阅读说明：本技术 工件、工件的制备方法、壳体以及电子设备 (workpiece, preparation method of workpiece, shell and electronic equipment ) 是由 盛秋春 黄义宏 黄礼忠 陈石峰 于 2019-09-19 设计创作，主要内容包括：本申请实施例提供一种工件和工件的制备方法。该工件和工件的制备方法可以应用在电子设备的壳体中,例如手机的盖板、中框等。该工件包括基材,基材表面具有至少一个渐变防眩光区域；渐变防眩光区域中的基材的光泽度沿着渐变防眩光区域中的至少一个预设方向降低；渐变防眩光区域中的基材的雾度和粗糙度,分别沿着至少一个预设方向升高。上述工件表面的渐变防眩光区域的光泽度、雾度、粗糙度都是逐渐变化的,中间过渡顺畅、不突兀,从而整体上呈现出一种新的渐变防眩光的外观效果。并且,该工件表面的渐变防眩光区域还具有较好的防眩光和防脏污效果,具有较好的触感。(The embodiment of the application provides a workpiece and a preparation method of the workpiece. The workpiece and the preparation method of the workpiece can be applied to the shell of electronic equipment, such as a cover plate, a middle frame and the like of a mobile phone. The workpiece comprises a base material, wherein the surface of the base material is provided with at least one gradually-changed anti-dazzle area; the glossiness of the substrate in the gradual change anti-glare area is reduced along at least one preset direction in the gradual change anti-glare area; the haze and the roughness of the substrate in the graded anti-glare area respectively increase along at least one preset direction. The glossiness, the haze and the roughness of the gradually-changed anti-dazzle area on the surface of the workpiece are gradually changed, and the middle transition is smooth and unobtrusive, so that a novel gradually-changed anti-dazzle appearance effect is integrally presented. In addition, the gradually-changed anti-dazzle area on the surface of the workpiece has better anti-dazzle and anti-pollution effects and better touch feeling.)

1. A workpiece, which is characterized by comprising a base material, wherein the surface of the base material is provided with at least one gradually-changed anti-dazzle area; the glossiness of the base material in the gradual change anti-glare area is reduced along at least one preset direction in the gradual change anti-glare area; and the haze and the roughness of the substrate in the gradual change anti-glare area respectively increase along the at least one preset direction.

2. A workpiece according to claim 1, characterized in that when the substrate is a transparent or translucent material, the visible light transmittance of the substrate in the gradual anti-glare areas decreases along at least one preset direction in the gradual anti-glare areas.

3. a workpiece according to claim 1 or 2, wherein a first preset pattern is arranged in the gradual anti-glare areas, the first preset pattern comprises a plurality of first areas, the arrangement density of the plurality of first areas is increased along the at least one preset direction, and the surface of the substrate in the first areas is a rough surface.

4. The workpiece according to claim 3, wherein 0 < R.ltoreq.0.05 mm, 0 < k.ltoreq.5R; wherein R represents a size of the first region; k represents a spacing distance between adjacent first regions along a preset direction.

5. the workpiece according to claim 3 or 4, wherein the surface of the base material in the second region is a smooth surface; the second area is an area except the first preset pattern in the gradual change anti-glare area.

6. The workpiece according to any of claims 1 to 5, wherein the material of the substrate comprises one or more of glass, plastic and ceramic.

7. A method of preparing a workpiece, comprising:

Arranging a protective layer on at least one surface of the base material; the first preset pattern comprises a plurality of first areas, and the arrangement density of the first areas is increased along at least one preset direction;

Carrying out frosting or sand blasting on the area of the surface of the base material where the protective layer is not formed;

Chemically polishing the frosted or sandblasted area of the surface of the base material where the protective layer is not formed;

And removing the protective layer to obtain the workpiece.

8. The method of claim 7, wherein 0 < R.ltoreq.0.05 mm, 0 < k.ltoreq.5R; wherein R represents a size of the first region; k represents a spacing distance between adjacent first regions along a preset direction.

9. The method of claim 7 or 8, wherein the step of providing a protective layer on at least one surface of the substrate comprises:

Forming a photoresist layer on at least one surface of the substrate;

And exposing and developing the photoresist layer to form the protective layer.

10. The method of claim 9, wherein when the photoresist layer is made of a negative photoresist material, the step of exposing and developing the photoresist layer to form the protection layer comprises:

setting a photomask on the photoresist layer; the light shielding layer of the light shield is provided with a second preset pattern, and the second preset pattern is the same as the first preset pattern;

Exposing the photoresist layer on the surface of the substrate and the photomask;

And developing and removing the unexposed area of the photoresist layer to form the protective layer.

11. The method of claim 9, wherein the photoresist layer has a thickness of 2 to 5 μm.

12. The method according to any one of claims 7 to 11, further comprising, before the step of frosting or sandblasting the area of the surface of the substrate where the protective layer is not formed:

And sticking a protective film on the non-processing surface of the base material.

13. The method of any one of claims 7-12, wherein the substrate is a transparent, translucent, or opaque material.

14. The method of any one of claims 7-13, wherein the material of the substrate comprises one or more of glass, plastic, and ceramic.

15. A housing comprising at least one workpiece according to any one of claims 1 to 6, wherein the housing is further provided with a decorative or auxiliary material.

16. The housing of claim 15, wherein the workpiece is a cover plate or a center frame of the housing.

17. An electronic device, characterized in that the electronic device comprises a housing comprising at least one workpiece according to any of claims 1-6.

18. The electronic device of claim 17, wherein the workpiece is a cover plate or a middle frame of the housing.

Technical Field

The application relates to the technical field of material surface treatment, in particular to a workpiece, a preparation method of the workpiece, a shell and electronic equipment.

Background

In the field of electronic products (such as mobile phones, etc.), from the aesthetic point of view and the personalized customization point of view, the appearance of the product becomes one of the important factors for determining whether a consumer can purchase the electronic product. For the electronic product with the classic double-mirror design, the electronic product can have differentiated and personalized visual effects by carrying out decoration process treatment on the rear cover glass and the like of the electronic product. For the current electronic products, the visual effect of the glass rear cover and other positions is mainly realized by yellow light etching, frosting and other processes.

Photolithography is also a process for treating the surface of a material. The yellow light etching process mainly comprises the following steps: firstly, coating a photosensitive substance on the surface of a material, and leaving a part of protective layer having a protective effect on the surface of the material after exposure and development; then, etching the unprotected area on the surface of the material by adopting HF and the like; finally, the protective layer is removed, so that a specific pattern is formed on the surface of the material.

By processing the material (such as glass) by yellow etching, a specific pattern can be formed on the surface of the material. These patterns give the material surface a specific texture as a whole. Because the surface of the graph is still a smooth surface, the visible light transmittance and the glossiness of the material are higher, and the material has better stereoscopic impression. However, the roughness and haze of the surface of the material are low, so that the material cannot achieve an anti-glare (AG) effect.

When the light is excessively concentrated, the clarity of the picture is degraded and the viewer is visually fatigued, so-called glare. For a material with a mirror surface, the light directly passing through the material or the light reflected by the mirror surface on the surface of the material has a more concentrated light, so the glare phenomenon is more obvious. To solve this problem, the roughness and haze of the material surface may be increased by a frosting process.

Frosting is a treatment process for the surface of a material. The frosting process mainly comprises the following steps: firstly, preparing a frosting solution from frosting powder and the like; then, the surface of the material is chemically eroded by using the frosting liquid, so that the surface of the material is uneven.

The material is processed by adopting a frosting mode, so that the surface of the material has certain roughness and haze, light irradiated on the surface of the material is subjected to diffuse reflection, the light is prevented from being excessively concentrated, and an anti-dazzle effect is achieved. When the roughness reaches a proper range, the frosted surface of the material also has better hand feeling. However, since the surface of the material is uniformly processed, the effect of variation cannot be formed on the surface of the material.

Therefore, how to develop a material with a new appearance effect on the surface is a problem to be solved urgently by those skilled in the art.

Disclosure of Invention

The application provides a workpiece, the surface of which is provided with a gradual change anti-glare area, and the glossiness, the haze and the roughness of a base material in the gradual change anti-glare area are respectively and gradually changed, and the transition is smooth and unobtrusive, so that a new appearance effect of gradual change anti-glare is integrally presented. In addition, the gradual change anti-dazzle light area on the surface of the workpiece has better touch and anti-fouling effect.

in a first aspect, the present application provides a workpiece comprising a substrate having at least one graded antiglare region on a surface thereof; the glossiness of the base material in the gradual change anti-glare area is reduced along at least one preset direction in the gradual change anti-glare area; and the haze and the roughness of the substrate in the gradual change anti-glare area respectively increase along the at least one preset direction.

By adopting the realization mode, the glossiness, the haze and the roughness of the gradually-changed anti-dazzle area on the surface of the workpiece are gradually changed, and the middle transition is smooth and unobtrusive, so that a novel gradually-changed anti-dazzle appearance effect is integrally presented. And the formation of this gradual change anti-dazzle light zone for the work piece has better third dimension, also can realize anti-dazzle light effect, still has better sense of touch and anti-smudging effect.

With reference to the first aspect, in a first possible implementation manner of the first aspect, when the substrate is a transparent or translucent material, the visible light transmittance of the substrate in the gradual change anti-glare area decreases along at least one preset direction in the gradual change anti-glare area. Under the condition, the visible light transmittance of the gradual change anti-glare area is also gradually changed, and the middle transition is smooth and unobtrusive, so that a new appearance effect of gradual change anti-glare is presented on the whole. And the formation of the gradually-changed anti-dazzle light area enables the workpiece to have better stereoscopic impression.

With reference to the first aspect and the foregoing possible implementation manner, in a second possible implementation manner of the first aspect, a first preset pattern is disposed in the gradual change anti-glare area, the first preset pattern includes a plurality of first areas, an arrangement density of the plurality of first areas increases along the at least one preset direction, and a surface of the substrate in the first areas is a rough surface. The arrangement mode of the first area in the first preset pattern is designed, and the surface of the base material in the first area is set to be a rough surface, so that the gradual change anti-dazzle area with gradually changed visible light transmittance, glossiness, haze and roughness is formed.

With reference to the first aspect and the possible implementations described above, in a third possible implementation of the first aspect, R is greater than 0 and less than or equal to 0.05mm, and k is greater than 0 and less than or equal to 5R; wherein R represents a size of the first region; k represents a spacing distance between adjacent first regions along a preset direction. The size of the first region and the spacing distance between the adjacent first regions are limited within the range, so that the requirement of the appearance design effect of the workpiece is met, the gradually-changed anti-dazzle appearance effect is realized, the workpiece has better stereoscopic impression and touch feeling, and the anti-dazzle effect and the anti-pollution effect are realized.

With reference to the first aspect and the foregoing possible implementations, in a fourth possible implementation of the first aspect, the surface of the base material in the second region is a smooth surface; the second area is an area except the first preset pattern in the gradual change anti-glare area.

With reference to the first aspect and the foregoing possible implementation manners, in a fifth possible implementation manner of the first aspect, the material of the substrate includes one or more of glass, plastic, and ceramic. The gradual change anti-dazzle light area is formed on the surfaces of various materials, so that the workpiece is suitable for being applied to various different products, and the application range is wide.

In a second aspect, the present application provides a method of preparing a workpiece, comprising: arranging a protective layer on at least one surface of the base material; the first preset pattern comprises a plurality of first areas, and the arrangement density of the first areas is increased along at least one preset direction; carrying out frosting or sand blasting on the area of the surface of the base material where the protective layer is not formed; chemically polishing the frosted or sandblasted area of the surface of the base material where the protective layer is not formed; and removing the protective layer to obtain the workpiece.

By adopting the implementation mode, firstly, the protective layer is arranged on the surface of the base material, so that the area of the surface of the base material, which is not provided with the protective layer, forms a first preset pattern. Since the arrangement density of the plurality of first regions in the first predetermined pattern not covered by the protective layer is gradually increased, after the frosting/sandblasting and chemical polishing processes are performed on the surface of the substrate not covered by the protective layer, the density of the regions of the rough surface is gradually increased along the predetermined direction, so that the gradual anti-glare region is formed on the surface of the substrate. The method has simple process and is suitable for industrial production.

With reference to the second aspect, in a first possible implementation manner of the second aspect, R is greater than 0 and less than or equal to 0.05mm, and k is greater than 0 and less than or equal to 5R; wherein R represents a size of the first region; k represents a spacing distance between adjacent first regions along a preset direction. The size of the first region and the spacing distance between the adjacent first regions are limited within the range, so that the requirement of the appearance design effect of the workpiece is met, the gradually-changed anti-dazzle appearance effect is realized, the workpiece has better stereoscopic impression and touch feeling, and the anti-dazzle effect and the anti-pollution effect are realized.

With reference to the second aspect and the foregoing possible implementation manner, in a second possible implementation manner of the second aspect, the step of providing a protective layer on at least one surface of the substrate includes: forming a photoresist layer on at least one surface of the substrate; and exposing and developing the photoresist layer to form the protective layer. The protective layer is formed by the photoresist, the process is simple, and the method is suitable for industrial production.

with reference to the second aspect and the foregoing possible implementation manners, in a third possible implementation manner of the second aspect, when the photoresist layer is made of a negative photoresist material, the step of exposing and developing the photoresist layer to form the protection layer includes: setting a photomask on the photoresist layer; the photomask is provided with a second preset pattern, and the second preset pattern is the same as the first preset pattern; exposing the photoresist layer on the surface of the substrate and the photomask; and developing and removing the unexposed area of the photoresist layer to form the protective layer. The negative photoresist material has a higher resolution and a higher adhesion to the substrate than the positive photoresist material. The method is applied to the photoresist layer, so that the photoresist layer is not easy to fall off in the exposure and development process and the subsequent frosting/sand blasting process, and the workpiece is prevented from being scrapped because the gradual change anti-dazzle area on the surface does not meet the design requirement.

with reference to the second aspect and the foregoing possible implementation manners, in a fourth possible implementation manner of the second aspect, the thickness of the photoresist layer is 2 to 5 μm. Through forming the light resistance layer with the thickness, the problems that the light resistance layer is subjected to point dropping, falling and the like in the subsequent frosting or sand blasting process can be avoided, and therefore the workpiece is prevented from being scrapped because the gradual change anti-dazzle area on the surface does not meet the design requirement.

With reference to the second aspect and the foregoing possible implementation manners, in a fifth possible implementation manner of the second aspect, before the step of performing frosting or sand blasting on the area of the surface of the substrate where the protective layer is not formed, the method further includes: and sticking a protective film on the non-processing surface of the base material. The protective film can protect the non-processing surface in the processes of sand blasting/frosting and chemical polishing resistance, and the non-processing surface is prevented from being damaged. In addition, in the processes of sand blasting/frosting and chemical polishing resistance, the base material needs to be circulated among different working sections, and the problems of scratch, contamination, pollution and the like of the base material during circulation and transportation can be avoided by arranging the protective film.

With reference to the second aspect and the foregoing possible implementation manners, in a sixth possible implementation manner of the second aspect, the substrate is a transparent, translucent, or opaque material. The gradual change anti-dazzle light area is formed on the surfaces of various materials, so that the workpiece is suitable for being applied to various different products, and the application range is wide.

With reference to the second aspect and the foregoing possible implementation manners, in a seventh possible implementation manner of the second aspect, the material of the substrate includes one or more of glass, plastic, and ceramic. The gradual change anti-dazzle light area is formed on the surfaces of various materials, so that the workpiece is suitable for being applied to various different products, and the application range is wide.

in a third aspect, the present application provides a housing comprising at least one workpiece of any one of the first aspects, wherein the housing is further provided with a decorative element or an auxiliary material.

With reference to the third aspect, in a first possible implementation manner of the third aspect, the workpiece is a cover plate or a middle frame of the housing.

in a fourth aspect, the present application provides an electronic device comprising a housing comprising at least one workpiece of any of the first aspects.

With reference to the fourth aspect, in a first possible implementation manner of the fourth aspect, the workpiece is a cover plate or a middle frame of the housing.

Drawings

In order to more clearly explain the technical solution of the present application, the drawings needed to be used in the embodiments will be briefly described below.

FIG. 1 is a schematic diagram illustrating the effect of a gradually-varying antiglare region on the surface of a substrate of a workpiece according to the present application;

FIG. 2 is an enlarged schematic view of detail A of FIG. 1;

FIG. 3 is a schematic diagram of the effect of another graded antiglare region on the substrate surface of a workpiece in the present application;

FIG. 4 is a schematic side view of a substrate after a photoresist layer is formed on the surface thereof in an implementation of a method for fabricating a workpiece according to the present application;

FIG. 5 is a schematic side view of a photomask being placed on a photoresist layer for exposure in an implementation of the method for preparing a workpiece according to the present application;

FIG. 6 is a schematic side view of a substrate with a protective layer disposed on a surface thereof in accordance with one implementation of the workpiece preparation method of the present application;

FIG. 7 is a schematic side view of a substrate after frosting in one implementation of a method of making a workpiece according to the present application;

FIG. 8 is an enlarged schematic view of detail B of FIG. 7;

FIG. 9 is a schematic side view of a substrate after chemical polishing in one implementation of a method of making a workpiece according to the present application;

FIG. 10 is an enlarged schematic view of detail C of FIG. 9;

FIG. 11 is a schematic view showing the effect of a gradually-changed antiglare region in a glass sheet obtained in example 1 of the present application;

Fig. 12 is a schematic structural diagram of an implementation manner of an electronic device of the present application.

Description of reference numerals:

A substrate 1; a graded antiglare region 11; a photoresist layer 2; a mask 3; a substrate 31; a light-shielding layer 32; a protective layer 4; a first region 51; a second region 52; an electronic device 100; a cover plate 101.

Detailed Description

In order to facilitate understanding of the technical solution of the present application, the concept of several important optical performance parameters of materials such as glossiness, haze, roughness, transmittance, etc. will be briefly introduced below.

Gloss represents the ability of a material surface to reflect light. When the material with a smooth surface is irradiated by visible light, mirror reflection can be generated, and reflected light directly irradiates human eyes, so that the surface of the material is glossy, and a dazzling effect is caused.

Haze indicates the degree of material distinctiveness. The haze is determined by irradiating the material perpendicularly with a beam of parallel light from a standard light source, and causing scattering in the material and on the surface, so that part of the parallel light deviates from the incident direction, and the percentage of the ratio of the scattered light flux Td deviating from the incident direction by more than 2.5 DEG to the light flux T2 transmitted through the material is determined as the haze.

Roughness represents the small pitch and the unevenness of minute peaks and valleys on the surface of the material. The roughness of the surface of the material can be characterized by the arithmetic mean deviation Ra of the profile and also by the maximum height Rz of the profile, which can be converted into each other on a roughness measuring instrument. In the embodiments of the present application, Ra will be collectively referred to.

Transmittance refers to the ability of light to transmit through a material. The material is vertically irradiated by a beam of parallel light of a standard light source, and the ratio of the light flux T2 transmitted through the material to the incident light flux T1 irradiated to the material is the transmittance.

Generally, gloss, haze, and roughness can be used to measure the optical properties of transparent, translucent, or opaque materials, and transmittance is mainly used to measure the optical properties of transparent or translucent materials.

The embodiment of the application provides a workpiece, and the workpiece can be applied to electronic equipment. The electronic device in the embodiment of the present application includes but is not limited to: a mobile phone (mobile phone), a tablet computer (Pad), a personal computer, a Virtual Reality (VR) terminal device, an Augmented Reality (AR) terminal device, a wearable device, a television, a vehicle-mounted terminal, and the like.

The workpiece in the embodiment of the present application includes a part in an industrial processing process, and the workpiece may be a single part, or a part formed by combining several parts, and the like, which is not limited in the present application. The workpiece of the electronic device in the present application may be a part of the electronic product, which is exposed to the external environment, such as a shell of a mobile phone, a wearing structure of a wearable device, and the like. After all or part of the surface of the base material of the workpiece is processed, the gradual anti-dazzle effect can be generated.

In the prior art, the gradual effect means that the texture of the surface of the material gradually changes, thereby producing a gradual visual effect. The anti-dazzle effect means that the surface of the material is processed from flat crystal faces into rough surfaces with concave and convex parts, so that the effect of reducing strong light reflection or direct light is achieved. Therefore, in the related art, the gradation effect and the anti-glare effect are two visual effects independent of each other. The gradually-changed anti-dazzle effect can be understood as an integral visual effect. The visual effect can be characterized collectively by the three optical parameters haze, roughness, and gloss described previously.

based on this, the surface of the base material of the workpiece in the embodiment of the present application may be formed with at least one gradation antiglare region. For each of the graded antiglare regions, the gloss of the substrate in that region decreases along at least one predetermined direction in the graded antiglare region; and the haze and the roughness of the substrate in the region respectively increase along the at least one preset direction.

The substrate of the workpiece is made of transparent, semitransparent or opaque material, such as one or more of glass, plastic and ceramic. When the base material is a transparent or semitransparent material, the optical parameter of visible light transmittance can be increased, and the four optical parameters are used for representing the visual effect of the gradual change anti-glare. That is, the visible light transmittance of the substrate in the gradation anti-glare area decreases along at least one preset direction in the gradation anti-glare area.

In the embodiment of the present application, the gradual-change anti-glare region may be a planar region or a curved region, which is not limited in the present application. The preset direction can be any direction on the gradual change anti-dazzle area, and can be a straight line direction or a curve direction; there may be only one preset direction or a plurality of preset directions in one gradual anti-glare region, which is not limited in this application.

For example, please refer to fig. 1 and fig. 2, fig. 1 is a schematic diagram illustrating an effect of a gradually-changed antiglare region on a surface of a substrate of a workpiece according to the present application, and fig. 2 is an enlarged schematic diagram of a portion a in fig. 1. In fig. 1, the surface of the substrate is a plane, and the predetermined direction is the X direction. The visible light transmittance of the base material in the gradation antiglare region 11 gradually decreases and the glossiness also gradually decreases along the X direction. Meanwhile, along the X direction, the haze of the base material in the graded antiglare region 11 gradually increases, and the roughness also gradually increases.

For another example, please refer to fig. 3, fig. 3 is a schematic view of an effect of another graded antiglare region on the surface of the substrate of the workpiece according to the present application. In fig. 3, the surface of the substrate is a plane, and there are a plurality of predetermined directions, i.e., a plurality of Y directions. Along the plurality of Y directions, the visible light transmittance of the base material in the gradation antiglare region 11 is gradually reduced, and the glossiness is also gradually reduced, respectively. Meanwhile, along the plurality of Y directions, the haze and the roughness of the base material in the graded antiglare region 11 gradually increase, respectively. In fact, the variation in the gradual-change anti-glare region 11 shown in fig. 3 shows a radial gradual-change effect, and a direction from any point of the outer circumference of the circle to the center of the circle can be regarded as a preset direction.

the glossiness, the haze and the roughness of the gradually-changed anti-dazzle area on the surface of the workpiece are gradually changed, when the base material of the workpiece is made of transparent or semitransparent materials, the visible light transmittance of the gradually-changed anti-dazzle area is also gradually changed, the middle transition is smooth and unobtrusive, and therefore the novel gradually-changed anti-dazzle appearance effect is integrally presented. In the gradual change anti-glare area of the surface of the workpiece, a part of area has better glossiness, so that the workpiece has better stereoscopic impression, and a part of area has better haze and roughness, thereby realizing the anti-glare effect. When the base material of the workpiece is a transparent or semitransparent material, the workpiece can show better permeability due to the fact that a part of the area has better visible light transmittance and glossiness, and therefore the workpiece has better stereoscopic impression.

In addition, the gradual change anti-dazzle area on the surface of the workpiece has better touch and anti-fouling effect. Specifically, on one hand, the gradual anti-dazzle area on the surface of the workpiece has gradual roughness, so that the workpiece has better touch feeling. The surface of the skin-like body can be further provided with an anti-fingerprint coating, and the combination of the anti-fingerprint coating and the anti-fingerprint coating can realize the skin-like texture. On the other hand, the workpiece surface has the gradient roughness and haze, so that the gradient anti-glare area of the workpiece surface has a better anti-fouling (such as dust, grease, fingerprints and the like) effect. The gradation antiglare region in the embodiment of the present application has a suitable roughness relative to a smooth mirror surface, and is less likely to adhere dirt. Even if some dirt is adhered, the gradual change anti-dazzle light area has proper haze, so that a good visual covering effect can be generated on the dirt, and the dirt is not easy to be perceived by naked eyes.

Optionally, referring to fig. 1 to 3, a first preset pattern is disposed in the gradual change anti-glare area, the first preset pattern includes a plurality of first areas 51, and the arrangement density of the plurality of first areas 51 increases along at least one preset direction. In the embodiment of the present application, an area other than the first preset pattern in the graded anti-glare area 11 is referred to as a second area 52.

The smooth surface in the embodiments of the present application, which may also be referred to as a smooth surface or a mirror surface, has a roughness that is generally low, and may even be 0. The rough surface is a concept opposite to the smooth surface, and the rough surface generally has an uneven structure having a roughness greater than that of the smooth surface. The surface of the substrate in the first region 51 is a rough surface, and the surface of the substrate in the second region 52 is a smooth surface.

The shape of the first region may be a regular shape or an irregular shape, which is not limited in the present application. Generally, the shapes and sizes of the plurality of first regions in the same first predetermined pattern may be set to be the same, so as to facilitate industrial production.

The size of the first region can be measured by conventional metrology. For example, when the first region is circular, a radius or a diameter may be employed as its dimension. For another example, when the first region is a square, the side length of the square may be used as its size. Also for example, when the first region is irregularly shaped, the longest distance from the center of gravity to the edge thereof may be employed as its size.

Alternatively, where R represents the size of the first region, 0 < R ≦ 0.05mm may be defined. For example, in the example shown in FIG. 1, the first region 51 is circular, with its radius r representing the size of the first region, 0 < r ≦ 0.05 mm. The size of the first region 51 is limited within the above range to meet the requirement of the design effect of the workpiece, so as to achieve the appearance effect of the gradual anti-glare.

The distance between adjacent first regions along a predetermined direction may be represented by a straight-line distance between the centers of gravity of the adjacent first regions, or may be represented by a shortest straight-line distance between the adjacent first regions. Therefore, the arrangement density of the plurality of first regions increases along at least one preset direction, and it can also be understood that the spacing distance between adjacent first regions gradually decreases along one preset direction. For example, in the example of fig. 1 and 3, k represents a spacing distance between adjacent first regions along a preset direction, and k initially has a larger value along the X direction or the Y direction, and gradually decreases as the arrangement density gradually increases.

Alternatively, 0 < k ≦ 5R. For example, in the example shown in FIGS. 1 and 2, the first region 51 is a circle, and the distance between the centers of two adjacent circles can be expressed as 0 < k.ltoreq.5 r. The spacing distance between the adjacent first regions 51 is limited within the above range to meet the requirement of the appearance design effect of the workpiece, and the appearance effect of the gradual change anti-glare is realized.

It should be noted that, for the adjacent first areas 51 in the first preset pattern, they may be independent from each other, and may also be connected or partially overlapped. Both cases may exist in the same first preset pattern at the same time as shown in fig. 1 and 3.

The substrate surface of the first region is a roughened uneven surface, i.e., a rough surface, which has an effect on the visible light transmittance, the glossiness, the haze, and the roughness of the substrate. Along the preset direction, the arrangement density of the plurality of first areas gradually increases. In this way, the visible light transmittance and the glossiness of the substrate in the anti-glare area respectively decrease along at least one preset direction in the gradual anti-glare area, so that the haze and the roughness of the substrate in the anti-glare area respectively increase along the at least one preset direction, thereby achieving the gradual anti-glare effect.

The embodiment of the application also provides a preparation method of the workpiece. The preparation method can be applied to parts of industrial products, such as a cover plate, a battery cover, a decoration part and the like of an end product, so that any one of the workpieces with the gradually-changed anti-dazzle light area is prepared. The method may include the following steps 100 to 400.

Step 100: a protective layer is disposed on at least one surface of the substrate.

the substrate in embodiments of the present application may be a transparent, translucent, or opaque material, and may include one or more of glass, plastic, and ceramic, for example. Substrates of different materials may be employed in different application scenarios or design requirements.

The substrate may have multiple surfaces. For example, a typical cellular phone back cover typically has an upper surface, a lower surface, and four side surfaces. Wherein the lower surface and the side surfaces face the inside of the phone after installation, and the upper surface faces the outside environment. The upper surface needs to be treated to form a graded antiglare region, depending on the design of the appearance. In the embodiment of the present application, a surface (e.g., the aforementioned upper surface) that needs to be treated to form the gradation antiglare region is referred to as a processed surface. The other surfaces that do not require treatment (such as the aforementioned lower surface and four side surfaces) are referred to as non-machined surfaces. Therefore, a protective layer may be provided on the work surface.

The protective layer may be made of a conventional material such as photoresist. The protective layer has a preset pattern, and the area of the surface of the base material, which is not provided with the protective layer, forms a first preset pattern, so that the pattern of the protective layer is complementary with the first preset pattern.

As described above, the first predetermined pattern may include a plurality of first regions, and the plurality of first regions may have a regular shape or an irregular shape. The shape and size of the first regions, and the spacing distance between the first regions may refer to the related description, and are not described herein again.

Alternatively, where R represents the size of the first region, 0 < R ≦ 0.05mm may be defined. For example, please refer to fig. 6, fig. 6 is a schematic side view of a substrate with a protective layer disposed on the surface thereof according to an implementation manner of the workpiece manufacturing method of the present application. In the example shown in fig. 1 and 6, the protective layer 4 is disposed on the substrate 1, and the regions where the protective layer is not disposed form a first predetermined pattern including a plurality of first regions 51. The first region 51 is circular, and the radius r represents the size of the first region, wherein r is more than 0 and less than or equal to 0.05 mm. By limiting R within the range, the surface of the workpiece can meet the requirement of appearance design effect after subsequent processing steps, and the appearance effect of the gradual change anti-glare is realized.

the spacing distance between the adjacent first regions gradually decreases along a preset direction. For example, in the example of fig. 6, k represents the distance between adjacent first regions 51 along the X direction, and k initially has a larger value along the X direction and gradually decreases as the arrangement density gradually increases.

Alternatively, 0 < k ≦ 5R. For example, in the example shown in FIGS. 1 and 6, the first region 51 is a circle, and the distance between the centers of two adjacent circles can be expressed as 0 < k.ltoreq.5 r. By limiting k within the above range, the surface of the workpiece can meet the requirement of the appearance design effect after the subsequent processing steps, and the appearance effect of the gradual change anti-glare is realized.

Note that, similarly to the example shown in fig. 1, a plurality of adjacent first regions in the first preset pattern may be independent of each other, or may be connected or partially overlapped.

Alternatively, the protective layer may be formed by exposure and development. In one implementation, step 100 may include:

Step 110: forming a photoresist layer on at least one surface of the substrate;

Step 120: and exposing and developing the photoresist layer to form the protective layer.

Referring to fig. 4, fig. 4 is a schematic side view of a substrate after a photoresist layer is formed on a surface of the substrate in an implementation manner of the workpiece preparation method of the present application. In the example of fig. 4, a photoresist layer 2 is provided on a substrate 1, and the photoresist layer 2 may be formed by spraying using a conventional photoresist sprayer.

In a general scheme, the thickness of the photoresist coating is below 2 μm. In the embodiment of the present application, the photoresist layer has a thickness of 2-5 μm. Further optionally, the photoresist layer has a thickness of 3-5 μm. The thickness of the light resistance layer is the thickness of the protective layer, and the problems of point dropping, falling and the like of the light resistance layer in the subsequent frosting or sand blasting process can be avoided by forming the light resistance layer with the thickness, so that the workpiece is prevented from being scrapped because the gradual change anti-glare area on the surface does not meet the design requirement.

Optionally, after the photoresist layer is formed by spraying with the photoresist sprayer, it may be pre-cured, so as to make the adhesion between the photoresist layer and the substrate stronger. Alternatively, in one example, the temperature of the pre-cure may be 110-120 ℃ and the time of the pre-cure may be 1-2 min.

After the photoresist layer is formed, a partial region of the photoresist layer may be masked with a photomask, and then exposed in an exposure machine, and the exposed or unexposed region may be removed by development to form the aforementioned protective layer. Generally, there are positive and negative photoresists, and there is a corresponding difference in the areas removed by exposure and development when different photoresists are used. Wherein, the part of the positive photoresist material irradiated by light can be removed by the developing solution, and the part not irradiated by light can not be removed by the developing solution. In contrast, the negative photoresist material is not removed by the developer at the portion irradiated with light, and is removed by the developer at the portion not irradiated with light.

Specifically, in one implementation, when the photoresist layer is a negative photoresist material, step 120 includes:

Step 121: setting a photomask on the photoresist layer; the light shielding layer of the light shield is provided with a second preset pattern, and the second preset pattern is the same as the first preset pattern;

Step 122: exposing the photoresist layer on the surface of the substrate and the photomask;

Step 123: and developing and removing the unexposed area of the photoresist layer to form the protective layer.

Referring to fig. 5 to 6, fig. 5 is a schematic side view illustrating a side structure of a method for manufacturing a workpiece according to an embodiment of the present disclosure, in which a mask is stacked on a photoresist layer and exposed. In the example of fig. 5, a mask 3 is provided above the substrate 1 on which the photoresist layer 2 is provided. The mask 3 includes a substrate 31 and a light-shielding layer 32, and the light-shielding layer 32 forms a second predetermined pattern on the mask 3. Since the second predetermined pattern is the same as the first predetermined pattern, the blocked portion of the photoresist layer 2 is not irradiated by light in the exposure step, as shown in fig. 5. The photoresist layer 2 of these areas not irradiated with light may be removed in a developing step. Thus, the photoresist layer 2 portion left on the surface of the substrate 1 forms the protection layer 4, the pattern of the protection layer 4 is a complementary pattern to the first predetermined pattern, and the region of the surface of the substrate 1 not provided with the protection layer 4 forms the first predetermined pattern, as shown in fig. 6.

Alternatively, the mask 3 may be made of glass or chrome. The method comprises the steps of taking high-purity, low-reflectivity and low-thermal expansion coefficient quartz glass as a substrate 31, and plating a chromium material on the substrate 31 by sputtering to form a chromium layer (namely a light shielding layer 32), wherein the pattern of the chromium layer is a second preset pattern, as shown in fig. 5. Alternatively, the thickness of the chromium layer may be about 70 nm. Since the chromium material is completely opaque to light, the photomask is stacked above the photoresist layer to shield the light in the exposure step, and only the part of the photoresist layer except the region corresponding to the second preset pattern is exposed.

alternatively, the exposure energy in the exposure step may be 80mJ/cm². After exposure, the photoresist in the unexposed area is removed by adopting a developing solution to form a protective layer which is complementary to the first preset pattern. Alternatively, the temperature of the developing solution in the developing step may be 23 ± 2 ℃, and the wind-shear pressure may be 150 KPa.

In another implementation, when the photoresist layer is made of a positive photoresist material, step 120 may include:

Step 124: setting a photomask on the photoresist layer; the photomask is provided with a third preset pattern, and the third preset pattern is complementary with the first preset pattern;

Step 125: exposing the photoresist layer on the surface of the substrate and the photomask;

Step 126: and developing and removing the exposed area of the photoresist layer to form the protective layer.

Since the third predetermined pattern on the mask is complementary to the first predetermined pattern, the portion of the photoresist layer that is not blocked is irradiated by light in the exposure step, and can be removed in the development step. Thus, the protective layer left on the surface of the substrate is the same as the third preset pattern and is complementary to the first preset pattern, and the first preset pattern is formed in the area of the surface of the substrate where the protective layer is not arranged.

Alternatively, the light shield can be made of glass and chrome materials, and reference can be made to the related description. Compared with the photomask adopting the negative photoresist scheme, the difference between the negative photoresist and the photomask is that the pattern of the chromium layer is the third preset pattern.

Compared with the positive photoresist material, the negative photoresist material has high resolution and high adhesion with the base material, is relatively difficult to fall off in the processes of exposure, development and subsequent frosting/sand blasting, and is more favorable for forming a gradually-changed anti-dazzle area on the surface of a workpiece.

When the positive photoresist material is used, the process conditions of exposure and development can refer to the conditions when the negative photoresist material is used or the existing process conditions, and are not described herein again.

step 200: and carrying out frosting or sand blasting on the area of the surface of the base material where the protective layer is not formed.

The frosting is mainly a process of chemically eroding the surface of a material by adopting a frosting liquid to make the surface of the material uneven. The sand blasting is a process of physically eroding the surface of a material by utilizing the impact action of high-speed sand flow to enable the surface of the material to be uneven.

Referring to fig. 7 and 8, fig. 7 is a schematic side view of a substrate after frosting in an implementation manner of the workpiece preparation method of the present application; fig. 8 is an enlarged view of a portion B in fig. 7. It can be seen that the areas of the surface of the substrate 1 not protected by the protective layer 4 are provided with an uneven structure by sanding or sandblasting. While the area protected by the protective layer 4 is not attacked by the frosting liquid or the blasting sand.

the frosting or sand blasting can adopt the existing frosting or sand blasting process. When the frosting treatment is adopted, the concentration and the soaking time of the frosting liquid are different, and the formed uneven structure has difference. When the sandblasting treatment is used, the grain size of sandblasting, the speed of sandblasting, the time, and the like are different, and the formed uneven structure is also different. The haze and the roughness of the gradual change anti-dazzle light area can be adjusted to a certain degree by controlling the treatment process of frosting or sand blasting.

Alternatively, when a sand blasting process is used, angular, hard siliceous sand or other similar property particulates having a particle size of 2 to 10 μm may be used. Siliceous sand or other similar particulates should not contain impurities that contaminate the glass surface and should be sufficiently dry to contain no more than 0.5% moisture. During sand blasting, compressed air for sand blasting needs to be cooled and filtered before entering a sand blasting tank, so that an oil-free and water-free state is achieved. The pressure of the compressed air can be controlled between 0.1 MPa and 0.5MPa, and the air supply quantity is not less than 1 cubic meter per minute.

Compared with sand blasting, the sand blasting process is adopted in the embodiment of the application, the protective layer on the surface of the base material is not easy to fall off relatively, so that damage to the smooth area can be avoided, and the workpiece is prevented from being scrapped because the gradual change anti-dazzle area on the surface does not meet the design requirement.

step 300: chemically polishing the frosted or sandblasted area of the surface of the base material where the protective layer is not formed;

And immersing the frosted or sandblasted base material into the polishing solution, so that the polishing solution erodes the surface of the base material in the area where the protective layer is not formed. Referring to fig. 9 and 10, fig. 9 is a schematic side view of a substrate after chemical polishing in one implementation of a method for preparing a workpiece according to the present application; fig. 10 is an enlarged view of a portion C in fig. 9. As can be seen from fig. 9 and 10, by the chemical polishing, portions of the sharp protrusions in the rugged structure are eroded, so that the height difference of the rugged structure is reduced. After the steps of sanding/sandblasting and chemical polishing, the areas of the surface of the substrate 1 where the protective layer 4 is not formed form a rough surface. These rough surfaces can have an effect on the transmittance, haze, roughness and gloss of the substrate.

Alternatively, when the material of the substrate is different, chemical polishing may be performed using different polishing liquids. For example, when the substrate is glass, a fluorine-containing chemical liquid such as HF or the like may be used as the polishing liquid. Alternatively, the concentration of the polishing solution can be 0.2% < polishing solution concentration < 2% when applied to a glass substrate. Alternatively, the polishing time may be 5-30 min. For another example, when the substrate is ceramic, a strong acid solution such as HCl can be used as the polishing solution.

Optionally, after chemical polishing, the substrate surface may be cleaned to remove the polishing solution for subsequent steps.

Step 400: and removing the protective layer to obtain the workpiece.

the area of the substrate surface from which the protective layer was removed was still a smooth surface. The protective layer may be removed by a method commonly used in the art. For example, when the material of the protective layer is a photoresist material, a photoresist stripping process may be performed on the surface of the substrate. Optionally, in one implementation mode, the photoresist stripping solution can adopt a 5% NaOH solution, and the temperature of the photoresist stripping treatment is 50 +/-2 ℃. Optionally, before step 200, the method may further include step 500.

Step 500: and sticking a protective film on the non-processing surface of the base material.

The protective film is resistant to sand blasting/frosting and chemical polishing, so that a non-processing surface is protected in the sand blasting/frosting and chemical polishing processes, and the non-processing surface is prevented from being damaged. In addition, in the processes of sand blasting/frosting and chemical polishing resistance, the base material needs to be circulated among different working sections, and the problems of scratch, contamination, pollution and the like of the base material during circulation and transportation can be avoided by arranging the protective film.

Optionally, after the workpiece is prepared by any one of the methods, the surface of the workpiece may be subjected to chemical strengthening treatment, so as to obtain a workpiece with better mechanical strength. The chemical strengthening treatment may be performed by conventional methods, and will not be described herein.

since the arrangement density of the plurality of first regions not covered by the protective layer is gradually increased along the predetermined direction, the density of the regions of the rough surface is increased along the predetermined direction after the frosting/sandblasting and chemical polishing processes are performed on the surface of the substrate not covered by the protective layer. In this way, the visible light transmittance and the glossiness of the substrate in the gradual anti-glare region can be respectively reduced along at least one preset direction in the gradual anti-glare region, so that the haze and the roughness of the substrate in the anti-glare region are respectively increased along the at least one preset direction.

The visible light transmittance, the glossiness, the haze and the roughness of the gradual change anti-dazzle area on the surface of the workpiece are gradually changed, and the middle transition is smooth and unobtrusive, so that a novel appearance effect of gradual change anti-dazzle is integrally presented. In the gradual change anti-glare area on the surface of the workpiece, a part of area has better visible light transmittance and glossiness, so that the workpiece presents better permeability and better stereoscopic impression, and a part of area has better haze and roughness, thereby realizing the anti-glare effect. In addition, the gradually-changed anti-glare area on the surface of the workpiece has better touch feeling and anti-smudge effect, which can be referred to the related description above and will not be described herein again.

The following examples further illustrate the technical solutions of the present application, but do not limit the present application to the scope of the following examples. It should be noted that reagents, raw materials and equipment not specifically described in the examples were commercially available directly. The experimental methods not specified for the specific conditions were selected according to the conventional methods and conditions, or according to the commercial instructions.