阅读说明：本技术 一种布料的缝制方法、装置、设备及介质 (Cloth sewing method, device, equipment and medium ) 是由 何蟒 谢志明 于 2019-10-09 设计创作，主要内容包括：本申请公开了一种布料的缝制方法、装置、设备及介质,该方法包括：当需要对具有不同厚度的待缝布料进行缝制时,则向待缝布料的目标位置发射第一红外线,并获取第一红外线在目标位置处所反射的第二红外线；利用第一夹角和第二夹角计算待缝布料在目标位置处的目标厚度；根据待缝布料在目标位置处的目标厚度预先设置缝制待缝布料的目标缝制方法,以利用目标缝制方法缝制待缝布料。由于该方法可以在缝制待缝布料之前计算得到待缝布料在目标位置处的目标厚度,所以,就可以预先设置待缝布料的目标缝制方法,这样在对待缝布料进行缝制时就可以避免在缝制待缝布料的厚薄交界处所出现的缝制线迹长短不一致的现象,由此就可以显著提高待缝布料的缝制质量。(The application discloses a sewing method, a device, equipment and a medium for cloth, wherein the method comprises the following steps: when the cloth to be sewn with different thicknesses needs to be sewn, emitting first infrared rays to a target position of the cloth to be sewn, and acquiring second infrared rays reflected by the first infrared rays at the target position; calculating the target thickness of the cloth to be sewn at the target position by using the first included angle and the second included angle; and presetting a target sewing method for sewing the cloth to be sewn according to the target thickness of the cloth to be sewn at the target position, so as to sew the cloth to be sewn by using the target sewing method. The method can calculate the target thickness of the cloth to be sewn at the target position before the cloth to be sewn is sewn, so that the target sewing method of the cloth to be sewn can be preset, the phenomenon that sewing stitches are inconsistent in length at the thick-thin junction of the cloth to be sewn can be avoided when the cloth to be sewn is sewn, and the sewing quality of the cloth to be sewn can be remarkably improved.)

1. A sewing method of a cloth, characterized by comprising:

when the cloth to be sewn with different thicknesses needs to be sewn, emitting first infrared rays to a target position of the cloth to be sewn, and acquiring second infrared rays reflected by the first infrared rays at the target position; the target position is any point on the cloth to be sewn;

calculating the target thickness of the cloth to be sewn at the target position by using the first included angle and the second included angle; the first included angle is an included angle between the first infrared ray and the horizontal plane of the cloth to be sewn at the target position; the second included angle is an included angle between the second infrared ray and the horizontal plane of the cloth to be sewn at the target position;

and presetting a target sewing method for sewing the cloth to be sewn according to the target thickness of the cloth to be sewn at the target position, so as to sew the cloth to be sewn by using the target sewing method.

2. The sewing method of claim 1, wherein the process of emitting a first infrared ray to a target position of the cloth to be sewn and acquiring a second infrared ray reflected by the first infrared ray at the target position comprises:

and emitting the first infrared ray to the target position by using an infrared emitting device, and acquiring the second infrared ray reflected by the first infrared ray at the target position by using an infrared receiving device.

3. The sewing method of claim 2, wherein the infrared emitting device and the infrared receiving device are not on the same horizontal plane.

4. The sewing method of claim 2, wherein the infrared emitting device is an array of infrared emitting tubes and the infrared receiving device is an array of infrared receiving tubes.

5. The sewing method according to claim 2, wherein the process of emitting the first infrared ray to the target position by an infrared emitting device and acquiring the second infrared ray reflected by the first infrared ray at the target position by an infrared receiving device includes:

driving the infrared emission device to emit third infrared rays to the target position by using a pulse width modulation circuit; the third infrared ray is a group of infrared rays with the same preset frequency or a plurality of groups of infrared rays with different preset frequencies;

and acquiring a fourth infrared ray reflected by the third infrared ray on the cloth to be sewn by using the infrared receiving device.

6. The sewing method of claim 5, wherein the step of obtaining the fourth infrared ray reflected by the third infrared ray on the cloth to be sewn by using the infrared receiving device further comprises:

extracting a fifth infrared ray corresponding to the frequency characteristic of the third infrared ray from the fourth infrared ray by using a demodulation circuit, and calculating the target thickness of the cloth to be sewn at the target position by using a third included angle and a fourth included angle; the third included angle is an included angle between the third infrared ray and the horizontal plane where the target position is located and the cloth to be sewn, and the fourth included angle is an included angle between the fifth infrared ray and the horizontal plane where the target position is located and the cloth to be sewn.

7. A sewing device for cloth is characterized by comprising:

the infrared ray acquisition module is used for emitting first infrared rays to a target position of cloth to be sewn and acquiring second infrared rays reflected by the first infrared rays at the target position when the cloth to be sewn with different thicknesses needs to be sewn; the target position is any point on the cloth to be sewn;

the thickness calculating module is used for calculating the target thickness of the cloth to be sewn at the target position by utilizing the first included angle and the second included angle; the first included angle is an included angle between the first infrared ray and the horizontal plane of the cloth to be sewn at the target position; the second included angle is an included angle between the second infrared ray and the horizontal plane of the cloth to be sewn at the target position;

and the cloth sewing module is used for presetting a target sewing method for sewing the cloth to be sewn according to the target thickness of the cloth to be sewn at the target position so as to sew the cloth to be sewn by utilizing the target sewing method.

8. A sewing apparatus of cloth, characterized by comprising:

a memory for storing a computer program;

a processor for implementing the steps of a method of sewing a fabric as claimed in any one of claims 1 to 6 when executing said computer program.

9. A computer-readable storage medium, characterized in that the computer-readable storage medium has stored thereon a computer program which, when being executed by a processor, carries out the steps of a method of sewing a cloth according to any one of claims 1 to 6.

Technical Field

The invention relates to the technical field of sewing machines, in particular to a cloth sewing method, a device, equipment and a medium.

Background

In actual life, when sewing a fabric, the fabric thickness is often reduced or thickened suddenly, and in this case, in order to make sewing stitches on the fabric consistent, different sewing processes are needed to sew the fabric.

In the prior art, when determining which sewing method to sew the cloth, a linear hall sensor is generally installed on a presser foot of a sewing machine, the thickness of the cloth is detected by the linear hall sensor, then the height of the presser foot on the sewing machine is adjusted according to the detected thickness of the cloth, and finally the cloth is sewn by driving the presser foot. However, in the cloth thickness detection method, the thickness of the cloth needs to be detected when the cloth reaches the lower part of the presser foot, and the presser foot needs to be lifted in a relatively long time, so that the lifting height of the presser foot cannot respond to the change of the thickness of the cloth in time, and the phenomenon that the stitch length of the seam of the cloth at the thickness junction is inconsistent can occur, thereby affecting the sewing quality of the cloth. At present, no effective solution exists for the phenomenon.

Therefore, how to improve the sewing quality of the cloth is a technical problem to be solved urgently by the technical personnel in the field.

Disclosure of Invention

In view of the above, the present invention provides a method, an apparatus, a device and a medium for sewing a fabric, so as to improve the sewing quality of the fabric. The specific scheme is as follows:

a sewing method of cloth includes:

when the cloth to be sewn with different thicknesses needs to be sewn, emitting first infrared rays to a target position of the cloth to be sewn, and acquiring second infrared rays reflected by the first infrared rays at the target position; the target position is any point on the cloth to be sewn;

calculating the target thickness of the cloth to be sewn at the target position by using the first included angle and the second included angle; the first included angle is an included angle between the first infrared ray and the horizontal plane of the cloth to be sewn at the target position; the second included angle is an included angle between the second infrared ray and the horizontal plane of the cloth to be sewn at the target position;

and presetting a target sewing method for sewing the cloth to be sewn according to the target thickness of the cloth to be sewn at the target position, so as to sew the cloth to be sewn by using the target sewing method.

Preferably, the process of emitting a first infrared ray to a target position of the cloth to be sewn and acquiring a second infrared ray reflected by the first infrared ray at the target position includes:

and emitting the first infrared ray to the target position by using an infrared emitting device, and acquiring the second infrared ray reflected by the first infrared ray at the target position by using an infrared receiving device.

Preferably, the infrared emitting device and the infrared receiving device are not on the same horizontal plane.

Preferably, the infrared emitting device is an array type infrared emitting tube, and the infrared receiving device is an array type infrared receiving tube.

Preferably, the process of emitting the first infrared ray to the target location by using an infrared emitting device and acquiring the second infrared ray reflected by the first infrared ray at the target location by using an infrared receiving device includes:

driving the infrared emission device to emit third infrared rays to the target position by using a pulse width modulation circuit; the third infrared ray is a group of infrared rays with the same preset frequency or a plurality of groups of infrared rays with different preset frequencies;

and acquiring a fourth infrared ray reflected by the third infrared ray on the cloth to be sewn by using the infrared receiving device.

Preferably, after the process of obtaining the fourth infrared ray reflected by the third infrared ray on the cloth to be sewn by using the infrared receiving device, the method further includes:

extracting a fifth infrared ray corresponding to the frequency characteristic of the third infrared ray from the fourth infrared ray by using a demodulation circuit, and calculating the target thickness of the cloth to be sewn at the target position by using a third included angle and a fourth included angle; the third included angle is an included angle between the third infrared ray and the horizontal plane where the target position is located and the cloth to be sewn, and the fourth included angle is an included angle between the fifth infrared ray and the horizontal plane where the target position is located and the cloth to be sewn.

Correspondingly, the invention also discloses a sewing device for the cloth, which comprises:

the infrared ray acquisition module is used for emitting first infrared rays to a target position of cloth to be sewn and acquiring second infrared rays reflected by the first infrared rays at the target position when the cloth to be sewn with different thicknesses needs to be sewn; the target position is any point on the cloth to be sewn;

the thickness calculating module is used for calculating the target thickness of the cloth to be sewn at the target position by utilizing the first included angle and the second included angle; the first included angle is an included angle between the first infrared ray and the horizontal plane of the cloth to be sewn at the target position; the second included angle is an included angle between the second infrared ray and the horizontal plane of the cloth to be sewn at the target position;

and the cloth sewing module is used for presetting a target sewing method for sewing the cloth to be sewn according to the target thickness of the cloth to be sewn at the target position so as to sew the cloth to be sewn by utilizing the target sewing method.

Correspondingly, the invention also discloses a sewing device for the cloth, which comprises:

a memory for storing a computer program;

a processor for implementing the steps of the cloth sewing method as disclosed above when executing the computer program.

Accordingly, the present invention also discloses a computer readable storage medium, on which a computer program is stored, which, when being executed by a processor, implements the steps of a method for sewing a cloth as disclosed above.

Therefore, in the cloth sewing method provided by the invention, when the cloth to be sewn with different thicknesses needs to be sewn, first infrared rays are emitted to the target position of the cloth to be sewn, and second infrared rays reflected by the first infrared rays at the target position of the cloth to be sewn are obtained; then, a first included angle between the first infrared ray and the horizontal plane of the cloth to be sewn at the target position and a second included angle between the second infrared ray and the horizontal plane of the cloth to be sewn at the target position are obtained, and the target thickness of the cloth to be sewn at the target position is calculated by utilizing the first included angle and the second included angle; and finally, presetting a target sewing method for sewing the cloth to be sewn according to the calculated target thickness of the cloth to be sewn so as to sew the cloth to be sewn by using the target sewing method. Obviously, compared with the prior art, the method provided by the invention can calculate the target thickness of the cloth to be sewn at the target position before the cloth to be sewn is sewn, so that a worker can preset the target sewing method of the cloth to be sewn according to the calculated target thickness of the cloth to be sewn at the target position, the condition that the presser foot lifting height of the sewing machine cannot respond to the thickness change of the cloth to be sewn in time can be avoided in the process of sewing the cloth to be sewn by the sewing machine, the phenomenon that the length of sewing stitches is inconsistent at the boundary of the cloth thickness position where the cloth to be sewn is sewn by the sewing machine is avoided, and the sewing quality of the cloth to be sewn can be obviously improved. Correspondingly, the sewing device, equipment and medium for the cloth disclosed by the invention also have the beneficial effects.

Drawings

In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the description of the embodiments or the prior art will be briefly described below, it is obvious that the drawings in the following description are only embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to the provided drawings without creative efforts.

Fig. 1 is a flowchart of a method for sewing a fabric according to an embodiment of the present invention;

FIG. 2 is a schematic view showing the propagation of light rays when the infrared emitting device emits first infrared rays and the infrared receiving device receives second infrared rays;

FIG. 3 is a block diagram of a cloth thickness calculation system according to an embodiment of the present invention;

FIG. 4 is a structural view of a cloth sewing apparatus according to an embodiment of the present invention;

fig. 5 is a structural view of a cloth sewing apparatus according to an embodiment of the present invention.

Detailed Description

The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.

Referring to fig. 1, fig. 1 is a flowchart of a method for sewing a fabric according to an embodiment of the present invention, the method for sewing a fabric includes:

step S11: when the cloth to be sewn with different thicknesses needs to be sewn, emitting first infrared rays to a target position of the cloth to be sewn, and acquiring second infrared rays reflected by the first infrared rays at the target position;

wherein the target position is any point on the cloth to be sewn;

step S12: calculating the target thickness of the cloth to be sewn at the target position by using the first included angle and the second included angle;

the first included angle is an included angle between the first infrared ray and a horizontal plane where the cloth to be sewn is located at the target position; the second included angle is an included angle between the second infrared ray and a horizontal plane where the cloth to be sewn is located at the target position;

step S13: and presetting a target sewing method for sewing the cloth to be sewn according to the target thickness of the cloth to be sewn at the target position, so as to sew the cloth to be sewn by using the target sewing method.

In order to improve the sewing quality of the cloth to be sewn, in the embodiment, a new cloth sewing method is provided. In the cloth sewing method, when the cloth to be sewn with different thicknesses needs to be sewn, first infrared rays are emitted to a target position of the cloth to be sewn, namely, the first infrared rays are emitted to any point of the cloth to be sewn, and second infrared rays reflected by the first infrared rays at the target position of the cloth to be sewn are obtained.

When second infrared rays reflected by the cloth to be sewn at the target position are obtained, a first included angle between the first infrared rays and the horizontal plane of the cloth to be sewn at the target position and a second included angle between the second infrared rays and the horizontal plane of the cloth to be sewn at the target position are obtained; when the first included angle and the second included angle are obtained, calculating the cloth thickness of the cloth to be sewn at the target position by using the first included angle and the second included angle, namely calculating the target thickness of the cloth to be sewn at the target position by using the first included angle and the second included angle. In addition, since calculating the cloth thickness of the cloth to be sewn by using the first included angle and the second included angle is well known by those skilled in the art, in this embodiment, the method for calculating the cloth thickness is not described in detail.

It can be understood that, when the target thickness of the cloth to be sewn at the target position is obtained through calculation, the worker can preset a target sewing method for sewing the cloth to be sewn according to the target thickness of the cloth to be sewn at the target position, that is, parameters such as the rotating speed, the torque, the stitch length and the like of the sewing machine motor are set according to the target thickness of the cloth to be sewn at the target position, and thus the target sewing method for sewing the cloth to be sewn is obtained. It is conceivable that, after the target sewing method of the cloth to be sewn is set in advance according to the target thickness of the cloth to be sewn at the target position, the worker may store the code program corresponding to the target sewing method in advance in the control program of the sewing machine, so that the sewing machine can sew the cloth to be sewn according to the preset target sewing method.

Obviously, in the cloth sewing method provided in this embodiment, since the target thickness of the cloth to be sewn at the target position can be detected before the sewing machine sews the cloth to be sewn, the phenomenon that the thickness of the cloth to be sewn can be detected only when the cloth to be sewn reaches the position below the presser foot of the sewing machine in the prior art can be avoided, and thus the technical problem that the lifting height of the presser foot cannot respond to the change of the thickness of the cloth to be sewn in time is avoided. The cloth sewing method provided by the embodiment can avoid the phenomenon that the sewing machine sews the inconsistent stitch length at the thick and thin junction of the cloth to be sewn, thereby further improving the sewing quality of the sewing machine in the sewing process of the cloth to be sewn.

It can be seen that, in the cloth sewing method provided in this embodiment, when the cloth to be sewn with different thicknesses needs to be sewn, first infrared rays are emitted to a target position of the cloth to be sewn, and second infrared rays reflected by the first infrared rays at the target position of the cloth to be sewn are obtained; then, a first included angle between the first infrared ray and the horizontal plane of the cloth to be sewn at the target position and a second included angle between the second infrared ray and the horizontal plane of the cloth to be sewn at the target position are obtained, and the target thickness of the cloth to be sewn at the target position is calculated by utilizing the first included angle and the second included angle; and finally, presetting a target sewing method for sewing the cloth to be sewn according to the calculated target thickness of the cloth to be sewn so as to sew the cloth to be sewn by using the target sewing method. Obviously, compared with the prior art, by the method provided by the embodiment, the target thickness of the cloth to be sewn at the target position can be calculated before the cloth to be sewn is sewn, so that a worker can preset the target sewing method of the cloth to be sewn according to the calculated target thickness of the cloth to be sewn at the target position, and thus, the condition that the presser foot lifting height of the sewing machine cannot respond to the thickness change of the cloth to be sewn in time can be avoided in the sewing process of the cloth to be sewn by the sewing machine, the phenomenon that the length of sewing stitches is inconsistent at the boundary of the cloth thickness of the cloth to be sewn by the sewing machine is avoided, and the sewing quality of the cloth to be sewn can be remarkably improved.

Based on the above embodiments, this embodiment further describes and optimizes the technical solution, specifically, the steps are as follows: the process of emitting first infrared rays to a target position of cloth to be sewn and acquiring second infrared rays reflected by the first infrared rays at the target position comprises the following steps:

the infrared transmitting device is used for transmitting first infrared rays to the target position, and the infrared receiving device is used for acquiring second infrared rays reflected by the first infrared rays at the target position.

It is understood that, in a normal case, the first infrared ray emitted toward the target position and the second infrared ray reflected by the first infrared ray at the target position are generally uniformly distributed on both sides centering on the target position, so in the present embodiment, in order to avoid mutual interference of the first infrared ray and the second infrared ray in the emitting and receiving processes, the first infrared ray is emitted and the second infrared ray is received by the infrared emitting device and the infrared receiving device, respectively. That is, the first infrared ray is emitted to the target position by the infrared emitting device, and then the second infrared ray reflected by the first infrared ray at the target position is obtained by the infrared receiving device, so that the first infrared ray and the second infrared ray are independent and do not interfere with each other in the emitting process and the receiving process, and the accuracy and the reliability of the emitting result of the first infrared ray and the receiving result of the second infrared ray are ensured.

Specifically, in practical application, the infrared emitting device may be set as an infrared emitting tube, a laser pen, or a single chip microcomputer capable of emitting infrared rays, and the like, and the infrared receiving device may be set as an infrared receiving head, or an infrared receiving tube, and the like, as long as the purpose of practical application can be achieved.

In a preferred embodiment, the infrared emitting device and the infrared receiving device are not on the same horizontal plane.

Referring to fig. 2, fig. 2 is a schematic view illustrating light propagation when the infrared emitting device emits a first infrared ray and the infrared receiving device receives a second infrared ray. It can be considered that, since the cloth to be sewn may have different cloth thicknesses at different positions, if the infrared transmitting device and the infrared receiving device are disposed on the same horizontal plane, a phenomenon that a plurality of infrared rays are converged at one infrared ray convergence point may occur in a second infrared ray reflected by a first infrared ray acquired by the infrared receiving device at a target position, and obviously, this phenomenon may seriously affect the calculation accuracy of calculating the target thickness of the cloth to be sewn at the target position in a subsequent process.

Therefore, by the technical scheme provided by the embodiment, the accuracy and the reliability of the target thickness calculation result of the cloth to be sewn at the target position can be further ensured.

As a preferred embodiment, the infrared emitting device is an array type infrared emitting tube, and the infrared receiving device is an array type infrared receiving tube.

Specifically, in this embodiment, the infrared emitting device is configured as an array-type infrared emitting tube, and the infrared receiving device is configured as an array-type infrared receiving tube, because the array-type infrared emitting tube and the array-type infrared receiving tube can relatively increase the emitting area and the receiving area of the first infrared ray and the second infrared ray in the emitting and receiving processes, and the array-type infrared emitting tube and the array-type infrared receiving tube are also convenient for flexible setting and adjustment in the actual operation process, thereby further increasing the convenience of the first infrared ray and the second infrared ray in the emitting and receiving processes.

As a preferred embodiment, the above steps: a process of emitting a first infrared ray to a target position by an infrared emitting device and acquiring a second infrared ray reflected by the first infrared ray at the target position by an infrared receiving device, comprising:

driving an infrared emission device to emit third infrared rays to the target position by using a pulse width modulation circuit;

the third infrared ray is a group of infrared rays with the same preset frequency or a plurality of groups of infrared rays with different preset frequencies;

and acquiring a fourth infrared ray reflected by the third infrared ray on the cloth to be sewn by using the infrared receiving device.

It can be understood that, in practical applications, some infrared rays may exist in an external environment, and the infrared rays may interfere with an emission process of the first infrared rays and an extraction process of extracting second infrared rays corresponding to the first infrared rays in a subsequent process, so in order to distinguish the infrared rays from the first infrared rays, in this embodiment, first, the pulse width modulation circuit is used to drive the infrared emission device to emit third infrared rays to a target position of a cloth to be sewn, and then, the infrared reception device is used to obtain fourth infrared rays reflected by the third infrared rays on the cloth to be sewn.

That is, the PWM (Pulse Width Modulation) wave emitted by the Pulse Width Modulation circuit is used to drive the infrared emission device to emit the preset infrared ray with the preset frequency to the target position of the cloth to be sewn, wherein the third infrared ray emitted to the target position of the cloth to be sewn may be a set of infrared rays with the same preset frequency or a plurality of sets of infrared rays with different preset frequencies. It is conceivable that when the infrared emitting device is driven by the pulse width modulation circuit to emit the third infrared ray having the preset frequency to the target position, the third infrared ray can be distinguished from the infrared ray existing in the external environment.

Moreover, when a plurality of groups of infrared rays with different preset frequencies are emitted to the target position of the cloth to be sewn, a plurality of groups of infrared rays reflected from the target position of the cloth to be sewn correspondingly exist. In this case, the target thickness of the cloth to be sewn calculated by using the plurality of sets of infrared rays can be mutually corrected, and thus the calculation accuracy of the target thickness of the cloth to be sewn is further improved.

Therefore, by the technical scheme provided by the embodiment, the interference of the infrared ray existing in the external environment to the first infrared ray emission process can be relatively avoided.

As a preferred embodiment, the above steps: after the process of acquiring the fourth infrared ray reflected by the third infrared ray on the cloth to be sewn by using the infrared receiving device, the method further comprises the following steps:

extracting a fifth infrared ray corresponding to the frequency characteristic of the third infrared ray from the fourth infrared ray by using a demodulation circuit, and calculating the target thickness of the cloth to be sewn at the target position by using the third included angle and the fourth included angle;

the third included angle is an included angle between the third infrared ray and a horizontal plane of the cloth to be sewn at the target position, and the fourth included angle is an included angle between the fifth infrared ray and the horizontal plane of the cloth to be sewn at the target position.

In consideration of the fact that in practical application, infrared rays with specific frequency exist in sunlight and certain alternating current pulse components also exist in the heating infrared rays, the infrared receiving device has many impurity components in the fourth infrared rays reflected by the cloth to be sewn after the third infrared rays are obtained.

In the present embodiment, after the fourth infrared ray reflected by the third infrared ray on the cloth to be sewn is obtained by the infrared receiving device, a fifth infrared ray corresponding to the frequency characteristic of the third infrared ray is further extracted from the fourth infrared ray by using the demodulation circuit, that is, the fifth infrared ray having the same frequency as that of the third infrared ray is extracted from the fourth infrared ray by using the demodulation circuit, so that the impurity ac pulse in the fourth infrared ray and the infrared ray having a specific frequency in the sunlight are filtered out.

Referring to fig. 3, fig. 3 is a structural diagram of a cloth thickness calculating system according to an embodiment of the present invention. In the cloth thickness calculation system, a pulse width modulation circuit firstly drives an infrared emitting device to emit third infrared rays with preset frequency to a target position of cloth to be sewn, and meanwhile, an infrared receiving device receives fourth infrared rays reflected by the third infrared rays at the target position; and finally, the signal processor calculates the cloth thickness of the cloth to be sewn at the target position through a third included angle between the third infrared ray and the horizontal plane of the cloth to be sewn at the target position and a fourth included angle between the fifth infrared ray and the horizontal plane of the cloth to be sewn at the target position. Obviously, when the impurity components in the fourth infrared ray are filtered, the obtained fourth included angle between the fifth infrared ray and the horizontal plane of the cloth to be sewn at the target position is more accurate, and then the target thickness of the cloth to be sewn at the target position calculated by the third included angle and the fourth included angle is more accurate and reliable.

Therefore, by the technical scheme provided by the embodiment, the accuracy and the reliability of the target thickness calculation result of the cloth to be sewn at the target position can be further ensured.

Referring to fig. 4, fig. 4 is a structural diagram of a cloth sewing apparatus according to an embodiment of the present invention, the cloth sewing apparatus includes:

the infrared ray acquisition module 21 is configured to emit first infrared rays to a target position of cloth to be sewn when the cloth to be sewn with different thicknesses needs to be sewn, and acquire second infrared rays reflected by the first infrared rays at the target position; wherein the target position is any point on the cloth to be sewn;

the thickness calculating module 22 is used for calculating the target thickness of the cloth to be sewn at the target position by using the first included angle and the second included angle; the first included angle is an included angle between the first infrared ray and a horizontal plane where the cloth to be sewn is located at the target position; the second included angle is an included angle between the second infrared ray and a horizontal plane where the cloth to be sewn is located at the target position;

the cloth sewing module 23 is configured to preset a target sewing method for sewing the cloth to be sewn according to a target thickness of the cloth to be sewn at a target position, so as to sew the cloth to be sewn by using the target sewing method.

The sewing device for the cloth provided by the embodiment of the invention has the beneficial effects of the sewing method for the cloth disclosed in the invention.

Referring to fig. 5, fig. 5 is a structural diagram of a cloth sewing apparatus according to an embodiment of the present invention, the cloth sewing apparatus includes:

a memory 31 for storing a computer program;

the processor 32 is used for implementing the steps of the sewing method for cloth as disclosed in the foregoing when executing the computer program.

The sewing equipment for the cloth provided by the embodiment of the invention has the beneficial effects of the disclosed sewing method for the cloth.

Accordingly, the embodiment of the present invention further discloses a computer readable storage medium, wherein a computer program is stored on the computer readable storage medium, and when the computer program is executed by a processor, the steps of the cloth sewing method disclosed in the foregoing are realized.

The computer-readable storage medium disclosed by the embodiment of the invention has the beneficial effects of the cloth sewing method disclosed by the invention.

The embodiments are described in a progressive manner, each embodiment focuses on differences from other embodiments, and the same or similar parts among the embodiments are referred to each other. The device disclosed by the embodiment corresponds to the method disclosed by the embodiment, so that the description is simple, and the relevant points can be referred to the method part for description.

Finally, it should also be noted that, herein, relational terms such as first and second, and the like may be used solely to distinguish one entity or action from another entity or action without necessarily requiring or implying any actual such relationship or order between such entities or actions. Also, the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or apparatus. Without further limitation, an element defined by the phrase "comprising an … …" does not exclude the presence of other identical elements in a process, method, article, or apparatus that comprises the element.

The method, the device, the equipment and the medium for sewing the cloth provided by the invention are described in detail, the principle and the implementation mode of the invention are explained by applying specific examples, and the description of the examples is only used for helping to understand the method and the core idea of the invention; meanwhile, for a person skilled in the art, according to the idea of the present invention, there may be variations in the specific embodiments and the application scope, and in summary, the content of the present specification should not be construed as a limitation to the present invention.