阅读说明：本技术 一种化学气相沉积系统及供气装置和供气方法 (A kind of chemical gas-phase deposition system and feeder and air supply method ) 是由 于金凤 朱刘 于 2019-09-05 设计创作，主要内容包括：本发明提供了一种化学气相沉积系统及供气装置和供气方法,所述供气装置包括末端总管、第一供气管线和至少一个备用供气管线；第一供气管线包括混合气供应支线、工艺气体供应支线、混气容器和第六电磁气动阀,工艺气体供应支线包括工艺气体储存容器、高纯过滤器、第四电磁气动阀、第五电磁气动阀、第三压力变送器、第一质量流量计、第一吹扫气管线和第二吹扫气管线；所述备用供气管线与所述第一供气管线相同。本发明的化学气相沉积系统的供气装置可实现在线切换和稳定、安全、连续的供气,保证化学气相沉积过程中工艺供气的稳定性。(The present invention provides a kind of chemical gas-phase deposition system and feeder and air supply method, the feeder includes end general pipeline, the first gas supply line and at least one spare gas supply line；First gas supply line includes gaseous mixture supply branch line, process gas supply branch line, mixed gas container and the 6th electromagnetism-gas-driving valve, and it includes process gas storage container, high-purity filter, the 4th electromagnetism-gas-driving valve, the 5th electromagnetism-gas-driving valve, third pressure transmitter, the first mass flowmenter, the first purge line and the second purge line that process gas, which supplies branch line,；The spare gas supply line is identical as first gas supply line.The feeder of chemical gas-phase deposition system of the invention can realize online switching and stablize, safety, continuous gas supply, guarantee the stability of technique gas supply in chemical vapor deposition processes.)

1. a kind of feeder of chemical gas-phase deposition system, which is characterized in that the feeder includes end general pipeline, first Gas supply line and at least one spare gas supply line；

The use device of air pipeline connection of the end general pipeline and chemical gas-phase deposition system, end general pipeline and the first air supply pipe spool Road connection, end general pipeline and spare gas supply line pipeline connection；

First gas supply line includes gaseous mixture supply branch line, process gas supply branch line, mixed gas container and the 6th electromagnetism gas Dynamic valve, the gaseous mixture supply branch line and the mixed gas reservoir, process gas supply branch line and the mixed gas reservoir, 6th electromagnetism-gas-driving valve pipeline connection is between mixed gas container and the end general pipeline；

The gaseous mixture supplies the gaseous mixture air container that branch line includes starting point and the gaseous mixture air container pipeline connection The 7th electromagnetism-gas-driving valve, with the 4th pressure transmitter of the 7th electromagnetism-gas-driving valve pipeline connection and with the described 4th Second mass flowmenter of pressure transmitter pipeline connection, second mass flowmenter and the mixed gas container pipeline connection；

The process gas supplies the process gas storage container that branch line includes starting point and the process gas storage container pipe High-purity filter of road connection and the 4th electromagnetism-gas-driving valve of high-purity filter pipeline connection and the 4th electromagnetism gas 5th electromagnetism-gas-driving valve of dynamic valve pipeline connection, with the third pressure transmitter of the 5th electromagnetism-gas-driving valve pipeline connection, with The first mass flowmenter, the first purge line and the second purge line of the third pressure transmitter pipeline connection, institute The first mass flowmenter and the mixed gas container pipeline connection are stated, the end pipeline connection of first purge line is described On pipeline between high-purity filter and the 4th electromagnetism-gas-driving valve, the end pipeline connection of second purge line is described On pipeline between 4th electromagnetism-gas-driving valve and the 5th electromagnetism-gas-driving valve, constant temperature dress is provided with outside the process gas storage container It sets；

First purge line successively includes the first purge gass storage container and first purging from starting point to end First electromagnetism-gas-driving valve of gas storage container pipeline connection and first pressure with the first electromagnetism-gas-driving valve pipeline connection Transmitter, the first pressure transmitter pass through pipe of the pipeline connection between high-purity filter and the 4th electromagnetism-gas-driving valve On the road；

Second purge line successively includes the second purge gass storage container and second purging from starting point to end Second electromagnetism-gas-driving valve of gas storage container pipeline connection, the second pressure pick-up with the second electromagnetism-gas-driving valve pipeline connection Device, with the venturi generator of the second pressure transmitter pipeline connection, the with the venturi generator pipeline connection Three electromagnetism-gas-driving valves and tail gas pipeline with the venturi generator pipeline connection, the third electromagnetism-gas-driving valve pipeline It is connected on the pipeline between the 4th electromagnetism-gas-driving valve and the 5th electromagnetism-gas-driving valve；

The spare gas supply line is identical as first gas supply line.

2. feeder according to claim 1, which is characterized in that the feeder includes end general pipeline, the first confession Gas pipeline and a spare gas supply line.

3. feeder according to claim 1, which is characterized in that the thermostat is water bath thermostat or oil Bathe thermostat.

4. feeder according to claim 1, which is characterized in that the process gas storage container is process gas steel Bottle, the mixed gas container are mixed gas tank.

5. feeder according to claim 1, which is characterized in that store argon in the first purge gass storage container Gas perhaps stores argon gas or nitrogen in nitrogen the second purge gass storage container, stores up in the gaseous mixture air container There are argon gas, hydrogen or nitrogen.

6. feeder according to claim 1, which is characterized in that the feeder further includes PLC control system；

The PLC control system is electrically connected and is controlled with the first electromagnetism-gas-driving valve the open and close of the first electromagnetism-gas-driving valve and adjusts big Small, the PLC control system is electrically connected and is controlled with the second electromagnetism-gas-driving valve the open and close of the second electromagnetism-gas-driving valve and adjusts big Small, the PLC control system is electrically connected and is controlled with third electromagnetism-gas-driving valve the open and close of third electromagnetism-gas-driving valve and adjusts big Small, the PLC control system is electrically connected and is controlled with the 4th electromagnetism-gas-driving valve the open and close of the 4th electromagnetism-gas-driving valve and adjusts big Small, the PLC control system is electrically connected and is controlled with the 5th electromagnetism-gas-driving valve the open and close of the 5th electromagnetism-gas-driving valve and adjusts big Small, the PLC control system is electrically connected and is controlled with the 6th electromagnetism-gas-driving valve the open and close of the 6th electromagnetism-gas-driving valve and adjusts big Small, the PLC control system is electrically connected and is controlled with the 7th electromagnetism-gas-driving valve the open and close of the 7th electromagnetism-gas-driving valve and adjusts big It is small；

The PLC control system is electrically connected and is controlled with the first mass flowmenter the open and close of the first mass flowmenter and adjusts big Small, the PLC control system is electrically connected and is controlled with the second mass flowmenter the open and close of the second mass flowmenter and adjusts big It is small；

The PLC control system is electrically connected and is controlled with first pressure transmitter the open and close of first pressure transmitter and adjusts big Small, the PLC control system is electrically connected and is controlled with second pressure transmitter the open and close of second pressure transmitter and adjusts big Small, the PLC control system is electrically connected and is controlled with third pressure transmitter the open and close of third pressure transmitter and adjusts big Small, the PLC control system is electrically connected and is controlled with the 4th pressure transmitter the open and close of the 4th pressure transmitter and adjusts big It is small.

7. a kind of chemical gas-phase deposition system, which is characterized in that the chemical gas-phase deposition system includes that claim 1-6 such as appoints The feeder of chemical gas-phase deposition system described in one and with the feeder pipeline connection use device of air, it is described It is vacuum furnace body with device of air.

8. chemical gas-phase deposition system according to claim 7, which is characterized in that the chemical gas-phase deposition system also wraps Include filter, spray column and the bucket that gathers dust；

The vacuum furnace body is provided with exhaust outlet, the exhaust outlet and filter pipeline connection, the filter and spray tower tube Road connection, the filter are connected to the bucket that gathers dust.

9. a kind of air supply method of chemical gas-phase deposition system, which is characterized in that the described method comprises the following steps:

(1) chemical gas-phase deposition system as claimed in claim 7 or 8 is installed；

(2) the 5th electromagnetism-gas-driving valve is closed, the second electromagnetism-gas-driving valve, second pressure transmitter, the first electromagnetism-gas-driving valve, the are opened One pressure transmitter and the 4th electromagnetism-gas-driving valve close third electromagnetism-gas-driving valve, export in the first purge gass storage container Gas is purged；

(3) close the first electromagnetism-gas-driving valve, open third electromagnetism-gas-driving valve, export the second purge gass storage container in gas into Row purging；

(4) repetition step (2), step (3) are circuited sequentially 10-99 times；

(5) vacuum pump for opening vacuum furnace body is vacuumized, closing third electromagnetism-gas-driving valve, the 7th electromagnetism-gas-driving valve of unlatching, And the 4th pressure transmitter make gaseous mixture supply branch line keep connection, to vacuum furnace body conveying gaseous mixture air container in gas Body；

(6) the first electromagnetism-gas-driving valve, first pressure transmitter, the 4th electromagnetism-gas-driving valve, the 5th electromagnetism-gas-driving valve, Yi Ji are opened Three pressure transmitters make process gas supply branch line keep connection, open thermostat, convey process gas to vacuum furnace body；

(7) when the gas deficiency in the process gas storage container in first gas supply line, the spare gas supply is enabled Pipeline enables the same step of method (1) of the spare gas supply line to step (6).

10. air supply method according to claim 9, which is characterized in that in the step (7), process gas is hydrogen selenide, three Boron chloride or methyl trichlorosilane, in the step (6), the temperature of thermostat is 35 DEG C -50 DEG C.

Technical field

The invention belongs to chemical vapour deposition technique fields, and in particular to a kind of chemical gas-phase deposition system and feeder And air supply method.

Background technique

Chemical vapour deposition technique is to be issued biochemical reaction using gaseous material in vacuum, high temperature, deposited to solid liner body The upper method for generating product.It is widely applied to infra-red material preparation field such as zinc selenide, zinc sulphide, diamond film etc. at present Production and field of ceramic material preparation, such as boron nitride, silicon carbide.It generally will use in the production process of these products Toxic gas, the saturated vapor of these toxic gases is also relatively relatively low, causes to supply in process of production unstable, influences product Performance.

Summary of the invention

A kind of chemical gas-phase deposition system is provided it is an object of the invention to overcome the shortcomings of the prior art place And feeder and air supply method.

To achieve the above object, the technical scheme adopted by the invention is as follows: a kind of feeder of chemical gas-phase deposition system, The feeder includes end general pipeline, the first gas supply line and at least one spare gas supply line；

The use device of air pipeline connection of the end general pipeline and chemical gas-phase deposition system, end general pipeline and the first air supply pipe Line pipeline connection, end general pipeline and spare gas supply line pipeline connection；

First gas supply line includes gaseous mixture supply branch line, process gas supply branch line, mixed gas container and the 6th electricity Magnetic pneumatic operated valve, the gaseous mixture supply branch line and the mixed gas reservoir, process gas supply branch line and the mixed gas container Connection, the 6th electromagnetism-gas-driving valve pipeline connection is between mixed gas container and the end general pipeline；

The gaseous mixture supplies the gaseous mixture air container that branch line includes starting point and the gaseous mixture air container pipeline Connection the 7th electromagnetism-gas-driving valve, with the 4th pressure transmitter of the 7th electromagnetism-gas-driving valve pipeline connection and with it is described Second mass flowmenter of the 4th pressure transmitter pipeline connection, second mass flowmenter and the mixed gas container pipeline connect It is logical；

The process gas supply branch line includes the process gas storage container of starting point, stores and hold with the process gas 4th electromagnetism-gas-driving valve of high-purity filter of device pipeline connection and high-purity filter pipeline connection and the 4th electricity 5th electromagnetism-gas-driving valve of magnetic pneumatic operated valve pipeline connection, the third pressure inverting with the 5th electromagnetism-gas-driving valve pipeline connection Device purges tracheae with the first mass flowmenter of the third pressure transmitter pipeline connection, the first purge line and second Line, first mass flowmenter and the mixed gas container pipeline connection, the end pipeline connection of first purge line On pipeline between high-purity filter and the 4th electromagnetism-gas-driving valve, the end pipeline connection of second purge line On pipeline between the 4th electromagnetism-gas-driving valve and the 5th electromagnetism-gas-driving valve, it is provided with outside the process gas storage container Thermostat；

First purge line successively includes the first purge gass storage container and described first from starting point to end First electromagnetism-gas-driving valve of purge gass storage container pipeline connection and with the first electromagnetism-gas-driving valve pipeline connection first Pressure transmitter, the first pressure transmitter is by pipeline connection between high-purity filter and the 4th electromagnetism-gas-driving valve Pipeline on；

Second purge line successively includes the second purge gass storage container and described second from starting point to end Second electromagnetism-gas-driving valve of purge gass storage container pipeline connection, the second pressure with the second electromagnetism-gas-driving valve pipeline connection The venturi generator of transmitter and the second pressure transmitter pipeline connection and the venturi generator pipeline connection Third electromagnetism-gas-driving valve and tail gas pipeline with the venturi generator pipeline connection, the third electromagnetism-gas-driving valve Pipeline connection is on the pipeline between the 4th electromagnetism-gas-driving valve and the 5th electromagnetism-gas-driving valve；

The spare gas supply line is identical as first gas supply line.

The feeder of above-mentioned chemical gas-phase deposition system is provided with identical first gas supply line and spare gas supply line, By the selection of the device and connection type that use to gas supply line, the accurate control to gas supply flow is realized；And it utilizes Mass flow controller realizes the automatic switchover of the first gas supply line and spare gas supply line；And pass through the first purging tracheae Line by inside pipeline air or toxic gas purge, line gas is set by the setting of the second blow line It changes, realizes and keep the pure of supply gas when the automatic switchover of the first gas supply line and spare gas supply line；In process gas Online thermostat is set outside storage container, temperature control can be stablized and guarantees enough evaporating capacities；Above-mentioned chemical vapor deposition The feeder of system can realize online switching and stablize, safety, continuous gas supply, guarantee technique in chemical vapor deposition processes The stability of gas supply.

Preferably, the feeder includes end general pipeline, the first gas supply line and a spare gas supply line.

Preferably, the thermostat is water bath thermostat or oil bath thermostat.

Preferably, the process gas storage container is process gas steel cylinder, and the mixed gas container is mixed gas tank.

Preferably, argon gas or nitrogen, the second purge gass storage are stored in the first purge gass storage container Argon gas is stored in container perhaps stores argon gas, hydrogen or nitrogen in the nitrogen gaseous mixture air container.

Preferably, the feeder further includes PLC control system；

The PLC control system is electrically connected with the first electromagnetism-gas-driving valve and controls open and close and the tune of the first electromagnetism-gas-driving valve Size is saved, the PLC control system is electrically connected with the second electromagnetism-gas-driving valve and controls the open and close and adjusting of the second electromagnetism-gas-driving valve Size, the PLC control system are electrically connected and are controlled with third electromagnetism-gas-driving valve the open and close of third electromagnetism-gas-driving valve and adjust big Small, the PLC control system is electrically connected and is controlled with the 4th electromagnetism-gas-driving valve the open and close of the 4th electromagnetism-gas-driving valve and adjusts big Small, the PLC control system is electrically connected and is controlled with the 5th electromagnetism-gas-driving valve the open and close of the 5th electromagnetism-gas-driving valve and adjusts big Small, the PLC control system is electrically connected and is controlled with the 6th electromagnetism-gas-driving valve the open and close of the 6th electromagnetism-gas-driving valve and adjusts big Small, the PLC control system is electrically connected and is controlled with the 7th electromagnetism-gas-driving valve the open and close of the 7th electromagnetism-gas-driving valve and adjusts big It is small；

The PLC control system is electrically connected with the first mass flowmenter and controls open and close and the tune of the first mass flowmenter Size is saved, the PLC control system is electrically connected with the second mass flowmenter and controls the open and close and adjusting of the second mass flowmenter Size；

The PLC control system is electrically connected with first pressure transmitter and controls open and close and the tune of first pressure transmitter Size is saved, the PLC control system is electrically connected with second pressure transmitter and controls the open and close and adjusting of second pressure transmitter Size, the PLC control system are electrically connected and are controlled with third pressure transmitter the open and close of third pressure transmitter and adjust big Small, the PLC control system is electrically connected and is controlled with the 4th pressure transmitter the open and close of the 4th pressure transmitter and adjusts big It is small.

The present invention also provides a kind of chemical gas-phase deposition system, the chemical gas-phase deposition system includes any of the above-described described Chemical gas-phase deposition system feeder and with the feeder pipeline connection use device of air, it is described to be filled with gas It is set to vacuum furnace body.

Preferably, the chemical gas-phase deposition system further includes filter, spray column and the bucket that gathers dust；

The vacuum furnace body is provided with exhaust outlet, the exhaust outlet and filter pipeline connection, the filter and spray Tower pipeline connection, the filter are connected to the bucket that gathers dust.

The present invention also provides a kind of air supply methods of chemical gas-phase deposition system, the described method comprises the following steps:

(1) any of the above-described chemical gas-phase deposition system is installed；

(2) the 5th electromagnetism-gas-driving valve is closed, the second electromagnetism-gas-driving valve, second pressure transmitter, the first electromagnetic pneumatic are opened Valve, first pressure transmitter and the 4th electromagnetism-gas-driving valve, close third electromagnetism-gas-driving valve, and output the first purge gass storage is held Gas in device is purged；

(3) the first electromagnetism-gas-driving valve is closed, third electromagnetism-gas-driving valve is opened, exports the gas in the second purge gass storage container Body is purged；

(4) repetition step (2), step (3) are circuited sequentially 10-99 times；

(5) vacuum pump for opening vacuum furnace body is vacuumized, and third electromagnetism-gas-driving valve is closed, and opens the 7th electromagnetic pneumatic Valve and the 4th pressure transmitter make gaseous mixture supply branch line keep connection, into vacuum furnace body conveying gaseous mixture air container Gas；

(6) open the first electromagnetism-gas-driving valve, first pressure transmitter, the 4th electromagnetism-gas-driving valve, the 5th electromagnetism-gas-driving valve, with And third pressure transmitter makes process gas supply branch line keep connection, opens thermostat, conveys process gas to vacuum furnace body Body；

(7) it when the gas deficiency in the process gas storage container in first gas supply line, enables described spare Gas supply line enables the same step of method (1) of the spare gas supply line to step (6).

Preferably, in the step (7), when the third pressure transmitter on the first gas supply line the low detected value of pressure in When setting value or the flow detection value of the first mass flowmenter are lower than setting value, the PLC control system closes the first gas supply The 6th electromagnetism-gas-driving valve and the 5th electromagnetism-gas-driving valve on pipeline carry out spare gas supply line according to step (2)-step (4) Purging, is then supplied according to step (5)-step (6).

Preferably, in the step (7), process gas is hydrogen selenide, boron chloride or methyl trichlorosilane.

Preferably, in the step (6), the temperature of thermostat is 35 DEG C -50 DEG C.

The beneficial effects of the present invention are: the present invention provides a kind of chemical gas-phase deposition system and feeders and gas supply Method, the feeder of chemical gas-phase deposition system of the invention can realize online switching and stable, safety, continuous gas supply, Guarantee the stability of technique gas supply in chemical vapor deposition processes.

Detailed description of the invention

Fig. 1 is a kind of chemical gas-phase deposition system of the embodiment of the present invention and the schematic diagram of feeder.

Fig. 2 is a kind of schematic diagram of chemical gas-phase deposition system of the embodiment of the present invention.

Wherein, 1, end general pipeline, the 2, first gas supply line, 3, spare gas supply lines, the 4, the 6th electromagnetism-gas-driving valve, 5, Mixed gas tank, the 6, second mass flowmenter, the 7, the 4th pressure transmitter, the 8, the 7th electromagnetism-gas-driving valve, 9, gaseous mixture air container, 10, the first mass flowmenter, 11, third pressure inverting, the 12, the 5th electromagnetism-gas-driving valve, the 13, the 4th electromagnetism-gas-driving valve, 14, high-purity Filter, 15, process gas steel cylinder, 16, thermostat, 17, first pressure transmitter, the 18, first electromagnetism-gas-driving valve, 19, One purge gass storage container, 20, third electromagnetism-gas-driving valve, 21, second pressure transmitter, the 22, second electromagnetism-gas-driving valve, 23, Two purge gass storage containers, 24, tail gas pipeline, 25, vacuum furnace body, 26, filter, 27, gather dust bucket, 28, spray column, 29, text Generator in mound.

Specific embodiment

To better illustrate the object, technical solutions and advantages of the present invention, below in conjunction with specific embodiment to the present invention It is described further.