阅读说明：本技术 蚀刻时间侦测方法及蚀刻时间侦测系统 (Etching period method for detecting and etching period detecting system ) 是由 萧郁伦 于 2018-09-12 设计创作，主要内容包括：一种蚀刻时间侦测方法,包括以下步骤：依据配方数据执行蚀刻制程；于蚀刻时间中的判断时间内接收由数组光感测元件所传输的透光率数值；依据配方数据,分别撷取由各组光感测元件所传输的数个透光率数值,以产生相应的数个计算数值；于判断时间内处理计算数值,以产生相应各组光感测元件的数值分布数据；以及比对数值分布数据,以决定一过蚀刻时间。此外,一种蚀刻时间侦测系统亦被提出。(A kind of etching period method for detecting, comprising the following steps: execute etch process according to formulation data；Judging in etching period receives the transmittance values that are transmitted by array Photosensing Units in the time；According to formulation data, the several transmittance values transmitted by each group Photosensing Units are captured respectively, to generate corresponding several evaluations；In judging to handle evaluation in the time, to generate the numeric distribution data of corresponding each group Photosensing Units；And numeric distribution data are compared, to determine the overetch time.In addition, a kind of etching period detecting system is also suggested.)

1. a kind of etching period method for detecting, which comprises the following steps:

An etch process is executed according to a formulation data, wherein the formulation data includes an etching period；

One in the etching period judges to receive the several transmittance values transmitted by array Photosensing Units in the time；

According to the formulation data, those transmittance values transmitted by each group Photosensing Units are captured, respectively to generate phase The several evaluations answered；

In handling those evaluations in the judgement time, to generate the numeric distribution data of the corresponding each group Photosensing Units； And

Those numeric distribution data are compared, to determine the overetch time.

2. etching period method for detecting as described in claim 1, which is characterized in that the etching period is according to a unit time area It is divided into several time intervals, which includes a continuous time interval and a predicted time section, the predicted time area Between for the time interval add the unit time, it is described according to the formulation data, captured respectively by each group Photosensing Units institute The step of those transmittance values of transmission, those evaluations corresponding with generation, comprising the following steps:

According to the processing procedure numerical value and an allowable error value in the formulation data, to generate a prediction number in the predicted time section It is worth range, wherein the processing procedure numerical value system is to be somebody's turn to do in those corresponding evaluations of each group of the time interval Photosensing Units Allowable error value ties up to the predicted time section and is adjusted according to the formulation data；

According to the prediction numberical range, those light transmittance numbers for meeting each group Photosensing Units in the prediction numberical range are captured Value, using those corresponding evaluations of the Photosensing Units of each group as the predicted time section；And

Those corresponding evaluations of each group in the predicted time section Photosensing Units are updated to the processing procedure numerical value.

3. etching period method for detecting as claimed in claim 2, which is characterized in that be set forth in the judgement time and handle those The step of evaluation, the numeric distribution data to generate the corresponding each group Photosensing Units, comprising the following steps:

In a sampling range, according to those evaluations of each group Photosensing Units in the respectively time interval, to generate phase The preliminary distributed data of one answered, wherein the preliminary distributed data includes several first picking points, and respectively first picking point corresponds to Respectively the one first of the time interval each group Photosensing Units captures numerical value；And

According to each numerical value change relationship between first picking point in the preliminary distributed data of each group Photosensing Units, with Filter out the corresponding numeric distribution data.

4. etching period method for detecting as claimed in claim 3, which is characterized in that the foundation each group Photosensing Units Numerical value change relationship in the preliminary distributed data between those first picking points, to filter out the corresponding numeric distribution data The step of, comprising the following steps:

Compare those evaluations of each group Photosensing Units in the respectively time interval；And

The each group Photosensing Units is chosen in the maximum value of respectively those evaluations of the time interval, using as it is corresponding this first Capture numerical value.

5. etching period method for detecting as claimed in claim 4, which is characterized in that the foundation each group Photosensing Units Numerical value change relationship in the preliminary distributed data between those first picking points, to filter out the corresponding numeric distribution data The step of, comprising the following steps:

Within the scope of the sampling, according to the timing of the respectively time interval, those first picking points for capturing the slope condition that meets are made For corresponding one second picking point；And

Within the scope of the sampling, according to the timing of the respectively time interval, judge whether those second picking points meet a path condition.

6. etching period method for detecting as claimed in claim 5, which is characterized in that described capture meets being somebody's turn to do for the slope condition The step of a little first picking points are as corresponding second acquisition, comprising the following steps:

Within the scope of the sampling, according to the timing of the respectively time interval, by finding an initial point and one between those first picking points Most end point；

To the most end point by the initial point, two slopes of continuous three first picking points are calculated；And

The respectively direction of two slope, if the direction of two slope is identical, by the direction for meeting two slope it is identical respectively should First picking point is as corresponding second picking point.

7. etching period method for detecting as claimed in claim 5, which is characterized in that described whether to judge those second picking points The step of meeting the path condition, comprising the following steps:

Within the scope of the sampling, according to the timing of the respectively time interval, a line distance of continuous two second picking points is calculated；

According to the timing of the respectively time interval, between those lines distance, each group light sensing member in the respectively time interval is searched Those of part calculate whether point is less than the corresponding line distance at a distance from any second picking point, and wherein those calculate point Corresponding to respectively those corresponding evaluations of the time interval each group Photosensing Units；And

If so, the calculating point is substituted by second picking point.

8. etching period method for detecting as claimed in claim 7, which is characterized in that described those numeric distribution data of comparison, With the step of determining the overetch time, comprising the following steps:

By those the second picking point lines in those numeric distribution data, to generate a corresponding indicatrix, wherein respectively should Indicatrix is distinguished into several time-domain curves according to the respectively time interval；

Compare the corresponding time-domain curve of those time intervals adjacent in those numeric distribution data area ratio and tiltedly Rate；

The variation of the area ratio and slope of the corresponding time-domain curve according to the adjacent respectively time interval, if at least wantonly two The area ratio numerical value and slope number of the corresponding time-domain curve of the adjacent respectively time interval in a numeric distribution data Value difference is different to be not more than a threshold values, captures at least two numeric distribution data；And

If there are those similar numeric distribution data, those numeric distribution data bit are searched in a lower limit value of the sampling range The evaluation of the time interval of next timing；And

The timing of the corresponding etching period of those evaluations is handled, to generate the overetch time.

9. etching period method for detecting as claimed in claim 8, which is characterized in that described those evaluations of processing are corresponding The step of timing of the etching period, comprising the following steps:

The timing of the corresponding etching period of those evaluations is averaged.

10. a kind of etching period detecting system characterized by comprising

One parameter storage element, to a formulation data of withdrawing deposit；

One process unit, including array Photosensing Units；And

One data processing unit, connects the parameter storage element and the process unit, and the data processing unit is by the formulation data It is transmitted to the process unit, which executes an etch process according to the formulation data, and the data processing unit receives The several transmittance values transmitted by each group Photosensing Units, wherein the data processing unit includes a filter module and one Algorithm module, the filter module capture the several light transmissions transmitted by each group Photosensing Units according to the formulation data respectively Rate score, to generate corresponding several evaluations, which handles those evaluations, to generate the corresponding each group light sensation The numeric distribution data of element are surveyed, which compares those numeric distribution data, to determine the overetch time.

11. etching period detecting system as claimed in claim 10, which is characterized in that the filter module is according to the formulation data In a processing procedure numerical value and an allowable error value, with generate a predicted time section one prediction numberical range, the processing procedure numerical value System is in those corresponding evaluations of each group of the time interval Photosensing Units, when which ties up to the prediction Between section adjusted according to the formulation data, for the filter module according to the prediction numberical range, acquisition meets the prediction numerical value model Those transmittance values for enclosing the interior each group Photosensing Units, using the Photosensing Units phase of each group as the predicted time section Those evaluations answered.

12. etching period detecting system as claimed in claim 11, which is characterized in that the filter module updates the predicted time Those corresponding evaluations of each group in the section Photosensing Units are to the processing procedure numerical value.

13. etching period detecting system as claimed in claim 10, which is characterized in that in a sampling range, the calculation mould Those evaluations of block according to each group Photosensing Units in several time intervals, to generate corresponding one preliminary distribution number According to the preliminary distributed data includes several first picking points, and respectively the first picking point system should corresponding to the respectively time interval each group The one first of Photosensing Units captures numerical value, and the algorithm module is according to each in the preliminary distributed data of each group Photosensing Units Numerical value change relationship between first picking point, to filter out the corresponding numeric distribution data.

14. etching period detecting system as claimed in claim 13, which is characterized in that the algorithm module is in the respectively time interval Compare the numerical value of those evaluations of each group Photosensing Units, which chooses each group Photosensing Units and respectively should The maximum value of the numerical value of those evaluations of time interval, first to capture numerical value as corresponding this.

15. etching period detecting system as claimed in claim 13, which is characterized in that within the scope of the sampling, according to respectively this when Between section timing, which, which captures, meets those first picking points of a slope condition and captures as corresponding one second Point, the algorithm module is within the scope of the sampling, according to the timing of the respectively time interval, judges whether those second picking points meet one Path condition.

16. etching period detecting system as claimed in claim 15, which is characterized in that within the scope of the sampling, according to respectively this when Between section timing, the algorithm module is by finding an initial point and most end point, the algorithm module between those first picking points To the most end point by the initial point, two slopes of continuous three first picking points are calculated, which respectively should Identical respectively first picking point in the direction for meeting two slope is made if the direction of two slope is identical in the direction of two slopes For corresponding second picking point.

17. etching period detecting system as claimed in claim 15, which is characterized in that within the scope of the sampling, according to respectively this when Between section timing, which calculates a line distance of continuous two second picking points, and the algorithm module was according to respectively should The timing of time interval searches those meters of each group Photosensing Units in the respectively time interval between those lines distance Calculate whether point is less than the corresponding line distance with any second picking point at a distance from, those calculate point system corresponding to respectively this when Between those corresponding evaluations of the section each group Photosensing Units, if so, the algorithm module by the calculating point be substituted by this Two picking points.

18. etching period detecting system as claimed in claim 17, which is characterized in that the algorithm module is by those numeric distributions Respectively the second picking point line in data, to generate a corresponding indicatrix, each this feature curve is according to the respectively time zone Between be distinguished into several time-domain curves, which compares the corresponding of those time intervals adjacent in those numeric distribution data The time-domain curve area ratio and slope, the algorithm module is bent according to corresponding time domain of the adjacent respectively time interval The variation of the area ratio and slope of line, if the time interval adjacent at least in any two numeric distribution data is corresponding Respectively the area ratio numerical value of the time-domain curve and slope numerical value difference are not more than a threshold values, the algorithm module capture this at least two The numeric distribution data, if there is those similar numeric distribution data, which searches those numeric distribution data bit and exists The evaluation of the time interval of next timing of one lower limit value of the sampling range, the algorithm module handle those calculating The timing of the corresponding etching period of numerical value, to generate the overetch time.

19. etching period detecting system as claimed in claim 18, which is characterized in that the algorithm module is by those evaluations The timing of the corresponding etching period is average.

Technical field

The invention relates to a kind of manufacturing method thereof and process systems, and in particular to a kind of erosion for wet process Carve time method for detecting and etching period detecting system.

Background technique

In wet process etching (wet process pays etching technique or wet-etching technology), processing procedure (technique) solution concentration is higher or warm Degree is higher, and the removed rate of the film on substrate is faster, but excessively high rate of etch will cause serious undercutting (under- Cutting) phenomenon or too low rate of etch will cause undercut (under-etching) and there is a phenomenon where being partially completed, Therefore rate of etch must be by control appropriate.

Furthermore the time of etching (paying erosion or etching) is related with rate of etch of the processing procedure solution to film material, to avoid losing The situation of etching speed unevenness, it is therefore desirable to the mode of an overetch processing procedure to remove remaining film, and the prior art be with Set regular time rear execution overetch (Over-etching) processing procedure, but because in processing procedure other parameters variation (such as: It is etched object, cavity temperature, liquor strength, substrate inclined degree or plate face dead space capacity) and there is Residual foil thickness to exist often Unevenness during etching.The prior art is to replace processing procedure solution according to its rule of thumb to adjust formula, to maintain by engineering staff The overetch time is in certain control range, but different product has the different overetch time, also can not general above-mentioned experience Rule goes to replace or engineering staff must go the quality of keyholed back plate processing procedure solution depending on product characteristic；Or even same production Product, when processing procedure solution fails, the judgement point of overetch time can deviate (shift), thus can not accurately judge overetched Begin the time, causes over etching or etching incomplete, and then influence product quality and yield (qualification rate), and also increase process monitoring on foot With the operational degree of difficulty of processing procedure medical fluid, and time-histories height is spent.

In addition, the film thickness of substrate can constantly change during etch process, how have when the prior art detects substrate Imitating interpretation useful signal is also a great problem.Or the prior art is easy by spray solution or remains in water on substrate The influence of gas causes to receive invalid optical noise, and if substrate when being swung left and right or placement position or the inclination of substrate Situation also results in the feedback of invalid detection signal, therefore these situations will cause the degree of difficulty of the effective detection signal of interpretation, The judgement detected for etching period is reduced in turn.

Therefore, how to improve and a kind of " etching period method for detecting and etching period detecting system " can be provided to avoid The problem of suffered from is stated, is industry project urgently to be resolved.

Summary of the invention

A purpose of the present invention is that can accurately judge the overetch time, while reducing process monitoring and processing procedure medical fluid behaviour Degree of difficulty on work.

A purpose of the present invention is that achieving the purpose that complete etching substrate by the judgement of overetch time.

Another object of the present invention is to, can effective interpretation transmittance values detection signal, it is unnecessary to filter out whereby Noise, these unnecessary noises include feedback signal caused by aqueous vapor because of spray solution or on substrate, because of substrate Placement position and orientation cause feedback signal error, or indefinite because detecting position caused by the wiggly influence of substrate.

One embodiment of the invention proposes a kind of etching period method for detecting, comprising the following steps: according to a formulation data An etch process is executed, wherein formulation data includes an etching period；One in etching period judges to receive in the time by counting Several transmittance values that group Photosensing Units is transmitted；According to formulation data, captures passed by each group Photosensing Units respectively Defeated several transmittance values, to generate corresponding several evaluations；In judging to handle evaluation in the time, to generate phase Answer a numeric distribution data of each group Photosensing Units；And numeric distribution data are compared, to determine the overetch time.

One embodiment of the invention proposes a kind of etching period detecting system, including a parameter storage element, a processing procedure list Member and a data processing unit.Parameter storage element is to a formulation data of withdrawing deposit.Process unit includes array light sensing member Part.Formulation data is transmitted to processing procedure list by data processing unit Connecting quantity storage element and process unit, data processing unit Member, process unit executes an etch process according to formulation data, and data processing unit reception is passed by each group Photosensing Units Defeated several transmittance values, wherein data processing unit includes a filter module and an algorithm module, and filter module foundation is matched Number formulary according to the several transmittance values transmitted by each group Photosensing Units are captured respectively, to generate corresponding several evaluations, Algorithm module handles evaluation, and to generate the numeric distribution data of corresponding each group Photosensing Units, algorithm module compares logarithm Distributed data, to determine the overetch time.

It is with array light sensing in etching period method for detecting and etching period detecting system of the invention based on above-mentioned Element detects the transmittance values of substrate, by formulation data and compares the numeric distribution data of each group Photosensing Units, came Invalid or unreasonable noise and numeric distribution data are filtered out, to judge overetch time, and sentencing via the overetch time It is disconnected, achieve the purpose that complete etching substrate.

Furthermore transmittance values state of the system of the present invention according to time interval, to calculate the prediction in predicted time section Numberical range, and then determine whether the received transmittance values in predicted time section meet default value range, so that when prediction Between the received transmittance values system in section can have preferable correlation degree with the transmittance values of time interval, in this way, if It is influenced by spray solution or the aqueous vapor remained on substrate, the transmittance values for causing Photosensing Units to be detected are noisy Situation, so that the transmittance values difference of received transmittance values and time interval is very big and causes to receive invalid light transmission The transmittance values of rate score or surrounding time move towards wrong and lead to receive unreasonable transmittance values, this hair It is bright to filter out invalid or unreasonable transmittance values whereby, the case where to reduce the feedback for causing invalid detection signal；More very Person, if substrate is swung left and right, transmittance values also can have variation as substrate swings situation, but the present invention can still have Effect maintains the trend of transmittance values, achievees the purpose that filter out noise, and then promote the judgement for detecting etching period.

For the present invention can be clearer and more comprehensible, special embodiment below, and be described below in detail with reference to the accompanying drawings.

Detailed description of the invention

Fig. 1 is the schematic diagram of etching period detecting system of the invention.

Fig. 2 is the schematic diagram of an embodiment of the process unit of Fig. 1.

Fig. 3 is the flow chart of etching period method for detecting of the invention.

Fig. 4 is the flow chart for capturing transmittance values in Fig. 3 according to formulation data.

Fig. 5 is the flow chart that the numeric distribution data of Photosensing Units are generated in Fig. 3.

Fig. 6 is the flow chart that preliminary distributed data is generated in Fig. 5.

Fig. 7 is the flow chart that numeric distribution data are filtered out in Fig. 5.

Fig. 8 is the flow chart that the second picking point is captured in Fig. 7.

Fig. 9 is to judge whether each second picking point meets the flow chart of path condition in Fig. 7.

Figure 10 is the flow chart that several numeric distribution data are compared in Fig. 3.

Figure 11 A is the schematic diagram of one embodiment of transmittance data distributed data.

Figure 11 B is the schematic diagram for generating preliminary one embodiment of distributed data.

Figure 11 C is the schematic diagram for calculating one embodiment of slope.

Figure 11 D is the schematic diagram of one embodiment of numeric distribution data.

Figure 11 E is the schematic diagram for generating one embodiment of indicatrix.

Figure 11 F is the schematic diagram for generating one embodiment of overetch time.

Symbol description:

10 etching period detecting systems, 11 process units, 112 Photosensing Units, 12 parameter storage elements,

122 formulation datas, 13 data processing units, 132 filter modules, 134 algorithm modules, 14 external equipments,

B1 optical signal launcher, B2 light signal receiving, C order,

The first time-domain curve of D1, the second time-domain curve of D2, D3 third time-domain curve,

The 4th time-domain curve of D4, the 5th time-domain curve of D5, the 6th time-domain curve of D6,

E1 indicatrix, F1 substrate, F2 film, the dead space F3, L1 optical signal,

M1, M11 first slope, the second slope of M2, M21, M3, M31 third slope,

The 4th slope of M4, M41, the 5th slope of M5, M51, the 6th slope of M6, M61,

The 7th slope of M7, N1 calculating point, the first picking point of P1, the second picking point of P2, PN calculate point,

PN1 first calculates point, and PN2 second calculates point,

The first time section T1, the second time interval of T2, T3 third time interval,

The 4th time interval of T4, the 5th time interval of T5, the 6th time interval of T6,

TN1 the first overetch time, TN2 the second overetch time, the TE overetch time,

R1 upper limit value, R2 lower limit value, V1 etching groove,

S10 etching period method for detecting,

S11 ~ S15 step, S132 ~ S136 step, S142 ~ S144 step, S21 ~ S24 step,

S232 ~ S236 step, S242 ~ S246 step, S151 ~ S159 step.

Specific embodiment

Below in conjunction with drawings and examples, further description of the specific embodiments of the present invention.Following embodiment is only For clearly illustrating technical solution of the present invention, and cannot be limited the scope of the invention with this.

Fig. 1 is the schematic diagram of etching period detecting system of the invention.Fig. 2 is an embodiment of the process unit of Fig. 1 Schematic diagram.Please referring initially to Fig. 1.In the present embodiment, 10 system of etching period detecting system is suitable for various wet etching processing procedures, etching Time detecting system 10 includes a process unit 11, a parameter storage element 12 and a data processing unit 13.

Array Photosensing Units 112 is equipped in process unit 11, Photosensing Units 112 is a penetration in this present embodiment Photosensing Units, by taking Fig. 2 as an example, process unit 11 of the present invention is, for example, etching groove a V1, substrate F1 to be etched from processing procedure list First 11 sides are admitted to be etched, and substrate F1 has dead space F3 in its edge, and the range of dead space F3 can be according to practical production The different demands of product and set, there is film F 2 to be etched on substrate F1, can configure idler wheel (not being painted) under substrate F1 and come Substrate F1 is set to swing back and forth, substrate F1 is in being etched processing procedure in etching groove V1.Photosensing Units 112 is, for example, a penetration light Sensing element, it includes array corresponding optical signal launcher B1 and a light signal receiving B2, optical signal launch dresses B1 is set to emit optical signal L1 to substrate F1, light signal receiving B2 emits and wears receiving optical signal launcher B1 The optical signal L1 of saturating substrate F1, with the strong and weak with interpretation transmittance values of optical signal L1, and 2 thickness of film F of substrate F1 be with Transmittance values are inversely proportional, therefore can collect these transmittance values by Photosensing Units 112, are etched shifting to obtain film F 2 The degree removed.In the present embodiment, Photosensing Units 112 is, for example, 3 groups, and so the present invention does not limit the number of Photosensing Units 112 Amount and configuration.

Please answer referring to Fig. 1, parameter storage element 12 be as a database, can be by hardware (such as integrated circuit), soft Part (such as processor execute program instruction) or combinations thereof is come the function realizing communication connection Yu withdraw deposit, such as memory.Ginseng Number storage element 12 is to a formulation data 122 of withdrawing deposit, and user can set according to the different demands of practical board and processing procedure Parameter fixed or that formulation data 122 is stored in advance, for example, parameter includes etching solution type, for example, aluminic acid；Parameter includes The constituents such as medical fluid type, for example, nitric acid, acetic acid and phosphoric acid；Parameter includes etching period, and for example, 120 seconds；Parameter can be Judge the time, this judged in the time, data processing unit 13, judged whether to reach overetch time, for example, 40 seconds；Parameter can For processing procedure numerical value, herein by taking rate of etch is 200/ second as an example, in other embodiments, processing procedure numerical value can be light transmittance；Parameter can For the unit time, such as using 1 second as the unit time；Parameter can be data volume per unit time, such as with reading light sensation per second Surveying the transmission signal data volume of element 112 is 10；Parameter can be sampling range, to define the upper and lower of required acquisition processing procedure numerical value Limit value；Parameter can be allowable error value, for example, 20%；Parameter can use time or cycle-index for medical fluid；Parameter can be each group The offset of Photosensing Units 112, error amount caused by the arrangement angles to compensate Photosensing Units 112 and substrate F1.

Data processing unit 13 connects process unit 11, and 13 system of data processing unit can pass through hardware (such as integrated electricity Road), software (such as processor execute program instruction) or combinations thereof realize the function of communication connection and logic judgment, such as Computer or other computer installations.In the present embodiment, 13 system of data processing unit receives the line request of external equipment 14 simultaneously Etc. the order C of external equipment 14 to be received, external equipment 14 can be a computer or other computer installation input interfaces.At data After the reason reception of unit 13 order C and it is transmitted to process unit 11, such as to the order that substrate F1 is etched.

On the other hand, 13 Connecting quantity storage element 12 of data processing unit, data processing unit 13 include a filtering mould Block 132 and an algorithm module 134,132 Connection Calculus module 134 of filter module.Data processing unit 13 is to receive by parameter The formulation data 122 that storage element 12 is transmitted, and formulation data 122 is transmitted to process unit 11,11 foundation of process unit Formulation data 122, to execute etch process to substrate F1, at the same time, data processing unit 13 is to collect or receive by preceding Several transmittance values that array Photosensing Units 112 is transmitted are stated, filter module 132 captures respectively according to formulation data 122 The several transmittance values transmitted by each group Photosensing Units 112, filter module 132 can be according to the processing procedure numbers of a time interval Value and allowable error value, to generate a prediction numberical range in a predicted time section, filter module 132 is according to prediction numerical value model It encloses, captures the transmittance values for meeting each Photosensing Units 112 in prediction numberical range, to generate corresponding each group light sensing member Several evaluations of part 112, and evaluation is accessed to algorithm module 134.The processing processing each group light sensation of algorithm module 134 Several evaluations of element 112 are surveyed, to generate a numeric distribution data of each group Photosensing Units 112, algorithm module 134 compares To the numeric distribution data of each group Photosensing Units 112, to determine an overetch time (Over- Etching Time), that is, Determine the time point of beginning overetch processing procedure.It should be noted that etching end point is that an etch process terminates to etch a substrate At time point, the invention reside in the presumption overetch times to judge etching end point, and in other embodiments, etching end point can be substrate Terminate the time point etc. for being etched into the air-dried stage.

Fig. 3 is the flow chart of etching period method for detecting of the invention.Referring to Fig. 3, the etching period of the present embodiment is detectd Survey method S10 can be used for etching period detecting system 10 as shown in Figure 1.Etching period method for detecting S10 includes the following steps S11 ~S15.Step S11 is carried out, an etch process is executed according to a formulation data 122, when wherein formulation data 122 includes an etching Between.By taking Fig. 1 as an example, the line that data processing unit 13 receives external equipment 14 requests and waits the order of external equipment 14 to be received After C, the reception of data processing unit 13 order C and it is transmitted to process unit 11, process unit 11 is executed according to formulation data 122 Etch process, the parameter of formulation data 122 include etching solution type, medical fluid type, etching period, judge the time, processing procedure numerical value, Unit time, per unit time data volume, sampling range, allowable error value, medical fluid use time or cycle-index and each group The offset of Photosensing Units 112.

Then step S12 is carried out, one in etching period judges that reception is passed by array Photosensing Units 112 in the time Defeated several transmittance values.By taking Fig. 1 and Fig. 2 as an example, each group of Photosensing Units 112 captures transmittance values to substrate F1, And it is transmitted to data processing unit 13.Then, step S13 is carried out, according to formulation data 122, is captured respectively by each group light sensing Several transmittance values that element 112 is transmitted, to generate corresponding several evaluations.By taking Fig. 1 as an example, filter module 132 The several transmittance values transmitted by each group Photosensing Units 112 are captured respectively according to formulation data 122, are calculated accordingly each The corresponding several evaluations of group Photosensing Units 112.In addition, filter module 132 is according in formulation data 122 when per unit Between data volume quantity come capture Photosensing Units 112 transmission transmittance values.

Specifically, step S13 may include following steps S132 to step S136, referring to Fig. 4, Fig. 4 is foundation in Fig. 3 The flow chart of formulation data acquisition transmittance values.Etching period is distinguished into several time intervals according to a unit time, etches Time includes a continuous time interval and a predicted time section, when wherein predicted time section is that time interval adds unit Between.Step S132 is carried out, according to the processing procedure numerical value and an allowable error value in formulation data 122, to generate predicted time area Between one prediction numberical range, wherein processing procedure numerical value system be time interval each group Photosensing Units 112 accordingly calculate number Value, allowable error value tie up to predicted time section and are adjusted according to formulation data.By taking Fig. 1 as an example, filter module 132 is according to the time The state in section extracts formulation data 122 by parameter storage element 12 and has a dynamic parameter matrix, dynamic parameter matrix system According to the corresponding different calculated linear physical model of time institute of formulation data 122 (include process conditions), and by matching Number formulary according in 122 processing procedure numerical value and allowable error value calculate the prediction numberical range in predicted time section, wherein being formulated Processing procedure numerical value system in data 112 is the corresponding evaluation of each group Photosensing Units 112 in time interval, and evaluation is Meet the transmittance values of each group Photosensing Units 112 in prediction numberical range, and allowable error value system according to etching period and The different time and have different gains.For specific, time interval is, for example, the sometime section in etching period, prediction Time interval is then the future time section in sometime section, and wherein future time section is that sometime section adds unit Time, the transmittance values system and sometime area that Photosensing Units 112 inputs in future time section (predicted time section) Between (time interval) input transmittance values have relationship.The transmittance values of predicted time section input, time interval input Transmittance values and allowable error value be respectively provided with corresponding dynamic parameter matrix, therefore can be by present time (time interval) Transmittance values calculate the prediction numberical range in future time (predicted time section), also that is, can be with the present time (time Section) input transmittance values on the basis of, calculate prediction future time (predicted time section) transmittance values.

Step S134 is carried out, according to prediction numberical range, acquisition meets each group Photosensing Units 112 in prediction numberical range Transmittance values, using the corresponding evaluation of each group Photosensing Units 112 as predicted time section.By taking Fig. 1 as an example, filter Predicted time section is met each group light sensation in prediction numberical range according to prediction numberical range, filter module 132 by wave module 132 Each transmittance values for surveying element 112, the corresponding each evaluation of each group Photosensing Units 112 as predicted time section； Anti-, filter module 132 judges that certain transmittance values of Photosensing Units 112 do not meet in prediction numberical range, filtering Module 132 will correct dynamic parameter matrix, such as make the numerical value zero of dynamic parameter matrix, and then allow this predicted time section Transmittance values can not be read to data processing unit 13, achieve the purpose that filter out noise whereby.Step S136 is carried out, more The corresponding evaluation of each group Photosensing Units 112 in new predicted time section is to processing procedure numerical value.By taking Fig. 1 as an example, filter module The corresponding evaluation of each group Photosensing Units 112 in predicted time section in step S134 is updated to processing procedure numerical value by 132, is made For calculation basis next time, until in the judgement time in etching period.

By above-mentioned steps S132 to step S136 it is found that the etching period method for detecting S10 system of the present embodiment is according to the time The transmittance values state in section to calculate the prediction numberical range in predicted time section, and then determines predicted time section Whether received transmittance values meet default value range, enable the received transmittance values system in predicted time section and when Between the transmittance values in section have preferable correlation degree, in this way, if by spray solution or remain in water on substrate The influence of gas, cause Photosensing Units 112 detect the noisy situation of transmittance values so that received transmittance values with The transmittance values difference of time interval is very big and leads to the light transmittance for receiving invalid transmittance values or surrounding time Numerical value moves towards wrong and leads to receive unreasonable transmittance values, and the present invention can filter out invalid or unreasonable saturating whereby Light rate score；Or the etching period method for detecting S10 of the present embodiment not will receive putting for substrate by the above-mentioned practice The case where influence of position or inclination conditions, reduction causes the feedback of invalid detection signal；What is more, it is shaken if substrate carries out left and right When pendulum, transmittance values also can have variation as substrate swings situation, but via the present embodiment etching period method for detecting S10 The above-mentioned practice, can effectively maintain the trend of transmittance values, achieve the purpose that filter out noise, and then promoted for etching period The judgement of detecting.

It please answer referring to Fig. 3, after invalid or unreasonable transmittance values are filtered out in step S13, by taking Figure 11 A as an example, Figure 11 A The longitudinal axis for the schematic diagram of one embodiment of transmittance data distributed data, Figure 11 A is light transmittance, when the longitudinal axis horizontal axis of Figure 11 A is Between, each point N1 system that calculates corresponds to the corresponding each evaluation of each time interval each group Photosensing Units 112, in the cross of Figure 11 A Distinguishing on axis according to the unit time has first time section T1, the second time interval T2, third time interval T3, the 4th time zone Between T4, the 5th time interval T5 and the 6th time interval T6, and first time section T1, the second time interval T2, third time There are several calculating point N1 respectively in section T3, the 4th time interval T4, the 5th time interval T5 and the 6th time interval T6；Yu Tu The upper limit value R1 and lower limit value R2 set on the longitudinal axis of 11A according to formulation data 122.Step S14 is carried out, in judging in the time Evaluation is managed, to generate the numeric distribution data of corresponding each group Photosensing Units 112.By taking Fig. 1 as an example, algorithm module 134 is connect The evaluation by the transmitted each group Photosensing Units 112 of aforementioned filter module 132 is received, algorithm module 134 handles each calculating Numerical value, to generate the numeric distribution data of corresponding each group Photosensing Units 112.Specifically, step S14 may include following steps S142 to step S144, referring to Fig. 5, Fig. 5 is the flow chart for generating the numeric distribution data of Photosensing Units in Fig. 3.It carries out Step S142, in a sampling range, each calculating of the algorithm module 134 according to each group Photosensing Units 112 in each time interval Numerical value, to generate corresponding one preliminary distributed data (see Figure 11 B).Step S142 may include following steps S21 to step S22, Referring to Fig. 6, Fig. 6 is the flow chart for generating preliminary distributed data in Fig. 5.Step S21 is carried out, compares each group in each time interval The evaluation of Photosensing Units 112, by taking Figure 11 A as an example.Algorithm module 134 is respectively at first time section T1, the second time Section T2, third time interval T3, the 4th time interval T4, the 5th time interval T5 are each compared in the 6th time interval T6 Calculate the evaluation of point N1.Then, step S22 is carried out, algorithm module 134 chooses each group Photosensing Units 112 in each time The maximum value of the several evaluations for calculating point N1 in section, to capture numerical value, by taking Figure 11 B as an example, Figure 11 B as corresponding first For the schematic diagram for generating preliminary one embodiment of distributed data, the longitudinal axis of Figure 11 B is light transmittance, and the horizontal axis of Figure 11 B is the time, is passed through Step S22, algorithm module 134 is when first time section T1, the second time interval T2, third time interval T3, the 4th Between choose the maximum value of each evaluation for calculating point N1 simultaneously in section T4, the 5th time interval T5 and the 6th time interval T6 As the first picking point P1, preliminary distributed data includes several first picking point P1, when each first picking point P1 system corresponds to each Between section each group Photosensing Units 112 one first capture numerical value.

Then, step S144 is carried out, algorithm module 134 is according in the preliminary distributed data of each group Photosensing Units 112 the Numerical value change relationship between one picking point P1, to filter out corresponding numeric distribution data.Step S144 may include following step Rapid S23 to step S24, referring to Fig. 7, Fig. 7 is the flow chart for filtering out numeric distribution data in Fig. 5.Carry out step S23, In It samples in range, according to the timing of each time interval, captures the first picking point of the slope condition that meets as corresponding one second Picking point.Step S23 may include following steps S232 to step S236, referring to Fig. 8, Fig. 8 is to capture the second picking point in Fig. 7 Flow chart.Step S232 is carried out, in sampling range, algorithm module 134 is captured according to the timing of each time interval by each first An initial point and most end point are found between point.By taking Figure 11 B as an example, the first picking point P1 in first time section T1 is For initial point, the first picking point P1 in the 6th time interval T6 is most end point.Then, step S234 is carried out, by first Initial point starts to most end point, calculates two slopes of continuous three the first picking points, and by taking Figure 11 C as an example, Figure 11 C is to calculate slope one The schematic diagram of embodiment.Algorithm module 134 calculates two slopes of the first picking point of continuous three time intervals: by the first time Section T1 starts, and algorithm module 134 calculates the first of first time section T1, the second time interval T2 and third time interval T3 Two slopes of picking point P1, the first picking point P1 of the first picking point P1 to the second time interval T2 of first time section T1 it Between slope be first slope M1, the first picking point of the first picking point P1 to third time interval T3 of the second time interval T2 Slope between P1 is the second slope M2；Then, algorithm module 134 calculate the second time interval T2, third time interval T3 with Two slopes of the first picking point P1 of 4th time interval T4, the first picking point P1 of the second time interval T2 to third time zone Between T3 the first picking point P1 between slope be the second slope M2, when the first picking point P1 to the 4th of third time interval T3 Between section T4 the first picking point P1 between slope be third slope M3；Then, algorithm module 134 calculates third time interval Two slopes of the first picking point P1 of T3, the 4th time interval T4 and the 5th time interval T5, the first of third time interval T3 Slope between the first picking point P1 of picking point P1 to the 4th time interval T4 is third slope M3, the 4th time interval T4's Slope between the first picking point P1 of first picking point P1 to the 5th time interval T5 is the 4th slope M4；Then, mould is calculated Block 134 calculates two slopes of the first picking point P1 of the 4th time interval T4, the 5th time interval T5 and the 6th time interval T6, Slope between the first picking point P1 of the first picking point P1 to the 5th time interval T5 of 4th time interval T4 is the 4th oblique Slope between the first picking point P1 of the first picking point P1 to the 6th time interval T6 of rate M4, the 5th time interval T5 is the Five slope M5.

Step S236 is carried out, refering to fig. 1 1C and Figure 11 D, Figure 11 D is the schematic diagram of one embodiment of numeric distribution data, is drilled The direction for meeting two slopes identical each first is picked if the direction of two slopes is identical in the direction that calculation module 134 compares two slopes Take corresponding second picking point of conduct.By taking Figure 11 C as an example, the first picking point P1 in first time section T1 is as initial Point, on the basis of the direction of first slope M1, the direction of the second slope M2 is different from the direction of first slope M1, therefore will not capture The first picking point P1 of third time interval T3, and then need the first picking point P1 of the second time interval T2 being connected to the 4th The first picking point P1 to the first of the 4th time interval T4 of the first picking point P1, the second time interval T2 of time interval T4 is picked Taking the slope between point P1 is the 6th slope M6, and then judges the direction of first slope M1 and the 6th slope M6, tiltedly due to first The direction of rate M1 is identical to the direction of the 6th slope M6, therefore by the first picking point P1 of first time section T1, the second time zone Between T2 the first picking point P1 and the 4th time interval T4 the first picking point P1 as corresponding second picking point P2 (as scheme Shown in 11D).Similarly, the direction of the 4th slope M4 is different from the direction of first slope M1, therefore will not capture the 5th time interval T5 The first picking point P1, and then need for the first picking point P1 of the 4th time interval T4 to be connected to the of the 6th time interval T6 It is oblique between the first picking point P1 of the first picking point P1 to the 6th time interval T6 of one picking point P1, the 4th time interval T4 Rate is the 7th slope M7, and then judges the direction of the 6th slope M6 and the 7th slope M7, since the direction of the 6th slope M6 is identical In the direction of the 7th slope M7, therefore the first of the first picking point P1 of the 4th time interval T4 and the 6th time interval T6 is picked Take point P1 as corresponding second picking point P2 (as shown in Figure 11 D).

After step S23 finds the second picking point P2, carry out step S24, sampling range in, algorithm module 134 according to The timing of each time interval, judges whether each second picking point P2 meets a path condition.Step S24 may include following steps S242 to step S246, referring to Fig. 9, Fig. 9 is to judge whether each second picking point meets the flow chart of path condition in Fig. 7, Step S242 is carried out, in sampling range, algorithm module 134 calculates continuous two second acquisitions according to the timing of each time interval A line distance of point P2.Then, step S244 is carried out, is searched each between each line distance according to the timing of each time interval Whether the calculating point N1 of each group Photosensing Units 112 is less than at a distance from any second picking point P2 and connects accordingly in time interval Linear distance.By taking Figure 11 D as an example, the second picking point P2 of the second picking point P2 to the second time interval T2 of first time section T1 Line distance on the basis of, search the second time interval T2 in each calculating point N1 and first time section T1 second capture Whether the distance of point P2 is less than line distance above-mentioned, if so, carrying out step S246, will calculate point and is substituted by the second picking point P2。

Referring back to Fig. 3, after step S14, the numeric distribution data for generating every group of Photosensing Units 112, step is carried out S15 compares each numeric distribution data, to determine the overetch time, that is, determines to start the time point of overetch processing procedure.It needs Bright, etching end point is that an etch process terminates to etch the time point of a substrate, and the invention reside in the presumption overetch times Judge etching end point, in other embodiments, etching end point can terminate the time point etc. for being etched into the air-dried stage for substrate. Step S15 may include following steps S151 to step S159, referring to Fig. 10, Figure 10 is to compare several numeric distribution numbers in Fig. 3 According to flow chart, carry out step S151, algorithm module 134 is by each second picking point line in each numeric distribution data, to produce Raw corresponding indicatrix E1, wherein each indicatrix is distinguished into several time-domain curves according to each time interval.It is with Figure 11 E Example, Figure 11 E are the schematic diagram for generating one embodiment of indicatrix, and indicatrix E1 is according to first time section T1, the second time Section T2, third time interval T3, the 4th time interval T4, the 5th time interval T5 and the 6th time interval T6 are distinguished into one First time-domain curve D1, the second time-domain curve D2, third time-domain curve D3, the 4th time-domain curve D4, the 5th time-domain curve D5 with And the 6th time-domain curve D6.

Then, step S153 is carried out, algorithm module 134 compares the phase of each time interval adjacent in each numeric distribution data The area ratio and slope for each time-domain curve answered search similar numeric distribution data whereby.For slope, it is with Figure 11 E Example, the slope of the first time-domain curve D1 are first slope M11；The slope of second time-domain curve D2 is the second slope M21；When third The slope of domain curve D3 is third slope M31；The slope of 4th time-domain curve D4 is the 4th slope M41；5th time-domain curve D5 Slope be the 5th slope M51；The slope of 6th time-domain curve D6 is the 6th slope M61.Similarly, another group of Photosensing Units 132 numeric distribution data should also have the first slope of corresponding above-mentioned each time-domain curve, the second slope, third slope, the 4th Slope, the 5th slope and the 6th slope.It in the present embodiment, is by the of the numeric distribution data of a certain group of Photosensing Units First slope of one slope ratio to the numeric distribution data to another group of Photosensing Units；The numerical value of a certain group of Photosensing Units point Second slope of second slope ratio of cloth data to the numeric distribution data to another group of Photosensing Units；A certain group of light sensing member Third slope of the third slope ratio of the numeric distribution data of part to the numeric distribution data to another group of Photosensing Units；It is a certain 4th slope ratio of the numeric distribution data of group Photosensing Units is to the of the numeric distribution data to another group of Photosensing Units Four slopes；5th slope ratio of the numeric distribution data of a certain group of Photosensing Units is to the numerical value point to another group of Photosensing Units 5th slope of cloth data；6th slope ratio of the numeric distribution data of a certain group of Photosensing Units is to first to another group of light sensing 6th slope of the numeric distribution data of part, and so on.For area ratio, by taking Figure 11 E as an example, the first time-domain curve D1's Area is to be corresponded in first time section T1 to the integral area of light transmittance；The area of second time-domain curve D2 is at second Between correspond in the T2 of section to the integral area of light transmittance；The area of third time-domain curve D3 is corresponding in third time interval T3 To the integral area of light transmittance；The area of 4th time-domain curve D4 is to be corresponded in the 4th time interval T4 to the integral of light transmittance Area；The area of 5th time-domain curve D5 is to be corresponded in the 5th time interval T5 to the integral area of light transmittance；6th time domain The area of curve D6 is to be corresponded in the 6th time interval T6 to the integral area of light transmittance.When the first time-domain curve D1 and second The area ratio of domain curve D2 is the first area ratio；The area ratio of second time-domain curve D2 and third time-domain curve D3 are the Two area ratios；The area ratio of third time-domain curve D3 and the 4th time-domain curve D4 are third area ratio；4th time domain is bent The area ratio of line D4 and the 5th time-domain curve D5 are fourth face product ratio；5th time-domain curve D5's and the 6th time-domain curve D6 Area ratio is the 5th area ratio.Similarly, the numeric distribution data of another group of Photosensing Units 132 should also have correspondence above-mentioned The first area ratio, second area ratio, third area ratio, fourth face product ratio and the 5th area ratio of each time-domain curve Rate.It in the present embodiment, is to compare the first area ratio of the numeric distribution data of a certain group of Photosensing Units to another group First area ratio of the numeric distribution data of Photosensing Units；Second face of the numeric distribution data of a certain group of Photosensing Units Product ratio compares the second area ratio of the numeric distribution data to another group of Photosensing Units；The number of a certain group of Photosensing Units The third area ratio of Distribution value data compares the third area ratio of the numeric distribution data to another group of Photosensing Units；Certain The fourth face product ratio of the numeric distribution data of one group of Photosensing Units is compared to the numeric distribution number of another group of Photosensing Units According to fourth face product ratio；5th area ratio of the numeric distribution data of a certain group of Photosensing Units is compared to another group of light sensation The 5th area ratio of the numeric distribution data of element is surveyed, and so on.It follows that it is directed to area ratio, the present embodiment Step S153 is the area ratio for comparing corresponding each time-domain curve of adjacent time interval, and indirect by a certain group of light sensation The feature for surveying the area of the indicatrix of the numeric distribution data of element and the numeric distribution data of another group of Photosensing Units is bent The area of line compares.

Then, carry out step S155, the area ratio of corresponding each time-domain curve according to adjacent each time interval and The variation of slope, if the face of the corresponding respectively time-domain curve of each time interval adjacent at least in any two numeric distribution data Product ratio value and slope numerical value difference are not more than a threshold values, capture at least two numeric distribution data.For example, a certain group The area ratio and slope of each time-domain curve of the numeric distribution data of Photosensing Units are as benchmark, another group of light sensing member The variation of the area ratio and slope of each time-domain curve of the numeric distribution data of part compares according to abovementioned steps S153, If the area ratio numerical value and slope numerical value of each time-domain curve of a certain group of Photosensing Units and another group of Photosensing Units The area ratio numerical value of each time-domain curve and the difference of slope numerical value are not more than a threshold values, and wherein threshold values is, for example, 10%, also That is, the similarity of the numeric distribution data of a certain group of Photosensing Units and another group of light sensing distributed data will be up to 90%, then this The numeric distribution data of two groups of Photosensing Units 112 are just effective data, and can be routed module 134 and capture use.It lifts For example, by taking Fig. 1 as an example, if three groups of Photosensing Units 112 have the numeric distribution data similarity of two groups of Photosensing Units 112 high Up to 90%, then the numeric distribution data of this two groups of Photosensing Units 112 are just determined effective data.Certainly, above-mentioned system is with three groups Photosensing Units 112 as an example,, still can be according to if the group number of Photosensing Units 112 is greater than three in other preferred embodiments User setting mode carry out, if such as five groups take three groups to meet criterion, also can be considered effective numeric distribution data.

Then, step S157 is carried out, if there are similar each numeric distribution data, algorithm module 134 searches each numeric distribution Evaluation of the position in the calculating point of the time interval of next timing of a lower limit value of sampling range.By taking Figure 11 E as an example, calculation Module 134 searches position in the calculating point of the time interval of next timing of a lower limit value R2 of sampling range, i.e. the 6th time zone Between calculating point PN, calculating point PN after T6 rear respectively calculating point of the 6th time interval T6 is captured also according to abovementioned steps Evaluation maximum value.As shown in fig. 11f, Figure 11 F is the schematic diagram for generating one embodiment of overetch time, according to step S157 finds the first calculating point PN1 and second and calculates point PN2, wherein first calculates point PN1 corresponding to one group of Photosensing Units 112, second, which calculates point PN2 system, corresponds to another group of Photosensing Units 112.Then, step S159 is carried out, each evaluation is handled The timing of corresponding etching period, to generate the overetch time, in the present embodiment, by the corresponding etching period of each evaluation Timing it is average.By taking Figure 11 F as an example, the first timing for calculating the corresponding etching period of point PN1 is the first overetch time TN1, Second timing for calculating the corresponding etching period of point PN2 is the second overetch time TN2, by the first overetch time TN1 and the After the time of two overetch time TN2 is average, an overetch time TE can produce.So the present invention limits not to this, Yu Qi His embodiment can use the maximum value of the first overetch time TN1 and the second overetch time TN2 as overetch time TE.When So, above-mentioned system is captured to two groups of Photosensing Units 112 as an example with algorithm module 134, if meeting abovementioned steps S151 to step The group number quantity of the Photosensing Units 112 for the effective numeric distribution data that the criterion of rapid S155 meets is more, calculates mould Block 134 also can generate the overetch time to step S159 according to abovementioned steps S157.It should be noted that etching end point is one Etch process terminates to etch the time point of a substrate, and the invention reside in the presumption overetch times to judge etching end point, at other In embodiment, etching end point can terminate the time point etc. for being etched into the air-dried stage for substrate.

In conclusion being with array light sensing in etching period method for detecting and etching period detecting system of the invention Element detects the transmittance values of substrate, by formulation data and compares the numeric distribution data of each group Photosensing Units, came Invalid or unreasonable noise and numeric distribution data are filtered out, to judge overetch time, and sentencing via the overetch time It is disconnected, achieve the purpose that complete etching substrate.

Furthermore transmittance values state of the system of the present invention according to time interval, to calculate the prediction in predicted time section Numberical range, and then determine whether the received transmittance values in predicted time section meet default value range, so that when prediction Between the received transmittance values system in section can have preferable correlation degree with the transmittance values of time interval, in this way, if It is influenced by spray solution or the aqueous vapor remained on substrate, the transmittance values for causing Photosensing Units to be detected are noisy Situation, so that the transmittance values difference of received transmittance values and time interval is very big and causes to receive invalid light transmission The transmittance values of rate score or surrounding time move towards wrong and lead to receive unreasonable transmittance values, this hair It is bright to filter out invalid or unreasonable transmittance values whereby, the case where to reduce the feedback for causing invalid detection signal；More very Person, if substrate is swung left and right, transmittance values also can have variation as substrate swings situation, but the present invention can still have Effect maintains the trend of transmittance values, achievees the purpose that filter out noise, and then promote the judgement for detecting etching period.

In addition, the area of the indicatrix of the present invention and the indirect numeric distribution data by a certain group of Photosensing Units with The area of the indicatrix of the numeric distribution data of another group of Photosensing Units compares, but compares different groups of Photosensing Units Numeric distribution data in each time interval corresponding each time-domain curve area ratio and slope, therefore pass through phase according to timing The area ratio of adjacent time interval determines the trend and trend of the numeric distribution data of different groups of Photosensing Units from slope, compared with Can effectively determine whether the numeric distribution data of different groups of Photosensing Units similar, thus the present invention not will receive substrate put position It sets or the influence of inclination conditions.

Although the present invention has been disclosed by way of example above, it is not intended to limit the present invention., any technical field Middle tool usually intellectual, without departing from the spirit and scope of the present invention, when can make some changes and embellishment, thus it is of the invention Protection scope when view appended claims institute defender subject to.