阅读说明：本技术 一种表面波等离子体发生装置和方法 (A kind of surface wave plasma generating device and method ) 是由 孙冰 朱小梅 于 2019-09-23 设计创作，主要内容包括：本发明公开了一种表面波等离子体发生装置,包括依次连接的微波源、环形隔离器、匹配调节器、波导管、耦合变换器、耦合隔离器和反应器,反应器为上底敞开、下底密封的圆柱形筒体,反应器的上底与耦合隔离器的一面固定连接,耦合隔离器的另一面与耦合变换器固定连接,反应器的侧面设有进气管和气压调节装置,气压调节装置用于维持反应器中的低气压环境。本发明还公开了一种表面波等离子体发生的方法,利用前述表面波等离子体发生装置,去掉了现有技术中常用的滤波板,实现多模耦合,在耦合隔离器处实现较大电场,使激发的等离子体密度更大,更均匀。(The invention discloses a kind of surface wave plasma generating devices, including sequentially connected microwave source, circulator/isolator, matching adjuster, waveguide, coupled inverters, coupling isolator and reactor, reactor is the cylindrical tube that upper bottom is opened wide, bottom seals, the upper bottom of reactor is fixedly connected on one side with coupling isolator, the another side of coupling isolator is fixedly connected with coupled inverters, the side of reactor is equipped with air inlet pipe and air pressure regulator, and air pressure regulator is used to maintain the hypobaric in reactor.A kind of method occurred the invention also discloses surface wave plasma eliminates filter band commonly used in the prior art using aforementioned surfaces wave plasma producing apparatus, realize Multiple modes coupling, larger electric field is realized at coupling isolator, keeps the plasma density of excitation bigger, more evenly.)

1. a kind of surface wave plasma generating device, which is characterized in that including sequentially connected microwave source (1), annular isolation Device (2), matching adjuster (3), waveguide (4), coupled inverters (5), coupling isolator (6) and reactor (13), it is described anti- Answering device (13) is the cylindrical tube that upper bottom is opened wide, bottom seals, the upper bottom of the reactor (13) and the coupling isolator (6) be fixedly connected on one side, the another side of the coupling isolator (6) is fixedly connected with the coupled inverters (5), described anti- The side of device is answered to be equipped with air inlet pipe (14) and air pressure regulator (10), the air pressure regulator (10) is for remaining described anti- Answer the hypobaric in device (13).

2. a kind of surface wave plasma generating device according to claim 1, which is characterized in that the reactor (13) It is equipped with snorkel (15), control valve (11) and pressure detector (12), the pressure detecting is set on the snorkel (15) Device (12) is than the control valve (11) close to the reactor.

3. a kind of surface wave plasma generating device according to claim 1, which is characterized in that the air inlet pipe (14) It is equipped with gas flow controller (7).

4. a kind of surface wave plasma generating device according to claim 1, which is characterized in that the waveguide (4) Select square waveguide.

5. a kind of surface wave plasma generating device according to claim 1, which is characterized in that the coupled inverters It (5) successively include span line (51), changeover portion (52) and realization section (53), the span line (51) and the waveguide (4) are even It connects and the section of the two is identical, the realization section (53) connect with the coupling isolator (6), and the realization section (53) Section it is identical as the section of the reactor (13), the changeover portion (52) be section gradual change waveguide, the changeover portion (52) section fades to the identical section with the realization section (53) by section identical with the span line (51).

6. a kind of surface wave plasma generating device according to claim 5, which is characterized in that the transition section length L₁=5cm~65cm, realization section (53) the length L₂=2cm~5cm, the height of the reactor (13) are 6cm~40cm, Realization section (53) diameter of section is equal with the reactor (13) basal diameter, diameter D=10cm~30cm.

7. a kind of surface wave plasma generating device according to claim 1, which is characterized in that the coupling isolator It (6) is one of quartz or nonpolarity ceramics.

8. a kind of surface wave plasma generating device according to claim 1, which is characterized in that the reactor (13) It is equipped with plasma detection port (8) and observation window (9), the observation window (9) uses glass or quartz.

9. a kind of surface wave plasma method for generation, which is characterized in that utilize surface wave plasma described in claim 1 Generating device, the specific method is as follows:

Start the air pressure regulator (10), the reactor (13) is vacuumized, is then passed through from the air inlet pipe (14) Gas, and maintaining the air pressure range in the reactor (13) using the air pressure regulator (10) is 0.1~2000Pa, benefit It is 0-10L/min with the flow that the gas flow controller (7) control is passed through gas；

Start the microwave source (1), exports microwave using the microwave source (1), the power of microwave is 200W-5000W, microwave Frequency is 2450MHz ± 20MHz, and microwave is transmitted to the matching adjuster (3) by the circulator/isolator (2), through described After matching adjuster (3) adjusting, the coupled inverters (5) are transferred to by the waveguide (4) and are further transferred to institute It states coupling isolator (6), microwave is injected into the reactor (13) by the coupling isolator (6), the coupling isolation Device (6) is in the side ionized gas in the reactor (13) and forms surface wave plasma.

Technical field

The present invention relates to microelectronics technology more particularly to a kind of surface wave plasma generating device and methods.

Background technique

Plasma is widely used in modern industry as " the 4th state of substance ", for example, carbon nanotube preparation, half The processing of conductor, the surface of material are modified etc., in the application of plasma, in addition to guarantee plasma discharge stability and Other than reproducibility, low pressure plasma densification, larger in area and homogenization are also required.

Existing microwave surface wave plasma generating device before microwave coupling enters reactor, need to by aperture plate, When generating polarization in aperture plate, but passing through aperture plate, not only microwave energy can largely be lost, but also the microwave penetrated can also go out Existing non-uniform phenomenon is unfavorable for generating the homogeneous plasma of high density, large area.

Summary of the invention

The present invention provides a kind of surface wave plasma generating device and method, eliminates aperture plate, changes coupling transform The structure of device provides the homogeneous plasma of high density, large area.

A kind of surface wave plasma generating device, including sequentially connected microwave source, circulator/isolator, matching adjusting Device, waveguide, coupled inverters, coupling isolator and reactor, the reactor are the cylinder that upper bottom is opened wide, bottom seals Cylinder, the upper bottom of the reactor and being fixedly connected on one side for the coupling isolator, the another side of the coupling isolator with The coupled inverters are fixedly connected, and the side of the reactor is equipped with air inlet pipe and air pressure regulator, the air pressure adjustment Device is used to maintain the hypobaric in the reactor.

Further, the reactor is equipped with snorkel, and control valve and pressure detector, institute is arranged on the snorkel Pressure detector is stated than the control valve close to the reactor.

Further, the air inlet pipe is equipped with gas flow controller.

Further, the waveguide selects square waveguide.

Further, the coupled inverters successively include span line, changeover portion and realize section, the span line with it is described The section of waveguide connection and the two is identical, and the realization section is connect with the coupling isolator, and the realization section Section is identical as the section of the reactor, and the changeover portion is the waveguide of section gradual change, the section of the changeover portion by with institute It states the identical section of span line and fades to section identical with the realization section.

Further, the transition section length L₁=5cm~65cm, the realization segment length L₂=2cm~5cm is described anti- The height for answering device is 6cm~40cm, and the realization section diameter of section is equal with the reactor basal diameter, diameter D=10cm ~30cm.

Further, the coupling isolator is one of quartz or nonpolarity ceramics.

Further, the reactor is equipped with plasma detection port and observation window, and the observation window uses glass Or quartz.

A kind of surface wave plasma method for generation, using surface wave plasma generating device described in claim, The specific method is as follows:

Start the air pressure regulator, the reactor is vacuumized, is then passed through gas, and benefit from the air inlet pipe Maintaining the air pressure range in the reactor with the air pressure regulator is 0.1~2000Pa, utilizes the gas flow control The flow that device control processed is passed through gas is 0-10L/min；

Start the microwave source, exports microwave using the microwave source, the power of microwave is 200W-5000W, the frequency of microwave Rate is 2450MHz ± 20MHz, and microwave is transmitted to the matching adjuster by the circulator/isolator, is adjusted through the matching After device is adjusted, by the waveguide transmissions to the coupled inverters and it is further transferred to the coupling isolator, microwave It is injected into the reactor by the coupling isolator, the coupling isolator is in the ionization of the side in the reactor Gas forms surface wave plasma.

The present invention provides a kind of surface wave plasma generating device and method, eliminates aperture plate, passes through and changes coupling The structure of converter, excites microwave in reactor, forms the homogeneous plasma of high density, large area.

Detailed description of the invention

In order to more clearly explain the embodiment of the invention or the technical proposal in the existing technology, to embodiment or will show below There is attached drawing needed in technical description to be briefly described, it should be apparent that, the accompanying drawings in the following description is this hair Bright some embodiments for those of ordinary skill in the art without creative efforts, can be with root Other attached drawings are obtained according to these attached drawings.

Fig. 1 is surface wave plasma generating device structural schematic diagram disclosed by the invention；

Fig. 2 is the structural schematic diagram of coupled inverters in the present invention；

Fig. 3 is the schematic cross-sectional view of coupled inverters and reactor in the present invention.

In figure: 1, microwave source；2, circulator/isolator；3, adjuster is matched；4, waveguide；5, coupled inverters；6, it couples Isolator；7, gas flow controller；8, plasma detects port；9, observation window；10, air pressure regulator；11, pressure passes Sensor；12, pressure detector；13, reactor；14, air inlet pipe；15, snorkel.

Specific embodiment

In order to make the object, technical scheme and advantages of the embodiment of the invention clearer, below in conjunction with the embodiment of the present invention In attached drawing, technical scheme in the embodiment of the invention is clearly and completely described, it is clear that described embodiment is A part of the embodiment of the present invention, instead of all the embodiments.Based on the embodiments of the present invention, those of ordinary skill in the art Every other embodiment obtained without creative efforts, shall fall within the protection scope of the present invention.

As shown in Figure 1, a kind of surface wave plasma generating device, including sequentially connected microwave source 1, circulator/isolator 2, match adjuster 3, waveguide 4, coupled inverters 5, coupling isolator 6 and reactor 13, reactor 13 be upper bottom open wide, under The cylindrical tube of bottom sealing, the upper bottom of reactor 13 and being fixedly connected on one side for coupling isolator 6, coupling isolator 6 it is another It is fixedly connected on one side with coupled inverters 5, reactor is equipped with air inlet pipe 14 and air pressure regulator 10, air pressure regulator 10 For maintaining the hypobaric in reactor 13.

Then the microwave issued by microwave source 1 is transferred to coupling by waveguide 4 by circulator/isolator 2, matching adjuster 3 Converter 5 is closed, coupled inverters 5 are directly injected microwave in reactor by coupling isolator, play coupling, this implementation In example, reactor is injected from the under shed of coupled inverters 5 and is reacted using one of stainless steel, aluminium or monel, microwave Device 13, than in the prior art, by gap penetration microwave, efficiency wants high, and the throughput of microwave increases, the plasma of excitation Density can also improve.

Air pressure regulator uses vacuum pump, before starting microwave source, using air pressure regulator by gas in reactor Body extraction, then passes to the gas of needs, such as helium, nitrogen, until the pressure needed, and maintain to press by air pressure regulator Power.

Further, reactor 13 is equipped with snorkel 15, and control valve 11 and pressure detector 12 is arranged on snorkel 15, Pressure detector 12 is than control valve 11 close to reactor.Control valve 11 is in close state before device work terminates, by pressure Detector 12 is to the pressure real-time monitoring in reactor 13.After device works, control valve 11 is opened, in balanced reaction device 13 Outer air pressure.

Further, air inlet pipe 14 is equipped with gas flow controller 7, can accurately control and be passed through gas in reactor 13 Flow.

Further, waveguide 4 selects square waveguide.The microwave power that microwave source issues is larger, using rectangular waveguide Pipe, is conducive to the transmission of HIGH-POWERED MICROWAVES.

Further, as shown in Figure 2 and Figure 3, coupled inverters 5 successively include span line 51, changeover portion 52 and realization section 53, span line 51 is connected with waveguide 4 and the section of the two is identical, realizes that section 53 is connect with coupling isolator 6, and realize The section of section 53 is identical with the section of reactor 13, changeover portion 52 for section gradual change waveguide, the section of changeover portion 52 by with biography Defeated section of 51 identical sections fade to section identical with section 53 is realized.Other than the shape conversion from rectangular to circular, coupling Microwave is directly injected into reactor by coupling isolator by converter 5, plays coupling, 5 under shed of coupled inverters can To keep the plasma density generated bigger by a greater amount of microwaves.

Further, transition section length L₁=5cm~65cm realizes section (53) length L₂=2cm~5cm, reactor (13) Height be 6cm~40cm, realize 53 diameter of section of section it is equal with 13 basal diameter of reactor, diameter D=10cm~30cm.It is micro- In transmission process, amplitude and position phase moment are all changing wave, and coupled inverters and reactor are pressed the size design Production, makes microwave reach strong electric (Coupling point, i.e., at coupling isolator) at Coupling point, the relatively forceful electric power generated using microwave , the Multiple modes coupling after filter band is removed in realization.Due to eliminating filter band, microwave is set to enter reactor with Multiple modes coupling, same Strong electric is generated under constant power, keeps generation plasma density bigger.

Further, coupling isolator 6 is one of quartz or nonpolarity ceramics.

Further, reactor 10 is equipped with plasma detection port 8 and observation window 9, and observation window 9 uses glass or stone English.Plasma detection port 8 can connect detecting instrument, for sense plasma, reactor temperature etc..Pass through The situation of inside reactor plasma can be observed in observation window 9.

A kind of surface wave plasma method for generation is as follows:

Start air pressure regulator 10, reactor 13 is vacuumized, is then passed through gas from air inlet pipe 14, and utilize air pressure It is 0.1~2000Pa that regulating device 10, which maintains the air pressure range in reactor 13, is passed through gas using the control of gas flow controller 7 The flow of body is 0-10L/min；

Start microwave source 1, exports microwave using microwave source 1, the power of microwave is 200W-5000W, and the frequency of microwave is 2450MHz ± 20MHz, microwave are transmitted to matching adjuster 3 by circulator/isolator 2 and pass through after matched adjuster 3 is adjusted Waveguide 4 is transferred to coupled inverters 5 and is further transferred to coupling isolator 6, and microwave passes through coupling isolator 6 and is injected into instead It answers in device 13, coupling isolator 6 is in the side ionized gas in reactor 13 and forms surface wave plasma.

Surface wave plasma generating device and method disclosed in the present invention are investigated, process using two kinds of gases It is as follows:

1, air pressure regulator 10 is opened, foreign gas in reactor 13 is removed, pressure reaches 1 × 10^-3Pa, then will be pure Argon gas enters in reactor 13 by gas flow controller 7, ventilation flow rate 500ml/min, starts microwave source 1, function Rate is set as 755W, through circulator/isolator 2, matching adjuster 3, waveguide 4, coupled inverters 5 and coupling isolator 6, will produce In raw microwave input reactor 13 and form surface wave；The air pressure in reactor 13 is maintained using air pressure regulator 10 100Pa, the microwave surface wave in reactor 13 excite and maintain plasma, the plasma density generated to argon gas electric discharge Reach 8.1 × 10¹¹/cm³, average electron temperature 2.05eV.

2, air pressure regulator 10 is opened, foreign gas in reactor 13 is removed, pressure reaches 1 × 10^-3Pa, then will be pure Helium atmosphere enters in reactor 13 by gas flow controller 7, ventilation flow rate 500ml/min, starts microwave source 1, function Rate is set as 860W, through circulator/isolator 2, matching adjuster 3, waveguide 4, coupled inverters 5 and coupling isolator 6, will produce In raw microwave input reactor 13 and form surface wave；The air pressure in reactor 13 is maintained using air pressure regulator 10 500Pa, the microwave surface wave in reactor 13 excite and maintain plasma, the plasma density generated to argon gas electric discharge Reach 2.9 × 10¹²/cm³, average electron temperature 3.78eV.

Finally, it should be noted that the above embodiments are only used to illustrate the technical solution of the present invention., rather than its limitations；To the greatest extent Pipe present invention has been described in detail with reference to the aforementioned embodiments, those skilled in the art should understand that: its according to So be possible to modify the technical solutions described in the foregoing embodiments, or to some or all of the technical features into Row equivalent replacement；And these are modified or replaceed, various embodiments of the present invention technology that it does not separate the essence of the corresponding technical solution The range of scheme.