阅读说明：本技术 防板偏检知设计 (Inspection design for preventing plate deviation ) 是由 邱睿彦 于 2018-07-05 设计创作，主要内容包括：一种防板偏检知设计,其具有机台本体、承载平台、第一侦测组件、第二侦测组件及控制装置。承载平台设置于机台本体中,承载平台的曝光面用以承载待曝光件。第一侦测组件包含有两个第一侦测器,两个第一侦测器能侦测待曝光件的第一侧边。第二侦测组件包含有两个第二侦测器,两个第二侦测器能侦测待曝光件的第二侧边。控制装置能依据第一侦测组件及第二侦测组件侦测待曝光件的第一侧边及第二侧边的结果,而判断待曝光件是否正确地设置于承载平台,而控制装置能于待曝光件未正确地设置于承载平台上时,控制警示装置动作,以提醒使用者。(A plate deviation prevention detection design comprises a machine body, a bearing platform, a first detection assembly, a second detection assembly and a control device. The bearing platform is arranged in the machine table body, and the exposure surface of the bearing platform is used for bearing the piece to be exposed. The first detecting component comprises two first detectors which can detect the first side edge of the piece to be exposed. The second detecting component comprises two second detectors which can detect the second side edge of the piece to be exposed. The control device can judge whether the piece to be exposed is correctly arranged on the bearing platform or not according to the results of the first side edge and the second side edge of the piece to be exposed detected by the first detecting component and the second detecting component, and the control device can control the action of the warning device to remind a user when the piece to be exposed is not correctly arranged on the bearing platform.)

1. The design of the plate deviation prevention detector is characterized in that the design of the plate deviation prevention detector is used for exposing a piece to be exposed, and the design of the plate deviation prevention detector comprises:

the exposure device is used for exposing the piece to be exposed;

the bearing platform is arranged on the machine table body and is provided with an exposure surface, the exposure surface is used for bearing the piece to be exposed, and two side edges of the exposure surface, which are mutually perpendicular, are respectively defined as a first base line and a second base line; the exposure light beam generated by the exposure device can irradiate the to-be-exposed piece through the exposure surface;

a first detecting component, which comprises two first detectors, wherein the first detectors are used for detecting the position of a first side edge of the to-be-exposed piece arranged on the exposure surface relative to the first base line;

a second detecting component, which comprises two second detectors, wherein the second detectors are used for detecting the position of a second side edge of the to-be-exposed piece arranged on the exposure surface relative to the second baseline; wherein the first side edge is perpendicular to the second side edge;

the control device can control the action of a warning device when the member to be exposed is not correctly arranged on the exposure surface according to the results of the two first detectors detecting the position of the first side edge of the member to be exposed relative to the first base line and the results of the two second detectors detecting the position of the second side edge of the member to be exposed relative to the second base line; the control device can control the exposure device to act to expose the piece to be exposed according to the result that the two first detectors detect the position of the first side edge of the piece to be exposed relative to the first base line and the result that the two second detectors detect the position of the second side edge of the piece to be exposed relative to the second base line when the piece to be exposed is correctly arranged on the exposure surface.

2. The design of plate-bias prevention sensor as claimed in claim 1, wherein the distance between the two first detectors of the first detection assembly in the direction of the second baseline is not greater than 0.5 cm.

3. The design of plate-bias prevention sensor as claimed in claim 1, wherein the distance between the two second detectors of the second detection assembly in the direction of the first baseline is not greater than 0.5 cm.

4. The design for preventing plate deviation detection as claimed in claim 1, wherein two of said first detectors of said first detecting assembly are capable of detecting said first side of said to-be-exposed member disposed on said exposure surface respectively and generating two first detecting signals correspondingly, and said control device is capable of determining a first deviation amount of said first side of said to-be-exposed member with respect to said first baseline according to said two first detecting signals.

5. The design for preventing plate deviation detection as claimed in claim 1, wherein two of said second detectors of said second detecting assembly are capable of detecting said second side of said to-be-exposed member disposed on said exposure surface respectively and generating two second detecting signals correspondingly, and said control device is capable of determining a second deviation amount of said second side of said to-be-exposed member with respect to said second baseline according to said two second detecting signals.

6. The design of plate-bias prevention inspection as claimed in claim 1, further comprising an upper frame device disposed on the machine body and correspondingly located above the supporting platform, wherein the upper frame device can be controlled by the control device to abut against the side of the supporting platform having the exposure surface; the two first detectors are respectively arranged on the bearing platform and the upper frame device.

7. The design for detecting plate deviation as claimed in claim 6, wherein the first detector disposed on the supporting platform can be used to detect whether the member to be exposed is disposed on the supporting platform; when the control device judges that the bearing platform is not provided with the piece to be exposed according to the result detected by the first detector arranged on the bearing platform, the control device correspondingly controls the action of the warning device.

8. The design of plate-deflection prevention sensor as claimed in claim 1, wherein the first detecting element is connected to a first adjusting element, and the first adjusting element is controllable by the control device to correspondingly change the distance of at least one of the first detectors relative to the first baseline.

9. The design of plate-deflection prevention sensor according to claim 1, wherein the second detecting element is connected to a second adjusting element, and the second adjusting element is controlled by the control device to correspondingly change the distance between at least one of the second detectors and the second baseline; the two second detection assemblies adjusted by the second adjusting assembly can be used for detecting the position of the second side edge of the to-be-exposed piece relative to an auxiliary baseline parallel to the second baseline.

10. The design of claim 1, wherein one of the first detectors is located on the first baseline, and the other of the first detectors is offset from the first baseline in the direction of the second baseline by a distance not greater than 0.5 cm; one of the second detectors is correspondingly located on the second baseline, and the other of the second detectors is deviated from the second baseline in the direction of the second baseline by a distance not greater than 0.5 cm.

Technical Field

The invention relates to a design of an internal component of exposure equipment, in particular to a plate deviation prevention detection design suitable for the exposure equipment.

Background

The existing exposure equipment only corrects the position before the circuit board is sent into the exposure equipment, and directly performs exposure operation after the circuit board enters the exposure equipment. Therefore, in the conventional exposure equipment, the problem that the whole exposed circuit board cannot be used and must be scrapped due to the deviation of the position of the circuit board relative to the exposure negative film after the circuit board enters the exposure equipment is easily caused.

Disclosure of Invention

The invention mainly aims to provide a plate deviation prevention detection design which is suitable for exposure equipment and is used for solving the problem that the exposed circuit board must be scrapped due to the fact that the position deviation of the circuit board is easy to occur in the existing exposure equipment.

In order to achieve the above object, the present invention provides a design for detecting plate-bias, which is suitable for an exposure apparatus, the design for detecting plate-bias is used to expose a workpiece to be exposed, the design for detecting plate-bias comprises: the device comprises a machine table body, a bearing platform, a first detection component, a second detection component and a control device. The machine body is provided with an exposure device which is used for exposing the piece to be exposed. The bearing platform is arranged on the machine platform body and is provided with an exposure surface, the exposure surface is used for bearing a piece to be exposed, and two side edges of the exposure surface, which are mutually vertical, are respectively defined as a first baseline and a second baseline. The first detecting component comprises two first detectors for detecting the position of a first side edge of the to-be-exposed piece arranged on the exposure surface relative to the first base line. The second detecting component comprises two second detectors for detecting the position of a second side edge of the to-be-exposed piece arranged on the exposure surface relative to the second baseline. Wherein the first side edge is perpendicular to the second side edge. The control device is electrically connected with the first detection assembly and the second detection assembly, and can control the action of a warning device according to the result that the two first detectors detect the position of the first side edge of the piece to be exposed relative to the first base line and the result that the two second detectors detect the position of the second side edge of the piece to be exposed relative to the second base line so as to control the action of the warning device when the piece to be exposed is not correctly arranged on the exposure surface; the control device can control the action of the exposure device according to the result that the two first detectors detect the position of the first side edge of the piece to be exposed relative to the first base line and the result that the two second detectors detect the position of the second side edge of the piece to be exposed relative to the second base line, and when the piece to be exposed is correctly arranged on the exposure surface, the exposure device is controlled to carry out exposure operation on the piece to be exposed.

Preferably, the distance between the two first detectors of the first detection element in the direction of the second baseline is not greater than 0.5 cm.

Preferably, the distance between the two second detectors of the second detection element in the direction of the first baseline is not greater than 0.5 cm.

Preferably, the two first detectors of the first detecting assembly can respectively detect the first side edge of the to-be-exposed member disposed on the exposure surface and correspondingly generate two first detecting signals, and the control device can determine a first deviation amount of the first side edge of the to-be-exposed member relative to the first baseline according to the two first detecting signals.

Preferably, the two second detectors of the second detecting element can respectively detect the second side edge of the to-be-exposed member disposed on the exposure surface, and correspondingly generate two second detecting signals, and the control device can determine a second deviation amount of the second side edge of the to-be-exposed member relative to the second baseline according to the two second detecting signals.

Preferably, the design of the plate deviation prevention detector further comprises an upper frame device, which is arranged on the machine body and correspondingly located above the bearing platform, wherein the upper frame device can be controlled by the control device to abut against one side of the bearing platform, which is provided with the exposure surface; the two first detectors are respectively arranged on the bearing platform and the upper frame device.

Preferably, the first detector disposed on the carrying platform can be used to detect whether the piece to be exposed is disposed on the carrying platform; when the control device judges that the bearing platform is not provided with the piece to be exposed according to the result detected by the first detector arranged on the bearing platform, the control device correspondingly controls the action of the warning device.

Preferably, the first detecting element is connected to a first adjusting element, and the first adjusting element can be controlled by the control device to correspondingly change the distance of at least one of the first detectors relative to the first baseline.

Preferably, the second detecting element is connected to a second adjusting element, and the second adjusting element can be controlled by the control device to correspondingly change the distance between at least one of the second detectors and the second baseline; the two second detection assemblies adjusted by the second adjusting assembly can be used for detecting the position of the second side edge of the to-be-exposed piece relative to an auxiliary baseline parallel to the second baseline.

Preferably, one of the first detectors is correspondingly located on the first baseline, and the other of the first detectors is deviated from the first baseline in the direction of the second baseline by a distance not greater than 0.5 cm; one of the second detectors is correspondingly located on the second baseline, and the other of the second detectors is deviated from the second baseline in the direction of the second baseline by a distance not greater than 0.5 cm.

The plate deviation prevention detection design of the invention can achieve the following effects: before the exposure operation of the piece to be exposed, the first detecting component and the second detecting component are utilized to detect the position of the piece to be exposed, so that whether the piece to be exposed is correctly arranged on the bearing platform is judged, and the control device and the warning device are matched to perform the exposure operation when the piece to be exposed is correctly arranged on the bearing platform; if the piece to be exposed is not correctly arranged on the bearing platform, the exposure operation is not carried out, and related personnel are informed in real time through the warning device. Therefore, the problem that the exposed part cannot be used when the exposure operation is carried out under the condition that the part to be exposed is not correctly arranged on the bearing platform can be greatly reduced.

Drawings

Fig. 1 is a schematic diagram of a design of a plate-deviation prevention detector according to the present invention.

Fig. 2 is a schematic view of a supporting platform and a first detector thereof according to the design of the present invention.

Fig. 3 is a schematic diagram of a top frame device, a first detector and a second detector of the plate-bias detection design of the present invention.

Fig. 4 is a schematic view of a supporting platform, a platform frame device, a first detecting element and a second detecting element of the plate-deflection-prevention detection design of the present invention.

Fig. 5 is a schematic view of the arrangement positions of the carrying platform, the first detecting element and the second detecting element of the design of preventing the plate deviation detection of the present invention.

Fig. 6 to 12 are schematic diagrams illustrating various states of the to-be-exposed member disposed on the supporting platform of the plate-deviation prevention sensor design of the present invention.

Fig. 13 is a schematic diagram of a first detector and a first adjusting component of the design of the plate-deviation prevention detector of the present invention.

Fig. 14 is a schematic diagram of a first detector and a first adjusting component of the design of the plate-deviation prevention detector of the present invention.

Fig. 15 is a schematic diagram of two second detectors and a second adjusting component of the design of the plate-deviation prevention detector of the present invention.

Detailed Description

Please refer to fig. 1, which is a schematic diagram of a design of a plate-deviation prevention detector according to the present invention. The invention relates to a plate deviation detection prevention design, which is applied to an exposure device, in particular to an exposure device for carrying out exposure operation on a circuit board. The design 1 includes a main body 10, a platform 11, a frame 12, an exposure device 13 and a control device 14. The main body 10 has an exposure space 10a therein. The shape of the machine body 10 may vary according to the needs, and the machine body 10 may be an independent device or may be connected with other machine devices, which is not limited herein. The machine body 10 includes a movable opening 101, and a user can repair, replace, clean, etc. related components in the machine body 10 through the movable opening 101.

Referring to fig. 1 and 2, fig. 2 is a schematic view of a supporting platform. The supporting platform 11 is disposed in the machine body 10 and is correspondingly disposed in the exposure space 10 a. The supporting platform 11 has a light-transmissive exposure surface 111, and the exposure surface 111 is used for supporting a member to be exposed (e.g. a circuit board). In practical applications, the exposure surface 111 may have a plurality of air-extracting holes (not shown), and the plurality of air-extracting holes are correspondingly connected to at least one air-extracting device (not shown), so that the to-be-exposed member disposed on the exposure surface 111 can be fixedly attached to the exposure surface 111 through the cooperation of the air-extracting device and the plurality of air-extracting holes. The lower exposure unit 131 of the exposure device 13 is disposed in the machine body 10, and the exposure beam emitted by the lower exposure unit 131 can irradiate the to-be-exposed member through the exposure surface 111.

As shown in fig. 1, 3 and 4, the upper frame device 12 is disposed in the machine body 10, and the upper frame device 12 is located in the exposure space 10 a. The upper frame device 12 has a transparent fixing surface 121, and the fixing surface 121 is used for disposing an exposure film. An upper exposure unit 132 of the exposure device 13 is disposed in the machine body 10, and the exposure beam emitted by the upper exposure unit 132 can be irradiated on the exposure film through the fixing surface 121. In different embodiments, the plate-offset detection design 1 may only include the lower exposure unit 131, but not include the upper exposure unit 132.

The control device 14 is electrically connected to the exposure device 13, and the control device 14 can control the upper exposure unit 132 and the lower exposure unit 131 to perform an exposure operation on the workpiece to be exposed by using the exposure beams emitted by the upper exposure unit 132 and the lower exposure unit 131 in cooperation with the exposure film. In practical applications, the control device 14 may be a computer, a processor, or the like disposed in the machine body 10, or the control device 14 may be a computer independent from the machine body 10, which is not limited herein.

Referring to fig. 2 to 5, the exposure surface 111 is rectangular, and two sides of the exposure surface 111 perpendicular to each other are respectively defined as a first baseline C1 and a second baseline C2. The design 1 further includes a first detecting element 15 and a second detecting element 16. The first detecting element 15 comprises two first detectors 151, 152, and the second detecting element 16 comprises two second detectors 161, 162. The two first detectors 151, 152 and the two second detectors 161, 162 are electrically connected to the control device 14, respectively, and the control device 14 can control the two first detectors 151, 152 and the two second detectors 161, 162 to determine whether the to-be-exposed part S (as shown in fig. 6) disposed on the supporting platform 11 is correctly disposed.

Further, two first detectors 151, 152 may be disposed on the supporting platform 11 and the upper frame device 12, respectively, and the two first detectors 151, 152 are not disposed facing each other, and the two first detectors 151, 152 are disposed substantially adjacent to the first baseline C1. In practical applications, the positions of the two first detectors 151, 152 of the first detection assembly 15 relative to the first baseline C1 may be designed according to requirements, for example, the distance between the two first detectors 151, 152 in the direction of the second baseline C2 is not greater than 0.5 cm, or alternatively, one of the first detectors 151, 152 may be located on the first baseline C1, and the other first detector 151, 152 in the direction of the second baseline C2 is not greater than 0.5 cm from the first baseline C1.

Each of the first detectors 151, 152 can generate a detection signal according to whether the to-be-exposed workpiece S is detected, and the control device 14 can determine the position of the first side S1 (shown in fig. 6) of the to-be-exposed workpiece S relative to the first baseline C1 according to the detection signals generated by the two first detectors 151, 152. For example, each of the first detectors 151, 152 may be a proximity sensor, and when the first detector 151, 152 does not detect the to-be-exposed member S, the first detector 151, 152 may not generate any signal, and when the first detector 151, 152 detects the to-be-exposed member S, a first signal may be generated correspondingly. Of course, the way of generating the signal correspondingly is not limited to this, but in different embodiments, each of the first detectors 151 and 152 may generate one detection signal correspondingly when the to-be-exposed member S is not detected, and generate another detection signal correspondingly when the to-be-exposed member S is detected.

In practical applications, the two first detectors 151 and 152 may be electrically connected to the control device 14 independently, and the control device 14 determines a first deviation amount of the first side S1 of the to-be-exposed object S from the first baseline C1 according to the two first detection signals transmitted by the two first detectors 151 and 152. In different embodiments, the results detected by the two first detectors 151 and 152 may be integrated by the microprocessor into a single result signal, and the control device 14 can determine the position of the first side S1 of the to-be-exposed object S relative to the first baseline C1 directly according to the result signal.

In practical applications, the first detector 151 disposed on the supporting platform 11 can be further used to detect whether the exposure surface 111 is provided with the to-be-exposed part S, so that when the control device 14 determines that the supporting platform 11 is not provided with the to-be-exposed part according to the detection result of the first detector 151 disposed on the supporting platform 11, the control device 14 can correspondingly control the operation of the warning device (not shown), such as a warning light, a warning horn, etc., to remind the user that the supporting platform 11 is not provided with the to-be-exposed part. Correspondingly, the first detector 152 disposed on the upper frame device 12 can also be used to detect whether the fixing surface 121 is disposed with an exposure film, so that when the control device 14 determines that the upper frame device 12 is not disposed with an exposure film according to the first detector 152 disposed on the upper frame device 12, the control device 14 can control the warning device to prompt the user.

Specifically, the position of each of the first detectors 151, 152 relative to the first baseline C1 may be different according to the detection manner of the first detectors 151, 152. For example, as shown in fig. 6, the first detector 151 may be correspondingly disposed on the first baseline C1, and the first detector 152 may be located at a position where the first baseline C1 is shifted toward the positive Y-axis direction in the figure. Each of the first detectors 151(152) may transmit a first detection signal to the control device 14 when detecting the first side edge S1 of the to-be-exposed workpiece S (i.e., the portion of each of the first detectors 151(152) is shielded by the to-be-exposed workpiece S); when the first detectors 151(152) are completely covered by the to-be-exposed member S, the second detection signals can be sent to the control device 14; when the first detectors 151(152) are not covered by the to-be-exposed member S, the third detection signal can be transmitted to the control device 14.

As shown in fig. 6, when the first side S1 of the to-be-exposed device S is substantially aligned with the first baseline C1, the control device 14 receives the first control signal (i.e., the first side S1 is detected) transmitted from the first detector 151 and the second detection signal (i.e., the first side S1 is detected) transmitted from the first detector 152, so that the control device 14 can determine that the first side S1 of the to-be-exposed device S is located at the correct position relative to the first baseline C1.

As shown in fig. 7, when the control device 14 receives two third detection signals (i.e., does not detect the first side S1 or the to-be-exposed device S) transmitted by the two first detectors 151 and 152, the control device 14 can determine that the first side S1 of the to-be-exposed device S is offset from the first baseline C1 in the positive Y-axis direction of the figure, which may indicate that the to-be-exposed device S is not disposed on the supporting platform 11 or the to-be-exposed device S is disposed at a completely incorrect position on the supporting platform 11.

As shown in fig. 8, when the control device 14 receives two second detection signals (i.e., only the to-be-exposed device S is detected and the first side S1 is not detected) transmitted by the two first detectors 151 and 152, the control device 14 can determine that the first side S1 of the to-be-exposed device S is offset from the first baseline C1 in the negative Y-axis direction of the figure.

As shown in fig. 9, when an included angle is formed between the first side S1 of the to-be-exposed device S and the first baseline C1 (i.e., the to-be-exposed device S rotates counterclockwise relative to the supporting platform 11), the two first detectors 151 and 152 will transmit two first detection signals to the control device 14, so that the control device 14 can know that both the two first detectors 151 and 152 detect the first side S1 of the to-be-exposed device S, and thus can determine that the first side S1 of the to-be-exposed device S is disposed obliquely relative to the first baseline C1, and the to-be-exposed device S is not disposed on the supporting platform 11 correctly.

It should be noted that in the above embodiment of utilizing the two first detectors 151 and 152 to detect the first side S1 of the to-be-exposed device S for correspondingly transmitting different types of detection signals to the control device 14, the two first detectors 151 and 152 are not necessarily located on the first baseline C1 at the same time, and one of the two first detectors 151 and 152 may be located on the first baseline C1 and the other one is disposed away from the first baseline C1, or the two first detectors 151 and 152 may be respectively offset towards two sides of the first baseline C1.

As shown in fig. 2, 4, 5 and 13, in different applications, the first detecting element 15 may be connected to a first adjusting element 17, and the first adjusting element 17 can be controlled by the control device 14 to correspondingly change the distance between at least one first detector 151, 152 and the first baseline C1, or the first adjusting element 17 can also be used to change the distance D1 between the two first detectors 151, 152 in the direction of the first baseline C1.

For example, the first adjustment assembly 17 may include two connecting arms 171, 173 and two drivers 172, 174. The first detector 151 disposed on the supporting platform 11 may be connected to the connecting arm 171, the connecting arm 171 is connected to the driver 172, and the driver 172 can be controlled by the control device 14 to drive the connecting arm 171 to move, so that the first detector 151 moves toward or away from the first baseline C1 toward the second baseline C2.

As shown in fig. 3, fig. 5 and fig. 14, the first detector 152 disposed on the upper frame device 12 can be connected to the connecting arm 173, the connecting arm 173 is connected to the driver 174, and the driver 174 can be controlled by the control device 14 to drive the first detector 152 to move toward the carrying platform 11 through the connecting arm 173.

In addition, the first adjusting assembly 17 may further include a sliding block 175, a sliding rail 176, and a limiting member 177. The first detector 152 disposed on the upper frame device 12 may further be connected to the sliding block 175, the sliding block 175 may be slidably disposed on the sliding rail 176, the sliding rail 176 is correspondingly and fixedly disposed on the upper frame device 12, and the sliding block 175 and the sliding rail 176 may further be connected to a limiting member 177, so that a user can operate the limiting member 177 to prevent the sliding block 175 from moving relative to the sliding rail 176. The slide rail 176 may be disposed along the first base line C1, and the user may manually or electronically control the sliding block 175 to move along the slide rail 176, so as to move the first detector 151 along the first base line C1, and after the user moves the first detector 151 to a desired position, the user may manually or electronically control the limiting member 177 to fix the sliding block 175 and the slide rail 176, so that the sliding block 175 cannot move relative to the slide rail 176 any more. Of course, the sliding block 175, the sliding rail 176 and the limiting member 177 can also be applied to the first detector 151 disposed on the supporting platform 11.

Referring to fig. 3, 4, 5 and 15, two second detectors 161, 162 may be disposed on the upper frame device 12, and the two second detectors 161, 162 can be used to detect the position of the second side edge S2 of the to-be-exposed workpiece S relative to a second baseline C2 of the supporting platform 11. The second side edge S2 is perpendicular to the first side edge S1, and the second baseline C2 is perpendicular to the first baseline C1.

The actual operation of the two second detectors 161, 162 is substantially the same as that of the two first detectors 151, 152, and the difference between the two first detectors 151, 152 is that the two first detectors 151, 152 are used to detect the position of the first side S1 of the to-be-exposed workpiece S relative to the first baseline C1, and the two second detectors 161, 162 are used to detect the position of the second side S2 of the to-be-exposed workpiece S relative to the second baseline C2, so that only the portions of the second detectors 161, 162 that need to be emphasized in particular will be described below, and the rest of the portions that are not described in detail will refer to the above description of the first detectors 151, 152.

As shown in fig. 3, 5 and 15, two second detectors 161, 162 may be disposed together on the upper frame device 12, and the two second detectors 161, 162 are disposed substantially adjacent to the second baseline C2. In practical applications, the positions of the two second detectors 161, 162 of the second detecting element 16 relative to the second baseline C2 may be designed according to requirements, for example, the distance D2 between the two second detectors 161, 162 in the direction of the first baseline C1 may be not greater than 0.5 cm, or alternatively, one of the second detectors 161, 162 may be located on the second baseline C2, and the distance between the other second detector 161, 162 in the direction of the first baseline C1 and the second baseline C2 is not greater than 0.5 cm.

In practical applications, the two second detectors 161, 162 can be electrically connected to the control device 14 independently, and the control device 14 can determine a second deviation of the second side edge S2 of the object S to be exposed relative to the second baseline C2 according to two second detection signals transmitted by the two second detectors 161, 162.

As shown in fig. 3, 4, 5 and 15, in different applications, the second detecting element 16 may be connected to a second adjusting element 18, and the second adjusting element 18 can be controlled by the control device 14 to correspondingly change the distance between at least one of the second detectors 161 and 162 and the second baseline C2, or the second adjusting element 18 can also be used to change the distance D2 between the two second detectors 161 and 162 in the direction of the second baseline C2.

For example, as shown in fig. 2, 3 and 15, the second adjustment assembly 18 may include a connecting arm 181 and a driver 182. The second detectors 161 and 162 disposed on the upper frame device 12 are connected to the connecting arm 181, the connecting arm 181 is connected to the driver 182, and the driver 182 can be controlled by the control device 14 to drive the connecting arm 181 to move, so that the second detectors 161 and 162 approach or depart from the second baseline C2 along the direction of the first baseline C1.

In the embodiment, the two second detectors 161, 162 are disposed on a linkage plate Q, the linkage plate Q is connected to the linkage arm 181, and the actuator 182 can simultaneously adjust the positions of the two second detectors 161, 162 relative to the second baseline C2 through the linkage arm 181 and the linkage plate Q, but not limited thereto. In different embodiments, the two second detectors 161, 162 can also be connected to different connecting arms and drivers independently, but not limited thereto.

In addition, the second adjusting assembly 18 may further include a sliding block 183, a sliding rail 184 and a limiting member 185. The second detectors 161 and 162 disposed on the upper frame device 12 may be connected to the sliding block 183, the sliding block 183 is slidably disposed on the sliding rail 184, the sliding rail 184 is correspondingly and fixedly disposed on the upper frame device 12, and a position-limiting member 185 is disposed between the sliding block 183 and the sliding rail 184, so that a user can operate the position-limiting member 185 to prevent the sliding block 183 from moving relative to the sliding rail 184. The slide rail 184 may be disposed along the second base line C2, and the user may manually or electronically control the sliding block 183 to move along the slide rail 184, so as to move the second detectors 161, 162 along the second base line C2, and after the user moves the second detectors 161, 162 to a desired position, the user may manually or electronically control the limiting member 185 to fix the sliding block 183, so that the sliding block 183 cannot move relative to the slide rail 184 any more.

The position of each of the second detectors 161, 162 relative to the second baseline C2 may be different according to the detection mode of the second detectors 161, 162 and the size of the member S to be exposed. In the following description, the dimension of the object S to be exposed is significantly smaller than the dimension of the exposure surface 111, but the invention is not limited thereto. When the size of the to-be-exposed device S is substantially equal to the size of the exposure surface 111, the two second detectors 161, 162 may not be adjusted by the second adjusting component 18, and the two second detectors 161, 162 may be used to detect the position of the second side edge S2 of the to-be-exposed device S relative to the second baseline C2. In other words, in the following description, the two second detectors 161, 162 are adjusted by the second adjusting element 18 before detecting the position of the second side edge S2 of the workpiece S relative to an auxiliary baseline C21 parallel to the second baseline C2.

Specifically, referring to fig. 6 and 10 to 12, each second detector 161(162) may transmit a first detection signal to the control device 14 when detecting the second side edge S2 of the to-be-exposed piece S, that is, when a portion of each second detector 161(162) is shielded by the to-be-exposed piece S, and each second detector 161(162) may transmit a second detection signal to the control device 14 when being completely shielded by the to-be-exposed piece S, and may transmit a third detection signal to the control device 14 when the second detector 161(162) is not shielded by the to-be-exposed piece S.

As shown in fig. 6, when the second side S2 of the to-be-exposed device S is substantially parallel to the second baseline C2, the control device 14 receives the first control signal (i.e., the second side S2 is detected) transmitted from the second detector 161 and the third detection signal (i.e., the second side S2 is not detected and the to-be-exposed device S is not detected) transmitted from the second detector 162, so that the control device 14 can determine that the second side S2 of the to-be-exposed device S is located at the correct position relative to the second baseline C2.

As shown in fig. 10, when the control device 14 receives two third detection signals (i.e., no second side edge S2 is detected and no to-be-exposed workpiece S is detected) transmitted by the two second detectors 161, 162, the control device 14 can determine that the second side edge S2 of the to-be-exposed workpiece S is offset from the second baseline C2 in the positive X-axis direction of the figure, which may indicate that no to-be-exposed workpiece S is disposed on the supporting platform 11 or that the to-be-exposed workpiece S is disposed at a completely incorrect position on the supporting platform 11.

As shown in fig. 11, when the control device 14 receives two second detection signals (i.e., only the to-be-exposed device S is detected and the second side S2 is not detected) transmitted by the two second detectors 161, 162, the control device 14 can determine that the second side S2 of the to-be-exposed device S is offset from the second baseline C2 in the negative Y-axis direction of the figure.

As shown in fig. 12, when an included angle is formed between the second side S2 of the to-be-exposed device S and the second baseline C2 (i.e., the to-be-exposed device S rotates clockwise relative to the supporting platform 11), the two second detectors 161, 162 will transmit two second detection signals to the control device 14, so that the control device 14 can know that both the two second detectors 161, 162 detect the second side S2 of the to-be-exposed device S, and thus can determine that the second side S2 of the to-be-exposed device S is obliquely disposed relative to the second baseline C2, and the to-be-exposed device S is not properly disposed on the supporting platform 11.

It should be noted that in the above embodiment of utilizing the two second detectors 161, 162 to detect the second side S2 of the to-be-exposed device S, and accordingly transmit different types of detection signals to the control device 14, the two second detectors 161, 162 need to be located on the second baseline C2, one of the two second detectors 161, 162 may be located on the second baseline C2, and the other one is disposed away from the second baseline C2, or the two second detectors 161, 162 may be respectively offset towards two sides of the second baseline C2.

In summary, in the plate-deviation prevention detection design 1 of the present invention, when the two first detectors 151 and 152 and the two second detectors 161 and 162 are used in conjunction with the control device 14 to dispose the detectable member S on the supporting platform 11, the detectable member S is in the correct disposition state as shown in fig. 6, the detectable member S is in the disposition state of being deviated in the positive Y-axis direction of the coordinate system in the figure as shown in fig. 7, the detectable member S is in the disposition state of being deviated in the negative Y-axis direction of the coordinate system in the figure as shown in fig. 8, the detectable member S is in the counterclockwise-deflected disposition state as shown in fig. 9, the detectable member S is in the positive X-axis direction of the coordinate system in the figure as shown in fig. 10, the detectable member S is in the negative X-axis direction of the coordinate system in the figure as shown in fig. 11, or the detectable member S is in the counterclockwise-deflected disposition state as shown in fig. 12, so that the control device 14 can, according to the, correspondingly controlling the exposure device 13 to perform exposure operation on the piece S to be exposed; in contrast, when the control device 14 determines that the to-be-exposed part S is in any state shown in fig. 7 to 12, the control device 14 may be a control warning device to remind the related user that the to-be-exposed part S is not correctly disposed on the carrying platform 11, and of course, in practical applications, when the control device 14 determines that the to-be-exposed part S is not correctly disposed on the carrying platform 11, the control device 14 may also be a control device (e.g., a robot arm with a suction cup, etc.) to adjust the position of the to-be-exposed part S relative to the carrying platform 11, or to place the to-be-exposed part S again.

As described above, the design 1 for detecting plate offset according to the present invention can detect the position of the workpiece S before the exposure operation is performed on the workpiece S, so as to greatly reduce the problem that the workpiece S cannot be used after exposure due to incorrect positioning.