阅读说明：本技术 微镜装置的寿命预测方法及装置、计算机可读存储介质 (Method and apparatus for predicting life span of micro-mirror device, and computer readable storage medium ) 是由 李帆雅 魏迪 沈文江 于 2020-04-24 设计创作，主要内容包括：本发明公开了一种微镜装置的寿命预测方法。所述寿命预测方法包括：获取到N个微镜装置组中各个微镜装置组在各自相应的偏转应力下的疲劳次数；根据各个微镜装置组各自相应的偏转应力和疲劳次数,获得对微镜装置的寿命进行预测的寿命预测模型。本发明还提供了一种微镜装置的寿命预测装置装置和和计算机可读存储存储介质。本发明能够实现对微镜装置的寿命的预测。此外,本发明的预测不需要高温等恶劣环境,不需要任何设备,操作简单,常温即可完成加速老化进程。进一步地,还可以节省时间,能够快速预估微镜装置的寿命。(The invention discloses a method for predicting the service life of a micromirror device. The life prediction method comprises the following steps: acquiring the fatigue times of each micromirror device group in the N micromirror device groups under respective corresponding deflection stress; and obtaining a service life prediction model for predicting the service life of the micro-mirror device according to the deflection stress and fatigue times corresponding to each micro-mirror device group. The invention also provides a life-span predicting device of the micro-mirror device and a computer readable storage medium. The invention can realize the prediction of the service life of the micro-mirror device. In addition, the method does not need severe environments such as high temperature and the like, does not need any equipment, is simple to operate, and can finish the accelerated aging process at normal temperature. Further, time can be saved and the life span of the micromirror device can be estimated quickly.)

1. A method for predicting a lifetime of a micromirror device, the method comprising:

acquiring the fatigue times of each micromirror device group in the N micromirror device groups under respective corresponding deflection stress;

and obtaining a service life prediction model for predicting the service life of the micro-mirror device according to the deflection stress and fatigue times corresponding to each micro-mirror device group.

2. The method of claim 1, wherein each micromirror device group comprises M micromirror devices, wherein different micromirror device groups have different deflection stresses, each micromirror device in the ith micromirror device group has the same deflection stress, and each micromirror device in the ith micromirror device group has the same deflection frequency;

wherein calculating the fatigue times of each micromirror device group of the N micromirror device groups under respective corresponding deflection stresses comprises:

acquiring fatigue time of each micro-mirror device in the ith micro-mirror device group under the same corresponding deflection stress, wherein i is more than or equal to 1 and less than or equal to N, and i is a positive integer;

dividing the sum of the fatigue time of each micro-mirror device in the ith micro-mirror device group by the number M of the micro-mirror devices in the ith micro-mirror device group to calculate the average fatigue time of the ith micro-mirror device group;

the average fatigue time of the ith micromirror device group is multiplied by the same deflection frequency corresponding to each micromirror device in the ith micromirror device group to calculate the fatigue times of the ith micromirror device group.

3. The lifetime prediction method of claim 2, wherein each micromirror device in the ith micromirror device group corresponds to the same deflection stress i τ, wherein τ represents a reference deflection stress.

4. The life prediction method according to any one of claims 1 to 3, wherein the life prediction model is a linear life prediction model, the independent variable of the linear life prediction model is the logarithm of the deflection stress, and the dependent variable of the linear life prediction model is the logarithm of the fatigue number.

5. The method of claim 4, wherein obtaining a linear life prediction model for predicting the life of the micromirror device according to the respective deflection stress and fatigue times of each micromirror device group comprises:

constructing a nonlinear life prediction model by utilizing the deflection stress and the fatigue times corresponding to each micromirror device group, wherein the independent variable of the nonlinear life prediction model is the negative constant power of the deflection stress, and the dependent variable of the nonlinear life prediction model is the fatigue times;

and respectively taking logarithms of the dependent variable and the sub-variable of the nonlinear life prediction model to construct and obtain the linear life prediction model.

6. A lifetime prediction apparatus of a micromirror device, the lifetime prediction apparatus comprising:

a fatigue number acquisition module configured to acquire a fatigue number of each micromirror device group of the N micromirror device groups under respective corresponding deflection stresses;

and the service life model acquisition module is configured to acquire a service life prediction model for predicting the service life of the micro-mirror device according to the deflection stress and the fatigue times corresponding to each micro-mirror device group.

7. The lifetime prediction device of claim 6, wherein each micromirror device group comprises M micromirror devices, wherein different micromirror device groups have different deflection stresses, each micromirror device in the ith micromirror device group has the same deflection stress, and each micromirror device in the ith micromirror device group has the same deflection frequency;

wherein, the fatigue number obtaining module comprises:

the fatigue time acquisition unit is used for acquiring the fatigue time of each micromirror device in the ith micromirror device group under the corresponding same deflection stress, wherein i is more than or equal to 1 and less than or equal to N, and i is a positive integer;

an average fatigue time calculation unit configured to calculate an average fatigue time of an ith micro-mirror device group by dividing a sum of fatigue times of respective micro-mirror devices in the ith micro-mirror device group by a number M of micro-mirror devices in the ith micro-mirror device group;

and a fatigue number calculating unit configured to calculate a fatigue number of the ith micro-mirror device group by multiplying an average fatigue time of the ith micro-mirror device group by the same deflection frequency corresponding to each micro-mirror device in the ith micro-mirror device group.

8. The life prediction device according to claim 6 or 7, wherein the life prediction model is a linear life prediction model, the independent variable of the linear life prediction model is a logarithm of a deflection stress, and the dependent variable of the linear life prediction model is a logarithm of a fatigue number.

9. The life prediction device of claim 8, wherein the life model acquisition module comprises:

a nonlinear model construction unit configured to construct a nonlinear life prediction model using respective deflection stress and fatigue frequency corresponding to each micromirror device group, wherein an independent variable of the nonlinear life prediction model is a negative constant power of the deflection stress, and a dependent variable of the nonlinear life prediction model is the fatigue frequency;

and the linear model construction unit is configured to respectively take logarithms of the dependent variable and the sub-variable of the nonlinear life prediction model so as to construct and obtain the linear life prediction model.

10. A computer-readable storage medium, wherein a lifetime prediction program of a micro mirror device is stored on the computer-readable storage medium, and when executed by a processor, the lifetime prediction program of the micro mirror device implements a lifetime prediction method of a micro mirror device according to any one of claims 1 to 5.

Technical Field

The invention belongs to the technical field of micro-electronic machinery, and particularly relates to a method and a device for predicting the service life of a micro-mirror device and a computer readable storage medium.

Background

The micro-mirror device is an optical device manufactured by using precise micro-nano processing technologies such as photoetching, etching, film growth and the like, and a specific driver is used for enabling a micro-mirror surface to deflect at a certain frequency and angle, so that the micro-mirror device can be used as an important element in a light path and can realize functions such as light beam transmission, laser pointing deflection, 3D scanning and the like.

For micromirror devices, the way they fail includes: fatigue due to the number of operations, breakage due to external shock and/or vibration, and the like, and thus the lifetime reliability of the micromirror device is crucial as a device playing a key role in various application scenarios. Therefore, it is desirable to provide a method that can predict the lifetime of a micromirror device.

Disclosure of Invention

In order to solve the above-mentioned technical problems of the prior art, an object of the present invention is to provide a method and an apparatus for predicting a lifetime of a micromirror device, and a computer-readable storage medium.

According to an aspect of the present invention, there is provided a lifetime prediction method of a micromirror device, the lifetime prediction method comprising: acquiring the fatigue times of each micromirror device group in the N micromirror device groups under respective corresponding deflection stress; and obtaining a service life prediction model for predicting the service life of the micro-mirror device according to the deflection stress and fatigue times corresponding to each micro-mirror device group.

In a method for predicting a lifetime of a micromirror device according to an aspect of the present invention, each micromirror device group includes M micromirror devices, wherein different micromirror device groups have different corresponding deflection stresses, each micromirror device in an ith micromirror device group corresponds to a same deflection stress, and each micromirror device in the ith micromirror device group corresponds to a same deflection frequency; wherein calculating the fatigue times of each micromirror device group of the N micromirror device groups under respective corresponding deflection stresses comprises: acquiring fatigue time of each micro-mirror device in the ith micro-mirror device group under the same corresponding deflection stress, wherein i is more than or equal to 1 and less than or equal to N, and i is a positive integer; dividing the sum of the fatigue time of each micro-mirror device in the ith micro-mirror device group by the number M of the micro-mirror devices in the ith micro-mirror device group to calculate the average fatigue time of the ith micro-mirror device group; the average fatigue time of the ith micromirror device group is multiplied by the same deflection frequency corresponding to each micromirror device in the ith micromirror device group to calculate the fatigue times of the ith micromirror device group.

In a method for predicting a lifetime of a micromirror device according to an aspect of the present invention, each micromirror device in an ith micromirror device group corresponds to the same deflection stress i τ, wherein τ represents a reference deflection stress.

In a lifetime prediction method of a micromirror device according to an aspect of the present invention, the lifetime prediction model is a linear lifetime prediction model whose independent variable is a logarithm of a deflection stress and whose dependent variable is a logarithm of a fatigue number.

In a method for predicting a lifetime of a micromirror device according to an aspect of the present invention, obtaining a linear lifetime prediction model for predicting a lifetime of a micromirror device according to respective deflection stresses and fatigue times corresponding to respective groups of micromirror devices includes: constructing a nonlinear life prediction model by utilizing the deflection stress and the fatigue times corresponding to each micromirror device group, wherein the independent variable of the nonlinear life prediction model is the negative constant power of the deflection stress, and the dependent variable of the nonlinear life prediction model is the fatigue times; and respectively taking logarithms of the dependent variable and the sub-variable of the nonlinear life prediction model to construct and obtain the linear life prediction model.

According to another aspect of the present invention, there is also provided a lifetime prediction apparatus of a micromirror device, the lifetime prediction apparatus including: a fatigue number acquisition module configured to acquire a fatigue number of each micromirror device group of the N micromirror device groups under respective corresponding deflection stresses; and the service life model acquisition module is configured to acquire a service life prediction model for predicting the service life of the micro-mirror device according to the deflection stress and the fatigue times corresponding to each micro-mirror device group.

In a lifetime prediction apparatus of a micromirror device according to another aspect of the present invention, each micromirror device group comprises M micromirror devices, wherein different micromirror device groups have different corresponding deflection stresses, each micromirror device in the ith micromirror device group corresponds to the same deflection stress, and each micromirror device in the ith micromirror device group corresponds to the same deflection frequency; wherein, the fatigue number obtaining module comprises: the fatigue time acquisition unit is used for acquiring the fatigue time of each micromirror device in the ith micromirror device group under the corresponding same deflection stress, wherein i is more than or equal to 1 and less than or equal to N, and i is a positive integer; an average fatigue time calculation unit configured to calculate an average fatigue time of an ith micro-mirror device group by dividing a sum of fatigue times of respective micro-mirror devices in the ith micro-mirror device group by a number M of micro-mirror devices in the ith micro-mirror device group; and a fatigue number calculating unit configured to calculate a fatigue number of the ith micro-mirror device group by multiplying an average fatigue time of the ith micro-mirror device group by the same deflection frequency corresponding to each micro-mirror device in the ith micro-mirror device group.

In the lifetime prediction apparatus of a micromirror device according to another aspect of the present invention, the lifetime prediction model is a linear lifetime prediction model whose independent variable is a logarithm of a deflection stress and whose dependent variable is a logarithm of a fatigue number.

In a lifetime prediction apparatus of a micromirror device according to another aspect of the present invention, the lifetime model obtaining module comprises: a nonlinear model construction unit configured to construct a nonlinear life prediction model using respective deflection stress and fatigue frequency corresponding to each micromirror device group, wherein an independent variable of the nonlinear life prediction model is a negative constant power of the deflection stress, and a dependent variable of the nonlinear life prediction model is the fatigue frequency; and the linear model construction unit is configured to respectively take logarithms of the dependent variable and the sub-variable of the nonlinear life prediction model so as to construct and obtain the linear life prediction model.

According to still another aspect of the present invention, there is also provided a computer-readable storage medium having stored thereon a lifetime prediction program of a micromirror device, the lifetime prediction program of the micromirror device, when executed by a processor, implementing the lifetime prediction method of the micromirror device as described above.

The invention has the beneficial effects that: the invention realizes the prediction of the service life of the micromirror device by constructing a service life prediction model. In addition, the method and the device for predicting the service life of the micromirror device do not need severe environments such as high temperature and the like, do not need any equipment, are simple to operate, and can finish the accelerated aging process at normal temperature. Further, time can be saved and the life span of the micromirror device can be estimated quickly.

Drawings

The above and other aspects, features and advantages of embodiments of the present invention will become more apparent from the following description taken in conjunction with the accompanying drawings, in which:

FIG. 1 is a schematic diagram of a two-dimensional MEMS micro-mirror;

FIG. 2 is a flow chart of a method for lifetime prediction of a micro mirror device according to an embodiment of the present invention;

fig. 3 is a block diagram of a lifetime prediction apparatus of a micromirror device according to an embodiment of the invention.

Detailed Description

Hereinafter, specific embodiments of the present invention will be described in detail with reference to the accompanying drawings. This invention may, however, be embodied in many different forms and should not be construed as limited to the specific embodiments set forth herein. Rather, these embodiments are provided to explain the principles of the invention and its practical application to thereby enable others skilled in the art to understand the invention for various embodiments and with various modifications as are suited to the particular use contemplated.

The micro-mirror device, especially the MEMS micro-mirror device, has multiple orders of modal modes as a mechanically responsive structure, including, for example, a torsion mode, an in-plane sliding mode, an out-of-plane sliding mode, an in-plane rocking mode, and an out-of-plane rocking mode. In either mode, the micromirror device experiences fatigue during operation (mainly fatigue of the deflection axis carrying the micromirror for deflection), which leads to failure of the micromirror device due to fatigue.

The method for predicting the lifetime of the micromirror device according to the present invention can be applied to at least one of the above-mentioned modes. In the following, the description is made in a torsional mode and an out-of-plane rocking mode, and it is to be understood that the following description is also applicable to other modes.

Hereinafter, a lifetime prediction method of a micromirror device will be described in detail with a two-dimensional MEMS micromirror device as an example of the micromirror device. It should be understood, however, that the micromirror device of the present invention is not limited to two-dimensional MEMS micromirror devices, such as one-dimensional micromirror devices, three-dimensional micromirror devices, etc., all falling within the scope of the present invention. In a two-dimensional MEMS micro-mirror device, a torsion mode and/or an out-of-plane rocking mode is present, whereas in case of the torsion mode and/or the out-of-plane rocking mode, the deflection stress of the deflection axis is mainly torsion stress and/or bending stress. See the description below for details.

Fig. 1 is a schematic structural diagram of a two-dimensional MEMS micro-mirror. In fig. 1, the thicknesses of the respective members are not shown for convenience of illustration. It should be understood that in practice the components are of a certain thickness.

Referring to fig. 1, the two-dimensional MEMS micro-mirror device includes: micromirror 1, inner deflection axis 2, ring 3, and outer deflection axis 4.

Specifically, in the present embodiment, the number of the inner yaw axes 2 is two, but the present invention is not limited thereto. The micromirror 1 has a cylindrical shape, but the invention is not limited thereto. The two inner deflection axes 2 are connected to the side faces of the micromirror 1, respectively, and the axial extensions of the two inner deflection axes 2 meet the central axis of the micromirror 1. Of course, the central axis of the micromirror 1 refers to the line connecting the centers of the two bottom circles of the micromirror 1. Further, the axial directions of the two inner deflection shafts 2 are coincident (or collinear). In this way, the micromirror 1 can deflect about two internal deflection axes 2 (i.e., twist, in twist mode). The micromirror 1 shown in fig. 1 is deflected counterclockwise along two internal deflection axes 2, but this is only an example.

Further, the ring portion 3 surrounds the micromirror 1. Specifically, the ring portion 3 has a circular cylindrical shape, but this is merely an example, and the present invention is not limited thereto. The ring portion 3 and the micromirror 1 have the same central axis. The two inner yaw axes 2 are also connected to the inner annular surface of the ring portion 3. The number of the outer deflection shafts 4 is two, but the present invention is not limited thereto. The two outer deflection axes 4 are respectively connected to the outer annular surface of the ring portion 3, and the axial extensions of the two outer deflection axes 4 converge to the central axis of the micromirror 1, i.e., the central axis of the ring portion 3. Further, the axial directions of the two outer deflection shafts 4 are coincident (or collinear).

Thus, when the micromirror 1 is deflected (i.e., twisted, in the twisted mode) about the two inner deflection axes 2, the two outer deflection axes 4 can be excited to deflect up and down (i.e., bent, in the out-of-plane rocking mode) as shown in fig. 1, and at this time, the fatigue characteristics of the material from which the deflection axes (inner deflection axis 2 and outer deflection axis 4) are made are dominated by bending stress, so that the lifetime of the entire micromirror device can be predicted by predicting the lifetime of only the outer deflection axis 4. In contrast, in the case of a one-dimensional micromirror device (not including the ring portion 3 and the outer deflection axis 4), since the torsion stress is dominant, the lifetime of the entire micromirror device can be predicted by predicting the lifetime of the inner deflection axis 2. As can be appreciated from the description herein, the lifetime of a micromirror device is primarily determined by the lifetime of the deflection axis, and thus the lifetime of a micromirror device is predicted to be equal to the predicted lifetime of the deflection axis.

Some basic concepts are presented below.

First, the fatigue time of a micromirror device refers to the deflection time from when the micromirror device starts to deflect (acquire the deflection axis) at a certain deflection frequency to when the micromirror device fails.

Second, the number of times a micromirror device is fatigued refers to the fatigue of the micromirror device multiplied by the deflection frequency of the micromirror device.

Third, the normal deflection stress of the micromirror device refers to the deflection stress that the micromirror device is driven at the time of normal use. Therefore, it can be appreciated that the set deflection stress for lifetime prediction of the micromirror device of the present embodiment is at least partially not the normal deflection stress, as will be explained in detail below.

A lifetime prediction method and a lifetime prediction apparatus of a micromirror device according to an embodiment of the present invention are described in detail below with reference to the examples given above. It should be understood that for the two-dimensional micromirror device shown in fig. 1, the lifetime of the micromirror device is mainly determined by the bending stress of the deflection axis (outer deflection axis 4), and thus the deflection stress used to construct the lifetime prediction method refers to the bending stress. In addition, if a one-dimensional micromirror device is aimed at, the lifetime of the micromirror device is mainly determined by the torsional stress of the deflection axis, and thus the deflection stress used to construct the lifetime prediction method refers to the torsional stress.

Further, in the following description, N micromirror device groups are provided, where N is a positive integer greater than or equal to 1. Each micro-mirror device group comprises M micro-mirror devices, wherein M is a positive integer greater than or equal to 1; that is, a total of N M micromirror devices are provided. Wherein each of the N × M micromirror devices employs the micromirror device shown in fig. 1, that is, the N × M micromirror devices are identical.

In addition, the deflection stresses for each micromirror device set are set to be different. Here, preferably, the deflection stress corresponding to the ith micromirror device group is i τ, where τ represents the magnitude of the reference deflection stress, and 2 ≦ i ≦ N. That is, the 1 st micromirror device group corresponds to a deflection stress τ, the 2 nd micromirror device group corresponds to a deflection stress τ, … …, and so on, and the nth micromirror device group corresponds to a deflection stress τ.

Here, the deflection stress is a bending stress applied to the outer deflection axis 4 shown in fig. 1, and of course, different deflection stresses represent different angles of the outer deflection axis 4 shown in fig. 1 with respect to the horizontal plane. Moreover, it should be understood that for a certain group of micromirror devices, all micromirror devices included therein have the same deflection stress; that is, for the ith micromirror device group, the deflection stress corresponding to all micromirror devices in the ith micromirror device group is i τ.

In addition, the ith is setThe deflection frequency corresponding to each micromirror device set is f_iAnd all the micromirror devices in the ith micromirror device group have a deflection frequency of f_i. Of course, the deflection frequencies corresponding to different micromirror device sets may be the same or different, and the invention is not limited thereto.

Fig. 2 is a flowchart of a lifetime prediction method of a micromirror device according to an embodiment of the invention. Referring to fig. 2, a life span prediction method of a micro mirror device according to an embodiment of the present invention includes steps S110 and S120.

Specifically, in step S110, the number of times each micromirror device group among the N micromirror device groups has fatigue under the respective deflection stress is acquired.

As one embodiment for implementing step S110, the following is specific.

First of all, the first step is to,and acquiring the fatigue time of each micro-mirror device in the ith micro-mirror device group under the same corresponding deflection stress.

Specifically, the fatigue time of each micromirror device in the 1 st micromirror device group under the deflection stress τ is obtained. That is, for the 1 st micromirror device group, the fatigue time of each micromirror device included therein under the action of the deflection stress τ can be obtained, thereby obtaining M fatigue times for the 1 st micromirror device group.

The fatigue time of each micromirror device in the 2 nd micromirror device group under the deflection stress of 2 τ is obtained. That is, for the 2 nd micromirror device group, the fatigue time of each micromirror device included therein under the action of the deflection stress of 2 τ can be obtained, thereby obtaining M fatigue times for the 2 nd micromirror device group.

……

And so on; and acquiring the fatigue time of each micro-mirror device in the Nth micro-mirror device group under the action of the deflection stress Ntau. That is, for the nth micromirror device group, the fatigue time of each micromirror device included therein under the action of the deflection stress of N τ can be obtained, thereby obtaining M fatigue times for the nth micromirror device group.

Secondly, the first step is to carry out the first,the average fatigue time of the ith micromirror device group is calculated by dividing the sum of the fatigue times of the respective micromirror devices in the ith micromirror device group by the number M of micromirror devices in the ith micromirror device group.

Specifically, the sum of the fatigue times for the respective micromirror devices in the 1 st micromirror device group (i.e., the sum of M fatigue times for the 1 st micromirror device group) is divided by the number M of micromirror devices in the 1 st micromirror device group to calculate the average fatigue time for the 1 st micromirror device group.

The average fatigue time for the 2 nd micromirror device group is calculated by dividing the sum of the fatigue times for each micromirror device in the 2 nd micromirror device group (i.e., the sum of M fatigue times for the 2 nd micromirror device group) by the number M of micromirror devices in the 2 nd micromirror device group.

……

And so on; the average fatigue time for the nth micromirror device group is calculated by dividing the sum of the fatigue times for each micromirror device in the nth micromirror device group (i.e., the sum of M fatigue times for the nth micromirror device group) by the number M of micromirror devices in the nth micromirror device group.

Finally, the process is carried out in a batch,the average fatigue time of the ith micromirror device group is multiplied by the same deflection frequency corresponding to each micromirror device in the ith micromirror device group to calculate the fatigue times of the ith micromirror device group.

Specifically, the average fatigue time of the 1 st micromirror device group is multiplied by the same deflection frequency corresponding to each micromirror device in the 1 st micromirror device group (i.e. the deflection frequency corresponding to the 1 st micromirror device group) to calculate the fatigue frequency of the 1 st micromirror device group.

The average fatigue time of the 2 nd micromirror device group is multiplied by the same deflection frequency corresponding to each micromirror device in the 2 nd micromirror device group (i.e. the deflection frequency corresponding to the 2 nd micromirror device group) to calculate the fatigue times of the 2 nd micromirror device group.

……

And so on; the fatigue times of the nth micromirror device group are calculated by multiplying the average fatigue time of the nth micromirror device group by the same deflection frequency corresponding to each micromirror device in the nth micromirror device group (i.e., the deflection frequency corresponding to the nth micromirror device group).

With continued reference to fig. 2, in step S120, a lifetime prediction model for predicting the lifetime of the micromirror device is obtained according to the respective deflection stress and fatigue times of each micromirror device group.

As one embodiment for implementing step S120, the following is specific.

First of all, the first step is to,and constructing a nonlinear life prediction model by utilizing the deflection stress and the fatigue times corresponding to each micromirror device group, wherein the independent variable of the nonlinear life prediction model is the negative constant power of the deflection stress, and the dependent variable of the nonlinear life prediction model is the fatigue times.

Specifically, as can be seen from the above, each micromirror device group has a corresponding deflection stress and fatigue times. For example, the first micromirror device group has a deflection stress S₁(deflection stress of τ) and fatigue number Q₁(ii) a The second micromirror device group has a deflection stress S₂(deflection stress of 2. tau.) and fatigue number Q₂(ii) a … …, respectively; the Nth micromirror device group has a deflection stress S_N(deflection stress of N tau) and fatigue number Q_N. Thus, the deflection stress is plotted on the abscissa and the fatigue frequency is plotted on the ordinate, i.e., the coordinate (S)₁，Q₁) Coordinate (S)₂， Q₂) … …, coordinates (S)_N，Q_N) A graph is fitted, and the graph is represented by a nonlinear life prediction model. That is, the non-linear life prediction model may be expressed as: KS^-nWhere Q represents the number of yaw, S represents the yaw stress, K represents a normal number (model constant), and n also represents a normal number. That is, the independent variable of the nonlinear life prediction model is the negative constant power of the deflection stress, and the dependent variable of the nonlinear life prediction model is the fatigue frequency.

Secondly, the first step is to carry out the first,dependent variable of the nonlinear life prediction modelAnd taking logarithms of the sub-variables respectively to construct and obtain the linear life prediction model.

Specifically, the above nonlinear life prediction model is linearized, i.e., Q ═ KS^-nRespectively taking logarithms of the dependent variable and the independent variable, thereby constructing and obtaining the linear life prediction model lnQ ═ lnK-nlnS. That is, the independent variable of the linear life prediction model is the logarithm of the deflection stress, and the dependent variable of the linear life prediction model is the logarithm of the fatigue number.

Of course, the lifetime prediction method of the micromirror device according to the present invention is not limited to the above-described method of constructing the linear lifetime prediction model, and may be constructed in other suitable ways.

Fig. 3 is a block schematic diagram of a lifetime prediction apparatus of a micro mirror device according to an embodiment of the present invention. Referring to fig. 3, a lifetime prediction apparatus of a micro mirror device according to an embodiment of the present invention includes: a fatigue number acquisition module 310 and a life model acquisition module 320.

Specifically, the fatigue number obtaining module 310 is configured to obtain the fatigue number of each of the N micromirror device groups under the respective deflection stress.

As an embodiment of configuring the fatigue number acquiring module 310, specifically, the fatigue number acquiring module 310 includes: a fatigue number acquisition unit 311, an average fatigue time calculation unit 312, and a fatigue number calculation unit 313.

Further, the fatigue number obtaining unit 311 is configured to obtain fatigue time of each micromirror device in the ith micromirror device group under the same corresponding deflection stress.

Specifically, the fatigue number acquisition unit 311 acquires the fatigue time of each micromirror device in the 1 st micromirror device group under the action of the deflection stress τ. That is, for the 1 st micromirror device group, the fatigue number acquisition unit 311 can acquire the fatigue time of each micromirror device included therein under the action of the deflection stress τ, thereby obtaining M fatigue times for the 1 st micromirror device group.

The fatigue number acquisition unit 311 acquires the fatigue time of each micromirror device in the 2 nd micromirror device group under the action of the deflection stress of 2 τ. That is, for the 2 nd micromirror device group, the fatigue number acquisition unit 311 can acquire the fatigue time of each micromirror device included therein under the action of the deflection stress of 2 τ, thereby obtaining M fatigue times for the 2 nd micromirror device group.

……

And so on; the fatigue number acquisition unit 311 acquires the fatigue time of each micromirror device in the nth micromirror device group under the action of the deflection stress N τ. That is, for the nth micromirror device group, the fatigue number acquisition unit 311 can acquire the fatigue time of each micromirror device included therein under the action of the deflection stress of N τ, thereby obtaining M fatigue times for the nth micromirror device group.

In addition, the average fatigue time calculation unit 312 is configured to calculate the average fatigue time of the ith micromirror device group by dividing the sum of the fatigue times of the respective micromirror devices in the ith micromirror device group by the number M of micromirror devices in the ith micromirror device group.

Specifically, the average fatigue time calculation unit 312 divides the sum of the fatigue times for the respective micromirror devices in the 1 st micromirror device group (i.e., the sum of M fatigue times for the 1 st micromirror device group) by the number M of micromirror devices in the 1 st micromirror device group to calculate the average fatigue time for the 1 st micromirror device group.

The average fatigue time calculation unit 312 divides the sum of the fatigue times for the respective micromirror devices in the 2 nd micromirror device group (i.e., the sum of M fatigue times for the 2 nd micromirror device group) by the number M of micromirror devices in the 2 nd micromirror device group to calculate the average fatigue time for the 2 nd micromirror device group.

……

And so on; the average fatigue time calculation unit 312 divides the sum of the fatigue times for the respective micromirror devices in the nth micromirror device group (i.e., the sum of the M fatigue times for the nth micromirror device group) by the number M of micromirror devices in the nth micromirror device group to calculate the average fatigue time for the nth micromirror device group.

The fatigue number calculating unit 313 is configured to calculate the fatigue number of the ith micro-mirror device group by multiplying the average fatigue time of the ith micro-mirror device group by the same deflection frequency corresponding to each micro-mirror device in the ith micro-mirror device group.

Specifically, the fatigue number calculating unit 313 multiplies the same deflection frequency corresponding to each micromirror device in the 1 st micromirror device group (i.e., the deflection frequency corresponding to the 1 st micromirror device group) by the average fatigue time of the 1 st micromirror device group to calculate the fatigue number of the 1 st micromirror device group.

The fatigue number calculating unit 313 multiplies the same deflection frequency corresponding to each micromirror device in the 2 nd micromirror device group (i.e. the deflection frequency corresponding to the 2 nd micromirror device group) by the average fatigue time of the 2 nd micromirror device group to calculate the fatigue number of the 2 nd micromirror device group.

……

And so on; the fatigue number calculating unit 313 multiplies the average fatigue time of the nth micromirror device group by the same deflection frequency corresponding to each micromirror device in the nth micromirror device group (i.e., the deflection frequency corresponding to the nth micromirror device group) to calculate the fatigue number of the nth micromirror device group.

With continued reference to fig. 3, the lifetime model obtaining module 320 is configured to obtain a lifetime prediction model for predicting the lifetime of the micromirror device according to the respective deflection stress and fatigue times of each micromirror device group.

As an embodiment of constructing the life model obtaining module 320, specifically, the life model obtaining module 320 includes: a nonlinear model construction unit 321 and a linear model construction unit 322.

Specifically, the nonlinear model construction unit 321 is configured to construct a nonlinear life prediction model by using the respective deflection stress and fatigue times of each micromirror device group, wherein an independent variable of the nonlinear life prediction model is a negative constant power of the deflection stress, and a dependent variable of the nonlinear life prediction model is the fatigue times.

In particular toFrom the above, each micromirror device group has corresponding deflection stress and fatigue times. For example, the first micromirror device group has a deflection stress S₁(deflection stress of τ) and fatigue number Q₁(ii) a The second micromirror device group has a deflection stress S₂(deflection stress of 2. tau.) and fatigue number Q₂(ii) a … …, respectively; the Nth micromirror device group has a deflection stress S_N(deflection stress of N tau) and fatigue number Q_N. Thus, the nonlinear model construction unit 321 takes the deflection stress as an abscissa and the fatigue number as an ordinate, i.e., coordinate (S)₁，Q₁) Coordinate (S)₂，Q₂) … …, coordinates (S)_N，Q_N) A graph is fitted, and the graph is represented by a nonlinear life prediction model. That is, the non-linear life prediction model may be expressed as: KS^-nWhere Q represents the number of yaw, S represents the yaw stress, K represents a normal number (model constant), and n also represents a normal number. That is, the independent variable of the nonlinear life prediction model is the negative constant power of the deflection stress, and the dependent variable of the nonlinear life prediction model is the fatigue frequency.

The linear model constructing unit 322 is configured to respectively logarithm dependent variables and sub-variables of the nonlinear life prediction model to construct the linear life prediction model.

The linear model construction unit 322 linearizes the above nonlinear life prediction model, i.e., Q ═ KS^-nRespectively taking logarithms of the dependent variable and the independent variable, thereby constructing and obtaining the linear life prediction model lnQ ═ lnK-nlnS. That is, the independent variable of the linear life prediction model is the logarithm of the deflection stress, and the dependent variable of the linear life prediction model is the logarithm of the fatigue number.

Of course, the life span prediction device of the micromirror device according to the present invention is not limited to the above-described construction method of the linear life span prediction model, and may be constructed in other suitable ways.

In summary, according to the method and apparatus for predicting the lifetime of the micromirror device of the embodiments of the invention, the lifetime of the micromirror device is predicted by constructing a lifetime prediction model. In addition, according to the method and the device for predicting the service life of the micro-mirror device, severe environments such as high temperature and the like are not needed, any equipment is not needed, the operation is simple, and the accelerated aging process can be completed at normal temperature. Further, time can be saved and the life span of the micromirror device can be estimated quickly.

An embodiment of the present invention also provides a computer-readable storage medium having a lifetime prediction program of a micro mirror device stored thereon, which when executed by a processor implements a lifetime prediction method of a micro mirror device as shown in fig. 1.

The memory may include forms of volatile memory in a computer readable storage medium, Random Access Memory (RAM) and/or non-volatile memory, such as Read Only Memory (ROM) or Flash memory (Flash RAM). The memory is an example of a computer-readable storage medium.

Computer-readable storage media, including both non-transitory and non-transitory, removable and non-removable media, may implement information storage by any method or technology. The information may be computer readable instructions, data structures, modules of a program, or other data. Examples of computer-readable storage media include, but are not limited to, phase change memory (PRAM), Static Random Access Memory (SRAM), Dynamic Random Access Memory (DRAM), other types of Random Access Memory (RAM), Read Only Memory (ROM), Electrically Erasable Programmable Read Only Memory (EEPROM), flash memory or other memory technology, compact disc read only memory (CD-ROM), Digital Versatile Discs (DVD) or other optical storage, magnetic cassettes, magnetic disk storage, quantum memory, graphene-based storage media or other magnetic storage devices, or any other non-transmission medium that can be used to store information that can be accessed by a computing device.

It should also be noted that the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or apparatus. Without further limitation, an element defined by the phrase "comprising an … …" does not exclude the presence of other like elements in a process, method, article, or apparatus that comprises the element.

The foregoing description has been directed to specific embodiments of this disclosure. Other embodiments are within the scope of the following claims. In some cases, the actions or steps recited in the claims may be performed in a different order than in the embodiments and still achieve desirable results. In addition, the processes depicted in the accompanying figures do not necessarily require the particular order shown, or sequential order, to achieve desirable results. In some embodiments, multitasking and parallel processing may also be possible or may be advantageous.

The terminology used in the description of the one or more embodiments is for the purpose of describing the particular embodiments only and is not intended to be limiting of the description of the one or more embodiments. As used in one or more embodiments of the present specification and the appended claims, the singular forms "a," "an," and "the" are intended to include the plural forms as well, unless the context clearly indicates otherwise. It should also be understood that the term "and/or" as used herein refers to and encompasses any and all possible combinations of one or more of the associated listed items.

It should be understood that although the terms first, second, third, etc. may be used in one or more embodiments of the present description to describe various information, such information should not be limited to these terms. These terms are only used to distinguish one type of information from another. For example, first information may also be referred to as second information, and similarly, second information may also be referred to as first information, without departing from the scope of one or more embodiments herein. The word "if" as used herein may be interpreted as "at … …" or "when … …" or "in response to a determination", depending on the context.

The above description is only for the purpose of illustrating the preferred embodiments of the one or more embodiments of the present disclosure, and is not intended to limit the scope of the one or more embodiments of the present disclosure, and any modifications, equivalent substitutions, improvements, etc. made within the spirit and principle of the one or more embodiments of the present disclosure should be included in the scope of the one or more embodiments of the present disclosure.