system of this waste liquid storage device (10), be used for saving waste liquid (20) that wet etching produced, waste liquid (20) include first solute (22) and second solute (24), second solute (24) are the catalyst that first solute (22) took place exothermic oxidation reaction, waste liquid storage device (10) include first liquid storage pot (11) and connect outside complexing agent solution source (30) and first pipeline (12) of first liquid storage pot (11), first liquid storage pot (11) are used for storing waste liquid (20), first pipeline (12) are used for leading complexing agent (32) to first liquid storage pot (11), complexing agent (32) are used for restraining the catalytic power of second solute (24) to first solute (22) reaction. The wet etching system (100) comprises a wet etching machine table (40) and a waste liquid storage device (10), wherein the wet etching machine table is used for etching workpieces and generating waste liquid (20).)