阅读说明：本技术 剥离液储罐、光阻剥离设备及方法 (Stripping liquid storage tank, photoresist stripping equipment and method ) 是由 李洋 王云志 罗云 于 2019-09-25 设计创作，主要内容包括：本申请提供了一种剥离液储罐、光阻剥离设备及方法,属于显示技术领域。剥离液储罐包括：罐体,以及,固定在罐体内的吸附过滤组件,罐体上设置有进液口和出液口,该吸附过滤组件位于进液口与出液口之间；该吸附过滤组件包括吸附层,该吸附层用于对从进液口进入罐体并流向出液口的剥离液中的光阻碎片进行吸附。由于吸附过滤组件中的吸附层可以对剥离液中的光阻碎片进行吸附,因此经过该吸附过滤组件的剥离液中残留的光阻碎片较少,再次利用该剥离液剥离光阻时,能够残留在基板上的光阻碎片较少,有助于提高显示产品的良率和品质。(The application provides a stripping liquid storage tank, a photoresist stripping device and a method, and belongs to the technical field of display. The stripping solution storage tank includes: the tank body is provided with a liquid inlet and a liquid outlet, and the adsorption and filtration assembly is positioned between the liquid inlet and the liquid outlet; this adsorb filtering component includes the adsorbed layer, and this adsorbed layer is arranged in adsorbing the light resistance piece in the stripper that gets into jar body and flow to the liquid outlet from the inlet. Because the adsorption layer in the adsorption filtering assembly can adsorb the photoresist fragments in the stripping liquid, the residual photoresist fragments in the stripping liquid passing through the adsorption filtering assembly are less, and when the stripping liquid is reused for stripping the photoresist, the residual photoresist fragments on the substrate are less, thereby being beneficial to improving the yield and the quality of display products.)

1. A stripping liquid storage tank, comprising:

the tank body is provided with a liquid inlet and a liquid outlet, and the adsorption filtering component is positioned between the liquid inlet and the liquid outlet;

the adsorption and filtration assembly comprises an adsorption layer, and the adsorption layer is used for adsorbing light resistance fragments which enter the tank body from the liquid inlet and flow to stripping liquid of the liquid outlet.

2. The stripping liquid storage tank according to claim 1,

the material of the adsorption layer is macroporous adsorption resin.

3. The stripping liquid storage tank according to claim 2,

the pore size of the macroporous adsorption resin is 0.5-1.5 microns.

4. The stripping liquid storage tank according to claim 1,

the adsorption filtration assembly further comprises: the adsorption layer is arranged between every two adjacent filter layers in the at least two filter layers.

5. The stripping liquid storage tank according to claim 4,

the shape of the filter pores of the filter layer comprises: at least one of circular or polygonal.

6. The stripping liquid storage tank according to claim 5,

the size of the filter holes of the filter layer is 0.5 mm-1.5 mm.

7. The stripping liquid storage tank according to claim 4,

the adsorption filtration assembly comprises: the filter layer is a filter screen.

8. The stripping solution tank according to any one of claims 1 to 7,

the inlet is located on the lateral wall of the tank body, the liquid outlet is located on the top surface of the tank body, the adsorption and filtration component is fixed on the inner wall of the tank body, and the adsorption and filtration component is parallel to the bottom surface of the tank body.

9. A resist stripping apparatus, characterized by comprising: a stripping mechanism, a cleaning mechanism and an air drying mechanism, the stripping mechanism comprising the stripping liquid tank according to any one of claims 1 to 8,

the stripping mechanism is used for stripping the photoresistor on the substrate to be stripped by using the stripping liquid in the stripping liquid storage tank, wherein the adsorption filtering assembly is used for adsorbing and filtering photoresistor fragments in the stripping liquid when the stripping liquid passes through the adsorption filtering assembly;

the cleaning mechanism is used for cleaning the substrate to be stripped after the stripping mechanism strips the photoresistor on the substrate to be stripped, and removing the residual photoresistor and stripping liquid on the substrate to be stripped;

and the air drying mechanism is used for drying the substrate to be peeled after the cleaning mechanism cleans the substrate to be peeled.

10. The resist stripping apparatus according to claim 9,

the stripping mechanism, the cleaning mechanism and the air drying mechanism are arranged along a target direction,

the peeling mechanism includes: m filters, m +1 stripping solution storage tanks, m +1 liquid pumps and m +1 stripping chambers arranged along the target direction, wherein m is an integer greater than or equal to 1,

the liquid outlets of the m +1 stripping liquid storage tanks are communicated with the liquid inlets of the m +1 liquid pumps in a one-to-one correspondence manner, the liquid outlets of the m +1 liquid pumps are positioned in the m +1 stripping chambers in a one-to-one correspondence manner, the liquid inlets of the m filters are positioned in the m last stripping chambers arranged along the target direction in a one-to-one correspondence manner, and the liquid outlets of the m filters are communicated with the liquid inlets of the stripping liquid storage tanks corresponding to the m first stripping chambers arranged along the target direction in the m +1 stripping liquid storage tanks in a one-to-one correspondence manner;

each filter is used for filtering the stripping liquid flowing to the filter in the corresponding stripping chamber and guiding the filtered stripping liquid into the corresponding stripping liquid storage tank;

each liquid pump is used for pumping the stripping liquid in the corresponding stripping liquid storage tank and spraying the stripping liquid into the corresponding stripping chamber, and the adsorption filtration assembly in each stripping liquid storage tank is used for adsorption filtration of the photoresist fragments in the stripping liquid in the process of pumping the stripping liquid from the stripping liquid storage tank by the corresponding liquid pump.

11. A resist stripping method for the resist stripping apparatus according to claim 9 or 10, the method comprising:

stripping the photoresist on the substrate to be stripped by using stripping liquid in a stripping liquid storage tank of the stripping mechanism through a stripping mechanism, wherein an adsorption filtering assembly in the stripping liquid storage tank is used for adsorbing and filtering photoresist fragments in the stripping liquid when the stripping liquid passes through the adsorption filtering assembly;

cleaning the substrate to be stripped through a cleaning mechanism, and removing residual light resistance and stripping liquid on the substrate to be stripped;

and air-drying the substrate to be peeled through an air-drying mechanism.

Technical Field

The application relates to the technical field of display, in particular to a stripping liquid storage tank, a photoresist stripping device and a method.

Background

The manufacturing process of the display product generally includes a front-end manufacturing process, a middle-end manufacturing process and a back-end assembling process, wherein the front-end manufacturing process is mainly used for manufacturing functional patterns on the substrate. In the front-end process, firstly, a film is deposited on a substrate and coated with a light resistance, then, the light resistance is sequentially exposed and developed to obtain a light resistance pattern, then, the film is etched under the shielding of the light resistance pattern, and finally, the light resistance pattern is stripped through light resistance stripping equipment to obtain a functional pattern.

Disclosure of Invention

The embodiment of the application provides a stripping liquid storage tank, a photoresist stripping device and a method, which are beneficial to improving the yield and quality of display products. The technical scheme is as follows:

in a first aspect, there is provided a stripping liquid storage tank comprising:

the tank body is provided with a liquid inlet and a liquid outlet, and the adsorption filtering component is positioned between the liquid inlet and the liquid outlet;

the adsorption and filtration assembly comprises an adsorption layer, and the adsorption layer is used for adsorbing light resistance fragments which enter the tank body from the liquid inlet and flow to stripping liquid of the liquid outlet.

Optionally, the material of the adsorption layer is macroporous adsorption resin.

Optionally, the macroporous adsorbent resin has a pore size of 0.5 to 1.5 microns.

Optionally, the adsorptive filter assembly further comprises: the adsorption layer is arranged between every two adjacent filter layers in the at least two filter layers.

Optionally, the shape of the filter pores of the filter layer comprises: at least one of circular or polygonal.

Optionally, the size of the filtration pores of the filtration layer is 0.5 mm to 1.5 mm.

Optionally, the adsorptive filter assembly comprises: the filter layer is a filter screen.

Optionally, the liquid inlet is located on the lateral wall of the tank body, the liquid outlet is located on the top surface of the tank body, the adsorption and filtration component is fixed on the inner wall of the tank body, and the adsorption and filtration component is parallel to the bottom surface of the tank body.

In a second aspect, there is provided a resist stripping apparatus comprising: a stripping mechanism, a cleaning mechanism and an air drying mechanism, wherein the stripping mechanism comprises the stripping solution storage tank of any one of the first aspect,

the stripping mechanism is used for stripping the photoresistor on the substrate to be stripped by using the stripping liquid in the stripping liquid storage tank, wherein the adsorption filtering assembly is used for adsorbing and filtering photoresistor fragments in the stripping liquid when the stripping liquid passes through the adsorption filtering assembly;

the cleaning mechanism is used for cleaning the substrate to be stripped after the stripping mechanism strips the photoresistor on the substrate to be stripped, and removing the residual photoresistor and stripping liquid on the substrate to be stripped;

and the air drying mechanism is used for drying the substrate to be peeled after the cleaning mechanism cleans the substrate to be peeled.

Optionally, the peeling mechanism, the washing mechanism and the seasoning mechanism are arranged along a target direction,

the peeling mechanism includes: m filters, m +1 stripping solution storage tanks, m +1 liquid pumps and m +1 stripping chambers arranged along the target direction, wherein m is an integer greater than or equal to 1,

the liquid outlets of the m +1 stripping liquid storage tanks are communicated with the liquid inlets of the m +1 liquid pumps in a one-to-one correspondence manner, the liquid outlets of the m +1 liquid pumps are positioned in the m +1 stripping chambers in a one-to-one correspondence manner, the liquid inlets of the m filters are positioned in the m last stripping chambers arranged along the target direction in a one-to-one correspondence manner, and the liquid outlets of the m filters are communicated with the liquid inlets of the stripping liquid storage tanks corresponding to the m first stripping chambers arranged along the target direction in the m +1 stripping liquid storage tanks in a one-to-one correspondence manner;

each filter is used for filtering the stripping liquid flowing to the filter in the corresponding stripping chamber and guiding the filtered stripping liquid into the corresponding stripping liquid storage tank;

each liquid pump is used for pumping the stripping liquid in the corresponding stripping liquid storage tank and spraying the stripping liquid into the corresponding stripping chamber, and the adsorption filtration assembly in each stripping liquid storage tank is used for adsorption filtration of the photoresist fragments in the stripping liquid in the process of pumping the stripping liquid from the stripping liquid storage tank by the corresponding liquid pump.

In a third aspect, there is provided a photoresist stripping method for the photoresist stripping apparatus of the second aspect, the method comprising:

stripping the photoresist on the substrate to be stripped by using stripping liquid in a stripping liquid storage tank of the stripping mechanism through a stripping mechanism, wherein an adsorption filtering assembly in the stripping liquid storage tank is used for adsorbing and filtering photoresist fragments in the stripping liquid when the stripping liquid passes through the adsorption filtering assembly;

cleaning the substrate to be stripped through a cleaning mechanism, and removing residual light resistance and stripping liquid on the substrate to be stripped;

and air-drying the substrate to be peeled through an air-drying mechanism.

The beneficial effects that technical scheme that this application embodiment provided brought include:

according to the stripping liquid storage tank, the photoresist stripping device and the method, after the stripping mechanism uses the stripping liquid in the stripping liquid storage tank to strip the photoresist on the substrate to be stripped, the substrate to be stripped is cleaned by the cleaning mechanism, then the substrate to be stripped is air-dried by the air-drying mechanism, the adsorption layer in the adsorption filtering assembly can adsorb the photoresist fragments in the stripping liquid when the stripping liquid passes through the adsorption filtering assembly, so that the residual photoresist fragments in the stripping liquid passing through the stripping liquid storage tank are less, when the stripping liquid is reused to strip the photoresist, the residual photoresist fragments on the substrate are less, and the yield and the quality of a display product are improved.

Drawings

FIG. 1 is a schematic structural diagram of a stripping solution storage tank according to an embodiment of the present disclosure;

FIG. 2 is a schematic structural diagram of an adsorption filter assembly provided in an embodiment of the present application;

FIG. 3 is an elevation view of a filter layer provided by embodiments of the present application;

FIG. 4 is a view illustrating an exemplary embodiment of a photoresist stripping apparatus;

FIG. 5 is a flowchart of a method of stripping photoresist according to an embodiment of the present application.

Detailed Description

To make the objects, technical solutions and advantages of the present application more clear, embodiments of the present application will be described in further detail below with reference to the accompanying drawings.

In the manufacturing process of the display product, the photoresist on the substrate to be stripped can be stripped through the photoresist stripping equipment. The photoresist stripping apparatus generally includes a stripping liquid tank, a filter, a liquid pump and a stripping chamber, wherein the liquid pump is used for pumping and spraying the stripping liquid in the stripping liquid tank onto a substrate to be stripped in the stripping chamber to strip the photoresist on the substrate to be stripped, the filter is used for filtering the stripping liquid flowing from the stripping chamber to the filter, and guiding the filtered stripping liquid into the stripping liquid tank so as to recycle and reuse the stripping liquid. However, the size of the filter holes in the existing filter is usually 1 micron to 2 microns, the size of the photoresist fragments generated in the stripping process is usually 0.1 micron to 5 microns, the filter cannot filter the photoresist fragments with the size smaller than 1 micron, and when the stripping solution is reused, the photoresist fragments are easy to remain on the substrate to be stripped, so that the yield and the quality of the display product are affected. It is easy to understand that the photoresist debris with the size less than 1 micron can be filtered out by reducing the size of the filter holes in the filter, but researches find that the filter is easy to block due to reducing the size of the filter holes in the filter, the scheme is not feasible in practical application, and no better method is available for removing the photoresist debris with the size less than 1 micron.

For example, an Organic Light-emitting Diode (OLED) has the advantages of self-luminescence, wide viewing angle, high contrast, low power consumption, and very high response speed, and the OLED display becomes the most promising display product with the development of display technology. OLED displays generally include High Definition (HD) displays, Full High Definition (FHD) displays, and ultra High Definition (QHD) displays. The pixel size of the HD display is 79 micrometers, the resolution of the QHD display is 49 micrometers, the HD display and the FHD display are large, the residue of the light resistance fragments with the size smaller than 1 micrometer on the HD display and the FHD display does not obviously affect the quality of the HD display and the FHD display, but the QHD display is small in pixel size, and the residue of the light resistance fragments with the size smaller than 1 micrometer on the QHD display can cause the abnormity of the QHD display, for example, the QHD display can generate a large number of white dots, and the yield and the quality of the QHD display are seriously affected.

The embodiment of the application provides a stripping liquid storage tank, photoresistance stripping equipment and method, photoresistance stripping equipment includes filter and stripping liquid storage tank, the internal absorption filter assembly that is provided with of jar of this stripping liquid storage tank, the stripping liquid that filters through the filter gets into jar body and flows to the liquid outlet of this stripping liquid storage tank from the inlet of this stripping liquid storage tank, when the stripping liquid passes through absorption filter assembly, the adsorbed layer in this absorption filter assembly can adsorb the photoresistance piece in the stripping liquid and filter, consequently, it is less to remain the photoresistance piece in the stripping liquid through this stripping liquid storage tank, when utilizing this stripping liquid to strip the photoresistance again, the photoresistance piece that can remain on the base plate is less, thereby can avoid showing the secondary pollution of product, help improving the yield and the quality that show the product. For details of the present application, reference is made to the following examples.

Referring to fig. 1, which shows a schematic structural diagram of a stripping solution storage tank 01 provided in an embodiment of the present application, referring to fig. 1, the stripping solution storage tank 01 includes: tank 011 and adsorption filtration subassembly 012. Be provided with inlet 0111 and liquid outlet 0112 on jar body 011, adsorption filtration subassembly 012 is fixed in jar body 011 and is located between inlet 0111 and the liquid outlet 0112. The adsorption filter assembly 012 includes an adsorption layer (not shown in fig. 1) for adsorbing a photoresist fragment in a stripping liquid (not shown in fig. 1) that enters the stripping liquid tank 01 from the liquid inlet 0111 and flows to the liquid outlet 0112.

To sum up, the stripping liquid storage tank that this application embodiment provided, because the internal adsorption filtration subassembly that is provided with of jar, this adsorption filtration subassembly is located between the inlet of the jar body and the liquid outlet, the adsorbed layer among this adsorption filtration subassembly can adsorb the light resistance piece in the stripping liquid that flows to the liquid outlet from the inlet entering jar body, consequently it is less to remain the light resistance piece in the stripping liquid of this stripping liquid storage tank through this stripping liquid, when this stripping liquid of reuse peels off the light resistance, can remain the light resistance piece on the base plate less, help improving the yield and the quality of demonstration product.

Optionally, the adsorptive filter component 012 further includes at least two filter layers, and an adsorptive layer is disposed between each adjacent two of the at least two filter layers. The filter layer has filter pores, the size of the filter pores may be 0.5 mm to 1.5 mm, for example, the size of the filter pores may be 0.8 mm, 1 mm, 1.2 mm, 1.4 mm, and the like, the shape of the filter pores may be at least one of circular or polygonal, for example, the shape of the filter pores may be circular, elliptical, triangular, or quadrangular. Alternatively, the filter layer may be a metal filter mesh or a rubber filter mesh. For example, referring to fig. 2, which shows a schematic structural diagram of an adsorption filter assembly 012 provided in an embodiment of the present application, referring to fig. 2, the adsorption filter assembly 012 includes: two filter layers 0121 and an adsorption layer 0122 arranged between the two filter layers 0121. Referring to fig. 3, which is an exemplary front view of a filter layer 0121 provided by the present application, referring to fig. 3, the shape of the filter holes of the filter layer 0121 may be equilateral triangle, and the side length of the equilateral triangle may be 1 mm.

Optionally, the material of the adsorption layer 0122 may be macroporous adsorption resin, which is usually prepared by adding a certain proportion of pore-forming agent into 0.5% gelatin solution and polymerizing with styrene and divinylbenzene as raw materials. Wherein, styrene is a polymerization monomer, divinylbenzene is a cross-linking agent, toluene or xylene is a pore-foaming agent, and the styrene and the divinylbenzene are mutually cross-linked and polymerized to form a porous skeleton structure of the macroporous adsorption resin. The macroporous adsorption resin adsorbs the adsorbed substance through a huge specific surface by utilizing Van der Waals attraction between the macroporous adsorption resin and the adsorbed substance. Currently commonly used macroporous adsorbent resins may include non-polar macroporous adsorbent resins, medium-polar macroporous adsorbent resins and polar macroporous adsorbent resins. In the embodiment of the present application, the macroporous adsorbent resin may be a nonpolar macroporous adsorbent resin, the particle size of the macroporous adsorbent resin may be 3 mm to 5 mm, and the pore size may be 0.5 micron to 1.5 micron, because the macroporous adsorbent resin may adsorb substances having a size smaller than the pore size thereof, the macroporous adsorbent resin may adsorb the photoresist fragments having a size smaller than 1.5 micron, for example, in the manufacturing process of the QHD display, the macroporous adsorbent resin may adsorb the photoresist fragments having a size smaller than 1 micron, so that the photoresist fragments remaining on the substrate are reduced, thereby improving the yield and quality of the QHD display, that is, improving the yield and quality of the high-resolution OLED display product.

As will be readily understood by those skilled in the art, the size of the filtration pores in the filtration layer 0121 may be 0.5 mm to 1.5 mm to ensure the solution circulation, and the particle size of the macroporous adsorbent resin may be 3 mm to 5 mm, since the size of the filtration pores in the filtration layer 0121 is smaller than the particle size of the macroporous adsorbent resin, the filtration layer 0121 may support the macroporous adsorbent resin to prevent the macroporous adsorbent resin from falling or diffusing, so that the macroporous adsorbent resin may be fixed between the two filtration layers 0121. In addition, it is easy to understand that after the macroporous adsorption resin is used for a certain number of times, the macroporous adsorption resin can adsorb more substances, so that after the macroporous adsorption resin is used for a certain number of times, the macroporous adsorption resin can be cleaned to remove the substances adsorbed by the macroporous adsorption resin, and then the macroporous adsorption resin can be reused after being dried. Optionally, the macroporous adsorbent resin may be washed with tris, and the temperature range for drying the macroporous adsorbent resin may be 250 to 350 ℃ (celsius), and the drying time range may be 3 to 4 hours.

Optionally, in this application embodiment, as shown in fig. 1, the liquid inlet 0111 is located on the side wall of the tank body 011, the liquid outlet 0112 is located on the top surface of the tank body 011, the adsorption and filtration component 012 is fixed on the inner wall of the tank body 011, and the adsorption and filtration component 012 is parallel to the bottom surface of the tank body 011. It should be noted that, in the embodiment of the present application, the adsorption filter element 012 and the bottom surface of the tank 011 may be parallel or approximately parallel, for example, an included angle between the adsorption filter element 012 and the bottom surface of the tank 011 is 0 degree, 1 degree, 2 degrees, 5 degrees or 10 degrees.

In the embodiment of the application, when the adsorption filter component 012 is arranged on the inner wall of the tank 011, the adsorption layer 0122 can be fixed between the two filter layers 0121 to form the adsorption filter component 012 with an integral structure, and then the adsorption filter component 012 is fixed on the inner wall of the tank 011; or, it may also be that one layer of filter layer 0121 is fixed on the inner wall of the tank 011 at first, then a layer of macroporous adsorption resin is disposed on the filter layer 0121 to obtain an adsorption layer 0122, and finally another layer of filter layer 0121 is disposed on the adsorption layer 0122 and fixed on the inner wall of the tank 011 to form an adsorption filtration component 012, and the above two implementation manners may be all to dispose the adsorption filtration component 012 in the tank 011, which is not limited in the embodiments of the present application.

To sum up, the stripping liquid storage tank that this application embodiment provided, because the internal adsorption filtration subassembly that is provided with of jar, this adsorption filtration subassembly is located between the inlet of the jar body and the liquid outlet, the adsorbed layer among this adsorption filtration subassembly can adsorb the light resistance piece in the stripping liquid that flows to the liquid outlet from the inlet entering jar body, consequently it is less to remain the light resistance piece in the stripping liquid of this stripping liquid storage tank through this stripping liquid, when this stripping liquid of reuse peels off the light resistance, can remain the light resistance piece on the base plate less, help improving the yield and the quality of demonstration product.

Referring to fig. 4, which shows a usage scenario of a photoresist stripping apparatus provided in an embodiment of the present application, referring to fig. 4, the photoresist stripping apparatus includes a stripping mechanism 0, a cleaning mechanism 1, and an air drying mechanism 2, the stripping mechanism 0 may include a stripping liquid storage tank 01 shown in fig. 1, and the stripping liquid storage tank 01 includes a tank 011 and an adsorption filter assembly 012 disposed in the tank 011.

The stripping mechanism 0 is configured to strip the photoresist on the substrate S to be stripped by using a stripping liquid in a stripping liquid storage tank 01, wherein the adsorption filtration assembly 012 is configured to adsorb and filter photoresist fragments in the stripping liquid when the stripping liquid passes through the adsorption filtration assembly 012.

The cleaning mechanism 1 is used for cleaning the substrate S to be peeled after the peeling mechanism 0 peels the photoresist on the substrate S to be peeled, and removing the residual photoresist and the peeling liquid on the substrate S to be peeled.

The air drying mechanism 2 is configured to air-dry the substrate S to be peeled after the cleaning mechanism 1 cleans the substrate S to be peeled.

Optionally, with continued reference to fig. 4, the peeling mechanism 0 includes: m filters 02, m +1 stripping solution storage tanks 01, m +1 liquid pumps 03 and m +1 stripping chambers 04, wherein the m +1 stripping chambers 04 are arranged along a target direction F, and m is an integer greater than or equal to 1. The liquid outlets of the m +1 stripping liquid storage tanks 01 are communicated with the liquid inlets of the m +1 liquid pumps 03 in a one-to-one correspondence manner, the liquid outlets of the m +1 liquid pumps 03 are located in the m +1 stripping chambers 04 in a one-to-one correspondence manner, the liquid inlets of the m filters 02 are located in the m last stripping chambers 04 arranged along the target direction F in a one-to-one correspondence manner, and the liquid outlets of the m filters 02 are communicated with the liquid inlets of the stripping liquid storage tanks 01 corresponding to the m previous stripping chambers 04 arranged along the target direction F in the m +1 stripping liquid storage tanks 01 in a one-to-one correspondence manner. Wherein each filter 02 is used for filtering the stripping liquid flowing to the filter 02 in the corresponding stripping chamber 04, and guiding the filtered stripping liquid into the corresponding stripping liquid storage tank 01; each of the liquid pumps 03 is configured to pump out the stripping liquid in the corresponding stripping liquid storage tank 011 and spray the stripping liquid into the corresponding stripping chamber 04, and the adsorption filtration assembly 012 in each stripping liquid storage tank 01 is configured to perform adsorption filtration on the photoresist fragments in the stripping liquid during the process of pumping out the stripping liquid from the stripping liquid storage tank 01 by the corresponding liquid pump 03.

For example, in fig. 4, when m is 2, the peeling mechanism 0 includes two filters 02, three peeling liquid tanks 01, three liquid pumps 03, and three peeling chambers 04. The description will be given by taking an example in which the two filters 02 include a first filter and a second filter, the three stripping liquid tanks 01 include a first stripping liquid tank, a second stripping liquid tank, and a third stripping liquid tank, the three drawing pumps 03 include a first drawing pump, a second drawing pump, and a third drawing pump, and the three stripping chambers 04 include a first stripping chamber, a second stripping chamber, and a third stripping chamber arranged in this order along the target direction F. The liquid outlet of the first stripping liquid storage tank is communicated with the liquid inlet of the first liquid pump, the liquid outlet of the first liquid pump is positioned in the first stripping chamber, the liquid inlet of the first filter is positioned in the second stripping chamber, the liquid outlet of the first filter is communicated with the liquid inlet of the first stripping liquid storage tank, the liquid outlet of the second stripping liquid storage tank is communicated with the liquid inlet of the second liquid pump, the liquid outlet of the second liquid pump is positioned in the second stripping chamber, the liquid inlet of the second filter is positioned in the third stripping chamber, the liquid outlet of the second filter is communicated with the liquid inlet of the second stripping liquid storage tank, the liquid outlet of the third stripping liquid storage tank is communicated with the liquid inlet of the third liquid pump, and the liquid outlet of the third liquid pump is positioned in the third stripping chamber. The first filter is used for filtering the stripping liquid flowing out of the second stripping chamber and guiding the filtered stripping liquid into the first stripping liquid storage tank, the first liquid pump is used for pumping the stripping liquid in the first stripping liquid storage tank and spraying the stripping liquid into the first stripping chamber, the second filter is used for filtering the stripping liquid flowing out of the third stripping chamber and guiding the filtered stripping liquid into the second stripping liquid storage tank, the second liquid pump is used for pumping the stripping liquid in the second stripping liquid storage tank and spraying the stripping liquid into the second stripping chamber, and the third liquid pump is used for pumping the stripping liquid in the third stripping liquid storage tank and spraying the stripping liquid into the third stripping chamber.

Alternatively, the cleaning mechanism 1 may include: n filters (not shown in fig. 4), n +1 water storage tanks (not shown in fig. 4), n +1 liquid pumps (not shown in fig. 4), and n +1 cleaning chambers (not shown in fig. 4), where the n +1 cleaning chambers are arranged along a target direction F, and n is an integer greater than or equal to 1. The liquid outlet of n +1 water storage tank communicates with the inlet one-to-one of n +1 drawing liquid pump, and the liquid outlet one-to-one of n +1 drawing liquid pump is located n +1 washrooms, and in the liquid outlet of n filter and n +1 water storage tank, communicate with the inlet one-to-one of the water storage tank that the preceding n washrooms that arranges along target direction F correspond. Each filter is used for filtering the deionized water flowing to the filter in the corresponding cleaning chamber and guiding the filtered deionized water into the corresponding water storage tank; each liquid pump is used for pumping the deionized water in the corresponding water storage tank and spraying the deionized water into the corresponding cleaning chamber.

For example, fig. 4 illustrates that n is 1, and the cleaning mechanism 1 includes one filter, two water storage tanks, two liquid pumps, and two cleaning chambers. The two water storage tanks include a first water storage tank and a second water storage tank, the two liquid pumps include a first liquid pump and a second liquid pump, and the two cleaning chambers include a first cleaning chamber and a second cleaning chamber which are sequentially arranged along the target direction F. The inlet of filter is located the second wash chamber, and the liquid outlet of filter and the inlet of first water storage tank intercommunication, the liquid outlet of first water storage tank and the inlet of first drawing liquid pump intercommunication, the liquid outlet of first drawing liquid pump are located the first wash chamber, the liquid outlet of second water storage tank and the inlet of second drawing liquid pump intercommunication, the liquid outlet of second drawing liquid pump is located the second wash chamber. The filter is used for filtering the deionized water that flows out to the second purge chamber to the leading-in first water storage tank of deionized water after will filtering, first drawing liquid pump is arranged in taking out the deionized water in the first water storage tank and sprays deionized water in the first purge chamber, and the second drawing liquid pump is arranged in taking out the deionized water in the second water storage tank and sprays deionized water in the second purge chamber. The drying mechanism 2 may include an air drying chamber (not shown in fig. 4) and an air knife (not shown in fig. 4) located in the air drying chamber, and the air knife may blow the deionized water on the surface of the substrate S to be peeled after the substrate S to be peeled is cleaned by the cleaning mechanism 1.

Alternatively, as shown in fig. 4, the peeling mechanism 0, the cleaning mechanism 1, and the air drying mechanism 2 are sequentially arranged along the target direction F, the cleaning mechanism 1 may be a first cleaning mechanism, the photoresist peeling apparatus may further include a liquid knife mechanism 3, a second cleaning mechanism 4, and a brush mechanism 5, the liquid knife mechanism 3, the second cleaning mechanism 4, and the brush mechanism 5 are all located between the peeling mechanism 0 and the cleaning mechanism 1, and the liquid knife mechanism 3, the second cleaning mechanism 4, and the brush mechanism 5 are sequentially arranged along the target direction F. The liquid knife mechanism 3 is used for scraping the residual photoresist on the substrate S to be peeled off after the photoresist on the substrate S to be peeled off is peeled off by the peeling mechanism 0, and optionally, the liquid knife mechanism 3 may comprise a liquid knife; the second cleaning mechanism 4 is used for cleaning the substrate S to be stripped after the liquid knife mechanism 3 scrapes off the photoresist on the substrate S to be stripped, and optionally, the cleaning agent in the second cleaning mechanism 4 may be hydroxymethyl aminomethane (THAM); the brush mechanism 5 is used for brushing off the photoresist on the substrate S to be stripped after the second cleaning mechanism 4 cleans the substrate S to be stripped, and optionally, the brush mechanism 5 may comprise a brush.

It should be noted that, in the embodiment of the present application, the photoresist stripping apparatus may further include a conveying mechanism (not shown in fig. 4) and a control mechanism (not shown in fig. 4), and the control mechanism is configured to control the conveying mechanism to convey the substrate S to be stripped along the target direction F. In addition, it is easy to understand that the working processes of the peeling mechanism 0, the cleaning mechanism 1, the air drying mechanism 2, the liquid knife mechanism 3, the cleaning mechanism 4 and the brush mechanism 5 can all be controlled by the control mechanism, for example, when the control mechanism controls the conveying mechanism to convey the substrate S to be peeled to the peeling chamber, the control mechanism controls the corresponding liquid pump in the peeling mechanism 0 to work to spray the peeling liquid on the substrate S to be peeled; when the control mechanism controls the conveying mechanism to convey the substrate S to be stripped to the cleaning chamber of the cleaning mechanism 1, the control mechanism controls the corresponding liquid pump in the cleaning mechanism 1 to work to spray deionized water to the substrate S to be stripped.

To sum up, the photoresistance stripping equipment that this application embodiment provided, stripping mechanism use the stripper in the stripper storage tank to treat the photoresistance on the base plate of peeling off after peeling off, wiper mechanism treats the base plate of peeling off and washs, later air-dry mechanism treats the base plate of peeling off and air-dries, the adsorbed layer among the adsorption filtration subassembly can adsorb the photoresistance piece in the stripper when stripper passes through adsorption filtration subassembly, consequently it is less to remain the photoresistance piece in the stripper through this stripper storage tank, when utilizing this stripper to peel off the photoresistance again, can remain the photoresistance piece on the base plate less, help improving the yield and the quality of display product.

Referring to fig. 5, a flowchart of a method of stripping photoresist according to an embodiment of the present application is shown, which can be used in the photoresist stripping apparatus shown in fig. 4. Referring to fig. 5, the method may include the steps of:

and 101, stripping the photoresist on the substrate to be stripped by using a stripping liquid in a stripping liquid storage tank of the stripping mechanism through the stripping mechanism, wherein an adsorption filtering assembly in the stripping liquid storage tank is used for adsorbing and filtering photoresist fragments in the stripping liquid when the stripping liquid passes through the adsorption filtering assembly.

Wherein, peeling means may include: m filters, m +1 strips off the liquid storage tank, m +1 drawing liquid pump and m +1 strip off the room, m +1 strips off the room and arranges along the target direction, m +1 strips off the liquid outlet of liquid storage tank and the inlet one-to-one intercommunication of m +1 drawing liquid pump, m +1 drawing liquid pump's liquid outlet one-to-one is located m +1 strips off indoor, m filters's inlet one-to-one is located and strips off indoor along the last m that the target direction was arranged, m filters's liquid outlet and m +1 strip off among the liquid storage tank, with the inlet one-to-one intercommunication of the preceding m strip off the liquid storage tank that the room corresponds of arranging along the target direction. Each filter can filter the stripping liquid flowing to the filter in the corresponding stripping chamber, and the filtered stripping liquid is introduced into the corresponding stripping liquid storage tank; each liquid pump can pump out the stripping liquid in the corresponding stripping liquid storage tank and spray the stripping liquid into the corresponding stripping chamber, and the adsorption filtering assembly in each stripping liquid storage tank can adsorb and filter the photoresist fragments in the stripping liquid in the process that the corresponding liquid pump pumps out the stripping liquid from the stripping liquid storage tank.

Alternatively, when m is 2, the peeling mechanism may include a first filter and a second filter, a first peeling liquid tank, a second peeling liquid tank, and a third peeling liquid tank, a first liquid pump, a second liquid pump, and a third liquid pump, and a first peeling chamber, a second peeling chamber, and a third peeling chamber arranged in this order along the target direction. When the substrate to be stripped is conveyed to the first stripping chamber, the first liquid pump can pump out the stripping liquid in the first stripping liquid storage tank and spray the stripping liquid on the substrate to be stripped so as to strip the photoresist on the substrate to be stripped in the first step; after the first stripping, the substrate to be stripped is conveyed to a second stripping chamber, a second liquid pump can pump out stripping liquid in a second stripping liquid storage tank and spray the stripping liquid onto the substrate to be stripped so as to carry out second-step stripping on the photoresist on the substrate to be stripped, the stripping liquid generated in the second-step stripping flows into a first filter, the first filter can filter the stripping liquid, the filtered stripping liquid is guided into a first stripping liquid storage tank so as to be reused in the first-step stripping, and an adsorption filtering component in the first stripping liquid storage tank can adsorb and filter photoresist fragments in the stripping liquid passing through the adsorption filtering component in the process that the first liquid pump pumps out the stripping liquid from the first stripping liquid storage tank. After the second stripping, the substrate to be stripped is conveyed to a third stripping chamber, a third liquid pump can pump out the stripping liquid in a third stripping liquid storage tank and spray the stripping liquid on the substrate to be stripped so as to carry out third stripping on the photoresist on the substrate to be stripped, and the stripping liquid generated by the third stripping flows into a second filter and is reused in the second stripping under the action of the second filter, the second liquid pump and the second stripping liquid storage tank.

And 102, cleaning the substrate to be stripped through a cleaning mechanism, and removing the residual photoresist and stripping liquid on the substrate to be stripped.

After the peeling mechanism peels the substrate to be peeled, the cleaning mechanism may clean the substrate to be peeled to remove the residual photoresist and the peeling liquid on the substrate to be peeled.

Wherein, the wiper mechanism can include: n filters, n +1 water storage tanks, n +1 liquid suction pumps and n +1 cleaning chambers, wherein the n +1 cleaning chambers are arranged along a target direction F, and n is an integer greater than or equal to 1. The liquid outlet of n +1 water storage tank communicates with the inlet one-to-one of n +1 drawing liquid pump, and the liquid outlet one-to-one of n +1 drawing liquid pump is located n +1 washrooms, and in the liquid outlet of n filter and n +1 water storage tank, communicate with the inlet one-to-one of the water storage tank that the preceding n washrooms that arranges along target direction F correspond. Each filter is used for filtering the deionized water flowing to the filter in the corresponding cleaning chamber and guiding the filtered deionized water into the corresponding water storage tank; each liquid pump is used for pumping the deionized water in the corresponding water storage tank and spraying the deionized water into the corresponding cleaning chamber.

Alternatively, when n is 1, the cleaning mechanism 1 includes a filter, a first water storage tank and a second water storage tank, a first liquid pump and a second liquid pump, and a first cleaning chamber and a second cleaning chamber arranged in sequence along the target direction F. When the substrate to be stripped is conveyed to the first cleaning chamber, the first liquid pump can pump out the deionized water in the first water storage tank and spray the deionized water onto the substrate to be stripped so as to clean the substrate to be stripped for the first time; after the first cleaning, the substrate to be peeled is conveyed to the second cleaning chamber, the second liquid pump can pump out the deionized water in the second water storage tank and spray the deionized water onto the substrate to be peeled so as to carry out second cleaning on the substrate to be peeled, the deionized water generated by the second cleaning flows into the filter, the filter can filter the deionized water, and the filtered deionized water is introduced into the first water storage tank so as to be reused in the first cleaning.

It should be noted that the photoresist stripping apparatus further includes a liquid knife mechanism, a second cleaning mechanism and a brush mechanism, which are located between the stripping mechanism and the cleaning mechanism, before the cleaning mechanism cleans the substrate to be stripped, the liquid knife mechanism can scrape the residual photoresist on the substrate to be stripped after the stripping mechanism strips the photoresist on the substrate to be stripped, the second cleaning mechanism can clean the substrate to be stripped after the liquid knife mechanism strips the photoresist on the substrate to be stripped, and the brush mechanism can brush the photoresist on the substrate to be stripped after the second cleaning mechanism cleans the substrate to be stripped.

And 103, air-drying the substrate to be stripped through an air-drying mechanism.

After the cleaning mechanism cleans the substrate to be peeled, the substrate to be peeled can be air-dried by the air-drying mechanism. Optionally, the drying mechanism may include an air drying chamber and an air knife located in the air drying chamber, and the air knife may blow the deionized water on the surface of the substrate to be peeled while the substrate to be peeled is transferred to the air drying chamber.

To sum up, the photoresistance stripping equipment that this application embodiment provided, stripping mechanism use the stripper in the stripper storage tank to treat the photoresistance on the base plate of peeling off after peeling off, wiper mechanism treats the base plate of peeling off and washs, later air-dry mechanism treats the base plate of peeling off and air-dries, the adsorbed layer among the adsorption filtration subassembly can adsorb the photoresistance piece in the stripper when stripper passes through adsorption filtration subassembly, consequently it is less to remain the photoresistance piece in the stripper through this stripper storage tank, when utilizing this stripper to peel off the photoresistance again, can remain the photoresistance piece on the base plate less, help improving the yield and the quality of display product.

In this application, the terms "first," "second," and "third" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance. The term "plurality" means two or more unless expressly limited otherwise.

The above description is only exemplary of the present application and is not intended to limit the present application, and any modifications, equivalents, improvements, etc. made within the spirit and principles of the present application are intended to be included within the scope of the present application.