阅读说明：本技术 一种斜齿图形光栅板的制作方法及光栅板 (Manufacturing method of helical tooth pattern grating plate and grating plate ) 是由 岳力挽 毛智彪 唐步高 顾大公 马潇 许从应 于 2019-09-11 设计创作，主要内容包括：本发明适用于光学全息成像技术领域,提供了一种斜齿图形光栅板的制作方法及光栅板,其中,方法包括：对衬底进行直角刻蚀形成凹槽；对所述凹槽的一侧进行斜角刻蚀形成第一斜角；在形成所述第一斜角的衬底上设置介质膜并进行刻蚀,形成凸起；对所述凸起的一侧进行斜角刻蚀形成第二斜角。本发明能够大大提高斜齿图形光栅板的生产效率,降低生产成本。(The invention is suitable for the technical field of optical holographic imaging, and provides a manufacturing method of a helical tooth pattern grating plate and the grating plate, wherein the method comprises the following steps: carrying out right-angle etching on the substrate to form a groove; performing bevel etching on one side of the groove to form a first bevel; arranging a dielectric film on the substrate with the first bevel angle and etching to form a protrusion; and performing bevel etching on one side of the protrusion to form a second bevel. The invention can greatly improve the production efficiency of the helical tooth pattern grating plate and reduce the production cost.)

1. A manufacturing method of a skewed tooth graph grating plate is characterized by comprising the following steps:

carrying out right-angle etching on the substrate to form a groove;

performing bevel etching on one side of the groove to form a first bevel;

arranging a dielectric film on the substrate with the first bevel angle and etching to form a protrusion;

and performing bevel etching on one side of the protrusion to form a second bevel.

2. The method for manufacturing a grating plate with a slanted tooth pattern according to claim 1, wherein the step of performing bevel etching on one side of the groove to form a first bevel comprises:

deviating the position of the photomask plate corresponding to the groove from the first side of the groove;

photoetching the photoresist formed on the substrate etched with the groove, and etching the middle layer to expose a first side right-angle area of the groove and reserve the coverage of the photoresist in a second side right-angle area;

and etching the right-angle area at the first side of the groove to form the first bevel angle.

3. The method for manufacturing a grating plate with a slanted tooth pattern according to claim 1, wherein a dielectric film is disposed on the substrate on which the first slanted angle is formed and etched, and the step of forming the protrusion specifically comprises:

arranging the dielectric film on the substrate with the first bevel;

grinding the dielectric film, removing the dielectric film on the surface layer of the substrate, and reserving the dielectric film deposited in the groove to form a dielectric film groove;

and selectively etching the substrate forming the dielectric film groove, removing the surface substrate on the same horizontal plane with the dielectric film groove, and forming a bulge formed by the dielectric film.

4. The method for manufacturing a grating plate with a slanted tooth pattern according to claim 1, wherein the step of performing bevel etching on one side of the protrusion to form a second bevel comprises:

deviating the position of the photomask plate corresponding to the bulge from the first side of the bulge;

photoetching the photoresist formed on the substrate etched with the bulges, and etching the middle layer to expose the right-angle areas at the first sides of the bulges and reserve the coverage of the photoresist at the oblique-angle areas at the second sides of the bulges;

and etching the right-angle area at the first side of the bulge to form the second bevel angle.

5. The method for manufacturing a grating plate with a slanted tooth pattern as claimed in claim 1, wherein the step of performing a right-angle etching on the substrate to form the groove specifically comprises:

arranging the photomask plate right above the substrate;

photoetching the photoresist formed on the substrate, and etching the intermediate layer;

and carrying out the right-angle etching on the substrate to form a groove.

6. The method for manufacturing a grating plate with slanted teeth as claimed in claim 2, wherein before the step of disposing the position of said photomask corresponding to said grooves to be offset to the first sides of said grooves, the method further comprises the steps of:

removing the photoresist and the intermediate layer formed on the substrate etched with the groove;

and (4) completely covering the substrate on which the groove is formed by spin-coating photoresist and the intermediate layer.

7. The method for manufacturing a grating plate with a slanted tooth pattern as claimed in claim 3, wherein before the step of disposing a dielectric film on the substrate having the first slanted angle formed thereon, the method further comprises the steps of:

and removing the photoresist and the intermediate layer formed on the substrate etched with the first bevel angle.

8. The method for manufacturing a grating plate with slanted teeth as claimed in claim 4, wherein before the step of disposing the position of said photomask corresponding to said protrusions to be offset to the first sides of said protrusions, the method further comprises the steps of:

and (4) completely covering the substrate on which the bulges are formed by spin-coating photoresist and the intermediate layer.

9. The method for manufacturing a grating plate with a slanted tooth pattern as claimed in claim 4, wherein after the step of etching the right-angled region of the first side of said protrusion to form said second bevel, further comprising the steps of:

and removing the photoresist and the intermediate layer formed on the substrate etched with the second bevel angle to form the substrate with the skewed tooth-shaped asymmetric protrusions.

10. A grating plate is characterized by comprising a substrate, wherein oblique tooth-shaped asymmetric protrusions are arranged on the substrate.

11. A grating plate, comprising the method for manufacturing a grating plate with a skewed tooth pattern as claimed in any one of claims 1 to 9.

Technical Field

The invention belongs to the technical field of optical holographic imaging, and particularly relates to a manufacturing method of a helical tooth pattern grating plate and the grating plate.

Background

A grating plate is a precision optical element with a spatially periodic structure. Can be freely colored, odorless, tasteless and nontoxic, and has the advantages of good rigidity, insulation and printability, etc. The conversion of the phase and amplitude of the object to be shot is realized by decomposing the polychromatic light by using the principle of light diffraction, and the human brain processes several pictures at different angles through the visual difference of two eyes to form an image with depth. The product can be widely used in indoor advertising lamp boxes such as hotels, shopping malls, gymnasiums, airport lounges, waiting kiosks and the like, and wedding buildings, figure portraits and decorative paintings.

In the prior art, in the fabrication of an integrated circuit chip, an immersion lithography machine is used for lithography, and after exposure processing is performed on a photoresist, a portion to be removed by etching processing is combined, so that a symmetric tooth-shaped grating plate, such as a right-angle type grating plate, a reverse-oblique-angle type grating plate or an oblique-angle type grating plate, can be fabricated. Therefore, in the prior art, the problem that the imaging effect of the symmetric grating plate is poor when the optical holographic imaging is carried out exists. Therefore, in order to improve the imaging effect, a helical grating plate is needed, and the existing manufacturing process of the grating plate has low efficiency and high cost.

Disclosure of Invention

The embodiment of the invention provides a manufacturing method of a helical tooth graph grating plate, aiming at solving the problems of low production efficiency and high cost of the helical tooth type grating plate.

The embodiment of the invention is realized in such a way, and provides a manufacturing method of a skewed tooth graph grating plate, which comprises the following steps:

carrying out right-angle etching on the substrate to form a groove;

performing bevel etching on one side of the groove to form a first bevel;

arranging a dielectric film on the substrate with the first bevel angle and etching to form a protrusion;

and performing bevel etching on one side of the protrusion to form a second bevel.

Further, the step of performing bevel etching on one side of the groove to form a first bevel specifically includes:

deviating the position of the photomask plate corresponding to the groove from the first side of the groove;

photoetching the photoresist formed on the substrate etched with the groove, and etching the middle layer to expose a first side right-angle area of the groove and reserve the coverage of the photoresist in a second side right-angle area;

and etching the right-angle area at the first side of the groove to form the first bevel angle.

Further, the step of providing a dielectric film on the substrate on which the first bevel is formed and etching the dielectric film to form the protrusion includes:

arranging the dielectric film on the substrate with the first bevel;

grinding the dielectric film, removing the dielectric film on the surface layer of the substrate, and reserving the dielectric film deposited in the groove to form a dielectric film groove;

and selectively etching the substrate forming the dielectric film groove, removing the surface substrate on the same horizontal plane with the dielectric film groove, and forming a bulge formed by the dielectric film.

Further, the step of performing bevel etching on one side of the protrusion to form a second bevel specifically includes:

deviating the position of the photomask plate corresponding to the bulge from the first side of the bulge;

photoetching the photoresist formed on the substrate etched with the bulges, and etching the middle layer to expose the right-angle areas at the first sides of the bulges and reserve the coverage of the photoresist at the oblique-angle areas at the second sides of the bulges;

and etching the right-angle area at the first side of the bulge to form the second bevel angle.

Further, the step of performing right-angle etching on the substrate to form the groove specifically includes:

arranging the photomask plate right above the substrate;

photoetching the photoresist formed on the substrate, and etching the intermediate layer;

and carrying out the right-angle etching on the substrate to form a groove.

Further, before the step of disposing the position of the photomask corresponding to the groove to deviate from the first side of the groove, the method further comprises the steps of:

removing the photoresist and the intermediate layer formed on the substrate etched with the groove;

and (4) completely covering the substrate on which the groove is formed by spin-coating photoresist and the intermediate layer.

Further, before the step of providing the dielectric film on the substrate formed with the first bevel, the method further comprises the steps of:

and removing the photoresist and the intermediate layer formed on the substrate etched with the first bevel angle.

Further, before the step of disposing the photomask plate corresponding to the position of the protrusion to be deviated to the first side of the protrusion, the method further comprises the steps of:

and (4) completely covering the substrate on which the bulges are formed by spin-coating photoresist and the intermediate layer.

Furthermore, after the step of etching the first side right-angle region of the protrusion to form the second bevel, the method further comprises the steps of:

and removing the photoresist and the intermediate layer formed on the substrate etched with the second bevel angle to form the substrate with the skewed tooth-shaped asymmetric protrusions.

The invention also provides a grating plate which comprises a substrate, wherein the substrate is provided with oblique tooth-shaped asymmetric protrusions.

The invention also provides a grating plate, comprising the manufacturing method of the grating plate with the skewed tooth patterns in any specific embodiment.

The invention achieves the following beneficial effects: according to the invention, because the substrate is subjected to right-angle etching firstly to obtain the substrate with the groove, then the oblique-angle etching is carried out on one side of the groove, the dielectric film is arranged on the substrate with the first oblique angle and then the substrate with the protrusion structure formed by the dielectric film is etched, and then the protrusion is subjected to oblique-angle etching to form the second oblique angle, the substrate with the first oblique angle and the second oblique angle, namely the substrate (grating plate) with the sawtooth-shaped asymmetric protrusion, can be obtained, the process difficulty is reduced by twice oblique-angle etching, the production efficiency of the oblique-tooth-pattern grating plate is improved, and the production cost is reduced.

Drawings

Fig. 1 is a flowchart of an embodiment of a method for manufacturing a grating plate with skewed tooth patterns according to an embodiment of the present disclosure;

FIG. 2 is a flow diagram of one embodiment of step 102 of FIG. 1;

FIG. 3 is a flow diagram of one embodiment of step 103 of FIG. 1;

FIG. 4 is a flow diagram of one embodiment of step 104 of FIG. 1;

FIG. 5 is a flow diagram of one embodiment of step 101 of FIG. 1;

fig. 6 is a flowchart of another specific embodiment of a method for manufacturing a grating plate with skewed tooth patterns according to an embodiment of the present disclosure;

fig. 7 is a flowchart of another specific embodiment of a method for manufacturing a grating plate with skewed tooth patterns according to an embodiment of the present disclosure;

fig. 8 is a flowchart of another specific embodiment of a method for manufacturing a grating plate with skewed tooth patterns according to an embodiment of the present disclosure;

fig. 9 is a flowchart of another specific embodiment of a method for manufacturing a grating plate with skewed tooth patterns according to an embodiment of the present disclosure;

FIG. 10 is a schematic structural diagram of an embodiment of bevel etching as provided by an embodiment of the present application;

FIG. 11 is a schematic structural diagram of another embodiment of bevel etching according to the present disclosure;

FIG. 12 is a schematic structural diagram of another embodiment of bevel etching according to the present disclosure;

FIG. 13 is a schematic structural diagram of an embodiment of a dielectric film and a substrate provided by an embodiment of the present application;

FIG. 14 is a schematic structural diagram of another embodiment of a dielectric film and a substrate provided in the present application;

FIG. 15 is a schematic diagram of a structure of an embodiment of a bump provided by an embodiment of the present application;

FIG. 16 is a schematic structural diagram of another embodiment of bevel etching according to the present disclosure;

FIG. 17 is a schematic structural diagram of an embodiment of right angle etching provided in the present application;

FIG. 18 is a schematic structural diagram of another embodiment of a right angle etch provided in an embodiment of the present application;

FIG. 19 is a schematic structural diagram of another embodiment of a right angle etch provided in the embodiments of the present application;

fig. 20 is a schematic structural diagram of a specific embodiment of a grating plate according to an embodiment of the present application.

The structure comprises a substrate 1, a substrate 2, a groove 3, a photomask plate 4, a first oblique angle 5, a dielectric film 6, a protrusion 7, a second oblique angle 8, a photoresist 9 and a middle layer.

Detailed Description

In order to make the objects, technical solutions and advantages of the present invention more apparent, the present invention is described in further detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the invention and are not intended to limit the invention.

In the prior art, in the manufacture of an integrated circuit chip, a symmetric tooth-shaped grid plate, such as a right-angle type, a reverse oblique angle type or an oblique angle type, can be manufactured by photoetching a photoresist through an immersion photoetching machine and then combining with a part needing to be removed through etching treatment; the invention applies to form a substrate with grooves with oblique angles after right-angle etching and oblique-angle etching are carried out on the grooves through multiple offset arrangement of a photomask plate, then a dielectric film is arranged on the substrate, a bulge consisting of the dielectric film is formed through selective etching and is arranged on the substrate, the bulge is provided with a first oblique angle and a second oblique angle, the substrate with asymmetric bulges of helical tooth patterns can be obtained, the process difficulty is reduced through twice oblique-angle etching, the production efficiency of the helical tooth pattern grating plate is improved, and the production cost is reduced.